CN115956224A - 对准单元用的防尘构造体 - Google Patents

对准单元用的防尘构造体 Download PDF

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Publication number
CN115956224A
CN115956224A CN202180050422.8A CN202180050422A CN115956224A CN 115956224 A CN115956224 A CN 115956224A CN 202180050422 A CN202180050422 A CN 202180050422A CN 115956224 A CN115956224 A CN 115956224A
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CN
China
Prior art keywords
dust
proof structure
proof
dustproof
frame
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN202180050422.8A
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English (en)
Chinese (zh)
Inventor
平野政胜
黑川健一
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsui Chemicals Inc
Original Assignee
Asahi Kasei Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Kasei Corp filed Critical Asahi Kasei Corp
Publication of CN115956224A publication Critical patent/CN115956224A/zh
Pending legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor

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  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Epidemiology (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Public Health (AREA)
  • Audible-Bandwidth Dynamoelectric Transducers Other Than Pickups (AREA)
  • Atmospheric Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Multimedia (AREA)
  • Vibration Prevention Devices (AREA)
CN202180050422.8A 2020-08-20 2021-08-17 对准单元用的防尘构造体 Pending CN115956224A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2020-139630 2020-08-20
JP2020139630 2020-08-20
PCT/JP2021/030064 WO2022039166A1 (ja) 2020-08-20 2021-08-17 アライメントユニット用の防塵構造体

Publications (1)

Publication Number Publication Date
CN115956224A true CN115956224A (zh) 2023-04-11

Family

ID=80350439

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202180050422.8A Pending CN115956224A (zh) 2020-08-20 2021-08-17 对准单元用的防尘构造体

Country Status (5)

Country Link
JP (1) JP7375210B2 (ko)
KR (1) KR20230035093A (ko)
CN (1) CN115956224A (ko)
TW (1) TWI784668B (ko)
WO (1) WO2022039166A1 (ko)

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3402746B2 (ja) * 1994-05-19 2003-05-06 Ｈｏｙａ株式会社 フォトマスク検査方法及びその装置
JPH113854A (ja) * 1997-06-12 1999-01-06 Nikon Corp 露光装置、露光方法及び位置検出装置
JP2004093976A (ja) * 2002-08-30 2004-03-25 Nsk Ltd アライメント調整装置
JP2005116965A (ja) 2003-10-10 2005-04-28 Canon Inc 露光装置及びその制御方法
JP2005203522A (ja) * 2004-01-14 2005-07-28 Nikon Corp 露光方法及び装置、並びにデバイス製造方法
JP4395654B2 (ja) * 2004-09-09 2010-01-13 株式会社マシンエンジニアリング ワークの位置決め装置
JP5769605B2 (ja) * 2011-12-02 2015-08-26 株式会社ディスコ 切削装置
JP6376601B2 (ja) * 2015-05-18 2018-08-22 信越化学工業株式会社 ペリクル支持手段及びこれを用いたペリクル支持装置とペリクル装着方法

Also Published As

Publication number Publication date
KR20230035093A (ko) 2023-03-10
TWI784668B (zh) 2022-11-21
JP7375210B2 (ja) 2023-11-07
JPWO2022039166A1 (ko) 2022-02-24
TW202212991A (zh) 2022-04-01
WO2022039166A1 (ja) 2022-02-24

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Applicant after: MITSUI CHEMICALS, Inc.

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