CN115595550A - Automatic material changing and continuous evaporation coating device and method for AF particle coating material - Google Patents

Automatic material changing and continuous evaporation coating device and method for AF particle coating material Download PDF

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Publication number
CN115595550A
CN115595550A CN202211301855.9A CN202211301855A CN115595550A CN 115595550 A CN115595550 A CN 115595550A CN 202211301855 A CN202211301855 A CN 202211301855A CN 115595550 A CN115595550 A CN 115595550A
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China
Prior art keywords
film material
rod
feeding
base
particle
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Pending
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CN202211301855.9A
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Chinese (zh)
Inventor
朱宇彬
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Guangdong Zhenhua Technology Co ltd
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Guangdong Zhenhua Technology Co ltd
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Priority to CN202211301855.9A priority Critical patent/CN115595550A/en
Publication of CN115595550A publication Critical patent/CN115595550A/en
Pending legal-status Critical Current

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    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • C23C14/26Vacuum evaporation by resistance or inductive heating of the source

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

The invention discloses an automatic material changing and continuous evaporation coating device and method for an AF (AF) granular film material, which comprises a base, a detachable film material box, a feeding rod, a movable pull rod and a heating mechanism, wherein the feeding rod is arranged on the base; the detachable film material box is arranged on the top of the base; a feeding groove is formed in the base, and the feeding rod is installed in the feeding groove; an accommodating cavity is formed in one end of the feeding rod, and the movable pull rod is arranged on the right side of the accommodating cavity and connected with the feeding rod; the heating mechanism is arranged below the base. The invention is used as an evaporation device with independent function, is arranged on vacuum coating equipment, and can automatically replace AF particle coating materials to carry out continuous AF evaporation coating. Because the vacuum environment is not needed to be destroyed, the high vacuum state can be kept for a long time, thus the high-quality AF coating effect can be obtained, a large amount of high vacuum pumping time is saved, and the production efficiency is improved.

Description

Automatic material changing and continuous evaporation coating device and method for AF particle coating material
Technical Field
The invention relates to the technical field of vacuum coating, in particular to an automatic material changing and continuous evaporation coating device and method for an AF (AF) granular coating material.
Background
Currently, the AF film plating on a transparent panel is generally found in the mobile phone industry, the display element film plating industry or other electronic product industries with display panels. The AF film has various manufacturing methods, such as vacuum coating, spray coating, dip coating and the like, which are commonly used, and the coating components of the methods are different, and the effects are different. At present, most products are prepared by adopting a vacuum coating process, wherein the main two preparation methods comprise the following steps: the other is to use the granular film material to evaporate and plate the AF film, which is mainly realized by using a monomer film plating machine and is characterized in that the AF film layer has good performance quality and lower yield. The other method is to use liquid AF film material to continuously supply liquid for evaporation coating, and is characterized in that the performance and the quality of the AF film layer are poor, but the continuous production is convenient, and the yield is larger.
In the prior art, the two coating methods have different film effects, mainly because the difference of the vacuum pressure of the formed film is large. Generally, the working vacuum degree of the liquid AF membrane liquid is lower than that of the fixed particles, so that the binding force of the membrane layer is lower, a strong diffraction effect can be generated, and other functional elements in the coating cavity are polluted. The evaporation vacuum degree of the solid particle membrane material is usually within the pressure range of 10E-3Pa or more, but the good vacuum degree can be maintained only by repeatedly vacuumizing, and the process of vacuumizing is time-consuming, so that the production efficiency of coating is greatly reduced.
Disclosure of Invention
The invention aims to provide an automatic material changing and continuous evaporation coating device and method for an AF particle coating material.
The invention provides an automatic material changing and continuous evaporation coating device for an AF particle coating material, which comprises:
the device comprises a base, a detachable film material box, a feeding rod, a movable pull rod and a heating mechanism;
the detachable film material box is arranged on the top of the base;
a feeding groove is formed in the base, and the feeding rod is installed in the feeding groove;
an accommodating cavity is formed in one end of the feeding rod, and the movable pull rod is arranged on the right side of the accommodating cavity and connected with the feeding rod;
the heating mechanism is arranged below the base.
Optionally, a discharge port is formed in the bottom of the detachable film material box and communicated with the accommodating cavity.
Optionally, the movable pulling rod comprises a fixed rod and a swinging rod, and one end of the fixed rod is movably connected with one end of the swinging rod.
Optionally, a straight groove is formed in one side of the feeding groove, the feeding rod moves horizontally in the feeding groove, and the oscillating rod moves horizontally in the straight groove.
Optionally, a clamping groove is formed in the base, and the detachable diaphragm capsule is mounted on the clamping groove.
Optionally, can dismantle the membrane cartridge and twist and the locating pin including membrane cartridge base, apron, locking hand, membrane cartridge base and apron set up respectively can dismantle the front and back both sides face of membrane cartridge, locking hand twist with the cover connection, the locating pin sets up can dismantle the both ends of membrane cartridge.
Optionally, the heating mechanism comprises a heating element and an evaporation electrode, and the heating element is connected with the evaporation electrode.
Optionally, a groove is formed in the top surface of the heating element, and the shape of the groove is set according to the shape of the particle film material.
Optionally, the two side walls of the heating member are annularly provided with limiting blocks, and the limiting blocks are made of ceramic materials.
The invention provides an automatic material changing and continuous evaporation coating method for an AF (AF) granular film material, which is applied to an automatic material changing and continuous evaporation coating device for the AF granular film material, and the device comprises a base, a detachable film material box, a feeding rod, a movable pull rod and a heating mechanism; the detachable film material box is arranged at the top of the base; a feeding groove is formed in the base, and the feeding rod is installed in the feeding groove; an accommodating cavity is formed in one end of the feeding rod, and the movable pull rod is arranged on the right side of the accommodating cavity and connected with the feeding rod; the heating mechanism is arranged below the base; the method comprises the following steps:
s1: the detachable film material box is arranged on the clamping groove of the base, and the particle film materials in the detachable film material box are gathered downwards under the action of gravity;
s2: electrifying the heating mechanism, and simultaneously dropping a film material into the accommodating cavity of the feeding rod under the action of gravity at a proper position;
s3: moving the feeding rod forwards, and simultaneously driving the movable pulling rod to move forwards, wherein the movable pulling rod pushes the waste film material above the heating mechanism away from the original position;
s4: when the feeding rod reaches the limit position, the accommodating cavity filled with the new film material just reaches the upper part of the heating mechanism, and the new film material falls to the heating position above the heating mechanism;
