CN117144296A - 一种氢燃料电池极板涂层的制备方法 - Google Patents
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Abstract
本发明公开了一种氢燃料电池极板涂层的制备方法,属于燃料电池技术领域。该方法包括:将双极板基底抛光、清洗,载入镀膜装置,表面沉积得到基础层,随后进行离子刻蚀,最后表面沉积得到金属层,即得。该方法通过在石墨双极板或金属双极板上沉积Cu、Cr、Ni或Cu、Cr、Zr涂层,具备良好的导电性能、防腐蚀性能及机械强度,用于石墨极板可弥补机械强度不足,用于金属极板可弥补防腐蚀性能不足。
Description
技术领域
本发明属于燃料电池技术领域,尤其涉及一种氢燃料电池极板涂层的制备方法。
背景技术
质子交换膜燃料电池(proton exchangemembrane fuel cells,PEMFCs)具有启动快、工作温度低等优点,通过其实现氢能高效利用是氢能经济的重要一环,目前被认为是汽车等领域最具前景的电源之一。
双极板在燃料电池中起到分隔反应气体、除热、排出化学反应产物(水)的作用,是燃料电池的核心部件之一。双极板主要分为石墨、金属两大类别:石墨双极板拥有优良的导电性以及较好的抗腐蚀能力,应用广泛,但机械强度差,体积大,导致体积功率密度难以提高。而金属双极板具有成本低,体积功率密度高,延展性和导电导热性能好等优点,但防腐蚀性能欠佳。
有鉴于此,特提出本发明。
发明内容
本发明的目的在于提供一种氢燃料电池极板涂层的制备方法,通过在石墨双极板或金属双极板上沉积Cu、Cr、Ni或Cu、Cr、Zr涂层,具备良好的导电性能、防腐蚀性能及机械强度,用于石墨极板可弥补机械强度不足,用于金属极板可弥补防腐蚀性能不足。
为实现以上目的,本发明特采用以下技术方案:
本发明提供一种氢燃料电池极板涂层的制备方法,包括如下步骤:
S1:将双极板基底抛光、清洗。
进一步地,所述双极板基底包括金属双极板或石墨双极板。
S2:将S1所得产物载入镀膜装置,表面沉积得到基础层。
进一步地,所述载入镀膜装置之后抽真空并通入氩气,随后再进行表面沉积;优选地,所述抽真空为抽真空至0.1-0.3Pa。
进一步地,所述基础层包括金属Cu和/或金属Cr。
更进一步地,所述基础层包括金属Cu和金属Cr时,Cu和Cr的质量比为4:(0.5-1)。
通过增加所述基础层,能够有效保持导电性能的基础上,增加双极板的机械强度,尤其是对于石墨双极板来说。所述表面沉积的方法,可以有效提高双极板和基础层的结合力。
S3:将S2所得产物进行离子刻蚀。
进一步地,所述离子刻蚀为在150-300℃、抽真空至1-3×10-3Pa下,通入氩气进行刻蚀。
S4:将S3所得产物表面沉积得到金属层,即得。
进一步地,所述金属层包括金属Ni和/或金属Zr。
更进一步地,所述金属层包括金属Ni和金属Zr时,Ni和Zr的质量比为5:(0.5-1)。
优选地,所述金属层还包括金属Cu和/或金属Cr。
更优选地,所述金属层包括金属Cu和金属Cr时,Cu和Cr的质量比为4:(0.5-1)。
通过离子刻蚀后进行表面沉积金属层,可以增强双极板整体导电性,同时增加耐腐蚀性。
与现有技术相比,本发明通过在金属双极板或石墨双极板上两次进行表面沉积制备CuCrNi或CuCrZr涂层,在两次表面沉积之间还进行了离子刻蚀,可以同时提高双板整体的导电性、耐腐蚀性和机械强度。
具体实施方式
下面将结合具体实施例对本发明的实施方案进行详细描述,但是本领域技术人员将会理解,下列实施例仅用于说明本发明,而不应视为限制本发明的范围。实施例中未注明具体条件者,按照常规条件或制造商建议的条件进行。所用试剂或仪器未注明生产厂商者,均为可以通过市售购买获得的常规产品。
本发明实施例提供的氢燃料电池极板涂层的制备方法,包括如下步骤:
第一步,先将双极板基底抛光、清洗。所述双极板基底包括金属双极板或石墨双极板。
第二步,将第一步所得产物载入镀膜装置,表面沉积得到基础层,厚度为200-500nm。
在进一步的实施方式中,所述载入镀膜装置之后抽真空并通入氩气,随后再进行表面沉积;优选地,所述抽真空为抽真空至0.1-0.3Pa。
在进一步的实施方式中,所述基础层包括金属Cu和/或金属Cr。当所述基础层包括金属Cu和金属Cr时,Cu和Cr的质量比为4:(0.5-1)。
第三步,将第二步所得产物进行离子刻蚀。
在进一步的实施方式中,所述离子刻蚀为在150-300℃、抽真空至1-3×10-3Pa下,通入氩气进行刻蚀。
第四步,将第三步所得产物表面沉积得到金属层,金属层的厚度约为50-100nm,即得所述的氢燃料电池极板涂层。
在进一步的实施方式中,所述金属层包括金属Ni和/或金属Zr。
当所述金属层包括金属Ni和金属Zr时,Ni和Zr的质量比为5:(0.5-1)。
在优选的实施方式中,所述金属层还包括金属Cu和/或金属Cr。
当所述金属层包括金属Cu和金属Cr时,Cu和Cr的质量比为4:(0.5-1),Cu和Cr的总质量与金属Ni和/或金属Zr质量比为(3-5):1。
实施例1
一种氢燃料电池极板涂层的制备方法:
(1)将金属双极板基底进行抛光,随后以去离子水超声清洗20min后烘干。
(2)将烘干后的金属双极板基底置于多弧离子镀膜炉中,抽真空至0.2Pa,通入氩气,开启Cu和Cr的质量比为4:0.6的靶材进行沉积,得到厚度为300nm的基础层。
(3)继续抽真空至1.5×10-3Pa,在260℃下通入氩气进行离子刻蚀。
(4)通入氩气至0.2Pa时,开启Zr靶材进行沉积,得到厚度为80nm的金属层,得到氢燃料电池极板涂层。测得所述涂层的接触电阻为3.8mΩ·cm2,自腐蚀电流为0.19μA/cm2。
实施例2
一种氢燃料电池极板涂层的制备方法:
(1)将石墨双极板基底进行抛光,随后以去离子水超声清洗20min后烘干。
(2)将烘干后的石墨双极板基底置于多弧离子镀膜炉中,抽真空至0.2Pa,通入氩气,开启Cu和Cr的质量比为4:1的靶材进行沉积,得到厚度为400nm的基础层。
(3)继续抽真空至2×10-3Pa,在300℃下通入氩气进行离子刻蚀。
(4)通入氩气至0.2Pa时,开启Ni靶材进行沉积,得到厚度为100nm的金属层,得到氢燃料电池极板涂层。测得所述涂层的接触电阻为3.1mΩ·cm2,自腐蚀电流为0.24μA/cm2。
实施例3
一种氢燃料电池极板涂层的制备方法:
(1)将金属双极板基底进行抛光,随后以去离子水超声清洗20min后烘干。
(2)将烘干后的金属双极板基底置于多弧离子镀膜炉中,抽真空至0.2Pa,通入氩气,开启Cu和Cr的质量比为4:0.5的靶材进行沉积,得到厚度为500nm的基础层。
(3)继续抽真空至1.0×10-3Pa,在180℃下通入氩气进行离子刻蚀。
(4)通入氩气至0.2Pa时,开启Ni和Zr的质量比为5:0.5的靶材进行沉积,得到厚度为100nm的金属层,得到氢燃料电池极板涂层。测得所述涂层的接触电阻为2.9mΩ·cm2,自腐蚀电流为0.23μA/cm2。
实施例4
一种氢燃料电池极板涂层的制备方法:
(1)将金属双极板基底进行抛光,随后以去离子水超声清洗20min后烘干。
(2)将烘干后的金属双极板基底置于多弧离子镀膜炉中,抽真空至0.2Pa,通入氩气,开启Cu和Cr的质量比为4:0.5的靶材进行沉积,得到厚度为200nm的基础层。
(3)继续抽真空至1.5×10-3Pa,在260℃下通入氩气进行离子刻蚀。
(4)通入氩气至0.2Pa时,开启CuCrNi靶材进行沉积,其中,Cu、Cr、Ni的质量比为4:0.5:1,得到厚度为100nm的金属层,得到氢燃料电池极板涂层。测得所述涂层的接触电阻为2.6mΩ·cm2,自腐蚀电流为0.26μA/cm2。
实施例5
一种氢燃料电池极板涂层的制备方法:
(1)将金属双极板基底进行抛光,随后以去离子水超声清洗20min后烘干。
(2)将烘干后的金属双极板基底置于多弧离子镀膜炉中,抽真空至0.2Pa,通入氩气,开启Cu和Cr的质量比为4:0.5的靶材进行沉积,得到厚度为200nm的基础层。
(3)继续抽真空至1.5×10-3Pa,在260℃下通入氩气进行离子刻蚀。
(4)通入氩气至0.2Pa时,开启CuCrZr靶材进行沉积,其中,Cu、Cr、Zr的质量比为4:0.5:1,得到厚度为50nm的金属层,得到氢燃料电池极板涂层。测得所述涂层的接触电阻为2.8mΩ·cm2,自腐蚀电流为0.19μA/cm2。
可以看出,本发明实施例-5中所制备的双极板涂层,具有良好的导电性能和抗腐蚀性能。
最后应说明的是:以上各实施例仅用以说明本发明的技术方案,而非对其限制;尽管参照前述各实施例对本发明进行了详细的说明,本领域的普通技术人员应当理解:其依然可以对前述各实施例所记载的技术方案进行修改,或者对其中部分或者全部技术特征进行等同替换;而这些修改或者替换,并不使相应技术方案的本质脱离本发明各实施例技术方案的范围。
此外,本领域的技术人员能够理解,尽管在此的一些实施例包括其它实施例中所包括的某些特征而不是其它特征,但是不同实施例的特征的组合意味着处于本发明的范围之内并且形成不同的实施例。例如,在上面的权利要求书中,所要求保护的实施例的任意之一都可以以任意的组合方式来使用。公开于该背景技术部分的信息仅仅旨在加深对本发明的总体背景技术的理解,而不应当被视为承认或以任何形式暗示该信息构成已为本领域技术人员所公知的现有技术。
Claims (10)
1.一种氢燃料电池极板涂层的制备方法,其特征在于,包括如下步骤:
S1:将双极板基底抛光、清洗;
S2:将S1所得产物载入镀膜装置,表面沉积得到基础层;
S3:将S2所得产物进行离子刻蚀;
S4:将S3所得产物表面沉积得到金属层,即得。
2.根据权利要求1所述的制备方法,其特征在于,步骤S1中,所述双极板基底包括金属双极板或石墨双极板。
3.根据权利要求1所述的制备方法,其特征在于,步骤S2中,所述载入镀膜装置之后抽真空并通入氩气,随后再进行表面沉积;
所述抽真空为抽真空至0.1-0.3Pa。
4.根据权利要求3所述的制备方法,其特征在于,步骤S2中,所述基础层包括金属Cu和/或金属Cr。
5.根据权利要求4所述的制备方法,其特征在于,所述基础层包括金属Cu和金属Cr时,Cu和Cr的质量比为4:(0.5-1)。
6.根据权利要求1所述的制备方法,其特征在于,步骤S3中,所述离子刻蚀为在150-300℃、抽真空至1-3×10-3Pa下,通入氩气进行刻蚀。
7.根据权利要求1所述的制备方法,其特征在于,步骤S4中,所述金属层包括金属Ni和/或金属Zr。
8.根据权利要求7所述的制备方法,其特征在于,步骤S4中,所述金属层包括金属Ni和金属Zr时,Ni和Zr的质量比为5:(0.5-1)。
9.根据权利要求1所述的制备方法,其特征在于,步骤S4中,所述金属层还包括金属Cu和/或金属Cr。
10.根据权利要求1所述的制备方法,其特征在于,步骤S4中,所述金属层包括金属Cu和金属Cr时,Cu和Cr的质量比为4:(0.5-1)。
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