CN115287583B - Ion diffusion coating fixture device and method suitable for strengthening clock ring opening - Google Patents
Ion diffusion coating fixture device and method suitable for strengthening clock ring opening Download PDFInfo
- Publication number
- CN115287583B CN115287583B CN202210808980.2A CN202210808980A CN115287583B CN 115287583 B CN115287583 B CN 115287583B CN 202210808980 A CN202210808980 A CN 202210808980A CN 115287583 B CN115287583 B CN 115287583B
- Authority
- CN
- China
- Prior art keywords
- shielding
- plating
- workpiece
- ion
- adjusting rod
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000009792 diffusion process Methods 0.000 title claims abstract description 68
- 238000000576 coating method Methods 0.000 title claims abstract description 42
- 239000011248 coating agent Substances 0.000 title claims abstract description 41
- 238000000034 method Methods 0.000 title claims abstract description 32
- 238000007142 ring opening reaction Methods 0.000 title claims abstract description 24
- 238000005728 strengthening Methods 0.000 title claims abstract description 20
- 238000007747 plating Methods 0.000 claims abstract description 71
- 238000007733 ion plating Methods 0.000 claims abstract description 21
- 230000008595 infiltration Effects 0.000 claims description 44
- 238000001764 infiltration Methods 0.000 claims description 44
- 230000008569 process Effects 0.000 claims description 21
- 239000007789 gas Substances 0.000 claims description 15
- 239000000463 material Substances 0.000 claims description 15
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 10
- 238000005256 carbonitriding Methods 0.000 claims description 6
- 229910052786 argon Inorganic materials 0.000 claims description 5
- 229910000963 austenitic stainless steel Inorganic materials 0.000 claims description 5
- 230000002787 reinforcement Effects 0.000 claims description 5
- 229910001220 stainless steel Inorganic materials 0.000 claims description 5
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 3
- 230000008859 change Effects 0.000 claims description 3
- 239000004020 conductor Substances 0.000 claims description 3
- 229910001039 duplex stainless steel Inorganic materials 0.000 claims description 3
- 239000000203 mixture Substances 0.000 claims description 3
- 238000003825 pressing Methods 0.000 claims description 3
- 239000010935 stainless steel Substances 0.000 claims description 3
- 239000010936 titanium Substances 0.000 claims description 3
- 229910052719 titanium Inorganic materials 0.000 claims description 3
- 229910001566 austenite Inorganic materials 0.000 claims description 2
- 229910000859 α-Fe Inorganic materials 0.000 claims 1
- 238000005260 corrosion Methods 0.000 abstract description 6
- 230000007797 corrosion Effects 0.000 abstract description 6
- 150000002500 ions Chemical class 0.000 description 55
- 230000000694 effects Effects 0.000 description 9
- 238000009826 distribution Methods 0.000 description 5
- 230000008878 coupling Effects 0.000 description 3
- 238000010168 coupling process Methods 0.000 description 3
- 238000005859 coupling reaction Methods 0.000 description 3
- 230000009471 action Effects 0.000 description 2
- 125000004429 atom Chemical group 0.000 description 2
- 230000005684 electric field Effects 0.000 description 2
- 230000005596 ionic collisions Effects 0.000 description 2
- 239000011159 matrix material Substances 0.000 description 2
- 238000005121 nitriding Methods 0.000 description 2
- 238000005299 abrasion Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000002715 modification method Methods 0.000 description 1
- 125000004433 nitrogen atom Chemical group N* 0.000 description 1
- 239000013589 supplement Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
- C23C8/06—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases
- C23C8/28—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases more than one element being applied in one step
- C23C8/30—Carbo-nitriding
- C23C8/32—Carbo-nitriding of ferrous surfaces
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
- C23C8/04—Treatment of selected surface areas, e.g. using masks
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
- C23C8/06—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases
- C23C8/36—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases using ionised gases, e.g. ionitriding
- C23C8/38—Treatment of ferrous surfaces
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The invention discloses an ion plating fixture device and method suitable for strengthening a clock ring opening, wherein the ion plating fixture device suitable for strengthening the clock ring opening comprises a bottom plate, wherein the bottom plate is used for placing a workpiece; the shielding plate is positioned above the bottom plate to shield the seeping plating surface of the workpiece, the distance between the shielding plate and the seeping plating surface of the workpiece is defined as shielding distance H, and the shielding distance H is larger than zero so as to ensure that a discharge space capable of generating glow discharge is arranged above the seeping plating surface of the workpiece; and the shielding plate is connected with the upper end of the adjusting rod through the connecting component and can be adjusted up and down along the adjusting rod through the connecting component so as to adjust the distance between the shielding plate and the bottom plate, thereby adjusting the shielding distance H. The invention adopts a shielding mode to carry out ion diffusion coating treatment on the workpiece, can improve the uniformity of a diffusion layer, and improves the surface hardness and the friction resistance of the whole ring opening while improving the corrosion resistance of the clock ring opening after diffusion coating.