s5: the feeding rod moves reversely, the movable pull rod swings, and the movable pull rod swings back to realize reset after avoiding the position of a new film material;
s6: and the feeding rod continues to move reversely, the accommodating cavity moves to a proper position below the detachable film material box, new film materials fall into the accommodating cavity, the feeding rod moves forwards, and then the new film materials are conveyed to be heated and evaporated.
According to the technical scheme, the invention has the following beneficial effects:
(1) Because the solid AF particle film material is used, the high vacuum state can be always kept, the film coating effect with the best performance is obtained, and other vacuum elements in a film coating cavity cannot be polluted.
(2) Can be matched with a feeding system with a vacuum buffer cavity, and can realize long-time continuous uninterrupted assembly line operation.
(3) Better film performance can be obtained, meanwhile, the time for repeatedly pumping high vacuum is saved in the process of automatic material changing and continuous evaporation, and the production efficiency is effectively improved.
Drawings
FIG. 1 is a schematic structural view of an AF particle film material automatic changing continuous evaporation coating device in the present invention;
FIG. 2 is another schematic structural diagram of the AF particle film material automatic changing continuous evaporation coating device in the present invention;
FIG. 3 is a side view of the AF particle coating material automatic feeding continuous evaporation coating device of the present invention;
FIG. 4 is a schematic structural diagram of the feeding and discharging processes in the AF particle film material automatic-changing continuous evaporation coating method of the present invention;
FIG. 5 is a schematic flow chart of the AF particle coating material automatic changing continuous evaporation coating method of the present invention.
In the figure: the device comprises a base 1, a detachable membrane material box 2, a feeding rod 3, a movable pulling rod 4, a heating mechanism 5, a ceramic limiting block 6, a feeding groove 101, a straight groove 102, a membrane box base 201, a membrane box cover plate 202, a membrane box locking hand screw 203, a membrane box positioning pin 204, a 301 accommodating cavity, a fixing rod 401 and a swinging rod 402.
Detailed Description
The embodiment of the application provides an automatic material changing continuous evaporation coating device and method for an AF particle coating material, which are used for improving the coating production efficiency of the particle coating material.
The technical solutions in the present application will be described clearly and completely with reference to the accompanying drawings in the embodiments of the present application, and it is obvious that the described embodiments are only some embodiments of the present application, not all embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present application.
Please refer to fig. 1 to 3, a continuous evaporation coating device for automatic material changing of AF particle film material, comprising a base 1, a detachable film material box 2, a feeding rod 3, a movable pulling rod 4 and a heating mechanism 5, wherein the detachable film material box 2 is installed on the top of the base 1, a feeding groove 101 is formed in the base 1, the feeding rod 3 is installed in the feeding groove 101, a containing cavity 301 is formed at one end of the feeding rod 3, the movable pulling rod 4 is arranged on the right side of the containing cavity 301 and connected with the feeding rod 3, the heating mechanism 5 is arranged below the base 1, the base 1 is installed on a vacuum coating device, the detachable film material box 2 is used for pre-loading the particle film material, the feeding rod 3 is used for feeding, the movable pulling rod 4 is used for discharging, and the heating mechanism 5 is used for evaporation coating. In this embodiment, the AF particle coating material is a copper cap-shaped container, and is filled with a coating material that adsorbs a filamentous solid of the coating material and is dedicated for AF coating in units of particles. The copper container has good heat-conducting property, and the coating material is easily heated uniformly.
Further, can dismantle the bottom of membrane magazine 2 and seted up the discharge gate, the discharge gate intercommunication holds chamber 301, and is specific, when feed rod 3 has not begun to remove yet, the discharge gate below just faces the top opening that holds chamber 301, just can make granule membrane material drop from the capsule incasement and hold in the chamber 301. When the feed rod 3 moves, the discharge port is in a sealed state at this time. The opening widths of the accommodating cavity 301 and the discharge hole are matched with the shape and size of the membrane material.
Further, the movable lever 4 includes a fixed rod 401 and a swing rod 402, one end of the fixed rod 401 is movably connected to one end of the swing rod 402, and the fixed rod 104 and the swing rod 402 may be connected by a screw or a hinge, which is not limited herein. And the swing angle setting of the swing lever 402 allows only a specific angle, for example, the swing angle is set to 90 degrees.
Further, a straight groove 102 is formed in one side of the feeding groove 101, the feeding groove 101 and the straight groove 102 are not on the same horizontal line, the feeding rod 3 and the fixed rod 401 horizontally move in the feeding groove 101, and the oscillating rod 402 horizontally moves in the straight groove 102; the in-groove width of the feed chute 101 is set according to the diameter of the feed rod 3, and the in-groove width of the straight chute 102 is set according to the width of the oscillating rod 402. When the movable pulling rod 4 moves forwards, the swinging rod 402 cannot swing at the limit position and moves together with the fixed rod 401 to push out the waste film material; when the movable pulling rod 4 moves reversely, the swinging rod 402 can swing to avoid the position of a new film material and then swing back to realize resetting, so that the device can realize the functions of discharging the waste film material and charging the new film material of the AF particle film material in one reciprocating motion period.
Further, the detachable film box 2 comprises a film box base 201, a cover plate 202, a locking hand screw 203 and positioning pins 204, wherein the film box base 201 and the cover plate 202 are arranged on the front side surface and the rear side surface, the locking hand screw 203 is connected with the cover plate 202, and the positioning pins 204 are arranged at the two ends of the detachable film box; the detachable film material box 2 in the embodiment can pre-install particles into the film material box in advance, is convenient to disassemble and assemble, can replace the film material box quickly, saves maintenance time, and can continuously plate the film for times determined by the size loading capacity of the film material box. When the film material box is installed, the film material box is inserted into the specific clamping groove formed in the base 1, so that the film material box is firmer. Secondly, the film material box can be clamped at a certain position through the positioning pin 201 to prevent shaking; the membrane box can be fixed manually by the membrane box locking part 202; the surface of the film cartridge may be stabilized by the mating of the cartridge base 203 and the cover plate 204.
Furthermore, the heating mechanism 5 comprises a heating element and an evaporation electrode, wherein the heating element is connected with the evaporation electrode, the heating element is made of high-melting point material, and heat is generated through current. The top surface of the heating element is provided with a groove, and the shape of the groove is arranged according to the shape of the particle film material, so that the surface of the groove is processed to be matched with the shape of the particle film material. The both sides wall ring of heating member is equipped with ceramic stopper 6, and the setting of recess shape and the setting of ceramic stopper 6 can realize letting the stable location of particle membrane material to there is great contact surface, and the heat conduction is good, can obtain stable evaporation rate.
In addition, the continuous evaporation coating device in the embodiment can realize large-area uniform coating by arranging a plurality of same coating devices. And meanwhile, a container is arranged below the device, so that the waste film material is convenient to recycle.
Referring to fig. 4-5, a in fig. 4 is a schematic structural view illustrating a film material falling into the accommodating chamber; b is a structural schematic diagram of pushing the waste film material out of an evaporation position by a movable pull rod; c is a structural schematic diagram of a new membrane falling into an evaporation position; d is a structural schematic diagram of the feeding rod returning to be ready for filling new membrane materials.
In this embodiment, an AF particle film material automatic-changing continuous evaporation coating method includes the following steps:
s1: before the operation is started, the device is arranged on vacuum coating equipment, a detachable film material box 2 pre-filled with an AF (AF) particle new film material is inserted into a specific clamping groove of a base 1, and the particle film material is gathered downwards under the action of gravity;
s2: the heating elements for continuous evaporation coating are communicated, the evaporation circuit is determined to be normal by trying to electrify, coating is prepared, a particle film material in the detachable film material box 2 is in a proper position, and the particle film material falls into the accommodating cavity 301 in the material conveying rod 3 under the action of gravity;
s3: when the device is operated, the feeding rod 3 moves forwards under the action of external force, the fixed rod 401 and the feeding rod 3 in the movable pull rod 4 move in the feeding groove 101, the swing rod 402 moves forwards under the limitation of the wall of the straight groove 102, and the swing rod 402 pushes the waste film material above the heating element away from the original position and drops downwards into a container for collecting the waste film material below;
s4: when the feeding rod 3 reaches the limit position, the accommodating cavity 301 filled with the new film material just reaches the position above the heating element, and the new film material falls down and falls onto a surface groove which is matched with the shape of the film material and is positioned above the heating element under the constraint of the ceramic limiting block 6;
s5: the feeding rod 3 moves reversely, the swinging rod 402 swings, and the swinging rod swings back to realize reset after avoiding the position of a new film;
s6: feed rod 3 continues reverse movement, and the chamber 301 that holds that loads the membrane material moves under the membrane material box discharge gate, and new membrane material drops and holds in the chamber 301, accomplishes new membrane material and loads the action, and feed rod 3 forward movement prepares next automatic cycle of reloading.
It is intended that the foregoing description of the disclosed embodiments enable any person skilled in the art to make or use the present application. Various modifications to these embodiments will be readily apparent to those skilled in the art, and the generic principles defined herein may be applied to other embodiments without departing from the scope of the application. Thus, the present application is not intended to be limited to the embodiments shown herein but is to be accorded the widest scope consistent with the principles and novel features disclosed herein.

Claims (10)

1. The utility model provides an automatic continuous evaporation coating device that reloads of AF granule coating film material which characterized in that includes:
the device comprises a base, a detachable film material box, a feeding rod, a movable pull rod and a heating mechanism;
the detachable film material box is arranged on the top of the base;
a feeding groove is formed in the base, and the feeding rod is installed in the feeding groove;
one end of the feeding rod is provided with an accommodating cavity, and the movable pull rod is arranged on the right side of the accommodating cavity and connected with the feeding rod;
the heating mechanism is arranged below the base.
2. The AF particle film material automatic changing continuous evaporation coating device of claim 1, wherein a discharge hole is formed at the bottom of the detachable film material box, and the discharge hole is communicated with the containing cavity.
3. The AF particle film material automatic refueling continuous evaporation coating device as claimed in claim 1, wherein the movable pulling rod comprises a fixed rod and a swinging rod, and one end of the fixed rod is movably connected with one end of the swinging rod.
4. The AF particle film material automatic changing continuous evaporation coating device of claim 3, wherein a straight groove is opened at one side of the feeding groove, the feeding rod moves horizontally in the feeding groove, and the swinging rod moves horizontally in the straight groove.
5. The automatic feeding and continuous evaporation coating device for AF particle membrane materials as claimed in claim 1, wherein a clamping groove is arranged on said base, and said detachable membrane cassette is installed on said clamping groove.
6. The AF particle film material automatic changing continuous evaporation coating device of claim 5, wherein the detachable film material box comprises a film box base, a cover plate, a locking hand screw and positioning pins, the film box base and the cover plate are respectively arranged on the front side surface and the rear side surface of the detachable film material box, the locking hand screw is connected with the cover plate, and the positioning pins are arranged at two ends of the detachable film material box.
7. The AF particle coating material automatic refueling continuous evaporation coating device as claimed in claim 1, wherein the heating mechanism comprises a heating member and an evaporation electrode, and the heating member is connected with the evaporation electrode.
8. The AF particle coating material automatic material changing continuous evaporation coating device of claim 7, wherein a groove is formed on the top surface of the heating element, and the shape of the groove is set according to the shape of the particle coating material.
9. The AF particle film material automatic material changing continuous evaporation coating device of claim 8, wherein the two side walls of the heating element are annularly provided with limiting blocks, and the limiting blocks are made of ceramic materials.
10. An automatic material changing and continuous evaporation coating method for AF particle film materials is characterized in that the method is applied to an automatic material changing and continuous evaporation coating device for AF particle film materials, and the device comprises a base, a detachable film material box, a feeding rod, a movable pull rod and a heating mechanism; the detachable film material box is arranged at the top of the base; a feeding groove is formed in the base, and the feeding rod is installed in the feeding groove; one end of the feeding rod is provided with an accommodating cavity, and the movable pull rod is arranged on the right side of the accommodating cavity and connected with the feeding rod; the heating mechanism is arranged below the base; the method comprises the following steps:
s1: the detachable film material box is arranged on the top of the base, and the particle film materials in the detachable film material box are gathered downwards under the action of gravity;
s2: electrifying the heating mechanism, and simultaneously dropping a film material into the accommodating cavity of the feeding rod under the action of gravity at a proper position;
s3: moving the feeding rod forwards, and simultaneously driving the movable pulling rod to move forwards, wherein the movable pulling rod pushes the waste film material above the heating mechanism away from the original position;
s4: when the feeding rod reaches the limit position, the accommodating cavity filled with the new film material just reaches the upper part of the heating mechanism, and the new film material falls to the heating part above the heating mechanism;
s5: the feeding rod moves reversely, and the movable pull rod swings back to realize reset after swinging to avoid the position of a new film material;
s6: and the feeding rod continues to move reversely, the accommodating cavity moves to a proper position below the detachable film material box, new film materials fall into the accommodating cavity, the feeding rod moves forwards, and then the new film materials are conveyed to be heated and evaporated.
CN202211301855.9A 2022-10-24 2022-10-24 Automatic material changing and continuous evaporation coating device and method for AF particle coating material Pending CN115595550A (en)

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CN202211301855.9A CN115595550A (en) 2022-10-24 2022-10-24 Automatic material changing and continuous evaporation coating device and method for AF particle coating material

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Application Number Priority Date Filing Date Title
CN202211301855.9A CN115595550A (en) 2022-10-24 2022-10-24 Automatic material changing and continuous evaporation coating device and method for AF particle coating material

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CN115595550A true CN115595550A (en) 2023-01-13

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Citations (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0578825A (en) * 1991-09-25 1993-03-30 Mitsubishi Heavy Ind Ltd Device for feeding raw material
JPH05339716A (en) * 1992-06-11 1993-12-21 Tdk Corp Method for supplying raw material pellet in vacuum evaporation
JPH0874039A (en) * 1994-09-08 1996-03-19 Ishikawajima Harima Heavy Ind Co Ltd Vacuum deposition material feeder
JP2003193218A (en) * 2001-12-27 2003-07-09 Shin Meiwa Ind Co Ltd Evaporation material feeder
US20060251811A1 (en) * 2005-05-03 2006-11-09 Eastman Kodak Company Controllably feeding powdered or granular material
CN101128373A (en) * 2005-02-25 2008-02-20 新明和工业株式会社 Vibrating bowl, vibrating bowl feeder, and vacuum deposition apparatus
CN101292058A (en) * 2005-10-19 2008-10-22 株式会社爱发科 Film forming material supplying apparatus
US20100122656A1 (en) * 2008-11-14 2010-05-20 Michael Long Particulate material metering and vaporization
JP2010116595A (en) * 2008-11-13 2010-05-27 Panasonic Corp Device for supplying film-forming material
JP2013127086A (en) * 2011-12-16 2013-06-27 Ulvac Japan Ltd Vapor deposition apparatus and vapor deposition method
CN203863924U (en) * 2014-06-09 2014-10-08 温州科力塑业有限公司 Feeding and melting device of injection molding machine
CN111850479A (en) * 2020-08-19 2020-10-30 布勒莱宝光学设备(北京)有限公司 Vacuum evaporation coating equipment
TWI719616B (en) * 2019-09-02 2021-02-21 馬來西亞商愛億集團有限公司 Apparatus and method for automatic change of coating material and heating and vaporization
CN215828861U (en) * 2021-10-09 2022-02-15 深圳市纳宏光电技术有限公司 Automatic feeding device for granular film material

Patent Citations (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0578825A (en) * 1991-09-25 1993-03-30 Mitsubishi Heavy Ind Ltd Device for feeding raw material
JPH05339716A (en) * 1992-06-11 1993-12-21 Tdk Corp Method for supplying raw material pellet in vacuum evaporation
JPH0874039A (en) * 1994-09-08 1996-03-19 Ishikawajima Harima Heavy Ind Co Ltd Vacuum deposition material feeder
JP2003193218A (en) * 2001-12-27 2003-07-09 Shin Meiwa Ind Co Ltd Evaporation material feeder
CN101128373A (en) * 2005-02-25 2008-02-20 新明和工业株式会社 Vibrating bowl, vibrating bowl feeder, and vacuum deposition apparatus
US20060251811A1 (en) * 2005-05-03 2006-11-09 Eastman Kodak Company Controllably feeding powdered or granular material
CN101292058A (en) * 2005-10-19 2008-10-22 株式会社爱发科 Film forming material supplying apparatus
JP2010116595A (en) * 2008-11-13 2010-05-27 Panasonic Corp Device for supplying film-forming material
US20100122656A1 (en) * 2008-11-14 2010-05-20 Michael Long Particulate material metering and vaporization
JP2013127086A (en) * 2011-12-16 2013-06-27 Ulvac Japan Ltd Vapor deposition apparatus and vapor deposition method
CN203863924U (en) * 2014-06-09 2014-10-08 温州科力塑业有限公司 Feeding and melting device of injection molding machine
TWI719616B (en) * 2019-09-02 2021-02-21 馬來西亞商愛億集團有限公司 Apparatus and method for automatic change of coating material and heating and vaporization
CN111850479A (en) * 2020-08-19 2020-10-30 布勒莱宝光学设备(北京)有限公司 Vacuum evaporation coating equipment
CN215828861U (en) * 2021-10-09 2022-02-15 深圳市纳宏光电技术有限公司 Automatic feeding device for granular film material

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