CN108559957B - A kind of titanium alloy cutting cutter material and preparation method thereof with PVD coating - Google Patents
A kind of titanium alloy cutting cutter material and preparation method thereof with PVD coating Download PDFInfo
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- CN108559957B CN108559957B CN201810372099.6A CN201810372099A CN108559957B CN 108559957 B CN108559957 B CN 108559957B CN 201810372099 A CN201810372099 A CN 201810372099A CN 108559957 B CN108559957 B CN 108559957B
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
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- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
- C23C14/325—Electric arc evaporation
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- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
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- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
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- C23C14/0057—Reactive sputtering using reactive gases other than O2, H2O, N2, NH3 or CH4
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- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
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- C23C14/024—Deposition of sublayers, e.g. to promote adhesion of the coating
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- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
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- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0641—Nitrides
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- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
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- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/18—Metallic material, boron or silicon on other inorganic substrates
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- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
- C23C28/32—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
- C23C28/34—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates
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- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
- C23C28/34—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates
- C23C28/347—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates with layers adapted for cutting tools or wear applications
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Abstract
The present invention relates to a kind of titanium alloy cutting cutter material and preparation method thereof with PVD coating, prepares multi-element coating using the cathodic arc evaporation technique in physical vapour deposition (PVD) PVD, comprising: carries out polished and cleaned to sample cutter;Prepare TiN bond coating;Prepare TiCNO and TiCN multi-element coating;Protective coating is prepared, can be TiAlZr/TiAlZrCr coating, TiAlZr/CrN coating, TiAlZr/ZrN coating, TiAl/CrN coating or TiAl/TiAlCr coating.A variety of alloying elements are added in cutter coat in the present invention, multi-element coating system is formed, improves the hardness of coating, improve the wearability and toughness of coating, are reduced and the bonding of titanium alloy tendency and coefficient of friction.Meanwhile there is cutter resistance to mechanical impact and good thermal stability, good combination property effectively to extend titanium alloy cutting cutting-tool's used life.
Description
Technical field
The present invention relates to metal cutting investigation of materials field, in particular to a kind of titanium alloy cutting knife with PVD coating
Has material and preparation method thereof.
Background technique
With the development of Machine Manufacturing Technology, foreign-made had started largely already using high cutting speed, high feed speed
With automobile and the airplane industry field of the Novel numerical control machine of high structural rigidity, such as mass production.And these are high performance
Lathe puts forward new requirements the material, coating process and cutter structure of cutter.
Currently, hard alloy coating technology is broadly divided into physical gas phase deposition technology (PVD) and chemical vapor deposition
(CVD), the abrasion resistant protective coating of single-layer or multi-layer being made of hard material is applied to by CVD or PVD process described
In main body.PVD process includes magnetron sputtering, arc vapor deposition (electric arc PVD), ion plating, electron-beam vapor deposition and laser
Ablation.However, the product hardness using PVD preparation process is low compared with the product by CVD preparation process, coating film-substrate cohesion also compared with
It is low.In addition, the performance of the coating of cutting element is related to the design of its protective coating, currently, the coating material of high speed cutting tool
In material, most widely used coating is TiN.According to incompletely statistics, utilization rate of the TiN coating on high-speed steel tool be 50%~
70%, and the utilization rate on complex cutting tool is then more than 90%.However, TiN coating oxidation resistent susceptibility is poor, when super using temperature
When crossing 500 DEG C, obvious oxidation is burnt by coating surface;TiN coating hardness is lower simultaneously, can not adapt to cutting high speed pair
The high request of cutter coat.TiC coated cutting tool has preferable chemical stability and anti-oxidant abrasiveness.The knot of coating and matrix
It is high to close intensity, anti-stick, durability is higher, when cutting is small to the abrasion of cutter.However, can be generated between TiC coating and matrix de-
Carbon-coating, that is, brittlement phase, this decarburized layer can be thickened as coating layer thickness increases, and lead to the reduction of blade bending strength, and brittleness increases,
Crushing knife is easy when cutting.Al2O3Coating has good thermal stability and chemical property, high mechanical strength.However, due to Al2O3
Too big, single Al is differed with the physics of hard alloy substrate, chemical property2O3Coating is unable to satisfy high-performance, high cutting speed
Requirement of the cutter for coating.
TiCN coating has both the advantages of TiC coating and TiN coating, the wearability of adhesive strength and TiC with TiN, firmly
Degree is than TiN high, and coefficient of friction is small, there is certain inhibiting effect for cohesiveness.With the raising of cutting rate, cutting
Phenomena such as tool surface may locally generate a large amount of heat in journey, and coated cutting tool oxidation, hardness decline, instantaneous wear-out failure is tight
Weight.And when continuous high speed cutting, cutter is exposed under hot conditions for a long time, and tissue and microstructure change, so that property
It can reduce.
In addition, titanium alloy is a kind of metal material for being difficult cutting in Tool in Cutting field.This is because titanium alloy is chemical
Activity is higher, cutting temperature is high, unit area cutting force causes to generate between titanium alloy and cutter greatly and stings weldering, bonding, spread and
Oxidative wear is serious.Therefore, how to design and prepare a kind of good combination property and can efficiently realize the painting of titanium alloy cutting
Layer cutter more gradually becomes cutting tool field project in the urgent need to address.
Patent ZL200510071119.2 discloses a kind of cutting tool coating and its manufacturing method, and which disclose one
The production method of kind TiAlCN nonmetalloid linear gradient's coating is to carry out coating treatment, the coating using PVD method
Treatment process is divided into continuous four periods, be within second period, while be passed through into furnace chamber argon gas, nitrogen,
Acetylene gas, wherein argon Ar flow remains unchanged, the flow uniform descent of nitrogen or rising, and the flow of acetylene gas is then at the uniform velocity
It rises or falls;To form the TiAlCN gradient layer of a nonmetalloid linear change.Production method in the patent is multiple
It is miscellaneous, it needs to keep monitoring at any time in flow of the reaction process to argon gas, nitrogen, acetylene gas, and be accordingly adjusted, and due to
Rate variation and gas reaction consume uncertain, are easy to cause furnace gas partial pressure and ratio uneven, cause air pressure insufficient,
And then cause the cutter material performance of production bad.
Patent 201180020600.0 discloses a kind of PVD coating for intermetallic composite coating, and the coating passes through physics gas
Mutually deposition (PVD) and deposit, including at least two layers, described two layers have different grain size, but have of the same nature
Ingredient.The granularity of two coatings in the patent has biggish difference, has apparent boundary in microscopic structure, ties between two coatings
Conjunction property is poor, and the hardness and film-substrate cohesion of coating are low, and the hardness of cutter entirety is low, and stability is poor.
Patent 201380049876.9 discloses a kind of tool with TiAlCrSiNPVD coating;Specifically closed by hard
Main body made of gold, cermet, ceramics, steel or high-speed steel and the multi-layer wear-resistant in the main body is applied to using PVD process
Protective coating, protective coating include at least one layer (A): TiaAl(1-a)N, wherein 0.33 < a < 1 is with a thickness of 20nm to 3 μm;
With at least one layer (B), it includes the Ti that a series of at least four is alternately stacked arrangementbSi(1-b)N and AlcCr(1-c)N sublayer is simultaneously
And layer is with a thickness of 0.5nm to 15nm, wherein 0.70 <b < 0.98 and 0.3 < c < 0.75, also include layer (C): TidSi(1-d)N, wherein
0.70 < d < 0.98 and layer is with a thickness of 50nm to l μm.The patent of composition in to(for) coating has a stringent determination, and
The thickness and component of manufacturing process floating coat are easy affected by various factors, make such as temperature, bias, time, introduced gas
The arrangement of the setting target such as partial pressure, this just increases the manufacture difficulty and cost of manufacture of coating, is unfavorable for industrially promoting and applying.
Summary of the invention
The shortcomings that it is a primary object of the present invention to overcome the prior art and deficiency, propose a kind of titanium with PVD coating
Alloy cutter material and preparation method thereof.A variety of alloying elements are added in cutter coat in the present invention, are formed polynary
Coating system improves the hardness of coating, improves the abrasion resistance and toughness of coating, and have the impact of good resistance to mechanical and
Thermal stability, good combination property effectively extend titanium alloy cutting cutting-tool's used life.
The present invention specifically provides a kind of preparation method of titanium alloy cutting cutter material with PVD coating, using physics
Cathodic arc evaporation technique in physical vapour deposition (PVD) PVD prepares multi-element coating, and above-mentioned technical process includes the following steps:
Polished and cleaned is carried out to sample cutter: successively being polished step by step using silicon carbide paper, polishing treatment, blasting treatment makes
Ultrasonic cleaning is carried out to sample cutter respectively with acetone and ethyl alcohol;
Preparation bonding bottom: installation Ti target after the cutter after cleaning is placed on work rest, is sent into vacuum chamber, makes matrix
Vertical range between arc source is 200~300mm, is evacuated to lower than 10-3Pa, and carrying out heating to workpiece simultaneously reaches it
To preset temperature;It is passed through nitrogen, nitrogen flow is 600~650sccm, applies substrate bias -80V~-220V, in specimen surface
Depositing TiN bond coating;
Prepare main coating: the main coating is TiCNO and TiCN mixed coating: the Ti target of use, Ti target arc current are
60~65A, depositing temperature are 260~270 DEG C, and substrate bias is -80V~-220V, keeps and be passed through nitrogen, C2H2And CO mixing
Gas is reacted into reaction chamber, and the flow of nitrogen is 400~500sccm, C2H2Flow be 150~300sccm, the flow of CO
For 80~200sccm, preparation TiCNO and TiCN mixed coating is generated;
Prepare protective coating: the protective coating is TiAlZr/TiAlZrCr coating, TiAlZr/CrN coating, TiAlZr/
ZrN coating, TiAl/CrN coating or TiAl/TiAlCr coating are taken corresponding with coating when preparing above-mentioned multi-element coating
Target and target arc current are passed through nitrogen or argon gas, and depositing temperature is 260~270 DEG C, and substrate bias is -80V~-220V.
