CN115747743A - Equipment and process for workpiece coating and high-temperature deuterium gas permeation - Google Patents
Equipment and process for workpiece coating and high-temperature deuterium gas permeation Download PDFInfo
- Publication number
- CN115747743A CN115747743A CN202211638269.3A CN202211638269A CN115747743A CN 115747743 A CN115747743 A CN 115747743A CN 202211638269 A CN202211638269 A CN 202211638269A CN 115747743 A CN115747743 A CN 115747743A
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- Prior art keywords
- coating
- deuterium
- workpiece
- cavity
- permeating
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- 239000011248 coating agent Substances 0.000 title claims abstract description 137
- 238000000576 coating method Methods 0.000 title claims abstract description 137
- 229910052805 deuterium Inorganic materials 0.000 title claims abstract description 103
- YZCKVEUIGOORGS-OUBTZVSYSA-N Deuterium Chemical compound [2H] YZCKVEUIGOORGS-OUBTZVSYSA-N 0.000 title claims abstract description 101
- 238000000034 method Methods 0.000 title claims description 12
- 230000008569 process Effects 0.000 title claims description 11
- 238000012546 transfer Methods 0.000 claims abstract description 44
- 239000000463 material Substances 0.000 claims abstract description 36
- 239000007888 film coating Substances 0.000 claims abstract description 9
- 238000009501 film coating Methods 0.000 claims abstract description 9
- 238000010438 heat treatment Methods 0.000 claims description 30
- 238000004140 cleaning Methods 0.000 claims description 17
- 238000009792 diffusion process Methods 0.000 claims description 17
- 238000010884 ion-beam technique Methods 0.000 claims description 11
- 238000001755 magnetron sputter deposition Methods 0.000 claims description 10
- 230000008859 change Effects 0.000 claims description 8
- 230000008595 infiltration Effects 0.000 claims description 7
- 238000001764 infiltration Methods 0.000 claims description 7
- 230000007246 mechanism Effects 0.000 claims description 7
- 238000001816 cooling Methods 0.000 claims description 5
- XLYOFNOQVPJJNP-ZSJDYOACSA-N Heavy water Chemical compound [2H]O[2H] XLYOFNOQVPJJNP-ZSJDYOACSA-N 0.000 claims 10
- 238000004519 manufacturing process Methods 0.000 abstract description 4
- 238000012545 processing Methods 0.000 description 4
- 239000000919 ceramic Substances 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000009776 industrial production Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 239000012466 permeate Substances 0.000 description 2
- 238000007789 sealing Methods 0.000 description 2
- 230000001174 ascending effect Effects 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000005086 pumping Methods 0.000 description 1
- 239000013077 target material Substances 0.000 description 1
- 238000013519 translation Methods 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
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Classifications
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E30/00—Energy generation of nuclear origin
- Y02E30/10—Nuclear fusion reactors
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
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- Physical Vapour Deposition (AREA)
Abstract
The invention relates to a workpiece coating and high-temperature deuterium permeation device, which comprises a coating cavity, a deuterium permeation cavity and a material transferring device, wherein the coating cavity provides a place for coating treatment of a workpiece, the coating cavity is connected with the coating device, the deuterium permeation cavity provides a place for deuterium permeation treatment of the workpiece, the deuterium permeation cavity is connected with the deuterium permeation device, a transfer channel for transferring the workpiece is arranged between the coating cavity and the deuterium permeation cavity, an adjusting device is arranged on the transfer channel and used for adjusting the on-off state of the transfer channel, and the material transferring device is used for transferring the workpiece between the coating cavity and the deuterium permeation cavity. The scheme provided by the invention can realize film coating treatment and deuterium permeation treatment on the workpiece on one device, solve the problem of film pollution and improve the production efficiency.
Description
Technical Field
The invention relates to the field of coating, in particular to equipment and a process for coating a workpiece and permeating deuterium at high temperature.
Background
The technological processes of magnetron sputtering coating and surface deuterium gas permeation are separately implemented in the current equipment in the market, the problem of film layer pollution exists in the midway, the production efficiency is not high, and the equipment is not suitable for industrial production.
Disclosure of Invention
The invention aims to provide a workpiece coating and high-temperature deuterium permeating equipment which can realize coating treatment and deuterium permeating treatment on a workpiece on one equipment.
The technical scheme adopted by the invention is as follows: a workpiece coating and high-temperature deuterium gas permeating device is characterized in that: including the coating film cavity, seep the deuterium cavity, change the material device, the coating film cavity provides the place for the coating film of work piece is handled, the coating film cavity is connected with the coating film device, seep the deuterium cavity and provide the place for the seep deuterium of work piece is handled, seep the deuterium cavity and be connected with seep the deuterium device, be provided with the transfer channel that supplies the work piece to transfer between coating film cavity and the seep deuterium cavity, be provided with adjusting device on the transfer channel, adjusting device is used for adjusting the on-off state that transfers the channel, change the material device and be used for realizing the transfer of work piece between coating film cavity and seep the deuterium cavity.
The specific operation is as follows: the device also comprises a carrier, wherein the workpiece is assembled on the carrier, and the material transferring device is used for realizing the movement of the carrier between the film coating cavity and the deuterium permeating cavity.
The transfer channel is linear, the length direction of the transfer channel is recorded as the direction A, and the material moving device moves the workpiece along the direction A to realize the transfer of the workpiece between the film coating cavity and the deuterium diffusion cavity.
Be provided with the assembly groove on the carrier, change the material device and including the commentaries on classics material fork of the U type that the horizontal form was arranged, change the material fork and follow A direction movable mounting, change the material fork and insert the assembly inslot and assemble with the carrier.
The coating cavity is provided with an assembly sleeve arranged along the A direction, a push rod is arranged in the assembly sleeve, the push rod slides along the A direction and is in sealing assembly with the seal assembly sleeve, the end part of the push rod extending into the coating cavity is used for installing a material transferring device, and the other end of the push rod extending to the outer side of the assembly sleeve is connected with a driving mechanism for driving the push rod to move along the A direction.
The adjusting device comprises a gate valve arranged on the transfer channel.
The coating device is a vacuum magnetron sputtering coating device.
The coating cavity is internally provided with a coating objective table, the coating objective table rotates and is installed in a lifting mode, a coating heating assembly is arranged on the coating objective table, the coating objective table is connected with the bias assembly, and the coating cavity is further provided with an ion beam cleaning device for cleaning a workpiece.
The deuterium permeating cavity is internally provided with a deuterium permeating objective table, the deuterium permeating objective table is installed in a lifting mode, and a deuterium permeating heating assembly is arranged on the deuterium permeating objective table.
The invention also provides a process for coating a workpiece and permeating deuterium gas at high temperature, which is characterized by comprising the following operations: arranging a workpiece and a carrier on a coating object stage in a coating cavity, closing a flashboard valve to adjust a transfer channel to be in a closed state, adjusting the coating object stage to rotate and start a coating heating component, heating the workpiece to a set temperature, opening an ion beam cleaning device to clean the surface of the workpiece, after cleaning, starting a bias device to apply bias to the workpiece and opening the coating device to perform coating processing on the workpiece, after the coating processing is finished, opening a flashboard valve to adjust the transfer channel to be in a communicated state, adjusting the transfer device to translate and assemble the carrier on the coating object stage in a standing state, then adjusting the coating object stage to descend to a low position to separate the carrier from the coating object stage, adjusting the transfer device to continue moving, moving the carrier to the upper side of the deuterium-permeated object stage in a deuterium permeation cavity, adjusting the deuterium-permeated object stage to move from the low position to the high position to support the carrier, after the carrier is supported by the deuterium-permeated object stage, retracting the transfer device into the coating cavity, closing the flashboard valve to adjust the transfer channel to be in a closed state, heating component to heat the workpiece to the deuterium-permeated object stage, starting to permeate gas pressure, and cooling the deuterium-permeated gas to the atmosphere, and cooling the workpiece, and filling the workpiece to the room temperature, and cooling the workpiece.
The scheme provided by the invention can realize film coating treatment and deuterium permeation treatment on the workpiece on one device, solve the problem of film pollution and improve the production efficiency.
Drawings
FIG. 1 is a schematic structural diagram of the present invention.
FIG. 2 is a schematic structural view of the coating chamber and the deuterium-permeated chamber after a part of the chamber wall is taken out.
FIG. 3 is a schematic view of the carrier and workpiece shown in FIG. 2 moving into the deuterium infiltration chamber.
Fig. 4 is a schematic structural diagram of the material transferring device.
100-frame, 101-electrical cabinet, 110-coating cavity, 111-A mounting hole, 112-B mounting hole, 113-coating objective table, 120-deuterium permeating cavity, 121-deuterium permeating objective table, 131-material rotating fork, 132-push rod, 133-guide rod, 135-driving mechanism, 136-movable support, 137-assembly set, 140-carrier and 150-gate valve.
Detailed Description
In order that the objects and advantages of the invention will be more clearly understood, the following description is given in conjunction with the accompanying examples. It is to be understood that the following text is merely illustrative of one or more specific embodiments of the invention and does not strictly limit the scope of the invention as specifically claimed.
As shown in fig. 1-4, a device for coating a film on a workpiece and diffusing deuterium at high temperature comprises a coating chamber 110, a deuterium diffusion chamber 120, and a material transferring device, wherein the coating chamber 110 provides a place for coating the workpiece, the coating chamber 110 is connected with the coating device, the deuterium diffusion chamber 120 provides a place for deuterium diffusion of the workpiece, the deuterium diffusion chamber 120 is connected with the deuterium diffusion device, a transfer channel for transferring the workpiece is arranged between the coating chamber 110 and the deuterium diffusion chamber 120, an adjusting device is arranged on the transfer channel, the adjusting device is used for adjusting the on/off state of the transfer channel, and the material transferring device is used for realizing the transfer of the workpiece between the coating chamber 110 and the deuterium diffusion chamber 120. The scheme provided by the invention can realize film coating treatment and deuterium permeation treatment on the workpiece on one device, solve the problem of film pollution and improve the production efficiency.
The specific operation is as follows: the device also comprises a carrier 140, wherein the workpiece is assembled on the carrier 140, and the material transferring device is used for realizing the movement of the carrier 140 between the coating cavity 110 and the deuterium diffusion cavity 120. The transfer channel is linear, the length direction of the transfer channel is recorded as the A direction, and the material moving device moves the workpiece along the A direction to realize the transfer of the workpiece between the coating cavity 110 and the deuterium diffusion cavity 120. The carrier 140 is provided with an assembly groove, the material transferring device comprises a U-shaped material transferring fork 131 which is transversely arranged, the material transferring fork 131 is movably mounted along the A direction, and the material transferring fork 131 is inserted into the assembly groove to be assembled with the carrier 140. The carrier 140 may be circular, and an annular groove is formed in a side wall of the carrier 140, and the annular groove forms the assembly groove, so that the material transfer fork 131 and the assembly groove can be assembled quickly and conveniently. An assembly sleeve 137 (an assembly sleeve) arranged along the direction A is arranged on (the cavity wall of) the film coating cavity 110, a push rod 132 is arranged in the assembly sleeve 137, the push rod 132 slides and is assembled with the assembly sleeve 137 in the direction A in a sealing mode, the end portion, extending to the inside of the film coating cavity 110, of the push rod 132 is used for installing a material transferring device, and the other end, extending to the outside of the assembly sleeve, of the push rod 132 is connected with a driving mechanism 135 driving the push rod 132 to move along the direction A. Specifically, as shown in fig. 4, the material transferring fork 131 is installed at one end of the push rod 132, the rod body at the other end of the push rod 132 is formed by a pipe fitting, the pipe fitting is slidably sleeved on the guide rod 133, the push rod 132 is installed on the movable bracket 136, the movable bracket 136 is slidably assembled on the rack 100 along the direction a, the movable bracket 136 is connected with the driving mechanism 135, and the driving mechanism 35 may be formed by a driving electric cylinder 137.
The detailed operation is as follows: the adjusting device comprises a gate valve 150 arranged on the transfer channel. The gate valve 150 may be specifically a high vacuum gate valve 150, and the coating device is a vacuum magnetron sputtering coating device. The coating cavity 110 is internally provided with a coating objective table 113, the coating objective table 113 rotates and is installed in a lifting mode, a coating heating assembly is arranged on the coating objective table 113, the coating heating assembly can be a ceramic insulating heating plate, the coating objective table 113 is connected with a bias assembly, and an ion beam cleaning device for cleaning a workpiece is further arranged on the coating cavity. The deuterium permeating cavity 120 is internally provided with a deuterium permeating object stage 121, the deuterium permeating object stage 121 is installed in a lifting mode, and a deuterium permeating heating component is arranged on the deuterium permeating object stage 121. Deuterium diffusion objective table 121 specifically can constitute for high power heating plate, can carry out accurate heating control to the work piece, can heat the work piece to 600 ℃.
In the specific implementation: the equipment also comprises a frame 100, an electrical cabinet 101 and a control device, wherein the coating device specifically comprises 3 magnetron sputtering sources (marked as 1#, 2#, 3 #), and other air-extracting devices and the like, a coating cavity objective table is connected with a coating lifting driving device and a coating rotating driving device which drive the objective table to lift and self-transfer, and a deuterium permeating objective table 121 is connected with a deuterium permeating lifting driving device which drives the objective table to lift. The deuterium infiltration apparatus includes a deuterium inflation apparatus disposed on the deuterium infiltration chamber 120. The control device is arranged in the electrical cabinet and comprises a PLC man-machine operating device, and a heating adjusting unit, a temperature control adjusting unit, an air exhaust adjusting and controlling unit, a transfer control unit, a magnetron sputtering control unit, an ion beam cleaning control unit and the like are arranged in the PLC man-machine operating device. As shown in fig. 2 and 3, the top plate of the coating chamber 110 is provided with 3 a mounting holes 111 and 1B mounting hole 112, the a mounting hole 111 is used for mounting a magnetron sputtering source, and the B mounting hole 112 is used for mounting an ion beam cleaning device. Each magnetron sputtering source can sputter target materials with different materials for process selection. The magnetron sputtering source and the ion beam cleaning device are both arranged at the top of the cavity. The coating stage 113 is a multifunctional stage, can rotate, makes a coating film layer more uniform, can heat a workpiece, and can apply bias voltage to the coated workpiece to enhance the bonding force of the film layer. The objective table can also realize the functions of ascending and descending, thereby being convenient for transferring the workpiece. The coating device and the deuterium permeating device can be implemented by referring to the existing single-function vacuum coating equipment and deuterium permeating equipment.
The invention also provides a process for coating a workpiece and permeating deuterium at high temperature, which comprises the following operations: arranging the workpiece and the carrier 140 on a coating object stage 113 in a coating cavity, closing a gate valve 150 to adjust a transfer channel to be in a closed state, adjusting the rotation of the coating object stage 113 and starting a coating heating assembly, heating the workpiece to a set temperature, opening an ion beam cleaning device to clean the surface of the workpiece, after the cleaning, starting a biasing device to apply bias voltage to the workpiece and opening the coating device to perform coating processing on the workpiece, after the coating processing is finished, opening the gate valve 150 to adjust the transfer channel to be in a communicated state, adjusting the carrier 140 on the coating object stage 113 in a translation and standing state of the transfer device, then adjusting the coating object stage 113 to descend to a low position to separate the carrier 140 from the coating deuterium object stage 113, adjusting the transfer device to continue moving, moving the carrier 140 to the upper side of a deuterium permeation object stage 121 in the deuterium permeation cavity 120, adjusting the deuterium permeation object stage 121 to ascend from the low position to the high position to support the carrier 140, after the deuterium permeation object stage 140 is supported by the deuterium object stage 121, retracting the transfer device into the coating cavity 110, closing the gate valve 150 to adjust the channel to be in a closed state, transferring the deuterium object stage to be heated to the deuterium gas to a room temperature, heating assembly, heating the workpiece, heating chamber, heating the workpiece to heat the workpiece to a room temperature, and heating temperature, and stop the workpiece, and heating the workpiece.
The details are as follows: opening a door of a coating chamber, placing a workpiece to be coated on the carrier 140, heating the workpiece by the ceramic insulating heating plate, starting a high-energy ion beam cleaning source to clean the workpiece when the workpiece is heated to a set temperature value, starting one or more of the magnetron sputtering sources 1#, 2#, and 3# according to process requirements after the high-energy ion beam cleaning source bombards, and allowing the coating stage 113 to rotate, and then starting coating. After the coating is finished, a control key on an operation interface of the control device is clicked, the material transferring device starts to move to support the carrier 140, the coating object stage 113 descends, the carrier 140 is suspended to be supported, the material transferring device lifts the workpiece and the carrier 140 moves towards the deuterium diffusion cavity 120 together, and after the carrier 140 moves to a preset position, the deuterium diffusion object stage 121 starts to ascend until the carrier 140 is supported. The carrier 140 is in close contact with the deuterium diffusion object stage 121 (high power heating plate), and the high power heating plate is turned on, so as to heat the workpiece, after the workpiece is heated to a set temperature value, the high power heating plate stops working, and at the moment, deuterium gas is introduced into the deuterium diffusion cavity 120 until the internal air pressure of the deuterium diffusion cavity 120 reaches 2 atmospheric pressure values, and deuterium gas filling is stopped. All the working devices are stopped, and the equipment is in a standby state. And naturally cooling the coated workpiece to room temperature in the deuterium gas cavity, so that deuterium gas gradually permeates into the surface of the film layer to obtain a high-performance surface coating, and finishing the process.
The coating and deuterium permeating integrated equipment provided by the invention has the functions of heating, exhausting (air pumping), controlling temperature, vacuumizing, coating, permeating deuterium and the like, integrates the coating and surface deuterium permeating processes into a whole, is operated in one bond, greatly improves the efficiency, and is suitable for industrial production.
The foregoing is only a preferred embodiment of the present invention, and it should be noted that those skilled in the art can make various improvements and modifications without departing from the principle of the present invention, and these improvements and modifications should also be construed as the protection scope of the present invention. Structures, mechanisms, and methods of operation not specifically described or illustrated herein are not specifically illustrated or described, but are instead contemplated to be practiced in accordance with conventional techniques of the art, unless otherwise specified and limited.
Claims (10)
1. A workpiece coating and high-temperature deuterium gas permeating device is characterized in that: the deuterium transferring device comprises a coating cavity, a deuterium permeating cavity and a material transferring device, wherein the coating cavity provides places for coating treatment of a workpiece, the coating cavity is connected with the coating device, the deuterium permeating cavity provides places for deuterium treatment of the workpiece, the deuterium permeating cavity is connected with the deuterium permeating device, a transferring channel for transferring the workpiece is arranged between the coating cavity and the deuterium permeating cavity, an adjusting device is arranged on the transferring channel and used for adjusting the on-off state of the transferring channel, and the material transferring device is used for transferring the workpiece between the coating cavity and the deuterium permeating cavity.
2. The workpiece coating and deuterium gas infiltration at high temperature apparatus of claim 1, wherein: the device also comprises a carrier, wherein the workpiece is assembled on the carrier, and the material transferring device is used for realizing the movement of the carrier between the film coating cavity and the deuterium permeating cavity.
3. The workpiece coating and deuterium oxide infiltration apparatus of claim 1 or 2, wherein: the transfer channel is linear, the length direction of the transfer channel is recorded as the direction A, and the material moving device moves the workpiece along the direction A to realize the transfer of the workpiece between the film coating cavity and the deuterium diffusion cavity.
4. The workpiece coating and deuterium oxide permeating equipment at high temperature according to claim 3, wherein: be provided with the assembly groove on the carrier, change the material device and including the commentaries on classics material fork of the U type that the horizontal form was arranged, change the material fork and follow A direction movable mounting, change the material fork and insert the assembly inslot and assemble with the carrier.
5. The workpiece coating and deuterium oxide permeating equipment at high temperature according to claim 3, wherein: the coating cavity is provided with an assembly sleeve arranged along the A direction, a push rod is arranged in the assembly sleeve, the push rod slides along the A direction with the seal assembly sleeve and is in seal assembly, the end part of the push rod extending into the coating cavity is used for installing a material transferring device, and the other end of the push rod extending to the outer side of the assembly sleeve is connected with a driving mechanism for driving the push rod to move along the A direction.
6. The workpiece coating and deuterium gas infiltration at high temperature apparatus of claim 3, wherein: the adjusting device comprises a gate valve arranged on the transfer channel.
7. The workpiece coating and deuterium oxide permeating equipment at high temperature according to claim 3 or 4, wherein: the coating device is a vacuum magnetron sputtering coating device.
8. The workpiece coating and deuterium oxide permeating equipment at high temperature according to claim 7, wherein: the coating cavity is internally provided with a coating objective table, the coating objective table rotates and is installed in a lifting mode, a coating heating assembly is arranged on the coating objective table, the coating objective table is connected with the bias assembly, and the coating cavity is further provided with an ion beam cleaning device for cleaning a workpiece.
