CN116819916A - Counterpoint coordinate acquisition method of counterpoint identifier, storage medium and terminal - Google Patents
Counterpoint coordinate acquisition method of counterpoint identifier, storage medium and terminal Download PDFInfo
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- CN116819916A CN116819916A CN202310679479.5A CN202310679479A CN116819916A CN 116819916 A CN116819916 A CN 116819916A CN 202310679479 A CN202310679479 A CN 202310679479A CN 116819916 A CN116819916 A CN 116819916A
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Abstract
An alignment coordinate acquisition method of an alignment mark, a storage medium and a terminal, wherein the alignment coordinate acquisition method of the alignment mark comprises the following steps: providing a top layer layout; determining an alignment mark graph from the top layer layout, and selecting a frame for the alignment mark graph; acquiring a plurality of frame node coordinates of the selected frame; defining a plurality of coordinate variables, and endowing the values of the abscissa and the ordinate of the node coordinates of each frame in the selected frame with the corresponding coordinate variables; and obtaining the alignment coordinates of the alignment mark graph according to a plurality of the coordinate parameters. The alignment coordinates of the alignment mark patterns in the top-layer layout are automatically obtained, so that the problems of deviation and complexity caused by manually extracting the alignment coordinates can be solved, and the accuracy and the efficiency for obtaining the alignment coordinates can be effectively improved.
Description
Technical Field
The present invention relates to the field of semiconductor technologies, and in particular, to a method for acquiring an alignment coordinate of an alignment identifier, a storage medium, and a terminal.
Background
Photolithography is a technique for printing patterns with features on the surface of a wafer for the fabrication of semiconductor devices, various integrated circuits, flat panel displays, circuit boards, biochips, micromechanical electronic chips, optoelectronic circuit chips, and the like.
In modern microelectronics, the fabrication of integrated circuits belongs to a series of processes including photolithography, ion implantation, etching, epitaxial growth, oxidation, and the like. The photoetching process refers to a process of transferring a pattern onto a photoresist on a surface photoresist-uniformizing silicon wafer through processes such as exposure and development, and the like, and is ready for the next step of etching or ion implantation process. At least 10 photolithography steps or more are required in a typical chip process.
When the photoetching machine is exposed, the alignment mark is needed to be found according to the coordinate of the pre-input alignment mark, and the wafer is exposed after the alignment mark is positioned, so that the accuracy of the coordinate is extremely important, and once a wire deviation exists, the patterns exposed on the whole wafer can deviate.
However, there are still problems in acquiring the coordinates of the alignment marks.
Disclosure of Invention
The invention solves the technical problem of providing a counterpoint coordinate acquisition method, a storage medium and a terminal for counterpoint identification so as to improve accuracy and efficiency of acquiring counterpoint coordinates.
In order to solve the above problems, the present invention provides a method for obtaining alignment coordinates of an alignment mark, including: providing a top layer layout; determining an alignment mark graph from the top layer layout, and selecting a frame for the alignment mark graph; acquiring a plurality of frame node coordinates of the selected frame; and acquiring the alignment coordinates of the alignment mark graph according to the plurality of frame node coordinates.
Optionally, the method for determining the alignment mark graph from the top-level layout includes: obtaining a plurality of layout figures in the top layer layout; and determining the alignment identification graph from a plurality of layout graphs.
Optionally, the method for determining the alignment mark graph from the plurality of layout graphs includes: acquiring name information of each layout figure; and determining an alignment identification graph according to the name information.
Optionally, the selected frame is a rectangular frame, and sides of the selected frame perpendicular to each other are parallel to the horizontal direction and the vertical direction respectively.
Optionally, when the alignment mark pattern is a rectangular pattern, the selected frame overlaps with an edge contour of the alignment mark pattern.
Optionally, when the alignment mark pattern is a non-rectangular pattern or a combined pattern, the selected frame surrounds the alignment mark pattern.
Optionally, the selecting the frame node coordinates of the frame includes: the coordinate points corresponding to the first coordinates and the coordinate points corresponding to the second coordinates are diagonal vertexes in the selected frame respectively.
Optionally, the method for obtaining the alignment coordinates of the alignment mark graph according to the plurality of frame node coordinates includes: defining a plurality of coordinate variables, and endowing the values of the abscissa and the ordinate of the node coordinates of each frame in the selected frame with the corresponding coordinate variables; and obtaining the alignment coordinates of the alignment mark graph according to a plurality of the coordinate parameters.
Optionally, the method for defining a plurality of coordinate variables and assigning the value of the abscissa and the ordinate of the node coordinate of each frame in the selected frame to the corresponding coordinate variable includes: assigning values of the abscissa in the first coordinates to first lateral coordinate variables; assigning a value of an ordinate in the first coordinates to a first longitudinal coordinate variable; assigning a value of an abscissa in the second coordinate to a second lateral coordinate variable, the abscissa in the second coordinate being greater than the abscissa in the first coordinate; and assigning a value of an ordinate in the second coordinate to a second longitudinal coordinate variable, wherein the ordinate in the second coordinate is larger than the ordinate in the first coordinate.
Optionally, the method for obtaining the alignment coordinates of the alignment mark graph according to a plurality of coordinate parameters includes: providing a first horizontal distance dimension along the horizontal direction between the alignment coordinate and the first coordinate; adding the first horizontal coordinate variable to the first horizontal space size to be used as the horizontal coordinate of the alignment coordinate; providing a first vertical space dimension along the vertical direction between the alignment coordinate and the first coordinate; and adding the first longitudinal coordinate variable to the first vertical interval size to be used as the ordinate of the alignment coordinate.
Optionally, the method for obtaining the alignment coordinates of the alignment mark graph according to the coordinate parameters further includes: providing a second horizontal spacing dimension along the horizontal direction between the alignment coordinate and the second coordinate; subtracting the second horizontal pitch dimension from the second lateral coordinate variable as the lateral coordinate of the alignment coordinate; providing a second vertical space dimension along the vertical direction between the alignment coordinate and the second coordinate; subtracting the second vertical pitch dimension from the second longitudinal coordinate variable as the ordinate of the alignment coordinate.
Optionally, when the alignment coordinate is a central alignment coordinate, the method for obtaining the alignment coordinate of the alignment mark graph according to a plurality of coordinate parameters includes: adding the first transverse coordinate variable and the second transverse coordinate variable and dividing the added first transverse coordinate variable and the added second transverse coordinate variable by 2 to obtain transverse coordinates of the alignment coordinates; and adding the first longitudinal coordinate variable and the second longitudinal coordinate variable and dividing the added first longitudinal coordinate variable and the added second longitudinal coordinate variable by 2 to obtain the longitudinal coordinate of the alignment coordinate.
Correspondingly, the technical scheme of the invention also provides a storage medium, on which computer instructions are stored, and the method is characterized in that the computer instructions execute the steps of any one of the methods.
Correspondingly, the technical scheme of the invention also provides a terminal which comprises a memory and a processor, wherein the memory stores computer instructions capable of running on the processor, and the terminal is characterized in that the processor executes any one of the steps of the method when running the computer instructions.
Compared with the prior art, the technical scheme of the invention has the following advantages:
according to the method for acquiring the alignment coordinates of the alignment mark, disclosed by the technical scheme, the deviation and the complexity caused by manually extracting the alignment coordinates can be solved by automatically acquiring the alignment coordinates of the alignment mark graph in the top-level layout, and the accuracy and the efficiency for acquiring the alignment coordinates can be effectively improved.
Further, when the alignment coordinate is a center alignment coordinate, the method for obtaining the alignment coordinate of the alignment mark graph according to a plurality of coordinate parameters includes: adding the first transverse coordinate variable and the second transverse coordinate variable and dividing the added first transverse coordinate variable and the added second transverse coordinate variable by 2 to obtain transverse coordinates of the alignment coordinates; and adding the first longitudinal coordinate variable and the second longitudinal coordinate variable and dividing the added first longitudinal coordinate variable and the added second longitudinal coordinate variable by 2 to obtain the longitudinal coordinate of the alignment coordinate. Because the center alignment coordinate is a special alignment coordinate, the center alignment coordinate can be obtained in a direct operation mode without measurement, and the efficiency of obtaining the alignment coordinate can be further provided.
Drawings
FIG. 1 is a schematic flow chart of acquiring alignment coordinates of an alignment mark in an embodiment of the invention;
fig. 2 to fig. 5 are schematic structural diagrams of each step of a method for obtaining an alignment coordinate of an alignment mark in an embodiment of the present invention;
FIG. 6 is a schematic diagram of a structure of an alignment mark pattern for selecting a non-rectangular pattern or a combined pattern for a frame in other embodiments of the present invention;
fig. 7 is a schematic structural diagram of acquiring alignment coordinates of an alignment mark pattern according to another embodiment of the present invention.
Detailed Description
As described in the background, there are still problems in acquiring coordinates of the alignment marks. The following will specifically explain.
The current method for acquiring the alignment mark coordinates is to manually move a cursor to the center point of the alignment mark in the layout, then record the coordinates, and if the cursor is wrongly operated or the coordinates are wrongly recorded, exposure offset is caused, and the whole process is time-consuming and labor-consuming and has low working efficiency.
On the basis, the invention provides a counterpoint coordinate acquisition method, a storage medium and a terminal for counterpoint identification, which can solve the problems of deviation and complexity caused by manually extracting the counterpoint coordinate by automatically acquiring the counterpoint coordinate of the counterpoint identification graph in the top-level layout, and can effectively improve the accuracy and efficiency of acquiring the counterpoint coordinate.
In order that the above-recited objects, features and advantages of the present invention will become more readily apparent, a more particular description of the invention briefly described above will be rendered by reference to specific embodiments thereof which are illustrated in the appended drawings.
Fig. 1 is a schematic flow chart of acquiring alignment coordinates of an alignment mark in an embodiment of the present invention, including:
step S101, providing a top layer layout;
step S102, determining an alignment mark figure from the top layer layout, and selecting a frame to frame the alignment mark figure;
step S103, obtaining the coordinates of a plurality of frame nodes of the selected frame;
and step S104, obtaining the alignment coordinates of the alignment mark graph according to the frame node coordinates.
The following describes the steps of the alignment coordinate acquiring method of the alignment mark in detail with reference to the accompanying drawings.
Fig. 2 to fig. 5 are schematic structural diagrams of each step of a method for obtaining an alignment coordinate of an alignment mark in an embodiment of the present invention; FIG. 6 is a schematic diagram of a structure of an alignment mark pattern for selecting a non-rectangular pattern or a combined pattern for a frame in other embodiments of the present invention; fig. 7 is a schematic structural diagram of acquiring alignment coordinates of an alignment mark pattern according to another embodiment of the present invention.
Referring to fig. 2, a top level layout 100 is provided.
In this embodiment, the top layer layout 100 includes a device pattern 101 for forming a specific device structure, and an alignment mark pattern 102 serving as an alignment mark.
Referring to fig. 3, an alignment mark pattern 102 is determined from the top-level layout 100, and the alignment mark pattern 102 is framed by a selection frame 103.
In this embodiment, the method for determining the alignment mark pattern 102 from the top-level layout 100 includes: acquiring a plurality of layout figures in the top-level layout 100; and determining the alignment identification graph 102 from a plurality of layout graphs.
In this embodiment, the layout patterns in the top-level layout 100 are the device patterns 101 and the alignment mark patterns 102.
In this embodiment, the method for determining the alignment mark pattern 102 from the plurality of layout patterns includes: acquiring name information of each layout figure; and determining the alignment mark graph 102 according to the name information.
In this embodiment, the information base of each layout pattern includes name information (layer ID), size information (CD bar), wafer acceptance test information (Wafer Acceptance Test, WAT), etc., and the name information of each layout pattern is unique, so that the alignment mark pattern 102 may be determined according to the name information.
In this embodiment, after the alignment mark pattern 102 is determined, the system automatically performs frame selection on the determined alignment mark pattern 102 through the selection frame 103.
In this embodiment, the selection frame 103 is a rectangular frame, and sides of the selection frame 103 perpendicular to each other are parallel to the horizontal direction X and the vertical direction Y, respectively.
In this embodiment, when the alignment mark pattern 102 is a rectangular pattern, the selection frame 103 overlaps with the edge contour of the alignment mark pattern 102.
Referring to fig. 6, in other embodiments, when the alignment mark pattern 102 is a non-rectangular pattern or a combined pattern, the selection frame 103 surrounds the alignment mark pattern 102, and the selection frame 103 with the smallest area is selected from all the selection frames 103 capable of surrounding the alignment mark pattern 102, that is, the selection frame 103 is tangent to or overlaps with the contour of the outermost side of the alignment mark pattern 102.
Referring to fig. 4, a plurality of frame node coordinates of the selected frame 103 are obtained.
It should be noted that, in this embodiment, the frame node coordinates of the selected frame 103 are defined in advance in the system, and after the selected frame 103 frames the alignment mark pattern 102, the frame node coordinates are automatically identified and obtained.
In this embodiment, the selecting the frame node coordinates of the frame includes: a first coordinate (a, b) and a second coordinate (c, d), where the coordinate point corresponding to the first coordinate (a, b) and the coordinate point corresponding to the second coordinate (c, d) are respectively diagonal vertices in the selected frame 103.
In this embodiment, after the plurality of frame node coordinates are obtained, the alignment coordinates of the alignment mark pattern 102 are obtained according to the plurality of frame node coordinates. For specific processes, please refer to fig. 4 to fig. 5.
With continued reference to fig. 4, a plurality of coordinate variables are defined, and the values of the abscissa and the ordinate of each of the frame node coordinates in the selected frame 103 are assigned to the corresponding coordinate variables.
In this embodiment, the method for defining a plurality of coordinate variables and assigning values of an abscissa and an ordinate of the node coordinates of each frame in the selected frame to the corresponding coordinate variables includes: assigning the value of the abscissa a in said first coordinates (a, b) to a first transversal coordinate variable x1, i.e. x1=a; assigning the value of the ordinate b in said first coordinate (a, b) to a first longitudinal coordinate variable y1, i.e. y1=b; assigning a value of an abscissa c in the second coordinate (c, d) to a second transversal coordinate variable x2, i.e. x2=c, the abscissa c in the second coordinate (c, d) being larger than the abscissa a in the first coordinate (a, b); -assigning a value of an ordinate d in the second coordinate (c, d) to a second longitudinal coordinate variable y2, and y2=d, the ordinate d in the second coordinate (c, d) being larger than the ordinate b in the first coordinate (a, b).
Referring to fig. 5, the alignment coordinates (e, f) of the alignment mark pattern 102 are obtained according to a plurality of the coordinate parameters.
In this embodiment, by automatically acquiring the alignment coordinates (e, f) of the alignment mark patterns 102 in the top-level layout 100, the problems of deviation and complexity caused by manually extracting the alignment coordinates (e, f) can be solved, and the accuracy and efficiency of acquiring the alignment coordinates (e, f) can be effectively improved.
In this embodiment, the method for obtaining the alignment coordinates of the alignment mark graphic 102 according to the coordinate parameters includes: providing a first horizontal spacing dimension l1 along the horizontal direction X between the alignment coordinates (e, f) and the first coordinates (a, b); -taking said first transversal coordinate variable x1 plus said first horizontal pitch dimension l1 as the abscissa e of said alignment coordinates (e, f); providing a first vertical pitch dimension v1 along the vertical direction Y between the alignment coordinates (e, f) and the first coordinates (a, b); the first longitudinal coordinate variable y1 plus the first vertical spacing dimension v1 is taken as the ordinate f of the alignment coordinate (e, f).
In this embodiment, the first horizontal pitch dimension l1 and the first vertical pitch dimension v1 may be provided by manually setting them.
In an actual process, according to the requirement of the process on the alignment coordinate position, the first horizontal spacing dimension l1 and the first vertical spacing dimension v1 are artificially set, and then the alignment coordinate of the alignment mark pattern 102 can be obtained by calculating the first coordinate (a, b) serving as a reference with the set first horizontal spacing dimension l1 and the set first vertical spacing dimension v 1.
In this embodiment, when the alignment coordinate (e, f) is a central alignment coordinate, the method for obtaining the alignment coordinate (e, f) of the alignment mark pattern 102 according to a plurality of the coordinate parameters includes: adding the first transverse coordinate variable x1 and the second transverse coordinate variable x2 and dividing by 2 to obtain transverse coordinates e of the alignment coordinates (e, f); and adding the first longitudinal coordinate variable y1 and the second longitudinal coordinate variable y2, and dividing by 2 to obtain a longitudinal coordinate f of the alignment coordinates (e, f). Because the center alignment coordinates are the specific alignment coordinates (e, f), the center alignment coordinates can be obtained by a direct operation mode without measurement, and the efficiency of obtaining the alignment coordinates (e, f) can be further provided.
Referring to fig. 7, in other embodiments, the method for obtaining the alignment coordinates (e, f) of the alignment mark pattern 102 according to a plurality of the coordinate parameters further includes: providing a second horizontal spacing dimension l2 along the horizontal direction X between the alignment coordinates (e, f) and the second coordinates (c, d); subtracting the second horizontal pitch dimension l2 from the second lateral coordinate variable x2 as the lateral coordinate e of the alignment coordinate (e, f); providing a second vertical pitch dimension v2 along the vertical direction Y between the alignment coordinates (e, f) and the second coordinates (c, d); subtracting the second vertical pitch dimension v2 from the second longitudinal coordinate variable y2 as the ordinate f of the alignment coordinate (e, f).
Correspondingly, in an embodiment of the present invention, there is further provided a storage medium, on which computer instructions are stored, where the computer instructions execute the steps of any one of the methods described above.
Correspondingly, the embodiment of the invention also provides a terminal, which comprises a memory and a processor, wherein the memory stores computer instructions capable of running on the processor, and the terminal is characterized in that the processor executes the steps of any one of the methods when running the computer instructions.
Although the present invention is disclosed above, the present invention is not limited thereto. Various changes and modifications may be made by one skilled in the art without departing from the spirit and scope of the invention, and the scope of the invention should be assessed accordingly to that of the appended claims.
Claims (14)
1. The method for acquiring the alignment coordinates of the alignment mark is characterized by comprising the following steps:
providing a top layer layout;
determining an alignment mark graph from the top layer layout, and selecting a frame for the alignment mark graph;
acquiring a plurality of frame node coordinates of the selected frame;
and acquiring the alignment coordinates of the alignment mark graph according to the plurality of frame node coordinates.
2. The method for obtaining alignment coordinates of an alignment mark according to claim 1, wherein the method for determining an alignment mark pattern from the top-level layout comprises: obtaining a plurality of layout figures in the top layer layout; and determining the alignment identification graph from a plurality of layout graphs.
3. The method for obtaining alignment coordinates of an alignment mark according to claim 2, wherein the method for determining the alignment mark pattern from among the plurality of layout patterns comprises: acquiring name information of each layout figure; and determining an alignment identification graph according to the name information.
4. The method for obtaining alignment coordinates of an alignment mark according to claim 1, wherein the selected frame is a rectangular frame, and sides of the selected frame perpendicular to each other are parallel to a horizontal direction and a vertical direction, respectively.
5. The method for obtaining alignment coordinates of an alignment mark according to claim 4, wherein when the alignment mark pattern is a rectangular pattern, the selected frame overlaps with an edge profile of the alignment mark pattern.
6. The method for obtaining alignment coordinates of an alignment mark according to claim 4, wherein the selected border surrounds the alignment mark pattern when the alignment mark pattern is a non-rectangular pattern or a combined pattern.
7. The method for obtaining alignment coordinates of an alignment mark as claimed in claim 4, wherein selecting frame node coordinates of a frame comprises: the coordinate points corresponding to the first coordinates and the coordinate points corresponding to the second coordinates are diagonal vertexes in the selected frame respectively.
8. The method for obtaining the alignment coordinates of the alignment mark according to claim 7, wherein the method for obtaining the alignment coordinates of the alignment mark pattern according to the plurality of frame node coordinates comprises: defining a plurality of coordinate variables, and endowing the values of the abscissa and the ordinate of the node coordinates of each frame in the selected frame with the corresponding coordinate variables; and obtaining the alignment coordinates of the alignment mark graph according to a plurality of the coordinate parameters.
9. The method for obtaining the alignment coordinates of the alignment mark according to claim 8, wherein the method for defining a plurality of coordinate variables and assigning the values of the abscissa and the ordinate of the coordinates of each of the frame nodes in the selected frame to the corresponding coordinate variables comprises: assigning values of the abscissa in the first coordinates to first lateral coordinate variables; assigning a value of an ordinate in the first coordinates to a first longitudinal coordinate variable; assigning a value of an abscissa in the second coordinate to a second lateral coordinate variable, the abscissa in the second coordinate being greater than the abscissa in the first coordinate; and assigning a value of an ordinate in the second coordinate to a second longitudinal coordinate variable, wherein the ordinate in the second coordinate is larger than the ordinate in the first coordinate.
10. The method for obtaining the alignment coordinates of the alignment mark according to claim 9, wherein the method for obtaining the alignment coordinates of the alignment mark pattern according to a plurality of the coordinate parameters comprises: providing a first horizontal distance dimension along the horizontal direction between the alignment coordinate and the first coordinate; adding the first horizontal coordinate variable to the first horizontal space size to be used as the horizontal coordinate of the alignment coordinate; providing a first vertical space dimension along the vertical direction between the alignment coordinate and the first coordinate; and adding the first longitudinal coordinate variable to the first vertical interval size to be used as the ordinate of the alignment coordinate.
11. The method for obtaining the alignment coordinates of the alignment mark according to claim 9, wherein the method for obtaining the alignment coordinates of the alignment mark pattern according to a plurality of the coordinate parameters further comprises: providing a second horizontal spacing dimension along the horizontal direction between the alignment coordinate and the second coordinate; subtracting the second horizontal pitch dimension from the second lateral coordinate variable as the lateral coordinate of the alignment coordinate; providing a second vertical space dimension along the vertical direction between the alignment coordinate and the second coordinate; subtracting the second vertical pitch dimension from the second longitudinal coordinate variable as the ordinate of the alignment coordinate.
12. The method for obtaining the alignment coordinates of the alignment mark according to claim 9, wherein when the alignment coordinates are central alignment coordinates, the method for obtaining the alignment coordinates of the alignment mark pattern according to a plurality of the coordinate parameters comprises: adding the first transverse coordinate variable and the second transverse coordinate variable and dividing the added first transverse coordinate variable and the added second transverse coordinate variable by 2 to obtain transverse coordinates of the alignment coordinates; and adding the first longitudinal coordinate variable and the second longitudinal coordinate variable and dividing the added first longitudinal coordinate variable and the added second longitudinal coordinate variable by 2 to obtain the longitudinal coordinate of the alignment coordinate.
13. A storage medium having stored thereon computer instructions which, when run, perform the steps of the method of any of claims 1 to 12.
14. A terminal comprising a memory and a processor, the memory having stored thereon computer instructions executable on the processor, wherein the processor, when executing the computer instructions, performs the steps of the method of any of claims 1 to 12.
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| CN202310679479.5A CN116819916A (en) | 2023-06-07 | 2023-06-07 | Counterpoint coordinate acquisition method of counterpoint identifier, storage medium and terminal |
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| CN202310679479.5A CN116819916A (en) | 2023-06-07 | 2023-06-07 | Counterpoint coordinate acquisition method of counterpoint identifier, storage medium and terminal |
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