CN117317059B - Solar cell groove type alkali polishing machine table and production line - Google Patents
Solar cell groove type alkali polishing machine table and production line Download PDFInfo
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- CN117317059B CN117317059B CN202311283640.3A CN202311283640A CN117317059B CN 117317059 B CN117317059 B CN 117317059B CN 202311283640 A CN202311283640 A CN 202311283640A CN 117317059 B CN117317059 B CN 117317059B
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- 239000003513 alkali Substances 0.000 title claims abstract description 26
- 238000005498 polishing Methods 0.000 title claims abstract description 25
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 11
- 238000002791 soaking Methods 0.000 claims abstract description 15
- 230000005540 biological transmission Effects 0.000 claims abstract description 7
- 230000002093 peripheral effect Effects 0.000 claims description 12
- 238000004140 cleaning Methods 0.000 claims description 11
- 238000005554 pickling Methods 0.000 claims description 8
- 230000006835 compression Effects 0.000 claims description 6
- 238000007906 compression Methods 0.000 claims description 6
- 238000005406 washing Methods 0.000 claims description 6
- 238000001035 drying Methods 0.000 claims description 5
- 230000000694 effects Effects 0.000 abstract description 19
- 238000000034 method Methods 0.000 abstract description 10
- 230000008569 process Effects 0.000 abstract description 6
- 230000008859 change Effects 0.000 abstract description 3
- 239000000243 solution Substances 0.000 description 17
- 230000009471 action Effects 0.000 description 9
- 238000010586 diagram Methods 0.000 description 6
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 4
- 230000003628 erosive effect Effects 0.000 description 4
- 229910052710 silicon Inorganic materials 0.000 description 4
- 239000010703 silicon Substances 0.000 description 4
- 239000012670 alkaline solution Substances 0.000 description 3
- 238000005530 etching Methods 0.000 description 3
- 239000003929 acidic solution Substances 0.000 description 2
- 244000309464 bull Species 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 239000005360 phosphosilicate glass Substances 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000001125 extrusion Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 229910052711 selenium Inorganic materials 0.000 description 1
- 239000011669 selenium Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
- H01L31/1804—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof comprising only elements of Group IV of the Periodic Table
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67063—Apparatus for fluid treatment for etching
- H01L21/67075—Apparatus for fluid treatment for etching for wet etching
- H01L21/67086—Apparatus for fluid treatment for etching for wet etching with the semiconductor substrates being dipped in baths or vessels
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68721—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by edge clamping, e.g. clamping ring
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68742—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a lifting arrangement, e.g. lift pins
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68764—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a movable susceptor, stage or support, others than those only rotating on their own vertical axis, e.g. susceptors on a rotating caroussel
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
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- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Electromagnetism (AREA)
- Photovoltaic Devices (AREA)
Abstract
The invention discloses a solar cell groove type alkali polishing machine table and a production line, which relate to the technical field of solar cell manufacturing and comprise a frame, a soaking groove assembly fixedly arranged on the frame, and further comprise: a lifting frame driven by the first driving assembly to move transversely and vertically; and the clamping assembly is arranged on the lifting frame. According to the solar cell groove type alkali polishing machine table and the production line, the transmission assembly is utilized, so that the positions of the two limiting plates on each movable plate can be driven to change in the vertical sliding process of the lifting frame, and therefore the blocked part can be exposed while limiting the clamped solar cell is not affected, the effect of soaking and corroding the blocked part is achieved, and the practicability of the groove type alkali polishing machine table is improved to a certain extent.
Description
Technical Field
The invention relates to the technical field of solar cell manufacturing, in particular to a solar cell groove type alkali polishing machine table and a production line.
Background
A solar cell refers to a semiconductor device that can efficiently absorb solar energy and convert it into electric energy. And a device for converting solar light energy into electric energy by using semiconductor silicon, selenium and other materials. The power supply has the advantages of high reliability, long service life, high conversion efficiency and the like, and can be used as a power supply of an artificial satellite, a navigation light, a transistor radio and the like. In order to remove the phosphosilicate glass on the back surface and the front surface of the diffused silicon wafer, the diffused solar cell needs to be etched, and most of the existing etching methods adopt an alkali etching method (the silicon wafer is immersed in an alkaline solution with additives for back polishing, and the silicon wafer is immersed in an acid solution for taking out PSG on the front surface of the counter surface).
The existing groove type alkali polishing machine table is characterized in that solar cells are required to be soaked in etching solution, if a rack for placing the solar cells is rocked, the solar cells to be corroded are easy to fall off from the rack, so that the situation that the solar cells fall off is avoided as much as possible, the soaked solar cells are limited by a limiting plate generally, when the solar cells are limited by the existing limiting plate, the situation that the contact part of the limiting plate and the solar cells cannot be fully soaked is easy to occur due to the contact of the limiting plate and the solar cells, and therefore the alkali polishing effect of the solar cells is reduced, and the practicability of the groove type alkali polishing machine is also reduced to a certain extent.
Disclosure of Invention
The invention aims to provide a solar cell groove type alkali polishing machine table and a production line, which are used for solving the defects in the prior art.
In order to achieve the above object, the present invention provides the following technical solutions: the utility model provides a solar wafer groove type alkali burnishing machine platform, includes frame and fixed mounting soak groove subassembly on the frame, still includes: a lifting frame driven by the first driving assembly to move transversely and vertically; the clamping assembly is arranged on the lifting frame and comprises two clamping plates, and the two clamping plates are driven by the second driving assembly to enable the two clamping plates to slide and clamp the solar cell at the same time; the clamping assembly further comprises two movable plates which are driven by the sliding of the two clamping plates so that the two movable plates limit the clamped solar cell, and two limiting plates are arranged on the sides, close to each other, of the two movable plates in a sliding manner; and the transmission assembly is driven by the sliding of the lifting frame so as to enable the two limiting plates to slide.
Further, the soaking tank assembly comprises an alkaline tank, a first cleaning tank, a pickling tank, a second cleaning tank and a drying tank; the first driving assembly comprises a driving seat which is transversely arranged on the frame in a sliding mode, an air cylinder is fixedly arranged on the bottom surface of the driving seat, and the lifting frame is fixedly arranged at the output end of the air cylinder.
Further, the lifting frame comprises a first plate fixedly installed on the output end of the air cylinder, a second plate is slidably arranged on the bottom surface of the first plate, and a plurality of first elastic pieces are arranged between the first plate and the second plate; the inside of alkaline groove, first washing tank, pickling tank, second washing tank and stoving groove all is provided with and is used for restricting the second plate and carries out vertical gliding interception board.
Further, the second driving assembly comprises a fixing frame fixedly arranged on the second plate, a driving motor is fixedly arranged on the fixing frame, and a first gear is fixedly arranged at the output end of the driving motor; a screw rod is rotatably arranged on the second plate, a second gear meshed with the first gear is fixedly arranged on the peripheral surface of the screw rod, and a driving block is connected with the screw rod along axial threads; the second plate is also provided with two abutting blocks in a sliding manner, the two abutting blocks are in sliding fit with the driving block, and a second elastic piece is arranged between the two abutting blocks and the second plate; the two clamping plates are respectively arranged on the two abutting blocks.
Further, two circular plates are fixedly arranged on the peripheral surface of the screw rod, and the driving block is movably arranged between the two circular plates.
Further, a through hole is formed in the second plate, two sliding bottom plates are slidably arranged in the through hole, the two abutting blocks are respectively and fixedly connected to the top surfaces of the two sliding bottom plates, and the two clamping plates are respectively and fixedly connected to the bottom surfaces of the two sliding bottom plates; the second plate is further provided with two straight grooves, two ends of each straight groove are respectively communicated with an inclined groove, two sliding blocks are arranged in the straight grooves and the two inclined grooves in a sliding mode, the two sliding blocks are arranged on the movable plate in a sliding mode, and the two sliding blocks are arranged on the sliding bottom plate in a sliding mode respectively.
Further, the second elastic piece is a pressure spring, one end of the pressure spring is fixedly connected to the inner wall of the through hole, and the other end of the pressure spring is fixedly connected to the sliding bottom plate.
Further, a rotating rod is rotatably arranged on one side, away from each other, of each movable plate, and a fourth gear is fixedly connected to the peripheral surface of the rotating rod; two second racks meshed with the fourth gear are slidably arranged on one sides, away from each other, of the movable plates, the second racks are respectively located on two sides of the fourth gear, and the limiting plates are respectively and fixedly connected to the second racks.
Further, the transmission assembly comprises a first rack fixedly mounted on the first plate, and the first rack is slidably inserted on the second plate; and a third gear meshed with the first rack is coaxially connected to the peripheral surface of the rotating rod.
The invention also provides a solar cell production line which is realized based on the trough type alkali polishing machine table.
In the technical scheme, the invention provides the solar cell groove type alkali polishing machine table, which has the following beneficial effects: through utilizing first drive assembly for can vertically subside to soaking tank subassembly through the solar wafer that is held with the help of the clamping assembly in, thereby played the effect that can soak the erosion to solar wafer.
Through utilizing limiting plate on two fly leaves for use clamping assembly to carry out the centre gripping to solar cell piece, and make the solar cell piece of centre gripping soak in soaking tank subassembly, can carry out spacing effect to the solar cell piece of centre gripping, played the condition emergence that can effectively avoid the solar cell piece of soaking to drop from clamping assembly.
Through utilizing drive assembly for the crane can drive the position of two limiting plates on each fly leaf and change in vertical gliding in-process, thereby make when not influencing spacing the solar wafer of centre gripping, can also make the part that shelters from can expose, and then played the effect that can soak the erosion to the part that shelters from, thereby improved the practicality of slot type alkali polishing machine platform to a certain extent.
Drawings
In order to more clearly illustrate the embodiments of the present application or the technical solutions in the prior art, the drawings that are needed in the embodiments will be briefly described below, and it is obvious that the drawings in the following description are only some embodiments described in the present invention, and other drawings may be obtained according to these drawings for a person having ordinary skill in the art.
FIG. 1 is a schematic view of the overall structure provided by an embodiment of the present invention;
FIG. 2 is a schematic diagram of the structure shown in FIG. 1A according to an embodiment of the present invention;
FIG. 3 is a schematic view of a partially disassembled structure of FIG. 1 according to an embodiment of the present invention;
FIG. 4 is a schematic diagram of the structure shown in FIG. 3B according to an embodiment of the present invention;
FIG. 5 is a schematic diagram of the structure shown in FIG. 3C according to an embodiment of the present invention;
FIG. 6 is a schematic diagram of a partially disassembled structure of FIG. 3 according to an embodiment of the present invention;
FIG. 7 is a schematic diagram of the structure shown in FIG. 6D according to an embodiment of the present invention;
fig. 8 is a schematic structural diagram at E in fig. 6 according to an embodiment of the present invention.
Reference numerals illustrate:
1. a frame; 2. a soaking tank assembly; 21. an alkaline tank; 22. a first cleaning tank; 23. a pickling tank; 24. a second cleaning tank; 25. a drying tank; 3. a guide rod; 4. a driving seat; 5. a cylinder; 6. a lifting frame; 6011. a first plate member; 6012. a second plate member; 6013. a first elastic member; 6014. a limit rod; 6015. a baffle; 6016. a first rack; 701. a fixing frame; 702. a driving motor; 703. a first gear; 704. a screw rod; 705. a second gear; 706. a driving block; 707. a through hole; 708. a sliding bottom plate; 7081. a slide hole; 7082. a slide block; 7083. a straight groove; 7084. a diagonal slot; 709. a second elastic member; 710. an abutment block; 711. a limit groove; 712. a limiting block; 713. a clamping plate; 714. a movable plate; 7141. perforating; 715. a limiting plate; 716. a rotating rod; 717. a third gear; 718. a fourth gear; 719. and a second rack.
Detailed Description
In order to make the technical scheme of the present invention better understood by those skilled in the art, the present invention will be further described in detail with reference to the accompanying drawings.
Referring to fig. 1 to 8, a solar cell tank type alkaline polishing machine provided in an embodiment of the present invention includes a frame 1, a soaking tank assembly 2 fixedly installed on the frame 1, and further includes: a lifting frame 6 driven by the first driving assembly to move the lifting frame 6 transversely and vertically; the clamping assembly is arranged on the lifting frame 6 and comprises two clamping plates 713, and the two clamping plates 713 are driven by the second driving assembly to enable the two clamping plates 713 to slide and clamp the solar cell at the same time; the clamping assembly further comprises two movable plates 714 which are driven by the sliding of the two clamping plates 713, so that the two movable plates 714 limit the clamped solar cell, and two limiting plates 715 are arranged on one sides of the two movable plates 714, which are close to each other, in a sliding manner; and the transmission assembly receives the sliding drive of the lifting frame 6 so as to enable the two limiting plates 715 to slide.
In the technical scheme, the solar cell clamped by the clamping assembly can vertically sink into the soaking tank assembly 2 by utilizing the first driving assembly, so that the effect of soaking and eroding the solar cell is achieved; by utilizing the limiting plates 715 on the two movable plates 714, when the clamping assembly is used for clamping the solar cell, and the clamped solar cell is soaked in the soaking tank assembly 2, the effect of limiting the clamped solar cell is achieved, and the situation that the soaked solar cell falls off from the clamping assembly can be effectively avoided; through utilizing drive assembly for crane 6 can order about the position of two limiting plates 715 on each fly leaf 714 and change in vertical gliding in-process, thereby make when not influencing spacing the solar wafer of centre gripping, can also make the part that shelters from expose, and then played the effect that can soak the erosion to the part that shelters from, thereby improved the practicality of slot type alkali polishing machine platform to a certain extent.
Further, the two clamping plates 713 are fixedly provided with protection pads on the sides close to each other, and the protection pads are rubber pads.
In the above technical scheme, through utilizing the rubber pad for when utilizing two clamp plates 713 to carry out the centre gripping spacing to solar cell, can improve the effect of the buffer nature between two clamp plates 713 and the solar cell contact surface, thereby avoided as far as possible because the dynamics of holding of two clamp plates 713 is great, when carrying out the centre gripping spacing to solar cell, cause the centre gripping to make solar cell receive deformation and take place the condition emergence of damage.
Specifically, the soaking tank assembly 2 includes an alkaline tank 21, a first washing tank 22, a pickling tank 23, a second washing tank 24, and a drying tank 25; the first driving assembly comprises a driving seat 4 which is transversely arranged on the frame 1 in a sliding manner, an air cylinder 5 is fixedly arranged on the bottom surface of the driving seat 4, and a lifting frame 6 is fixedly arranged on the output end of the air cylinder 5.
In the above technical solution, by using the driving seat 4 and the air cylinder 5 on the frame 1, the solar cell clamped by the clamping assembly can be sequentially placed into the alkaline tank 21, the first cleaning tank 22, the pickling tank 23 and the second cleaning tank 24 for soaking, so that the alkaline solution and the acidic solution can erode the clamped solar cell, and the effect of alkali polishing the solar cell is achieved; after the held solar cell is immersed in the alkaline solution and the acidic solution, the dryer is used to dry the liquid remaining on the solar cell (the liquid remaining on the solar cell should be the solution in the second cleaning tank 24 according to the immersing process of the held solar cell).
Further, a guide rod 3 is fixedly installed on the frame 1, and the driving seat 4 is axially and slidably arranged on the guide rod 3.
In the above-described technical scheme, the guide rod 3 has the effect of restricting the sliding direction and the sliding distance of the driving seat 4.
Specifically, the lifting frame 6 includes a first plate 6011 fixedly installed on the output end of the cylinder 5, a second plate 6012 is slidably disposed on the bottom surface of the first plate 6011, and a plurality of first elastic members 6013 are disposed between the first plate 6011 and the second plate 6012; the inside of the alkaline tank 21, the first cleaning tank 22, the pickling tank 23, the second cleaning tank 24, and the drying tank 25 are all provided with an interception plate for restricting the second plate 6012 from vertically sliding.
In the above technical solution, by using the interception plate, in the process of making the first plate 6011 and the second plate 6012 on the lifting frame 6 vertically move downward under the action of the air cylinder 5, when the second plate 6012 is abutted to the interception plate, the effect of making the first plate 6011 slide relative to the second plate 6012 is achieved by continuous operation by the air cylinder 5.
Further, the plurality of first elastic members 6013 are springs, and two ends of each spring are fixedly connected to the first plate 6011 and the second plate 6012 respectively; the first plate 6011 is slidably inserted with a plurality of limiting rods 6014, bottom ends of the limiting rods 6014 are fixedly connected to the second plate 6012, and springs are respectively sleeved on the peripheral surfaces of the limiting rods 6014.
By utilizing the stopper rod 6014, an effect of being able to limit the spring is achieved, so that after the second plate 6012 abuts on the blocking plate, the first plate 6011 is able to slide along the axial directions of the plurality of stopper rods 6014, and therefore an effect of being able to limit the sliding direction of the first plate 6011 is achieved.
Further, the top end of each stop lever 6014 is fixedly connected with a baffle 6015, and the cross section of the baffle 6015 is circular.
In the above-mentioned technical solution, by using the baffle 6015, the sliding distance of the first baffle 6015 is limited, so that the first baffle 6015 is prevented from sliding down on the plurality of limit rods 6014 as much as possible.
Specifically, the second driving assembly includes a fixing frame 701 fixedly installed on the second plate 6012, a driving motor 702 is fixedly installed on the fixing frame 701, and a first gear 703 is fixedly installed at an output end of the driving motor 702; a screw rod 704 is rotatably mounted on the second plate 6012, a second gear 705 meshed with the first gear 703 is fixedly mounted on the peripheral surface of the screw rod 704, and a driving block 706 is axially and threadedly connected to the screw rod 704; the second plate 6012 is further provided with two abutting blocks 710 in a sliding manner, the two abutting blocks 710 are in sliding fit with the driving block 706, and a second elastic piece 709 is arranged between the two abutting blocks 710 and the second plate 6012; the two clamping plates 713 are respectively provided on the two abutment blocks 710.
In the above technical solution, by using the driving motor 702 on the fixing frame 701 and by driving between the first gear 703 and the second gear 705, when the first gear 703 rotates under the driving of the driving motor 702, the screw rod 704 on the second plate 6012 can rotate, so that the driving block 706 can move along the axial direction of the screw rod 704 under the action of the screw rod 704, and in the process that the driving block 706 moves downwards under the action of the screw rod 704, the two abutting blocks 710 can move in the direction away from each other under the extrusion of the driving block 706 by virtue of the abutting blocks 706 and the two sliding fit abutting blocks 710, and by virtue of the second elastic piece 709 between the two abutting blocks 710 and the second plate 6012, the two clamping plates 713 can clamp and limit the solar cell under the action of the abutting blocks 710.
Further, two sides of the driving block 706, which are close to the two abutting blocks 710, are respectively provided with a plurality of limiting grooves 711, limiting blocks 712 are respectively slidably arranged on the inner walls of the limiting grooves 711, and the limiting blocks 712 are respectively and fixedly connected to the corresponding abutting blocks 710.
In the above technical solution, by using the limiting groove 711 provided on the driving block 706 and the limiting block 712 provided on the abutting block 710, the effect of limiting the sliding of the driving is achieved, and the situation that the sliding of the two abutting blocks 710 is blocked due to the rotation of the driving block 706 under the action of the screw 704 is avoided as much as possible
Specifically, two circular plates are fixedly mounted on the peripheral surface of the screw 704, and a driving block 706 is movably disposed between the two circular plates.
In the above technical solution, by using two circular plates disposed on the screw 704, the effect of controlling the sliding distance of the driving block 706 is achieved, so that not only the situation that the driving block 706 falls off from the top end of the screw 704 when the driving block 706 moves to the topmost end of the screw 704 under the action of the screw 704 can be avoided, but also the situation that the driving block 706 moves to the bottommost way of the screw 704 under the action of the screw 704, the bottom end of the driving block 706 presses the second gear 705, thereby affecting the driving operation of the driving block 706 can be avoided.
Specifically, the second plate 6012 is provided with a through hole 707, two sliding bottom plates 708 are slidably disposed in the through hole 707, two abutting blocks 710 are respectively and fixedly connected to top surfaces of the two sliding bottom plates 708, and two clamping plates 713 are respectively and fixedly connected to bottom surfaces of the two sliding bottom plates 708; the second plate 6012 is further provided with two straight grooves 7083, two ends of each straight groove 7083 are respectively provided with an inclined groove 7084 in a communicating manner, two sliding blocks 7082 are slidably arranged in the straight grooves 7083 and the two inclined grooves 7084, the two sliding blocks 7082 are respectively slidably arranged on the movable plate 714, and the two sliding blocks 7082 are respectively slidably arranged on the two sliding bottom plates 708.
In the above technical solution, by using the straight groove 7083 and the diagonal groove 7084 formed on the second plate 6012, when the abutment blocks 710 on the two sliding bottom plates 708 slide under the action of the driving blocks 706, the sliding blocks 7082 on the two movable plates 714 can slide along the straight groove 7083 and the diagonal groove 7084, so that the limiting plates 715 on the two movable plates 714 can limit the clamped solar cells in the process of using the two clamping plates 713 to clamp and limit the solar cells.
Further, a sliding hole 7081 is formed in the sliding bottom plate 708, and a sliding block 7082 is slidably disposed in the sliding hole 7081.
In the above technical solution, by using the slide hole 7081 and the slide block 7082 formed on the slide bottom plate 708, the slide bottom plate 708 can slide along the straight groove 7083 and the inclined groove 7084 during the sliding process
Specifically, the second elastic member 709 is a compression spring, one end of which is fixedly connected to the inner wall of the through hole 707, and the other end of which is fixedly connected to the sliding bottom plate 708.
In the above technical solution, by using the compression spring, the clamping plates 713 provided on the bottom ends of the two sliding bottom plates 708 can move in directions close to each other under the action of the spring force of the compression spring, so that the two clamping plates 713 can clamp the solar cell.
Specifically, a rotating rod 716 is rotatably disposed on one side of the two movable plates 714 away from each other, and a fourth gear 718 is fixedly connected to the peripheral surface of the rotating rod 716; two second racks 719 meshed with the fourth gear 718 are slidably arranged on the side, away from each other, of the two movable plates 714, the two second racks 719 are respectively located on two sides of the fourth gear 718, and the two limiting plates 715 are respectively and fixedly connected to the two second racks 719.
In the above technical scheme, through utilizing bull stick 716 on fly leaf 714 for third gear 717 can rotate under the effect of bull stick 716, and through utilizing the mutually supporting between third gear 717 and two second racks 719, thereby make limiting plate 715 that set up on fly leaf 714 can slide, and then played through the slip with the help of limiting plate 715, thereby carry out spacing position to the solar wafer of limiting plate 715 to the centre gripping and adjust, thereby make the effect that the part that original limiting plate 715 sheltered from can expose.
Specifically, the transmission assembly includes a first rack 6016 fixedly mounted on the first plate 6011, and the first rack 6016 is slidably inserted into the second plate 6012; a third gear 717 engaged with the first rack 6016 is coaxially connected to the circumferential surface of the rotating lever 716.
In the above technical solution, after the second plate 6012 on the lifting frame 6 is abutted to the interception plate, the first plate 6011 can slide relative to the second plate 6012 by using the continuous operation of the cylinder 5, so that the first rack 6016 provided on the first plate 6011 can cooperate with the third gear 717 on the rotating rod 716, thereby playing a role of enabling the rotating rod 716 on the movable plate 714 to rotate.
Further, a plurality of through holes 7141 are formed in both the movable plates 714.
In the above technical solution, the use of the perforations 7141 has the effect of enabling the immersed solution to better contact the solar cell.
The invention also provides a solar cell production line which is realized based on any one of the groove type alkali polishing machine tables.
While certain exemplary embodiments of the present invention have been described above by way of illustration only, it will be apparent to those of ordinary skill in the art that modifications may be made to the described embodiments in various different ways without departing from the spirit and scope of the invention. Accordingly, the drawings and description are to be regarded as illustrative in nature and not as restrictive of the scope of the invention, which is defined by the appended claims.
Claims (9)
1. The utility model provides a solar wafer groove type alkali burnishing machine platform, includes frame (1) and fixed mounting is in soaking tank subassembly (2) on frame (1), its characterized in that still includes: a lifting frame (6) driven by the first driving assembly to enable the lifting frame (6) to move transversely and vertically; the clamping assembly is arranged on the lifting frame (6) and comprises two clamping plates (713), and the two clamping plates (713) are driven by the second driving assembly to enable the two clamping plates (713) to slide and clamp the solar cell; the clamping assembly further comprises two movable plates (714), the two movable plates (714) are driven by sliding of the two clamping plates (713) so that the two movable plates (714) limit the clamped solar cell, and two limiting plates (715) are arranged on one sides, close to each other, of the two movable plates (714) in a sliding mode; the transmission assembly is driven by the sliding of the lifting frame (6) so as to enable the two limiting plates (715) to slide; the soaking tank assembly (2) comprises an alkaline tank (21), a first cleaning tank (22), a pickling tank (23), a second cleaning tank (24) and a drying tank (25); the first driving assembly comprises a driving seat (4) which is transversely arranged on the frame (1) in a sliding mode, an air cylinder (5) is fixedly arranged on the bottom surface of the driving seat (4), and the lifting frame (6) is fixedly arranged at the output end of the air cylinder (5).
2. The solar cell trough type alkali polishing machine table according to claim 1, wherein the lifting frame (6) comprises a first plate (6011) fixedly installed on the output end of the air cylinder (5), a second plate (6012) is slidably arranged on the bottom surface of the first plate (6011), and a plurality of first elastic pieces (6013) are arranged between the first plate (6011) and the second plate (6012); the inside of alkaline groove (21), first washing tank (22), pickling tank (23), second washing tank (24) and stoving groove (25) all is provided with the interception board that is used for restricting second plate (6012) and carries out vertical slip.
3. The solar cell trough type alkali polishing machine table according to claim 2, wherein the second driving assembly comprises a fixing frame (701) fixedly installed on the second plate (6012), a driving motor (702) is fixedly installed on the fixing frame (701), and a first gear (703) is fixedly installed at the output end of the driving motor (702); a screw rod (704) is rotatably mounted on the second plate (6012), a second gear (705) meshed with the first gear (703) is fixedly mounted on the peripheral surface of the screw rod (704), and a driving block (706) is connected to the screw rod (704) along the axial thread; two abutting blocks (710) are further arranged on the second plate (6012) in a sliding mode, the two abutting blocks (710) are in sliding fit with the driving block (706), and a second elastic piece (709) is arranged between the two abutting blocks (710) and the second plate (6012); the two clamping plates (713) are respectively arranged on the two abutting blocks (710).
4. A solar cell trough type alkali polishing machine table according to claim 3, wherein two circular plates are fixedly mounted on the peripheral surface of the screw rod (704), and the driving block (706) is movably arranged between the two circular plates.
5. A solar cell trough type alkali polishing machine table according to claim 3, wherein a through hole (707) is formed in the second plate (6012), two sliding bottom plates (708) are slidably disposed in the through hole (707), two abutting blocks (710) are respectively and fixedly connected to top surfaces of the two sliding bottom plates (708), and two clamping plates (713) are respectively and fixedly connected to bottom surfaces of the two sliding bottom plates (708); two straight grooves (7083) are further formed in the second plate (6012), two ends of each straight groove (7083) are communicated with each other and are provided with inclined grooves (7084), two sliding blocks (7082) are arranged in the straight grooves (7083) and the two inclined grooves (7084) in a sliding mode, the two sliding blocks (7082) are arranged on the movable plate (714) in a sliding mode, and the two sliding blocks (7082) are arranged on the two sliding bottom plates (708) in a sliding mode respectively.
6. The solar cell groove type alkali polishing machine table according to claim 5, wherein the second elastic piece (709) is a compression spring, one end of the compression spring is fixedly connected to the inner wall of the through hole (707), and the other end of the compression spring is fixedly connected to the sliding bottom plate (708).
7. The solar cell trough type alkali polishing machine table according to claim 2, wherein a rotating rod (716) is rotatably arranged on one side, away from each other, of each movable plate (714), and a fourth gear (718) is fixedly connected to the peripheral surface of the rotating rod (716); two second racks (719) meshed with the fourth gear (718) are slidably arranged on one sides, away from each other, of the two movable plates (714), the two second racks (719) are respectively located on two sides of the fourth gear (718), and the two limiting plates (715) are respectively and fixedly connected to the two second racks (719).
8. The solar cell trough alkali polisher stand according to claim 7, characterized in that the transmission assembly comprises a first rack (6016) fixedly mounted on the first plate (6011), the first rack (6016) being slidingly inserted on the second plate (6012); a third gear (717) meshed with the first rack (6016) is coaxially connected to the peripheral surface of the rotating rod (716).
9. A solar wafer production line, characterized in that it is realized on the basis of a trough-type alkaline polishing machine station according to any one of claims 1-8.
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| Application Number | Priority Date | Filing Date | Title |
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| CN202311283640.3A CN117317059B (en) | 2023-10-07 | 2023-10-07 | Solar cell groove type alkali polishing machine table and production line |
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| Application Number | Priority Date | Filing Date | Title |
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| CN202311283640.3A CN117317059B (en) | 2023-10-07 | 2023-10-07 | Solar cell groove type alkali polishing machine table and production line |
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| CN117317059A CN117317059A (en) | 2023-12-29 |
| CN117317059B true CN117317059B (en) | 2024-04-05 |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN110665894A (en) * | 2019-11-11 | 2020-01-10 | 青田林心半导体科技有限公司 | Semiconductor production belt cleaning device |
| CN214797348U (en) * | 2021-06-10 | 2021-11-19 | 浙江艾能聚光伏科技股份有限公司 | Solar cell etching machine |
| CN114267752A (en) * | 2021-12-22 | 2022-04-01 | 安徽舟港新能源科技有限公司 | Intelligent processing equipment for producing dephosphorized silicon glass by solar cell |
| CN114695208A (en) * | 2022-04-12 | 2022-07-01 | 安徽舟港新能源科技有限公司 | Photovoltaic silicon chip phosphorus washing device |
| WO2023045390A1 (en) * | 2021-09-27 | 2023-03-30 | 泰州隆基乐叶光伏科技有限公司 | Test apparatus for solar cell sheet |
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2023
- 2023-10-07 CN CN202311283640.3A patent/CN117317059B/en active Active
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110665894A (en) * | 2019-11-11 | 2020-01-10 | 青田林心半导体科技有限公司 | Semiconductor production belt cleaning device |
| CN214797348U (en) * | 2021-06-10 | 2021-11-19 | 浙江艾能聚光伏科技股份有限公司 | Solar cell etching machine |
| WO2023045390A1 (en) * | 2021-09-27 | 2023-03-30 | 泰州隆基乐叶光伏科技有限公司 | Test apparatus for solar cell sheet |
| CN114267752A (en) * | 2021-12-22 | 2022-04-01 | 安徽舟港新能源科技有限公司 | Intelligent processing equipment for producing dephosphorized silicon glass by solar cell |
| CN114695208A (en) * | 2022-04-12 | 2022-07-01 | 安徽舟港新能源科技有限公司 | Photovoltaic silicon chip phosphorus washing device |
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| CN117317059A (en) | 2023-12-29 |
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