CN117434628A - Multi-group array uniform lattice micro-lens array system and uniform point imaging method - Google Patents
Multi-group array uniform lattice micro-lens array system and uniform point imaging method Download PDFInfo
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- 238000003384 imaging method Methods 0.000 title claims abstract description 20
- 238000000034 method Methods 0.000 claims abstract description 17
- 239000000758 substrate Substances 0.000 claims description 38
- 238000004049 embossing Methods 0.000 claims description 25
- 239000011521 glass Substances 0.000 claims description 25
- 239000006121 base glass Substances 0.000 claims description 19
- 239000010453 quartz Substances 0.000 claims description 15
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 15
- 239000003292 glue Substances 0.000 claims description 6
- 239000011159 matrix material Substances 0.000 claims description 5
- 238000005329 nanolithography Methods 0.000 claims description 4
- 238000001312 dry etching Methods 0.000 claims description 3
- 238000013461 design Methods 0.000 abstract description 11
- 230000007547 defect Effects 0.000 abstract description 4
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- 238000003491 array Methods 0.000 description 1
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B3/00—Simple or compound lenses
- G02B3/0006—Arrays
- G02B3/0037—Arrays characterized by the distribution or form of lenses
- G02B3/0062—Stacked lens arrays, i.e. refractive surfaces arranged in at least two planes, without structurally separate optical elements in-between
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B21/00—Microscopes
- G02B21/0004—Microscopes specially adapted for specific applications
- G02B21/002—Scanning microscopes
- G02B21/0024—Confocal scanning microscopes (CSOMs) or confocal "macroscopes"; Accessories which are not restricted to use with CSOMs, e.g. sample holders
- G02B21/0032—Optical details of illumination, e.g. light-sources, pinholes, beam splitters, slits, fibers
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
- G02B27/0927—Systems for changing the beam intensity distribution, e.g. Gaussian to top-hat
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
- G02B27/0938—Using specific optical elements
- G02B27/095—Refractive optical elements
- G02B27/0955—Lenses
- G02B27/0961—Lens arrays
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B3/00—Simple or compound lenses
- G02B3/0006—Arrays
- G02B3/0037—Arrays characterized by the distribution or form of lenses
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
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Abstract
The invention relates to the technical field of micro-nano integrated optics, and discloses a multi-group array uniform lattice micro-lens array system and a uniform point imaging method. In addition, the micro-lens array adopts a method of optimizing a single channel firstly and arranging the single channel into an array mode in the design stage, so that the uniformity of output light spots is good, the uniformity is high, stray light can be eliminated by adding a diaphragm, and the defects of serious stray light phenomenon and poor light spot uniformity in the traditional design scheme are overcome.
Description
Technical Field
The invention relates to the technical field of micro-nano integrated optics, in particular to a multi-group array uniform lattice micro-lens array system and a uniform point imaging method.
Background
In recent years, due to the development of micro-nano integrated optics, the fields of super resolution, structured light, rotary disk confocal, array detectors, array optical fiber coupling and the like, the demand range of the array optical fiber coupling optical fiber array optical fiber is gradually increased due to the advantages of a lattice light source. For example, confocal microscopy imaging techniques are optical imaging techniques that utilize pinhole spatial filtering for point-wise illumination and scanning. The traditional laser scanning confocal microscope adopts a point-by-point scanning imaging mode, the measuring efficiency is low, the light energy utilization rate is low, the turntable confocal microscope adopts a multi-point turntable, the multi-point parallel scanning is realized, the scanning rate is greatly improved, the dot matrix light spots used in the multi-point scanning have good light spot consistency, less parasitic light crosstalk and high light utilization rate.
Currently, methods for generating lattice light spots mainly include a Diffuser, a grating beam splitter, a free-form surface lens, a micro lens array, and the like. The light field of the output array light spots is used as a known condition, the surface type of the product is mapped through physical optical software, and the lattice light spots generated by the method have stray light and cannot be eliminated, so that the consistency of the light spots is poor. The principle of grating beam splitting is that light beams irradiated to a two-dimensional grating are diffracted into light beam matrixes propagating in different directions, and the method is suitable for a mode of outputting light spots in a regular array arrangement, and has the problems of low light energy utilization rate and high processing and manufacturing difficulty. The free-form surface lens can be used as a beam splitter to generate a discrete light spot array with any energy ratio, and the method comprises three steps of dividing an incident light beam subarea corresponding to the discrete light spot array, calculating the light mapping from the incident light beam subarea to a corresponding light spot, constructing the free-form surface blocking, and has the advantages of complex design method and high processing and manufacturing difficulty.
Disclosure of Invention
In order to overcome the defects in the prior art, the invention aims to provide a multi-group array uniform lattice micro-lens array system and a uniform point imaging method, so as to solve the technical problems of parasitic light crosstalk, poor light spot consistency, low light energy utilization rate, high processing and manufacturing difficulty and complex design in the micro-lens array system in the prior art.
The invention is realized by the following technical scheme:
a multi-group array uniform lattice micro-lens array system comprises a first imprinting lens, base glass, a second imprinting lens, a quartz substrate, a first diaphragm and a second diaphragm; the substrate glass is provided with a first imprinting lens close to the side face of the light source, and is provided with a second imprinting lens close to the image side face; the first diaphragm is arranged between the first imprinting lens and the base glass, and the second diaphragm is arranged between the second imprinting lens and the base glass; the quartz substrate is arranged in the direction of the image side surface of the second imprinting lens, array light source holes are formed in the first imprinting lens, the second imprinting lens, the first diaphragm and the second diaphragm, and the array light source sub-channels are formed in one-to-one correspondence with the array light source holes of the first imprinting lens, the second imprinting lens, the first diaphragm and the second diaphragm.
Preferably, the diameter of the array light source holes of the first and second imprint lenses ranges from 0.135 to 0.145mm, and the diameter of the thickness ranges from 0.030 to 0.1mm.
Preferably, the diameter range of the array light source holes of the first diaphragm and the second diaphragm is 0.110-0.120 mm, the thickness range is 1-2 mu m, and the center distance between the first diaphragm and the second diaphragm is 0.13-0.16 mm.
Preferably, the surface type of the light source side surface of the first imprint lens is a plano-concave spherical surface, and the surface type of the image side surface of the second imprint lens is a plano-convex aspherical surface.
Preferably, the first embossing lens and the second embossing lens are respectively arranged on two sides of the substrate glass through UV glue, wherein the refractive index is 1.51, and the difference between the refractive index of the substrate glass and the refractive index of the UV glue is less than 0.01.
A uniform point imaging method of a multi-group array uniform lattice micro-lens array system is based on the multi-group array uniform lattice micro-lens array system, and comprises the following steps:
the Gaussian collimation surface light source is perpendicular to the incidence of the micro-lens array, diverges after passing through the first imprinting lens, the first diaphragm filters out large-angle crosstalk light rays, the unfiltered effective light rays pass through the base glass and then pass through the second diaphragm, the crosstalk light rays of the second imprinting lens are further filtered out, the focusing is carried out through the second imprinting lens, and the focused light rays form uniform point imaging through the quartz substrate.
Preferably, the alignment accuracy of the array light source sub-channels of the first imprint lens and the second imprint lens is less than 5 μm.
Preferably, the first imprinting lens and the second imprinting lens adopt a nano imprinting technology or a nano imprinting superposition dry etching technology, and the environmental temperature range is 20-120 ℃.
Preferably, the sagittal height/caliber of the first and second imprint lenses is less than 3.
Preferably, the first diaphragm and the second diaphragm both adopt nano lithography technology, the position precision of the array light source sub-channels of the first diaphragm and the second diaphragm is less than 0.7 mu m, and the alignment precision is less than 1 mu m.
Compared with the prior art, the invention has the following beneficial technical effects:
the invention provides a multi-group array uniform lattice micro-lens array system, which takes glass as a substrate, wherein a first embossing lens with a plane shape of a plano-concave spherical surface is arranged on the side surface of the substrate glass, a second embossing lens with a plane shape of a plano-convex aspheric surface is arranged on the side surface of the substrate glass, the first embossing lens and the second embossing lens are arranged in a multi-array structure, a first diaphragm is arranged between the first embossing lens and the substrate glass, a second diaphragm is arranged between the second embossing lens and the substrate glass, and the first diaphragm and the second diaphragm are also arranged in a multi-array structure. In addition, the micro-lens array adopts a method of optimizing a single channel firstly and arranging the single channel into an array mode in the design stage, so that the uniformity of output light spots is good, the uniformity is high, stray light can be eliminated by adding a diaphragm, and the defects of serious stray light phenomenon and poor light spot uniformity in the traditional design scheme are overcome.
Furthermore, the first imprinting lens and the second imprinting lens on two sides of the substrate glass can be manufactured by using a WLO process, the cost is low, the alignment precision is high, hundreds of optical combination lenses can be manufactured on one wafer by one-time imprinting, and a foundation is laid for batch production.
The micro lens array is formed by combining single lenses, light rays are split by the single lenses after passing through the micro lens array, and then the nano lithography diaphragm is combined, so that crosstalk signals can be effectively filtered out.
The invention provides a uniform point imaging method of a multi-group array uniform lattice micro-lens array system, wherein a beam of collimated light beam with Gaussian characteristic is perpendicular to a micro-lens array and enters, after passing through a first imprinting lens, the light beam diverges, an emergent light beam is emitted from a light source with smaller area, the first imprinting lens needs to strictly control spherical aberration, the smaller the spherical aberration is, the smaller the virtual light source diameter is, the refocusing is carried out through a second imprinting lens, and the target with the output light spot diameter smaller than 10 mu m is realized through a quartz substrate.
Drawings
FIG. 1 is a schematic diagram of a system light path of a multi-group array uniform lattice microlens array system according to the present invention;
FIG. 2 is a schematic diagram of the principle of the neutron path of the present invention 1;
FIG. 3 is a schematic view of the principle of the neutron path of the present invention 2;
FIG. 4 is a schematic view of an optical path of a neutron channel of the present invention without a first aperture;
FIG. 5 is a schematic view of an optical path of a neutron channel of the present invention with the addition of a first aperture;
FIG. 6 is a schematic diagram of an aperture calculation light path of a first diaphragm in the present invention;
FIG. 7 is a schematic view of an optical path of a neutron channel of the present invention with the addition of a second diaphragm;
fig. 8 is a layout of the first aperture and 13 x 13 arrays of the first aperture according to the present invention;
FIG. 9 is a layout of an array 13 x 13 of a first imprint lens and a second imprint lens according to the present invention;
FIG. 10 is an array diagram of a lighttools software simulation system in accordance with the present invention;
FIG. 11 is a graph of the effect of the lighttools software simulation array light spots in the present invention;
fig. 12 is a graph of the effect of the lighttools software in the present invention on simulating a single channel spot.
In the figure: 1-a first imprint lens; 2-base glass; 3-a second imprint lens; a 4-quartz substrate; 5-a first diaphragm; 6-a second diaphragm.
Detailed Description
In order that those skilled in the art will better understand the present invention, a technical solution in the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings in which it is apparent that the described embodiments are only some embodiments of the present invention, not all embodiments. All other embodiments, which can be made by those skilled in the art based on the embodiments of the present invention without making any inventive effort, shall fall within the scope of the present invention.
The invention is described in further detail below with reference to the attached drawing figures:
the invention aims to provide a multi-group array uniform lattice micro-lens array system and a uniform point imaging method, which are used for solving the technical problems of parasitic light crosstalk, poor light spot consistency, low light energy utilization rate, high processing and manufacturing difficulty and complex design in the micro-lens array system in the prior art.
