CN117074739A - Air floatation movement device for wafer detection - Google Patents
Air floatation movement device for wafer detection Download PDFInfo
- Publication number
- CN117074739A CN117074739A CN202311345176.6A CN202311345176A CN117074739A CN 117074739 A CN117074739 A CN 117074739A CN 202311345176 A CN202311345176 A CN 202311345176A CN 117074739 A CN117074739 A CN 117074739A
- Authority
- CN
- China
- Prior art keywords
- air
- axis
- sliding
- floating
- plate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000033001 locomotion Effects 0.000 title claims abstract description 148
- 238000001514 detection method Methods 0.000 title claims abstract description 13
- 238000007667 floating Methods 0.000 claims abstract description 32
- 238000007689 inspection Methods 0.000 claims description 16
- 230000008713 feedback mechanism Effects 0.000 claims description 14
- 239000006096 absorbing agent Substances 0.000 claims description 3
- 239000004579 marble Substances 0.000 claims description 3
- 230000035939 shock Effects 0.000 claims description 3
- 238000005188 flotation Methods 0.000 claims 7
- 235000012431 wafers Nutrition 0.000 abstract description 13
- 238000009434 installation Methods 0.000 description 5
- 238000013461 design Methods 0.000 description 4
- 238000006073 displacement reaction Methods 0.000 description 4
- 230000004044 response Effects 0.000 description 4
- 238000013459 approach Methods 0.000 description 3
- 230000005540 biological transmission Effects 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- 238000005299 abrasion Methods 0.000 description 2
- 230000020169 heat generation Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 230000009347 mechanical transmission Effects 0.000 description 2
- 230000001133 acceleration Effects 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 230000001360 synchronised effect Effects 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R1/00—Details of instruments or arrangements of the types included in groups G01R5/00 - G01R13/00 and G01R31/00
- G01R1/02—General constructional details
- G01R1/04—Housings; Supporting members; Arrangements of terminals
- G01R1/0408—Test fixtures or contact fields; Connectors or connecting adaptors; Test clips; Test sockets
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Magnetic Bearings And Hydrostatic Bearings (AREA)
Abstract
The invention provides an air floatation movement device for wafer detection, which comprises a frame, a base station, an air floatation bearing seat, a Y-axis movement module and an X-axis movement module. The air-floating movement device adopts the independent air-floating bearing seat to support the object stage to move, the Y-axis movement module directly uses the base station as an air-floating working surface, the X-axis movement module is integrally stacked on the Y-axis movement module, the Y-axis movement module and the X-axis movement module both adopt air-floating bearings to realize air-floating movement, the device has high integral rigidity, strong bearing capacity and good movement stability, and can meet the requirement of high-precision detection of wafers.
Description
Technical Field
The invention relates to the technical field of semiconductor detection equipment, in particular to an air floatation movement device for wafer detection.
Background
Along with the continuous upgrading of the chip manufacturing process, not only is the chip manufacturing equipment provided, but also higher precision requirements are provided for the chip detection equipment. The wafer is generally loaded on a stage device, and the stage device is mounted on a precision motion platform for use, and the motion platform realizes XY-axis scanning motion.
The existing motion platform can be mainly divided into a mechanical motion platform and an air floatation motion platform, the traditional mechanical motion platform is limited by mechanical transmission, the more the transmission series, the worse the precision, the low motion acceleration and the slow response speed. The air floating moving platform adopts an air floating bearing or an air floating guide rail for transmission, and has the advantages of low resistance and quick dynamic response. However, the existing air-floating moving platform still has some defects, such as the invention application CN114878864A discloses a wafer detection high-precision air-floating moving platform which only uses an air-floating transmission mode on the Z axis, and has the advantages of poor stability, low bearing capacity and insufficient rigidity; and the technology does not use air floatation on the XY axis movement, and a mechanical transmission part still exists in the movement process of the device, so that the overall precision of the device can be influenced. As another example, the invention application CN115773445a discloses a multi-degree-of-freedom gantry air-floating motion system, and the rigidity of the whole structure of the device is poor; the Y axis and the Z axis are driven by double linear motors, so that the control difficulty is improved, and serious synchronous motion errors are caused; the Y-axis air-floating guide rail is realized in a mode that an air sleeve surrounds the guide rail, the structure is very dependent on the machining precision and the mounting precision of the guide rail, and meanwhile, the guide rail and an air-floating bearing are worn greatly in the moving process. Therefore, the existing motion platform has the problems of poor motion stability, low rigidity and insufficient bearing capacity.
Disclosure of Invention
The invention aims to solve the problem of improving the motion stability, rigidity and bearing capacity of a motion platform and realizing the requirement of high-precision detection.
In order to solve the above problems, the present invention provides an air-floating motion device for wafer inspection, comprising
A frame;
the base is arranged on the frame, and the base is made of marble;
the air floatation bearing seat faces the base station, and an objective table is arranged on the air floatation bearing seat;
the Y-axis motion module comprises two groups of symmetrically arranged Y-axis linear motors and sliding beams, the Y-axis linear motors are arranged along the Y-axis direction, each Y-axis linear motor is in driving connection with the corresponding sliding beam, and at least one air bearing with an air bearing end face facing the base station is arranged on the sliding beam;
the X-axis motion module comprises an X-axis linear motor, a sliding frame, a first cross beam and a second cross beam, wherein the X-axis linear motor, the first cross beam and the second cross beam are arranged along the X-axis direction, two ends of the first cross beam and two ends of the second cross beam are erected on the sliding beams, an objective table is positioned between the first cross beam and the second cross beam, the X-axis linear motor is arranged on the second cross beam, the X-axis linear motor is in driving connection with the sliding frame, the sliding frame is fixedly connected with an air floatation bearing seat, at least one air floatation end face of the sliding frame faces towards an air floatation bearing of the second cross beam, and at least one air floatation face of the objective table faces towards the air floatation bearing of the first cross beam.
Compared with the prior art, the air floatation movement device for wafer detection has the following beneficial effects: the independent air floatation bearing seat is adopted to support the object stage to move, so that the load and friction on the motion assembly are reduced, the stress deformation of parts is avoided, the response speed and the precision are improved, and the power consumption is reduced; the Y-axis motion module directly takes the base station as an air floatation working surface, so that the processing and the installation are simple, the system error is reduced, and the Y-axis motion module adopts a symmetrical design, so that the double-drive synchronism is improved; the X-axis movement module is integrally stacked on the Y-axis movement module, so that the rigidity of the movement device is improved, and the first cross beam and the second cross beam are arranged on two sides of the objective table, so that the objective table has better flatness when moving, and the movement stability is ensured; the Y-axis motion module and the X-axis motion module both adopt air floatation bearings to realize air floatation movement, and a closed guide rail is not needed.
In a preferred or alternative scheme, the base station comprises a bottom plate and two side plates which are horizontally arranged, the side plates are arranged in parallel, the side plates are vertically arranged with the bottom plate, the two Y-axis linear motors are respectively arranged on one side of the side plates, the sliding beam comprises a first sliding plate and a second sliding plate which are mutually perpendicular, the first sliding plate is arranged in parallel with the side plates, and the second sliding plate is arranged in parallel with the bottom plate. The base station is provided with two side plates, so that the Y-axis movement module is convenient to fixedly mount, the section of the sliding beam is L-shaped, the structural strength is improved, and the movement stability is better.
In a preferred or alternative scheme, the first sliding plate is provided with an air bearing end face facing the side plate at the position close to two ends in the Y-axis direction, and the second sliding plate is provided with an air bearing end face facing the bottom plate at the position close to two ends in the Y-axis direction. The air bearing of the Y-axis motion module forms two rectangles in space arrangement, and forms air bearing contact with the bottom plate and the side plate of the base, so that the Y-axis motion module has wide supporting surface, strong bearing capacity and good rigidity.
In a preferred or alternative, one side surface of the first and second skids has a plurality of triangular grooves. The triangular grooves can reduce the mass of the sliding beam, improve the rigidity, reduce the running load, reduce the power consumption of the motor, reduce the heat generation and further improve the movement precision.
In a preferred or alternative scheme, two groups of Y-axis motion feedback mechanisms are arranged on the base station, and each Y-axis motion feedback mechanism is used for detecting the movement stroke of the corresponding sliding beam so as to accurately control the displacement of the sliding beam in the Y-axis direction.
In a preferred or alternative scheme, a Y-axis travel proximity switch is installed at positions corresponding to the travel start point and the travel end point of each sliding beam on the base, Y-axis collision-preventing blocks are respectively arranged at two ends of the sliding beam along the Y-axis direction, and a Y-axis collision-preventing damper is installed at positions corresponding to the travel start point and the travel end point of the sliding beam on the base. Setting a Y-axis travel proximity switch, and sending feedback when the sliding beam moves to a limit position to limit the maximum travel of the sliding beam; the Y-axis anti-collision block is matched with the Y-axis anti-collision damper, so that the moving speed of the sliding Liang Jiejin at the end of the stroke is rapidly reduced, and the movement precision is improved.
In a preferred or alternative aspect, the X-axis motion module includes a third beam disposed above the second beam, and the X-axis linear motor is disposed between the second beam and the third beam. The purpose of this structural design is to eliminate offset and torsion for centroid actuation and to increase the overall stiffness of the X-axis motion module.
In a preferred or alternative scheme, the sliding frame comprises a first vertical plate, a second vertical plate and a connecting plate, wherein the first vertical plate and the second vertical plate are arranged on two sides of the second cross beam and the third cross beam in parallel, the upper ends of the first vertical plate and the second vertical plate are fixedly connected with the connecting plate, and the lower ends of the first vertical plate and the second vertical plate are fixedly connected with the air floatation bearing seat.
In a preferred or alternative scheme, the first vertical plate is close to four corners and is provided with an air bearing end face facing the second beam or the third beam respectively, the second vertical plate is close to four corners and is provided with an air bearing end face facing the second beam or the third beam respectively, and two sides of the objective table along the X-axis direction are provided with an air bearing face facing the first beam respectively. The first crossbeam corresponds with two air bearing, and the both sides of second crossbeam and third crossbeam correspond with two air bearing respectively, form three-dimensional overall arrangement's air supporting space, make X axle motion module overall rigidity good, motion stability is high.
In a preferred or alternative, one side surface of the first, second and third beams has a plurality of triangular grooves. The triangular grooves can reduce the mass of the cross beam and improve the rigidity and the bearing capacity.
In a preferred or alternative scheme, the sliding frame is provided with an X-axis motion feedback mechanism for detecting the moving stroke of the sliding frame, so as to accurately control the displacement of the sliding frame in the X-axis direction.
In a preferred or alternative scheme, an X-axis travel proximity switch is respectively arranged on the sliding beams at two sides, an X-axis anti-collision block is respectively arranged on the sliding beams at two sides, and an X-axis anti-collision damper is respectively arranged at two sides of the objective table along the X-axis direction. Setting an X-axis travel proximity switch, and sending feedback when the objective table moves to a limit position, so as to limit the maximum travel of the objective table along the X-axis direction; the X-axis anti-collision block is matched with the X-axis anti-collision damper, so that the moving speed of the objective table is rapidly reduced when the objective table approaches to the end of the travel, and the movement precision is improved.
In a preferred or alternative scheme, a plurality of air outlet holes and corresponding pressure equalizing grooves are uniformly distributed at the bottom of the air floatation bearing seat. The bottom of the air-float bearing seat forms an air-float supporting surface with stable pressure, thereby ensuring the motion stability.
In a preferred or alternative, the frame is connected to the base station by an active shock absorber. The base station uses the active shock absorber to effectively filter ground vibration and improve the motion precision.
Drawings
Fig. 1 is an overall structure diagram of an air bearing motion device for wafer inspection in an embodiment of the present invention.
Fig. 2 is a layout perspective view of a Y-axis motion module and an X-axis motion module according to an embodiment of the present invention.
Fig. 3 is a layout elevation view of a Y-axis motion module and an X-axis motion module in an embodiment of the present invention.
Fig. 4 is a rear view of the layout of the Y-axis motion module and the X-axis motion module in an embodiment of the present invention.
Fig. 5 is a layout side view of a Y-axis motion module and an X-axis motion module in an embodiment of the invention.
Reference numerals illustrate:
the device comprises a 1-frame, an 11-active damper, a 2-base, a 21-bottom plate, a 22-side plate, a 23-portal frame, a 31-Y axis linear motor, a 32-sliding beam, a 321-first sliding plate, a 322-second sliding plate, a 33-Y axis motion feedback mechanism, a 34-Y axis travel proximity switch, a 35-Y axis anti-collision damper, a 36-Y axis drag chain, a 41-X axis linear motor, a 42-sliding frame, a 421-first vertical plate, a 422-second vertical plate, a 423-connecting plate, a 43-first beam, a 44-second beam, a 45-third beam, a 46-X axis motion feedback mechanism, a 47-X axis anti-collision damper, a 5-air floatation bearing seat, a 6-objective table and a 7-air floatation bearing.
Detailed Description
For the purpose of making the objects, technical solutions and advantages of the embodiments of the present invention more apparent, the technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings in the embodiments of the present invention, and it is apparent that the described embodiments are some embodiments of the present invention, but not all embodiments of the present invention. The components of the embodiments of the present invention generally described and illustrated in the figures herein may be arranged and designed in a wide variety of different configurations.
It should be noted that: like numerals and letters indicate like items in the following figures, and thus once an item is defined in one figure, no further definition or explanation thereof is necessary in the following figures.
In the description of the present invention, it should be noted that, directions or positional relationships indicated by terms such as "upper", "lower", "left", "right", "inner", "outer", "front", "rear", etc., are directions or positional relationships based on those shown in the drawings, or are directions or positional relationships conventionally put in use of the inventive product, are merely for convenience of describing the present invention and simplifying the description, and are not indicative or implying that the apparatus or element to be referred to must have a specific direction, be configured and operated in a specific direction, and thus should not be construed as limiting the present invention. In the drawings of the embodiment of the invention, a coordinate system XYZ is arranged, wherein the forward direction of an X axis corresponds to the front, the reverse direction of the X axis corresponds to the rear, the forward direction of a Y axis corresponds to the right, the reverse direction of the Y axis corresponds to the left, the forward direction of a Z axis corresponds to the upper, and the reverse direction of the Z axis corresponds to the lower.
The preferred embodiments of the present invention will be described below with reference to the accompanying drawings, it being understood that the preferred embodiments described herein are for illustration and explanation of the present invention only, and are not intended to limit the present invention.
Referring to fig. 1 to 5, an embodiment of the present invention provides an air-floating motion device for wafer inspection, which includes a frame 1 and a base 2 disposed on the frame 1. The frame 1 is used for supporting the base station 2, so that the whole device can move conveniently. The base station 2 is provided with an air-bearing seat 5, a Y-axis movement module and an X-axis movement module, the air-bearing seat 5 is provided with an objective table 6 for loading wafers, the Y-axis movement module and the X-axis movement module are respectively used for controlling the air-bearing seat 5 to move in the Y-axis direction and the X-axis direction, and the objective table 6 can move and rotate in the Z-axis direction, so that the movable positioning in the wafer detection process is realized.
With reference to fig. 1, a plurality of active dampers 11 are arranged between the frame 1 and the base 2, and the active dampers 11 can effectively filter ground vibration, so that the motion precision of the air floatation motion device is improved.
The base station 2 is made of marble, the bottom surface of the air floatation bearing seat 5 is an air floatation surface, a plurality of air outlet holes are uniformly distributed on the air floatation surface, and the air floatation surface faces the base station 2. The air floatation moving device adopts an independent air floatation bearing seat 5 to support the objective table 6 to move, reduces the load and friction on a moving assembly, avoids the stress deformation of parts, improves the response speed and precision, and reduces the power consumption. Preferably, a plurality of pressure equalizing grooves are arranged at the bottom of the air floatation bearing seat 5, and all the pressure equalizing grooves are used for connecting all the air outlet holes together, so that an air floatation bearing surface with stable pressure is formed at the bottom of the air floatation bearing seat 5, and the movement stability is improved.
As shown in fig. 2, the base 2 includes a bottom plate 21 and two side plates 22 which are horizontally arranged, the side plates 22 on both sides are arranged in parallel, and the side plates 22 are arranged perpendicular to the bottom plate 21, and the space between the bottom plate 21 and the side plates 22 constitutes the installation space of the moving part, and the upper parts of the two side plates 22 are connected with a portal frame 23, so that the overall rigidity of the base 2 is improved.
The Y-axis motion module and the X-axis motion module are arranged in a concave area formed by the bottom plate 21 and the side plate 22 of the base station 2, the whole Y-axis motion module is also called a lower axis module, the X-axis motion module is also called an upper axis motion module, and the X-axis motion module is built on the Y-axis motion module.
As shown in connection with fig. 3, the Y-axis motion module includes two sets of symmetrically arranged Y-axis linear motors 31 and slide beams 32. The Y-axis linear motors 31 are arranged along the Y-axis direction, the two Y-axis linear motors 31 are respectively arranged on one side plate 22, the Y-axis linear motors 31 are in driving connection with the corresponding sliding beams 32, and the Y-axis movement modules are symmetrically designed, so that the double-drive synchronism is improved. The sliding beam 32 is provided with at least one air bearing 7 with an air end face facing the base 2 so as to realize air floating movement. The Y-axis movement module directly takes the base station 2 as an air floatation working face, so that the processing and the installation are simple, and the system error is reduced.
Two sets of Y-axis motion feedback mechanisms 33 are provided on the base 2, and each Y-axis motion feedback mechanism 33 is used for detecting the movement stroke of the corresponding slide beam 32, so as to precisely control the displacement of the slide beam 32 in the Y-axis direction. Specifically, the Y-axis motion feedback mechanism 33 is provided on the side plate 22 of the base 2 above the Y-axis linear motor 31, and the Y-axis motion feedback mechanism 33 is composed of an encoder and a grating.
Referring to fig. 4, the sliding beam 32 includes a first sliding plate 321 and a second sliding plate 322 perpendicular to each other, the first sliding plate 321 is parallel to the side plate 22, the second sliding plate 322 is parallel to the bottom plate 21, the cross section of the sliding beam 32 is L-shaped, the structural strength is improved, and the X-axis movement module is convenient to erect, so that the movement stability is better.
In this embodiment, the Y-axis motion module includes eight air bearing bearings 7, and the specific setting positions are as follows: the first sliding plate 321 is provided with an air bearing 7 with an air bearing end face facing the side plate 22 near the left and right end positions respectively, and the second sliding plate 322 is provided with an air bearing 7 with an air bearing end face facing the bottom plate 21 near the left and right end positions respectively. The air bearing 7 of the Y-axis motion module is formed into two rectangles in space arrangement, and is in air bearing contact with the bottom plate 21 and the side plate 22 of the base, so that the support surface is wide, the bearing capacity is strong, and the rigidity is good.
As shown in fig. 5, the first sliding plate 321 and the second sliding plate 322 have a plurality of triangular grooves on one side surface, which can improve the rigidity of the sliding beam 32, reduce the mass, reduce the running load, reduce the power consumption of the motor, reduce the heat generation, and further improve the movement accuracy.
Further, a Y-axis travel proximity switch 34 is mounted on the base 2 at a position corresponding to the start and end of travel of each slide beam 32, and feedback is provided when the slide beams 32 move to a limit, thereby limiting the maximum travel of the slide beams 32.
Further, two Y-axis crash blocks are respectively arranged at the left and right ends of the edge of the sliding beam 32, a Y-axis crash damper 35 is mounted on the base 2 at positions corresponding to the travel starting point and the travel end point of the sliding beam 32, and when the sliding beam 32 approaches the travel end point, the Y-axis crash blocks are contacted with the Y-axis crash damper 35, so that the moving speed of the sliding beam 32 can be reduced rapidly, and the accuracy of the Y-axis movement module is improved.
As shown in fig. 2 to 5, the X-axis movement module includes an X-axis linear motor 41, a carriage 42, a first beam 43, and a second beam 44. The first beam 43 and the second beam 44 are arranged in parallel in the X-axis direction, and the first beam 43 and the second beam 44 are distributed on the left and right sides of the stage 6. The front side and the rear side of the two cross beams are erected on the two sliding beams 32, and the bottoms of the cross beams are propped against the second sliding plate 322 of the sliding beam 32 to form fixed connection. The X-axis linear motor 41 is disposed on the second beam 44, and is disposed in parallel with the second beam 44. The X-axis linear motor 41 is in driving connection with the sliding frame 42, and the sliding frame 42 is fixedly connected with the air-bearing seat 5, so that the X-axis linear motor 41 can drive the air-bearing seat 5 and the objective table 6 to move along the X-axis direction. The position of the sliding frame 42 is close to the second cross beam 44, at least one air bearing 7 with an air bearing end face facing the second cross beam 44 is arranged on the sliding frame 42, at least one air bearing 7 with an air bearing face facing the first cross beam 43 is arranged on the objective table 6, the X-axis movement modules realize air bearing movement by adopting the air bearing 7, the air bearing implementation mode has simple structure, little abrasion to the air bearing 7 and high integral rigidity of the device.
Further, the X-axis movement module includes a third beam 45, the third beam 45 is disposed above the second beam 44 in parallel, and the X-axis linear motor 41 is disposed between the second beam 44 and the third beam 45. The structural design aims to eliminate offset and torsion for centroid driving and improve the integral rigidity of the X-axis motion module.
As shown in fig. 4 and 5, the sliding frame 42 includes a first vertical plate 421, a second vertical plate 422 and a connecting plate 423, where the first vertical plate 421 and the second vertical plate 422 are disposed in parallel on the left and right sides of the second beam 44 and the third beam 45, the upper ends of the first vertical plate 421 and the second vertical plate 422 are fixedly connected with the connecting plate 423, and the sliding frame 42 forms a semi-surrounding structure for the second beam 44 and the third beam 45, and the lower ends of the first vertical plate 421 and the second vertical plate 422 are fixedly connected with the air bearing seat 5.
The carriage 42 is provided with an X-axis motion feedback mechanism 46 for detecting a movement stroke of the carriage 42, thereby precisely controlling the displacement of the carriage 42 in the X-axis direction. Specifically, the X-axis motion feedback mechanism 46 is composed of an encoder provided on the lower surface of the connection plate 423 of the carriage 42, and a grating provided above the third beam 45.
In this embodiment, the X-axis motion module includes ten air bearings 7, and the specific setting positions are as follows: two angular positions of the lower part of the first vertical plate 421 are respectively provided with an air bearing 7 with an air bearing end face facing the second cross beam 44, and two angular positions of the upper part are respectively provided with an air bearing 7 with an air bearing end face facing the third cross beam 45. The air bearing 7 on the second vertical plate 422 and the air bearing 7 on the first vertical plate 421 are symmetrically arranged, two angular positions of the lower part of the second vertical plate are respectively provided with the air bearing 7 with one air bearing end face facing the second cross beam 44, and two angular positions of the upper part of the second vertical plate are respectively provided with the air bearing 7 with one air bearing end face facing the third cross beam 45. The front and rear sides of the stage 6 are provided with an air bearing 7 with an air bearing surface facing the first cross beam 43. The air bearing 7 forms an air bearing supporting space in three-dimensional arrangement, so that the X-axis movement module has good integral rigidity and high movement stability.
Further, an X-axis travel proximity switch (not shown) is mounted on each of the side slide beams 32, and feedback is provided when the stage 6 is moved to the limit position, thereby limiting the maximum travel of the stage 6 in the X-axis direction.
Further, an X-axis crash block (not shown) is mounted on the sliding beams 32 on both sides, and an X-axis crash damper 47 is disposed on both front and rear sides of the stage 6, respectively, so that when the stage 6 approaches the end of the stroke, the X-axis crash block contacts with the X-axis crash damper 47, and the moving speed of the stage 6 can be rapidly reduced, thereby improving the accuracy of the X-axis motion module.
The base 2 is also provided with a plurality of fixing brackets on the right side of the installation parts of the Y-axis movement module and the X-axis movement module, which are used for fixing joints and air pipes of the movement module, and a connecting piece for fixing a Y-axis drag chain 36 is additionally arranged.
The Y-axis movement module, the X-axis movement module and the objective table 6 of the air-floating movement device of the embodiment all adopt an air-floating movement mode, and the movement is stable and efficient; the Y-axis movement module and the X-axis movement module adopt a plurality of air bearing 7 to realize air floatation movement, the air floatation implementation mode has simple structure, low requirements on processing precision and installation precision and small movement abrasion and error; the arrangement structure of the air bearing 7 and the structural design of the air bearing seat 5 for supporting the objective table 6 consider the overall rigidity of the device, improve the bearing capacity and the motion stability of the device, and can meet the high-precision detection requirement of the wafer.
Finally, it should be noted that the above embodiments are merely illustrative of the technical solution of the present invention, and not limiting thereof; although the invention has been described in detail with reference to the foregoing embodiments, it will be understood by those of ordinary skill in the art that: the technical scheme described in the foregoing embodiments can be modified or some or all of the technical features thereof can be replaced by equivalents; such modifications and substitutions do not depart from the spirit of the invention.
Claims (14)
1. An air-floating movement device for wafer detection is characterized by comprising
A frame (1);
the base (2) is arranged on the frame (1), and the base (2) is made of marble;
the air floatation bearing seat (5), the air floatation surface of the air floatation bearing seat (5) faces the base station (2), and the air floatation bearing seat (5) is provided with an objective table (6);
the Y-axis motion module comprises two groups of symmetrically arranged Y-axis linear motors (31) and sliding beams (32), wherein the Y-axis linear motors (31) are arranged along the Y-axis direction, each Y-axis linear motor (31) is in driving connection with the corresponding sliding beam (32), and at least one air bearing (7) with an air bearing end face facing the base station (2) is arranged on the sliding beam (32);
x axle motion module, including X axle linear motor (41), carriage (42), first crossbeam (43) and second crossbeam (44), X axle linear motor (41) first crossbeam (43) with second crossbeam (44) are along X axle direction setting, first crossbeam (43) with the both ends of second crossbeam (44) erect both sides on slide beam (32), objective table (6) are located first crossbeam (43) with between second crossbeam (44), X axle linear motor (41) set up on second crossbeam (44), X axle linear motor (41) with carriage (42) drive connection, carriage (42) with air supporting seat (5) fixed connection is equipped with at least one air supporting terminal surface orientation on carriage (42) air supporting seat (7) of second crossbeam (44), be equipped with at least one air supporting surface orientation on objective table (6) air supporting seat (7) of first crossbeam (43).
2. The air flotation motion device for wafer inspection according to claim 1, wherein the base (2) comprises a bottom plate (21) and two side plates (22) which are horizontally arranged, the side plates (22) are arranged in parallel on two sides, the side plates (22) are arranged perpendicular to the bottom plate (21), two Y-axis linear motors (31) are respectively arranged on one side of the side plates (22), the sliding beam (32) comprises a first sliding plate (321) and a second sliding plate (322) which are perpendicular to each other, the first sliding plate (321) is arranged in parallel with the side plates (22), and the second sliding plate (322) is arranged in parallel with the bottom plate (21).
3. The air bearing motion device for wafer inspection according to claim 2, wherein the first sliding plate (321) is provided with an air bearing (7) with an air bearing end face facing the side plate (22) at positions near two ends in the Y-axis direction, and the second sliding plate (322) is provided with an air bearing (7) with an air bearing end face facing the bottom plate (21) at positions near two ends in the Y-axis direction.
4. The air-floating motion device for wafer inspection according to claim 2, wherein one side surface of the first slide plate (321) and the second slide plate (322) has a plurality of triangular grooves.
5. The air-floating motion device for wafer inspection according to claim 1, wherein two sets of Y-axis motion feedback mechanisms (33) are provided on the base (2), each Y-axis motion feedback mechanism (33) being used for detecting a movement stroke of the corresponding slide beam (32).
6. The air flotation motion device for wafer inspection according to claim 1, wherein a Y-axis travel proximity switch (34) is installed on the base (2) at positions corresponding to a travel start point and an end point of each sliding beam (32), Y-axis anti-collision blocks are respectively arranged at two ends of the sliding beams (32) along the Y-axis direction, and a Y-axis anti-collision damper (35) is installed on the base (2) at positions corresponding to the travel start point and the end point of the sliding beams (32).
7. The air-floating motion device for wafer inspection according to claim 1, wherein the X-axis motion module comprises a third beam (45), the third beam (45) being disposed above the second beam (44), the X-axis linear motor (41) being disposed between the second beam (44) and the third beam (45).
8. The air flotation motion device for wafer inspection according to claim 7, wherein the sliding frame (42) comprises a first vertical plate (421), a second vertical plate (422) and a connecting plate (423), the first vertical plate (421) and the second vertical plate (422) are arranged on two sides of the second cross beam (44) and the third cross beam (45) in parallel, the upper ends of the first vertical plate (421) and the second vertical plate (422) are fixedly connected with the connecting plate (423), and the lower ends of the first vertical plate (421) and the second vertical plate (422) are fixedly connected with the air flotation bearing seat (5).
9. The air-floating movement device for wafer inspection according to claim 8, wherein the first vertical plate (421) is provided with an air-floating bearing (7) with an air-floating end face facing the second beam (44) or the third beam (45) near four corners, the second vertical plate (422) is provided with an air-floating bearing (7) with an air-floating end face facing the second beam (44) or the third beam (45) near four corners, and two sides of the stage (6) along the X-axis direction are provided with air-floating bearings (7) with air-floating faces facing the first beam (43).
10. The air-floating motion device for wafer inspection according to claim 9, wherein one side surface of the first beam (43), the second beam (44) and the third beam (45) has a plurality of triangular grooves.
11. The air-floating motion device for wafer inspection according to claim 1, wherein an X-axis motion feedback mechanism (46) is provided on the carriage (42) for detecting a moving stroke of the carriage (42).
12. The air flotation motion device for wafer inspection according to claim 1, wherein an X-axis travel proximity switch is mounted on the sliding beams (32) on both sides, an X-axis crash block is mounted on the sliding beams (32) on both sides, and an X-axis crash damper (47) is provided on both sides of the stage (6) along the X-axis direction.
13. The air flotation motion device for wafer inspection according to any one of claims 1-12, wherein a plurality of air outlet holes and corresponding pressure equalizing grooves are uniformly distributed at the bottom of the air flotation carrier (5).
14. The air bearing motion device for wafer inspection according to any one of claims 1-12, characterized in that the frame (1) is connected with the base station (2) through an active shock absorber (11).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202311345176.6A CN117074739B (en) | 2023-10-18 | 2023-10-18 | Air floatation movement device for wafer detection |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202311345176.6A CN117074739B (en) | 2023-10-18 | 2023-10-18 | Air floatation movement device for wafer detection |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN117074739A true CN117074739A (en) | 2023-11-17 |
| CN117074739B CN117074739B (en) | 2024-01-30 |
Family
ID=88708447
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202311345176.6A Active CN117074739B (en) | 2023-10-18 | 2023-10-18 | Air floatation movement device for wafer detection |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN117074739B (en) |
Citations (31)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4298307A (en) * | 1976-05-10 | 1981-11-03 | Bergman Raymond A | Air float power rotation system |
| JPH02118491A (en) * | 1988-10-28 | 1990-05-02 | Canon Inc | Static pressure air bearing xy stage |
| JP2001009673A (en) * | 1999-06-24 | 2001-01-16 | Toshiba Mach Co Ltd | Main shaft state detecting device for air bearing type machine tool |
| KR20040086560A (en) * | 2003-03-28 | 2004-10-11 | 스미도모쥬기가이고교 가부시키가이샤 | X-Y stage apparatus |
| CN1701925A (en) * | 2005-07-22 | 2005-11-30 | 北京航空航天大学 | H type air floating workbench with synchronization driving of bilateral linear motor |
| JP2009527207A (en) * | 2005-11-02 | 2009-07-23 | シムレー，ジャニック | Levitating equipment |
| CN201833188U (en) * | 2010-04-16 | 2011-05-18 | 杨国哲 | Air-floating type positioning platform |
| CN201954205U (en) * | 2011-01-05 | 2011-08-31 | 河南科技大学 | Precision air-flotation worktable |
| JP2011225355A (en) * | 2010-04-22 | 2011-11-10 | Sumitomo Heavy Ind Ltd | Air floating unit, stage device, inspection system, exposure system, and application system |
| CN105173129A (en) * | 2015-09-18 | 2015-12-23 | 南京航空航天大学 | Triaxial air bearing table leveling system and method |
| US20160124437A1 (en) * | 2013-05-20 | 2016-05-05 | Harbin Institute Of Technology | Measurement Control System for Multi-Shaft Supported Air Floatation Platform |
| US20180066704A1 (en) * | 2015-04-30 | 2018-03-08 | Carl Zeiss Industrielle Messtechnik Gmbh | Coordinate measuring apparatus with air bearing monitoring and adjusting capability |
| JP3216607U (en) * | 2018-03-30 | 2018-06-07 | 浩 倉林 | Air floating vibration control system |
| WO2018152862A1 (en) * | 2017-02-27 | 2018-08-30 | 深圳市易通自动化设备有限公司 | Chip mounter with independently working x axis and y axis |
| CN207936918U (en) * | 2018-04-02 | 2018-10-02 | 无锡星微科技有限公司 | A kind of motion platform detected for wafer thickness and curvature |
| US20200025248A1 (en) * | 2018-07-23 | 2020-01-23 | Alio Industries, Inc. | Planar rotary air bearing stage |
| CN112129234A (en) * | 2019-06-25 | 2020-12-25 | 无锡星微科技有限公司 | Be used for jumbo size wafer thickness testing platform |
| CN214771874U (en) * | 2021-06-29 | 2021-11-19 | 昆山仁合汇精密量具有限公司 | Motion platform based on T type air supporting guide rail |
| CN113696479A (en) * | 2021-08-16 | 2021-11-26 | 北京科技大学 | Precise three-dimensional direct-drive air-floating type 4D printing motion platform and implementation method thereof |
| CN215240681U (en) * | 2021-06-29 | 2021-12-21 | 昆山仁合汇精密量具有限公司 | Three-axis motion platform using vacuum air floatation slide rail |
| CN113977294A (en) * | 2021-10-22 | 2022-01-28 | 苏州舜迈机电科技有限公司 | High-precision linear driving air-flotation positioning platform |
| CN114111691A (en) * | 2021-11-19 | 2022-03-01 | 三英精控（天津）仪器设备有限公司 | High-precision air-floatation motion platform and method for wafer detection |
| CN216229283U (en) * | 2021-11-12 | 2022-04-08 | 浙江工业大学 | X/Y two-axis precise air-floating motion platform |
| JP2022062376A (en) * | 2020-10-08 | 2022-04-20 | 株式会社三誠Ａｉｒ断震システム | Air slider in air floating type vibration control device |
| CN114406454A (en) * | 2022-01-28 | 2022-04-29 | 河南通用智能装备有限公司 | Air supporting cutting platform |
| CN114619411A (en) * | 2022-03-29 | 2022-06-14 | 苏州矽行半导体技术有限公司 | Flexible motion platform and carrying platform system |
| CN115077920A (en) * | 2022-06-21 | 2022-09-20 | 大连理工大学 | Multistage turbine part assembly deformation test equipment |
| CN115319486A (en) * | 2022-10-12 | 2022-11-11 | 江苏三米科思半导体设备有限公司 | High-precision XY air floatation motion system and processing method thereof |
| CN115773445A (en) * | 2022-11-01 | 2023-03-10 | 三英精控（天津）仪器设备有限公司 | Multi-degree-of-freedom gantry air floatation motion system for precise optical detection imaging |
| CN218726710U (en) * | 2022-10-19 | 2023-03-24 | 苏州矽行半导体技术有限公司 | Moving device for semiconductor surface detection with high precision |
| CN219094012U (en) * | 2022-12-23 | 2023-05-30 | 苏州首镭激光科技有限公司 | Automatic stealthy cutting equipment of wafer |
-
2023
- 2023-10-18 CN CN202311345176.6A patent/CN117074739B/en active Active
Patent Citations (32)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4298307A (en) * | 1976-05-10 | 1981-11-03 | Bergman Raymond A | Air float power rotation system |
| JPH02118491A (en) * | 1988-10-28 | 1990-05-02 | Canon Inc | Static pressure air bearing xy stage |
| JP2001009673A (en) * | 1999-06-24 | 2001-01-16 | Toshiba Mach Co Ltd | Main shaft state detecting device for air bearing type machine tool |
| KR20040086560A (en) * | 2003-03-28 | 2004-10-11 | 스미도모쥬기가이고교 가부시키가이샤 | X-Y stage apparatus |
| CN1701925A (en) * | 2005-07-22 | 2005-11-30 | 北京航空航天大学 | H type air floating workbench with synchronization driving of bilateral linear motor |
| JP2009527207A (en) * | 2005-11-02 | 2009-07-23 | シムレー，ジャニック | Levitating equipment |
| CN201833188U (en) * | 2010-04-16 | 2011-05-18 | 杨国哲 | Air-floating type positioning platform |
| JP2011225355A (en) * | 2010-04-22 | 2011-11-10 | Sumitomo Heavy Ind Ltd | Air floating unit, stage device, inspection system, exposure system, and application system |
| CN201954205U (en) * | 2011-01-05 | 2011-08-31 | 河南科技大学 | Precision air-flotation worktable |
| US20160124437A1 (en) * | 2013-05-20 | 2016-05-05 | Harbin Institute Of Technology | Measurement Control System for Multi-Shaft Supported Air Floatation Platform |
| US20180066704A1 (en) * | 2015-04-30 | 2018-03-08 | Carl Zeiss Industrielle Messtechnik Gmbh | Coordinate measuring apparatus with air bearing monitoring and adjusting capability |
| CN105173129A (en) * | 2015-09-18 | 2015-12-23 | 南京航空航天大学 | Triaxial air bearing table leveling system and method |
| WO2018152862A1 (en) * | 2017-02-27 | 2018-08-30 | 深圳市易通自动化设备有限公司 | Chip mounter with independently working x axis and y axis |
| JP3216607U (en) * | 2018-03-30 | 2018-06-07 | 浩 倉林 | Air floating vibration control system |
| CN207936918U (en) * | 2018-04-02 | 2018-10-02 | 无锡星微科技有限公司 | A kind of motion platform detected for wafer thickness and curvature |
| US20200025248A1 (en) * | 2018-07-23 | 2020-01-23 | Alio Industries, Inc. | Planar rotary air bearing stage |
| CN112129234A (en) * | 2019-06-25 | 2020-12-25 | 无锡星微科技有限公司 | Be used for jumbo size wafer thickness testing platform |
| JP2022062376A (en) * | 2020-10-08 | 2022-04-20 | 株式会社三誠Ａｉｒ断震システム | Air slider in air floating type vibration control device |
| CN215240681U (en) * | 2021-06-29 | 2021-12-21 | 昆山仁合汇精密量具有限公司 | Three-axis motion platform using vacuum air floatation slide rail |
| CN214771874U (en) * | 2021-06-29 | 2021-11-19 | 昆山仁合汇精密量具有限公司 | Motion platform based on T type air supporting guide rail |
| CN113696479A (en) * | 2021-08-16 | 2021-11-26 | 北京科技大学 | Precise three-dimensional direct-drive air-floating type 4D printing motion platform and implementation method thereof |
| CN113977294A (en) * | 2021-10-22 | 2022-01-28 | 苏州舜迈机电科技有限公司 | High-precision linear driving air-flotation positioning platform |
| CN216229283U (en) * | 2021-11-12 | 2022-04-08 | 浙江工业大学 | X/Y two-axis precise air-floating motion platform |
| CN114111691A (en) * | 2021-11-19 | 2022-03-01 | 三英精控（天津）仪器设备有限公司 | High-precision air-floatation motion platform and method for wafer detection |
| US20230163016A1 (en) * | 2021-11-19 | 2023-05-25 | Sanying Motioncontrol (Tianjin) Instrument Co., Ltd. | A high precision air bearing stage with capability of parasitic error compensation |
| CN114406454A (en) * | 2022-01-28 | 2022-04-29 | 河南通用智能装备有限公司 | Air supporting cutting platform |
| CN114619411A (en) * | 2022-03-29 | 2022-06-14 | 苏州矽行半导体技术有限公司 | Flexible motion platform and carrying platform system |
| CN115077920A (en) * | 2022-06-21 | 2022-09-20 | 大连理工大学 | Multistage turbine part assembly deformation test equipment |
| CN115319486A (en) * | 2022-10-12 | 2022-11-11 | 江苏三米科思半导体设备有限公司 | High-precision XY air floatation motion system and processing method thereof |
| CN218726710U (en) * | 2022-10-19 | 2023-03-24 | 苏州矽行半导体技术有限公司 | Moving device for semiconductor surface detection with high precision |
| CN115773445A (en) * | 2022-11-01 | 2023-03-10 | 三英精控（天津）仪器设备有限公司 | Multi-degree-of-freedom gantry air floatation motion system for precise optical detection imaging |
| CN219094012U (en) * | 2022-12-23 | 2023-05-30 | 苏州首镭激光科技有限公司 | Automatic stealthy cutting equipment of wafer |
Non-Patent Citations (2)
| Title |
|---|
| 张从鹏;刘强;: "直线电机气浮精密定位平台设计与控制", 北京航空航天大学学报, no. 02 * |
| 黄鹏;卢志伟;刘波;张君安;: "精密高刚度二维气浮工作台的设计与分析", 液压与气动, no. 03 * |
Also Published As
| Publication number | Publication date |
|---|---|
| CN117074739B (en) | 2024-01-30 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US8109395B2 (en) | Gantry positioning system | |
| CN108015561B (en) | Motion platform capable of enlarging single-drive rigid-flexible coupling working area | |
| JP5013569B2 (en) | Die-sinker EDM | |
| WO2014120082A1 (en) | A planar positioning system and method of using the same | |
| CN108747426B (en) | Co-stator large-stroke trans-scale three-degree-of-freedom parallel motion platform | |
| CN113192873B (en) | Flexible connection mechanism, micro-motion stage mechanism and semiconductor device | |
| CN214771874U (en) | Motion platform based on T type air supporting guide rail | |
| CN104765382A (en) | Cross-scale two-dimensional large-stroke high-speed and high-precision motion platform | |
| US11097387B2 (en) | Machining center | |
| CN216229283U (en) | X/Y two-axis precise air-floating motion platform | |
| CN117074739B (en) | Air floatation movement device for wafer detection | |
| CN220380462U (en) | Grating ruler mounting structure and air bearing table | |
| CN218965332U (en) | Carrier system | |
| CN218726710U (en) | Moving device for semiconductor surface detection with high precision | |
| CN110729230B (en) | Ultra-high precision planar air-floatation workpiece table | |
| CN102723303B (en) | Air flotation locating platform with X coordinate and Y coordinate | |
| CN216199849U (en) | Double-layer air floatation movement device | |
| CN112130419A (en) | Motion platform for detecting thickness and curvature of large-size wafer | |
| JPS60127932A (en) | Xy stage | |
| CN113733063A (en) | Direct-drive high-speed large-stroke truss robot based on inclined plane support | |
| CN111604883A (en) | Multi-degree-of-freedom high-performance hybrid robot | |
| CN208663085U (en) | A kind of across scale freedom degree parallel connection motion platform of the big stroke of stator altogether | |
| CN217406308U (en) | Automatic alignment motor base | |
| CN116381892B (en) | Two-stage macro-micro camera lens focusing device based on direct-drive type air floatation platform | |
| CN216728022U (en) | High-precision three-axis movement device |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant |