CN115312429A - Wet process liquid storage tank and wet process device - Google Patents

Wet process liquid storage tank and wet process device Download PDF

Info

Publication number
CN115312429A
CN115312429A CN202210962621.2A CN202210962621A CN115312429A CN 115312429 A CN115312429 A CN 115312429A CN 202210962621 A CN202210962621 A CN 202210962621A CN 115312429 A CN115312429 A CN 115312429A
Authority
CN
China
Prior art keywords
liquid
tank
baffle
medicine
pipe
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN202210962621.2A
Other languages
Chinese (zh)
Inventor
郭裕隆
廖仁瑞
付恒野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Herman Semiconductor Technology Shenzhen Co ltd
Original Assignee
Herman Semiconductor Technology Shenzhen Co ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Herman Semiconductor Technology Shenzhen Co ltd filed Critical Herman Semiconductor Technology Shenzhen Co ltd
Priority to CN202210962621.2A priority Critical patent/CN115312429A/en
Publication of CN115312429A publication Critical patent/CN115312429A/en
Pending legal-status Critical Current

Links

Images

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67017Apparatus for fluid treatment
    • H01L21/67023Apparatus for fluid treatment for general liquid treatment, e.g. etching followed by cleaning
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67017Apparatus for fluid treatment
    • H01L21/67028Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67051Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67017Apparatus for fluid treatment
    • H01L21/67063Apparatus for fluid treatment for etching
    • H01L21/67075Apparatus for fluid treatment for etching for wet etching
    • H01L21/6708Apparatus for fluid treatment for etching for wet etching using mainly spraying means, e.g. nozzles

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Weting (AREA)

Abstract

The embodiment of the invention provides a wet process liquid storage tank and a wet process device, comprising: the liquid tank body comprises a tank bottom, a tank wall and a tank top, the tank bottom, the tank wall and the tank top are surrounded to form a liquid tank cavity, and the liquid tank cavity is used for containing liquid medicine; the medicine supply pipe is communicated with the groove wall or the groove bottom and is used for guiding out the liquid medicine in the liquid groove cavity; the return pipe is communicated with the tank top and is used for receiving the liquid medicine returned after the wet process; the liquid storage tank also comprises an exhaust pipe which is used for balancing the air pressure in the liquid tank cavity; the liquid tank cavity is internally provided with a bubble blocking piece which is arranged between the medicine supply pipe and the return pipe and is used for preventing bubbles from being transmitted to the vicinity of the medicine supply pipe from the vicinity of the return pipe; further, the bubbles entering the wet working chamber along with the liquid medicine are prevented from attaching to the surface of the display substrate, causing interference to the process uniformity and influencing the reliability of the performance of the display substrate.

