JP2019197912A - Load port - Google Patents

Abstract

To provide a load port capable of increasing sealing performance in an EFEM, reducing a supply amount of a gas used in the EFEM, and improving a quality of a wafer.SOLUTION: Each of load ports 3 is adjusted and provided in a wafer conveying chamber for taking in and out a wafer between the wafer conveying chamber and a wafer housing container, and comprises: a panel 31 that constitutes one part of a wall surface of the wafer conveying chamber, and forms an opening for opening the wafer conveying chamber; a door part 61 for opening and closing the opening; a mounting stage 34 that mounts the wafer housing container so that a lid part capable of opening and closing an inner space is opposite to the door part to enable progressing and retiring toward/from the panel 31; and an o-ring 44 provided on the mounting stage 34 side of the panel 31 along a periphery of the opening. By moving the mounting stage 34 to the panel 31, the o-ring 44 is elastically contacted to the circumference of the lid part in the wafer hosing container.SELECTED DRAWING: Figure 4

Description

  The present invention relates to a load port that can reduce the amount of gas used even when a special gas atmosphere is provided in a wafer transfer chamber, and an EFEM including the load port.

  Conventionally, semiconductors have been manufactured by performing various processing steps on a wafer. In recent years, higher integration of devices and circuit miniaturization have been promoted, and it is required to maintain the wafer periphery with a high degree of cleanliness so that particles and moisture do not adhere to the wafer surface. . Furthermore, in order not to change the surface properties such as oxidation of the wafer surface, the periphery of the wafer is made an inert gas nitrogen atmosphere or a vacuum state.

  In order to properly maintain the atmosphere around the wafer, the wafer is managed in a sealed storage pod called FOUP (Front-Opening Unified Pod), which is filled with nitrogen. Further, an EFEM (Equipment Front End Module) as disclosed in the following Patent Document 1 is used in order to transfer a wafer between a processing apparatus for processing a wafer and the FOUP. The EFEM constitutes a wafer transfer chamber that is substantially closed inside the housing, and has a load port that functions as an interface unit with the FOUP on one of its opposing wall surfaces, and a process on the other side. A load lock chamber which is part of the apparatus is connected. A wafer transfer device for transferring wafers is provided in the wafer transfer chamber, and wafers are taken in and out between the FOUP connected to the load port and the load lock chamber using this wafer transfer device. .

  That is, a wafer is taken out from a FOUP (load port) serving as one delivery position using a wafer conveyance device, and conveyed to a load lock chamber serving as the other delivery position. In the processing apparatus, the wafer transferred through the load lock chamber is processed in a processing unit called a process chamber, and after the processing is completed, the wafer is taken out again through the load lock chamber and stored in the FOUP. Returned to

  The inside of the processing apparatus has a special atmosphere such as a vacuum corresponding to the processing so that the wafer can be processed quickly. In addition, the inside of the wafer transfer chamber in the EFEM has a clean air atmosphere with high cleanliness by introducing air that has been cleaned through a chemical filter or the like, and is caused by adhesion of particles or the like to the surface of the wafer being transferred. There is no contamination.

JP 2012-49382 A

  However, in recent years, with the progress of higher integration and miniaturization, the EFEM wafer transfer chamber has a relatively high degree of cleanliness, but is affected by the air atmosphere different from that in the FOUP and processing equipment. There is a growing concern.

  That is, exposure to an air atmosphere tends to cause moisture and oxygen to adhere to the wafer surface, which may cause corrosion and oxidation. Further, when the corrosive gas or the like used in the processing apparatus remains on the wafer surface, the wiring material on the wafer surface may be corroded and the yield may be deteriorated. Furthermore, since the corrosion element accelerates the corrosion reaction due to the presence of moisture, there is a possibility that the corrosion proceeds more quickly when both the corrosive gas and the moisture exist.

  In order to avoid this, like the FOUP, it can be considered that the inside of the wafer transfer chamber has a dry nitrogen atmosphere. Furthermore, even if it is other than dry nitrogen, a gas atmosphere using an appropriate special gas may be considered depending on the content of processing on the wafer.

  However, in conventional EFEM, it is almost considered to suppress the outflow of gas from the wafer transfer chamber and load port constituting the EFEM only by increasing the internal pressure so that particles do not enter from the outside. Not. Therefore, even if a special gas such as dry nitrogen is supplied into the wafer transfer chamber, it is difficult to properly maintain and manage the internal atmosphere because the gas flows out to the outside, and a large amount of gas is required. This increases the cost required for the gas. Further, if a large amount of gas flows out of the EFEM, depending on the type of the gas, there is a risk that the working environment outside the EFEM may be deteriorated.

  An object of the present invention is to effectively solve such problems. Specifically, when a special gas atmosphere is provided in the wafer transfer chamber constituting the EFEM, the outflow of the gas used to the outside An object of the present invention is to provide a load port and an EFEM capable of suppressing the inflow of air or the like from the outside, reducing the amount of gas used, and improving the quality of the wafer.

  In order to achieve this object, the present invention takes the following measures.

  That is, the load port of the present invention is provided adjacent to the wafer transfer chamber, and is a load port for taking in and out of the wafer between the wafer transfer chamber and the wafer storage container. The door includes a plate-like portion that forms a part of the wall surface and is formed with an opening for opening the wafer transfer chamber, a door portion for opening and closing the opening, and a lid portion that can open and close the internal space. The wafer storage container is placed so as to face the part, and a mounting table that can be moved back and forth toward the plate-like part is provided, and the plate-like part has a substantially rectangular shape on the panel body. The window frame part contacting the opened wafer storage container and the opening formed in the window frame part are provided larger than the outer periphery of the lid part of the wafer storage container, and the wafer storage container and the window frame Between departments A window unit configured separately from the panel body on which an elastic material is provided along the periphery of the opening, and the wafer storage by moving the mounting table toward the plate-like portion The elastic material is configured to elastically contact around the lid portion of the container.

  With this configuration, the wafer storage container is moved together with the mounting table toward the plate-like portion, so that the opening of the plate-like portion and the periphery of the lid portion are connected via an elastic material, and the lid portion of the wafer storage container Even when the door of the plate-like part is opened, it is possible to prevent gas from flowing out of the wafer transfer chamber. Therefore, even when the wafer transfer chamber has a special gas atmosphere such as an inert gas, a clean gas, or a dry gas, it is possible to reduce the cost required for gas management by reducing the amount of these gases used. At the same time, it is possible to suppress the deterioration of the working environment outside the wafer transfer chamber due to the outflow of gas. Furthermore, since the inflow of gas from the outside into the wafer transfer chamber can be suppressed, it is possible to prevent particles from entering the wafer storage container and the wafer transfer chamber, and to maintain the quality of the wafer. .

  Even when particles are generated due to the elastic contact of the elastic material, the pressure in the wafer storage container is set to be higher than that in the wafer transfer chamber so that the particles do not enter the wafer storage container with the opening of the lid and the door. In order to make it possible to increase the temperature, it is preferable to provide gas supply means for supplying gas into the wafer storage container via a gas supply valve provided in the wafer storage container.

  In order to improve the adhesion between the wafer storage container and the elastic material, the window unit includes a clamp unit that draws the lid portion toward the window frame portion. In order to further enhance the above effect, the clamp unit is provided outside the window frame portion and in the left-right direction, and can be engaged with a flange provided around the lid portion in the wafer storage container. It is preferable to include an engagement piece and a cylinder that is pulled into the window frame portion in a state where the engagement piece is engaged with the flange portion.

  Further, in order to suppress the outflow of gas from the opening regardless of whether the wafer storage container is connected or not, and to further save the gas, the window unit is arranged along the periphery of the opening. An elastic material provided on the door portion side of the plate-like portion is further provided, and the opening is closed by the door portion so that the elastic material provided on the door portion side and the door portion are in elastic contact. It is preferable to configure.

  It is preferable that the pressure in the wafer storage container is higher than the pressure in the wafer transfer chamber by the gas supply means.

  As a structure different from the above, it is also preferable that the elastic material is formed in a plate shape.

  In order to reduce the number of parts and further reduce the manufacturing cost, it is also preferable to integrally configure the elastic material provided on the mounting table side and the elastic material provided on the door portion side. .

  The EFEM of the present invention is a transfer robot for transferring the wafer in the EFEM including any one of the load ports described above and the wafer transfer chamber provided between the load port and a processing apparatus for processing the wafer. The wafer transfer chamber has a circulation path for circulating the gas in the wafer transfer chamber and a transfer robot for transferring the wafer, and the ceiling of the wafer transfer chamber has the transfer space The fan filter unit for forming a down flow is provided, and the circulation path is provided with a chemical filter for removing residual gas flowing into the transfer space from the processing. The chemical filter provided above the opening of the load port is located above the opening of the load port. Characterized in that also provided below.

  With this configuration, it is possible to increase the sealing degree in the wafer transfer chamber and suppress the outflow of gas to the outside and the inflow of gas from the outside. Therefore, it is possible to easily manage the gas atmosphere in the wafer transfer chamber and reduce the cost required for management while maintaining a clean state.

  In order to prevent the particles from adhering to the wafer to be transported even when the elastic material is repeatedly elastically contacted, an air flow from above to below in the wafer transport chamber. It is preferable to configure so as to form.

  According to the present invention described above, when the inside of the EFEM has a special gas atmosphere, the outflow of the gas to be used to the outside and the inflow from the outside of the air or the like are suppressed, and the supply amount of the gas to be used is reduced. It is possible to provide a load port and an EFEM capable of reducing the cost by reducing the cost and improving the quality of the wafer.

The perspective view of EFEM provided with the load port concerning a 1st embodiment of the present invention. The side view of the EFEM. The perspective view which shows the state which separated some load ports from the EFEM. The perspective view of the load port. The front view of the load port. The rear view of the load port. The sectional side view of the load port. FIG. 8 is a side sectional view showing a state in which the FOUP is moved to the plate-like portion side from the state of FIG. 7. The sectional side view which shows the state which separated the door part from the plate-shaped part with the cover part of FOUP from the state of FIG. The sectional side view which shows the state which moved the door part below with the cover part of FOUP from the state of FIG. The principal part expansion perspective view which expands and shows the window unit and door part which comprise the load port apparatus. The principal part expanded sectional view which expands and shows the AA cross section in FIG. The principal part expanded sectional view which expands and shows the BB cross section in FIG. The principal part enlarged front view which shows the clamp unit provided in the window unit. The principal part expansion perspective view which expands and shows the window unit and door part which comprise the load port which concerns on 2nd Embodiment of this invention. The principal part expanded sectional view which expands and shows the CC cross section in FIG. The principal part expansion perspective view which expands and shows the window unit and door part which comprise the load port which concerns on 3rd Embodiment of this invention. Explanatory drawing which shows the sealing member attached to the vicinity of opening of the window unit. The principal part expanded sectional view which expands and shows the DD cross section in FIG. The principal part expanded sectional view corresponding to Drawing 12 showing the example which changed the load port concerning a 1st embodiment of the present invention.

  Embodiments of the present invention will be described below with reference to the drawings.

<First Embodiment>
A load port 3 according to the first embodiment and an EFEM 1 including the load port 3 are shown in FIG. The EFEM 1 has three load ports 3 arranged side by side and connected to a front surface 21 that constitutes a part of the wall surface of the wafer transfer chamber 2 that forms a box-shaped housing.

  Here, in this application, the direction of the side to which the load port 3 is connected as viewed from the wafer transfer chamber 2 is defined as the front side, and the direction of the rear surface 22 side facing the front surface 21 is defined as the rear direction. The orthogonal direction is defined as the side. That is, the three load ports 3 are arranged side by side along the side.

  FIG. 2 is a side view of the load port 3 and the EFEM 1 including the load port 3. As described above, the load port 3 is connected to the front surface 21 of the wafer transfer chamber 2. The load port 3 includes a panel 31 as a plate-like portion on the rear side, and this panel 31 is integrated with the front surface 21 to constitute a part of the wall surface of the EFEM 1. The load port 3 is provided with a mounting table 34 so as to protrude forward from the panel 31. On the mounting table 34, a FOUP 7 as a wafer storage container for storing the wafer W can be mounted. It has become.

  The EFEM 1 is installed on the floor surface FL, and a processing device 9 for performing predetermined processing on the wafer W can be connected to the rear surface 22 side, and a gate valve (not shown) provided on the rear surface 22 of the EFEM 1 is connected. Thus, the internal space Se of the wafer transfer chamber 2 and the processing device 9 communicate with each other. A wafer transfer device 8 for transferring the wafer W is provided in the internal space Se of the wafer transfer chamber 2, and the wafer transfer device 8 is used to process the FOUP 7 installed in the load port 3 and the processing. The wafer W can be transferred to and from the apparatus 9.

  The wafer transfer chamber 2 is configured so that the internal space Se is substantially sealed by connecting the load port 3 and the processing apparatus 9, and includes a gas supply port and a gas discharge port (not shown). It is possible to increase the nitrogen gas concentration in the internal space Se by purging with dry nitrogen gas. Then, a fan filter unit 25 is provided in the upper part of the wafer transfer chamber 2, gas is sent downward, the gas is sucked from the chemical filter 26 provided in the lower part, and the circulation provided adjacent to the inner side of the rear surface 22. The gas can be returned to the upper fan filter unit 25 through the duct 27. By doing so, it is possible to form a downflow that is an airflow from the upper side to the lower side in the wafer transfer chamber 2 and to keep the inside gas in a clean state by circulating it. Further, even if particles that contaminate the surface of the wafer W exist in the internal space Se of the wafer transfer chamber 2, the particles are pushed down by the downflow, and the particles adhere to the surface of the wafer W being transferred. It becomes possible to suppress. Moreover, the residual gas by the processing apparatus 9 can also be caught by the chemical filter 26, and it is possible to keep the internal space Se in a more clean state.

  FIG. 3 shows a state in which one load port 3A is removed from the wafer transfer chamber 2 from the state of FIG. An opening 23 that is slightly smaller than the panel 31 of the load port 3 is provided on the front surface 21 to which the load port 3A is connected, and the internal space Se can be opened by the opening 23. A contact surface 24 is formed along the periphery of the opening 23 so as to form a stepped shape that is recessed rearward, and the rear surface of the panel 31 is in contact with the contact surface 24.

  4, 5 and 6 are respectively a perspective view of the load port 3, a front view when viewed from the front, and a rear view when viewed from the rear. Hereinafter, the configuration of the load port 3 will be described with reference to these drawings. These drawings show a state in which the external cover 32 (see FIG. 2) located below the mounting table 34 is removed and a part of the internal structure is exposed.

  In the load port 3, the panel 31 is vertically erected from the rear of the leg 35 to which the caster and the installation leg are attached, and the horizontal base 33 is provided from the height position of about 60% of the panel 31 toward the front. Yes. Furthermore, a mounting table 34 for mounting the FOUP 7 (see FIG. 2) is provided on the upper portion of the horizontal base 33. As schematically shown in FIG. 7, the FOUP 7 is provided on one surface of the main body 71 as a main body 71 having an internal space Sf for accommodating the wafer W (see FIG. 2), and serving as a carry-in / out port for the wafer W. The lid portion 72 is configured to close the opening 71 a, and the lid portion 72 faces the panel 31 when correctly placed on the mounting table 34.

  4 to 6, a positioning pin 34 a for positioning the FOUP 7 is provided on the mounting table 34, and a lock claw 34 b for fixing the FOUP 7 to the mounting table 34 is provided. Yes. The locking claw 34b can be fixed while guiding the FOUP 7 to an appropriate position in cooperation with the positioning pin 34a by performing a locking operation, and the FOUP 7 can be separated from the mounting table 34 by performing an unlocking operation. State.

  Further, the mounting table 34 includes a gas supply nozzle 34c that constitutes a gas supply means for supplying gas into the FOUP 7 (see FIG. 2), and a gas that constitutes a gas discharge means for discharging gas from within the FOUP 7. The discharge nozzles 34d are provided at two locations, respectively. These are normally located below the upper surface of the mounting table 34, and when used, they move upward to be connected to the gas supply valve 73 and the gas discharge valve 74 (see FIG. 7) of the FOUP 7, respectively. Yes. A gas such as dry nitrogen gas is supplied from the gas supply nozzle 73 c to the internal space Sf of the FOUP 7 (see FIG. 7) via the gas supply valve 73, and the internal space Sf from the gas discharge nozzle 34 d via the gas discharge valve 74. The gas purge can be performed by discharging the gas. Further, by setting the gas supply amount to be larger than the gas discharge amount, the positive pressure setting is set such that the pressure of the internal space Sf is increased with respect to the pressure of the outside or the internal space Se (see FIG. 2) of the wafer transfer chamber 2. You can also.

  The mounting table 34 can be moved in the front-rear direction with the FOUP 2 (see FIG. 7) mounted.

  The panel 31 constituting the load port 3 is attached to columns 31a and 31a erected on both sides, a panel main body 31b supported by these, and a window portion 31c opened to the panel main body 31b in a substantially rectangular shape. Window unit 4. Here, the “substantially rectangular” as used in the present application refers to a shape in which four corners are smoothly connected by arcs while a rectangle having four sides is a basic shape. A gasket 37 as an elastic material formed in a rectangular frame shape is provided in the vicinity of the outer periphery of the rear surface of the panel main body 31b. The gasket 37 is made of a rubber material with little gas permeation. The gasket 37 comes into contact with the contact surface 24 (see FIG. 3) set in the vicinity of the edge of the opening 23 of the wafer transfer chamber 2 described above, and a gap between the outer periphery of the panel main body 31b and the opening 23. The gas leakage from the inside of the wafer transfer chamber 2 to the outside is suppressed.