It further, further include Ion Cleaning step, specially applying substrate bias to sample cutter is -350V, is passed through
Arc initiation device, the striking under condition of high vacuum degree are opened, the ion that Ti target is emitted reaches specimen surface, carries out ion to specimen surface
Sputter clean, scavenging period are 5~10 minutes.
Further, the TiAlZr/TiAlZrCr coating the preparation method comprises the following steps: using TiAlZr target, arc current is
50~60A, depositing temperature are 260~270 DEG C, and substrate bias is -80V~-220V, and is passed through argon gas, and the flow of argon gas is 500
~650sccm, depositing Ti AlZr coating, TiAlZr coating with a thickness of 300~500 μm;TiAlZr target and Cr target are then used,
TiAl target arc current is 50~60A, and Cr target arc current is 40A, and depositing temperature is 260~270 DEG C, and substrate bias is -80V
~-220V, and be passed through argon gas and nitrogen, the flow of argon gas fall to 300~400sccm, and the flow of nitrogen is 200~
400sccm, depositing Ti AlZrCr coating, TiAlZrCr coating layer thickness are 200~400 μm.
Further, the TiAlZr/CrN coating the preparation method comprises the following steps: using TiAlZr target, using TiAlZr target, electricity
Arc current is 50~60A, and depositing temperature is 260~270 DEG C, and substrate bias is -80V~-220V, and is passed through argon gas, argon gas
Flow be 500~650sccm, depositing Ti AlZr coating, TiAlZr coating with a thickness of 200~500 μm;Then Cr target is used,
Cr target arc current is 60A, and depositing temperature is 260~270 DEG C, and substrate bias is -80V~-220V, and is passed through argon gas and nitrogen
Gas, the flow of argon gas fall to 300~400sccm, and the flow of nitrogen is 200~400sccm, deposit CrN coating, CrN coating
With a thickness of 200~400 μm.
Further, the TiAlZr/ZrN coating the preparation method comprises the following steps: using TiAlZr target, using TiAlZr target, electricity
Arc current is 50~60A, and depositing temperature is 260~270 DEG C, and substrate bias is -80V~-220V, and is passed through argon gas, argon gas
Flow be 500~650sccm, depositing Ti AlZr coating, TiAlZr coating with a thickness of 200~500 μm;Then Zr painting is prepared
Layer, using Zr target, Zr target arc current is 60A, and depositing temperature is 260~270 DEG C, and substrate bias is -80V~-220V, and is led to
Enter argon gas and nitrogen, the flow of argon gas falls to 300~400sccm, and the flow of nitrogen is 200~400sccm, and deposition ZrN is applied
Layer, ZrN coating layer thickness are 200~400 μm.
Further, the TiAl/CrN coating the preparation method comprises the following steps: first use TiAl target, arc current be 60~
65A, depositing temperature are 260~270 DEG C, and substrate bias is -80V~-220V, and are passed through nitrogen, the flow of nitrogen is 500~
700sccm, depositing Ti Al coating, TiAl coating with a thickness of 200~500 μm;Then Cr coating is prepared, using Cr target, Cr target
Arc current is 60A, and depositing temperature is 260~270 DEG C, and substrate bias is -80V~-220V, and is passed through nitrogen, the stream of nitrogen
Amount is 500~700sccm, deposits CrN coating, and CrN coating layer thickness is 200~400 μm.
Further, the TiAl/TiAlCr coating the preparation method comprises the following steps: using TiAl target, arc current is 60~
65A, depositing temperature are 260~270 DEG C, and substrate bias is -80V~-220V, and are passed through nitrogen, the flow of nitrogen is 500~
700sccm, depositing Ti Al coating, TiAl coating with a thickness of 200~500 μm;Then TiAlCr is prepared using TiAl target and Cr
Target, TiAl target arc current be 60~65A, Cr target arc current be 40A, depositing temperature be 260~270 DEG C, substrate bias be-
80V~-220V, and it is passed through nitrogen, the flow of nitrogen is 500~700sccm, depositing Ti AlCr coating, TiAlCr coating layer thickness
It is 200~400 μm.
The present invention also provides a kind of using the titanium alloy cutting cutter material obtained by above-mentioned preparation method with PVD coating
Material, the PVD coating are multi-element coating, and the multi-element coating includes main coating and protective coating, the main coating be TiCNO and
TiCN mixed coating, in TiCNO the and TiCN mixed coating, the oxygen atom of incorporation is instead of the carbon atom in the TiCN of part
Or nitrogen-atoms, TiCNO and TiCN mixed coating is face-centred cubic structure, with a thickness of 500~800 μm;The protective coating is
TiAlZr/TiAlZrCr coating, TiAlZr/CrN coating, TiAlZr/ZrN coating, TiAl/CrN coating or TiAl/TiAlCr are applied
Layer, with a thickness of 400~800 μm.