Description

Liquid storage tank for wet process and wet process device
[ technical field ] A
The invention relates to the technical field of display, in particular to a wet process liquid storage tank and a wet process device.
[ background ] A method for producing a semiconductor device
With the development of display technology, in the manufacturing process of glass substrate processing technology (including but not limited to processing technologies such as TFT-LCD, micro LED, mini LED, LTPS, IGZO and the like), in a wet process processing section, spraying reaction liquid medicine on the surface of a glass substrate, and enabling the reaction liquid medicine to fully contact with the film surface of the glass substrate to carry out wet process reaction; however, if bubbles adhere to the surface of the glass substrate between the glass substrate and the liquid level, the area covered by the bubbles will not be able to fully contact and react with the reaction solution, so that the area covered by the bubbles and the area not covered by the bubbles will form process difference defects, which include but are not limited to film residue, smudging, etc., and the process difference defects will further cause abnormal failure of the glass substrate process.
The formation of bubbles often occurs when the reaction solution flows back to the reservoir through the circulation line system. As shown in fig. 1 and fig. 2, fig. 1 is a schematic perspective view of a reservoir in the prior art; FIG. 2 is a front view of the reservoir shown in FIG. 1; when the backflow liquid medicine 80 'flows back to the liquid medicine accommodating groove 10' through the backflow pipe 20', the backflow liquid medicine 80' impacts the liquid surface in the liquid medicine accommodating groove 10 'to generate bubbles 90' due to gravity flow, and when the circulation pipe continuously works, the reaction liquid medicine 80 'flows along the direction from the backflow pipe 20' to the liquid outlet pipe 40 'and drives the bubbles 90' accommodated in the reaction liquid medicine 80 'to flow together, so that the bubbles 90' are brought into the liquid outlet pipe line and further brought to the surface of the glass substrate.
[ summary of the invention ]
In view of this, the embodiment of the invention provides a backlight substrate, a display module and a display device.
In a first aspect, an embodiment of the present invention provides a wet process liquid storage tank, including:
the liquid tank body comprises a tank bottom, a tank wall and a tank top, the tank bottom, the tank wall and the tank top are surrounded to form a liquid tank cavity, and the liquid tank cavity is used for containing liquid medicine;
the medicine supply pipe is communicated with the groove wall or the groove bottom and is used for guiding out the liquid medicine in the liquid groove cavity;
the return pipe is communicated with the tank top and is used for receiving the liquid medicine returned after the wet process;
the liquid storage tank also comprises an exhaust pipe communicated with the liquid tank body and used for balancing the air pressure in the liquid tank cavity;
the liquid tank cavity is internally provided with a bubble barrier which is arranged between the medicine supply pipe and the return pipe and used for preventing bubbles from being transmitted to the vicinity of the medicine supply pipe from the vicinity of the return pipe.
Further optionally, the bubble barrier comprises a first baffle and a second baffle which are arranged at intervals along a first direction, the first baffle is positioned on one side of the second baffle, which is far away from the backflow hole, and the first direction is parallel to the bottom of the tank; the first top wall of the first baffle plate is attached to the top of the groove, the second bottom wall of the second baffle plate is attached to the bottom of the groove, and the first side wall of the first baffle plate and the second side wall of the second baffle plate are respectively attached to the groove walls; a gap exists between the second bottom wall of the first baffle and the bottom of the tank, and a gap exists between the second top wall of the second baffle and the top of the tank.
Further optionally, the height of the second top wall of the second baffle to the trough bottom is greater than the height of the first bottom wall of the first baffle to the trough bottom.
Further optionally, the height from the second top wall of the second baffle to the trough bottom is greater than the height from the bottom end of the return pipe to the trough bottom and less than the height from the top end of the exhaust pipe to the trough bottom.
Further optionally, a cross-sectional area of the baffle gap between the first baffle and the second baffle in the first direction is larger than a cross-sectional area of the return pipe.
Further alternatively, the liquid medicine flow rate of the baffle gap between the first baffle and the second baffle per unit time is larger than the liquid medicine flow rate of the return pipe.
Further optionally, the first baffle includes a plurality of vent holes, the vent holes being located adjacent the first top wall.
Further optionally, the vent is a recess formed by the first top wall being downwardly concave.
In a second aspect, an embodiment of the present invention provides a wet processing apparatus, including any one of the liquid storage tank and the wet processing chamber, where the liquid storage tank and the wet processing chamber are communicated with a self-refluxing system through a chemical supply system, where the chemical supply system includes a liquid supply pipe, and the self-refluxing system includes a reflux pipe.
Further optionally, the drug supply system includes a liquid pump, and the liquid pump is communicated with the liquid supply pipe and drives the drug solution in the liquid storage tank to be transferred to the wet-making working chamber through the liquid supply pipe.
Further optionally, the wet-processing chamber comprises a spraying device and an object stage, the object stage is used for bearing the display substrate, and the spraying device is used for spraying the liquid medicine transmitted through the liquid supply pipe onto the display substrate.
In the embodiment of the invention, the bubble blocking piece is additionally arranged in the liquid storage tank and is arranged between the medicine supply pipe and the return pipe; when the liquid medicine after the wet process is required to flow back to the liquid storage tank through the return pipe, the bubble blocking piece can weaken or cut off the phenomenon that bubbles generated by impacting the liquid level in the liquid storage tank under the action of the self gravity of the liquid medicine float to the position near the medicine supply pipe, so that the bubbles are prevented from being carried when the liquid medicine is pumped and recycled through the medicine supply pipe, the defect of process difference between a bubble coated area and an uncoated area generated by the fact that the bubbles are attached to the surface of the display substrate to be subjected to the wet process is eliminated or weakened, the display substrate process failure abnormity caused by the defect of the process difference is avoided, and the reliability of the wet process technology of the display substrate is improved.
[ description of the drawings ]
In order to more clearly illustrate the technical solutions of the embodiments of the present invention, the drawings needed to be used in the embodiments will be briefly described below, and it is obvious that the drawings in the following description are only some embodiments of the present invention, and it is obvious for those skilled in the art to obtain other drawings based on these drawings without creative efforts.
FIG. 1 is a schematic perspective view of a reservoir in the prior art;
FIG. 2 is a front view of the reservoir shown in FIG. 1;
fig. 3 is a schematic perspective view of a liquid storage tank according to an embodiment of the present invention;