  The window unit 4 is provided at a position facing the lid portion 72 (see FIG. 7) of the FOUP 7 described above, and a substantially rectangular opening 42 (see FIG. 7) is provided as will be described in detail later. Thus, the internal space Se of the wafer transfer chamber 2 can be opened through the opening 42. The load port 3 includes an opening / closing mechanism 6 for opening / closing the opening 42.

  The opening / closing mechanism 6 includes a door portion 61 for opening and closing the opening 42, a support frame 63 for supporting the door portion 61, and a movable block for supporting the support frame 63 movably in the front-rear direction via the slide support means 64. 65, and a slide rail 66 that supports the movable block 65 so as to be movable in the vertical direction with respect to the panel main body 31b. As shown in FIG. 7, the support frame 63 supports the lower rear portion of the door portion 61. After extending downward, the support frame 63 passes through a slit-like insertion hole 31d provided in the panel body 31b. It has a substantially crank shape protruding toward the front of the panel body 31b. The slide support means 64, the movable block 65, and the slide rail 66 for supporting the support frame 63 are provided in front of the panel body 31b. That is, the sliding part for moving the door part 61 is outside the wafer transfer chamber 2, and even if particles are generated in these parts, the insertion hole 31d is made small as a slit, so that Can be prevented from entering the wafer transfer chamber 2.

  Furthermore, an actuator (not shown) for moving the door portion 61 in the front-rear direction and in the up-down direction is provided for each direction, and a drive command from the control unit Cp is given thereto. Thereby, the door part 61 can be moved now in the front-back direction and an up-down direction.

  Further, a cover 36 is provided in front of the panel main body 31b so as to extend downward from directly below the horizontal base 33. Inside the cover 36, a support frame 63, a slide support means 64, and a movable block 65 are provided. In addition, the slide rail 66 is covered so as to be sealed. Therefore, although the insertion hole 31d is formed in the panel main body 31b, the gas in the wafer transfer chamber 2 (see FIG. 3) is prevented from flowing out through this portion.

  The door portion 61 includes a latching operation for opening and closing the lid portion 72 (see FIG. 7) of the FOUP 7 and a connecting means 62 for holding the lid portion 72. In the connecting means 62, the lid 72 can be opened by latching the lid 72, and the lid 72 can be connected to the door 61 and integrated. Conversely, the connection between the lid 72 and the door can be released, and the lid 72 can be attached to the main body 71 to be in a closed state.

  Here, the detailed configuration of the window unit 4 described above will be described with reference to FIG. The window unit 4 includes a window frame portion 41, O-rings 44 and 46 (see FIG. 12) as elastic members attached thereto, and FOUP 7 (see FIG. 7) with respect to the window frame portion 41 via the O-ring 44. And a clamp unit 5 as a pull-in means for bringing them into close contact with each other.

  The window frame portion 41 has a frame shape in which a substantially rectangular opening 42 is formed inside. Since the window frame portion 41 constitutes a part of the panel 31 (see FIG. 3) described above as a component of the window unit 4, the opening 42 serves as a wall surface of the casing constituting the wafer transfer chamber 2. It can be said that the front surface 21 is opened. The opening 42 is slightly larger than the outer periphery of the lid portion 72 (see FIG. 7) of the FOUP 7, and the lid portion 72 can be moved through the opening 42. Further, in a state where the FOUP 7 is placed on the placing table 34, the front surface of the main body 71 that forms the periphery of the lid portion 72 abuts against the window frame portion 41 via the O-ring 44 as an abutment surface 71 b.

  Further, the door 61 described above is in contact with the rear surface of the window frame 41 via an O-ring 46 (see FIG. 12). Specifically, a thin wall portion 61 a provided in a bowl shape contacts the outer periphery of the door portion 61. At this time, the thick portion 61b formed inside the thin portion 61a is formed to be smaller than the opening 42, so that it protrudes forward through the opening 42.

  FIG. 12 is an enlarged view of the AA cross section in FIG. A dovetail groove 43 having a trapezoidal cross section is formed on the front surface of the window frame portion 41 so as to circulate around the periphery of the opening 42, and an O-ring 44 is inserted therein. The dovetail groove 43 has a small opening and has a cross-sectional shape that expands toward the inside. Therefore, the O-ring 44 can be appropriately supported inside, and the O-ring 44 does not easily jump out. Further, a part of the O-ring 44 protrudes forward from the opening of the dovetail groove 43 so that the protruding part can contact the contact surface 71b set in the FOUP 7. It has become. Therefore, the FOUP 7 placed on the placement table 34 (see FIG. 7) moves to the panel 31 side together with the placement table 34, so that the O-ring 44 can be brought into elastic contact with the contact surface.

  Similarly, a dovetail groove 45 having a trapezoidal cross section is formed on the rear surface of the window frame portion 41 so as to go around the periphery of the opening 42, and an O-ring 46 is inserted therein. And by closing the door part 61, it comes in elastic contact with the front surface of the outer peripheral thin part 61a. The dovetail groove 45 is formed inside the dovetail groove 43 so that the thickness is extremely thin between the two so that the strength is not insufficient.

  Returning to FIG. 11, the clamp units 5 are provided at a total of four locations that are spaced apart in the vertical direction on both sides of the window frame portion 41. Each clamp unit 5 is generally composed of an engagement piece 51 and a cylinder 52 for operating the engagement piece 51.

  FIG. 13 is an enlarged view of the BB cross section in FIG. The cylinder 52 constituting the clamp unit 5 is attached to the rear of the window frame portion 41 and includes a shaft 53 that can be moved forward and backward through a hole provided in the window frame portion 41. A proximal end 51a of the engagement piece 51 is attached to the distal end of the shaft 53, and the distal end 51b extends from the proximal end 51a toward the outer peripheral direction of the shaft 53. Further, a guide groove 53a having a 90 ° phase twist along the axial direction is formed on the outer periphery of the shaft 53, and a guide pin 54 fixed to the window frame 41 side is inserted into the guide groove 53a from the radial direction. Yes. Therefore, the guide groove 53a is guided by the guide pin 54 as the cylinder 52 advances and retreats, and the shaft 53 rotates 90 ° around the axis center. Then, as shown in FIG. 13b, when the engaging piece 51 jumps forward together with the shaft 51, the tip 51b faces upward, and when it is pulled backward, the tip 51b is on the inner FOUP 7 side. It becomes the direction toward The engagement piece 51 can be engaged with the flange 71c projecting laterally from the FOUP 7 by the tip 51b facing inward. While maintaining the engaged state as described above, the shaft 53 is further pulled by the cylinder 52, so that the abutting surface 71b of the FOUP 7 is more closely attached to the O-ring 44 as shown in FIG. It is possible to do. By operating the clamp unit 5 in four places, it is possible to make the deformation amount of the O-ring 44 uniform and improve the sealing performance. Further, when the engagement piece 51 is moved forward, the tip 51b is directed upward so that the engagement piece 51 does not interfere with the flange 71c when viewed from the front. By doing so, the FOUP 7 can be moved together with the mounting table 34 (see FIG. 7). In addition, when the front end 51b is moved forward, it is only required that the front end 51b does not interfere with the collar portion 71c, and the front end 51b may be set not only in the upward direction but also in the downward direction or the outward direction.

  A cable guide 55 extending in the vertical direction is provided in front of the engagement piece 51. The cable guide 55 is formed by being able to bend a sheet metal, and can prevent other members from being caught in the engagement piece 51. It is also preferable to fix piping, electrical wiring, and the like outside the cable guide 55.

  The load port 3 configured as described above operates when a drive command is given to each unit by the control unit Cp shown in FIG. Hereinafter, an operation example when the load port 3 of the present embodiment is used will be described with reference to FIGS.

  FIG. 7 shows a state in which the FOUP 7 is placed on the placement table 34 and separated from the panel unit 31. In this state, since the door portion 61 is in contact with the rear surface of the window frame portion 41 (see FIG. 12) constituting the window unit 4 via the O-ring 46, the space between the window frame portion 41 and the door portion 61. There is no gap between the two and high sealing performance can be obtained. Therefore, even if the internal space Sf of the wafer transfer chamber 2 is filled with nitrogen gas or the like, it is possible to suppress the outflow of gas to the outside and the inflow of gas from the outside to the internal space Sf.

  Although omitted in this figure, the FOUP 7 is fixed at an appropriate position with respect to the mounting table 34 by the locking operation by the lock claw 53 (see FIG. 4) and the positioning action with the positioning pin 34.

  And the gas supply nozzle 34c and the gas discharge nozzle 34d with which the mounting base 34 is provided protrude upward, and are connected to the gas supply valve 73 and the gas discharge valve 74 with which the FOUP 7 is provided. Thereafter, fresh dry nitrogen gas is supplied from the gas supply nozzle 34 c through the gas supply valve 73, and the gas that has remained in the internal space Sf is discharged from the gas supply nozzle 34 c through the gas discharge valve 74. By performing the gas purge in this way, the internal space Sf is filled with nitrogen gas, and the pressure is set higher than the internal space Sf of the wafer transfer chamber 2.

  Next, as shown in FIG. 8, the mounting table 34 is moved rearward to bring the contact surface 71 b of the FOUP 7 into contact with the window frame portion 41. Specifically, the contact surface 71b is brought into contact with each other via an O-ring 44 provided on the front surface of the window frame portion 41 (see FIG. 12), so that a sealed state is obtained. When the mounting table 34 is moved in this way, the engagement piece 51 (see FIG. 13) is projected forward by the cylinder 52 constituting the clamp unit 5 in advance, and the tip 51b is directed upward. Do not interfere with FOUP7.

  Further, by operating the connecting means 62 (see FIG. 6) provided on the door portion 61, the lid portion 72 can be detached from the main body 71 in an unlatched state, and the lid portion 72 is integrally formed by the door portion 61. The state is held. At the same time, the engagement piece 51 (see FIG. 13) is pulled rearward by the cylinder 52 constituting the clamp unit 5, and the front end 51b faces inward, and is engaged with the flange 71c of the FOUP 7. By further pulling in, the contact surface 71b of the FOUP 7 is more closely attached to the O-ring 44, and the sealing property is improved.

  From this state, as shown in FIG. 9, the door portion 61 is moved rearward together with the support frame 63. By doing so, the internal space Sf can be opened by separating the lid 72 of the FOUP 7 from the main body 71. At this time, since the contact surface 71b of the FOUP 7 is firmly attached to the window unit 4, it is possible to suppress the outflow and inflow of gas between the wafer transfer chamber 2 and the FOUP 7 and the outside. Yes.

  Further, since the pressure of the FOUP 7 is increased, a gas flow is generated from the internal space Sf of the FOUP 7 toward the wafer transfer chamber 2. For this reason, it is possible to keep the inside of the FOUP 7 clean by suppressing the entry of particles or the like from the way transfer chamber 2 into the FOUP 7. It is also preferable to continuously supply a low flow rate gas through the gas supply nozzle 34c in order to prevent particles from entering.

  Next, the door 61 is moved downward together with the support frame 63. By doing so, the rear of the opening 71a as the carry-in / out port of the FOUP 7 can be largely opened, and the wafer W can be moved between the FOUP 7 and the processing apparatus 9 (see FIG. 2). Since all the mechanisms for moving the door portion 61 are covered with the cover 36 in this way, it is possible to suppress leakage of gas in the wafer transfer chamber 2 to the outside.

  As described above, the operation when opening the opening 71a of the FOUP 7 has been described. However, when closing the opening 71a of the FOUP 7, an operation opposite to the above may be performed.

  By repeating such an operation, the O-rings 44 and 46 are repeatedly brought into elastic contact with the lid portion 72 or the door portion 61, and new particles may be generated. These particles are moved downward by the downflow formed inside the wafer transfer chamber 2 when the lid 72 or the door 61 is opened (see FIG. 2). Therefore, it is possible to maintain the wafer W surface in a clean state without adhering to the wafer W surface.

  As described above, the load port 3 in the present embodiment is provided adjacent to the wafer transfer chamber 2 and is used for loading and unloading the wafer W between the wafer transfer chamber 2 and the FOUP 7 which is a wafer storage container. A panel 31 as a plate-like part that forms part of the wall surface of the wafer transfer chamber 2 and has an opening 42 for opening the wafer transfer chamber 2 and a door for opening and closing the opening 42 Along the periphery of the opening 42, the mounting table 34 that allows the FOUP 7 to be placed so as to face the door portion 61 so that the lid portion 72 that can open and close the internal space Sf faces the door portion 61. And an O-ring 44 as an elastic material provided on the mounting table 34 side of the panel 31, and the mounting table 34 is moved toward the panel 31, thereby forming the periphery of the lid portion 72 in the FOUP 7. O-ring 44 is obtained by adapted elastic contact the surface 71b.

  With this configuration, the FOUP 7 is moved toward the panel 31 together with the mounting table 34, whereby the opening 42 of the panel 31 and the periphery of the lid portion 72 are connected via the O-ring 44. Even when the portion 72 and the door portion 61 provided on the panel 31 are opened, it is possible to prevent gas from flowing out of the wafer transfer chamber 2 to the outside. Therefore, even when the inside of the wafer transfer chamber 2 has a special gas atmosphere such as an inert gas, a clean gas, or a dry gas, it is possible to reduce the cost required for gas management by reducing the amount of these gases used. In addition, it is possible to suppress the deterioration of the working environment outside the wafer transfer chamber 2 due to the outflow of gas. Furthermore, since the inflow of gas into the wafer transfer chamber 2 from the outside can be suppressed, it is possible to prevent particles from entering the FOUP 7 and the wafer transfer chamber 2 from the outside, and to maintain the quality of the wafer W. Is also possible.

  Since the gas supply nozzle 34c is further provided as a gas supply means for supplying gas into the FOUP 7 via the gas supply valve 73 provided in the FOUP 7, the O-ring 44 is elastically contacted. Even when particles are generated, if the pressure in the FOUP 7 is made higher than that in the wafer transfer chamber 2 by using the gas supply nozzle 34c, the lid 72 and the door 61 are opened and the FOUP 7 is released. Since gas flows to the wafer transfer chamber 2 side, it is possible to prevent particles from entering the FOUP 7 and maintain a clean state.

  Further, in the FOUP 7, an engagement piece 51 that can be engaged with a flange portion 71c provided around the lid portion 72, and a pull-in means for pulling the engagement piece 51 toward the panel 31 in a state where the engagement piece 51 is engaged with the flange portion 71c. As the mounting table 34 is moved, the engaging piece 51 is pulled toward the panel 31 in a state in which the mounting unit 34 is engaged with the flange portion 71c of the FOUP 7 by the clamp unit 5. The adhesiveness with the ring 44 can be enhanced to further enhance the above effect.

  In addition, an O-ring 46 as an elastic material provided on the door 61 side of the panel 31 along the periphery of the opening 42 is further provided. By closing the opening 42 by the door 61, Since the provided O-ring 46 and the door portion 61 are configured to elastically contact, the O-ring 46 provided on the door portion 61 side is closed by the door portion 61 by elastically contacting the door portion 61. In this case, the outflow of gas from the opening 42 can be suppressed regardless of whether the FOUP 7 is connected or not, so that gas can be further saved.

  Further, since the elastic materials for sealing are the O-rings 44 and 46, the sealing structure can be configured at low cost.

  Further, the EFEM 1 of the present embodiment includes the load port 3 and the casing 2 that constitutes the wafer transfer chamber, and a gasket as a seal member between the panel 31 and the casing 2 that constitutes the load port 3. 37 is provided. Therefore, it is possible to increase the sealing degree in the wafer transfer chamber 2 and suppress the outflow of gas to the outside and the inflow of gas from the outside, and easily manage the gas atmosphere in the wafer transfer chamber 2, It is possible to reduce the cost required for management while maintaining a clean state.

  In addition, since an air flow from the upper side to the lower side is formed inside the wafer transfer chamber 2, even if particles are generated by the elastic contact of the O-rings 44 and 46, the door portion 61. Alternatively, the particles can be moved downward by an air flow directed downward simultaneously with the opening of the lid 72 so as not to adhere to the wafer W to be transferred.

Second Embodiment
FIG. 15 shows a window unit 104 constituting a part of the EFEM 101 and the load port 103 of the second embodiment. The door 61 shown in the figure is the same as that in the first embodiment, and the points other than the window unit 104 are configured in the same manner as in the first embodiment. In the present embodiment, the same parts as those in the first embodiment are denoted by the same reference numerals, and description thereof is omitted.

  In the window unit 104, a gasket 144 as a plate-like elastic material is provided in a portion in front of the window frame portion 141 and in the vicinity of the periphery of the opening 142. The gasket 144 is configured in a substantially rectangular frame shape, and the inside thereof is the same size as the opening 142. And it is fixed so that it may be pinched | interposed between the stop plate 143 and the window frame part 141 similarly comprised by the substantially rectangular frame shape.

  Further, as shown in FIG. 16, a gasket 146 as a plate-like elastic material configured in a substantially rectangular frame shape is provided on the rear surface of the window frame portion 141, as in the case of the front surface. It is fixed using.

  The gaskets 144 and 146 are made of a rubber material with little gas permeation, and can be improved in sealing performance by coming into contact with the contact surface 71b of the FOUP 7 and the thin portion 61a of the door 61. .

  The gaskets 144 and 146 can be designed to increase the contact area with the abutment surface 71b of the FOUP 7 and the door portion 61 by appropriately changing the hardness and thickness, thereby improving the adhesion performance. There is no need to provide the window unit 141 with the clamp unit 5 as shown in the embodiment. However, in the case where higher sealing performance is required, for example, by increasing the pressure difference between the inside and the outside, the clamp unit 5 may be provided in order to improve the adhesion performance.