Referring to fig. 1, in one embodiment of the present invention, there is provided a multi-group array uniform lattice microlens array system including a first imprint lens1, a base glass 2, a second imprint lens 3, a quartz base 4, a first diaphragm 5, and a second diaphragm 6; the substrate glass 2 is provided with a first imprinting lens1 close to the side face of the light source, and the substrate glass 2 is provided with a second imprinting lens 3 close to the image side face; the first diaphragm 5 is arranged between the first imprint lens1 and the base glass 2, and the second diaphragm 6 is arranged between the second imprint lens 3 and the base glass 2; the quartz substrate 4 is positioned in the image side direction of the second imprinting lens 3, the first imprinting lens1, the second imprinting lens 3, the first diaphragm 5 and the second diaphragm 6 are respectively provided with an array light source hole, and the array light source sub-channels are formed by one-to-one correspondence of the array light source holes of the first imprinting lens1, the second imprinting lens 3, the first diaphragm 5 and the second diaphragm 6, wherein the system takes the first diaphragm 5 as an alignment reference.
The array light source holes of the first imprint lens1, the second imprint lens 3, the first diaphragm 5 and the second diaphragm 6 are all arranged according to a hexagonal array of 13×13, as shown in fig. 8 and 9.
In the invention, the base glass has a rectangular structure, wherein the thickness is 0.36mm, and the side length is 2.5mm by 2.5mm; the diameter of the array light source holes of the first imprinting lens1 and the second imprinting lens 3 is 0.14mm, and the thickness is 0.08mm; wherein, the first imprinting lens1 can adopt a spherical surface/an aspherical surface, and the invention is preferably a plano-concave spherical surface, thereby reducing the cost and the processing difficulty; the second embossing lens 3 is in a plane-convex aspheric surface, and focuses light;
specifically, the diameter of the array light source holes of the first diaphragm 5 and the second diaphragm 6 is 0.115mm, the thickness is 1 μm, and the pitch interval is 0.15mm.
The first diaphragm 5 and the second diaphragm 6 have a rectangular shape with a side length of 2.5mm by 2.5 mm.
Specifically, the surface shape of the light source side surface of the first imprint lens1 is a plano-concave spherical surface, and the surface shape of the image side surface of the second imprint lens 3 is a plano-convex aspherical surface.
Specifically, the first embossing lens1 and the second embossing lens 3 are respectively arranged on two sides of the substrate glass 2 through UV glue, wherein the refractive index is 1.51, and the refractive index difference between the refractive index of the substrate glass and the refractive index of the UV glue is less than 0.01.
The invention also provides a uniform point imaging method of the multi-group array uniform lattice micro-lens array system, which is based on the multi-group array uniform lattice micro-lens array system and comprises the following steps:
the Gaussian collimation surface light source is perpendicular to the incidence of the micro-lens array, diverges after passing through the first imprinting lens1, filters out large-angle crosstalk light rays by the first diaphragm 5, and further filters out the crosstalk light rays of the second imprinting lens after passing through the substrate glass 2 and then passes through the second diaphragm 6, focuses through the second imprinting lens 3, and the focused light rays form uniform point imaging through the quartz substrate 4.
Specifically, the alignment accuracy of the array light source sub-channels of the first imprint lens1 and the second imprint lens 3 is less than 5 μm.
Specifically, the first imprinting lens1 and the second imprinting lens 3 are combined with the external environment temperature requirement, and the nanoimprint technology or the nanoimprint superposition dry etching technology is adopted, so that the product can be ensured to adapt to different temperature scenes, and the environment temperature range is 20-120 ℃; the sagittal height/caliber of the first imprint lens1 and the second imprint lens 3 is less than 3.
Specifically, the first diaphragm 5 and the second diaphragm 6 both adopt nano lithography technology, the position precision of the array light source sub-channels of the first diaphragm 5 and the second diaphragm 6 is less than 0.7 μm, and the alignment precision is less than 1 μm.
The diameter of the output light spot is the diameter corresponding to the central light intensity which is reduced to 13.5%.