FIG. 4 is a front view of the reservoir shown in FIG. 3;
fig. 5 is a schematic perspective view of another liquid storage tank provided in an embodiment of the present invention;
fig. 6 is a schematic perspective view of another liquid storage tank according to an embodiment of the present invention;
FIG. 7 is a side view of the first baffle in the sump of FIG. 6;
FIG. 8 is a front view of the first baffle in the sump of FIG. 6;
fig. 9 is a schematic perspective view of another liquid storage tank according to an embodiment of the present invention;
fig. 10 is a schematic view of a wet processing apparatus according to an embodiment of the invention.
[ detailed description ] A
For better understanding of the technical solutions of the present invention, the following detailed descriptions of the embodiments of the present invention are provided with reference to the accompanying drawings.
It should be understood that the described embodiments are only some embodiments of the invention, and not all embodiments. All other embodiments, which can be obtained by a person skilled in the art without making any creative effort based on the embodiments in the present invention, belong to the protection scope of the present invention.
The terminology used in the embodiments of the invention is for the purpose of describing particular embodiments only and is not intended to be limiting of the invention. As used in the examples of the present invention and the appended claims, the singular forms "a," "an," and "the" are intended to include the plural forms as well, unless the context clearly indicates otherwise.
It should be understood that the term "and/or" as used herein is merely a relationship that describes an associated object, meaning that three relationships may exist, e.g., a and/or B, may represent: a exists alone, A and B exist simultaneously, and B exists alone. In addition, the character "/" herein generally indicates that the former and latter related objects are in an "or" relationship.
In the description herein, it is to be understood that the terms "substantially", "approximately", "about", "substantially", and the like in the claims and the examples are intended to be inclusive and mean that there may be substantial acceptance, rather than a requirement for an exact value, within reasonable process operation or tolerance.
It should be understood that although the terms first, second, third, etc. may be used to describe directional lines, etc. in embodiments of the present invention, these directions should not be limited to these terms. These terms are only used to distinguish one direction from another. For example, a first direction may also be referred to as a second direction, and similarly, a second direction may also be referred to as a first direction, without departing from the scope of embodiments of the present invention.
The embodiment of the invention provides a liquid storage tank for a display substrate wet process, which is used for solving the problem that bubbles generated by excitation when liquid medicine flows back into the liquid storage tank interfere the surface of a display substrate in the wet process with the process uniformity, and improving the reliability of the display substrate process.
Fig. 3 is a schematic perspective view of a liquid storage tank according to an embodiment of the present invention; fig. 4 is a front view of the reservoir 100 shown in fig. 3; as shown in fig. 3 and 4, the liquid storage tank 100 includes a liquid tank body 10, the liquid tank body 10 includes a tank bottom 103, a tank wall 102 and a tank top 101, the tank bottom 103, the tank wall 102 and the tank top 101 are enclosed to form a liquid tank cavity, and the liquid tank cavity is used for accommodating the liquid medicine 80; the medicine supply pipe 40 is communicated with the tank wall 102 or the tank bottom 103 and is used for leading out the medicine liquid 80 in the tank cavity; the return pipe 20 is communicated with the tank top 101 and is used for receiving the liquid medicine 80 which flows back after the wet process; the reservoir 100 further comprises an exhaust pipe 30 for balancing the air pressure in the liquid tank cavity; the liquid tank cavity is provided with a bubble 90 blocking member 11/12, and the bubble 90 blocking member is arranged between the medicine supply pipe 40 and the return pipe 20 and used for blocking the bubbles 90 from being transmitted to the vicinity of the medicine supply pipe 40 from the vicinity of the return pipe 20.
Specifically, with continuing reference to fig. 3 and 4, the liquid storage tank 100 is a three-dimensional hollow structure, and the three-dimensional shape thereof may be a cuboid, a cube, a cylinder, a cone, or the like; in the embodiment of the present application, a rectangular parallelepiped reservoir 100 is described as an example. The liquid storage tank 100 comprises a tank top 101, a tank wall 102, a tank bottom 103 and a liquid tank cavity formed by enclosing the tank top 101, the tank wall 102 and the tank bottom 103, wherein the liquid tank cavity can be used for storing various liquid medicines 80 in wet processes; further, the wet process reservoir 100 may be used in various wet process sections of various display substrates, display panels, display modules or display devices, including but not limited to glass substrates, liquid crystal display panels, liquid crystal display devices, organic light emitting display panels, array substrates, color film substrates, organic light emitting display devices, micro LED display panels and display devices, mini LED light emitting substrates; the driving types in the display substrate include, but are not limited to, LTPS (low temperature polysilicon) display substrate, IGTO (indium gallium tin oxide) display substrate, IGZO (indium gallium zinc oxide) display substrate, and the like; the exemplary teachings of the embodiments of the present invention do not limit the absolute scope of the wet processing reservoir 100. For the convenience of the following description, the embodiments of the present invention will be described with reference to a wet process for manufacturing a glass substrate.
The liquid storage tank 100 comprises a medicine supply pipe 40 communicated with the liquid tank cavity, the medicine supply pipe 40 is used for guiding out the medicine liquid 80 in the liquid tank cavity, one end of the medicine supply pipe 40 can be communicated with the tank wall 102 or the tank bottom 103, as shown in fig. 3, the medicine supply pipe 40 is communicated with the low point of the tank wall 102 close to the tank bottom 103, and in order to lead out the medicine liquid 80 in the liquid tank cavity more efficiently and more smoothly, the medicine supply pipe 40 is preferably arranged near the tank bottom 103 of the liquid storage tank 100. In order to improve the tightness of the communication between the medicine supply pipe 40 and the liquid tank cavity and avoid the seepage of the liquid medicine 80 through the joint, a sealing piece can be arranged at the joint of the medicine supply pipe 40 and the liquid tank cavity.
Further, the other end of the chemical supply tube 40 can be in communication with an external liquid pump 50, so that the liquid chemical 80 in the liquid tank cavity can be promoted to reach the wet process working chamber more easily, the flow rate of the liquid chemical 80 is increased, and the working efficiency of the wet process is improved.
Referring to fig. 3, the liquid storage tank 100 includes a return pipe 20, one end of the return pipe 20 passes through the tank top 101 of the liquid tank 10 and is inserted below the liquid level of the liquid medicine 80 inside the liquid tank 10, the other end of the return pipe 20 is communicated with an external wet working chamber, the return pipe 20 is used for returning the liquid medicine 80 after the wet process is completed inside the wet working chamber to the liquid storage tank 100 for recycling, and the return pipe 20 is communicated with the tank top 101 of the liquid tank 10, so that the liquid medicine 80 can smoothly return to the liquid tank 10 under the action of its own gravity. The liquid storage tank 100 also comprises an exhaust pipe 30, one end 301 of the exhaust pipe 30 extends into the cavity of the liquid storage tank 100 and is higher than the upper liquid level of the liquid medicine 80 in the liquid storage tank 100, the other end 302 of the exhaust pipe 30 is communicated with the external atmospheric pressure, and the exhaust pipe 30 is used for balancing the air pressure inside and outside the cavity of the liquid storage tank; the liquid tank cavity is internally provided with a bubble 90 blocking member 11/12, and the bubble 90 blocking member is arranged between the medicine supply pipe 40 and the return pipe 20 and used for blocking bubbles 90 from being transmitted to the vicinity of the medicine supply pipe 40 from the vicinity of the return pipe 20; in addition, another important function of the exhaust pipe 30 is to discharge the overload liquid medicine 80 when the liquid medicine 80 in the liquid tank cavity is too high to exceed the preset height of the top end 301 of the exhaust pipe 30, so as to adjust the liquid level of the liquid medicine 80 in the liquid tank cavity.
The nozzle of the medicine supply pipe 40 is arranged on one side of the exhaust pipe 30 far away from the return pipe 20, when the liquid medicine 80 flows back to the liquid storage tank 100 under the action of self gravity, the bubble 90 blocking piece can weaken or block the bubbles 90 generated by impacting the liquid level in the liquid storage tank 100 under the action of self gravity to float to the position near the medicine supply pipe 40, further the bubbles 90 are prevented from being carried when the liquid medicine 80 is pumped and recycled through the medicine supply pipe 40, the defect of process difference between a bubble 90 coated area and an uncoated area generated by the fact that the bubbles 90 are attached to the surface of the display substrate to be subjected to the wet process is eliminated or weakened, further the display substrate process failure abnormality caused by the process difference defect is avoided, and the reliability of the display substrate wet process technology is improved.
It should be noted that, in the drawings provided in the embodiments of the present application, in order to schematically represent the internal structural features of the reservoir, the structures of the film layers such as the liquid medicine and the tank body are made to be perspective, and it should be understood by those skilled in the art that, in an actual reservoir device, for example, the second baffle 12 is completely immersed in the liquid medicine 80, so that the structure of the second baffle 12 cannot be seen from the side structure.
Alternatively, the bubble barrier 11/12 comprises a first baffle 11 and a second baffle 12 arranged at an interval along a first direction, the second baffle 12 is positioned at one side of the first baffle 11 far away from the return pipe 20, and the first direction is parallel to the tank bottom 103; the first top wall 111 of the first baffle plate 11 is attached to the inner wall of the groove top 101, the second bottom wall 122 of the second baffle plate 12 is attached to the inner wall of the groove bottom 103, and the first side wall (not shown) of the first baffle plate 11 and the second side wall (not shown) of the second baffle plate 12 are respectively attached to the inner walls of the groove walls 102; the first bottom wall 112 of the first baffle 11 is not in contact with the inner wall of the tank bottom 103, and the second top wall 121 of the second baffle 12 is not in contact with the inner wall of the tank top 101.
Specifically, with continued reference to fig. 3 and 4, the barrier for bubbles 90 includes a first baffle 11 and a second baffle 12 spaced apart along a first direction, the first direction being parallel to the bottom 103 of the tank; the first baffle plate 11 and the second baffle plate 12 are disposed in parallel between the exhaust pipe 30 and the return pipe 20. The second baffle plate 12 is located on the side of the first baffle plate 11 away from the exhaust pipe 30, i.e., the first baffle plate 11 is closer to the supply pipe orifice than the second baffle plate 12. The first top wall 111 of the first baffle 11 is attached to the inner wall of the tank top 101 of the liquid tank 10, and the side wall of the first baffle 11 is attached to the inner wall of the tank wall 102 of the liquid tank 10; in other words, except that the first bottom wall 112 of the first baffle 11 close to the bottom of the liquid tank body 10 is not contacted with the inner wall of the tank bottom 103, the rest sides of the first baffle are attached to the inside of the liquid tank cavity, and the liquid medicine 80 can only flow through the gap between the first bottom wall 112 and the inner wall of the tank bottom 103; the second top wall 121 of the second baffle 12 is not in contact with the inner wall of the tank top 101 of the liquid tank body 10, the side wall of the second baffle 12 is attached to the inner wall of the tank wall 102 of the liquid tank body 10, and the second bottom wall 122 of the second baffle 12 is attached to the inner wall of the tank bottom 103; in other words, the second baffle 12 is attached to the inside of the tank body 10 except that the second ceiling wall 121 close to the tank top 101 of the tank body 10 is not in contact with the inner wall of the tank top 101, and the chemical solution 80 can only flow through the gap between the second ceiling wall 121 and the inner wall of the tank top 101. Liquid in the liquid storage tank 100 is diffused and distributed at two sides of the baffle plate of the first baffle plate 11 in the liquid storage tank 100 from the bottom of the first baffle plate 11 due to the principle of communicating pipes, when the backflow liquid medicine 80 is discharged to the liquid storage tank 100 under the self-gravity through the return pipe 20, and when the backflow liquid medicine impacts with the liquid level of the liquid medicine 80 to generate bubbles 90, the bubbles 90 not only float upwards under the self-buoyancy action, but also are blocked by the second baffle plate 12, therefore, the bubbles 90 diffuse from the upper part of the second baffle plate 12 towards the first baffle plate 11 and continue to move towards the tank top 101 under the self-buoyancy action, therefore, the bubbles 90 cannot pass through the bottom of the first baffle plate 11, namely, the bubbles 90 are reduced and even completely blocked from diffusing to the vicinity of the pipe orifice of the medicine supply pipe 40 at the other side of the first baffle plate 11, so that the bubbles 90 cannot circulate back to the surface of the glass substrate to be processed by the wet method when the medicine supply pipe 40 performs liquid extraction, and the bubbles 90 can not attach to the surface of the display substrate in the wet method to cause interference on the uniformity and influence the reliability of the performance of the display substrate.
Alternatively, as shown in fig. 3 and 4, the height of the second top wall 121 of the second baffle 12 to the groove bottom 103 is greater than the height of the first bottom wall 112 of the first baffle 11 to the groove bottom 103.
Specifically, with continued reference to fig. 3 and 4, the distance between the second top wall 121 at the uppermost end of the second baffle 12 and the inner surface of the groove bottom 103 is C, and the distance between the first bottom wall 112 at the lowermost end of the first baffle 11 and the inner surface of the groove bottom 103 is a, where C > a. In other words, the height of the gap between the first baffle 11 and the groove bottom 103 is smaller than the height of the second baffle 12, or the first baffle 11 and the second baffle 12 are at least partially overlapped in the direction parallel to the groove bottom 103, so as to avoid the bubbles 90 from being driven by the liquid flow to pass through the lowest end of the first baffle 11 in the direction parallel to the liquid flow after the bubbles 90 pass through the upper end of the second baffle 12, and further reach the vicinity of the nozzle of the drug supply tube 40, and further improve the blocking effect of the bubbles 90 between the blocking of the bubbles 90.
Alternatively, as shown in fig. 4, the height of the second top wall 121 of the second baffle 12 from the trough bottom 103 is greater than the height from the bottom end 202 of the return pipe 20 to the trough bottom 103 and less than the height from the top 301 of the exhaust pipe 30 to the trough bottom 103.
Specifically, with continued reference to fig. 4, the distance between the second top wall 121 located at the uppermost end of the second baffle 12 and the inner surface of the trough bottom 103 is C, the height between the bottom end 202 of the return pipe 20 close to the trough bottom 103 and the trough bottom 103 is D, and the height between the top 301 of the exhaust pipe 30 close to the trough top 101 and the trough bottom 103 is E, where C > D and C < E; by setting the distance C between the second top wall 121 and the inner surface of the tank bottom 103 to be greater than the height D between the bottom end 202 of the return tube 20 and the tank bottom 103, the bubbles 90 generated by the backflow liquid medicine 80 impacting the surface of the liquid medicine 80 can be prevented from directly floating horizontally to move across the second top wall 121 of the second baffle plate 12 toward the first bottom wall 112 of the first baffle plate 11; it functions to block the air bubbles 90 while guiding the air bubbles 90 to float toward the tank top 101 in the height direction of the second barrier 12. The distance C between the second top wall 121 and the inner surface of the tank bottom 103 is set to be smaller than the height E between the top end 301 of the exhaust pipe 30 and the tank bottom 103, and since the exhaust pipe 30 is used for exhausting the gas in the upper gas layer inside the reservoir 100, that is, the top end 301 of the exhaust pipe 30 usually extends out of the surface of the liquid medicine 80 in the reservoir 100, but the second baffle 12 usually blocks the horizontal movement of the bubbles 90, but cannot completely block the flow of the liquid medicine 80 inside the reservoir 100, therefore, the second top wall 121 of the second baffle 12 is usually located below the surface of the liquid medicine 80 in the reservoir 100. Setting C > D, and C < E; the function of blocking the horizontal movement of the bubbles 90 can be realized, the normal flow of the liquid medicine 80 in the liquid storage tank 100 can be maintained, and meanwhile, the bubbles 90 are led out by the exhaust pipe 30 after being conveyed out of the liquid medicine 80.
Alternatively, as shown in fig. 3 and 4, the cross-sectional area of the baffle gap between the first baffle 11 and the second baffle 12 is larger than the cross-sectional area of the return pipe 20 in the first direction.
Specifically, with reference to fig. 3 and fig. 4, the distance between the first baffle 11 and the second baffle 12 in the direction parallel to the bottom 103 of the tank is B, and as can be seen from the above analysis, when the drug supply tube 40 supplies the drug solution 80 by the external driving system, the liquid in the reservoir 100 is driven to flow, and the flow direction of the drug solution 80 is from the vicinity of the return tube 20 to the vicinity of the second top wall 121 of the second baffle 12, then through the gap between the first baffle 11 and the second baffle 12, and finally to the vicinity of the drug supply tube 40 by turning over the first bottom wall 112 of the first baffle 11. As known to those skilled in the art, the flow rate of the liquid in the channel is proportional to both the cross-sectional area of the channel and the flow rate of the liquid, Q = Sv (S is the cross-sectional area, and v is the flow rate of the liquid), and when the circulation rate of the liquid medicine 80 in the wet working system is constant, the flow rate of the liquid in the channel is closely related to the cross-sectional area of the channel. The cross sectional area of the baffle gap between the first baffle 11 and the second baffle 12 is set to be larger than the cross sectional area of the return pipe 20, so that the flow of the liquid medicine 80 in the liquid storage tank 100 in unit time is not smaller than the flow of the return pipe 20 in unit time due to the blockage of the baffles, on one hand, the normal supply of the wet liquid medicine 80 in the wet working chamber is ensured, and on the other hand, the phenomenon that the return flow in unit time is larger than the medicine supply amount is avoided, so that the liquid in the liquid storage tank 100 gradually exceeds the self capacity limit and overflows the liquid storage tank 100; ensuring the normal operation of the wet process circulation.
Alternatively, the flow rate of the medical fluid 80 per unit time in the baffle gap between the first baffle 11 and the second baffle 12 is larger than the flow rate of the medical fluid 80 in the return pipe 20. As described above, the flow direction of the medical fluid 80 goes from the vicinity of the return tube 20 over the second top wall 121 of the second baffle 12, then passes through the gap between the first baffle 11 and the second baffle 12, and finally goes over the first bottom wall 112 of the first baffle 11 to the vicinity of the drug delivery tube 40. The flow rate of the liquid medicine 80 in the baffle clearance between the first baffle 11 and the second baffle 12 is set to be greater than the flow rate of the liquid medicine 80 in the return pipe 20, so that the flow rate of the liquid medicine 80 in the liquid storage tank 100 in unit time is not smaller than the flow rate of the return pipe 20 in unit time due to the blocking of the baffles, on one hand, the normal supply of the wet liquid medicine 80 in the wet working chamber is ensured, on the other hand, the situation that the flow rate of the liquid medicine in unit time is greater than the medicine supply amount is avoided, and the liquid in the liquid storage tank 100 gradually exceeds the capacity limit of the liquid storage tank 100 and overflows the liquid storage tank 100; ensuring the normal operation of the wet process circulation.
Optionally, fig. 5 is a schematic perspective view of another liquid storage tank provided in an embodiment of the present invention; as shown in fig. 5, the first baffle plate 11 includes a plurality of vent holes 110, and the vent holes 110 are located near the first top wall 111.
Specifically, as shown in fig. 5, a plurality of vent holes 110 are provided in a region of the first baffle plate 11 near the tank top 101, and the number of vent holes 110 is not particularly limited in the embodiment of the present application. The reservoir 100 serves as a closed system, and a gas layer is formed above the surface of the chemical solution 80, and a part of the gas is derived from gas brought from the outside through each pipe, and the other part of the gas is derived from gas volatilization of the chemical solution 80 itself. The bubbles 90 in the liquid medicine 80 will also enter the upper gas layer in the liquid tank 10 after passing through the liquid medicine 80, and the exhaust pipe 30 can exhaust the gas accumulated in the upper gas layer in the liquid tank 10, so as to maintain the balance of the internal and external air pressures in the liquid tank 10, so that the liquid medicine 80 can normally circulate in the pipeline. Except stretching into the inside first diapire of liquid medicine 80 and leaving the clearance in cistern body 10, all laminate with cistern body 10's inside around first baffle 11, first baffle 11 is in fact cut apart into two parts that two parts do not communicate each other with the air bed on cistern body 10 upper portion like this, normal inside and outside pressure changing can be carried out by one side of blast pipe 30 in the setting, but the atmospheric pressure that first baffle 11 is close to the upper portion gas layer of back flow 20 one side will be higher and higher, and then be unfavorable for the smooth backward flow of liquid medicine 80 in the back flow 20. By providing the vent hole 110 at the upper portion of the first baffle plate 11, the gas layers at both sides of the first baffle plate 11 can flow normally, which is beneficial to maintaining the air pressure in each position inside the liquid tank 10 to be balanced.
Optionally, fig. 6 is a schematic perspective view of another liquid storage tank provided in an embodiment of the present invention; fig. 7 is a side view of the first baffle 11 in the sump 100 of fig. 6; fig. 8 is a front view of the first baffle 11 in the sump 100 shown in fig. 6; as shown in fig. 6 to 8, the vent hole 110 is a groove formed by the first top wall being depressed downward.
Specifically, as shown in fig. 6 to 8, the first top wall 111 of the first baffle 11 is a non-planar structure, and includes a plurality of grooves recessed from the first top wall 111 toward the body portion of the first baffle 11, and the shape of the grooves may be an arc, an inverted trapezoid, or the like, and the specific shape of the grooves is not limited in this embodiment. The recess may be integrally formed with the body of the first baffle 11. When the first top wall 111 is attached to the tank top 101 of the liquid tank 10, a vent hole 110 for air circulation is formed between the concave groove and the tank top 101. Through set up the recess in the upper portion of first baffle 11, can realize that the gas layer of first baffle 11 both sides normally flows, be favorable to keeping the inside atmospheric pressure in every place of liquid cell body 10 balanced.
Optionally, fig. 9 is a schematic perspective view of another liquid storage tank according to an embodiment of the present invention; as shown in fig. 9, the reservoir 100 further includes an infusion tube 1 and a drainage tube 2 communicated therewith; the infusion tube 1 is used for conveying the liquid medicine 80 to be used for wet preparation from a factory service end to the liquid tank cavity and is a supply pipeline required by the original liquid medicine; specifically, the infusion tube 1 can be in communication with the slot wall 102 as shown in fig. 9, but can be in communication with the slot top 101 in other embodiments, and those skilled in the art will appreciate that the adjustment can be made in practical use according to the needs. The liquid discharge pipe 2 is used for emptying the liquid medicine 80 in the liquid tank cavity; when the reaction is stopped or the category of the wet liquid medicine needs to be changed, the liquid medicine 80 remained in the liquid tank cavity is emptied through the liquid discharge pipe 2; specifically, the bleeder 1 may be in communication with the tank bottom 103 as shown in fig. 9, but may be in communication with the tank wall 102 in other embodiments; however, to more completely evacuate the medical fluid 80, the drug discharge tube is preferably in communication with the tank bottom 103, according to the principle of gravity. Further alternatively, please continue to refer to fig. 9, the liquid discharge pipe 2 includes at least two branch pipes 2010, and the branch pipes 2010 are respectively communicated with the liquid tank cavities on both sides of the bubble barrier 11/12; more specifically, the branch pipes 2010 are respectively communicated with the liquid tank cavities on two sides of the second baffle 12, so as to avoid the blocking of the liquid on two sides by the bubble blocking compartments 11/12, and further to ensure that the liquid medicine 80 in the partial area is not completely discharged.
Fig. 9 is a schematic diagram of a wet processing apparatus 100 according to an embodiment of the present invention; as shown in fig. 9, the wet processing apparatus 100 comprises a liquid storage tank 100 and a wet processing chamber 61 as described above, wherein the liquid storage tank 100 and the wet processing chamber 61 are communicated with each other through a drug supply system and a self-return system, the drug supply system comprises a drug supply pipe 40, and the self-return system comprises a return pipe 20.
Specifically, as shown in fig. 10, the wet processing apparatus includes a liquid storage tank 100 and a wet processing chamber, the wet processing chamber is located above the liquid storage tank 100, the liquid storage tank 100 is communicated with the wet processing chamber through a chemical supply system and a self-refluxing system, and the liquid chemical 80 is circulated inside the liquid storage tank 100 and the wet processing chamber. The medicine supply system transmits the liquid medicine 80 in the liquid storage tank 100 upwards to the wet working chamber, and comprises a medicine supply pipe 40; the self-refluxing system reflows the liquid medicine 80 after the wet process from the wet working chamber to the interior of the liquid storage tank 100 for recycling.
Further, as shown in fig. 10, the drug supply system includes a first drug supply tube 40, a second drug supply tube 60 and a liquid pump 50, the first drug supply tube 40 is connected between the liquid pump 50 and the liquid storage tank 100, the second drug supply tube 60 is connected between the liquid pump 50 and the wet working chamber, and the liquid drug 80 is driven by the liquid pump 50 to be transported from the liquid storage tank 100 to the wet working chamber through the first drug supply tube 40 and the second drug supply tube 60. The liquid pump 50 can control the flow rate of the liquid 80, control the delivery volume of the liquid 80, and provide the delivery power.
Further, as shown in fig. 10, the wet processing chamber 61 includes a spraying device 62 and a stage 64, the stage 64 is used for carrying the display substrate 63, and the spraying device 62 is used for spraying the liquid medicine 80 transmitted through the medicine supply tube 40/60 onto the display substrate 63.
Specifically, with continuing reference to fig. 10, the stage 64 is disposed inside the wet chamber 61, the stage 64 is used for carrying the glass substrate 63 to be wet, the stage 64 may be a plurality of transmission rollers 641 disposed in parallel, and the rollers 641 may not only carry the glass substrate 63, but also transmit the wet glass substrate 63 away from the wet chamber 61. The wet working chamber 61 further comprises a spraying device 62, the spraying device 62 is communicated with the chemical supply pipe 40, the chemical liquid 80 is sprayed onto the glass substrate 63 through the spraying heads of the spraying device 62 after being transmitted to the wet working chamber through the chemical supply pipe 40, the specific number of the spraying heads in the spraying device is not limited, but a plurality of spraying heads can be uniformly distributed for uniform spraying effect.
In the embodiment of the invention, the bubble blocking piece is additionally arranged in the liquid storage tank and is arranged between the medicine supply pipe and the return pipe; when the liquid medicine after being wetted needs to flow back to the liquid storage tank through the return pipe, the bubble blocking piece can weaken or block bubbles generated by impacting the liquid level in the liquid storage tank under the action of self gravity to float to the position near the medicine supply pipe, so that the liquid medicine is prevented from being entrained by the bubbles when being pumped and recycled through the medicine supply pipe, the defect of process difference between a bubble coated area and an uncoated area generated by the fact that the bubbles are attached to the surface of the display substrate to be subjected to the wet process is eliminated or weakened, the defect of process difference is further prevented from causing abnormal display substrate process failure, and the reliability of the display substrate wetting process is improved.
The present invention is not limited to the above preferred embodiments, and any modifications, equivalent substitutions, improvements, etc. within the spirit and principle of the present invention should be included in the scope of the present invention.

Claims (12)

1. A wet processing reservoir, comprising:
the liquid tank comprises a tank bottom, a tank wall and a tank top, wherein a liquid tank cavity is formed by surrounding the tank bottom, the tank wall and the tank top and is used for containing liquid medicine;
the medicine supply pipe is communicated with the tank wall or the tank bottom and is used for guiding out the liquid medicine in the liquid tank cavity;
the return pipe is communicated with the tank top and is used for receiving the liquid medicine which flows back after the wet process;
the liquid storage tank also comprises an exhaust pipe communicated with the liquid tank body, and the exhaust pipe is used for balancing the air pressure in the liquid tank cavity;
the liquid tank cavity is internally provided with a bubble blocking piece which is arranged between the medicine supply pipe and the return pipe and used for preventing bubbles from being transmitted to the vicinity of the medicine supply pipe from the vicinity of the return pipe.
2. The reservoir of claim 1,
the bubble blocking piece comprises a first baffle and a second baffle which are arranged at intervals along a first direction, the first baffle is positioned on one side, away from the backflow hole, of the second baffle, and the first direction is parallel to the bottom of the tank;
the first top wall of the first baffle plate is attached to the top of the groove, the second bottom wall of the second baffle plate is attached to the bottom of the groove, and the first side wall of the first baffle plate and the second side wall of the second baffle plate are respectively attached to the groove walls;
a gap exists between the first bottom wall of the first baffle and the tank bottom, and a gap exists between the second top wall of the second baffle and the tank top.
3. The reservoir of claim 2,
the height of the second top wall of the second baffle to the trough bottom is greater than the height of the first bottom wall of the first baffle to the trough bottom.
4. A reservoir according to claim 3,
the height from the second top wall of the second baffle plate to the tank bottom is greater than the height from the bottom end of the return pipe to the tank bottom and less than the height from the top end of the exhaust pipe to the tank bottom.
5. The reservoir of claim 2,
the cross-sectional area of the baffle gap between the first baffle and the second baffle in the first direction is larger than the cross-sectional area of the return pipe.
6. The reservoir of claim 2,
the liquid medicine flow rate of the baffle clearance between the first baffle and the second baffle is larger than that of the return pipe in unit time.
7. The reservoir of claim 2, wherein the first baffle includes a plurality of vent holes, the vent holes being located adjacent the first top wall.
8. The reservoir of claim 7, wherein said vent is a recess formed by said first top wall being recessed downwardly.
9. The liquid storage tank according to claim 1, wherein the liquid storage tank is provided with a liquid conveying pipe and a liquid drainage pipe, the liquid conveying pipe is communicated with the tank body and is used for conveying a plant end original liquid medicine to the liquid tank cavity, and the liquid drainage pipe is used for emptying the liquid medicine reserved in the liquid tank cavity; the liquid discharge pipe comprises at least two branch pipes, and the branch pipes are respectively communicated with the liquid tank cavities on two sides of the bubble blocking piece.
10. A wet processing apparatus, comprising the fluid storage tank and the wet processing chamber according to any one of claims 1 to 9, wherein the fluid storage tank and the wet processing chamber are communicated with each other through a drug supply system and a self-return system, the drug supply system comprises the drug supply pipe, and the self-return system comprises the return pipe.
11. The wet processing apparatus of claim 10, wherein the chemical supply system comprises a liquid pump, and the liquid pump is in communication with the chemical supply tube and drives the chemical liquid in the liquid storage tank to be transferred to the wet processing chamber through the chemical supply tube.
12. The wet processing apparatus according to claim 10, wherein the wet processing chamber comprises a spraying device and a stage, the stage is used for carrying a display substrate, and the spraying device is used for spraying the chemical solution onto the display substrate.
CN202210962621.2A 2022-08-11 2022-08-11 Wet process liquid storage tank and wet process device Pending CN115312429A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202210962621.2A CN115312429A (en) 2022-08-11 2022-08-11 Wet process liquid storage tank and wet process device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202210962621.2A CN115312429A (en) 2022-08-11 2022-08-11 Wet process liquid storage tank and wet process device

Publications (1)

Publication Number Publication Date
CN115312429A true CN115312429A (en) 2022-11-08

Family

ID=83861416

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202210962621.2A Pending CN115312429A (en) 2022-08-11 2022-08-11 Wet process liquid storage tank and wet process device

Country Status (1)

Country Link
CN (1) CN115312429A (en)

Similar Documents

Publication Publication Date Title
US10022652B2 (en) Solution treatment apparatus and solution treatment method
KR101073340B1 (en) Substrate cleaning apparatus
CN100377768C (en) Micro fluid chip
CN102412134B (en) Substrate processing device
CN1676231B (en) Substrate processing device and method
WO2006027909A1 (en) Pump unit for feeding chemical liquid
CN115312429A (en) Wet process liquid storage tank and wet process device
CN1853799B (en) Substrate processing device and method
KR20060135496A (en) Substrate processing system and control method
TWI801528B (en) Applicator and Applicator Air Exhaust Method
CN102092955B (en) Etching apparatus
WO2019056632A1 (en) Wafer processing device, solution tank thereof, and discharge method for solution tank
CN101829647B (en) Decompression drying device
KR101305263B1 (en) Apparatus for treating substrates
US20020083839A1 (en) Apparatus and method for degassing and preventing gelation in a viscous liquid
CN101295089A (en) Substrate processing apparatus
KR100820362B1 (en) Apparatus for suppling chemical agent supply
CN105545713B (en) Pump, pump installation and liquid-supplying system
US20220105535A1 (en) Substrate processing apparatus and substrate processing method
CN215566811U (en) Centrifugal pump operating system
KR101631030B1 (en) water supplying apparatus with High pressure jetting
CN115841974B (en) Water film spraying equipment of photovoltaic cleaning equipment
US20030185690A1 (en) Systems and methods for transferring and delivering a liquid chemical from a source to an end use station
CN215975553U (en) Chemical thinning system for glass
CN217481964U (en) Sealing system of pipeline type water sealing device and pure water tank

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination