CN115627447A - Device and method for enhancing heating evaporation rate of high-energy particle beam - Google Patents
Device and method for enhancing heating evaporation rate of high-energy particle beam Download PDFInfo
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/28—Vacuum evaporation by wave energy or particle radiation
- C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/246—Replenishment of source material
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
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Abstract
The invention discloses a high-energy particle beam heating evaporation rate enhancing device, which belongs to the technical field of vacuum coating and comprises a vacuum coating cavity, an energy output device, a coating material and conveying mechanism and a crucible; the crucible comprises a crucible main body, a thermal field adjusting piece and a cooling base; the bottom of the crucible main body is connected with the top of the cooling base; a thermal field adjusting piece is arranged in the middle of the inner part of the crucible main body; the thermal field adjustment member includes a thermally conductive body; the middle part of heat conduction main part is equipped with the through-hole, be equipped with heat conduction assembly in the middle of the top of heat conduction main part. The invention can improve the upper limit of the deposition rate of the evaporation coating by the thermal field adjusting piece, improve the deposition rate of the existing equipment, thereby realizing the improvement of the yield and greatly reducing the cost, and meanwhile, higher input energy can be applied by the thermal field adjusting piece without causing violent boiling.
Description
Technical Field
The invention relates to the technical field of vacuum coating, in particular to a device and a method for enhancing the heating evaporation rate of a high-energy particle beam.
Background
The products in the solar energy industry, the semiconductor industry, the magnetic material industry, the electronic component industry and the like have the need of plating very thick metal films, the former production equipment is mainly a single machine for electron beam evaporation coating or a production line for magnetron sputtering coating, the coating speed is relatively slow, and the product yield and the like are greatly influenced.
The industry is huge in size, the demand yield of market development is large, and the production mode of reducing the production cost through large-scale production is very important, including and not limited to manufacturing equipment with larger yield, improving the production efficiency of the existing equipment and controlling the overall cost of the production equipment.
The production equipment commonly used in the industry at present is a single machine for electron beam evaporation coating or a continuous production line for magnetron sputtering coating. Continuous production lines for electron beam evaporation coating have also been developed. However, the greatest limitation of the magnetron sputtering coating technology is that the deposition rate is low, the cost is high, the yield is improved by adding more sputtering coating configurations, and the magnetron sputtering coating technology is obviously not a good choice in terms of cost. Since electron beam evaporation is limited by boiling phenomenon, the deposition rate has an upper limit, and thus the problem of greatly increasing the production yield also occurs.
Disclosure of Invention
The invention aims to provide a device and a method for enhancing the heating evaporation rate of a high-energy particle beam, which can apply higher input energy without causing severe boiling and can greatly improve the deposition rate, thereby realizing the improvement of the yield and the great reduction of the cost.
The purpose of the invention is realized by the following technical scheme:
the invention provides a high-energy particle beam heating evaporation rate reinforcing device, which comprises a vacuum coating cavity, an energy output device, a film material and conveying mechanism and a crucible; the vacuum coating cavity is used for providing a vacuum coating environment; the energy output device is used for providing heat required by melting the membrane material; the film material and conveying mechanism is used for conveying the film material to maintain the level of the film liquid in the crucible and ensure the continuous film coating; the crucible is used for providing a place for melting the film material; the crucible comprises a crucible main body, a thermal field adjusting piece and a cooling base; the bottom of the crucible main body is connected with the top of the cooling base; a thermal field adjusting piece is arranged in the middle of the inner part of the crucible main body; the thermal field adjustment member comprises a thermally conductive body; the middle part of heat conduction main part is equipped with the through-hole, be equipped with heat conduction assembly in the middle of the top of heat conduction main part.
As a further technical improvement, the bottom of the heat conducting main body is provided with a through groove which is horizontally penetrated, and the through groove is communicated with the through hole and can supplement membrane liquid for a vaporization high-temperature area at the top of the through hole. The film liquid in the energy incidence area reduced by evaporation can be continuously replenished.
As a further technical improvement, a U-shaped water cooling groove is arranged at the bottom of the cooling base, and an opening of the water cooling groove faces downwards.
As a further technical improvement, the water cooling tank is provided with a water pipeline.
As a further technical improvement, the crucible is a heat-insulating crucible.
On the other hand, the invention also provides a method for enhancing the heating evaporation rate of the high-energy particle beam, which comprises the following steps: s1, placing a high-energy particle beam heating evaporation rate enhancing device in a vacuum coating cavity; s2, correspondingly arranging an energy output device, a film material and conveying mechanism in the vacuum coating cavity, and respectively matching and installing the energy output device, the film material and conveying mechanism, the film material and the conveying mechanism with the device, wherein the middle of the top of the thermal field adjusting piece is an energy incidence area, and the energy incidence area is a high-temperature incidence area at the same time, so that a vaporization high-temperature area is formed in the middle of the top of the thermal field adjusting piece in the process of melting the film material to form a film forming liquid; s3, conveying the film material into the crucible main body by the film material and conveying mechanism, and controlling the film material to cover the bottom of the crucible or the thermal field adjusting part until the bottom of the crucible or the thermal field adjusting part is not exposed;
s4, vacuumizing the vacuum coating cavity, starting an energy output device to output energy to the coating material, forming a film liquid after the coating material is heated and melted, and starting coating; s5, when the coating speed needs to be increased, the energy output device increases the energy output, meanwhile, the coating material and the conveying mechanism synchronously increase the feeding, the evaporation loss of the coating consumed by coating and the film liquid in the vaporization high-temperature area is supplemented, meanwhile, the liquid level of the film liquid is kept stable by matching with the coating material and the conveying mechanism, and meanwhile, the through groove can also supplement the film liquid for the vaporization high-temperature area at the top of the through hole; s6, when the film coating speed is increased, the heat conduction assembly conducts heat of the vaporization high-temperature area to the heat conduction main body, the heat conduction main body conducts the heat to the bottom of the crucible main body, and then the heat is taken away from the cooling base, so that the heat of other areas is lower than that of the vaporization high-temperature area, the high-temperature vaporization range is reduced, the thermal field distribution of film liquid of the energy incidence area is changed, and the liquid boiling phenomenon or boiling degree is inhibited or changed.
As a further technical improvement, the method for enhancing the heating evaporation rate of the energetic particle beam further comprises a step S7 of continuously introducing cold water into a water cooling tank of the cooling base to take away heat conducted from the heat conduction main body to the bottom of the crucible main body.
As a further technical improvement, the distance between the liquid level of the film liquid and the top surface of the heat conducting component is less than 10mm.
As further technical improvement, the proper positions and angles of the film material and the conveying mechanism are adjusted, and whether the feeding is stable or not is simulated by a testing machine before film coating.
The invention has the beneficial effects that:
1. the thermal field adjusting piece is arranged in the crucible, so that the upper limit of the deposition rate of the evaporation coating is improved, the deposition rate is higher, the yield is improved by improving the deposition rate of the existing equipment, the cost is greatly reduced, higher input energy can be applied through the thermal field adjusting piece without causing severe boiling, the continuous long-term coating work can be realized by matching with the coating material and the conveying mechanism, the liquid level fluctuation of the coating material is not large, the production process is stable, the evaporation loss of the coating liquid in an energy incidence area can be supplemented by the surrounding coating liquid in time conveniently, the liquid level height of the coating liquid can be kept stable by matching with the coating material and the conveying mechanism, and the stability of the production process is ensured by keeping the same production conditions.
2. The invention has simple structure and obvious effect, reduces the sputtering condition of coating configuration, can adapt to the output power regulation and production rate regulation aiming at the production condition, and is suitable for continuous coating production line equipment or the application scene of coating a thick film layer.
Drawings
In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings used in the embodiments or the prior art descriptions will be briefly described below, it is obvious that the drawings in the following description are only some embodiments of the present invention, and other drawings can be obtained by those skilled in the art without creative efforts.
FIG. 1 is a schematic structural view of the present invention;
FIG. 2 is a schematic view of a thermal field conditioner;
FIG. 3 is a schematic structural view of a vacuum coating chamber;
FIG. 4 is a schematic diagram of the energy output device;
FIG. 5 is a schematic structural view of a film material and a conveying mechanism;
the attached drawings are as follows: 1-a vacuum coating cavity, 11-a vacuum pump, 12-a vacuum valve, 13-a workpiece holder, 14-a substrate, 2-an energy output device, 21-a base, 22-an electron emitter, 23-an anode, 24-an electromagnetic coil, 25-a collector, 26-a shielding plate, 27-a high-energy electron beam, 3-a film material and conveying mechanism, 31-a transmission motor, 32-a guide pipe, 33-a wire feeder base frame, 34-a friction pinch roller, 35-a metal wire, 36-a wire coil, 4-a crucible, 41-a crucible main body, 42-a thermal field adjusting piece, 43-a through groove, 5-a cooling base, 51-a water cooling groove, 6-film liquid and 7-an energy incidence area.
Detailed Description
The embodiments of the present disclosure are described in detail below with reference to the accompanying drawings.
The embodiments of the present disclosure are described below with specific examples, and other advantages and effects of the present disclosure will be readily apparent to those skilled in the art from the disclosure in the specification. It is to be understood that the described embodiments are merely illustrative of some, and not restrictive, of the embodiments of the disclosure. The disclosure may be carried into practice or applied to various other specific embodiments, and various modifications and changes may be made in the details within the description and the drawings without departing from the spirit of the disclosure. It is to be noted that the features in the following embodiments and examples may be combined with each other without conflict. All other embodiments, which can be derived by a person skilled in the art from the embodiments disclosed herein without making any creative effort, shall fall within the protection scope of the present disclosure.
Example one
As shown in fig. 1-2, the embodiment provides a high-energy particle beam heating evaporation rate enhancing device, which comprises a vacuum coating cavity, an energy output device, a coating material and conveying mechanism and a crucible;
the vacuum coating cavity is used for providing a vacuum coating environment; the energy output device is used for providing heat required by melting the membrane material; the film material and conveying mechanism is used for conveying the film material to maintain the level of the film liquid in the crucible and ensure the continuous film coating; the crucible is used for providing a place for melting the film material;
the crucible comprises a crucible main body, a thermal field adjusting piece and a cooling base; the bottom of the crucible main body is connected with the top of the cooling base; a thermal field adjusting piece is arranged in the middle of the inner part of the crucible main body; the thermal field adjustment member includes a thermally conductive body; the middle part of heat conduction main part is equipped with the through-hole, be equipped with heat conduction assembly in the middle of the top of heat conduction main part.
It should be noted that the shape of the heat conducting component is not specific, and may be in various forms, and the following purpose is achieved by the structure that surrounds the energy incidence area to a certain extent: firstly, the film has proper heat preservation effect, and heat can be prevented from rapidly losing through the film liquid; secondly, the volume of an energy incidence area is extruded, the film liquid with less volume is heated by the same energy, a faster evaporation speed can be obtained certainly, thirdly, partial heat is guided away, the highest temperature of the film liquid is stabilized, and then a reduced space is matched to avoid generating large-volume boiling bubbles and inhibit the intensity of boiling.
The film and conveying mechanism is arranged on one side of the crucible, namely, discharge ports of the film and conveying mechanism are arranged on one side of a crucible opening, energy output devices are respectively arranged on the other side of the crucible, and output ports of the energy output devices are aligned with the middle position of the crucible.
The corners of the thermal field adjusting piece are in arc transition, and meanwhile, high-temperature resistant materials are also adopted.
As shown in fig. 3, the vacuum coating cavity comprises a vacuum cavity body, a vacuum pump and a workpiece frame; a vacuum pump is arranged on one side of the vacuum cavity and is communicated with the vacuum cavity through a vacuum valve; the top in the middle of the inside of the vacuum cavity is provided with a workpiece frame, and the bottom of the workpiece frame is provided with a substrate. The bottom of the substrate is provided with a crucible.
As shown in fig. 4, the energy output device (electron beam evaporation source) includes a base, an electron emitter, an anode, an electromagnetic coil, a collector, and a shielding plate; the top of the base is respectively provided with an electromagnetic coil, an anode and an electron emitter; and shielding plates are arranged at the tops of the electromagnetic coil, the anode and the electron emitter, and a collector is arranged on one side of each shielding plate. The electron emitter emits a high-energy electron beam.
As shown in fig. 5, the film material and conveying mechanism comprises a guide pipe, a wire feeder chassis, a friction pressing wheel and a wire coil; one end of the top of the wire feeder chassis is provided with a wire coil, the middle position of the wire feeder chassis is provided with a friction pressing wheel, and the other end of the wire feeder chassis is provided with a guide pipe; the friction pinch roller outputs power through a transmission motor; the wire is wound with a metal wire; the metal wire respectively penetrates through the friction pinch roller and the guide tube; the transmission motor drives the metal wire to the top of the crucible.
The embodiment also provides a method for enhancing the heating evaporation rate of the energetic particle beam, which comprises the following steps: s1, placing a high-energy particle beam heating evaporation rate enhancing device in a vacuum coating cavity; s2, correspondingly arranging an energy output device, a film material and conveying mechanism in the vacuum coating cavity, and respectively matching and installing the energy output device, the film material and conveying mechanism, the film material and the conveying mechanism with the device, wherein the middle of the top of the thermal field adjusting piece is an energy incidence area, and the energy incidence area is a high-temperature incidence area at the same time, so that a vaporization high-temperature area is formed in the middle of the top of the thermal field adjusting piece in the process of melting the film material to form a film forming liquid; s3, conveying the film material into the crucible main body by the film material and conveying mechanism, and controlling the film material to cover the bottom of the crucible or the thermal field adjusting part until the bottom of the crucible or the thermal field adjusting part is not exposed; s4, vacuumizing the vacuum coating cavity, starting an energy output device to output energy to the coating material, forming a film liquid after the coating material is heated and melted, and starting coating; s5, when the film coating speed needs to be increased, the energy output device increases the energy output, meanwhile, the film material and the conveying mechanism synchronously increase the feeding, the evaporation loss of the film material consumed by film coating and the film liquid in the vaporization high-temperature area is supplemented, meanwhile, the film material and the conveying mechanism are matched, the liquid level of the film liquid is maintained to be stable, and meanwhile, the through grooves can also supplement the film liquid for the vaporization high-temperature area at the top of the through holes;
s6, when the film coating speed is increased, the heat conduction assembly conducts heat of the vaporization high-temperature area to the heat conduction main body, the heat conduction main body conducts the heat to the bottom of the crucible main body, and then the heat is taken away from the cooling base, so that the heat of other areas is lower than that of the vaporization high-temperature area, the high-temperature vaporization range is reduced, the thermal field distribution of film liquid of the energy incidence area is changed, and the liquid boiling phenomenon or boiling degree is inhibited or changed.
It should be noted that the energy output device of this embodiment employs an electron gun, and when the energy is continuously increased by using electron beam evaporation, the thermal field distribution of the film liquid in the energy incidence region is changed, and the heat of the film liquid in the range of the thermal field adjusting member is conducted away, so that the thickness of the high-temperature liquid reaching the vaporization degree is reduced, and the bubbles generated by the vaporization of the film liquid are small. The small-size film liquid bubbles have small tension when broken, the splashed film liquid has small volume and close splashing distance, and the violent film liquid splashing is not generated any more when boiling, so that the evaporation rate can be improved by continuously increasing the heating power. The invention is suitable for continuous coating production line equipment or application scenes of coating thick films by matching with the film material and the conveying mechanism.
The thermal field adjusting piece of the embodiment is convenient for peripheral membrane liquid to supplement the evaporation loss of the membrane liquid in the energy incidence area in time, the height of the liquid level of the membrane liquid can be kept relatively stable by matching with the membrane material and the conveying mechanism, and the stability of the production process is ensured by keeping the same production conditions.
Example two
As shown in fig. 1-2, the present embodiment provides a device for enhancing the evaporation rate of high-energy particle beam heating, which comprises a vacuum coating cavity, an energy output device, a coating material and conveying mechanism, and a crucible; the vacuum coating device comprises a vacuum coating cavity, an energy output device, a film material and conveying mechanism and a crucible; the vacuum coating cavity is used for providing a vacuum coating environment; the energy output device is used for providing heat required by melting the membrane material; the film material and conveying mechanism is used for conveying the film material to maintain the level of the film liquid in the crucible and ensure the continuous film coating; the crucible is used for providing a place for melting the film material; the crucible comprises a crucible main body, a thermal field adjusting piece and a cooling base; the bottom of the crucible main body is connected with the top of the cooling base; a thermal field adjusting piece is arranged in the middle of the inner part of the crucible main body; the thermal field adjustment member includes a thermally conductive body; the middle part of heat conduction main part is equipped with the through-hole, be equipped with heat conduction assembly in the middle of the top of heat conduction main part.
The film and conveying mechanism is arranged on one side of the crucible, namely, discharge ports of the film and conveying mechanism are arranged on one side of a crucible opening, energy output devices are respectively arranged on the other side of the crucible, and output ports of the energy output devices are aligned with the middle position of the crucible.
The corners of the thermal field adjusting piece are in arc transition and are made of high-temperature-resistant materials.
As shown in fig. 3, the vacuum coating cavity comprises a vacuum cavity body, a vacuum pump and a workpiece frame; a vacuum pump is arranged on one side of the vacuum cavity and is communicated with the vacuum cavity through a vacuum valve; the top in the middle of the inside of the vacuum cavity is provided with a workpiece frame, and the bottom of the workpiece frame is provided with a substrate. The bottom of the substrate is provided with a crucible.
As shown in fig. 4, the energy output device (electron beam evaporation source) includes a base, an electron emitter, an anode, an electromagnetic coil, a collector, and a shielding plate; the top of the base is respectively provided with an electromagnetic coil, an anode and an electron emitter; and shielding plates are arranged at the tops of the electromagnetic coil, the anode and the electron emitter, and a collector is arranged on one side of each shielding plate. The electron emitter emits a high-energy electron beam.
As shown in fig. 5, the film material and conveying mechanism comprises a guide pipe, a wire feeder chassis, a friction pressing wheel and a wire coil; one end of the top of the wire feeder chassis is provided with a wire coil, the middle position of the wire feeder chassis is provided with a friction pinch roller, and the other end of the wire feeder chassis is provided with a guide pipe; the friction pinch roller outputs power through a transmission motor; the wire is wound with a metal wire; the metal wire respectively penetrates through the friction pinch roller and the guide tube; the transmission motor drives the metal wire to the top of the crucible.
The bottom of the heat conduction main body is provided with a through groove which horizontally penetrates through the heat conduction main body, and the through groove is communicated with the through hole and can supplement membrane liquid for a vaporization high-temperature area at the top of the through hole. The film liquid in the energy incidence area reduced by evaporation can be continuously replenished.
The bottom of cooling base is equipped with the water-cooling tank of U type, the opening of water-cooling tank is down. The water cooling tank is provided with a water pipeline, and water flow is injected into the water pipeline to take away heat of the cooling base.
The crucible adopts the heat preservation crucible, uses insulation material pottery to make the crucible main part in this embodiment, uses high energy particle beam to provide evaporation energy, compares with traditional copper crucible, and the heat runs off fewly, can reach and input less energy and can obtain great evaporation rate.
The heat-insulating crucible can be a crucible made of an integral high-temperature-resistant material, or a crucible with a composite structure, for example, a continuous or discontinuous heat-insulating layer is arranged in a copper crucible; the heat transfer capacity of the heat-insulating crucible is lower than that of a single copper crucible by more than 30 percent.
On the other hand, the embodiment also provides a method for enhancing the heating evaporation rate of the high-energy particle beam, which is different from the method described in the first embodiment in that the method for enhancing the heating evaporation rate of the high-energy particle beam further comprises a step S7 of continuously introducing cold water into a water cooling tank of the cooling base to take away heat conducted from the heat conducting body to the bottom of the crucible body. The distance between the liquid level of the membrane liquid and the top surface of the heat conducting component is less than 10mm. And (5) adjusting the proper position and angle of the film material and the conveying mechanism, and testing the machine before film coating to simulate whether the feeding is stable.
This embodiment is through setting up the thermal field adjustment piece in the crucible, promote the deposition rate upper limit of evaporation coating, possess faster deposition rate, deposition rate through promoting current equipment, thereby realize promoting output, reduce cost by a wide margin, can apply higher input energy through the thermal field adjustment piece simultaneously and can not cause violent boiling, cooperation membrane material and conveying mechanism, can continuous long-term coating work, and the fluctuation of membrane material liquid level is little, the production process is stable, also make things convenient for peripheral membrane liquid in time to supply the membrane liquid evaporation loss in energy incident area, cooperation membrane material and conveying mechanism, can maintain the liquid level of membrane liquid more stable, through keeping the same production condition, the stability of production technology has been guaranteed.
The above description is for the purpose of illustrating embodiments of the invention and is not intended to limit the invention, and it will be apparent to those skilled in the art that any modification, equivalent replacement, or improvement made without departing from the spirit and principle of the invention shall fall within the protection scope of the invention.
Claims (9)
1. A high-energy particle beam heating evaporation rate enhancing device comprises a vacuum coating cavity, an energy output device, a film material and conveying mechanism and a crucible;
the vacuum coating cavity is used for providing a vacuum coating environment; the energy output device is used for providing heat required by melting the membrane material; the film material and conveying mechanism is used for conveying the film material to maintain the level of the film liquid in the crucible and ensure the continuous film coating; the crucible is used for providing a place for melting the film material; the method is characterized in that:
the crucible comprises a crucible main body, a thermal field adjusting piece and a cooling base; the bottom of the crucible main body is connected with the top of the cooling base; a thermal field adjusting piece is arranged in the middle of the inner part of the crucible main body; the thermal field adjustment member includes a thermally conductive body; the middle part of heat conduction main part is equipped with the through-hole, be equipped with heat conduction assembly in the middle of the top of heat conduction main part.
2. The high energy particle beam heating evaporation rate enhancing device according to claim 1, wherein a horizontally penetrating through groove is formed in the bottom of the heat conducting main body, and the through groove is communicated with the through hole and can supplement a film liquid to a vaporization high temperature region at the top of the through hole.
3. The apparatus as claimed in claim 1, wherein the cooling base has a U-shaped water cooling tank at the bottom, and the opening of the water cooling tank faces downward.
4. The device for supporting the evaporation rate of the energetic particle beam heating as claimed in claim 3, wherein the water cooling tank is provided with a water pipe.
5. The apparatus of claim 1, wherein the crucible is a thermal crucible.
6. A method for enhancing the heating evaporation rate of a high-energy particle beam is characterized by comprising the following steps: s1, placing a high-energy particle beam heating evaporation rate enhancing device in a vacuum coating cavity; s2, correspondingly arranging an energy output device, a film material and conveying mechanism in the vacuum coating cavity, and respectively matching and installing the energy output device, the film material and conveying mechanism, the film material and the conveying mechanism with the device, wherein the middle of the top of the thermal field adjusting piece is an energy incidence area, and the energy incidence area is a high-temperature incidence area at the same time, so that a vaporization high-temperature area is formed in the middle of the top of the thermal field adjusting piece in the process of melting the film material to form a film forming liquid;
s3, conveying the film material into the crucible main body by the film material and conveying mechanism, and controlling the film material to cover the bottom of the crucible or the thermal field adjusting part until the bottom of the crucible or the thermal field adjusting part is not exposed;
s4, vacuumizing the vacuum coating cavity, starting an energy output device to output energy to the coating material, forming a film liquid after the coating material is heated and melted, and starting coating;
s5, when the coating speed needs to be increased, the energy output device increases the energy output, meanwhile, the coating material and the conveying mechanism synchronously increase the feeding, the evaporation loss of the coating consumed by coating and the film liquid in the vaporization high-temperature area is supplemented, meanwhile, the liquid level of the film liquid is kept stable by matching with the coating material and the conveying mechanism, and meanwhile, the through groove can also supplement the film liquid for the vaporization high-temperature area at the top of the through hole;
s6, when the film coating speed is increased, the heat conduction assembly conducts heat of the vaporization high-temperature area to the heat conduction main body, the heat conduction main body conducts the heat to the bottom of the crucible main body, and then the heat is taken away from the cooling base, so that the heat of other areas is lower than that of the vaporization high-temperature area, the range of high-temperature vaporization is reduced, the thermal field distribution of film liquid in an energy incidence area is changed, and the boiling phenomenon or the boiling degree of the liquid is inhibited or changed.
7. The method for enhancing evaporation rate of high energy particle beam heating according to claim 6, further comprising a step S7 of continuously introducing cold water into the water cooling tank of the cooling base to take away heat conducted from the heat conducting body to the bottom of the crucible body.
8. The method for enhancing the evaporation rate by heating the energetic particle beam as claimed in claim 6, wherein the distance between the liquid level of the membrane liquid and the top surface of the heat conducting component is less than 10mm.
9. The method according to claim 6, wherein the proper position and angle of the coating material and the transportation mechanism are adjusted, and a trial run is performed before coating to simulate whether the feeding is stable.
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202211324428.2A CN115627447A (en) | 2022-10-27 | 2022-10-27 | Device and method for enhancing heating evaporation rate of high-energy particle beam |
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| CN202211324428.2A CN115627447A (en) | 2022-10-27 | 2022-10-27 | Device and method for enhancing heating evaporation rate of high-energy particle beam |
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