CN108559957A - A kind of titanium alloy cutting cutter material and preparation method thereof with PVD coatings - Google Patents
A kind of titanium alloy cutting cutter material and preparation method thereof with PVD coatings Download PDFInfo
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
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- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
- C23C14/325—Electric arc evaporation
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- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
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- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
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- C23C14/0057—Reactive sputtering using reactive gases other than O2, H2O, N2, NH3 or CH4
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- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
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- C23C14/024—Deposition of sublayers, e.g. to promote adhesion of the coating
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- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
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- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0641—Nitrides
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0664—Carbonitrides
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/18—Metallic material, boron or silicon on other inorganic substrates
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
- C23C28/32—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
- C23C28/34—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
- C23C28/34—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates
- C23C28/347—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates with layers adapted for cutting tools or wear applications
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- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Cutting Tools, Boring Holders, And Turrets (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The present invention relates to a kind of titanium alloy cutting cutter material and preparation method thereof with PVD coatings, multi-element coating is prepared using the cathodic arc evaporation technique in physical vapour deposition (PVD) PVD, including:Cleaning is polished to sample cutter;Prepare TiN bond coatings;Prepare TiCNO and TiCN multi-element coatings;Protective coating is prepared, can be TiAlZr/TiAlZrCr coatings, TiAlZr/CrN coatings, TiAlZr/ZrN coatings, TiAl/CrN coatings or TiAl/TiAlCr coatings.A variety of alloying elements are added in cutter coat in the present invention, multi-element coating system is formed, improves the hardness of coating, improve the wearability and toughness of coating, reduce the bonding tendency and friction coefficient with titanium alloy.Meanwhile there is cutter resistance to mechanical impact and good thermal stability, good combination property effectively to extend titanium alloy cutting cutting-tool's used life.
Description
Technical field
The present invention relates to metal cutting investigation of materials field, more particularly to a kind of titanium alloy cutting knife with PVD coatings
Has material and preparation method thereof.
Background technology
With the development of Machine Manufacturing Technology, foreign-made had started largely to use high cutting speed, high feed speed already
With the Novel numerical control machine of high structural rigidity, such as the automobile of mass production and airplane industry field.And these are high performance
Lathe proposes new requirement for the material, coating process and cutter structure of cutter.
Currently, hard alloy coating technology is broadly divided into physical gas phase deposition technology (PVD) and chemical vapor deposition
(CVD), CVD or PVD process by single-layer or multi-layer described in abrasion resistant protective coating is applied to made of hard material
In main body.PVD process includes magnetron sputtering, arc vapor deposition (electric arc PVD), ion plating, electron-beam vapor deposition and laser
Ablation.However, the product hardness using PVD preparation processes is low compared with the product by CVD preparation processes, coating film-substrate cohesion also compared with
It is low.In addition, the performance of the coating of cutting element is related to the design of its protective coating, currently, the coating material of high speed cutting tool
In material, most widely used coating is TiN.According to incompletely statistics, utilization rate of the TiN coatings on high-speed steel tool be 50%~
70%, and the utilization rate on complex cutting tool is then more than 90%.However, TiN coating oxidation resistent susceptibilities are poor, when temperature in use is super
When crossing 500 DEG C, apparent oxidation is burnt by coating surface;TiN coating hardness is relatively low simultaneously, can not adapt to cutting high speed pair
The high request of cutter coat.TiC coated cutting tools have preferable chemical stability and anti-oxidant abrasiveness.The knot of coating and matrix
It is high to close intensity, anti-stick, durability is higher, when cutting is small to the abrasion of cutter.However, will produce between TiC coatings and matrix de-
Carbon-coating, that is, brittlement phase, this decarburized layer can be thickened as coating layer thickness increases, and the reduction of blade bending strength, brittleness is caused to increase,
Crushing knife is easy when cutting.Al2O3Coating has good thermal stability and chemical property, high mechanical strength.However, due to Al2O3
Too big, single Al is differed with the physics of hard alloy substrate, chemical property2O3Coating can not expire group high-performance, high cutting speed
Requirement of the cutter for coating.
TiCN coatings have both the advantages of TiC coatings are with TiN coatings, the wearability of adhesive strength and TiC with TiN, firmly
Degree is than TiN high, and friction coefficient is small, there is certain inhibiting effect for cohesiveness.With the raising of cutting rate, cutting
Phenomena such as tool surface may locally will produce a large amount of heat in journey, and coated cutting tool oxidation, hardness decline, instantaneous wear out failure is tight
Weight.And when continuous high speed cutting, cutter is exposed under hot conditions for a long time, tissue and microstructure change so that property
It can reduce.
In addition, in Tool in Cutting field, it is difficult the metal material cut that titanium alloy, which is a kind of,.This is because titanium alloy is chemical
Activity is higher, cutting temperature is high, unit area cutting force causes to generate between titanium alloy and cutter greatly and stings weldering, bond, spread and
Oxidative wear is serious.Therefore, how to design and prepare a kind of good combination property and can efficiently realize the painting of titanium alloy cutting
Layer cutter more gradually becomes cutting tool field project in the urgent need to address.
Patent ZL200510071119.2 discloses a kind of cutting tool coating and its manufacturing method, and which disclose one
The production method of kind TiAiCN nonmetalloid linear gradient's coatings is to carry out coating treatment, the coating using PVD methods
Processing procedure is divided into continuous four periods, be within second period, while be passed through into furnace chamber argon gas, nitrogen,
Acetylene gas, wherein argon Ar flow remain unchanged, the flow uniform descent of nitrogen or rising, and the flow of acetylene gas is then at the uniform velocity
It rises or falls;To form the TiAlCN gradient layers of a nonmetalloid linear change.Production method in the patent is multiple
It is miscellaneous, it needs that the flow of argon gas, nitrogen, acetylene gas is kept monitoring at any time in reaction process, and be accordingly adjusted, and due to
Rate changes and what gas reaction consumed does not know, and is easy to cause furnace gas partial pressure and ratio is uneven, cause air pressure insufficient,
And then cause the cutter material performance of production bad.
Patent 201180020600.0 discloses a kind of PVD coatings for intermetallic composite coating, and the coating passes through physics gas
Mutually deposition (PVD) and deposit, including at least two layers, described two layers have different grain size, but with of the same nature
Ingredient.The granularity of two coatings in the patent has larger difference, has apparent boundary in microscopic structure, is tied between two coatings
Conjunction property is poor, and the hardness and film-substrate cohesion of coating are low, and the hardness of cutter entirety is low, and stability is poor.
Patent 201380049876.9 discloses a kind of tool with TiAlCrSiNPVD coatings;Specifically closed by hard
Main body made of gold, cermet, ceramics, steel or high-speed steel and it is applied to the multi-layer wear-resistant in the main body using PVD process
Protective coating, protective coating include at least one layer (A):TiaAl(1-a)N, wherein 0.33 < a <, 1 thickness is 20nm to 3 μ
m;With at least one layer (B), it includes the Ti that a series of at least four is alternately stacked arrangementbSi(1-b)N and AlcCr(1-c)N sublayers
And layer thickness is 0.5nm to 15nm, wherein 0.70 < b < 0.98 and 0.3 < c < 0.75, also include layer (C):TidSi(1-d)
N, wherein 0.70 < d < 0.98 and layer thickness are 50nm to 1 μm.Have strictly really for the composition of coating in the patent
It is fixed, and the thickness of coating and component are easy affected by various factors in the production process, make such as temperature, bias, the time, introduced
The arrangement of target is arranged in partial pressure of gas etc., this just increases the manufacture difficulty and cost of manufacture of coating, is unfavorable for industrially pushing away
Wide application.
Invention content
The shortcomings that it is a primary object of the present invention to overcome the prior art and a kind of insufficient, titanium with PVD coatings of proposition
Alloy cutter material and preparation method thereof.A variety of alloying elements are added in cutter coat in the present invention, are formed polynary
Coating system improves the hardness of coating, improves the abrasion resistance and toughness of coating, and with the impact of good resistance to mechanical and
Thermal stability, good combination property effectively extend titanium alloy cutting cutting-tool's used life.
The present invention specifically provides a kind of preparation method of the titanium alloy cutting cutter material with PVD coatings, using physics
Cathodic arc evaporation technique in physical vapour deposition (PVD) PVD prepares multi-element coating, and above-mentioned technical process includes the following steps:
Cleaning is polished to sample cutter:It is polished step by step using silicon carbide paper successively, polishing treatment, sandblast makes
Ultrasonic cleaning is carried out to sample cutter respectively with the third bronze medal and ethyl alcohol;
Prepare bonding bottom:Ti targets are installed, after the cutter after cleaning is placed on work rest, vacuum chamber is sent into, makes matrix
Vertical range between arc source is 200~300mm, is evacuated to less than 10-3Pa, and carrying out heating to workpiece simultaneously makes it reach
To preset temperature;It is passed through nitrogen, nitrogen flow is 600~650sccm, applies substrate bias -80V~-220V, in specimen surface
Depositing TiN bond coating;
Prepare main coating:The main coating is TiCNO and TiCN multi-element coatings:The Ti targets of use, Ti target arc currents are
60~65A, depositing temperature are 260~270 DEG C, and substrate bias is -80V~-220V, keeps and be passed through nitrogen, C2H2And CO mixing
It is reacted in gas to reative cell, the flow of nitrogen is 400~500sccm, C2H2Flow be 150~300sccm, the flow of CO
For 80~200sccm, generates and prepare TiCNO and TiCN mixed coatings;
Prepare protective coating:The protective coating is TiAlZr/TiAlZrCr coatings, TiAlZr/CrN coatings, TiAlZr/
ZrN coatings, TiAl/CrN coatings or TiAl/TiAlCr coatings are taken corresponding with coating when preparing above-mentioned multi-element coating
Target and target arc current are passed through nitrogen or argon gas, and depositing temperature is 260~270 DEG C, and substrate bias is -80V~-220V.
Further, further include Ion Cleaning step, it is -350V specially to apply substrate bias to sample cutter, is passed through
Arc initiation device, the striking under condition of high vacuum degree are opened, the ion that Ti targets are emitted reaches specimen surface, and ion is carried out to specimen surface
Sputter clean, scavenging period are 5~10 minutes.
Further, the preparation method of the TiAlZr/TiAlZrCr coatings is:Using TiAlZr targets, arc current is
50~60A, depositing temperature are 260~270 DEG C, and substrate bias is -80V~-220V, and is passed through argon gas, and the flow of argon gas is 500
The thickness of~650sccm, depositing Ti AlZr coatings, TiAlZr coatings are 300~500 μm;TiAlZr targets and Cr targets are then used,
TiAl target arc currents are 50~60A, and Cr target arc currents are 40A, and depositing temperature is 260~270 DEG C, and substrate bias is -80V
~-220V, and be passed through argon gas and nitrogen, the flow of argon gas fall to 300~400sccm, and the flow of nitrogen is 200~
400sccm, depositing Ti AlZrCr coatings, TiAlZrCr coating layer thicknesses are 200~400 μm.
Further, the preparation method of the TiAlZr/CrN coatings is:Using TiAlZr targets, using TiAlZr targets, electricity
Arc current is 50~60A, and depositing temperature is 260~270 DEG C, and substrate bias is -80V~-220V, and is passed through argon gas, argon gas
Flow is 500~650sccm, and the thickness of depositing Ti AlZr coatings, TiAlZr coatings is 200~500 μm;Then Zr targets are used,
Zr target arc currents are 60A, and depositing temperature is 260~270 DEG C, and substrate bias is -80V~-220V, and is passed through argon gas and nitrogen
The flow of gas, argon gas falls to 300~400sccm, and the flow of nitrogen is 200~400sccm, deposits ZrN coatings, ZrN coatings
Thickness is 200~400 μm.
Further, the preparation method of the TiAlZr/ZrN coatings is:Using TiAlZr targets, using TiAlZr targets, electricity
Arc current is 50~60A, and depositing temperature is 260~270 DEG C, and substrate bias is -80V~-220V, and is passed through argon gas, argon gas
Flow is 500~650sccm, and the thickness of depositing Ti AlZr coatings, TiAlZr coatings is 200~500 μm;Then Zr paintings are prepared
Layer, using Zr targets, Zr target arc currents are 60A, and depositing temperature is 260~270 DEG C, and substrate bias is -80V~-220V, and is led to
Enter argon gas and nitrogen, the flow of argon gas falls to 300~400sccm, and the flow of nitrogen is 200~400sccm, and deposition ZrN is applied
Layer, ZrN coating layer thicknesses are 200~400 μm.
Further, the preparation method of the TiAl/CrN coatings is:First use TiAl targets, arc current be 60~
65A, depositing temperature are 260~270 DEG C, and substrate bias is -80V~-220V, and is passed through nitrogen, the flow of nitrogen is 500~
The thickness of 700sccm, depositing Ti Al coatings, TiAl coatings are 200~500 μm;Then Cr coatings are prepared, using Cr targets, Cr targets
Arc current is 60A, and depositing temperature is 260~270 DEG C, and substrate bias is -80V~-220V, and is passed through nitrogen, the stream of nitrogen
Amount is 500~700sccm, deposits CrN coatings, and CrN coating layer thicknesses are 200~400 μm.
Further, the preparation method of the TiAl/TiAlCr coatings is:Using TiAl targets, arc current is 60~
65A, depositing temperature are 260~270 DEG C, and substrate bias is -80V~-220V, and is passed through nitrogen, the flow of nitrogen is 500~
The thickness of 700sccm, depositing Ti Al coatings, TiAl coatings are 200~500 μm;Then it prepares TiAlCr and uses TiAl targets and Cr
Target, TiAl target arc currents be 60~65A, Cr target arc currents be 40A, depositing temperature be 260~270 DEG C, substrate bias be-
80V~-220V, and it is passed through nitrogen, the flow of nitrogen is 500~700sccm, depositing Ti AlCr coatings, TiAlCr coating layer thicknesses
It is 200~400 μm.
The present invention also provides a kind of titanium alloy cutting cutter materials using with PVD coatings obtained by above-mentioned preparation method
Material, the PVD coatings of stating are multi-element coating, and the multi-element coating includes main coating and protective coating, and the main coating is TiCN
With TiCNO multi-element coatings, in the multi-element coating, the oxygen atom of incorporation is instead of the carbon atom or nitrogen original in the TiCN of part
Son, multi-element coating are face-centred cubic structure, and thickness is 500~800 μm;The protective coating is TiAlZr/TiAlZrCr coatings,
TiAlZr/CrN coatings, TiAlZr/ZrN coatings, TiAl/CrN coatings or TiAl/TiAlCr coatings, thickness are 400~800 μm.
Further, further include TiN bond coatings between the main coating and sample tool surface, thickness is 80~
120 μm of TiN bond coatings play a transition role between TiCNO and TiCN coatings and matrix, improve interface binding power and film/
Binding performance between matrix.
Further, TiCN the and TiCNO multi-element coatings are TiC0.78N0.52And TiC0.63N0.471O0.21Multi-element coating.
Compared with prior art, the present invention having the following advantages that and advantageous effect:
Main coating in the present invention is TiCN and TiCNO multi-element coatings, which is provided simultaneously with TiCN and Al2O3It applies
Layer the advantages of, the coated grains shape uniformly, crystallite dimension refinement, crystal grain marshalling and it is close, with refined crystalline strengthening work
With;Along with the TICN lattices that enter of oxygen atom generate distortion of lattice, play the role of solution strengthening.Generally so that apply
The dense structure of layer, hardness improve.
PVD coatings are provided with TiN bond coatings in the present invention, and TiN bond coatings play matrix and the transition of main coating is made
With the interface binding power between raising main coating and matrix improves the binding performance between film/matrix.PVD coatings are set in the present invention
It is set to multi-element coating cutter, the growth of the column crystal in coating interface has been interrupted due to multi-element coating, so that coating interface
It is strengthened, it is intercrystalline to be tightly combined, to improve the hardness of coating.Further, since the microhardness and film/base of coating
The promotion of binding force largely also improves the abrasion resistance energy of coating.
Contain Zr elements in multi-element coating, the bonding abrasion degree between cutter and titanium alloy can be reduced, bonding abrasion is
The main failure forms of machining titanium alloy cutter, so, the addition of Zr greatly improves the wearability of cutter.In multi-element coating
Coating containing Cr can be improved appearance surface hardness, film/base junction resultant force and inoxidizability, reduce friction coefficient, extends cutter and use
Service life.
Description of the drawings
Fig. 1 is the room temperature friction coefficient curve figure of the titanium alloy cutting cutter material with PVD coatings;
Fig. 2 be before processing and treated cutter sample in 500~900 DEG C of oxidation weight gain curve figures.
Specific implementation mode
The present invention is more specifically described in detail with reference to specific embodiment and Figure of description.
Tool matrix in the present embodiment is W18Cr4V tool steel.The equipment that the present embodiment uses is Swiss-PVD coating
Company model is the coating apparatus depositing coating of SP1500.
Embodiment 1:
For the preparation method of the titanium alloy cutting cutter material with PVD coatings in the present embodiment, using physical
Cathodic arc evaporation technique in vapor deposition PVD prepares multi-element coating, specifically includes following steps:
First, sample is cleaned, removes greasy dirt, rusty stain, dust of workpiece etc., it is ensured that workpiece obtains good coat knot
With joint efforts.It is first polished step by step with silicon carbide paper, then the polishing treatment to specimen surface.Carry out sandblast, can be used corundum,
SiO2Equal sand grains sandblast, and obtain surface clean, that essence is rough.Then sample cutter is surpassed respectively using the third bronze medal and ethyl alcohol
Sound wave cleans.It carries out Ion Cleaning and prepares bond coating:Installation Ti targets are sent after the cutter after cleaning is placed on work rest
Enter to vacuum chamber, it is 200~300mm to make the vertical range between matrix and arc source, is evacuated to less than 10-3Pa, and it is right simultaneously
Workpiece carries out heating and reaches preset temperature.It is -350V to apply substrate bias to sample cutter, is passed through unlatching arc initiation device,
The striking under condition of high vacuum degree, the ion that Ti targets are emitted reach specimen surface, and ion sputtering cleaning, cleaning are carried out to specimen surface
Time is 5~10 minutes.Then, it is passed through nitrogen, nitrogen flow is 600~650sccm, applies substrate bias -80V~-220V,
In specimen surface depositing TiN bond coating, thickness is 80~120 μm.
Prepare main coating, that is, TiCNO and TiCN coatings:It is prepared using the cathodic arc evaporation in physical vapour deposition (PVD) PVD
TiCNO and TiCN coatings.The Ti targets of use, Ti target arc currents are 60~65A, and depositing temperature is 260~270 DEG C, and matrix is inclined
Pressure is -80V~-220V, keeps and be passed through nitrogen, C2H2And reacted in CO mixed gas to reative cell, the flow of nitrogen is 400
~500sccm, C2H2Flow be 150~300sccm, the flow of CO is 80~200sccm, generates that prepare TiCNO and TiCN mixed
Coating is closed, the thickness of TiCNO and TiCN coatings is 500~800 μm.
In above-mentioned steps, the volume ratio of nitrogen and other gases is 2: 1~3: 1, can the accounting appropriate that improve nitrogen.
In the present embodiment, when nitrogen accounts for it is relatively high when, in deposition, arc macular area nearby easily generates nitride deposition on target surface, and nitrogenizes
The fusing point of object is high, can reduce hole size of burning, the generation of drop, limits for cathode surface when reducing cathodic vacuum arc discharge
Ablation.
Prepare protective coating;Protective coating is TiAlZr/TiAlZrCr coatings, uses TiAlZr targets, arc current first
For 50~60A, depositing temperature is 260~270 DEG C, and substrate bias is -80V~-220V, and is passed through argon gas, and the flow of argon gas is
The thickness of 500~650sccm, depositing Ti AlZr coatings, TiAlZr coatings are 200~500 μm.Then TiAlZrCr uses are prepared
TiAlZr targets and Cr targets, TiAl target arc currents are 50~60A, and Cr target arc currents are 40A, and depositing temperature is 260~270
DEG C, substrate bias is -80V~-220V, and is passed through argon gas and nitrogen, and the flow of argon gas falls to 300~400sccm, nitrogen
Flow is 200~400sccm, and depositing Ti AlZrCr coatings, TiAlZrCr coating layer thicknesses are 200~400 μm.
Embodiment 2:
The sample of the preparation method of the titanium alloy cutting cutter material with PVD coatings is cleaned in the present embodiment, is viscous
It ties bottom preparation and main coating preparation process is same as Example 1;Protective coating is TiAlZr/CrN coatings in the present embodiment.
The preparation method of protective coating is:TiAlZr targets are used first, and it is 50~60A, deposition to use TiAlZr targets, arc current first
Temperature is 260~270 DEG C, and substrate bias is -80V~-220V, and is passed through argon gas, and the flow of argon gas is 500~650sccm, is sunk
The thickness of product TiAlZr coatings, TiAlZr coatings is 200~500 μm.Then Cr coatings are prepared, using Cr targets, Cr targets electric arc electricity
Stream is 40A, and depositing temperature is 260~270 DEG C, and substrate bias is -80V~-220V, and is passed through argon gas and nitrogen, the stream of argon gas
Amount falls to 300~400sccm, and the flow of nitrogen is 200~400sccm, deposits CrN coatings, and CrN coating layer thicknesses are 200~
400μm。
Embodiment 3:
The sample of the preparation method of the titanium alloy cutting cutter material with PVD coatings is cleaned in the present embodiment, is viscous
It ties bottom preparation and main coating preparation process is same as Example 1;Protective coating is TiAlZr/ZrN coatings in the present embodiment.
The preparation method of protective coating is:Protective coating can be TiAlZr/ZrN coatings.TiAlZr targets are used first, are used first
TiAlZr targets, arc current are 50~60A, and depositing temperature is 260~270 DEG C, and substrate bias is -80V~-220V, and is passed through
The flow of argon gas, argon gas is 500~650sccm, and the thickness of depositing Ti AlZr coatings, TiAlZr coatings is 200~500 μm.So
After prepare Zr coatings, using Zr targets, Zr target arc currents are 60A, and depositing temperature is 260~270 DEG C, and substrate bias is -80V
~-220V, and be passed through argon gas and nitrogen, the flow of argon gas fall to 300~400sccm, and the flow of nitrogen is 200~
400sccm, deposits ZrN coatings, and ZrN coating layer thicknesses are 200~400 μm.
Embodiment 4:
The sample of the preparation method of the titanium alloy cutting cutter material with PVD coatings is cleaned in the present embodiment, is viscous
It ties bottom preparation and main coating preparation process is same as Example 1;Protective coating is TiAl/CrN coatings in the present embodiment.It protects
Shield coating preparation method be:Protective coating is TiAl/CrN coatings.It is 60~65A to use TiAl targets, arc current first, is sunk
Accumulated temperature degree is 260~270 DEG C, and substrate bias is -80V~-220V, and is passed through nitrogen, and the flow of nitrogen is 500~700sccm,
The thickness of depositing Ti Al coatings, TiAl coatings is 200~500 μm.Then Cr coatings are prepared.Using Cr targets, Cr target arc currents
For 60A, depositing temperature is 260~270 DEG C, and substrate bias is -80V~-220V, and is passed through nitrogen, the flow of nitrogen is 500~
700sccm, deposits CrN coatings, and CrN coating layer thicknesses are 200~400 μm.
Embodiment 5:
The sample of the preparation method of the titanium alloy cutting cutter material with PVD coatings is cleaned in the present embodiment, is viscous
It ties bottom preparation and main coating preparation process is same as Example 1;Protective coating is that TiAl/TiAlCr is applied in the present embodiment
Layer.The preparation method of protective coating is:Protective coating can be TiAl/TiAlCr multi-element coatings, use TiAl targets, electric arc electricity first
Stream is 60~65A, and depositing temperature is 260~270 DEG C, and substrate bias is -80V~-220V, and is passed through nitrogen, the flow of nitrogen
Thickness for 500~700sccm, depositing Ti Al coatings, TiAl coatings is 200~500 μm.Then it prepares TiAlCr and uses TiAl
Target and Cr targets, TiAl target arc currents are 60~65A, and Cr target arc currents are 40A, and depositing temperature is 260~270 DEG C, matrix
Bias is -80V~-220V, and is passed through nitrogen, and the flow of nitrogen is 500~700sccm, depositing Ti AlCr coatings, TiAlCr paintings
Layer thickness is 200~400 μm.
Arc current is ranging from tested and is measured in above-described embodiment 1 to the technique in embodiment 5, needed for conventional coating
Arc current value, and the lower value in desirable arc current value range takes smaller current value decrease electric arc appropriate
Electric discharge, reduce arc spot number, while reducing micro- molten bath area, reduce number of drops, improve the quality of coating deposition.Even if electric arc
The reduction of current value can reduce the rate of evaporation and deposition, and then the deposition efficiency influenced to a certain degree, however, being adopted in the present invention
With the technique of multilayer multi-element coating, it can equally reach high arc current value and be formed by compactness possessed by coating surface,
High rigidity and wear-resisting characteristic.
Target stretches progress using the technique for mixing hot pressing, hot isostatic pressing, cold pressing and sintering, cast, hot rolling or cold rolling
Forming processes, after the heat treatment process such as matter, sintering, carry out mechanical processing combined with backboard it is obtained.
For single TiCN coatings, dissolves each other the unlimited solid solution to be formed for TiC and TiN, there is NaCl type face-centered cubics
Amorphous carbon is easily precipitated in structure, so that structural transformation progress faster, thermal stability is poor, and defect concentration reduces in coating,
Stress release.In main coating, such as TiCN and TiCNO multi-element coatings generated in embodiment 1 to embodiment 5, the oxygen of incorporation
Atom is similarly NaCl type face-centred cubic structures, is solid-solution in face-centered cubic instead of the C atoms or N atoms in the TiCN of part, TiO
In lattice, TiCNO solid solution is formed.The texture coefficient of TiCN and TiCNO multi-element coatings increases, can in conjunction with XRD spectrum
Know, the diffracted intensity of coating is also improved, this is because the interaction of oxygen atom and carbon atom promotes nitrogen-atoms
Deposition.For coating morphology, the crystal of TiCN single coatings is coarse, and size is uneven, and there are rib ridges for inside.And TiCN and
The grain shape of TiCNO multi-element coatings refines, and grain particles reduce, and grain size is not much different, and crystal grain is neatly tightly combined, and is made
Coating hardness is obtained to improve.TiCN and TiCNO multi-element coatings hardness compared with single TiCN coatings is improved, oxygen atom
Solution strengthening effect and refined crystalline strengthening effect are produced into TiCN lattices are made so that coating structure is more fine and compact.
Prepared TiCN and TiCNO multi-element coatings are TiC in the present embodiment0.78N0.52And TiC0.63N0.47lO0.21It is polynary
Coating.
Contain Zr elements in embodiment 1 and embodiment 2 in multi-element coating, embodiment 3 generates ZrN coatings, embodiment 1-3 institutes
The coating of generation can reduce the adhesive wear degree with Ti alloys, and wear-resisting property is greatly improved, can be widely applied to
High speed cutting tool effectively reduces the abrasion of cutter, improves the cutting quality of workpiece.It is applied generated in embodiment 4 and embodiment 5
In layer, outermost tunic is the coating containing Cr, since outermost layer coating contains Cr elements so that sample appearance surface hardness, film/base junction
Resultant force and inoxidizability are significantly improved, and multicomponent membrane cutter is applicable to the High-speed machining of 400m/min or more,
And cutting ability and thermal stability get a promotion, and end wear amount reduces, and service life extends.
The coating hardness of multi-element coating cutter prepared by embodiment 1 to embodiment 5 is higher than the hardness of untreated sample,
This is because the multilayer multi-element coating of deposition has interrupted the growth of the column crystal in coating interface, so that coating interface obtains
Strengthen.With the increase of coating layer thickness known to following table, and the microhardness for the sample for being coated with multi-element coating is made to significantly increase,
This is because with the increase of coating layer thickness, intercrystalline combination is even closer, causes coating finer and close, is applied to improve
The hardness of layer.
Coating layer thickness | Hardness (HV before processing0.01) | Hardness (HV after processing0.01) |
1000μm | 2650±50 | 3500±50 |
1200μm | 2650±50 | 3750±50 |
1400μm | 2650±50 | 3850±50 |
Treated multi-element coating cutter both has a higher rigid nature compared with sample before processing, and the film improved/
Binding force between base.Before depositing Ti CNO and TiCN coating, TiN bond coatings are prepared, improve TiCNO and TiCN coatings and matrix
Between interface binding power, improve film/matrix between binding performance.Under normal conditions, due to being deposited between multi-element coating and matrix
In certain lattice equations, this so that the binding force between coating and matrix is declined.However, due to TiN bond coatings
Play matrix and TiCNO and TiCN coating transitional functions, meanwhile, TiAl coatings play TiCNO and TiCN coatings and Cr coatings it
Between transitional function.In this way, improving the compatibility between gradient coating composition consecutive variations and each coating, subtract to a certain extent
The thermal stress that small multi-element coating is generated due to coefficient of thermal expansion difference so that good combination is presented in interface between each coating
State improves the film-substrate cohesion of multi-element coating.
Coating layer thickness | Binding force (N) before processing | Binding force (N) after processing |
1000μm | 180±50 | > 220 |
1200μm | 180±50 | > 220 |
1400μm | 180±50 | > 220 |
Between the 1 average room temperature friction coefficient that can be seen that prepared coating is 0.3~0.4 with reference to the accompanying drawings, and with
Deposition thickness difference, friction system is reduced and fluctuates reduction.This is because the microhardness and film of coating/base junction are closed
Power greatly enhances the abrasion resistance energy of coating.In addition, for the surface topography of coating abrasion, wear area reduces,
Friction groove trace, crackle and the degree mitigation for peeling off hole.
As shown in Fig. 2, for that rear sample will be placed at 500~900 DEG C before treatment, the curve graph of oxidation 5 hours.From figure
Can be seen that, the oxidation weight gain of sample after treatment significantly lower than processing before sample, sample after treatment its high temperature resistance gasification property
Getable apparent improvement.It can be seen from the figure that at 500~700 DEG C, treated, and sample still increases weight without apparent, and
When temperature is more than 700~800 DEG C, treated, and sample increases slowly weightening with temperature, when temperature is more than 800 DEG C, the oxygen of sample
Change weightening to be substantially increased, at this point, coating failure.
The above-mentioned measurement for hardness is measured using microhardness testers, and the mode that multigroup sample is averaged is arranged;
Coating adhesion scratch test machine is carried out using WS-97 and measures bond strength;Using scanning electron microscope sem and X-ray diffractometer XRD
Carry out coating morphology and Phase Structure Analysis.
The implementation of the present invention is not limited to this, and the above according to the invention is known using the ordinary skill of this field
Knowledge and customary means, under the premise of not departing from above-mentioned basic fundamental thought of the invention, the present invention can also make other a variety of shapes
Modification, replacement or the change of formula, all fall within rights protection scope of the present invention.
Claims (10)
1. a kind of preparation method of the titanium alloy cutting cutter material with PVD coatings, using in physical gas phase deposition technology
Cathodic arc evaporation technique prepares multi-element coating, which is characterized in that above-mentioned technical process includes the following steps:
Cleaning is polished to sample cutter:It is polished step by step using silicon carbide paper successively, polishing treatment, sandblast and the third bronze medal
And ethyl alcohol carries out ultrasonic cleaning to sample cutter respectively;
Prepare bonding bottom:Ti targets are installed, after the cutter after cleaning is placed on work rest, vacuum chamber is sent into, makes matrix and arc
Vertical range between source is 200~300mm, is evacuated to less than 10-3Pa, and simultaneously to workpiece carry out heating reach it is pre-
If temperature;It is passed through nitrogen, nitrogen flow is 600~650sccm, applies substrate bias -80V~-220V, is deposited in specimen surface
TiN bond coatings;
Prepare main coating:The main coating is TiCNO and TiCN multi-element coatings:The Ti targets of use, Ti target arc currents be 60~
65A, depositing temperature are 260~270 DEG C, and substrate bias is -80V~-220V, keeps and be passed through nitrogen, C2H2And CO mixed gas
To being reacted in reative cell, the flow of nitrogen is 400~500sccm, C2H2Flow be 150~300sccm, the flow of CO is 80
~200sccm is generated and is prepared TiCNO and TiCN mixed coatings;
Prepare protective coating:The protective coating is TiAlZr/TiAlZrCr coatings, TiAlZr/CrN coatings, TiAlZr/ZrN
Coating, TiAl/CrN coatings or TiAl/TiAlCr coatings take target corresponding with coating when preparing above-mentioned multi-element coating
Material and target arc current are passed through nitrogen or argon gas, and depositing temperature is 260~270 DEG C, and substrate bias is -80V~-220V.
2. the preparation method of the titanium alloy cutting cutter material according to claim 1 with PVD coatings, feature exist
In:Further include Ion Cleaning step, it is -350V specially to apply substrate bias to sample cutter, is passed through unlatching arc initiation device,
Striking under condition of high vacuum degree, ion that Ti targets are emitted reach specimen surface, and ion sputtering cleaning is carried out to specimen surface, when cleaning
Between be 5~10 minutes.
3. the preparation method of the titanium alloy cutting cutter material according to claim 1 or 2 with PVD coatings, feature
It is:The preparation method of the TiAlZr/TiAlZrCr coatings is:Using TiAlZr targets, arc current is 50~60A, deposition
Temperature is 260~270 DEG C, and substrate bias is -80V~-220V, and is passed through argon gas, and the flow of argon gas is 500~650sccm, is sunk
The thickness of product TiAlZr coatings, TiAlZr coatings is 300~500 μm;Then use TiAlZr targets and Cr targets, TiAl targets electric arc electricity
Stream is 50~60A, and Cr target arc currents are 40A, and depositing temperature is 260~270 DEG C, and substrate bias is -80V~-220V, and is led to
Enter argon gas and nitrogen, the flow of argon gas falls to 300~400sccm, and the flow of nitrogen is 200~400sccm, deposition
TiAlZrCr coatings, TiAlZrCr coating layer thicknesses are 200~400 μm.
4. the preparation method of the titanium alloy cutting cutter material according to claim 1 or 2 with PVD coatings, feature
It is:The preparation method of the TiAlZr/CrN coatings is:Using TiAlZr targets, using TiAlZr targets, arc current is 50~
60A, depositing temperature are 260~270 DEG C, and substrate bias is -80V~-220V, and is passed through argon gas, the flow of argon gas is 500~
The thickness of 650sccm, depositing Ti AlZr coatings, TiAlZr coatings are 200~500 μm;Then Zr targets, Zr target arc currents are used
For 60A, depositing temperature is 260~270 DEG C, and substrate bias is -80V~-220V, and is passed through argon gas and nitrogen, the flow of argon gas
300~400sccm is fallen to, the flow of nitrogen is 200~400sccm, deposits ZrN coatings, and ZrN coating layer thicknesses are 200~400
μm。
5. the preparation method of the titanium alloy cutting cutter material according to claim 1 or 2 with PVD coatings, feature
It is:The preparation method of the TiAIZr/ZrN coatings is:Using TiAIZr targets, using TiAlZr targets, arc current is 50~
60A, depositing temperature are 260~270 DEG C, and substrate bias is -80V~-220V, and is passed through argon gas, the flow of argon gas is 500~
The thickness of 650sccm, depositing Ti AlZr coatings, TiAlZr coatings are 200~500 μm;Then Zr coatings are prepared, using Zr targets,
Zr target arc currents are 60A, and depositing temperature is 260~270 DEG C, and substrate bias is -80V~-220V, and is passed through argon gas and nitrogen
The flow of gas, argon gas falls to 300~400sccm, and the flow of nitrogen is 200~400sccm, deposits ZrN coatings, ZrN coatings
Thickness is 200~400 μm.
6. the preparation method of the titanium alloy cutting cutter material according to claim 1 or 2 with PVD coatings, feature
It is:The preparation method of the TiAl/CrN coatings is:It is 60~65A to use TiAl targets, arc current first, and depositing temperature is
260~270 DEG C, substrate bias is -80V~-220V, and is passed through nitrogen, and the flow of nitrogen is 500~700sccm, depositing Ti Al
The thickness of coating, TiAl coatings is 200~500 μm;Then Cr coatings are prepared, using Cr targets, Cr target arc currents are 60A, are sunk
Accumulated temperature degree is 260~270 DEG C, and substrate bias is -80V~-220V, and is passed through nitrogen, and the flow of nitrogen is 500~700sccm,
CrN coatings are deposited, CrN coating layer thicknesses are 200~400 μm.
7. the preparation method of the titanium alloy cutting cutter material according to claim 1 or 2 with PVD coatings, feature
It is:The preparation method of the TiAl/TiAlCr coatings is:Using TiAl targets, arc current is 60~65A, and depositing temperature is
260~270 DEG C, substrate bias is -80V~-220V, and is passed through nitrogen, and the flow of nitrogen is 500~700sccm, depositing Ti Al
The thickness of coating, TiAl coatings is 200~500 μm;Then it prepares TiAlCr and uses TiAl targets and Cr targets, TiAl target arc currents
For 60~65A, Cr target arc currents are 40A, and depositing temperature is 260~270 DEG C, and substrate bias is -80V~-220V, and is passed through
The flow of nitrogen, nitrogen is 500~700sccm, and depositing Ti AlCr coatings, TiAlCr coating layer thicknesses are 200~400 μm.
8. the titanium alloy cutting cutter material with PVD coatings, institute obtained by a kind of preparation method by described in claim 1
It is multi-element coating to state PVD coatings, and the multi-element coating includes main coating and protective coating, it is characterised in that:The main coating is
TiCN and TiCNO multi-element coatings, in the multi-element coating, the oxygen atom of incorporation is instead of the carbon atom or nitrogen in the TiCN of part
Atom, multi-element coating are face-centred cubic structure, and thickness is 500~800 μm;The protective coating applies for TiAlZr/TiAlZrCr
Layer, TiAlZr/CrN coatings, TiAlZr/ZrN coatings, TiAl/CrN coatings or TiAl/TiAlCr coatings, thickness are 400~800
μm。
9. the titanium alloy cutting cutter material according to claim 7 with PVD coatings, it is characterised in that:In the master
Further include TiN bond coatings between coating and sample tool surface, thickness is 80~120 μm of TiN bond coatings in TiCNO
And play a transition role between TiCN coatings and matrix, improve the binding performance between interface binding power and film/matrix.
10. the titanium alloy cutting cutter material according to claim 7 with PVD coatings, it is characterised in that:The TiCN
It is TiC with TiCNO multi-element coatings0.78N0.52And TiC0.63N0.47O0.21Multi-element coating.
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