  Even when configured as described above, it is possible to obtain the same effects as those of the first embodiment described above.

  And since the elastic material for sealing is formed in plate shape, it is possible to comprise a sealing structure at low cost.

<Third Embodiment>
FIG. 17 shows a window unit 204 that constitutes a part of the EFEM 201 and the load port 203 of the third embodiment. The door portion 61 shown in the figure is the same as that in the first and second embodiments, and the points other than the window unit 204 are configured in the same manner as in the first embodiment. In the present embodiment, the same parts as those in the first and second embodiments are denoted by the same reference numerals, and description thereof is omitted.

  In this window unit 204, a seal member 244 as an elastic member is provided in a portion of the window frame portion 241 that is near the periphery of the opening 242, specifically so as to protrude slightly inward from the periphery of the opening 242. It has become a thing.

  The seal member 244 has a substantially rectangular frame shape as shown in FIG. 18A, and a flat plate portion 244a is formed on the outer peripheral side as in the cross-sectional shape shown in FIG. Two elastic portions 244b and 244c branched in an inverted Y shape are formed on the side. The elastic portions 244b and 244c each have a shape protruding from the inside of the flat plate portion 244a while curving so as to protrude forward and backward. Due to such a shape, the elastic portions 244b and 244c have large deformation margins and can be easily deformed in the front-rear direction.

  In another way, the shape of the sealing member 244 is sealed between the door portion 61 and the elastic portion 244b as an elastic member protruding forward in order to seal with the FOUP 7. Therefore, it can also be said that the elastic portion 244c as an elastic material protruding toward the front is integrally configured via the flat plate portion 244a.

  As shown in FIG. 19, the seal member 244 is fixed so as to sandwich the flat plate portion 244 between the window frame portion 241 and a stopper plate 243 formed in a substantially rectangular frame shape provided behind the window frame portion 241. The elastic portions 244b and 244c are positioned inside the opening 242 of the window frame portion 241.

  The elastic portions 244b and 244c can be sealed by elastically contacting the contact surface 71b of the FOUP 71 and the thin portion 61a of the door portion 61. At this time, since the elastic portions 244b and 244c can be greatly elastically deformed, the contact area with the contact surface 71b of the FOUP 71 and the thin portion 61a of the door portion 61 can be increased and made uniform, and high sealing performance is achieved. Can be obtained. Therefore, as in the second embodiment, it is not necessary to provide the clamp unit 5 as shown in the first embodiment in the window frame portion 141. However, when higher sealing performance is required, the clamp unit 5 is clamped to improve the adhesion performance. The unit 5 may be provided.

  Even when configured as described above, it is possible to obtain the same effects as those of the first embodiment described above.

  Since the elastic portion 244b, which is an elastic material provided on the mounting table 34 side, and the elastic portion 244c, which is an elastic material provided on the door portion 61 side, are configured integrally to perform sealing. The seal structure can be configured with a small number of parts, and the manufacturing cost can be reduced.

  The specific configuration of each unit is not limited to the above-described embodiment.

  For example, in the above-described embodiment, the panel 31 as the plate-like portion is configured by attaching the window unit 4 to the panel main body portion 31b. However, the panel 31 may be configured integrally without partitioning the two. Specifically, the window frame portion 41 constituting the window unit 5 may be integrally formed without being divided from the panel main body portion 31b.

  Further, in the first embodiment, the O-ring 46 is provided on the rear surface of the window frame portion 41 in order to perform sealing between the window frame portion 41 and the door portion 61, but as shown in FIG. Further, the window unit 304 and the door 361 may be modified. That is, the dovetail groove 345 may be formed in the thin wall portion 361a of the door portion 361 instead of the rear surface of the window frame portion 341, and the O-ring 346 may be inserted therein. By bringing the thin portion 361a of 361 and the rear surface of the window frame portion 341 into contact with each other via an O-ring 346, the same sealing performance can be obtained.

  Furthermore, in the above-described embodiment, the gas supply nozzle 34c, which is a gas supply means, is incorporated in the mounting table 34, and the gas supply nozzle 34c is configured as a so-called bottom purge method in which gas is supplied into the FOUP 7 from the lower side. It may be configured as a so-called front purge system that is incorporated in the door portion 61 and supplies gas from the front side into the FOUP 7. Even if the load port 3 is not equipped with a gas supply means, a gas supply device into the FOUP 3 configured separately from the load port 3 such as a so-called purge station is used to supply gas into the FOUP 7 in advance. If the pressure is increased and installed in the load port 3, it is possible to obtain the same effect as described above.

  Furthermore, in the above-described embodiment, nitrogen gas is used as the gas supplied into the EFEM 1 and the FOUP 7, but various gases such as air and ozone can be used depending on the processing.

  Moreover, although FOUP7 was used as a wafer storage container in the above-mentioned embodiment, even if it is a case where the wafer storage container of another form is used, it can comprise similarly and can acquire the effect according to the above. .

  Other configurations can be variously modified without departing from the spirit of the present invention.

1 ... EFEM
2 ... Wafer transfer chamber (casing)
3 ... Load port 5 ... Clamp unit (retraction means)
7. FOUP (wafer storage container)
31 ... Panel (plate-shaped part)
34 ... mounting table 34c ... gas supply nozzle (gas supply means)
37 ... Gasket (seal member)
42 ... Opening 44,46 ... O-ring (elastic material)
DESCRIPTION OF SYMBOLS 51 ... Engagement piece 61 ... Door part 71c ... Eaves part 72 ... Lid part 73 ... Gas supply valve 144,146 ... Gasket (elastic material)
244b, 244c ... Elastic part (elastic material)
W ... wafer

The present invention, even when the wafer transfer chamber and a special gas atmosphere, it relates to Rodopo bets that can reduce the amount of gas.

An object of the present invention is to effectively solve such problems. Specifically, when a special gas atmosphere is provided in the wafer transfer chamber constituting the EFEM, the outflow of the gas used to the outside , by suppressing the inflow from the outside air, and the like, and it reduces the supply amount of gas used, and its object is to provide a Rodopo bets that can improve the quality of the wafer.

That is, the load port of the present invention is a load port for connecting a wafer storage container to a wafer transfer chamber, a plate-like portion having an opening for opening the wafer transfer chamber , and opening and closing the opening. And a mounting table on which a wafer storage container is placed so that a lid that can open and close an internal space is opposed to the door and can be moved back and forth toward the plate-like part. In addition, an elastic material is interposed along the periphery of the opening between the plate-like portion and the wafer storage container, and the plate-like portion has a panel body provided with the opening. By moving the pedestal toward the plate-like portion, the elastic member is configured to elastically contact the periphery of the lid portion in the wafer storage container, and engages with a flange portion provided in the wafer storage container. The The clamp unit to draw the collar portion to the panel body, the said panel main body is provided on a member provided on the opening edge of the opening is configured separately, it is characterized.

With this configuration, the wafer storage container is moved together with the mounting table toward the plate-like portion, so that the opening of the plate-like portion and the periphery of the lid portion are connected via an elastic material, and the lid portion of the wafer storage container Even when the door of the plate-like part is opened, it is possible to prevent gas from flowing out of the wafer transfer chamber. Therefore, even when the wafer transfer chamber has a special gas atmosphere such as an inert gas, a clean gas, or a dry gas, it is possible to reduce the cost required for gas management by reducing the amount of these gases used. At the same time, it is possible to suppress the deterioration of the working environment outside the wafer transfer chamber due to the outflow of gas. Furthermore, since the inflow of gas from the outside into the wafer transfer chamber can be suppressed, it is possible to prevent particles from entering the wafer storage container and the wafer transfer chamber, and to maintain the quality of the wafer. . In addition, since the clamp unit that engages with the flange provided in the wafer storage container and pulls the flange toward the panel main body is provided, the adhesion between the wafer storage container and the elastic material can be improved.

  It is also preferable that the clamp units are respectively provided on the left and right sides of the opening.

  It is also preferable that the clamp unit includes an engagement piece that can be engaged with the flange provided around the lid portion in the wafer storage container, and a cylinder that operates the engagement piece.

  It is also preferable that the cylinder is pulled into the panel main body side in the state where the engaging piece is engaged with the flange portion.

  When the cylinder advances and retracts the engagement piece, the posture may be changed between a posture in which the engagement piece engages with the flange portion and a posture in which the engagement piece does not engage with the flange portion. Is preferred.

  It is also preferable that the engagement piece is disposed at a position where the engagement piece does not interfere with the flange when the cylinder moves the engagement piece to a predetermined position.

  It is also preferable that the cylinder further moves the engaging piece in a posture engaged with the flange portion so that the elastic material is more elastically contacted around the lid portion.

According to the present invention described above, when the inside of the EFEM has a special gas atmosphere, the outflow of the gas to be used to the outside and the inflow from the outside of the air or the like are suppressed, and the supply amount of the gas to be used reduction to strive to reduce costs, it is possible to provide a Rodopo bets that can improve the quality of the wafer.

Claims (9)

A load port provided adjacent to the wafer transfer chamber, for loading and unloading the wafer between the wafer transfer chamber and the wafer storage container,
A part of the wall surface of the wafer transfer chamber is configured, and a plate-like portion formed with an opening for opening the wafer transfer chamber;
A door for opening and closing the opening;
A mounting table on which a wafer storage container is mounted so as to face the door portion with a lid portion capable of opening and closing an internal space, and can be moved back and forth toward the plate-like portion;
The plate-like portion is a panel main body, a window frame portion that is in contact with the wafer storage container opened in a substantially rectangular shape on the panel main body, and the opening formed in the window frame portion is the opening of the wafer storage container. A window unit that is provided larger than the outer periphery of the lid, and is configured separately from the panel body, wherein an elastic material is provided along the periphery of the opening between the wafer storage container and the window frame. Have
A load port, wherein the elastic member is configured to elastically contact the periphery of the lid portion in the wafer storage container by moving the mounting table toward the plate-like portion.   The load port according to claim 1, wherein the window unit includes a clamp unit that pulls the lid portion toward the window frame portion.   The clamp unit is provided on the outer side of the window frame portion and in the left-right direction, and is capable of engaging with an engagement piece provided around the lid portion in the wafer storage container, and the engagement piece The load port according to claim 1, further comprising a cylinder that is drawn into the plate-like portion side in a state of being engaged with the flange portion.   The window unit further includes an elastic material provided on the door portion side of the plate-shaped portion along the periphery of the opening, and the door portion closes the opening so that the door portion side is closed. The load port according to any one of claims 1 to 3, wherein the provided elastic member and the door portion are configured to elastically contact each other.   The load port according to any one of claims 1 to 4, further comprising gas supply means for supplying gas into the wafer storage container via a gas supply valve provided in the wafer storage container.   6. The load port according to claim 5, wherein the pressure in the wafer storage container is higher than the pressure in the wafer transfer chamber by the gas supply means.   The load port according to claim 1, wherein the elastic material is formed in a plate shape. In EFEM provided with the load port in any one of Claims 1-7, and the said wafer conveyance chamber provided between the said load port and the processing apparatus which processes the said wafer,
A transfer robot for transferring the wafer;
The wafer transfer chamber has a circulation path for circulating the gas in the wafer transfer chamber, and a transfer robot for transferring the wafer,
The ceiling part of the wafer transfer chamber is provided with the fan filter unit for forming a down flow in the transfer space, and the circulation path for removing residual gas flowing into the transfer space from the processing. A chemical filter is provided,
The EFEM, wherein the fan filter unit is provided above the opening of the load port, and the chemical filter is provided below the opening of the load port.   The EFEM according to claim 8, wherein an airflow is formed in the wafer transfer chamber from above to below.

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