9. The workpiece coating and deuterium gas infiltration at high temperature apparatus of claim 7, wherein: the deuterium permeating cavity is internally provided with a deuterium permeating objective table, the deuterium permeating objective table is installed in a lifting mode, and a deuterium permeating heating assembly is arranged on the deuterium permeating objective table.
10. A process for coating a workpiece and diffusing deuterium at high temperature is characterized by comprising the following operations: arranging a workpiece and a carrier on a coating objective table in a coating cavity, closing a flashboard valve to adjust a transfer channel to be in a closed state, adjusting the coating objective table to rotate and starting a coating heating assembly, after the workpiece is heated to a set temperature, opening an ion beam cleaning device to clean the surface of the workpiece, after the cleaning treatment, starting a bias device to apply bias voltage to the workpiece and opening the coating device to perform coating treatment on the workpiece, after the coating treatment is finished, opening a flashboard valve to adjust the transfer channel to be in a communicated state, adjusting the transfer device to translate and assemble the carrier on the coating objective table in a standing state, then adjusting the coating objective table to descend to a low position to separate the carrier from the coating objective table, adjusting the transfer device to continue moving, moving the carrier to the upper side of a deuterium-permeated objective table in the deuterium-permeated cavity, adjusting the deuterium-permeated objective table to ascend from the low position to the high position to prop the carrier, after the carrier is propped by the deuterium-permeated objective table, retracting the transfer device into the coating cavity, closing the flashboard valve to adjust the transfer channel to be in a closed state, heating assembly to heat the workpiece by deuterium, starting to reach an atmospheric pressure, and cooling the workpiece to room temperature, and stopping the deuterium-filled with the atmospheric pressure, and the workpiece.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202211638269.3A CN115747743B (en) | 2022-12-20 | 2022-12-20 | Workpiece coating and high-temperature deuterium permeation equipment and process |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202211638269.3A CN115747743B (en) | 2022-12-20 | 2022-12-20 | Workpiece coating and high-temperature deuterium permeation equipment and process |
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| Publication Number | Publication Date |
|---|---|
| CN115747743A true CN115747743A (en) | 2023-03-07 |
| CN115747743B CN115747743B (en) | 2023-11-28 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN202211638269.3A Active CN115747743B (en) | 2022-12-20 | 2022-12-20 | Workpiece coating and high-temperature deuterium permeation equipment and process |
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Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4581195A (en) * | 1981-02-22 | 1986-04-08 | Kyoto University | Negative hydrogen or deuterium ion source using semiconductor |
| CN1528691A (en) * | 2003-10-21 | 2004-09-15 | 江苏法尔胜光子有限公司 | Method for preparing low hydroxy content optical-fiber precast rod by tubular CVD process |
| KR20060055483A (en) * | 2006-03-06 | 2006-05-23 | (주) 디오브이 | Apparatus for encapsulation of organic electroluminescent devices |
| CN203419977U (en) * | 2013-08-07 | 2014-02-05 | 湖南特科能热处理有限公司 | Carburization nitridation device |
| CN215328254U (en) * | 2021-07-28 | 2021-12-28 | 常州广利管路系统科技有限公司 | Heat treatment device for copper-plated steel strip |
-
2022
- 2022-12-20 CN CN202211638269.3A patent/CN115747743B/en active Active
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4581195A (en) * | 1981-02-22 | 1986-04-08 | Kyoto University | Negative hydrogen or deuterium ion source using semiconductor |
| CN1528691A (en) * | 2003-10-21 | 2004-09-15 | 江苏法尔胜光子有限公司 | Method for preparing low hydroxy content optical-fiber precast rod by tubular CVD process |
| KR20060055483A (en) * | 2006-03-06 | 2006-05-23 | (주) 디오브이 | Apparatus for encapsulation of organic electroluminescent devices |
| CN203419977U (en) * | 2013-08-07 | 2014-02-05 | 湖南特科能热处理有限公司 | Carburization nitridation device |
| CN215328254U (en) * | 2021-07-28 | 2021-12-28 | 常州广利管路系统科技有限公司 | Heat treatment device for copper-plated steel strip |
Non-Patent Citations (1)
| Title |
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| 罗继军;: "一种渗碳气氛炉的自动搬运装置的设计与控制开发", 工业炉, no. 04 * |
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