Description
Technical Field
The invention relates to the field of metal surface heat treatment ion diffusion plating, in particular to an ion diffusion plating fixture device suitable for strengthening a clock ring opening, and also relates to an ion diffusion plating method suitable for strengthening the clock ring opening.
Background
The austenitic stainless steel has the characteristics of easy processing, good glossiness and corrosion resistance, and is commonly applied to clock parts, including stainless steel ring openings, watchbands, handles and the like; but austenitic stainless steel is generally low in hardness of 206HV 0.025 On the left and right sides, wear resistance and breakage are easy to occur in daily use.
In order to improve the surface hardness and wear resistance of stainless steel, ion nitriding is a common surface modification method, and carbon atoms are added in the ion nitriding to obtain higher hardness of a carburized layer by adopting a carbonitriding technology. Proper argon is added during gas bombardment in the ion diffusion plating process to promote the diffusion of nitrogen atoms and accelerate the diffusion plating speed.
However, the edge effect is always a big problem of ion diffusion plating, in the process of the ion diffusion plating, the difference of the ion density above the diffusion plating surface is caused by the difference of the electric potential at the corners and the center of the workpiece, the sheath layer thickness at the corners is smaller than that at the center, so that the edge effect is generated, and the phenomenon that the corners of the workpiece are permeated and the center is not permeated is caused.
In a corrosion environment, micro cells are formed between the seepage layer and the matrix due to uneven seepage plating, so that the corrosion resistance of the workpiece is reduced. Meanwhile, the uneven distribution of the surface hardness caused by uneven infiltration layer ensures that the stress at the corners of the workpiece is different from that at the central matrix, the stress at the central position is more obvious than that at the corners, and the abrasion is more obvious, so that the production requirement can not be met. Accordingly, the prior art is in need of improvement.
Disclosure of Invention
The invention aims to improve uniformity of a coating in an ion coating process, and provides an ion coating fixture device suitable for strengthening a clock ring opening by using ion carbonitriding treatment.
The embodiment of the invention also provides an ion diffusion plating method suitable for strengthening the opening of the clock.
According to an embodiment of the first aspect of the present invention, there is provided an ion plating jig device suitable for timepiece bezel reinforcement, comprising a base plate for placing a work piece; the shielding plate is positioned above the bottom plate to shield the seeping plating surface of the workpiece so as to change the ion movement direction of the surface of the seeping plating surface of the workpiece, the distance between the shielding plate and the seeping plating surface of the workpiece is defined as shielding distance H, and the shielding distance H is larger than zero so as to ensure that a discharge space capable of generating glow discharge is arranged above the seeping plating surface of the workpiece; and the lower end of the adjusting rod is fixed with the bottom plate, the shielding plate is connected with the upper end of the adjusting rod through a connecting component, and the shielding plate can be adjusted up and down along the adjusting rod through the connecting component so as to adjust the distance between the shielding plate and the bottom plate, thereby adjusting the shielding distance H.
The ion diffusion coating fixture device suitable for strengthening the clock ring opening has at least the following beneficial effects: in the ion plating process, a shielding plate is adopted to play a role in shielding the plating surface of the workpiece, so that the ion movement direction above the plating surface of the workpiece is changed, the ion energy sputtered is reflected, the ion collision frequency and the atom ionization speed are increased, and the average ion density and the ion energy of the plating surface of the workpiece are reduced in a short time; meanwhile, the shielding plate plays a certain electrostatic shielding role on the workpiece, so that electrons and ions generated by ionization in the infiltration plating furnace are preferentially gathered on the lower surface of the shielding plate before moving to the surface of the workpiece, part of ions and electrons are absorbed by the shielding plate, and the ion density above the infiltration plating surface of the workpiece is reduced. As the thickness and the ion density of the sheath layer at the corners and the center of the workpiece are different, the phenomenon of uneven seepage layer in ion seepage plating is caused, and the upper part of the workpiece is shielded by the shielding plate, the average ion density of the surface of the seepage plating surface of the workpiece is changed, the ion distribution and the electric field are more uniform, the thickness of the sheath layer is increased, the action range of the edge effect is further enlarged, and the uniformity of the seepage layer is improved. The invention has simple structure, the shielding plate can be adjusted up and down along the adjusting rod, the shielding distance H can be adjusted, and the invention is applicable to workpieces with various sizes.
