CN116559199A - Film defect detection device and detection method based on machine vision - Google Patents

Film defect detection device and detection method based on machine vision Download PDF

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Publication number
CN116559199A
CN116559199A CN202310835271.8A CN202310835271A CN116559199A CN 116559199 A CN116559199 A CN 116559199A CN 202310835271 A CN202310835271 A CN 202310835271A CN 116559199 A CN116559199 A CN 116559199A
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CN
China
Prior art keywords
linear
thin film
light
polaroid
film
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Pending
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CN202310835271.8A
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Chinese (zh)
Inventor
葛铭
程言平
魏江
沈井学
李晖
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Hangzhou Baizijian Technology Co ltd
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Hangzhou Baizijian Technology Co ltd
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Priority to CN202310835271.8A priority Critical patent/CN116559199A/en
Publication of CN116559199A publication Critical patent/CN116559199A/en
Pending legal-status Critical Current

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    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/95Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/01Arrangements or apparatus for facilitating the optical investigation
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy

Abstract

The embodiment of the invention discloses a thin film defect detection device and method based on machine vision. The film defect detection device is used for detecting whether a film to be detected has defects or not and comprises a light source, a first linear polaroid, a second linear polaroid and a camera which are sequentially arranged along a first direction, the film to be detected is positioned between the first linear polaroid and the second linear polaroid, the first direction intersects with a plane where the film to be detected is positioned, and a transmission shaft of the first linear polaroid and a transmission shaft of the second linear polaroid form a first preset included angle; the illumination light emitted by the light source is changed into first linearly polarized light after being transmitted by the first linear polarizing plate, the first linearly polarized light is transmitted by the film to be detected, and then is incident to the camera after being partially transmitted by the second linear polarizing plate, and the camera images according to the received light. The technical scheme of the embodiment of the invention adopts the technology of direct transmission and combined polaroid, and can solve the detection of uneven polishing, scar-like, water ripple and longitudinal grain defects caused by molecular stress.

Description

Film defect detection device and detection method based on machine vision
Technical Field
The invention relates to the technical field of film testing, in particular to a film defect detection device and method based on machine vision.
Background
In the film substrate industry at present, the defect detection requirement is higher and higher, and the popularization is wider and wider. The common flaw detection mostly adopts backlight detection, for example, the direct transmission bright field has the best detection effect on flaws of foreign matters (such as black spots, mosquitoes, impurities and the like); the direct transmission can solve the detection of some flaws (such as pits, bumps, folds and the like) with three-dimensional sense; the fish eye technology can well solve the detection of scratch defects. However, there is a lack of suitable detection means for uneven polishing, scar-like, moire and longitudinal pattern defects caused by molecular stress.
Disclosure of Invention
The embodiment of the invention provides a thin film defect detection device and a detection method based on machine vision, wherein the thin film defect detection device adopts a direct transmission and combined polaroid technology, and can solve the detection of uneven polishing, scar-like, water ripple and longitudinal grain defects caused by molecular stress.
According to an aspect of the present invention, there is provided a machine vision-based thin film defect detection device for detecting whether a thin film to be detected has a defect, where the thin film defect detection device includes a light source, a first linear polarizer, a second linear polarizer, and a camera sequentially disposed along a first direction, the thin film to be detected is located between the first linear polarizer and the second linear polarizer, the first direction intersects a plane in which the thin film to be detected is located, and a transmission axis of the first linear polarizer and a transmission axis of the second linear polarizer form a first preset included angle;
the illumination light emitted by the light source is changed into first linearly polarized light after being transmitted by the first linearly polarized plate, the first linearly polarized light is transmitted by the film to be detected and then is incident to the camera after being partially transmitted by the second linearly polarized plate, and the camera images according to the received light.
Optionally, the optical fiber polarizing device further comprises a rotating structure, wherein the rotating structure is used for driving the first linear polarizer and/or the second linear polarizer to rotate by taking the second direction as an axis so as to adjust an included angle between a transmission axis of the first linear polarizer and a transmission axis of the second linear polarizer;
the first linear polaroid and the second linear polaroid are parallel, and the second direction is perpendicular to the plane where the first linear polaroid is located.
Optionally, the first preset included angle is greater than or equal to 45 ° and less than or equal to 75 °.
Optionally, the first linearly polarized light is perpendicularly incident to the film to be tested.
Optionally, the first linearly polarized light is obliquely incident to the film to be tested at a second preset included angle.
Optionally, the second preset included angle is greater than or equal to 45 ° and less than or equal to 60 °.
Optionally, the light source includes a light emitting diode lamp plate, and a diffusion film and a condensing rod located on a light emitting side of the light emitting diode lamp plate.
Optionally, the camera includes a fixed focus lens and a photosensitive element located at a side of the fixed focus lens, which is away from the film to be measured, and the light transmitted by the second linear polarizer passes through the fixed focus lens and then enters the photosensitive element.
Optionally, the first linear polarizer comprises an industrial polarizing film or polarizing glass.
According to another aspect of the present invention, there is provided a machine vision-based thin film defect detection method, which is performed using the above thin film defect detection apparatus, the thin film defect detection method comprising:
the light source emits illumination light, and the illumination light is incident to the first linear polaroid;
the first linear polarizing plate transmits the illumination light and converts the illumination light into first linear polarized light, and the first linear polarized light is incident to the film to be tested and transmitted to the second linear polarizing plate;
the camera collects the transmitted light of the second linear polaroid and collects images;
and detecting whether the film to be detected has defects according to the image.
The film defect detection device is used for detecting whether a film to be detected has defects or not, and comprises a light source, a first linear polaroid, a second linear polaroid and a camera which are sequentially arranged along a first direction, wherein the film to be detected is positioned between the first linear polaroid and the second linear polaroid, the first direction is intersected with a plane where the film to be detected is positioned, and a transmission shaft of the first linear polaroid and a transmission shaft of the second linear polaroid form a first preset included angle; the illumination light emitted by the light source is changed into first linearly polarized light after being transmitted by the first linear polarizing plate, the first linearly polarized light is transmitted by the film to be detected, and then is incident to the camera after being partially transmitted by the second linear polarizing plate, and the camera images according to the received light. Through increasing the combination of first linear polarizer and second linear polarizer under the direct transmission detection environment, set up the transmission axis of first linear polarizer and the transmission axis of second linear polarizer and have first default contained angle to the interference light of filtering, thereby detect polishing uneven, scar appearance, ripple and the longitudinal grain class defect that material molecule stress caused.
It should be understood that the description in this section is not intended to identify key or critical features of the embodiments of the invention or to delineate the scope of the invention. Other features of the present invention will become apparent from the description that follows.
Drawings
In order to more clearly illustrate the technical solutions of the embodiments of the present invention, the drawings required for the description of the embodiments will be briefly described below, and it is apparent that the drawings in the following description are only some embodiments of the present invention, and other drawings may be obtained according to these drawings without inventive effort for a person skilled in the art.
FIG. 1 is a schematic diagram of a thin film defect detecting device in the prior art;
FIG. 2 is a schematic structural diagram of a machine vision-based thin film defect detection device according to an embodiment of the present invention;
FIG. 3 is a schematic diagram of another machine vision-based thin film defect detection apparatus according to an embodiment of the present invention;
FIG. 4 is a schematic diagram of a film defect detecting device based on machine vision according to another embodiment of the present invention;
FIG. 5 is a schematic diagram of a film defect detecting device based on machine vision according to another embodiment of the present invention;