Examples
According to fig. 1, the present embodiment provides a schematic system optical path diagram of a microlens array including a first imprint lens1, a base glass 2, a second imprint lens 3, a quartz substrate 4, a first diaphragm 5, and a second diaphragm 6; the substrate glass 2 is provided with a first embossing lens1 close to the side surface of the light source, and the surface of the first embossing lens1 is a plane concave spherical surface; the substrate glass 2 is provided with a second imprinting lens 3 near the image side surface, the surface of the second imprinting lens 3 is a plano-convex aspheric surface, a first diaphragm 5 is positioned between the first imprinting lens1 and the substrate glass 2, a second diaphragm 6 is positioned between the second imprinting lens 3 and the substrate glass 2, the distance between the quartz substrate 4 and the second imprinting lens 3 is 0.5mm, and the thickness of the quartz substrate 4 is 0.5mm.
The system light path is described as that a Gaussian collimated light beam with a divergence angle of 2 DEG and an incident wavelength of 532nm is perpendicular to the micro lens array, the light beam diverges after passing through the first imprinting lens1 and the first diaphragm 5, the emergent light beam is emitted from a light source with smaller area, the spherical aberration needs to be strictly controlled by the first imprinting lens1, the smaller the spherical aberration is, the smaller the virtual light source diameter is, and the refocusing is carried out by the second imprinting lens 3, so that the target with the output light spot diameter of less than 10 mu m is realized.
According to fig. 2, which is a schematic diagram 1 of the optical path principle of the array light source sub-channel, the system is based on the optical expansion theory, after the parallel light passes through the first embossing LENS1, the light diverges, focuses reversely, the image distance L1, the emergent light beam appears to be emitted from the light source with smaller area, for the embossing LENS2, the distance from the virtual light source to the embossing LENS2 is the object distance L2, and the light is refocused through the second embossing LENS 3 and converged to the image surface. The diameter of the focused image point is less than 10 mu m, the diameter of the virtual image point of the first imprinting lens1 of the system is small, and the magnification of the second imprinting lens 3 meets a certain requirement.
According to the schematic view 2 of the sub-channel optical path principle shown in fig. 3, the quartz substrate 4 is an optical path designating element, is a piece of flat glass, has a lateral offset effect on the system focus, and does not affect the optical characteristics of a focusing light spot; further, the object distance L2 of the first imprint lens1 from the second imprint lens 3 is the product of the optical length in air and the refractive index of the base glass.
In a typical non-imaging design, the etendue theory is followed. In an ideal optical system, the etendue is the product of the area of the beam and the solid angle of the beam, and when the beam passes through the optical system, the etendue never becomes small, may remain unchanged, and may become large due to light energy loss. The formula of etendue is as follows:
Etendue＝π·A·NA 2
wherein: a is the cross-sectional area of the flux, pi·n2 is the solid angle of radiation, na=sinθ.
In this embodiment, the following is calculated:
etendue=pi×0.01×sin for output spot 2 (4°)＝0.0002
Area of input light source=0.0002/(pi×sin (2 °)) =0.0018 mm
Through calculation, the area of the input light source is smaller than 1.8 mu m, the diameter of the output light spot is smaller than 10 mu m, however, the actual light emitting area is larger than 140 mu m, so that the first imprinting lens1 adopted by the design is a flat concave surface, the parallel light is scattered after passing through the first imprinting lens1, the emergent light beam is emitted from the light source with smaller area, the spherical aberration needs to be strictly controlled on the S1 surface, and the smaller the spherical aberration is, the smaller the diameter of the virtual light source is.
When the area of the sub-channel light source is 140 μm, the light is received completely, the aperture of the embossed LENS1 sub-channel is 140 μm, the aperture of the embossed LENS2 sub-channel is 230 μm, and due to the limitation of the aperture of the sub-channel of the system of 140 μm, the interval of the sub-channels is 150 μm, and the light at the edge of the first embossed LENS1 can generate stray light due to the crosstalk between adjacent channels, as shown in fig. 4.
According to fig. 4, a schematic optical path diagram of a sub-channel is shown without adding a first diaphragm 5, after parallel light enters the first imprint lens1, the light beam is diverged, and then enters the surface of the second imprint lens 3 through the base glass 2, and the edge light source of the sub-channel 1 is crossly connected to the surface of the second imprint lens 3 of the sub-channel 2.
According to fig. 5, a schematic optical path diagram of a first diaphragm 5 is added to a sub-channel, and after the first diaphragm 5 is added, most of sub-channel crosstalk stray light at the edge of the first imprint lens1 is eliminated, and a light beam divergence angle after the first imprint lens1 is too large, and after passing through a base glass, tiny stray light can be generated. In order to avoid crosstalk of the edge light source of the sub-channel 1 to the surface of the second imprinting lens 3 of the sub-channel 2, the aperture boundary light of the first diaphragm 5 limits the light passing diameter of the first diaphragm 5.
According to fig. 6, a schematic diagram of the first aperture calculating optical path of the first diaphragm 5 is shown, and the specific calculation is as follows:
refractive index formula: nsin (i) =n 'sin (i')
The exit angle i '=arcsin (sin (i)/n')=arcsin (sin (1 °)/1.51) =0.68
tan(0.68)＝0.012＝h/(0.36+0.08)
h＝0.00528mm
140μm/2-5.28μm＝64.72μm＞57.5μm
After calculation, the theoretical clear aperture of the first diaphragm 5 is 129.44 μm, which is larger than the diaphragm clear aperture simulated by software, which is 115 μm, if the diaphragm clear aperture 129.44 μm is used, a lot of stray light will be generated in the software, so that the diaphragm clear aperture is 115 μm finally.
As shown in fig. 7, stray light is eliminated after the addition of the second diaphragm 6. The second diaphragm 6 is 138 μm in size, and further eliminating the first diaphragm 5 does not eliminate stray light.
According to FIG. 8, an array layout diagram of the first diaphragm 5 and the second diaphragm 6 of the array in this embodiment is shown, the aperture of the diaphragm 1 is 115 μm, the pitch distance is 150 μm, the first diaphragm 5 and the second diaphragm 6 of each sub-channel are aligned uniformly, and the alignment requirement is less than 5 μm;
referring to FIG. 9, an array layout diagram of the first imprint lens1 and the second imprint lens 3 of the present embodiment is shown, wherein the aperture of the first imprint lens1 and the second imprint lens 3 is 140 μm, the pitch is 150 μm;
FIG. 10 is a schematic diagram of a lighting software simulation system according to the present embodiment;
according to fig. 11, a light simulation array spot effect diagram of the lighttools software is shown in the present embodiment;
referring to FIG. 12, a schematic view of the light effect of the sub-channel is shown in the embodiment; the diameter of the light spot is less than 10 mu m, and the light intensity is reduced to 13.5% of the corresponding diameter of the light spot.
Through the system, a 1.5W flat Gaussian beam is incident by a light source, the stray light of a sub-channel is less than 0.5%, the single-channel transmittance is more than 50%, the single-channel receiving energy is more than 1mw, the light intensity uniformity of the sub-channel receiving light is more than 98%, and the diameter of a light spot is less than 10 mu m, so that the technical requirements are met.
In summary, the present invention provides a multi-array uniform lattice microlens array system and a uniform point imaging method, wherein glass is used as a substrate, a first embossing lens with a plane shape of a plano-concave spherical surface is arranged on a side surface of the substrate glass, a second embossing lens with a plane shape of a plano-convex aspherical surface is arranged on a side surface of the substrate glass, the first embossing lens and the second embossing lens are arranged in a multi-array structure, a first diaphragm is arranged between the first embossing lens and the substrate glass, a second diaphragm is arranged between the second embossing lens and the substrate glass, and the first diaphragm and the second diaphragm are also arranged in a multi-array structure. In addition, the micro-lens array adopts a method of optimizing a single channel firstly and arranging the single channel into an array mode in the design stage, so that the uniformity of output light spots is good, the uniformity is high, stray light can be eliminated by adding a diaphragm, and the defects of serious stray light phenomenon and poor light spot uniformity in the traditional design scheme are overcome.
Finally, it should be noted that: the above embodiments are only for illustrating the technical aspects of the present invention and not for limiting the same, and although the present invention has been described in detail with reference to the above embodiments, it should be understood by those of ordinary skill in the art that: modifications and equivalents may be made to the specific embodiments of the invention without departing from the spirit and scope of the invention, which is intended to be covered by the claims.
Claims (10)
1. The array system of the multi-array uniform lattice micro-lens is characterized by comprising a first imprinting lens (1), base glass (2), a second imprinting lens (3), a quartz substrate (4), a first diaphragm (5) and a second diaphragm (6); the substrate glass (2) is provided with a first imprinting lens (1) close to the side face of the light source, and the substrate glass (2) is provided with a second imprinting lens (3) close to the image side face; the first diaphragm (5) is arranged between the first imprinting lens (1) and the base glass (2), and the second diaphragm (6) is arranged between the second imprinting lens (3) and the base glass (2); the quartz substrate (4) is arranged in the image side direction of the second imprinting lens (3), array light source holes are formed in the first imprinting lens (1), the second imprinting lens (3), the first diaphragm (5) and the second diaphragm (6), and the array light source sub-channels are formed in one-to-one correspondence with the array light source holes of the first imprinting lens (1), the second imprinting lens (3), the first diaphragm (5) and the second diaphragm (6).
2. The multi-group array uniform lattice microlens array system according to claim 1, wherein the diameter of the array light source holes of the first and second imprint lenses (1, 3) ranges from 0.135 to 0.145mm, and the diameter of the thickness ranges from 0.030 to 0.1mm.
3. The multi-group array uniform lattice microlens array system according to claim 1, wherein the diameter of the array light source hole of the first diaphragm (5) and the second diaphragm (6) is in the range of 0.110-0.120 mm, the thickness is in the range of 1-2 μm, and the center-to-center distance of the first diaphragm (5) and the second diaphragm (6) is in the range of 0.13-0.16 mm.
4. A multi-group array uniform lattice microlens array system according to claim 1, wherein the surface type of the light source side of the first imprint lens (1) is a plano-concave spherical surface, and the surface type of the image side of the second imprint lens (3) is a plano-convex aspherical surface.
5. The multi-group array uniform lattice microlens array system according to claim 1, wherein the first embossing lens (1) and the second embossing lens (3) are respectively arranged at two sides of the base glass (2) through UV glue, wherein the refractive index is 1.51, and the difference between the refractive index of the base glass and the refractive index of the UV glue is less than 0.01.
6. A method for forming uniform dots of a multi-group array uniform dot matrix microlens array system, based on the multi-group array uniform dot matrix microlens array system according to any one of claims 1 to 5, comprising the steps of:
the Gaussian collimation surface light source is perpendicular to the incidence of the micro lens array, diverges after passing through the first imprinting lens (1), filters out large-angle crosstalk light rays by the first diaphragm (5), passes through the second diaphragm (6) after effective unfiltered light rays pass through the base glass (2), further filters out crosstalk light rays of the second imprinting lens, focuses through the second imprinting lens (3), and forms uniform point imaging by focusing light rays through the quartz base (4).
7. The method for uniform spot imaging of a multi-group array uniform lattice microlens array system according to claim 6, wherein the alignment accuracy of the array light source sub-channels of the first and second imprint lenses (1, 3) is less than 5 μm.
8. The method for uniform dot imaging of a multi-group array uniform dot matrix microlens array system according to claim 6, wherein the first imprint lens (1) and the second imprint lens (3) adopt a nanoimprint technique or a nanoimprint superposition dry etching technique, and the ambient temperature ranges from 20 ℃ to 120 ℃.
9. A method of uniform spot imaging of a multi-group array uniform lattice microlens array system according to claim 6, characterized in that the sagittal height/caliber of the first (1) and second (3) imprint lenses is less than 3.
10. The method for uniform dot imaging of a multi-group array uniform dot matrix microlens array system according to claim 6, wherein the first diaphragm (5) and the second diaphragm (6) both adopt nanolithography, the position accuracy of the array light source sub-channels of the first diaphragm (5) and the second diaphragm (6) is less than 0.7 μm, and the alignment accuracy is less than 1 μm.
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