CN114695208A - Photovoltaic silicon chip phosphorus washing device - Google Patents
Photovoltaic silicon chip phosphorus washing device Download PDFInfo
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- CN114695208A CN114695208A CN202210378252.2A CN202210378252A CN114695208A CN 114695208 A CN114695208 A CN 114695208A CN 202210378252 A CN202210378252 A CN 202210378252A CN 114695208 A CN114695208 A CN 114695208A
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- frame
- silicon wafer
- linkage
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- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 title claims abstract description 73
- 229910052710 silicon Inorganic materials 0.000 title claims abstract description 73
- 239000010703 silicon Substances 0.000 title claims abstract description 73
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 title claims abstract description 43
- 229910052698 phosphorus Inorganic materials 0.000 title claims abstract description 43
- 239000011574 phosphorus Substances 0.000 title claims abstract description 43
- 238000005406 washing Methods 0.000 title claims abstract description 31
- 238000004140 cleaning Methods 0.000 claims abstract description 53
- 230000007246 mechanism Effects 0.000 claims abstract description 44
- 235000012431 wafers Nutrition 0.000 claims description 52
- 230000000149 penetrating effect Effects 0.000 claims description 9
- 230000002146 bilateral effect Effects 0.000 claims description 5
- 238000000034 method Methods 0.000 abstract description 13
- 239000007788 liquid Substances 0.000 abstract description 11
- 230000008569 process Effects 0.000 abstract description 8
- 238000004519 manufacturing process Methods 0.000 abstract description 4
- 238000002791 soaking Methods 0.000 abstract description 3
- 210000001503 joint Anatomy 0.000 description 4
- 239000002253 acid Substances 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000001360 synchronised effect Effects 0.000 description 1
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Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
- H01L21/67057—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing with the semiconductor substrates being dipped in baths or vessels
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/08—Cleaning involving contact with liquid the liquid having chemical or dissolving effect
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
- H01L21/67742—Mechanical parts of transfer devices
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68707—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a robot blade, or gripped by a gripper for conveyance
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
- H01L31/1804—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof comprising only elements of Group IV of the Periodic Table
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- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Robotics (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Electromagnetism (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Abstract
The invention relates to the technical field of photovoltaic silicon wafer production, in particular to a photovoltaic silicon wafer phosphorus washing device which comprises a washing frame, a control adjusting mechanism, a placing and clamping mechanism and a linkage control mechanism. The invention can solve the following problems in the phosphorus washing treatment process of the existing photovoltaic silicon wafer; firstly, manually inserting a photovoltaic silicon wafer into a cleaning basket, wherein the upper end and the lower end of the photovoltaic silicon wafer cannot be contacted with a cleaning solution, the phosphorus washing treatment of the photovoltaic silicon wafer is not thorough, and the comprehensive cleaning treatment of phosphorus elements on the surface of the photovoltaic silicon wafer cannot be ensured, so that the service life of the photovoltaic silicon wafer is influenced; and secondly, the cleaning basket inserted with the photovoltaic silicon wafer is statically placed in cleaning liquid for phosphorus cleaning treatment, the time spent for cleaning phosphorus elements on the surface of the photovoltaic silicon wafer through soaking of the cleaning liquid is long, and the phosphorus elements still remain on the photovoltaic silicon wafer, so that the cleaning is not thorough.
Description
Technical Field
The invention relates to the technical field of photovoltaic silicon wafer production, in particular to a photovoltaic silicon wafer phosphorus washing device.
Background
The photovoltaic silicon wafer is cut according to the specified size in the production process, then the cut photovoltaic silicon wafer is cleaned, the cleaning of phosphorus elements on the surface of the silicon wafer by the prepared acid cleaning solution is an important part in the production process of the photovoltaic silicon wafer, the cleaning result of the phosphorus elements on the surface of the photovoltaic silicon wafer is important for the service life of the photovoltaic silicon wafer,
however, the following problems exist in the process of phosphorus washing treatment of the existing photovoltaic silicon wafer; the method comprises the following steps that firstly, a photovoltaic silicon wafer is manually inserted into a cleaning basket, the upper end and the lower end of the photovoltaic silicon wafer cannot be in contact with cleaning liquid, phosphorus washing treatment of the photovoltaic silicon wafer is not thorough, phosphorus elements on the surface of the photovoltaic silicon wafer cannot be comprehensively cleaned, and the service life of the photovoltaic silicon wafer is influenced; and secondly, the cleaning basket inserted with the photovoltaic silicon wafer is statically placed in cleaning liquid for phosphorus cleaning treatment, the time spent for cleaning phosphorus elements on the surface of the photovoltaic silicon wafer through soaking of the cleaning liquid is long, and the phosphorus elements still remain on the photovoltaic silicon wafer, so that the cleaning is not thorough.
