CN115449754A - Evaporation rack and evaporation device - Google Patents
Evaporation rack and evaporation device Download PDFInfo
- Publication number
- CN115449754A CN115449754A CN202211072117.1A CN202211072117A CN115449754A CN 115449754 A CN115449754 A CN 115449754A CN 202211072117 A CN202211072117 A CN 202211072117A CN 115449754 A CN115449754 A CN 115449754A
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- evaporation
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- 238000001704 evaporation Methods 0.000 title claims abstract description 94
- 230000008020 evaporation Effects 0.000 title claims abstract description 94
- 239000000758 substrate Substances 0.000 claims abstract description 138
- 230000007246 mechanism Effects 0.000 claims abstract description 63
- 230000005540 biological transmission Effects 0.000 claims abstract description 41
- 230000000670 limiting effect Effects 0.000 claims description 8
- 230000000694 effects Effects 0.000 abstract description 16
- 238000000576 coating method Methods 0.000 abstract description 15
- 239000011248 coating agent Substances 0.000 abstract description 14
- 239000000463 material Substances 0.000 description 8
- 238000003825 pressing Methods 0.000 description 8
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 7
- 229910052802 copper Inorganic materials 0.000 description 7
- 239000010949 copper Substances 0.000 description 7
- 238000000034 method Methods 0.000 description 7
- 230000033001 locomotion Effects 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 5
- 229910052782 aluminium Inorganic materials 0.000 description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 4
- 238000009434 installation Methods 0.000 description 4
- 230000008569 process Effects 0.000 description 4
- 230000004888 barrier function Effects 0.000 description 3
- 238000009792 diffusion process Methods 0.000 description 3
- 230000002829 reductive effect Effects 0.000 description 3
- 230000002441 reversible effect Effects 0.000 description 3
- 238000002390 rotary evaporation Methods 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 230000036961 partial effect Effects 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 238000000429 assembly Methods 0.000 description 1
- 230000000712 assembly Effects 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000003638 chemical reducing agent Substances 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 230000002452 interceptive effect Effects 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000001883 metal evaporation Methods 0.000 description 1
- 238000005289 physical deposition Methods 0.000 description 1
- 238000005240 physical vapour deposition Methods 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 230000003014 reinforcing effect Effects 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000004575 stone Substances 0.000 description 1
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Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/50—Substrate holders
- C23C14/505—Substrate holders for rotation of the substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The invention discloses an evaporation rack and an evaporation device, wherein the evaporation rack comprises: the revolution frame can rotate, a virtual rotation axis of the revolution frame is a first rotation axis, and a rotation plane of the revolution frame is a first plane; the revolution driving mechanism is in transmission connection with the revolution frame and is used for driving the revolution frame to rotate; the substrate fixing assembly is used for fixing a substrate and provided with a fixing station, the fixing station is used for accommodating the substrate, and the plane where the fixing station is located is a second plane; the angle adjusting mechanism is arranged on the public rotating frame and used for driving the substrate fixing assembly to rotate so as to adjust the angle of the second plane relative to the first plane, the virtual rotating shaft of the substrate fixing assembly is the second rotating shaft, and when the angle adjusting mechanism drives the substrate fixing assembly to rotate, the distance between the second rotating shaft and the first plane is unchanged. The evaporation rack can be conveniently adjusted to the optimal evaporation angle, so that the evaporation coating effect is the best.
Description
Technical Field
The present disclosure relates to circuit board manufacturing, and more particularly to an evaporation rack and an evaporation apparatus.
Background
In the IC industry, the conventional wiring material is generally aluminum, but as the process size of integrated circuits is reduced, the disadvantage of high resistance of aluminum is gradually manifested. Copper is used as a wiring material for highly integrated circuits because of its good electrical conductivity instead of aluminum. Copper has the disadvantage of readily diffusing into silicon or silicon dioxide, which can severely affect device performance. It is therefore necessary to first cover the copper barrier with a material known as a diffusion barrier to prevent diffusion of copper. Another disadvantage of copper is that it is difficult to etch and does not deposit and then etch the pattern as does aluminum. The common practice is to etch the circuit pattern first and then electroplate the copper circuit by physical deposition. However, the electroplating requires conductivity, so a copper seed layer must be covered on the surface of the diffusion barrier layer for conducting.
Common seed layer fabrication methods are PTH or PVD sputtering, but the two methods: the former has the problems of complex process, poor film-forming density and weak bonding force with epoxy resin; the latter has the problems that the equipment is easy to generate arcing, the film-forming density is not good enough, and the film-forming temperature is higher. In order to overcome the above disadvantages, a metal evaporation coating process can be used to fabricate the seed layer, and the existing evaporation rack for placing the substrate of the circuit board is prone to cause large change of the distance between each area of the substrate and the evaporation source when adjusting the angle of the substrate relative to the evaporation source, and factors influencing the film forming effect become more, thereby being not beneficial to variable control in the adjusting process.
Disclosure of Invention
The present invention is directed to solving at least one of the problems of the prior art. Therefore, the invention provides an evaporation rack which can be conveniently adjusted to the optimal evaporation angle, so that the evaporation coating effect is the best.
The invention also provides an evaporation device with the evaporation rack.
An evaporation rack according to an embodiment of a first aspect of the present invention is used for placing a substrate, and includes: the revolution frame can rotate, a virtual rotation axis of the revolution frame is a first rotation axis, a rotation plane of the revolution frame is a first plane, and the first rotation axis is vertical to the first plane; the revolution driving mechanism is in transmission connection with the revolution frame and is used for driving the revolution frame to rotate; the substrate fixing assembly is used for fixing the substrate and provided with a fixing station, the fixing station is used for accommodating the substrate, and the plane of the fixing station is a second plane; the angle adjusting mechanism is used for driving the substrate fixing assembly to rotate so as to adjust the angle of the second plane relative to the first plane, the virtual axis of rotation of the substrate fixing assembly is a second rotating axis, the second rotating axis is parallel to or coincided with the first plane, the second rotating axis is intersected with the first rotating axis, and when the angle adjusting mechanism drives the substrate fixing assembly to rotate, the distance between the second rotating axis and the first plane is unchanged.
According to the embodiment of the invention, the evaporation rack at least has the following technical effects: the revolution frame and the revolution driving mechanism are arranged, so that the substrates can rotate around the evaporation source, and the rotary evaporation coating operation can be performed, a plurality of substrates can be coated simultaneously, the substrates in all directions can be coated more uniformly, and the coating quality is improved; the angle adjusting mechanism is arranged, so that the angle position of the substrate relative to the evaporation source can be adjusted under the condition that the distance between the substrate and the evaporation source is not changed, factors influencing the film forming effect are conveniently controlled, the most appropriate intersection angle is selected, and the best film forming effect is achieved.
According to some embodiments of the present invention, the substrate fixing assembly includes a substrate mounting frame, an escape column and a fixing dial piece, one end of the escape column is connected to the substrate mounting frame, the fixing dial piece is rotatably connected to the other end of the escape column, the escape column is used for avoiding a space for mounting the substrate, the fixing dial piece is used for fixing the substrate in a limiting manner, the substrate mounting frame is disposed on the angle adjusting mechanism, and the substrate mounting frame is provided with the fixing station.
According to some embodiments of the present invention, the angle adjusting mechanism includes an angle driving member, a rotating shaft, a rotating disc, and a mounting frame, the mounting frame is disposed on the revolution frame, the rotating shaft is rotatably connected to the mounting frame, one end of the rotating shaft is fixedly connected to the center of the rotating disc, the other end of the rotating shaft is in transmission connection with the angle driving member, the substrate fixing assembly is fixed to the outer side of the rotating disc, and a virtual axis of rotation of the rotating disc is the second rotating axis.
According to some embodiments of the present invention, the angle adjusting mechanism includes an angle driving member, a first gear, an arc-shaped bar, and a mounting bracket, the mounting bracket is disposed on the common rotating bracket, both ends of the arc-shaped bar are slidably connected to the mounting bracket, the substrate fixing assembly is connected to the arc-shaped bar, one side of the arc-shaped bar is provided with an arc-shaped rack, the first gear is engaged with the arc-shaped rack, the angle driving member is connected to the first gear in a transmission manner, the angle driving member is configured to drive the first gear to rotate, so that the arc-shaped bar rotates relative to the mounting bracket, and a virtual axis of rotation of the arc-shaped rack is the second rotating axis.
According to some embodiments of the present invention, the angle adjusting mechanism further includes a rotating rod, a bearing, a first bevel gear and a second bevel gear, wherein two first gears and two arc-shaped bars are provided, one arc-shaped bar is connected to one side of the substrate fixing component, the other arc-shaped bar is connected to the other side of the substrate fixing component, one end of the rotating rod is connected to one first gear, the other end of the rotating rod is connected to the other first gear, one first gear is engaged with the arc-shaped rack on one arc-shaped bar, the other first gear is engaged with the arc-shaped rack on the other arc-shaped bar, the bearing is provided on the mounting frame, the rotating rod is connected to the bearing, the first bevel gear is provided in the middle of the rotating rod, the second bevel gear is engaged with the first bevel gear, the angle driving member is in driving connection with the second bevel gear, and the angle driving member is configured to drive the second bevel gear to rotate, so as to drive the arc-shaped racks to rotate relative to the mounting frame.
According to some embodiments of the invention, the angle adjusting mechanism further comprises a guide wheel, the guide wheel is rotatably connected to the mounting frame, and a wheel surface of the guide wheel is slidably connected with the arc-shaped strip.
According to some embodiments of the invention, the revolution driving mechanism comprises a revolution driving member and a rotary base, the revolution frame and the rotary base are in rotary connection, and the revolution driving member is used for driving the revolution frame to rotate.
According to some embodiments of the present invention, the revolution driving mechanism further includes a plurality of protruding members and a transmission screw rod, the protruding members are evenly distributed on the outer circumference of the revolution frame, the transmission screw rod is provided with a threaded recess, at least one protruding member is located in the threaded recess, the revolution driving member is in transmission connection with the transmission screw rod, and the revolution driving member is configured to drive the transmission screw rod to rotate, so as to push the protruding members to move, and further drive the revolution frame to rotate relative to the rotating base.
According to some embodiments of the invention, the revolution driving mechanism further comprises a drum and a rotating ball, the drum and the rotating ball are both arranged between the revolution frame and the rotating base, an upper side of the drum abuts against the revolution frame, a lower side of the drum abuts against the rotating base, an inner side of the drum abuts against the rotating base, and an outer side of the drum abuts against the revolution frame.
The evaporation device according to the second aspect of the embodiment of the invention comprises the evaporation rack.
According to the evaporation device provided by the embodiment of the invention, at least the following technical effects are achieved: the evaporation device provided with the evaporation rack can be conveniently adjusted to the optimal evaporation angle, so that the evaporation coating effect is the best.
Additional aspects and advantages of the invention will be set forth in part in the description which follows and, in part, will be obvious from the description, or may be learned by practice of the invention.
Drawings
The above and/or additional aspects and advantages of the present invention will become apparent and readily appreciated from the following description of the embodiments, taken in conjunction with the accompanying drawings of which:
FIG. 1 is a schematic view of the overall assembly of an evaporation rack according to an embodiment of the present invention;
FIG. 2 is a schematic view of the evaporation rack of FIG. 1, with a portion of the shielding structure removed;
FIG. 3 is a cross-sectional isometric view of the evaporation rack of FIG. 1;
FIG. 4 is a schematic view of the entire assembly of the substrate fixing assembly and the angle adjusting mechanism of the evaporation rack shown in FIG. 1;
fig. 5 is an overall assembly view and a partially enlarged view of the substrate fixing assembly and the angle adjusting mechanism shown in fig. 4 with a portion of the shielding structure removed.
Reference numerals:
a male turret 100;
a revolution driving mechanism 200, a revolution driving member 210, a rotary base 220, a protruding member 230, a transmission screw 240, a thread concave 241, a roller 250, and a rotating ball 260;
the device comprises a substrate fixing component 300, a substrate mounting frame 310, a clearance column 320, a fixing shifting sheet 330 and a pressing plate frame 340;
the angle adjusting mechanism 400, the angle driving member 410, the first gear 420, the arc-shaped bar 430, the arc-shaped rack 431, the mounting frame 440, the rotating rod 450, the bearing 460, the first bevel gear 470, the second bevel gear 480 and the guide wheel 490.
Detailed Description
Reference will now be made in detail to embodiments of the present invention, examples of which are illustrated in the accompanying drawings, wherein like reference numerals refer to the same or similar elements or elements having the same or similar functions throughout. The embodiments described below with reference to the accompanying drawings are illustrative only for the purpose of explaining the present invention, and are not to be construed as limiting the present invention.
In the description of the present invention, it should be understood that the positional or orientational descriptions referred to, for example, "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "pointed", "inner", "outer", "axial", "radial", "circumferential", etc., are based on the positional or orientational relationships shown in the drawings and are for convenience of description and simplicity of description only, and are not intended to indicate or imply that the device or element referred to must have a particular orientation, be constructed and operated in a particular orientation, and therefore, are not to be construed as limiting the invention. In the description of the present invention, the sidewall means a left sidewall and/or a right sidewall.
In the description of the present invention, "a plurality" means two or more, "more than", "less than", "more than", and the like are understood as excluding the essential numbers, and "more than", "less than", "inside", and the like are understood as including the essential numbers. If the description of "first" and "second" is used for the purpose of distinguishing technical features, the description is not intended to indicate or imply relative importance or to implicitly indicate the number of the indicated technical features or to implicitly indicate the precedence of the indicated technical features.
In the description of the present invention, it is to be understood that "a is provided on B" and "a is provided on B" express a connection relationship or a positional relationship between a and B, and do not mean that a is necessarily above B.
In the description of the present invention, it should be noted that, unless otherwise explicitly specified or limited, the terms "disposed," "mounted," "connected," and "connected" are to be construed broadly, and may be, for example, fixedly connected, detachably connected, movably connected, or integrally connected; can be mechanically or electrically connected; they may be connected directly or indirectly through intervening media, or they may be interconnected between two elements. "bolted" and "screwed" are equally interchangeable. To those of ordinary skill in the art, the specific meanings of the above terms in the present invention can be understood in conjunction with specific situations.
It should be understood that a plurality of similar features in the present invention are distinguished only by different prefixes, and therefore, in the present invention, the combination of similar features of this class is represented by a feature name without a distinguished prefix (or a feature name with a partial prefix). It should be understood that in the description of the evaporation rack of the present invention, the description of "substrate" is introduced only for illustrating the structure of the evaporation rack and the functions generated by the structure, and the "substrate" does not belong to the structure of the evaporation rack.
Referring to fig. 1, 3 and 5, an evaporation rack for placing a substrate according to an embodiment of the present invention includes a revolving rack 100, a revolving drive mechanism 200, a substrate fixing assembly 300 and an angle adjusting mechanism 400.
The revolving frame 100 is rotatable, and a virtual axis of rotation of the revolving frame 100 is a first rotation axis, a plane (rotation plane) in which the revolving frame 100 is located is a first plane, and the first rotation axis is perpendicular to the first plane. It should be understood that, in the description of the present invention, the "virtual axis of rotation" of a certain component is a virtual rotation axis, and the component is not necessarily actually provided with a rotation axis, that is, the first rotation axis and the second rotation axis are virtual rotation axes; specifically, for example, the arc-shaped bar 430 of the present invention is connected to the mounting frame 440 via the guide wheel 490, and the arc-shaped bar 430 can rotate relative to the mounting frame 440, but it does not have a rotation shaft, so its rotation shaft is a virtual rotation shaft. In the evaporation apparatus, the first rotation shaft penetrates the evaporation source. The upper surface of the revolution shelf 100 is a plane on which other components (the mounting shelf 440) are placed, namely, a first plane; in the present embodiment, the revolving frame 100 has a substantially annular shape.
The revolution driving mechanism 200 is in transmission connection with the revolution frame 100, and the revolution driving mechanism 200 is used for driving the revolution frame 100 to rotate. The revolution driving mechanism 200 drives the revolution frame 100 to rotate, which may be driven by the revolution driving member 210 and a screw nut-like structure as in this embodiment, or may be driven by other driving methods, such as driving by the revolution driving member 210 and a planetary gear reducer, specifically, the lower end of the mounting frame 440 is rotatably and slidably connected with the rotating base 220, the upper end of the mounting frame 440 is provided with a gear ring, the revolution driving member 210 is in transmission connection with a sun gear, one side of the planetary gear is engaged with the sun gear, and the other side of the planetary gear is engaged with the gear ring; other driving manners can refer to other related documents in the art, and are not described herein again. Revolution, namely, the evaporation source is used as a fixed star, the substrate is used as a planet, and the substrate rotates around the evaporation source to form a running track similar to the revolution of the planet in a galaxy system; during evaporation coating, material body steam in each direction in the evaporation chamber possibly has certain difference, so that the revolution frame 100 is driven to revolve to drive the substrate to revolve, the substrates in each direction can be coated more uniformly, and the coating quality is improved.
The substrate fixing assembly 300 is used for fixing a substrate, the substrate fixing assembly 300 is provided with a fixing station, the fixing station is used for accommodating the substrate, and a plane where the fixing station is located is a second plane. After evaporation, the evaporation source is condensed to form a film on the substrate. The fixing station is used for accommodating the substrate, so the fixing station is approximately the same as the substrate and is in a flat plate shape, and the plane where the fixing station is located can be taken as a second plane. The substrate is an unfinished circuit board in the circuit board processing and manufacturing process, or is a raw material, and the raw material can be manufactured into the circuit board after further processing. The substrate fixing assembly 300 may be fixed in a limiting manner, such as a substrate mounting frame 310, a clearance post 320, and a fixing pick 330; the substrate fixture assembly 300 may also be fixed by other means, such as clamping, air chuck, etc.
The angle adjusting mechanism 400 is disposed on the revolution stand 100, the substrate fixing assembly 300 is disposed on the angle adjusting mechanism 400, and the angle adjusting mechanism 400 is configured to drive the substrate fixing assembly 300 to rotate, so as to adjust an angle of the second plane relative to the first plane, taking a virtual axis of rotation of the substrate fixing assembly 300 as a second rotation axis, the second rotation axis being parallel to or coinciding with the first plane, and the second rotation axis intersecting with the first rotation axis, when the angle adjusting mechanism 400 drives the substrate fixing assembly 300 to rotate, a distance between the second rotation axis and the first plane is unchanged (or, a position of the second rotation axis relative to the first plane is kept unchanged). The second rotation axis is parallel to or coincident with the first plane, and the first rotation axis is perpendicular to the first plane, so that the second rotation axis is perpendicular to the first rotation axis. The virtual axis of rotation of the substrate fixing assembly 300 is the second rotation axis, that is, the virtual axis of rotation of the second plane is the second rotation axis, or in practice, the angle adjusting mechanism 400 drives the substrate to rotate, and the virtual axis of rotation of the substrate is the second rotation axis. The second plane intersects the first plane, so that the second plane forms an intersection angle with the first plane, and the intersection angle is corresponding to the intersection angle; the angle adjustment mechanism 400 can drive the substrate fixing assembly 300 to rotate, so as to adjust the size of the intersection angle. In the evaporation apparatus, the evaporation source is disposed substantially at the intersection of the second rotation axis and the first rotation axis (i.e., the intersection of the two); therefore, the angular position (or evaporation angle) of the substrate relative to the evaporation source can be adjusted by the angle adjusting mechanism 400 without changing the distance between the substrate and the evaporation source and the distance between each area of the substrate relative to the evaporation source, so that the factors (or variables) influencing the film forming effect can be effectively controlled, and the film forming effect can be conveniently increased; specifically, the film forming quality and the film forming efficiency of the substrate at each intersection angle can be recorded respectively, so that analysis and comparison are comprehensively performed, the influence of the intersection angle on the film forming quality and the film forming efficiency is analyzed, the film forming quality and the film forming efficiency are comprehensively considered, the most appropriate intersection angle is selected when evaporation is actually performed, and the film forming effect is the best comprehensively considered. The angle adjustment mechanism 400 may have various configurations, such as an angle driving member 410, a rotating shaft, a rotating disc, and a mounting frame 440, and may also have other configurations of the angle adjustment mechanism 400, such as the angle driving member 410, the rotating shaft, the rotating disc, and the mounting frame 440.
The revolution frame 100 and the revolution driving mechanism 200 are arranged, so that the substrates can rotate around the evaporation source, and the rotary evaporation coating operation can be performed, a plurality of substrates can be coated simultaneously, the substrates in all directions can be coated more uniformly, and the coating quality is improved; the angle adjusting mechanism 400 can adjust the angle position of the substrate relative to the evaporation source under the condition that the distance between the substrate and the evaporation source is not changed, so that the factors influencing the film forming effect can be conveniently controlled, and the optimal intersection angle can be selected to achieve the best film forming effect.
Referring to fig. 4 and 5, in some embodiments of the present invention, the substrate fixing assembly 300 includes a substrate mounting frame 310, a space-avoiding column 320 and a fixing dial 330, one end of the space-avoiding column 320 is connected to the substrate mounting frame 310, the fixing dial 330 is rotatably connected to the other end of the space-avoiding column 320, the space-avoiding column 320 is used for avoiding a space for mounting a substrate, the fixing dial 330 is used for limiting and fixing the substrate, the substrate mounting frame 310 is disposed on the angle adjusting mechanism 400, and the substrate mounting frame 310 is provided with a fixing station.
The space avoidance column 320 and the fixed shifting piece 330 are arranged, so that the structure is simple, the opening and fixing modes are easy to use, and the processing and the use are convenient. It should be understood that the substrate fixing structures (formed by the clearance posts 320 and the fixing picks 330) are disposed at least in three directions of the substrate mounting frame 310, that is, the substrate fixing structures are disposed at least in three directions and need to be disposed at different positions, respectively.
Referring to fig. 5, in some embodiments of the present invention, the substrate fixing assembly 300 further includes a pressing plate frame 340, the evacuation column 320 is used for evacuating a space for installing the pressing plate frame 340, the fixing pull tab 330 limits the fixing pressing plate frame 340, the pressing plate frame 340 is used for fixing a substrate, and the pressing plate frame 340 is provided with a fixing station.
A special pressing plate frame 340 is arranged to fix the base plate, so that the base plates with different specifications can be fixed conveniently; specifically, the external dimensions of the platen frame 340 are suitable for being installed in a flap frame without changing, and the internal dimensions and shapes of the platen frame 340 can be designed correspondingly according to base plate plates with different sizes and shapes; therefore, in one substrate fixing assembly 300, only the pressing plate frame 340 needs to be replaced, and the rotary evaporation coating operation can be performed on substrates with different specifications.
In some embodiments of the present invention, the angle adjusting mechanism 400 includes an angle driving member 410, a rotating shaft, a rotating plate, and a mounting frame 440, the mounting frame 440 is disposed on the revolving frame 100, the rotating shaft is rotatably connected to the mounting frame 440, one end of the rotating shaft is fixedly connected to the center of the rotating plate, the other end of the rotating shaft is in transmission connection with the angle driving member 410, the substrate fixing assembly 300 is fixed to the outer side of the rotating plate, and the virtual axis of rotation of the rotating plate is a second rotating axis.
It will be appreciated that the drive member must be configured for actual use, but in actual sale, the drive member may not be mounted on the evaporation rack, requiring the drive member to be configured by the person who buys the evaporation rack. The driving part can be a motor, and can also be other driving parts such as an air cylinder, a hydraulic cylinder and the like; it should be further understood that, in the present invention, the driving member is connected with the driven member, and the driving member may be directly connected with the driven member, and the driving member directly drives the driven member to move; the driving member may also be indirectly connected to the driven member through an intermediate transmission assembly (e.g., one or more combinations of gears, racks, belts, chains, lead screws, etc.), so as to vary the speed, direction, magnitude, etc. of the driving force applied to the driven member. The angle driving member 410 drives the rotation shaft to rotate, thereby driving the rotation disc to rotate, and further driving the substrate fixing assembly 300 (substrate mounting frame 310) located at the outer side of the rotation disc to rotate, i.e. driving the substrate to rotate; the virtual axis of rotation of the turntable is the second axis of rotation, and the turntable of this embodiment is provided with a rotating shaft, so the rotating shaft and the second axis of rotation are collinear. Specifically, since the evaporation source is disposed on the path of the second rotation axis, in order to prevent the rotation axis and the evaporation source from interfering with each other, the turntable is generally connected to both sides of the substrate mounting frame 310, and the rotation axis and the angle driving member 410 are connected to the outside direction away from the turntable and the substrate mounting frame 310, in this way, the space occupied by the rotation axis and the angle driving member 410 is large, so that the overall size of the apparatus is large, the number of substrates that can be accommodated is small, and the turntable must be connected to the rotation axis and the rotation axis of the second rotation axis and the mounting frame 440 to be rotatably connected, thereby further increasing the size of the apparatus.
Referring to fig. 3 and 5, in some embodiments of the present invention, the angle adjustment mechanism 400 includes an angle driving member 410, a first gear 420, an arc-shaped bar 430 and a mounting frame 440, the mounting frame 440 is disposed on the revolution frame 100, both ends of the arc-shaped bar 430 are slidably connected to the mounting frame 440, the substrate fixing assembly 300 (the substrate mounting frame 310) is connected to the arc-shaped bar 430, one side of the arc-shaped bar 430 is provided with an arc-shaped rack 431, the first gear 420 is engaged with the arc-shaped rack 431, the angle driving member 410 is in transmission connection with the first gear 420, the angle driving member 410 is configured to drive the first gear 420 to rotate, so that the arc-shaped bar 430 rotates relative to the mounting frame 440, and a virtual axis of rotation of the arc-shaped rack 431 is a second rotation axis.
The angle driving member 410 drives the first gear 420 to rotate, and the first gear 420 drives the arc rack 431 to rotate, i.e. the arc strip 430 rotates relative to the mounting frame 440. Since three points define a circle, and both ends of the arc-shaped bar 430 are slidably connected to the mounting frame 440, and the arc-shaped rack 431 and the first gear 420 on one side of the arc-shaped bar 430 are engaged, the moving path of the arc-shaped bar 430 can be determined, or the arc-shaped bar 430 can be limited and fixed to a certain extent; the connection position of the arc-shaped bar 430 and the mounting frame 440 can be approximately arranged at any position on the movement path of the arc-shaped bar 430, namely, the specific position of the second rotating shaft is basically not required, so that compared with the above embodiment, the volume of the equipment can be effectively reduced; further, the arc rack 431, the first gear 420, the angle driving member 410, etc. may be disposed at the rear side (in the radial direction) of the arc rack 430, the substrate fixing assembly 300, etc., and have no influence on the placement of other substrates on the revolving frame 100, whereas in the above-mentioned embodiment, the rotating shaft, the angle driving member 410, etc. need to be disposed at the left and right outer sides (in the circumferential direction) of the parts such as the turntable, the substrate fixing assembly 300, etc., and may influence the placement of other substrates on the revolving frame 100, thereby being inconvenient for the fixation of other substrates, and even resulting in a smaller number of substrates that can be accommodated on the revolving frame 100.
In some embodiments of the present invention, the angle adjusting mechanism 400 further comprises a rocking transmission assembly, the angle driving member 410 is in transmission connection with the rocking transmission assembly, the rocking transmission assembly is in transmission connection with the first gear 420, and the rocking transmission assembly is used for enabling the angle driving member 410 to drive the first gear 420 to reciprocate.
The reciprocating forward and reverse rotation movement refers to reciprocating linear movement, namely forward rotation is performed by a certain angle, reverse rotation is performed by a certain angle, and the cycle is repeated. A shaking transmission assembly is arranged, so that the angle driving member 410 can drive the first gear 420 to reciprocate and rotate forwards and backwards, and further the arc-shaped strip 430, the substrate fixing assembly 300 (the substrate mounting frame 310) and the substrate can reciprocate and rotate, namely the substrate is shaken up and down continuously; on one hand, referring to the related contents of the revolution of the substrate, when evaporation coating is carried out, material body steam in each upper and lower position in an evaporation chamber possibly has a certain difference, so that the substrate is driven to continuously shake up and down, the coating of the substrate in each position can be more uniform, the coating quality is improved, and the distribution of material bodies on the substrate can be shaken to a certain degree when the substrate is shaken; on the other hand, by arranging the rocking transmission assembly, a plurality of substrates with the best film forming effect and similar evaporation angles (referring to the related content of the evaporation angle adjustment, one substrate corresponds to one evaporation angle, the film forming effect is best under the evaporation angle, and the numerical difference of the evaporation angles of the plurality of substrates is small) can be evaporated together; and when the substrate is independently evaporated corresponding to the plurality of substrates, the evaporation angle can be finely adjusted by the angle adjusting mechanism 400 without spending time, so that the time required by production is reduced, and the production efficiency is improved. It should be understood that the rocker drive assembly may be a combination of a slider-crank mechanism, a cam mechanism, a planar linkage mechanism, a partial gear mechanism, and other intermediate drive assemblies.
Specifically, for example, the rocking driving assembly includes an incomplete gear, a ring-shaped rack and a spur rack, the angle driving member 410 is in driving connection with the incomplete gear, the ring-shaped rack is provided with an upper rack and a lower rack, the upper rack is used for being engaged with the incomplete gear, the lower rack is used for being engaged with the incomplete gear, the ring-shaped rack is slidably connected with the mounting frame 440, the ring-shaped rack is connected with the spur rack, and the spur rack is engaged with the first gear 420. When the incomplete gear is meshed with the upper rack, the incomplete gear rotates to drive the annular rack to slide to one side, so that the straight rack is driven to slide to one side, and the first gear 420 is driven to rotate forwards; the incomplete gear continuously rotates to cause the incomplete gear and the upper rack to be disengaged, and the annular rack does not move any more; when the incomplete gear rotates to the lower part, the incomplete gear is meshed with the lower rack and continues to rotate to drive the annular rack to slide to the other side, so that the straight rack is driven to slide to the other side, and the first gear 420 is driven to rotate reversely; the incomplete gear continues to rotate, so that the incomplete gear is disengaged from the lower rack, and the annular rack does not move any more; when the incomplete gear rotates to the upper side, the incomplete gear is meshed with the upper rack, and the reciprocating forward and reverse rotation of the first gear 420 can be realized by repeating the processes.
Referring to fig. 3 and 5, in some embodiments of the present invention, the angle adjustment mechanism 400 further includes a rotating bar 450, a bearing 460, a first bevel gear 470 and a second bevel gear 480, two first gears 420 and two arc-shaped bars 430 are provided, one arc-shaped bar 430 is connected to one side of the substrate fixing assembly 300 (the substrate mounting frame 310), the other arc-shaped bar 430 is connected to the other side of the substrate fixing assembly 300 (the substrate mounting frame 310), one first gear 420 is connected to one end of the rotating bar 450, the other end of the rotating bar 450 is connected to the other first gear 420, one first gear 420 is engaged with the arc-shaped rack 431 on one arc-shaped bar 430, the other first gear 420 is engaged with the arc-shaped rack 431 on the other arc-shaped bar 430, the bearing 460 is provided on the mounting frame 440, the rotating bar 450 is connected to the bearing 460, the first bevel gear 470 is provided on the middle portion of the rotating bar 450, the second bevel gear 480 is engaged with the first bevel gear 470, the angle driver 410 is in transmission connection with the gear 480, and the angle driver 410 is used for driving the second bevel gear 480 to rotate, thereby driving the first bevel gear 470, the rotating bar 450, the two first bevel gears 470 and the arc-shaped rack 431 to rotate together, and the mounting frame 440.
Two arc strips 430 drive same base plate installation frame 310 motion for base plate installation frame 310 is fixed firm, and moves more steadily, and passes through bevel gear transmission angle driving piece 410's drive power, thereby changes the transmission position of power, increases angle driving piece 410's placeable position, makes things convenient for angle driving piece 410's installation fixed. The angle drive 410 is mounted on a mounting bracket 440.
Referring to fig. 5, in some embodiments of the present invention, the angle adjustment mechanism 400 further comprises a guide wheel 490, the guide wheel 490 is rotatably connected to the mounting frame 440, and a wheel surface of the guide wheel 490 is slidably connected (or abutted, rotatably connected) to the arc-shaped bar 430.
The connection mode of the guide wheel 490 and the arc-shaped bar 430 is a combination of sliding connection, abutting connection and rotating connection of various connection modes. Through setting up guide pulley 490, can reduce the frictional resistance between arc strip 430 and mounting bracket 440, make things convenient for the rotation of arc strip 430. It should be understood that, in this embodiment, the wheel surface of the guide wheel 490 is provided with a U-shaped ring groove, and the side surface of the arc-shaped bar 430 is provided with a U-shaped ring protrusion, the U-shaped ring protrusion is located in the U-shaped ring groove, and the U-shaped ring protrusion abuts against the guide wheel 490, so that the limiting effect is better. It should be understood that, in the present embodiment, at the connection point of the arc-shaped bar 430 and the mounting bracket 440, two guide wheels 490 are provided to abut against the upper and lower sides of the arc-shaped bar 430, respectively, so that the arc-shaped bar 430 is more easily slid.
Referring to fig. 2 and 3, in some embodiments of the present invention, the revolution driving mechanism 200 includes a revolution driving member 210 and a rotary base 220, the revolution frame 100 is rotatably connected to the rotary base 220, and the revolution driving member 210 is used for driving the revolution frame 100 to rotate.
The rotary base 220 plays a role of bearing and limiting, and facilitates the installation and movement of the revolution shelf 100. The revolution driving member 210 can directly or indirectly drive the revolution frame 100 to rotate.
Referring to fig. 2 and 3, in some embodiments of the present invention, the revolution driving mechanism 200 further includes a plurality of protruding members 230 and a transmission screw 240, the plurality of protruding members 230 are evenly distributed on the outer circumference of the revolution frame 100, the transmission screw 240 is provided with a threaded recess 241, at least one protruding member 230 is located in the threaded recess 241, the revolution driving member 210 is in transmission connection with the transmission screw 240, and the revolution driving member 210 is configured to drive the transmission screw 240 to rotate, so as to push the protruding members 230 to move, and further drive the revolution frame 100 to rotate relative to the rotary base 220.
The principle of the transmission screw 240 driving the revolution frame 100 to rotate can refer to the movement principle of the screw-nut mechanism. By providing the protrusion 230 and the driving screw 240, the driving force of the revolution driving member 210 (motor) is transmitted to the sidewall of the revolution frame 100, thereby facilitating the disposition of the revolution driving member 210 without occupying a space in the middle of the revolution frame 100 where the evaporation source is disposed.
Referring to fig. 3, in some embodiments of the present invention, the revolution driving mechanism 200 further includes a drum 250 and a rotating ball 260, the drum 250 and the rotating ball 260 are both disposed between the revolution frame 100 and the rotation base 220, an upper side of the drum 250 abuts the revolution frame 100, a lower side of the drum 250 abuts the rotation base 220, an inner side of the drum 250 abuts the rotation base 220, and an outer side of the drum 250 abuts the revolution frame 100.
The rollers 250 and the rotating balls 260 are arranged to bear pressure, isolate and reduce friction resistance, so that the revolution frame 100 can rotate conveniently. The inner and outer parts are based on the first rotating shaft, the side close to the first rotating shaft is the inner part, and the side far away from the first rotating shaft is the outer part.
Referring to fig. 1 and 4, an evaporation apparatus according to an embodiment of the present invention includes the evaporation rack described above.
The evaporation device provided with the evaporation rack can be conveniently adjusted to the optimal evaporation angle, so that the evaporation coating effect is the best. The evaporation apparatus may further include an evaporation source and a base, the evaporation source and the rotary base 220 (the revolution driving mechanism 200) are disposed on the base, and the evaporation source is used to evaporate a material body so that the material body is condensed into a film on the substrate, that is, an evaporation film. It should be understood that the base is a basic carrier for installing and fixing the components of the device, is a conceptual object, and may be any object, such as an object formed by combining one or more components, such as some metal tables, stone tables, wooden tables, supports, support plates, support frames, bearing seats, mounting plates, reinforcing ribs, hooks, the ground, ceilings, and the like, and plays a role in fixing and supporting; the revolution shelf 100, the mounting frame 440, the rotary base 220, etc. are similar to the base, and are also carriers for mounting and fixing the components in the evaporation shelf, and thus can also be objects formed by combining one or more components.
The embodiments of the present invention have been described in detail with reference to the accompanying drawings, but the present invention is not limited to the above embodiments, and various changes can be made within the knowledge of those skilled in the art without departing from the gist of the present invention.
Claims (10)
1. An evaporation rack for placing substrates, comprising:
the revolution frame can rotate, a virtual rotation axis of the revolution frame is a first rotation axis, a rotation plane of the revolution frame is a first plane, and the first rotation axis is vertical to the first plane;
the revolution driving mechanism is in transmission connection with the revolution frame and is used for driving the revolution frame to rotate;
the substrate fixing assembly is used for fixing the substrate and provided with a fixing station, the fixing station is used for accommodating the substrate, and the plane where the fixing station is located is a second plane;
the angle adjusting mechanism is used for driving the substrate fixing assembly to rotate so as to adjust the angle of the second plane relative to the first plane, the virtual axis of rotation of the substrate fixing assembly is a second rotating axis, the second rotating axis is parallel to or coincided with the first plane, the second rotating axis is intersected with the first rotating axis, and when the angle adjusting mechanism drives the substrate fixing assembly to rotate, the distance between the second rotating axis and the first plane is unchanged.
2. The evaporation rack according to claim 1, wherein the substrate fixing assembly comprises a substrate mounting frame, an evacuation column and a fixing shifting piece, one end of the evacuation column is connected with the substrate mounting frame, the fixing shifting piece is rotatably connected to the other end of the evacuation column, the evacuation column is used for evacuating a space for mounting the substrate, the fixing shifting piece is used for limiting and fixing the substrate, the substrate mounting frame is arranged on the angle adjusting mechanism, and the substrate mounting frame is provided with the fixing station.
3. The evaporation rack according to claim 1, wherein the angle adjustment mechanism comprises an angle driving member, a rotating shaft, a rotating disk and a mounting frame, the mounting frame is disposed on the revolution rack, the rotating shaft is rotatably connected with the mounting frame, one end of the rotating shaft is fixedly connected with the center of the rotating disk, the other end of the rotating shaft is in transmission connection with the angle driving member, the substrate fixing component is fixed on the outer side of the rotating disk, and the virtual axis of rotation of the rotating disk is the second rotating axis.
4. The evaporation rack according to claim 1, wherein the angle adjustment mechanism comprises an angle driving member, a first gear, an arc-shaped bar and a mounting frame, the mounting frame is disposed on the revolution rack, both ends of the arc-shaped bar are slidably connected with the mounting frame, the substrate fixing component is connected with the arc-shaped bar, one side of the arc-shaped bar is provided with the arc-shaped rack, the first gear is engaged with the arc-shaped rack, the angle driving member is connected with the first gear in a transmission manner, the angle driving member is used for driving the first gear to rotate, so that the arc-shaped bar rotates relative to the mounting frame, and a virtual axis of rotation of the arc-shaped rack is the second rotation axis.
5. The evaporation rack of claim 4, wherein the angle adjustment mechanism further comprises two rotating rods, two bearings, a first bevel gear and a second bevel gear, the two first gears and the two arc-shaped bars are provided, one arc-shaped bar is connected to one side of the substrate fixing component, the other arc-shaped bar is connected to the other side of the substrate fixing component, one first gear is connected to one end of each rotating rod, the other end of each rotating rod is connected to the other first gear, one first gear is meshed with the arc-shaped rack on one arc-shaped bar, the other first gear is meshed with the arc-shaped rack on the other arc-shaped bar, the bearings are arranged on the mounting rack, the rotating rods are connected with the bearings, the first bevel gear is arranged in the middle of each rotating rod, the second bevel gear is meshed with the first bevel gear, the angle driving member is in transmission connection with the second bevel gear, and the angle driving member is used for driving the second bevel gear to rotate, so as to drive the first bevel gear, the rotating rods and the two first bevel gears to rotate together, thereby enabling the arc-shaped racks to rotate relatively to the mounting rack.
6. An evaporation rack as claimed in claim 4, wherein the angle adjustment mechanism further comprises a guide wheel, the guide wheel is rotatably connected to the mounting rack, and a wheel surface of the guide wheel is slidably connected with the arc-shaped strip.
7. The evaporation rack of claim 1, wherein the revolution driving mechanism comprises a revolution driving member and a rotary base, the revolution rack and the rotary base are rotatably connected, and the revolution driving member is used for driving the revolution rack to rotate.
8. The evaporation rack of claim 7, wherein the revolution driving mechanism further comprises a plurality of protruding members and a transmission screw rod, the protruding members are evenly distributed on the outer circumference of the revolution rack, the transmission screw rod is provided with a threaded recess, at least one protruding member is located in the threaded recess, the revolution driving member is in transmission connection with the transmission screw rod, and the revolution driving member is used for driving the transmission screw rod to rotate, so as to push the protruding members to move, and further drive the revolution rack to rotate relative to the rotary base.
9. An evaporation rack as claimed in claim 7, wherein the revolution driving mechanism further comprises a roller and a rotating ball, the roller and the rotating ball are both disposed between the revolution rack and the rotating base, the upper side of the roller abuts against the revolution rack, the lower side of the roller abuts against the rotating base, the inner side of the roller abuts against the rotating base, and the outer side of the roller abuts against the revolution rack.
10. An evaporation apparatus comprising an evaporation rack according to any of claims 1 to 9.
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202211072117.1A CN115449754B (en) | 2022-09-02 | 2022-09-02 | Evaporation frame and evaporation device |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202211072117.1A CN115449754B (en) | 2022-09-02 | 2022-09-02 | Evaporation frame and evaporation device |
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| CN115449754A true CN115449754A (en) | 2022-12-09 |
| CN115449754B CN115449754B (en) | 2024-08-02 |
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Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2013086139A (en) * | 2011-10-19 | 2013-05-13 | Daikin Industries Ltd | Angle adjusting device |
| CN108193187A (en) * | 2017-11-29 | 2018-06-22 | 北京中科优唯科技有限公司 | A kind of substrate frame of achievable automatic turning |
| TWI664305B (en) * | 2018-11-13 | 2019-07-01 | 聚昌科技股份有限公司 | Three dimension revolution and rotation deposition turntable structure |
| CN113265639A (en) * | 2021-04-16 | 2021-08-17 | 布勒莱宝光学设备（北京）有限公司 | Coating film rotating mechanism with automatic swing planetary disc |
-
2022
- 2022-09-02 CN CN202211072117.1A patent/CN115449754B/en active Active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2013086139A (en) * | 2011-10-19 | 2013-05-13 | Daikin Industries Ltd | Angle adjusting device |
| CN108193187A (en) * | 2017-11-29 | 2018-06-22 | 北京中科优唯科技有限公司 | A kind of substrate frame of achievable automatic turning |
| TWI664305B (en) * | 2018-11-13 | 2019-07-01 | 聚昌科技股份有限公司 | Three dimension revolution and rotation deposition turntable structure |
| CN113265639A (en) * | 2021-04-16 | 2021-08-17 | 布勒莱宝光学设备（北京）有限公司 | Coating film rotating mechanism with automatic swing planetary disc |
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| CN115449754B (en) | 2024-08-02 |
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