According to an embodiment of the first aspect of the present invention, the shielding distance H is 8mm-10mm, so that a uniform seeping layer is obtained on the seeping surface of the workpiece. Through this technical scheme, the shielding plate passes through coupling assembling and adjusts from top to bottom along the adjusting lever, adjusts shielding interval H, adjusts the interval between work piece infiltration face and the shielding plate lower surface promptly. Because of inconsistent workpiece materials and sizes, the optimal shielding spacing of different samples is also different, and the shielding spacing H needs to be controlled between 8mm and 10mm through a connecting assembly so as to obtain a uniform seepage layer. Because glow discharge in the process of infiltration plating occurs in a cathode drop zone on the surface of the infiltration plating surface of the workpiece, if the cathode drop zone is shielded, the glow discharge cannot occur, and the workpiece cannot be infiltrated and plated; if the shielding distance exceeds the cathode drop zone, the influence of the shielding plate on the average ion density and ion distribution on the surface of the workpiece is weakened, and the ion diffusion uniformity cannot be improved. Good infiltrating effect can be obtained by adjusting the interval between the infiltration surface of the workpiece and the lower surface of the shielding plate to 8mm-10mm.
According to an embodiment of the first aspect of the present invention, the connecting assembly includes a supporting block located between the shielding plate and the adjusting rod, one end of the supporting block is connected with the shielding plate, the other end of the supporting block is connected with the adjusting rod, the adjusting rod is screwed with two first nuts for pressing the upper end and the lower end of the supporting block so as to fix the supporting block and the adjusting rod, the adjusting rod has a first external thread matched with the first nuts, and the supporting block is provided with a first through hole for the adjusting rod to pass through.
According to an embodiment of the first aspect of the present invention, the shielding plate is connected with a stud, the stud passes through the supporting block and is screwed with a second nut to fix the shielding plate and the supporting block, the shielding plate is provided with a first screw hole for the stud to connect, and the supporting block is provided with a second through hole for the stud to pass through; the side length of the shielding plate is 1.25 times of the side length of the workpiece. In the technical scheme, the shielding plate has good infiltration plating effect when the side length of the shielding plate is 1.25 times of the side length of the workpiece.
According to an embodiment of the first aspect of the present invention, the bottom plate is provided with a second screw hole into which the adjusting rod is screwed, and the lower end of the adjusting rod is provided with a second external thread which is matched with the second screw hole; the bottom plate is used for being placed on a workbench in the vacuum ion diffusion plating furnace, and the workbench is a conductor and is connected with a cathode of a direct current power supply.
According to an embodiment of the first aspect of the present invention, the material of the bottom plate, the adjusting rod, the supporting block and the shielding plate is pure titanium.
According to an embodiment of the second aspect of the present invention, there is provided an ion plating method suitable for strengthening a clock opening, wherein the ion plating fixture device suitable for strengthening a clock opening according to the first aspect of the present invention is mounted on a workbench in a vacuum ion plating furnace: the furnace wall of the vacuum ion infiltration plating furnace is connected with a direct current power supply anode, and the workbench is connected with a direct current power supply cathode; the ion carbonitriding is adopted and a small amount of argon is filled into the mixture according to the following process and parameters, and the volume ratio of the filled gas is CH 4 :Ar:N 2 :H 2 =1:2:3:9; the infiltration plating temperature is 330-390 ℃; the infiltration plating air pressure is 100-120Pa; the infiltration plating time is 6-8 h; the shielding distance H is 8mm-10mm.
The ion diffusion plating method suitable for strengthening the ring opening of the clock has at least the following effects: through the plating fixture device suitable for strengthening the clock ring opening, the workpiece is subjected to ion plating treatment in a shielding mode, so that the uniformity of a permeation layer can be improved, and the corrosion resistance of the clock ring opening after plating is improved, and meanwhile, the overall surface hardness and friction resistance of the ring opening are improved.
According to an embodiment of the second aspect of the invention, the material applied to the timepiece orifice is austenitic stainless steel, the surface hardness requirement being 750HV 0.025 The thickness of the seepage layer is required to be more than 10 mu m; performing diffusion coating according to the following process and parameters, wherein the diffusion coating temperature is 390 ℃; the volume ratio of the gas to be filled is CH 4 :Ar:N 2 :H 2 =1:2:3:9; the air pressure of the diffusion coating is 100Pa; the infiltration plating time is 6 hours; the shielding distance is 8mm.