Disclosure of Invention
In order to solve the problems, the invention provides a photovoltaic silicon wafer phosphorus washing device which can solve the problems mentioned above.
In order to achieve the purpose, the invention adopts the following technical scheme to realize the purpose: a photovoltaic silicon wafer phosphorus washing device comprises a washing frame, a control adjusting mechanism, a placing and clamping mechanism and a linkage control mechanism; control adjusting mechanisms are symmetrically installed on the left side and the right side of the cleaning frame, a placing clamping mechanism is arranged between the control adjusting mechanisms in a clamping and fixing mode, and a linkage control mechanism matched with the placing clamping mechanism is arranged in the cleaning frame;
the control adjusting mechanism comprises a control electric slider arranged on the cleaning frame, a movable plate is arranged on the control electric slider, a lifting cylinder is arranged on the movable plate, a lifting frame is arranged on the lifting cylinder, an inserting cylinder is arranged on the side wall of the lifting frame, an inserting plate is arranged on the inserting cylinder, and an inserting branch chain is arranged on the inserting plate.
Placing fixture including placing the frame, the symmetry sets up place the upper end left and right sides of frame be used for with grafting branch chain matched with joint branch chain, the both ends symmetry is provided with and is used for carrying out the centre gripping branch chain that presss from both sides tightly to the silicon chip about placing the frame, the rear end of placing the frame is provided with the drive branch chain that is used for controlling the operation of centre gripping branch chain.
Preferably, the inserting branch chain comprises an inserting frame arranged on the inserting plate, the inserting frame is of a U-shaped structure, the inserting frame is far away from one end of the inserting plate and provided with a supporting groove, an inserting spring rod is installed on the inner wall of the inserting frame, the supporting frame is installed on the inserting spring rod, inserting holes are symmetrically formed in the upper end face and the lower end face of the inserting frame, inserting blocks are arranged in the inserting holes in a sliding mode and slidably supported on the supporting frame, the supporting frame and the end face of the inserting blocks in contact are of an inclined structure, and locking grooves are symmetrically formed in the inserting blocks.
Preferably, the joint branched chain is in including the symmetry setting place the joint piece of the frame left and right sides, the rectangular channel has been seted up on the joint piece, the upper and lower both ends symmetry of joint piece seted up with the joint groove of rectangular channel intercommunication, the riser is installed to the rectangular channel, the joint spring beam is installed to bilateral symmetry around the riser, install the joint frame on the joint spring beam, the joint frame with sliding connection between the joint piece, the lower extreme of joint piece is provided with the butt joint hole.
Preferably, control centre gripping branch includes that the past is seted up backward equidistant control tank on placing the frame, be provided with the centre gripping subassembly in the control tank, the centre gripping unit mount is on the control panel, the control panel with it is provided with the control spring pole to place between the outer wall of frame, the control panel is crisscross in the past backward and is divided into a board and No. two boards in proper order, link to each other through a T template between a board, link to each other through No. two T templates between No. two boards.
Preferably, the driving branched chain comprises a driving motor installed on the outer wall of the placing frame through a motor base, a driving rod is installed on an output shaft of the driving motor, and two ends of the driving rod are connected with the first T-shaped plate and the second T-shaped plate through a sliding fit mode respectively.
Preferably, the centre gripping subassembly is including installing support block on the control panel, support the bilateral symmetry of block and install the centre gripping spring beam, centre gripping operation frame is installed to the centre gripping spring beam, centre gripping operation frame is located in the control flume.
Preferably, the linkage control mechanism comprises a linkage motor installed in the cleaning frame through a motor base, a rotating plate is installed on an output shaft of the linkage motor, circular arc convex blocks are evenly arranged on the rotating plate along the circumferential direction of the rotating plate, a positioning block is arranged on the inner wall of the cleaning frame, a linkage block is arranged at the upper end of the positioning block through a spring, linkage holes are formed in the middle of the linkage block and the middle of the positioning block, a linkage rod is arranged in the linkage holes in a sliding mode, a spring is sleeved between the linkage rod and the positioning block, and the linkage rod is abutted to the rotating plate.
Preferably, the upper end face of the linkage hole is uniformly provided with linkage grooves along the circumferential direction of the linkage hole, and the linkage rod is uniformly provided with operation rods.
Compared with the prior art, the invention has the following beneficial effects;
the invention solves the following problems in the phosphorus washing treatment process of the existing photovoltaic silicon wafer; the method comprises the following steps that firstly, a photovoltaic silicon wafer is manually inserted into a cleaning basket, the upper end and the lower end of the photovoltaic silicon wafer cannot be in contact with cleaning liquid, phosphorus washing treatment of the photovoltaic silicon wafer is not thorough, phosphorus elements on the surface of the photovoltaic silicon wafer cannot be comprehensively cleaned, and the service life of the photovoltaic silicon wafer is influenced; and secondly, the cleaning basket inserted with the photovoltaic silicon wafer is statically placed in cleaning liquid for phosphorus cleaning treatment, the time spent for cleaning phosphorus elements on the surface of the photovoltaic silicon wafer through soaking of the cleaning liquid is long, and the phosphorus elements still remain on the photovoltaic silicon wafer, so that the cleaning is not thorough.
The placing and clamping mechanism designed by the invention can stably clamp the photovoltaic silicon wafer in operation, and can alternatively clamp the photovoltaic silicon wafer in operation, so that the problem that the end edge of the photovoltaic silicon wafer cannot be contacted with a cleaning solution in the process of phosphorus washing treatment can be avoided, and the comprehensive cleaning treatment of phosphorus elements on the surface of the photovoltaic silicon wafer can be ensured.
The linkage control mechanism designed in the invention can drive the placing frame to vibrate in operation, the placing frame can drive liquid in the cleaning frame to flow and synchronously drive the photovoltaic silicon wafer to move in vibration operation, and the impact force of the cleaning liquid on the photovoltaic silicon wafer is increased, so that the phosphorus cleaning effect of the photovoltaic silicon wafer is improved.
Drawings
The invention is further illustrated with reference to the following figures and examples.
FIG. 1 is a schematic structural view of the present invention;
FIG. 2 is a cross-sectional view of the present invention;
FIG. 3 is an enlarged view of a portion of FIG. 2 in accordance with the present invention;
FIG. 4 is a cross-sectional view of a plugging branched chain of the present invention;
FIG. 5 is a schematic view of the structure of the leaning frame of the present invention;
FIG. 6 is a schematic view of the placement fixture of the present invention
FIG. 7 is a cross-sectional view of a clamping branch of the present invention
FIG. 8 is a schematic view of a snap branch of the present invention
FIG. 9 is a partial enlarged view of the invention at B of FIG. 2
Detailed Description
The embodiments of the invention will be described in detail below with reference to the drawings, but the invention can be implemented in many different ways as defined and covered by the claims.
As shown in fig. 1-9, a photovoltaic silicon wafer phosphorus washing device comprises a washing frame 1, a control adjusting mechanism 2, a placing and clamping mechanism 3 and a linkage control mechanism 4; the cleaning device is characterized in that control and adjustment mechanisms 2 are symmetrically arranged on the left side and the right side of the cleaning frame 1, placing and clamping mechanisms 3 are arranged between the control and adjustment mechanisms 2 in a clamping and fixing mode, and linkage control mechanisms 4 matched with the placing and clamping mechanisms 3 are arranged in the cleaning frame 1;
when washing phosphorus treatment to photovoltaic silicon chip, start control adjustment mechanism 2 and drive and place fixture 3 and adjust to suitable position, will prepare to wash the photovoltaic silicon chip of phosphorus treatment and place fixture 3 in, after photovoltaic silicon chip placed, will place fixture 3 through control adjustment mechanism 2 and place the linkage control mechanism 4 in the cleaning frame 1, accomplish the phosphorus treatment operation of washing to photovoltaic silicon chip through the supplementary cooperation of linkage control mechanism 4.
It is in including placing frame 31, symmetry setting to place fixture 3 place the upper end left and right sides of frame 31 be used for with grafting branch chain 26 matched with joint branch chain 32, the left and right ends symmetry of placing frame 31 is provided with and is used for carrying out the tight centre gripping branch chain 33 of clamp to the silicon chip, the rear end of placing frame 31 is provided with the drive branch chain 34 that is used for controlling the operation of centre gripping branch chain 33.
Silicon wafers to be washed with phosphorus are sequentially inserted into the placing frame 31, and the driving branched chain 34 drives the control clamping branched chain 33 to adjust so as to complete the clamping operation of the silicon wafers.
Control centre gripping branched chain 33 includes from the past backward equidistant seting up place the control flume on the frame 31, be provided with the centre gripping subassembly in the control flume, the centre gripping unit mount is on the control panel, the control panel with be provided with control spring pole 333 between the outer wall of placing frame 31, the control panel is crisscross to be divided into a board 331 and No. two boards 332 in the past backward in proper order, link to each other through a T type 334 board between a board 331, link to each other through No. two T type boards 335 between No. two boards 332.
The driving branched chain 34 comprises a driving motor 341 mounted on the outer wall of the placing frame 31 through a motor base, a driving rod 342 is mounted on an output shaft of the driving motor 341, and two ends of the driving rod 342 are connected with a first T-shaped 334 plate and a second T-shaped plate 335 through a sliding fit mode respectively.
The centre gripping subassembly is including installing support block 336 on the control panel, support block 336's bilateral symmetry and install centre gripping spring arm 337, centre gripping operation frame 338 is installed to centre gripping spring arm 337, centre gripping operation frame 338 is located in the control flume, when the control panel orientation place frame 31 direction motion two centre gripping operation frames 338 accomplish the centre gripping operation to the photovoltaic silicon chip under the squeezing action of control flume inner wall.
When the clamping branched chain 33 is controlled to clamp the photovoltaic silicon wafer, the driving motor 341 is started to control the driving rod 342 to perform angle adjustment, the driving rod 342 drives the first T-shaped plate 334 and the second T-shaped plate 335 to perform reverse adjustment in the movement process, and in the process, the clamping assembly connected with the first T-shaped plate 334 is in a clamping state, and the clamping assembly connected with the second T-shaped plate 335 is in an opening state.
The control adjusting mechanism 2 comprises a control electric slider 21 arranged on the cleaning frame 1, a moving plate is arranged on the control electric slider 21, a lifting cylinder 22 is arranged on the moving plate, a lifting frame 23 is arranged on the lifting cylinder 22, an inserting cylinder 24 is arranged on the side wall of the lifting frame 23, an inserting plate 25 is arranged on the inserting cylinder 24, and an inserting branch chain 26 is arranged on the inserting plate 25;
the inserting branch chain 26 comprises an inserting frame 261 arranged on the inserting plate 25, the inserting frame 261 is of a U-shaped structure, one end, far away from the inserting plate 25, of the inserting frame 261 is provided with an abutting groove, an inserting spring rod 262 is installed on the inner wall of the inserting frame 261, an abutting frame 263 is installed on the inserting spring rod 262, penetrating holes are symmetrically formed in the upper end face and the lower end face of the inserting frame 261, penetrating blocks 264 are arranged in the penetrating holes in a sliding mode, the penetrating blocks 264 abut against the abutting frame 263 in a sliding mode, the abutting frame 263 and the end face, in contact with the penetrating blocks 264, of the abutting frame 264 are of an inclined structure, and locking grooves are symmetrically formed in the penetrating blocks 264.
Joint branched chain 32 sets up including the symmetry place the joint piece 321 of the frame 31 left and right sides, the lower extreme of joint piece 321 is provided with the butt joint hole, the rectangular channel has been seted up on the joint piece 321, the upper and lower both ends symmetry of joint piece 321 seted up with the joint groove of rectangular channel intercommunication, riser 322 is installed to the rectangular channel, joint spring lever 323 is installed to bilateral symmetry around riser 322, install joint frame 324 on the joint spring lever 323, joint frame 324 with sliding connection between the joint piece 321.
After the photovoltaic silicon wafers are inserted, the electric sliding block 21, the lifting cylinder 22 and the inserting cylinder 24 are controlled to be matched with each other to control the inserting branch chain 26 to be in butt joint with the clamping branch chain 32, so that the control and adjustment mechanism 2 can control the placing frame 31 inserted with the photovoltaic silicon wafers to move into the cleaning frame 1 to perform phosphorus cleaning treatment.
The linkage control mechanism 4 comprises a linkage motor 41 installed in the cleaning frame 1 through a motor base, a rotating plate 42 is installed on an output shaft of the linkage motor 41, circular arc convex blocks are evenly arranged on the rotating plate 42 along the circumferential direction of the rotating plate, a positioning block 43 is arranged on the inner wall of the cleaning frame 1, a linkage block 44 is arranged at the upper end of the positioning block 43 through a spring, linkage holes are formed in the middle of the linkage block 44 and the positioning block 43, a linkage rod 45 is arranged in the linkage holes in a sliding mode, a spring is sleeved between the linkage rod 45 and the positioning block 43, and the linkage rod 45 is abutted against the rotating plate 42.
Linkage grooves are uniformly formed in the upper end face of each linkage hole along the circumferential direction of the linkage hole, and the linkage rods 45 are uniformly provided with operation rods 46.
Then the adjusting mechanism 2 is controlled to drive the placing frame 31 to move to a proper position, the placing frame 31 is placed on the linkage control mechanism 4, the linkage rod 45 is inserted into the butt joint hole, the adjusting mechanism 2 is controlled to reset at the moment, the linkage motor 41 starts to work to drive the rotating plate 42 to rotate, the rotating plate 42 drives the linkage rod 45 to lift and adjust through controlling the rotation of the arc bump in the rotating process, the linkage rod 45 drives the placing frame 31 to wholly adjust through the operation rod 46 in the moving process, in order to enable the photovoltaic silicon wafer to be comprehensively cleaned, the driving motor 341 synchronously controls the driving rod 342 to adjust at the moment, the photovoltaic silicon wafer can be comprehensively contacted with the phosphorus-washing liquid, the comprehensive cleaning of the photovoltaic silicon wafer is ensured, and the placing frame 31 is moved out of the cleaning frame 1 through controlling the adjusting mechanism 2 after the operation is completed.
The foregoing illustrates and describes the principles, general features, and advantages of the present invention. It will be understood by those skilled in the art that the present invention is not limited to the embodiments described above, which are given by way of illustration of the principles of the present invention, and that various changes and modifications may be made without departing from the spirit and scope of the invention as defined by the appended claims. The scope of the invention is defined by the appended claims and equivalents thereof.
Claims (8)
1. A photovoltaic silicon wafer phosphorus washing device comprises a washing frame (1), a control adjusting mechanism (2), a placing and clamping mechanism (3) and a linkage control mechanism (4); the cleaning frame is characterized in that control and adjustment mechanisms (2) are symmetrically arranged on the left side and the right side of the cleaning frame (1), placing and clamping mechanisms (3) are arranged between the control and adjustment mechanisms (2) in a clamping and fixing mode, and linkage control mechanisms (4) matched with the placing and clamping mechanisms (3) are arranged in the cleaning frame (1);
the control adjusting mechanism (2) comprises a control electric sliding block (21) arranged on the cleaning frame (1), a moving plate is arranged on the control electric sliding block (21), a lifting cylinder (22) is arranged on the moving plate, a lifting frame (23) is arranged on the lifting cylinder (22), an inserting cylinder (24) is arranged on the side wall of the lifting frame (23), an inserting plate (25) is arranged on the inserting cylinder (24), and an inserting branch chain (26) is arranged on the inserting plate (25);
place fixture (3) including placing frame (31), symmetry setting place the upper end left and right sides of frame (31) be used for with grafting branch chain (26) matched with joint branch chain (32), the left and right sides symmetry of placing frame (31) is provided with and is used for carrying out the centre gripping branch chain (33) that press from both sides tightly to the silicon chip, the rear end of placing frame (31) is provided with drive branch chain (34) that are used for controlling centre gripping branch chain (33) operation.
2. The photovoltaic silicon wafer phosphorus washing device as claimed in claim 1, wherein the plug-in branch chain (26) comprises a plug-in rack (261) arranged on the plug-in board (25), the inserting frame (261) is of a U-shaped structure, one end of the inserting frame (261) far away from the inserting plate (25) is provided with a leaning groove, an inserting spring rod (262) is arranged on the inner wall of the inserting frame (261), a leaning frame (263) is arranged on the inserting spring rod (262), the upper end surface and the lower end surface of the inserting frame (261) are symmetrically provided with inserting holes, inserting blocks (264) are arranged in the inserting holes in a sliding manner, the penetrating and inserting block (264) is abutted against the abutting frame (263) in a sliding mode, the abutting frame (263) and the end face, contacted with the penetrating and inserting block (264), of the abutting frame are of an inclined structure, and locking grooves are symmetrically formed in the penetrating and inserting block (264).
3. The photovoltaic silicon wafer phosphorus washing device of claim 2, characterized in that, joint branch chain (32) including the symmetry set up place the joint piece (321) of frame (31) left and right sides, the rectangular channel has been seted up on joint piece (321), the upper and lower both ends symmetry of joint piece (321) seted up with the joint groove of rectangular channel intercommunication, riser (322) are installed to the rectangular channel, joint spring beam (323) are installed to bilateral symmetry around riser (322), install joint frame (324) on joint spring beam (323), joint frame (324) with sliding connection between joint piece (321).
4. The photovoltaic silicon wafer phosphorus washing device of claim 1, characterized in that, the control centre gripping branched chain (33) includes from the front to back equidistant control groove set up on placing the frame (31), be provided with the centre gripping subassembly in the control groove, the centre gripping subassembly is installed on the control panel, control panel with place and be provided with control spring pole (333) between the outer wall of frame (31), the control panel from the front to back crisscross divide into one number board (331) and No. two board (332) in proper order, link to each other through No. one T type (334) board between the one number board (331), link to each other through No. two T type board (335) between No. two board (332).
5. The photovoltaic silicon wafer phosphorus washing device according to claim 4, wherein the driving branch chain (34) comprises a driving motor (341) installed on the outer wall of the placing frame (31) through a motor base, an output shaft of the driving motor (341) is provided with a driving rod (342), and two ends of the driving rod (342) are respectively connected with the first T-shaped plate (334) and the second T-shaped plate (335) through a sliding fit manner.
6. The photovoltaic silicon wafer phosphorus washing device of claim 5, wherein the clamping assembly comprises an abutting block (336) installed on the control board, clamping spring rods (337) are symmetrically installed on two sides of the abutting block (336), a clamping operation frame (338) is installed on each clamping spring rod (337), and the clamping operation frame (338) is located in the control groove.
7. The phosphorus washing device for the photovoltaic silicon wafers as claimed in claim 1, wherein the linkage control mechanism (4) comprises a linkage motor (41) installed in the washing frame (1) through a motor base, a rotating plate (42) is installed on an output shaft of the linkage motor (41), circular arc bumps are uniformly arranged on the rotating plate (42) along the circumferential direction of the rotating plate, a positioning block (43) is arranged on the inner wall of the washing frame (1), a linkage block (44) is arranged at the upper end of the positioning block (43) through a spring, linkage holes are formed in the middle of the linkage block (44) and the positioning block (43), a linkage rod (45) is slidably arranged in the linkage holes, a spring is sleeved between the linkage rod (45) and the positioning block (43), and the linkage rod (45) abuts against the rotating plate (42).
8. The photovoltaic silicon wafer phosphorus washing device according to claim 7, wherein the upper end surface of the linkage hole is uniformly provided with linkage grooves along the circumferential direction of the linkage hole, and the linkage rod (45) is uniformly provided with operation rods (46).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202210378252.2A CN114695208A (en) | 2022-04-12 | 2022-04-12 | Photovoltaic silicon chip phosphorus washing device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202210378252.2A CN114695208A (en) | 2022-04-12 | 2022-04-12 | Photovoltaic silicon chip phosphorus washing device |
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| CN114695208A true CN114695208A (en) | 2022-07-01 |
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| CN202210378252.2A Withdrawn CN114695208A (en) | 2022-04-12 | 2022-04-12 | Photovoltaic silicon chip phosphorus washing device |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN117317059A (en) * | 2023-10-07 | 2023-12-29 | 安徽美达伦光伏科技有限公司 | Solar cell groove type alkali polishing machine table and production line |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN117317059A (en) * | 2023-10-07 | 2023-12-29 | 安徽美达伦光伏科技有限公司 | Solar cell groove type alkali polishing machine table and production line |
| CN117317059B (en) * | 2023-10-07 | 2024-04-05 | 安徽美达伦光伏科技有限公司 | Solar cell groove type alkali polishing machine table and production line |
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Application publication date: 20220701 |