CN115436406A - 定量分析装置、方法以及程序和制造管理系统 - Google Patents

定量分析装置、方法以及程序和制造管理系统 Download PDF

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Publication number
CN115436406A
CN115436406A CN202210578178.9A CN202210578178A CN115436406A CN 115436406 A CN115436406 A CN 115436406A CN 202210578178 A CN202210578178 A CN 202210578178A CN 115436406 A CN115436406 A CN 115436406A
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sample
scale factor
test component
calibration curve
analysis
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English (en)
Chinese (zh)
Inventor
葛卷贵大
小泽哲也
笠利实希
姫田章宏
大渕敦司
绀谷贵之
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Rigaku Corp
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Rigaku Corp
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
    • G01N23/2055—Analysing diffraction patterns
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
    • G01N23/207—Diffractometry using detectors, e.g. using a probe in a central position and one or more displaceable detectors in circumferential positions
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06Q—INFORMATION AND COMMUNICATION TECHNOLOGY [ICT] SPECIALLY ADAPTED FOR ADMINISTRATIVE, COMMERCIAL, FINANCIAL, MANAGERIAL OR SUPERVISORY PURPOSES; SYSTEMS OR METHODS SPECIALLY ADAPTED FOR ADMINISTRATIVE, COMMERCIAL, FINANCIAL, MANAGERIAL OR SUPERVISORY PURPOSES, NOT OTHERWISE PROVIDED FOR
    • G06Q50/00—Information and communication technology [ICT] specially adapted for implementation of business processes of specific business sectors, e.g. utilities or tourism
    • G06Q50/04—Manufacturing
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00—Investigating materials by wave or particle radiation
    • G01N2223/05—Investigating materials by wave or particle radiation by diffraction, scatter or reflection
    • G01N2223/056—Investigating materials by wave or particle radiation by diffraction, scatter or reflection diffraction
    • G01N2223/0566—Investigating materials by wave or particle radiation by diffraction, scatter or reflection diffraction analysing diffraction pattern
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00—Investigating materials by wave or particle radiation
    • G01N2223/30—Accessories, mechanical or electrical features
    • G01N2223/306—Accessories, mechanical or electrical features computer control

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  • Chemical & Material Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Pathology (AREA)
  • Analytical Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Immunology (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Biochemistry (AREA)
  • Business, Economics & Management (AREA)
  • Engineering & Computer Science (AREA)
  • Economics (AREA)
  • Manufacturing & Machinery (AREA)
  • Human Resources & Organizations (AREA)
  • Marketing (AREA)
  • Primary Health Care (AREA)
  • Strategic Management (AREA)
  • Tourism & Hospitality (AREA)
  • General Business, Economics & Management (AREA)
  • Theoretical Computer Science (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
CN202210578178.9A 2021-06-04 2022-05-24 定量分析装置、方法以及程序和制造管理系统 Pending CN115436406A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2021-094383 2021-06-04
JP2021094383A JP7515885B2 (ja) 2021-06-04 2021-06-04 定量分析装置、方法およびプログラムならびに製造管理システム

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CN115436406A true CN115436406A (zh) 2022-12-06

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US (1) US12174131B2 (enExample)
JP (1) JP7515885B2 (enExample)
CN (1) CN115436406A (enExample)
DE (1) DE102022113192A1 (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7833174B2 (ja) * 2022-03-02 2026-03-19 株式会社リガク 混合物の回折パターン分析装置、方法、プログラム及び情報記憶媒体
JP2025032646A (ja) * 2023-08-28 2025-03-12 株式会社リガク 情報処理システム、情報処理方法及びプログラム

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4336591B2 (ja) 2004-01-30 2009-09-30 三菱マテリアル株式会社 セメントの品質予測方法およびセメントの製造管理システム
JP2008241442A (ja) 2007-03-27 2008-10-09 Sumitomo Osaka Cement Co Ltd セメントクリンカ中のｃ３ａおよびｃ４ａｆ含量の決定方法
JP5259199B2 (ja) 2008-01-15 2013-08-07 株式会社リガク Ｘ線回折定量分析方法、ｘ線回折定量分析装置、アスベストのｘ線回折定量分析方法及びアスベストのｘ線回折定量分析装置
JP5598926B2 (ja) 2011-09-26 2014-10-01 株式会社リガク Ｘ線回折測定データの解析方法
US9389191B2 (en) 2012-10-22 2016-07-12 Troxler Electronic Laboratories, Inc. Conveyor system and measuring device for determining water content of a construction material
JP6755068B2 (ja) 2015-03-03 2020-09-16 太平洋セメント株式会社 多成分系混合セメントの定量分析方法、および多成分系混合セメントの製造管理システム
JP7052249B2 (ja) 2017-08-08 2022-04-12 株式会社リコー 画像形成装置、液体を吐出する装置
CN111033246B (zh) 2017-08-09 2023-07-14 株式会社理学 晶相定量分析装置、晶相定量分析方法及晶相定量分析程序

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DE102022113192A1 (de) 2022-12-08
US20220390394A1 (en) 2022-12-08
US12174131B2 (en) 2024-12-24
JP2022186254A (ja) 2022-12-15
JP7515885B2 (ja) 2024-07-16

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