According to an embodiment of the second aspect of the invention, the material applied to the timepiece orifice is ferritic stainless steel, the surface hardness requirement being 600HV 0025 The thickness of the seepage layer is required to be more than 5 mu m; performing diffusion coating according to the following process and parameters, wherein the diffusion coating temperature is 330 ℃; the volume ratio of the gas to be filled is CH 4 :Ar:N 2 :H 2 =1:2:3:9; the infiltration plating air pressure is 120Pa; the infiltration plating time is 6 hours; the shielding distance H is 10mm.
According to an embodiment of the second aspect of the invention, the material applied to the timepiece orifice is a ferritic-austenitic duplex stainless steel, surface hardness requirement is 750HV 0.025 The thickness of the seepage layer is required to be more than 10 mu m; performing diffusion coating according to the following process and parameters, wherein the diffusion coating temperature is 360 ℃; the volume ratio of the gas to be filled is CH 4 :Ar:N 2 :H 2 =1:2:3:9; the air pressure of the diffusion coating is 100Pa; the infiltration plating time is 8 hours; the shielding distance H is 8mm.
Drawings
The invention is further described below with reference to the drawings and examples;
FIG. 1 is a front view of an embodiment of the invention, shown partially in cross-section;
fig. 2 is a top view of an embodiment of the present invention.
Detailed Description
Reference will now be made in detail to the present embodiments of the present invention, examples of which are illustrated in the accompanying drawings, wherein the accompanying drawings are used to supplement the description of the written description so that one can intuitively and intuitively understand each technical feature and overall technical scheme of the present invention, but not to limit the scope of the present invention.
In the description of the present invention, it should be understood that references to orientation descriptions such as upper, lower, front, rear, left, right, etc. are based on the orientation or positional relationship shown in the drawings, are merely for convenience of description of the present invention and to simplify the description, and do not indicate or imply that the apparatus or elements referred to must have a particular orientation, be constructed and operated in a particular orientation, and thus should not be construed as limiting the present invention.
In the description of the present invention, a number means one or more, a number means two or more, and greater than, less than, exceeding, etc. are understood to not include the present number, and above, below, within, etc. are understood to include the present number. The description of the first and second is for the purpose of distinguishing between technical features only and should not be construed as indicating or implying relative importance or implicitly indicating the number of technical features indicated or implicitly indicating the precedence of the technical features indicated.
In the description of the present invention, unless explicitly defined otherwise, terms such as arrangement, installation, connection, etc. should be construed broadly and the specific meaning of the terms in the present invention can be reasonably determined by a person skilled in the art in combination with the specific contents of the technical scheme.
Referring to fig. 1 and 2, an ion plating jig device suitable for reinforcement of a bezel of a timepiece includes a base plate 11, a shielding plate 21, and an adjustment lever 31. Wherein the bottom plate 11 is used for placing a workpiece.
The shielding plate 21 is located above the bottom plate 11 to shield the diffusion surface of the workpiece 41, so as to change the ion movement direction of the diffusion surface of the workpiece 41, the distance between the shielding plate 21 and the diffusion surface of the workpiece 41 is defined as a shielding distance H, and the shielding distance H is greater than zero, so as to ensure that a discharge space 42 capable of generating glow discharge is arranged above the diffusion surface of the workpiece 41.
The lower end of the adjustment lever 31 is fixed to the base plate 11. In this embodiment, the bottom plate 11 is provided with a second screw hole into which the adjusting rod 31 is screwed, and the lower end of the adjusting rod 31 has a second external thread corresponding to the second screw hole. In other embodiments, the base plate 11 may be fixedly provided with a coupling nut for coupling the adjustment rod 31; other fixed connection methods can be used to connect the adjusting rod 31 with the bottom plate 11.
The shielding plate 21 is connected with the upper end of the adjusting rod 31 through a connecting component, and the shielding plate 21 can be adjusted up and down along the adjusting rod 31 through the connecting component so as to adjust the distance between the shielding plate 21 and the bottom plate 11, thereby adjusting the shielding distance H.