fig. 6 and fig. 7 are schematic diagrams showing comparison of results of a portion of samples detected by using the thin film defect detecting device according to the prior art and the embodiment of the present invention.
Detailed Description
In order that those skilled in the art will better understand the present invention, a technical solution in the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings in which it is apparent that the described embodiments are only some embodiments of the present invention, not all embodiments. All other embodiments, which can be made by those skilled in the art based on the embodiments of the present invention without making any inventive effort, shall fall within the scope of the present invention.
It should be noted that the terms "first," "second," and the like in the description and the claims of the present invention and the above figures are used for distinguishing between similar objects and not necessarily for describing a particular sequential or chronological order. It is to be understood that the data so used may be interchanged where appropriate such that the embodiments of the invention described herein may be implemented in sequences other than those illustrated or otherwise described herein. Furthermore, the terms "comprises," "comprising," and "having," and any variations thereof, are intended to cover a non-exclusive inclusion, such that a process, method, system, article, or apparatus that comprises a list of steps or elements is not necessarily limited to those steps or elements expressly listed but may include other steps or elements not expressly listed or inherent to such process, method, article, or apparatus.
Fig. 1 is a schematic structural diagram of a film defect detecting device in the prior art, referring to fig. 1, the film defect detecting device is a direct transmission detecting device, and includes a light source 1 and a camera 2, a film 3 to be detected is disposed between the light source 1 and the camera 2, the film 3 to be detected is irradiated by the light source 1 during detection, an image is collected by the camera 2, and then whether the film 3 to be detected has a defect is identified by using an image identification technology. However, this detection technique is difficult to detect polishing unevenness, scar-like, moire and longitudinal pattern defects caused by molecular stress.
In order to solve the above problems, an embodiment of the present invention provides a thin film defect detection device based on machine vision. Fig. 2 is a schematic structural diagram of a film defect detecting device based on machine vision according to an embodiment of the present invention, where the film defect detecting device is used for detecting whether a film to be detected has defects, where the film to be detected may be Polycarbonate (PC), polymethyl methacrylate (PMMA) and related composite films, and the defects to be detected include polishing non-uniformity, scar-like, water ripple and longitudinal defects caused by molecular stress. Referring to fig. 2, the thin film defect detecting device provided in this embodiment includes a light source 10, a first linear polarizer 20, a second linear polarizer 30 and a camera 40 sequentially arranged along a first direction x, a thin film 50 to be detected is located between the first linear polarizer 20 and the second linear polarizer 30, the first direction x intersects a plane of the thin film 50 to be detected, and a transmission axis of the first linear polarizer 30 and a transmission axis of the second linear polarizer 40 form a first preset included angle α; the illumination light a emitted from the light source is transmitted through the first linear polarizer 20 and becomes first linear polarized light b, the first linear polarized light b is transmitted through the film 50 to be measured and then is incident to the camera 40 after being partially transmitted through the second linear polarizer 40, and the camera 40 images according to the received light.
It can be understood that the included angle of the transmission axes in the combination of linear polarizers is very important, and the transmittance is strongest when the transmission axes of the two linear polarizers are parallel; the light transmittance is worst when the transmission axes of the two linear polarizers are perpendicular. In this embodiment, the light source 10 emits unpolarized natural light a, and the unpolarized natural light a is transmitted through the first linear polarizer 10 to form linearly polarized light b with a polarization direction parallel to the transmission axis direction of the first linear polarizer 20, and the transmission axis of the first linear polarizer 20 and the transmission axis of the second linear polarizer 30 have the first preset included angle α, so that interference light is filtered out, and detection of defects caused by molecular stress is realized. Optionally, the first preset included angle α is greater than or equal to 45 ° and less than or equal to 75 °, which can be adjusted according to the optical characteristics of the film 50 to be measured during implementation. For example, the thickness of the film 50 to be tested is different, the first preset included angle is different, and the size of the first preset included angle can be selected according to practical experiment tests during implementation.
According to the technical scheme, the combination of the first linear polaroid and the second linear polaroid is added in the direct transmission detection environment, and the transmission shaft of the first linear polaroid and the transmission shaft of the second linear polaroid are provided with a first preset included angle so as to filter interference light, so that uneven polishing, scar-like, water ripple and longitudinal grain defects caused by material molecular stress are detected.
In another embodiment, optionally, the thin film defect detecting device further includes a rotating structure, where the rotating structure is configured to drive the first linear polarizer and/or the second linear polarizer to rotate around the second direction as an axis, so as to adjust an included angle between a transmission axis of the first linear polarizer and a transmission axis of the second linear polarizer; the first linear polaroid and the second linear polaroid are parallel, and the second direction is perpendicular to the plane of the first linear polaroid.
For different films to be detected, the first preset included angle with the best detection effect may be different, so that the included angle of the transmission shafts of the two linear polarizers can be adjusted during detection by arranging the rotating structure, so that the film defect detection device provided by the embodiment is suitable for detecting different films to be detected, or the included angle can be adjusted during detection of a certain film to be detected, so as to achieve higher detection precision.
For example, taking the rotation structure to drive the second linear polarizer to rotate as an example, fig. 3 is a schematic structural diagram of another film defect detecting device based on machine vision according to an embodiment of the present invention, referring to fig. 3, the film detecting device further includes a rotation structure 60, and the rotation structure 60 drives the second linear polarizer to rotate along the axis of the second direction y, so as to adjust the included angle of the transmission axes of the two polarizers.
It should be noted that, in other embodiments, the rotation structure 60 may be configured to rotate the first linear polarizer 20, or rotate the first linear polarizer 20 and the second linear polarizer 30, which may be designed according to practical situations, and the embodiments of the present invention are not limited thereto.
Alternatively, with continued reference to FIG. 2, the first linearly polarized light b is normally incident on the film 50 under test. That is, the detection light is normally incident to the film 50 to be detected, and backlight is provided to the film 50 to be detected to detect defects.
Since in some cases, normal incidence may not be able to detect certain defects or the detection accuracy is insufficient, in another embodiment, optionally, the first linearly polarized light is obliquely incident to the film to be measured at a second preset included angle.
Fig. 4 is a schematic structural diagram of another film defect detecting device based on machine vision according to an embodiment of the present invention, and referring to fig. 4, a first linearly polarized light b is obliquely incident to a film 50 to be detected at a second preset included angle β, so as to improve the detection accuracy of the film to be detected.
Optionally, the second preset included angle β is greater than or equal to 45 ° and less than or equal to 60 °. The specific implementation can be selected according to the actual situation, and the embodiment of the invention is not limited to this.
Fig. 5 is a schematic structural diagram of another machine vision-based thin film defect detection device according to an embodiment of the present invention, and referring to fig. 5, optionally, a light source 10 includes a light emitting diode lamp plate 11, and a diffusion film 12 and a condensing rod 13 located on a light emitting side of the light emitting diode lamp plate 11. The light emitting diode lamp panel 11 is provided with a plurality of light emitting diodes, for example, in a certain embodiment, a light source adopts an LED lamp bar produced by windows, an LED lamp panel combination is adopted in the light source, a 48VDC power supply is used, and current can be adjusted; the diffusion film 12 and the condensing rod 13 are added in the structure, so that high-brightness, uniform and consistent linear illumination can be formed in the center of the lamp panel.
Optionally, with continued reference to fig. 5, the camera 40 includes a fixed-focus lens 41 and a photosensitive element 42 located on a side of the fixed-focus lens 41 away from the film 50 to be measured, and the light transmitted by the second linear polarizer 30 is incident to the photosensitive element 42 after passing through the fixed-focus lens 41. For example, in one embodiment, the fixed focus lens 41 is a Rodogon f=80 mm optical lens, the sensitivity to light is very good, and the photosensitive element 42 is a windows OPSIS8000 smart camera, so that the capturing of 80000 lines of images per second can be achieved. Alternatively, the first linear polarizer 20 comprises an industrial polarizing film or polarizing glass, wherein the polarizing glass is a hard material with better effect, and the second linear polarizer 30 adopts a ZOMEI CPL40.5mm polarizer with 99.5% transmittance and 99.3% polarization.
Experimental detection shows that uneven polishing and scar-like defect types can not be detected in the direct transmission detection environment in the prior art; and after adding the double polarizer, the defect can be detected, and the detection effect is optimal when the included angle of the double polarizers is adjusted to 67.5 degrees (the brightness is reduced by 75%). By using the thin film defect detection device provided by the embodiment, the actual defect detection capability is improved from 65% to more than 95%, and the defect detection rate aiming at uneven polishing, scar-like, water ripple and other molecular stresses is more than 99%.
Tables 1 and 2 show the comparison results after detection by the thin film defect detection device provided by the prior art and the embodiment of the present invention, respectively, wherein a represents that the detection can be performed, B represents that the detection is medium, and C represents that the detection cannot be performed. Fig. 6 and fig. 7 are schematic diagrams showing comparison of results of a part of samples detected by using the thin film defect detecting device provided by the prior art and the embodiment of the present invention, and as can be seen from table 1, table 2, fig. 6 and fig. 7, the thin film defect detecting device provided by the embodiment of the present invention has good detection capability for defects caused by molecular stress.
Sample of Defect name Direct transmission The brightness of the direct transmission and the double polarization is reduced by 50 percent The brightness of the direct transmission and the double polarized light is reduced by 75 percent
1 Transverse lines B C C
2 Water wave B A A
3 Oil drop C C A
4 Longitudinal grain C A A
5 Longitudinal grain C C C
6 Uneven Z-type polishing B A A
7 Uneven polishing B A A
8 Uneven polishing of water drops C A A
9 Uneven longitudinal polishing of edge C A A
10 Uneven polishing of strip C A A
TABLE 1
Sample of Defect name Oblique transmission + camera and sample contained angle 45 deg The brightness of the direct transmission and the double polarization is reduced by 50 percent The included angle between the +camera and the sample is 45 DEG Direct transmission + dual polarization brightness drop Low 75% + camera to sample angle 45°
1 Transverse lines B B B
2 Water wave B A A
3 Oil drop C B B
4 Longitudinal grain C B B
5 Longitudinal grain B B B
6 Uneven Z-type polishing B A A
7 Uneven polishing B A A
8 Uneven polishing of water drops C A A
9 Uneven longitudinal polishing of edge A A A
10 Uneven polishing of strip C A A
TABLE 2
Based on the same inventive concept, the embodiment of the present invention further provides a method for detecting a thin film defect based on machine vision, which is performed by using any one of the thin film defect detecting devices provided in the foregoing embodiment, and the method for detecting a thin film defect includes:
the light source emits illumination light, and the illumination light is incident to the first linear polaroid;
the first linear polarizing plate transmits illumination light and converts the illumination light into first linear polarized light, and the first linear polarized light is incident to the film to be tested and transmitted to the second linear polarizing plate;
the camera collects the transmitted light of the second linear polaroid and collects images;
and detecting whether the film to be detected has defects according to the image.
According to the machine vision-based film defect detection method provided by the embodiment of the invention, the combination of the first linear polaroid and the second linear polaroid is added in the direct transmission detection environment, and the transmission shaft of the first linear polaroid and the transmission shaft of the second linear polaroid are provided with the first preset included angle so as to filter interference light, so that uneven polishing, scar-like, water ripple and longitudinal grain defects caused by material molecular stress are detected.
The above embodiments do not limit the scope of the present invention. It will be apparent to those skilled in the art that various modifications, combinations, sub-combinations and alternatives are possible, depending on design requirements and other factors. Any modifications, equivalent substitutions and improvements made within the spirit and principles of the present invention should be included in the scope of the present invention.

Claims (10)

1. The film defect detection device based on machine vision is characterized by being used for detecting whether a film to be detected has a defect or not, and comprises a light source, a first linear polaroid, a second linear polaroid and a camera which are sequentially arranged along a first direction, wherein the film to be detected is positioned between the first linear polaroid and the second linear polaroid, the first direction intersects with a plane where the film to be detected is positioned, and a transmission shaft of the first linear polaroid and a transmission shaft of the second linear polaroid form a first preset included angle;
the illumination light emitted by the light source is changed into first linearly polarized light after being transmitted by the first linearly polarized plate, the first linearly polarized light is transmitted by the film to be detected and then is incident to the camera after being partially transmitted by the second linearly polarized plate, and the camera images according to the received light.
2. The thin film defect detection apparatus according to claim 1, further comprising a rotation structure for driving the first linear polarizer and/or the second linear polarizer to rotate about a second direction as an axis to adjust an included angle between a transmission axis of the first linear polarizer and a transmission axis of the second linear polarizer;
the first linear polaroid and the second linear polaroid are parallel, and the second direction is perpendicular to the plane where the first linear polaroid is located.
3. The thin film defect inspection apparatus of claim 1, wherein the first predetermined included angle is greater than or equal to 45 ° and less than or equal to 75 °.
4. The thin film defect inspection apparatus according to claim 1, wherein the first linearly polarized light is perpendicularly incident to the thin film under inspection.
5. The apparatus according to claim 1, wherein the first linearly polarized light is obliquely incident on the thin film under test at a second predetermined angle.
6. The thin film defect inspection apparatus according to claim 5, wherein the second predetermined included angle is greater than or equal to 45 ° and less than or equal to 60 °.
7. The thin film defect detection apparatus according to claim 1, wherein the light source comprises a light emitting diode lamp panel, and a diffusion film and a condensing bar are disposed on a light emitting side of the light emitting diode lamp panel.
8. The thin film defect detection device according to claim 1, wherein the camera comprises a fixed focus lens and a photosensitive element positioned on a side of the fixed focus lens away from the thin film to be detected, and the light transmitted by the second linear polarizer is incident to the photosensitive element after passing through the fixed focus lens.
9. The thin film defect detection apparatus according to claim 1, wherein the first linear polarizer comprises an industrial polarizing film or polarizing glass.
10. A thin film defect detection method based on machine vision, characterized in that the thin film defect detection method is performed by using the thin film defect detection device according to any one of claims 1 to 9, and the thin film defect detection method comprises:
the light source emits illumination light, and the illumination light is incident to the first linear polaroid;
the first linear polarizing plate transmits the illumination light and converts the illumination light into first linear polarized light, and the first linear polarized light is incident to the film to be tested and transmitted to the second linear polarizing plate;
the camera collects the transmitted light of the second linear polaroid and collects images;
and detecting whether the film to be detected has defects according to the image.
CN202310835271.8A 2023-07-10 2023-07-10 Film defect detection device and detection method based on machine vision Pending CN116559199A (en)

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Application Number Priority Date Filing Date Title
CN202310835271.8A CN116559199A (en) 2023-07-10 2023-07-10 Film defect detection device and detection method based on machine vision

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Application Number Priority Date Filing Date Title
CN202310835271.8A CN116559199A (en) 2023-07-10 2023-07-10 Film defect detection device and detection method based on machine vision

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Citations (9)

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US5666199A (en) * 1994-07-11 1997-09-09 Phillips Petroleum Company Apparatus and process for detecting the presence of gel defects in oriented sheets or films based on polarization detection
US20060203246A1 (en) * 2005-03-10 2006-09-14 Fuji Photo Film Co., Ltd. Apparatus and method for inspecting film defect
US20070285665A1 (en) * 2006-06-09 2007-12-13 Fujifilm Corporation Apparatus and method for inspecting film defect
JP2008175609A (en) * 2007-01-17 2008-07-31 Sekisui Chem Co Ltd Inspection method of optical film and optical film
JP2008267991A (en) * 2007-04-20 2008-11-06 Dainippon Printing Co Ltd Phase difference film inspecting device, phase difference film inspecting method, and method of manufacturing phase difference film using same
KR20090103726A (en) * 2008-03-28 2009-10-01 후지필름 가부시키가이샤 Method and device for detecting defect
JP2011237313A (en) * 2010-05-12 2011-11-24 Shin Etsu Handotai Co Ltd Defect inspection device for transparent substrate and defect inspection method for parent substrate
CN102906561A (en) * 2010-05-25 2013-01-30 东丽株式会社 Film defect inspection device, defect inspection method, and release film
CN107615051A (en) * 2015-06-05 2018-01-19 住友化学株式会社 The defects of transmitance film inspection method, the manufacture method of linear polarization piece film and the manufacture method of polarization plates

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5666199A (en) * 1994-07-11 1997-09-09 Phillips Petroleum Company Apparatus and process for detecting the presence of gel defects in oriented sheets or films based on polarization detection
US20060203246A1 (en) * 2005-03-10 2006-09-14 Fuji Photo Film Co., Ltd. Apparatus and method for inspecting film defect
US20070285665A1 (en) * 2006-06-09 2007-12-13 Fujifilm Corporation Apparatus and method for inspecting film defect
JP2008175609A (en) * 2007-01-17 2008-07-31 Sekisui Chem Co Ltd Inspection method of optical film and optical film
JP2008267991A (en) * 2007-04-20 2008-11-06 Dainippon Printing Co Ltd Phase difference film inspecting device, phase difference film inspecting method, and method of manufacturing phase difference film using same
KR20090103726A (en) * 2008-03-28 2009-10-01 후지필름 가부시키가이샤 Method and device for detecting defect
JP2011237313A (en) * 2010-05-12 2011-11-24 Shin Etsu Handotai Co Ltd Defect inspection device for transparent substrate and defect inspection method for parent substrate
CN102906561A (en) * 2010-05-25 2013-01-30 东丽株式会社 Film defect inspection device, defect inspection method, and release film
CN107615051A (en) * 2015-06-05 2018-01-19 住友化学株式会社 The defects of transmitance film inspection method, the manufacture method of linear polarization piece film and the manufacture method of polarization plates

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