It further, further include TiN bond coating between the main coating and sample tool surface, with a thickness of 80~
120 μm of TiN bond coatings play a transition role between TiCNO and TiCN mixed coating and matrix, improve interface binding power
And the binding performance between film/matrix.
Further, TiCNO the and TiCN mixed coating is TiC0。78N0。52And TiC0。63N0。471O0。21Multi-element coating.
Compared with the prior art, the invention has the following advantages and beneficial effects:
Main coating in the present invention is TiCN and TiCNO mixed coating, which is provided simultaneously with TiCN and Al2O3It applies
Layer the advantages of, the coated grains shape uniformly, crystallite dimension refinement, crystal grain marshalling and it is close, with refined crystalline strengthening work
With;Along with the TICN lattice that enters of oxygen atom generates distortion of lattice, play the role of solution strengthening.Generally, so that applying
The dense structure of layer, hardness improve.
PVD coating is provided with TiN bond coating in the present invention, and TiN bond coating plays matrix and the transition of main coating is made
With improving the interface binding power between main coating and matrix, improve the binding performance between film/matrix.PVD coating is set in the present invention
It is set to multi-element coating cutter, the growth of the column crystal in coating interface has been interrupted due to multi-element coating, so that coating interface
It is strengthened, it is intercrystalline to be tightly combined, to improve the hardness of coating.Further, since the microhardness and film/base of coating
The promotion of binding force largely also improves the abrasion resistance energy of coating.
Contain Zr element in multi-element coating, the bonding abrasion degree between cutter and titanium alloy can be reduced, bonding abrasion is
The main failure forms of machining titanium alloy cutter, so, the addition of Zr greatly improves the wearability of cutter.In multi-element coating
Coating containing Cr can be improved appearance surface hardness, film/base junction resultant force and inoxidizability, reduce coefficient of friction, extends cutter and use
Service life.
Detailed description of the invention
Fig. 1 is the room temperature friction coefficient curve figure of the titanium alloy cutting cutter material with PVD coating;
Fig. 2 be before processing and treated cutter sample in 500~900 DEG C of oxidation weight gain curve figures.
Specific embodiment
Combined with specific embodiments below and Figure of description is more specifically described in detail the present invention.
Tool matrix in the present embodiment is W18Cr4V tool steel.The equipment that the present embodiment uses is Swiss-PVD coating
Company model is the coating apparatus depositing coating of SP1500.
Embodiment 1:
For the preparation method of the titanium alloy cutting cutter material with PVD coating in the present embodiment, using physical vapor
Cathodic arc evaporation technique in deposition PVD prepares multi-element coating, specifically includes the following steps:
Firstly, cleaning to sample, greasy dirt, rusty stain, dust of workpiece etc. are removed, it is ensured that workpiece obtains good coat knot
With joint efforts.It is first polished step by step with silicon carbide paper, then the polishing treatment to specimen surface.Carry out sandblast, can be used corundum,
SiO2Equal sand grains sandblast, and obtain surface clean, that essence is rough.Then sample cutter is surpassed respectively using the third bronze medal and ethyl alcohol
Sound wave cleaning.Carry out Ion Cleaning and prepare bond coating: installation Ti target is sent after the cutter after cleaning is placed on work rest
Enter to vacuum chamber, makes 200~300mm of vertical range between matrix and arc source, be evacuated to lower than 10-3Pa, and it is right simultaneously
Workpiece carries out heating and reaches preset temperature.Applying substrate bias to sample cutter is -350V, is passed through unlatching arc initiation device,
The striking under condition of high vacuum degree, the ion that Ti target is emitted reach specimen surface, carry out ion sputtering cleaning, cleaning to specimen surface
Time is 5~10 minutes.Then, it is passed through nitrogen, nitrogen flow is 600~650sccm, apply substrate bias -80V~-220V,
In specimen surface depositing TiN bond coating, with a thickness of 80~120 μm.
It prepares main coating, that is, TiCNO and TiCN coating: being prepared using the cathodic arc evaporation in physical vapour deposition (PVD) PVD
TiCNO and TiCN coating.The Ti target of use, Ti target arc current are 60~65A, and depositing temperature is 260~270 DEG C, and matrix is inclined
Pressure is -80V~-220V, keeps and be passed through nitrogen, C2H2And CO mixed gas is reacted into reaction chamber, the flow of nitrogen is 400
~500sccm, C2H2Flow be 150~300sccm, the flow of CO is 80~200sccm, and it is mixed to generate preparation TiCNO and TiCN
Close coating, TiCNO and TiCN coating with a thickness of 500~800 μm.
In above-mentioned steps, the volume ratio of nitrogen and other gases is 2:1~3:1, can the accounting appropriate that improve nitrogen.?
In the present embodiment, when nitrogen accounts for it is relatively high when, in deposition, the neighbouring nitride deposition easily generated on target surface in arc macular area, and nitrogenizing
The fusing point of object is high, can reduce hole size of burning, the generation of drop, limits for cathode surface when reducing cathodic vacuum arc discharge
Ablation.
Prepare protective coating;Protective coating is TiAlZr/TiAlZrCr coating, uses TiAlZr target, arc current first
For 50~60A, depositing temperature is 260~270 DEG C, and substrate bias is -80V~-220V, and is passed through argon gas, and the flow of argon gas is
500~650sccm, depositing Ti AlZr coating, TiAlZr coating with a thickness of 200~500 μm.Then TiAlZrCr use is prepared
TiAlZr target and Cr target, TiAl target arc current are 50~60A, and Cr target arc current is 40A, and depositing temperature is 260~270
DEG C, substrate bias is -80V~-220V, and is passed through argon gas and nitrogen, and the flow of argon gas falls to 300~400sccm, nitrogen
Flow is 200~400sccm, and depositing Ti AlZrCr coating, TiAlZrCr coating layer thickness is 200~400 μm.
Embodiment 2:
The sample of the preparation method of the titanium alloy cutting cutter material with PVD coating is cleaned in the present embodiment, is viscous
It ties bottom preparation and main coating preparation step is same as Example 1;Protective coating is TiAlZr/CrN coating in the present embodiment.
Protective coating the preparation method comprises the following steps: first use TiAlZr target, first use TiAlZr target, arc current be 50~60A, deposition
Temperature is 260~270 DEG C, and substrate bias is -80V~-220V, and is passed through argon gas, and the flow of argon gas is 500~650sccm, is sunk
Product TiAlZr coating, TiAlZr coating with a thickness of 200~500 μm.Then Cr coating is prepared, using Cr target, Cr target electric arc electricity
Stream is 40A, and depositing temperature is 260~270 DEG C, and substrate bias is -80V~-220V, and is passed through argon gas and nitrogen, the stream of argon gas
Amount falls to 300~400sccm, and the flow of nitrogen is 200~400sccm, deposits CrN coating, and CrN coating layer thickness is 200~
400μm。
Embodiment 3:
The sample of the preparation method of the titanium alloy cutting cutter material with PVD coating is cleaned in the present embodiment, is viscous
It ties bottom preparation and main coating preparation step is same as Example 1;Protective coating is TiAlZr/ZrN coating in the present embodiment.
Protective coating the preparation method comprises the following steps: protective coating can be TiAlZr/ZrN coating.TiAlZr target is used first, is used first
TiAlZr target, arc current are 50~60A, and depositing temperature is 260~270 DEG C, and substrate bias is -80V~-220V, and is passed through
Argon gas, the flow of argon gas are 500~650sccm, depositing Ti AlZr coating, TiAlZr coating with a thickness of 200~500 μm.So
After prepare Zr coating, using Zr target, Zr target arc current is 60A, and depositing temperature is 260~270 DEG C, and substrate bias is -80V
~-220V, and be passed through argon gas and nitrogen, the flow of argon gas fall to 300~400sccm, and the flow of nitrogen is 200~
400sccm, deposits ZrN coating, and ZrN coating layer thickness is 200~400 μm.
Embodiment 4:
The sample of the preparation method of the titanium alloy cutting cutter material with PVD coating is cleaned in the present embodiment, is viscous
It ties bottom preparation and main coating preparation step is same as Example 1;Protective coating is TiAl/CrN coating in the present embodiment.It protects
Protect coating the preparation method comprises the following steps: protective coating be TiAl/CrN coating.TiAl target is used first, and arc current is 60~65A, is sunk
Accumulated temperature degree is 260~270 DEG C, and substrate bias is -80V~-220V, and is passed through nitrogen, and the flow of nitrogen is 500~700sccm,
Depositing Ti Al coating, TiAl coating with a thickness of 200~500 μm.Then Cr coating is prepared.Using Cr target, Cr target arc current
For 60A, depositing temperature is 260~270 DEG C, and substrate bias is -80V~-220V, and is passed through nitrogen, the flow of nitrogen is 500~
700sccm, deposits CrN coating, and CrN coating layer thickness is 200~400 μm.
Embodiment 5:
The sample of the preparation method of the titanium alloy cutting cutter material with PVD coating is cleaned in the present embodiment, is viscous
It ties bottom preparation and main coating preparation step is same as Example 1;Protective coating is that TiAl/TiAlCr is applied in the present embodiment
Layer.Protective coating the preparation method comprises the following steps: protective coating can be TiAl/TiAlCr multi-element coating, first use TiAl target, electric arc electricity
Stream is 60~65A, and depositing temperature is 260~270 DEG C, and substrate bias is -80V~-220V, and is passed through nitrogen, the flow of nitrogen
For 500~700sccm, depositing Ti Al coating, TiAl coating with a thickness of 200~500 μm.Then TiAlCr is prepared using TiAl
Target and Cr target, TiAl target arc current are 60~65A, and Cr target arc current is 40A, and depositing temperature is 260~270 DEG C, matrix
Bias is -80V~-220V, and is passed through nitrogen, and the flow of nitrogen is 500~700sccm, depositing Ti AlCr coating, TiAlCr painting
Layer is with a thickness of 200~400 μm.
The arc current range into the technique in embodiment 5 of above-described embodiment 1 is that experiment measures, lower than needed for conventional coating
Arc current value, and the lower value in desirable arc current value range takes lesser current value decrease electric arc appropriate
Electric discharge, reduce arc spot number, while reducing micro- molten bath area, reduce number of drops, improve the quality of coating deposition.Even if electric arc
The reduction of current value can reduce the rate of evaporation and deposition, and then the deposition efficiency influenced to a certain degree, however, adopting in the present invention
With the technique of multilayer multi-element coating, it equally can achieve high arc current value and be formed by compactness possessed by coating surface,
High rigidity and wear-resisting characteristic.
Target stretches progress using the technique for mixing hot pressing, hot isostatic pressing, cold pressing and sintering, cast, hot rolling or cold rolling
Forming processes carry out machining and are made in conjunction with backboard after the heat treatment process such as matter, sintering.
For single TiCN coating, dissolves each other the unlimited solid solution to be formed for TiC and TiN, there is NaCl type face-centered cubic
Structure, easily precipitation amorphous carbon, so that structural transformation progress faster, thermal stability is poor, and defect concentration reduces in coating,
Stress release.In main coating, such as TiCN and TiCNO multi-element coating generated in embodiment 1 to embodiment 5, the oxygen of incorporation
Atom is similarly NaCl type face-centred cubic structure, is solid-solution in face-centered cubic instead of the C atom or N atom in the TiCN of part, TiO
In lattice, TiCNO solid solution is formed.The texture coefficient of TiCN and TiCNO multi-element coating increases, can in conjunction with XRD spectrum
Know, the diffracted intensity of coating is also improved, this is because the interaction of oxygen atom and carbon atom promotes nitrogen-atoms
Deposition.For coating morphology, the crystal of TiCN single coating is coarse, and size is uneven, and there are rib ridges for inside.And TiCN and
The grain shape of TiCNO multi-element coating refines, and grain particles reduce, and grain size is not much different, and crystal grain is neatly tightly combined, and is made
Coating hardness is obtained to improve.TiCN and TiCNO multi-element coating hardness compared with single TiCN coating is improved, oxygen atom
Into so that TiCN lattice produces solid solution strengthening effect and refined crystalline strengthening effect, so that coating structure is more fine and compact.
Prepared TiCN and TiCNO multi-element coating is TiC in the present embodiment0。78N0。52And TiC0。63N0。471O0。21It is polynary
Coating.
Contain Zr element in embodiment 1 and embodiment 2 in multi-element coating, embodiment 3 generates ZrN coating, embodiment 1-3 institute
The coating of generation can reduce the adhesive wear degree with Ti alloy, and wear-resisting property is greatly improved, can be widely applied to
The abrasion of cutter is effectively reduced in high speed cutting tool, improves the cutting quality of workpiece.It is applied generated in embodiment 4 and embodiment 5
In layer, outermost tunic is the coating containing Cr, since outermost layer coating contains Cr element, so that sample appearance surface hardness, film/base junction
Resultant force and inoxidizability are significantly improved, and multicomponent membrane cutter is applicable to the High-speed machining of 400m/min or more,
And cutting ability and thermal stability get a promotion, and end wear amount reduces, and service life extends.
The coating hardness of multi-element coating cutter prepared by embodiment 1 to embodiment 5 is higher than the hardness of untreated sample,
This is because the multilayer multi-element coating of deposition has interrupted the growth of the column crystal in coating interface, so that coating interface obtains
Strengthen.With the increase of coating layer thickness known to following table, and significantly increase the microhardness for the sample for being coated with multi-element coating,
This is because intercrystalline combination is even closer with the increase of coating layer thickness, cause coating finer and close, to improve painting
The hardness of layer.
Coating layer thickness | Hardness (HV before handling0。01) | Hardness (HV after processing0。01) |
1000μm | 2650±50 | 3500±50 |
1200μm | 2650±50 | 3750±50 |
1400μm | 2650±50 | 3850±50 |
Treated multi-element coating cutter is before handle compared with sample, both rigid natures with higher, and the film improved/
Binding force between base.Before depositing Ti CNO and TiCN coating, TiN bond coating is prepared, improves TiCNO and TiCN coating and matrix
Between interface binding power, improve film/matrix between binding performance.Under normal conditions, due to being deposited between multi-element coating and matrix
In certain lattice equations, this declines the binding force between coating and matrix.However, due to TiN bond coating
Play matrix and TiCNO and TiCN coating transitional function, meanwhile, TiAl coating play TiCNO and TiCN coating and Cr coating it
Between transitional function.In this way, improving the compatibility between gradient coating composition consecutive variations and each coating, subtract to a certain extent
The thermal stress that small multi-element coating is generated due to thermal expansion coefficient difference, so that good combination is presented in interface between each coating
State improves the film-substrate cohesion of multi-element coating.
Coating layer thickness | Binding force (N) before handling | Binding force (N) after processing |
1000μm | 180±50 | >220 |
1200μm | 180±50 | >220 |
1400μm | 180±50 | >220 |
1 as can be seen that the average room temperature coefficient of friction of prepared coating is between 0.3~0.4 with reference to the accompanying drawings, and with
Deposition thickness it is different, friction system is reduced and fluctuates reduction.This is because the microhardness and film of coating/base junction are closed
Power greatly enhances the abrasion resistance energy of coating.In addition, wear area reduces for the surface topography of coating abrasion,
The degree of friction groove trace, crackle and peeling pit mitigates.
As shown in Fig. 2, for that rear sample will be placed at 500~900 DEG C before treatment, the curve graph of oxidation 5 hours.From figure
It can be seen that, the oxidation weight gain of sample after treatment is significantly lower than the sample before processing, sample its gasification resistant to high temperatures after treatment
Getable apparent improvement.It can be seen from the figure that treated, and sample still increases weight without apparent at 500~700 DEG C, and
When temperature is more than 700~800 DEG C, treated sample increases slowly weight gain with temperature, when temperature is more than 800 DEG C, the oxygen of sample
Change weight gain to be substantially increased, at this point, coating failure.
The above-mentioned measurement for hardness is measured using microhardness testers, and the mode that multiple groups sample is averaged is arranged;
Coating adhesion scratch test machine is carried out using WS-97 and measures bond strength;Using scanning electron microscope sem and X-ray diffractometer XRD
Carry out coating morphology and Phase Structure Analysis.
The implementation of the present invention is not limited to this, and above content according to the invention is known using the ordinary skill of this field
Knowledge and customary means, under the premise of not departing from above-mentioned basic fundamental thought of the invention, the present invention can also make other a variety of shapes
Modification, replacement or the change of formula, all fall within rights protection scope of the present invention.
Claims (10)
1. a kind of preparation method of the titanium alloy cutting cutter material with PVD coating, using in physical gas phase deposition technology
Cathodic arc evaporation technique prepares multi-element coating, which is characterized in that above-mentioned technical process includes the following steps:
Polished and cleaned is carried out to sample cutter: successively being polished step by step using silicon carbide paper, polishing treatment, blasting treatment uses third
Ketone and ethyl alcohol carry out ultrasonic cleaning to sample cutter respectively;
Preparation bonding bottom: installation Ti target after the cutter after cleaning is placed on work rest, is sent into vacuum chamber, makes matrix and arc
Vertical range between source is 200~300mm, is evacuated to lower than 10-3Pa, and simultaneously to workpiece carry out heating reach it is pre-
If temperature;It is passed through nitrogen, nitrogen flow is 600~650sccm, applies substrate bias -80V~-220V, is deposited in specimen surface
TiN bond coating;
Prepare main coating: the main coating be TiCNO and TiCN mixed coating: the Ti target of use, Ti target arc current be 60~
65A, depositing temperature are 260~270 DEG C, and substrate bias is -80V~-220V, keeps and be passed through nitrogen, C2H2And CO mixed gas
It is reacted into reaction chamber, the flow of nitrogen is 400~500sccm, C2H2Flow be 150~300sccm, the flow of CO is 80
~200sccm generates preparation TiCNO and TiCN mixed coating;
Prepare protective coating: the protective coating is TiAlZr/TiAlZrCr coating, TiAlZr/CrN coating, TiAlZr/ZrN
Coating, TiAl/CrN coating or TiAl/TiAlCr coating take target corresponding with coating when preparing above-mentioned multi-element coating
Material and target arc current are passed through nitrogen or argon gas, and depositing temperature is 260~270 DEG C, and substrate bias is -80V~-220V.
2. the preparation method of the titanium alloy cutting cutter material according to claim 1 with PVD coating, feature exist
In: it further include Ion Cleaning step, specially applying substrate bias to sample cutter is -350V, it is passed through unlatching arc initiation device,
Striking under condition of high vacuum degree, ion that Ti target is emitted reach specimen surface, carry out ion sputtering cleaning to specimen surface, when cleaning
Between be 5~10 minutes.
3. the preparation method of the titanium alloy cutting cutter material according to claim 1 or 2 with PVD coating, feature
Be: the TiAlZr/TiAlZrCr coating the preparation method comprises the following steps: using TiAlZr target, arc current is 50~60A, deposition
Temperature is 260~270 DEG C, and substrate bias is -80V~-220V, and is passed through argon gas, and the flow of argon gas is 500~650sccm, is sunk
Product TiAlZr coating, TiAlZr coating with a thickness of 300~500 μm;Then use TiAlZr target and Cr target, TiAl target electric arc electricity
Stream is 50~60A, and Cr target arc current is 40A, and depositing temperature is 260~270 DEG C, and substrate bias is -80V~-220V, and is led to
Enter argon gas and nitrogen, the flow of argon gas falls to 300~400sccm, and the flow of nitrogen is 200~400sccm, deposition
TiAlZrCr coating, TiAlZrCr coating layer thickness are 200~400 μm.
4. the preparation method of the titanium alloy cutting cutter material according to claim 1 or 2 with PVD coating, feature
Be: the TiAlZr/CrN coating the preparation method comprises the following steps: using TiAlZr target, using TiAlZr target, arc current is 50~
60A, depositing temperature are 260~270 DEG C, and substrate bias is -80V~-220V, and are passed through argon gas, the flow of argon gas is 500~
650sccm, depositing Ti AlZr coating, TiAlZr coating with a thickness of 200~500 μm;Then Cr target, Cr target arc current are used
For 60A, depositing temperature is 260~270 DEG C, and substrate bias is -80V~-220V, and is passed through argon gas and nitrogen, the flow of argon gas
300~400sccm is fallen to, the flow of nitrogen is 200~400sccm, deposits CrN coating, and CrN coating layer thickness is 200~400
μm。
5. the preparation method of the titanium alloy cutting cutter material according to claim 1 or 2 with PVD coating, feature
Be: the TiAlZr/ZrN coating the preparation method comprises the following steps: using TiAlZr target, using TiAlZr target, arc current is 50~
60A, depositing temperature are 260~270 DEG C, and substrate bias is -80V~-220V, and are passed through argon gas, the flow of argon gas is 500~
650sccm, depositing Ti AlZr coating, TiAlZr coating with a thickness of 200~500 μm;Then Zr coating is prepared, using Zr target,
Zr target arc current is 60A, and depositing temperature is 260~270 DEG C, and substrate bias is -80V~-220V, and is passed through argon gas and nitrogen
Gas, the flow of argon gas fall to 300~400sccm, and the flow of nitrogen is 200~400sccm, deposit ZrN coating, ZrN coating
With a thickness of 200~400 μm.
6. the preparation method of the titanium alloy cutting cutter material according to claim 1 or 2 with PVD coating, feature
Be: the TiAl/CrN coating the preparation method comprises the following steps: first using TiAl target, arc current is 60~65A, and depositing temperature is
260~270 DEG C, substrate bias is -80V~-220V, and is passed through nitrogen, and the flow of nitrogen is 500~700sccm, depositing Ti Al
Coating, TiAl coating with a thickness of 200~500 μm;Then Cr coating is prepared, using Cr target, Cr target arc current is 60A, is sunk
Accumulated temperature degree is 260~270 DEG C, and substrate bias is -80V~-220V, and is passed through nitrogen, and the flow of nitrogen is 500~700sccm,
CrN coating is deposited, CrN coating layer thickness is 200~400 μm.
7. the preparation method of the titanium alloy cutting cutter material according to claim 1 or 2 with PVD coating, feature
Be: the TiAl/TiAlCr coating the preparation method comprises the following steps: using TiAl target, arc current is 60~65A, and depositing temperature is
260~270 DEG C, substrate bias is -80V~-220V, and is passed through nitrogen, and the flow of nitrogen is 500~700sccm, depositing Ti Al
Coating, TiAl coating with a thickness of 200~500 μm;Then TiAlCr is prepared using TiAl target and Cr target, TiAl target arc current
For 60~65A, Cr target arc current is 40A, and depositing temperature is 260~270 DEG C, and substrate bias is -80V~-220V, and is passed through
Nitrogen, the flow of nitrogen are 500~700sccm, and depositing Ti AlCr coating, TiAlCr coating layer thickness is 200~400 μm.
8. with the titanium alloy cutting cutter material of PVD coating, institute obtained by a kind of preparation method as described in claim 1
Stating PVD coating is multi-element coating, and the multi-element coating includes main coating and protective coating, it is characterised in that: the main coating is
TiCNO and TiCN mixed coating, in TiCNO the and TiCN mixed coating, the oxygen atom of incorporation is instead of in the TiCN of part
Carbon atom or nitrogen-atoms, TiCNO and TiCN mixed coating be face-centred cubic structure, with a thickness of 500~800 μm;The protection
Coating is TiAlZr/TiAlZrCr coating, TiAlZr/CrN coating, TiAlZr/ZrN coating, TiAl/CrN coating or TiAl/
TiAlCr coating, with a thickness of 400~800 μm.
9. the titanium alloy cutting cutter material according to claim 8 with PVD coating, it is characterised in that: in the master
It further include TiN bond coating between coating and sample tool surface, with a thickness of 80~120 μm of TiN bond coatings in TiCNO
And play a transition role between TiCN mixed coating and matrix, improve the binding performance between interface binding power and film/matrix.
10. the titanium alloy cutting cutter material with PVD coating according to claim 8 or claim 9, it is characterised in that: described
TiCNO and TiCN mixed coating is TiC0。78N0。52And TiC0。63N0。47O0。21Multi-element coating.
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