The skilled person knows that when the ion plating fixture device suitable for strengthening the clock ring opening is applied, the fixture device is installed in a vacuum ion plating furnace, specifically, the bottom plate 11 is used for being placed on a workbench in the vacuum ion plating furnace, and the workbench is an electric conductor and is connected with a cathode of a direct current power supply. It can be understood that the shielding plate 21 is adopted to shield the infiltration surface of the workpiece 41 in the ion infiltration process, so that the ion movement direction above the infiltration surface of the workpiece 41 is changed, the ion energy sputtered is reflected, the ion collision frequency and the atom ionization speed are increased, and the average ion density and the ion energy of the infiltration surface of the workpiece 41 are reduced in a short time; meanwhile, the shielding plate 21 plays a certain electrostatic shielding role on the workpiece 41, so that electrons and ions generated by ionization in the infiltration plating furnace are preferentially gathered on the lower surface of the shielding plate 21 before moving to the surface of the workpiece 41, part of ions and electrons are absorbed by the shielding plate 21, and the ion density above the infiltration plating surface of the workpiece 41 is reduced. The uneven phenomenon of the diffusion layer in the ion diffusion plating is caused by the difference of the thickness and the ion density of the sheath layer at the corners and the center of the workpiece 41, and the upper part of the workpiece 41 is shielded by the shielding plate 21, so that the average ion density of the surface of the diffusion plating surface of the workpiece 41 is changed, the ion distribution and the electric field are more uniform, the thickness of the sheath layer is increased, the action range of the edge effect is further enlarged, and the uniformity of the diffusion layer is improved. The invention has simple structure, the shielding plate 21 can be adjusted up and down along the adjusting rod 31, the shielding distance H can be adjusted, and the invention is applicable to workpieces with various sizes.
The shielding distance H is 8mm-10mm so that the infiltration surface of the workpiece 41 is uniformly infiltrated. Because the workpiece materials and the sizes are inconsistent, the optimal shielding distances of different samples are also different, the shielding plate 21 is adjusted up and down along the adjusting rod through the connecting component, and the shielding distance H is adjusted, namely, the distance between the seeping surface of the workpiece 41 and the lower surface of the shielding plate 21 is adjusted, and the shielding distance H is controlled to be 8mm-10mm through the connecting component so as to obtain a uniform seeping layer.
It can be understood that, because glow discharge occurs in the cathode drop zone on the surface of the workpiece infiltration surface in the infiltration process, if the cathode drop zone is shielded, glow discharge cannot occur, and the workpiece cannot be infiltrated; if the shielding distance H exceeds the cathode fall region, the influence of the shielding plate 21 on the average ion density and ion distribution on the surface of the workpiece 2 is weakened, and the ion diffusion uniformity cannot be improved. Good plating effect can be obtained by adjusting the distance between the plating surface of the work 2 and the lower surface of the shielding plate 21 to 8mm to 10mm.
Specifically, the connecting assembly comprises a supporting block 22 located between the shielding plate 21 and an adjusting rod 31, one end of the supporting block 22 is connected with the shielding plate 21, the other end of the supporting block 22 is connected with the adjusting rod 31, the adjusting rod 31 is screwed with two first nuts 32 used for pressing the upper end and the lower end of the supporting block 22 so as to fix the supporting block 22 and the adjusting rod 31, the adjusting rod 31 is provided with first external threads matched with the first nuts 32, and the supporting block 22 is provided with a first through hole for the adjusting rod 31 to pass through. It will be appreciated that by loosening the first nuts 32, the supporting block 22 can be adjusted up and down along the adjusting rod 31, and when the distance between the lower surface of the shielding plate 21 and the plating surface of the workpiece 2 is controlled to be 8mm-10mm, the two first nuts 32 are locked to fix the supporting block 22 and the adjusting rod 31. In other embodiments, a clamp may be mounted to the support block for holding the adjustment rod, and then locked when adjusted to the desired height.
In application, the adjusting lever 31 in this embodiment employs a screw, and the first external thread and the second external thread are identical.
In addition, the shielding plate 21 is connected with a stud 23, the stud 23 passes through the supporting block 22 and is screwed with a second nut 24 to fix the shielding plate 21 and the supporting block 22, the shielding plate 21 is provided with a first screw hole for connecting the stud 23, and the supporting block 22 is provided with a second through hole for the stud 23 to pass through. The side length of the shielding plate 21 is 1.25 times of the side length of the workpiece 41, and the workpiece has good plating effect, however, in other embodiments, the side length of the shielding plate 21 can be set to other length dimensions. The connection mode of the shielding plate 21 and the supporting block 22 adopts the technical scheme, and the shielding plate 21 can be disassembled for replacement and adjustment. In other embodiments, the stud and the second nut may be replaced with a connecting bolt that is threaded directly through the support block and then into the shield.
In some embodiments, the materials of the bottom plate 11, the adjusting rod 31, the supporting block 22 and the shielding plate 21 are all pure titanium.
The invention also discloses an ion diffusion plating method suitable for strengthening the ring opening of the clock, which comprises the following specific operation steps:
the ion plating fixture device suitable for strengthening the clock ring opening is arranged on a workbench in a vacuum ion plating furnace:
the furnace wall of the vacuum ion infiltration plating furnace is connected with a direct current power supply anode, and the workbench is connected with a direct current power supply cathode;
the ion carbonitriding is adopted and a small amount of argon is filled into the mixture according to the following process and parameters, and the volume ratio of the filled gas is CH 4 :Ar:N 2 :H 2 =1:2:3:9; the infiltration plating temperature is 330-390 ℃; the infiltration plating air pressure is 100-120Pa; the infiltration plating time is 6-8 h; the shielding distance H is 8mm-10mm.
The invention is suitable for an ion diffusion plating method for strengthening a clock ring opening, which aims at the clock ring openings made of different materials, adopts different processes and parameters to conduct diffusion plating, and specifically comprises the following steps:
in a first embodiment, the material used for the opening of the timepiece is austenitic stainless steel, the surface hardness of which is required to be 750HV 0.025 The thickness of the seepage layer is required to be more than 10 mu m; performing diffusion coating according to the following process and parameters, wherein the diffusion coating temperature is 390 ℃; the volume ratio of the gas to be filled is CH 4 :Ar:N 2 :H 2 =1:2:3:9; the air pressure of the diffusion coating is 100Pa; the infiltration plating time is 6 hours; shielding distance8mm.
In a second embodiment, the material applied to the opening of the timepiece is ferritic stainless steel, the surface hardness of which is required to be 600HV 0.025 The thickness of the seepage layer is required to be more than 5 mu m; performing diffusion coating according to the following process and parameters, wherein the diffusion coating temperature is 330 ℃; the volume ratio of the gas to be filled is CH 4 :Ar:N 2 :H 2 =1:2:3:9; the infiltration plating air pressure is 120Pa; the infiltration plating time is 6 hours; the shielding distance H is 10mm.
Third embodiment, the material applied to the timepiece orifice is ferrite-austenite duplex stainless steel, the surface hardness of which is required to be 750HV 0.025 The thickness of the seepage layer is required to be more than 10 mu m; performing diffusion coating according to the following process and parameters, wherein the diffusion coating temperature is 360 ℃; the volume ratio of the gas to be filled is CH 4 :Ar:N 2 :H 2 =1:2:3:9; the air pressure of the diffusion coating is 100Pa; the infiltration plating time is 8 hours; the shielding distance H is 8mm.
The invention enumerates three embodiments, adopts different processes and parameters for the clock ring opening with different materials for the diffusion coating, but the diffusion coating is carried out under the following processes and parameters, so that the uniformity of the diffusion coating can be improved, and the corrosion resistance performance of the ring opening after the diffusion coating is improved, and the overall surface hardness and friction resistance performance of the clock ring opening are improved. Adopts ion carbonitriding and small argon gas filling, and the filling gas volume ratio is CH 4 :Ar:N 2 :H 2 =1:2:3:9; the infiltration plating temperature is 330-390 ℃; the infiltration plating air pressure is 100-120Pa; the infiltration plating time is 6-8 h, and the shielding distance is 8-10 mm.
The embodiments of the present invention have been described in detail with reference to the accompanying drawings, but the present invention is not limited to the above embodiments, and various changes can be made within the knowledge of one of ordinary skill in the art without departing from the spirit of the present invention.
Claims (7)
1. An ion diffusion coating fixture device suitable for clock and watch ring mouth reinforces which characterized in that: comprising
The bottom plate is used for placing a workpiece;
the shielding plate is positioned above the bottom plate to shield the diffusion coating surface of the workpiece so as to change the ion movement direction of the diffusion coating surface of the workpiece, the distance between the shielding plate and the diffusion coating surface of the workpiece is defined as shielding distance H, the shielding distance H is larger than zero so as to ensure that a discharge space capable of generating glow discharge is arranged above the diffusion coating surface of the workpiece, and the shielding distance H is 8-10 mm so as to ensure that the diffusion coating surface of the workpiece obtains a uniform diffusion layer; and
the adjusting rod is fixed at the lower end of the adjusting rod, the shielding plate is connected with the upper end of the adjusting rod through a connecting component, the shielding plate can be adjusted up and down along the adjusting rod through the connecting component so as to adjust the distance between the shielding plate and the bottom plate, and therefore the shielding distance H is adjusted, the connecting component comprises a supporting block positioned between the shielding plate and the adjusting rod, one end of the supporting block is connected with the shielding plate, the other end of the supporting block is connected with the adjusting rod, the adjusting rod is screwed with two first nuts used for pressing the upper end and the lower end of the supporting block to fix the supporting block with the adjusting rod, the adjusting rod is provided with first external threads matched with the first nuts, the supporting block is provided with a first through hole for the adjusting rod to pass through, the shielding plate is connected with a stud, the stud is screwed with a second nut after passing through the supporting block so as to fix the shielding plate and the supporting block, the supporting block is provided with a second stud for the first through hole to pass through the first stud; the side length of the shielding plate is 1.25 times of the side length of the workpiece.
2. The ion plating jig device for timepiece bezel reinforcement according to claim 1, wherein: the bottom plate is provided with a second screw hole for screwing in the adjusting rod, and the lower end of the adjusting rod is provided with second external threads which are matched with the second screw hole; the bottom plate is used for being placed on a workbench in the vacuum ion diffusion plating furnace, and the workbench is a conductor and is connected with a cathode of a direct current power supply.
3. The ion plating jig device for timepiece bezel reinforcement according to any one of claims 1 to 2, wherein: the bottom plate, the adjusting rod, the supporting block and the shielding plate are all made of pure titanium.
4. An ion diffusion plating method suitable for strengthening a clock ring opening is characterized in that: mounting an ion plating jig device suitable for timepiece bezel reinforcement as defined in any one of claims 1 to 3 on a work table in a vacuum ion plating furnace:
the furnace wall of the vacuum ion infiltration plating furnace is connected with a direct current power supply anode, and the workbench is connected with a direct current power supply cathode;
the ion carbonitriding is adopted and a small amount of argon is filled into the mixture according to the following process and parameters, and the volume ratio of the filled gas is CH 4 :Ar:N 2 :H 2 =1:2:3:9; the infiltration plating temperature is 330-390 ℃; the infiltration plating air pressure is 100-120Pa; the infiltration plating time is 6-8 h; the shielding distance H is 8mm-10mm.
5. The ion plating method for strengthening a bezel of a timepiece according to claim 4, wherein: the material applied to the opening of the clock is austenitic stainless steel, and the surface hardness is required to be 750HV 0.025 The thickness of the seepage layer is required to be more than 10 mu m;
performing diffusion coating according to the following process and parameters, wherein the diffusion coating temperature is 390 ℃; the volume ratio of the gas to be filled is CH 4 :Ar:N 2 :H 2 =1:2:3:9; the air pressure of the diffusion coating is 100Pa; the infiltration plating time is 6 hours; the shielding distance is 8mm.
6. The ion plating method for strengthening a bezel of a timepiece according to claim 4, wherein: the material applied to the opening of the clock is ferrite stainless steel, and the surface hardness is required to be 600HV 0.025 The thickness of the seepage layer is required to be more than 5 mu m;
performing diffusion coating according to the following process and parameters, wherein the diffusion coating temperature is 330 ℃; the volume ratio of the gas to be filled is CH 4 :Ar:N 2 :H 2 =1:2:3:9; the infiltration plating air pressure is 120Pa; the infiltration plating time is 6 hours; the shielding distance H is 10mm.
