CN117043922A - 检查用半导体构造 - Google Patents

检查用半导体构造 Download PDF

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Publication number
CN117043922A
CN117043922A CN202280022838.3A CN202280022838A CN117043922A CN 117043922 A CN117043922 A CN 117043922A CN 202280022838 A CN202280022838 A CN 202280022838A CN 117043922 A CN117043922 A CN 117043922A
Authority
CN
China
Prior art keywords
inspection
main surface
electrode
semiconductor
probe
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN202280022838.3A
Other languages
English (en)
Chinese (zh)
Inventor
高尾俊郎
长尾胜久
榎田吉朗
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Rohm Co Ltd
Original Assignee
Rohm Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rohm Co Ltd filed Critical Rohm Co Ltd
Publication of CN117043922A publication Critical patent/CN117043922A/zh
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • H01L22/30Structural arrangements specially adapted for testing or measuring during manufacture or treatment, or specially adapted for reliability measurements
    • H01L22/32Additional lead-in metallisation on a device or substrate, e.g. additional pads or pad portions, lines in the scribe line, sacrificed conductors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • H01L22/30Structural arrangements specially adapted for testing or measuring during manufacture or treatment, or specially adapted for reliability measurements
    • H01L22/34Circuits for electrically characterising or monitoring manufacturing processes, e. g. whole test die, wafers filled with test structures, on-board-devices incorporated on each die, process control monitors or pad structures thereof, devices in scribe line
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R31/00Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
    • G01R31/26Testing of individual semiconductor devices
    • G01R31/2601Apparatus or methods therefor
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R31/00Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
    • G01R31/26Testing of individual semiconductor devices
    • G01R31/2644Adaptations of individual semiconductor devices to facilitate the testing thereof
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67242Apparatus for monitoring, sorting or marking
    • H01L21/67288Monitoring of warpage, curvature, damage, defects or the like
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • H01L22/10Measuring as part of the manufacturing process
    • H01L22/14Measuring as part of the manufacturing process for electrical parameters, e.g. resistance, deep-levels, CV, diffusions by electrical means

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Automation & Control Theory (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
CN202280022838.3A 2021-03-26 2022-02-22 检查用半导体构造 Pending CN117043922A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2021053878 2021-03-26
JP2021-053878 2021-03-26
PCT/JP2022/007253 WO2022202060A1 (ja) 2021-03-26 2022-02-22 検査用半導体構造

Publications (1)

Publication Number Publication Date
CN117043922A true CN117043922A (zh) 2023-11-10

Family

ID=83396985

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202280022838.3A Pending CN117043922A (zh) 2021-03-26 2022-02-22 检查用半导体构造

Country Status (5)

Country Link
US (1) US20240014081A1 (enExample)
JP (1) JPWO2022202060A1 (enExample)
CN (1) CN117043922A (enExample)
DE (1) DE112022001227T5 (enExample)
WO (1) WO2022202060A1 (enExample)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20250079242A1 (en) * 2023-09-01 2025-03-06 Taiwan Semiconductor Manufacturing Company, Ltd. Via accuracy measurement

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6386923B2 (ja) * 2015-01-26 2018-09-05 三菱電機株式会社 半導体評価装置およびチャックステージの検査方法
JP2019129173A (ja) * 2018-01-22 2019-08-01 Tdk株式会社 電子部品
JP7334435B2 (ja) * 2019-03-22 2023-08-29 富士電機株式会社 半導体装置および半導体装置の検査方法

Also Published As

Publication number Publication date
WO2022202060A1 (ja) 2022-09-29
US20240014081A1 (en) 2024-01-11
JPWO2022202060A1 (enExample) 2022-09-29
DE112022001227T5 (de) 2023-12-21

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