CN116590706A - Multilayer-structure cutter coating for cutting aluminum alloy and preparation method thereof - Google Patents
Multilayer-structure cutter coating for cutting aluminum alloy and preparation method thereof Download PDFInfo
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- CN116590706A CN116590706A CN202310557565.9A CN202310557565A CN116590706A CN 116590706 A CN116590706 A CN 116590706A CN 202310557565 A CN202310557565 A CN 202310557565A CN 116590706 A CN116590706 A CN 116590706A
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- 238000000576 coating method Methods 0.000 title claims abstract description 236
- 239000011248 coating agent Substances 0.000 title claims abstract description 232
- 238000005520 cutting process Methods 0.000 title claims abstract description 31
- 229910000838 Al alloy Inorganic materials 0.000 title claims abstract description 26
- 238000002360 preparation method Methods 0.000 title abstract description 7
- 239000000758 substrate Substances 0.000 claims abstract description 51
- 239000011159 matrix material Substances 0.000 claims abstract description 44
- 238000004544 sputter deposition Methods 0.000 claims abstract description 40
- 239000011733 molybdenum Substances 0.000 claims abstract description 27
- 229910052750 molybdenum Inorganic materials 0.000 claims abstract description 27
- 229910052804 chromium Inorganic materials 0.000 claims abstract description 23
- 239000011651 chromium Substances 0.000 claims abstract description 23
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims abstract description 21
- 229910003481 amorphous carbon Inorganic materials 0.000 claims abstract description 18
- 239000007888 film coating Substances 0.000 claims abstract description 17
- 238000009501 film coating Methods 0.000 claims abstract description 17
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 108
- 229910052786 argon Inorganic materials 0.000 claims description 54
- 238000006243 chemical reaction Methods 0.000 claims description 46
- 238000000151 deposition Methods 0.000 claims description 37
- 230000008021 deposition Effects 0.000 claims description 36
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims description 26
- 230000001105 regulatory effect Effects 0.000 claims description 23
- 239000007789 gas Substances 0.000 claims description 21
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 claims description 20
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 claims description 20
- 238000000034 method Methods 0.000 claims description 16
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 14
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 claims description 10
- 238000000227 grinding Methods 0.000 claims description 10
- 238000009832 plasma treatment Methods 0.000 claims description 10
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 claims description 9
- 229910010271 silicon carbide Inorganic materials 0.000 claims description 9
- 238000001816 cooling Methods 0.000 claims description 8
- CXOWYMLTGOFURZ-UHFFFAOYSA-N azanylidynechromium Chemical compound [Cr]#N CXOWYMLTGOFURZ-UHFFFAOYSA-N 0.000 claims description 7
- 229910052757 nitrogen Inorganic materials 0.000 claims description 7
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 5
- 244000137852 Petrea volubilis Species 0.000 claims description 5
- 238000004140 cleaning Methods 0.000 claims description 5
- 238000005238 degreasing Methods 0.000 claims description 5
- 238000007599 discharging Methods 0.000 claims description 5
- 238000001035 drying Methods 0.000 claims description 5
- 239000001257 hydrogen Substances 0.000 claims description 5
- 229910052739 hydrogen Inorganic materials 0.000 claims description 5
- 125000004435 hydrogen atom Chemical class [H]* 0.000 claims description 5
- 238000004519 manufacturing process Methods 0.000 claims description 5
- 238000005498 polishing Methods 0.000 claims description 5
- 238000004506 ultrasonic cleaning Methods 0.000 claims description 5
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 4
- 239000001301 oxygen Substances 0.000 claims description 4
- 229910052760 oxygen Inorganic materials 0.000 claims description 4
- 238000007781 pre-processing Methods 0.000 claims description 3
- 239000010410 layer Substances 0.000 abstract description 33
- 229910052710 silicon Inorganic materials 0.000 abstract description 7
- 238000005229 chemical vapour deposition Methods 0.000 abstract description 6
- 239000010703 silicon Substances 0.000 abstract description 6
- 230000037452 priming Effects 0.000 abstract description 5
- 239000002356 single layer Substances 0.000 abstract description 4
- 239000000126 substance Substances 0.000 abstract description 4
- 230000000694 effects Effects 0.000 abstract description 3
- 210000002381 plasma Anatomy 0.000 abstract 1
- 230000000052 comparative effect Effects 0.000 description 15
- 239000000047 product Substances 0.000 description 15
- 238000011049 filling Methods 0.000 description 12
- 238000012360 testing method Methods 0.000 description 8
- 238000011161 development Methods 0.000 description 4
- 238000007373 indentation Methods 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 230000006911 nucleation Effects 0.000 description 4
- 238000010899 nucleation Methods 0.000 description 4
- 238000001069 Raman spectroscopy Methods 0.000 description 3
- 238000001514 detection method Methods 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 238000005299 abrasion Methods 0.000 description 2
- 230000004888 barrier function Effects 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 238000011068 loading method Methods 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 230000001737 promoting effect Effects 0.000 description 2
- 230000003746 surface roughness Effects 0.000 description 2
- 238000007545 Vickers hardness test Methods 0.000 description 1
- 238000007792 addition Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 150000001721 carbon Chemical group 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 239000012467 final product Substances 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000011017 operating method Methods 0.000 description 1
- 231100000241 scar Toxicity 0.000 description 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
- C23C28/32—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer
- C23C28/322—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer only coatings of metal elements only
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
- C23C14/0036—Reactive sputtering
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
- C23C14/021—Cleaning or etching treatments
- C23C14/022—Cleaning or etching treatments by means of bombardment with energetic particles or radiation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0641—Nitrides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
- C23C14/165—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon by cathodic sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/26—Deposition of carbon only
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/32—Carbides
- C23C16/325—Silicon carbide
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
- C23C28/34—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates
- C23C28/341—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates with at least one carbide layer
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
- C23C28/34—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates
- C23C28/343—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates with at least one DLC or an amorphous carbon based layer, the layer being doped or not
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/10—Greenhouse gas [GHG] capture, material saving, heat recovery or other energy efficient measures, e.g. motor control, characterised by manufacturing processes, e.g. for rolling metal or metal working
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
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- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
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Abstract
The invention relates to a cutting tool coating with a multilayer structure for cutting aluminum alloy and a preparation method thereof, belonging to the technical field of preparation of cutting tool coatings. The invention adopts plasmas to bombard the surface of a substrate, increases the roughness of the surface of the substrate, improves the activity of the surface of the substrate, adopts sputtering priming and chemical vapor deposition, prepares a matrix bonding layer and a chromium nitride-silicon carbide-molybdenum coating on a cutter and takes the matrix bonding layer and the chromium nitride-silicon carbide-molybdenum coating as an intermediate layer, then deposits a tetrahedral amorphous carbon film coating on the intermediate layer, relieves the internal stress existing in the single-layer coating due to the difference of chemical components by using a multi-layer structure, provides larger dislocation resistance, effectively blocks the expansion of cracks, further improves the toughness of the coating, further improves the bonding strength of the coating, and prepares the cutter coating with a multi-layer structure with excellent bonding strength, high hardness and wear resistance.
Description
Technical Field
The invention belongs to the technical field of cutter coating preparation, and particularly relates to a multilayer structure cutter coating for cutting aluminum alloy and a preparation method thereof.
Background
With the rapid development of modern manufacturing, more and more difficult-to-machine materials are used to manufacture structural components, and conventional cutting tools have been difficult to adapt for the machining of new materials. In recent years, cutting tools for cutting aluminum alloys having a coating layer have been in the market in a brand-new form due to their excellent cutting performance and wide development prospects. Coated tools for cutting aluminum alloys face two major development limitations in industrial applications: the bonding strength between the coating and the tool substrate is insufficient and the wear resistance of the coating surface is weak. To solve the development problem of coated tools, we propose to first improve the adhesion of the coating, and the key of this is to improve the bond strength between the intermediate layer and the tool substrate.
Based on this, there is a need for a tool coating that overcomes the shortcomings of prior coated tools for cutting aluminum alloys.
Disclosure of Invention
The invention aims to provide a multilayer structure cutter coating for cutting aluminum alloy and a preparation method thereof, wherein plasma is adopted to bombard the surface of a substrate, the roughness of the surface of the substrate is increased, the activity of the surface of the substrate is improved, then sputtering priming and chemical vapor deposition are adopted to prepare a matrix bonding layer and a chromium nitride-silicon carbide-molybdenum coating on the cutter, the matrix bonding layer and the chromium nitride-silicon carbide-molybdenum coating are used as an intermediate layer, then a tetrahedral amorphous carbon film is deposited on the intermediate layer, the internal stress existing in the single-layer coating due to the difference of chemical components is relieved by the existence of a multilayer structure, the dislocation resistance is further increased, the crack expansion is effectively hindered, the toughness of the coating is further improved, the bonding strength of the coating is further improved, and the problem that the bonding strength, the hardness and the wear resistance of the multilayer structure cutter coating in the prior art are weak is solved.
The aim of the invention can be achieved by the following technical scheme:
the multi-layer structure cutter coating for cutting aluminum alloy comprises a matrix combination coating, wherein the matrix combination coating is arranged on the surface of a cutter sample, and a first intermediate coating, a second intermediate coating, a third intermediate coating and a surface coating are sequentially arranged on the matrix combination coating.
A method for preparing a multilayer structured tool coating for cutting aluminum alloys, the method comprising the steps of:
s10, preparing a cutter sample, and preprocessing the cutter sample to obtain a preprocessed matrix;
s20, placing the pretreated substrate into a reaction chamber, vacuumizing the reaction chamber, introducing gas to fully fill the reaction chamber, repeating the steps for 2 times, adjusting an air inlet valve after the reaction chamber is fully filled, and then discharging a radio frequency power supply to perform plasma bombardment on the surface of the substrate to obtain a substrate after plasma treatment;
s30, sequentially preparing coatings on the substrate after plasma treatment;
s40, stopping the reaction after the coating is prepared, cooling the temperature in the furnace to room temperature, and taking out to obtain a finished product.
Further, the preprocessing step in step S10 is as follows: and (3) degreasing, grinding and polishing the surface of the cutter sample by sand paper, cleaning the surface by alcohol, performing ultrasonic cleaning for 20-30min, and drying at the temperature of 100-110 ℃.
Further, in step S20, the reaction chamber is a reaction chamber of a plasma apparatus; the gas is argon; the air inlet valve is adjusted to ensure that the vacuum degree of the reaction chamber is stabilized at 50-100Pa; the frequency of the radio frequency power supply discharge is 13-15Mhz, and the power is 1-1.2kW; the plasma is one of oxygen plasma and argon plasma, and is consistent with the gas element introduced into the reaction chamber.
Further, the time of the plasma bombardment in the step S20 is 10-15min;
further, the preparing the coating in step S30 is:
s31, preparing a matrix bonding coating: argon is introduced into the furnace chamber, the sputtering voltage and the bias voltage of the chromium target are regulated, and the sputtering of the chromium coating is carried out, namely the substrate bonding coating is obtained;
s32, preparing a first intermediate coating: introducing nitrogen into the furnace chamber, adjusting the sputtering voltage and bias voltage of the chromium target, and sputtering the chromium nitride coating to obtain a first intermediate coating;
s33, preparing a second intermediate coating: adopting mixed gas composed of acetylene, monosilane and hydrogen, regulating the deposition pressure and temperature in the furnace, and performing silicon carbide coating deposition to obtain a second intermediate coating;
s34, preparing a third intermediate coating: adopting mixed gas composed of molybdenum and argon, regulating the deposition pressure and temperature in the furnace, and performing molybdenum coating deposition to obtain a third intermediate coating;
s35, preparing a surface coating: and (3) adopting mixed gas composed of acetylene and argon, regulating the deposition pressure and temperature in the furnace, and performing tetrahedral amorphous carbon film coating deposition to obtain the surface coating.
Further, the argon flow in the step S31 is 50-80sccm; the sputtering voltage and the bias voltage are 320-350V and 130-150V respectively; the thickness of the matrix bonding coating is 5-10 mu m.
Further, in the step S32, the flow rate of the nitrogen is 70-100sccm; the sputtering voltage and the bias voltage are respectively 350-360V and 150-170V; the thickness of the first intermediate coating is 8-10 mu m.
Further, the deposition pressure and the temperature in the furnace in the step S33 are respectively 5-5.2kPa and 1100-1250 ℃; the acetylene flow is 3-3.5mL/min, and the monosilane flow is 9-10mL/min; the thickness of the second intermediate coating is 6-10 mu m.
Further, the deposition pressure and the temperature in the furnace in the step S34 are respectively 35-40Pa and 850-900 ℃; the molybdenum is carried in by argon after being gasified by molybdenum powder; the argon flow is 7-8sccm; the thickness of the third intermediate coating is 8-10 mu m.
Further, the deposition pressure in the furnace in the step S35 is 0.05-1.3Pa, and the temperature is 80-200 ℃; the acetylene is carried in by argon; the argon flow is 50-60sccm; the thickness of the surface coating is 10-20 mu m.
The invention has the beneficial effects that:
(1) The invention adopts equal partsThe method comprises the steps of bombarding the surface of a substrate by using ions, increasing the roughness of the surface of the substrate, improving the activity of the surface of the substrate, preparing a matrix bonding layer and a chromium nitride-silicon carbide-molybdenum coating on a cutter by adopting sputtering priming and chemical vapor deposition, taking the matrix bonding layer and the chromium nitride-silicon carbide-molybdenum coating as intermediate layers, then depositing a tetrahedral amorphous carbon film coating on the intermediate layers, relieving internal stress existing in the single-layer coating due to chemical composition difference by using the existence of a multi-layer structure, providing larger dislocation resistance, effectively preventing crack expansion, further improving the toughness of the coating, further improving the bonding strength of the coating, and preparing the multi-layer structure cutter coating with excellent bonding strength, high hardness and wear resistance, wherein sp is as follows 3 The bond content is more than 70%.
(2) The invention is provided with a substrate bonding layer to improve the bonding force between the coating and the substrate, and the coating releases stress during temperature conversion, so that the expansion coefficient between the substrate and the coating is inconsistent, the coating is easy to fall off, but sputtering a chromium bonding layer in the coating for priming can greatly improve the bonding force between the coating and the substrate. Secondly, the first intermediate coating is a chromium nitride coating, which can play a role in supporting the upper and lower parts, and the auxiliary matrix bonding layer further improves the bonding force between the second intermediate coating and the third intermediate coating and the matrix layer; the second intermediate coating is a silicon carbide coating with sp between carbon atoms and silicon atoms 3 The bonding forms stable compounds, so that the silicon carbide has high-temperature stability and high-hardness performance, can be used as a diffusion barrier layer, and further improves the mechanical locking force of a matrix; the molybdenum coating is set as the third intermediate coating, and the nucleation rate of the tetrahedral amorphous carbon film coating is improved due to the remarkable nucleation promoting capability of the molybdenum coating, so that the growth rate of the tetrahedral amorphous carbon film coating is accelerated, on the premise that the matrix coating has excellent adhesion, the tetrahedral amorphous carbon film coating is easier to deposit on the surface of the molybdenum coating, the particle size of the deposited tetrahedral amorphous carbon film coating is finer, namely the surface roughness of the matrix is remarkably reduced, and meanwhile, the hardness and the wear resistance of the cutter are increased due to the characteristics of high hardness and remarkably reduced friction coefficient of the tetrahedral amorphous carbon film coating.
Drawings
In order to more clearly illustrate the technical solutions of the embodiments of the present invention, the drawings that are needed for the description of the embodiments will be briefly described below, and it is obvious that the drawings in the following description are only some embodiments of the present invention, and that other drawings may be obtained according to these drawings without inventive effort for a person skilled in the art.
FIG. 1 is a schematic representation of Rockwell indentation between a coating and a substrate of the final product according to example 3 of the present invention;
FIG. 2 shows the appearance of the grinding marks on the surface of the sample observed after the end of the abrasion resistance test of the finished product prepared in example 3 of the present invention.
Detailed Description
The technical solutions of the embodiments of the present invention will be clearly and completely described below in conjunction with the embodiments of the present invention, and it is apparent that the described embodiments are only some embodiments of the present invention, not all embodiments. All other embodiments, which can be made by those skilled in the art based on the embodiments of the invention without making any inventive effort, are intended to be within the scope of the invention.
Example 1
The multi-layer structure cutter coating for cutting aluminum alloy comprises a matrix combination coating, wherein the matrix combination coating is arranged on the surface of a cutter sample, and a first intermediate coating, a second intermediate coating, a third intermediate coating and a surface coating are sequentially arranged on the matrix combination coating.
A method for preparing a multilayer structured tool coating for cutting aluminum alloys, the method comprising the steps of:
s10, preparing a cutter sample, degreasing, grinding and polishing the surface of the cutter sample by sand paper, cleaning the surface by alcohol, performing ultrasonic cleaning of 20mi n, and drying at the temperature of 105 ℃ to obtain a pretreated substrate;
s20, placing the pretreated substrate into a reaction chamber of plasma equipment, vacuumizing the reaction chamber, filling argon into the reaction chamber, vacuumizing the reaction chamber after filling the reaction chamber, filling the reaction chamber with argon, regulating an air inlet valve after filling the reaction chamber to enable the vacuum degree of the reaction chamber to be stabilized at 75Pa, and then discharging by a radio frequency power supply with the frequency of 15Mhz and the power of 1kW to bombard the surface of the substrate by oxygen plasma to obtain the substrate after plasma treatment;
s30, placing the substrate after plasma treatment into a chemical vapor deposition furnace, vacuumizing, opening a circulating cooling system, and sequentially preparing a coating:
s31, preparing a matrix bonding coating: argon is introduced into the furnace chamber, the sputtering voltage and the bias voltage of the chromium target are regulated, and the sputtering of the chromium coating is carried out, namely the substrate bonding coating is obtained;
the argon flow is 50sccm; the sputtering voltage is 350V, and the sputtering bias voltage is 140V; the thickness of the matrix bonding coating is 8 mu m;
s32, preparing a first intermediate coating: introducing nitrogen into the furnace chamber, adjusting the sputtering voltage and bias voltage of the chromium target, and sputtering the chromium nitride coating to obtain a first intermediate coating;
the argon flow is 70sccm; the sputtering voltage is 350V, and the sputtering bias voltage is 160V; the thickness of the first intermediate coating is 9 μm;
s33, preparing a second intermediate coating: adopting mixed gas composed of acetylene, monosilane and hydrogen, regulating the deposition pressure in the furnace to be 5.1kP and the temperature to be 1100 ℃, and performing silicon carbide coating deposition to obtain a second intermediate coating;
the acetylene flow is 3.5mL/min, and the monosilane flow is 9mL/min; the thickness of the second intermediate coating is 8 μm;
s34, preparing a third intermediate coating: adopting mixed gas composed of molybdenum and argon, regulating the deposition pressure in the furnace to 40Pa and the temperature to 850 ℃, and performing molybdenum coating deposition to obtain a third intermediate coating;
the molybdenum is carried in by argon after being gasified by molybdenum powder; the argon flow is 7sccm; the thickness of the third intermediate coating is 9 μm;
s35, preparing a surface coating: adopting mixed gas composed of acetylene and argon, regulating the deposition pressure in the furnace to be 0.05Pa, and performing tetrahedral amorphous carbon film coating deposition at 200 ℃ to obtain a surface coating;
the acetylene is carried in by argon; the argon flow is 50sccm; the surface coating thickness was 15 μm.
S40, stopping the reaction after the coating is prepared, cooling the temperature in the furnace to room temperature, and taking out to obtain a finished product.
Detection of finished product sp using Raman spectrometer 3 Bond content, detected, finished product sp 3 The bond content reaches 81.52%.
Example 2
The multi-layer structure cutter coating for cutting aluminum alloy comprises a matrix combination coating, wherein the matrix combination coating is arranged on the surface of a cutter sample, and a first intermediate coating, a second intermediate coating, a third intermediate coating and a surface coating are sequentially arranged on the matrix combination coating.
A method for preparing a multilayer structured tool coating for cutting aluminum alloys, the method comprising the steps of:
s10, preparing a cutter sample, degreasing, grinding and polishing the surface of the cutter sample by sand paper, cleaning the surface by alcohol, performing ultrasonic cleaning at 25mi, and drying at a temperature of 100 ℃ to obtain a pretreated substrate;
s20, placing the pretreated substrate into a reaction chamber of plasma equipment, vacuumizing the reaction chamber, filling argon into the reaction chamber, vacuumizing the reaction chamber after filling the reaction chamber, filling the reaction chamber with argon, regulating an air inlet valve after filling the reaction chamber to enable the vacuum degree of the reaction chamber to be stabilized at 100Pa, and then bombarding the surface 13mi of the substrate with argon plasma by discharging with a radio frequency power supply with the frequency of 14Mhz and the power of 1.2kW to obtain the substrate after plasma treatment;
s30, placing the substrate after plasma treatment into a chemical vapor deposition furnace, vacuumizing, opening a circulating cooling system, and sequentially preparing a coating:
s31, preparing a matrix bonding coating: argon is introduced into the furnace chamber, the sputtering voltage and the bias voltage of the chromium target are regulated, and the sputtering of the chromium coating is carried out, namely the substrate bonding coating is obtained;
the argon flow is 65sccm; the sputtering voltage is 320V, and the sputtering bias voltage is 130V; the thickness of the matrix bonding coating is 5 mu m;
s32, preparing a first intermediate coating: introducing nitrogen into the furnace chamber, adjusting the sputtering voltage and bias voltage of the chromium target, and sputtering the chromium nitride coating to obtain a first intermediate coating;
the argon flow is 100sccm; the sputtering voltage is 350V, and the sputtering bias voltage is 150V; the thickness of the first intermediate coating is 8 μm;
s33, preparing a second intermediate coating: adopting mixed gas composed of acetylene, monosilane and hydrogen, regulating the deposition pressure in the furnace to be 5.25kP and the temperature to be 1200 ℃, and performing silicon carbide coating deposition to obtain a second intermediate coating;
the acetylene flow is 3 mL/min, and the monosilane flow is 10mL/min; the thickness of the second intermediate coating is 6 μm;
s34, preparing a third intermediate coating: adopting mixed gas composed of molybdenum and argon, regulating the deposition pressure in the furnace to 38Pa and the temperature to 870 ℃, and performing molybdenum coating deposition to obtain a third intermediate coating;
the molybdenum is carried in by argon after being gasified by molybdenum powder; the argon flow is 7.5sccm; the thickness of the third intermediate coating is 10 μm;
s35, preparing a surface coating: adopting mixed gas composed of acetylene and argon, regulating the deposition pressure in the furnace to be 0.7Pa, and performing tetrahedral amorphous carbon film coating deposition at 80 ℃ to obtain a surface coating;
the acetylene is carried in by argon; the argon flow is 60sccm; the surface coating thickness was 20 μm.
S40, stopping the reaction after the coating is prepared, cooling the temperature in the furnace to room temperature, and taking out to obtain a finished product.
Detection of finished product sp using Raman spectrometer 3 Bond content, detected, finished product sp 3 The bond content reaches 81.84%.
Example 3
The multi-layer structure cutter coating for cutting aluminum alloy comprises a matrix combination coating, wherein the matrix combination coating is arranged on the surface of a cutter sample, and a first intermediate coating, a second intermediate coating, a third intermediate coating and a surface coating are sequentially arranged on the matrix combination coating.
A method for preparing a multilayer structured tool coating for cutting aluminum alloys, the method comprising the steps of:
s10, preparing a cutter sample, degreasing, grinding and polishing the surface of the cutter sample by sand paper, cleaning the surface by alcohol, performing ultrasonic cleaning for 30min, and drying at a temperature of 110 ℃ to obtain a pretreated substrate;
s20, placing the pretreated substrate into a reaction chamber of plasma equipment, vacuumizing the reaction chamber, filling argon into the reaction chamber, vacuumizing the reaction chamber after filling the reaction chamber, filling the reaction chamber with argon, regulating an air inlet valve after filling the reaction chamber to enable the vacuum degree of the reaction chamber to be stabilized at 50Pa, and then discharging by a radio frequency power supply with the frequency of 13Mhz and the power of 1.1kW to bombard the surface of the substrate by oxygen plasma for 10min to obtain the substrate after plasma treatment;
s30, placing the substrate after plasma treatment into a chemical vapor deposition furnace, vacuumizing, opening a circulating cooling system, and sequentially preparing a coating:
s31, preparing a matrix bonding coating: argon is introduced into the furnace chamber, the sputtering voltage and the bias voltage of the chromium target are regulated, and the sputtering of the chromium coating is carried out, namely the substrate bonding coating is obtained;
the argon flow is 80sccm; the sputtering voltage is 335V, and the sputtering bias voltage is 150V; the thickness of the matrix bonding coating is 10 mu m;
s32, preparing a first intermediate coating: introducing nitrogen into the furnace chamber, adjusting the sputtering voltage and bias voltage of the chromium target, and sputtering the chromium nitride coating to obtain a first intermediate coating;
the argon flow is 85sccm; the sputtering voltage and the bias voltage are 360V and 170V respectively; the thickness of the first intermediate coating is 10 μm;
s33, preparing a second intermediate coating: adopting mixed gas composed of acetylene, monosilane and hydrogen, regulating the deposition pressure in the furnace to be 5kP and the temperature to be 1250 ℃, and performing silicon carbide coating deposition to obtain a second intermediate coating;
the acetylene flow is 3.2mL/min, and the monosilane flow is 9.5mL/min; the thickness of the second intermediate coating is 10 μm;
s34, preparing a third intermediate coating: adopting mixed gas composed of molybdenum and argon, regulating the deposition pressure in the furnace to 35Pa and the temperature to 900 ℃, and performing molybdenum coating deposition to obtain a third intermediate coating;
the molybdenum is carried in by argon after being gasified by molybdenum powder; the argon flow is 8sccm; the thickness of the third intermediate coating is 8 μm;
s35, preparing a surface coating: adopting mixed gas composed of acetylene and argon, regulating the deposition pressure in the furnace to be 1.3Pa, and performing tetrahedral amorphous carbon film coating deposition at 140 ℃ to obtain a surface coating;
the acetylene is carried in by argon; the argon flow is 55sccm; the thickness of the surface coating is 10 μm.
S40, stopping the reaction after the coating is prepared, cooling the temperature in the furnace to room temperature, and taking out to obtain a finished product.
Detection of finished product sp using Raman spectrometer 3 Bond content, detected, finished product sp 3 The bond content reaches 81.91%.
Fig. 1 is a schematic diagram of a rockwell indentation between a coating and a substrate of the finished product prepared in this example.
The finished product prepared by the embodiment is tested for friction resistance by adopting a reciprocating friction and wear testing machine, wherein the normal load is 5N, the single-pass friction distance is 5mm, the reciprocating frequency is 2Hz, the friction time is 1200s, and after the test is finished, the appearance of grinding marks on the surface of the sample is observed, and the image of the grinding marks is shown in figure 2.
Comparative example 1
In comparison with example 3, no matrix bond coat was prepared, and the remaining parameters and operating procedures were unchanged.
Comparative example 2
In comparison with example 3, no first intermediate coating was prepared, and the remaining parameters and operating steps were unchanged.
Comparative example 3
In contrast to example 3, no second intermediate coating was prepared, and the remaining parameters and operating steps were unchanged.
Comparative example 4
In comparison with example 3, no third intermediate coating was prepared, and the remaining parameters and operating steps were unchanged.
Test example 1
The adhesion between the coatings of examples 1-3 and comparative examples 1-4 and the substrate was tested by the Rockwell indentation test using a digital display Rockwell hardness tester model HRS-150. Wherein, the load of the digital Rockwell hardness tester is 150kgf, the load holding time is 15s, and the bonding strength grade between the coating and the substrate is judged according to the conditions of crack and peeling of the indentation edge and the bonding strength grade of the reference VDI3198, and the results are shown in Table 1.
TABLE 1
| Bond strength grade | |
| Example 1 | HF1 |
| Example 2 | HF1 |
| Example 3 | HF1 |
| Comparative example 1 | HF4 |
| Comparative example 2 | HF4 |
| Comparative example 3 | HF3 |
| Comparative example 4 | HF3 |
As shown in Table 1, the coating of the multi-layer structured tool prepared by the present invention has excellent bonding force between the coating and the substrate. The invention is provided with a substrate bonding layer, and when the temperature is converted, the coating releases stress, so that the expansion coefficient between the substrate and the coating is inconsistent, the coating is easy to fall off, and the bonding force between the coating and the substrate can be greatly increased by sputtering a chromium bonding layer in the coating for priming; secondly, the first intermediate coating is a chromium nitride coating which can play a role in supporting the upper and lower parts, and the auxiliary matrix bonding layer further improves the bonding force between the second intermediate coating and the third intermediate coating and the matrix layer; in addition, the coating is of a multi-layer structure, the internal stress of the single-layer coating due to the difference of chemical components is relieved, larger dislocation resistance is provided, crack propagation is effectively prevented, the toughness of the coating is further improved, and the bonding strength of the coating is further improved.
Test example 2
(1) The finished products prepared in examples 1 to 3 and comparative examples 1 to 4 were subjected to surface microscopic vickers hardness test using a vickers hardness tester. In the test, the average value was obtained 5 times for each sample using a diamond indenter of a regular rectangular pyramid type with a loading force of 1.96N and a loading time of 15s, and the results are shown in table 2.
(2) The finished products prepared in examples 1-3 and comparative examples 1-4 were subjected to friction resistance with a normal load of 5N, a single pass friction distance of 5mm, a reciprocating frequency of 2Hz, and a friction time of 1200s by using a reciprocating frictional wear testing machine, and the performance was expressed in terms of wear volume, and the calculation formula of the wear volume was as follows:
W V ＝Lh(3h 2 +4b 2 )/6b
wherein WV is the abrasion volume of the sample in mm 3 The method comprises the steps of carrying out a first treatment on the surface of the L is the total grinding mark length, h is the grinding mark depth,b is the wear scar width.
The results are shown in Table 2.
TABLE 2
| Surface micro Vickers Hardness (HV) | Wear volume (mm) 3 ) | |
| Example 1 | 2603 | 0.00169 |
| Example 2 | 2615 | 0.00162 |
| Example 3 | 2622 | 0.00157 |
| Comparative example 1 | 2254 | 0.00193 |
| Comparative example 2 | 2396 | 0.00198 |
| Comparative example 3 | 2097 | 0.00210 |
| Comparative example 4 | 2010 | 0.00219 |
As shown in Table 2, the multilayer structured tool coating prepared by the present invention is excellent in hardness and wear resistance. The second intermediate coating is silicon carbide coating with sp between carbon atom and silicon atom 3 The bonding forms stable compounds, so that the silicon carbide has high-temperature stability and high-hardness performance, can be used as a diffusion barrier layer, and further improves the mechanical locking force of a matrix; the molybdenum coating is set as the third intermediate coating, and the nucleation rate of the tetrahedral amorphous carbon film coating is improved due to the remarkable nucleation promoting capability of the molybdenum coating, so that the growth rate of the tetrahedral amorphous carbon film coating is accelerated, on the premise that the matrix coating has excellent adhesion, the tetrahedral amorphous carbon film coating is easier to deposit on the surface of the molybdenum coating, the particle size of the deposited tetrahedral amorphous carbon film coating is finer, namely the surface roughness of the matrix is remarkably reduced, and meanwhile, the hardness and the wear resistance of the cutter are increased due to the characteristics of high hardness and remarkably reduced friction coefficient of the tetrahedral amorphous carbon film coating.
In the description of the present specification, the descriptions of the terms "one embodiment," "example," "specific example," and the like, mean that a particular feature, structure, material, or characteristic described in connection with the embodiment or example is included in at least one embodiment or example of the present invention. In this specification, schematic representations of the above terms do not necessarily refer to the same embodiments or examples. Furthermore, the particular features, structures, materials, or characteristics described may be combined in any suitable manner in any one or more embodiments or examples.
The foregoing is merely illustrative and explanatory of the principles of the invention, as various modifications and additions may be made to the specific embodiments described, or similar thereto, by those skilled in the art, without departing from the principles of the invention or beyond the scope of the appended claims.
Claims (10)
1. The multi-layer structure cutter coating for cutting the aluminum alloy is characterized by comprising a matrix combined coating, wherein the matrix combined coating is arranged on the surface of a cutter sample, and a first intermediate coating, a second intermediate coating, a third intermediate coating and a surface coating are sequentially arranged on the matrix combined coating.
2. A method for producing a multilayer structured tool coating for cutting aluminum alloys according to claim 1, characterized by comprising the steps of:
s10, preparing a cutter sample, and preprocessing the cutter sample to obtain a preprocessed matrix;
s20, placing the pretreated substrate into a reaction chamber, vacuumizing the reaction chamber, introducing gas to fully fill the reaction chamber, repeating the steps for 2 times, adjusting an air inlet valve after the reaction chamber is fully filled, and then discharging a radio frequency power supply to perform plasma bombardment on the surface of the substrate to obtain a substrate after plasma treatment;
s30, sequentially preparing coatings on the substrate after plasma treatment;
s40, stopping the reaction after the coating is prepared, cooling the temperature in the furnace to room temperature, and taking out to obtain a finished product.
3. The method for preparing a multi-layered structured tool coating for cutting aluminum alloy according to claim 2, wherein the pretreatment step of step S10 is as follows: and (3) degreasing, grinding and polishing the surface of the cutter sample by sand paper, cleaning the surface by alcohol, performing ultrasonic cleaning for 20-30min, and drying at the temperature of 100-110 ℃.
4. The method for producing a multilayered structure tool coating for cutting aluminum alloy according to claim 2, wherein the reaction chamber of step S20 is a reaction chamber of a plasma apparatus; the gas is argon; the air inlet valve is adjusted to ensure that the vacuum degree of the reaction chamber is stabilized at 50-100Pa; the frequency of the radio frequency power supply discharge is 13-15Mhz, and the power is 1-1.2kW; the plasma is one of oxygen plasma and argon plasma, and is consistent with the gas element introduced into the reaction chamber.
5. The method for preparing a multi-layered structured tool coating for cutting aluminum alloy according to claim 2, wherein the preparing the coating in step S30 is:
s31, preparing a matrix bonding coating: argon is introduced into the furnace chamber, the sputtering voltage and the bias voltage of the chromium target are regulated, and the sputtering of the chromium coating is carried out, namely the substrate bonding coating is obtained;
s32, preparing a first intermediate coating: introducing nitrogen into the furnace chamber, adjusting the sputtering voltage and bias voltage of the chromium target, and sputtering the chromium nitride coating to obtain a first intermediate coating;
s33, preparing a second intermediate coating: adopting mixed gas composed of acetylene, monosilane and hydrogen, regulating the deposition pressure and temperature in the furnace, and performing silicon carbide coating deposition to obtain a second intermediate coating;
s34, preparing a third intermediate coating: adopting mixed gas composed of molybdenum and argon, regulating the deposition pressure and temperature in the furnace, and performing molybdenum coating deposition to obtain a third intermediate coating;
s35, preparing a surface coating: and (3) adopting mixed gas composed of acetylene and argon, regulating the deposition pressure and temperature in the furnace, and performing tetrahedral amorphous carbon film coating deposition to obtain the surface coating.
6. The method for preparing a multi-layer structured tool coating for cutting aluminum alloy according to claim 5, wherein the argon flow in step S31 is 50-80sccm; the sputtering voltage and the bias voltage are 320-350V and 130-150V respectively; the thickness of the matrix bonding coating is 5-10 mu m.
7. The method for producing a multilayered structure tool coating for cutting aluminum alloy according to claim 5, wherein the nitrogen flow in step S32 is 70-100sccm; the sputtering voltage and the bias voltage are respectively 350-360V and 150-170V; the thickness of the first intermediate coating is 8-10 mu m.
8. The method for preparing a multi-layer structured tool coating for cutting aluminum alloy according to claim 5, wherein the deposition pressure and temperature in the furnace in step S33 are 5-5.2kPa and 1100-1250 ℃, respectively; the acetylene flow is 3-3.5mL/min, and the monosilane flow is 9-10mL/min; the thickness of the second intermediate coating is 6-10 mu m.
9. The method for preparing a multi-layer structured tool coating for cutting aluminum alloy according to claim 5, wherein the deposition pressure and temperature in the furnace in step S34 are 35-40Pa and 850-900 ℃, respectively; the molybdenum is carried in by argon after being gasified by molybdenum powder; the argon flow is 7-8sccm; the thickness of the third intermediate coating is 8-10 mu m.
10. The method for preparing a multilayered cutter coating for cutting aluminum alloy according to claim 5, wherein the deposition pressure in the furnace in step S35 is 0.05-1.3Pa, and the temperature is 80-200 ℃; the acetylene is carried in by argon; the argon flow is 50-60sccm; the thickness of the surface coating is 10-20 mu m.
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