7. The method for enhanced ion plating for a timepiece bezel of claim 4, wherein: the material applied to the opening of the clock is ferrite-austenite duplex stainless steel, and the surface hardness is required to be 750HV 0.025 The thickness of the seepage layer is required to be more than 10 mu m;
performing diffusion coating according to the following process and parameters, wherein the diffusion coating temperature is 360 ℃; the volume ratio of the gas to be filled is CH 4 :Ar:N 2 :H 2 =1:2:3:9; the air pressure of the diffusion coating is 100Pa; the infiltration plating time is 8 hours; the shielding distance H is 8mm.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202210808980.2A CN115287583B (en) | 2022-07-11 | 2022-07-11 | Ion diffusion coating fixture device and method suitable for strengthening clock ring opening |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202210808980.2A CN115287583B (en) | 2022-07-11 | 2022-07-11 | Ion diffusion coating fixture device and method suitable for strengthening clock ring opening |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN115287583A CN115287583A (en) | 2022-11-04 |
| CN115287583B true CN115287583B (en) | 2024-01-30 |
Family
ID=83822936
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202210808980.2A Active CN115287583B (en) | 2022-07-11 | 2022-07-11 | Ion diffusion coating fixture device and method suitable for strengthening clock ring opening |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN115287583B (en) |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB1474358A (en) * | 1974-12-03 | 1977-05-25 | Seiko Instr & Electronics | Method of plating a substrate with a precious metal |
| US5859404A (en) * | 1995-10-12 | 1999-01-12 | Hughes Electronics Corporation | Method and apparatus for plasma processing a workpiece in an enveloping plasma |
| CN101289735A (en) * | 2008-06-14 | 2008-10-22 | 深圳八六三计划材料表面技术研发中心 | Precision hardening method and apparatus for austenitic stainless steel |
| CN103997843A (en) * | 2013-02-17 | 2014-08-20 | 中微半导体设备(上海)有限公司 | Plasma reactor improving gas distribution |
| CN210215514U (en) * | 2019-05-24 | 2020-03-31 | 上海丰东热处理工程有限公司 | Clamp for vacuum carburization workpiece |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7470329B2 (en) * | 2003-08-12 | 2008-12-30 | University Of Maryland | Method and system for nanoscale plasma processing of objects |
-
2022
- 2022-07-11 CN CN202210808980.2A patent/CN115287583B/en active Active
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB1474358A (en) * | 1974-12-03 | 1977-05-25 | Seiko Instr & Electronics | Method of plating a substrate with a precious metal |
| US5859404A (en) * | 1995-10-12 | 1999-01-12 | Hughes Electronics Corporation | Method and apparatus for plasma processing a workpiece in an enveloping plasma |
| CN101289735A (en) * | 2008-06-14 | 2008-10-22 | 深圳八六三计划材料表面技术研发中心 | Precision hardening method and apparatus for austenitic stainless steel |
| CN103997843A (en) * | 2013-02-17 | 2014-08-20 | 中微半导体设备(上海)有限公司 | Plasma reactor improving gas distribution |
| CN210215514U (en) * | 2019-05-24 | 2020-03-31 | 上海丰东热处理工程有限公司 | Clamp for vacuum carburization workpiece |
Also Published As
| Publication number | Publication date |
|---|---|
| CN115287583A (en) | 2022-11-04 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| Vlček et al. | High-power pulsed sputtering using a magnetron with enhanced plasma confinement | |
| EP0166349A1 (en) | Surface treatment process | |
| KR20030063109A (en) | Dlc layer system and method for producing said layer system | |
| EP1775352A3 (en) | Arc ion plating apparatus | |
| CN111441037B (en) | Cutter tray used in microwave plasma deposition diamond film device | |
| EP0199527A1 (en) | A process for the production of a surface-coated article | |
| CN115287583B (en) | Ion diffusion coating fixture device and method suitable for strengthening clock ring opening | |
| CN112210747A (en) | Arc discharge ion nitriding technology and nitriding furnace | |
| CN1082100C (en) | Industrial pulse or DC plasma and chemical gas-phase deposition equipment for strenthening surface of tool or mould | |
| CN109825808B (en) | Doped diamond-like film preparation device and method | |
| CN209941087U (en) | Cutter tray for microwave plasma diamond film deposition device | |
| Fancey et al. | Relative importance of bombardment energy and intensity in ion plating | |
| Williams | Vacuum coating with a hollow cathode source | |
| CN101550536A (en) | High-purity nickel target for magnetron sputtering | |
| JP6474076B2 (en) | Thin film manufacturing method and thin film manufacturing apparatus | |
| CN101109064A (en) | Method of plating-manufacturing silicon doped non-hydrogen diamond membrane | |
| CN207775332U (en) | A kind of device for the processing of T shape shaft sleeve parts glow ion nitridings | |
| CN109154061A (en) | By the TiCN with reduced growth defect of HIPIMS | |
| US20010029896A1 (en) | Rotating device for plasma immersion supported treatment of substrates | |
| US20220040769A1 (en) | Coated cutting tool | |
| KR100800799B1 (en) | Method for fabricating metal thin film on semiconductor surface using pvd | |
| JP2001172763A (en) | Method of forming metal-containing hard carbon film | |
| JPH07300665A (en) | Method for forming boron cementation layer and boron film on metallic base material | |
| CN212404266U (en) | Target table for magnetron sputtering vacuum machine | |
| CN220352214U (en) | Uniform nitriding device for high-density plasmas on surface of soft base material |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant |