CN115233160A - Evaporation source device and evaporation equipment - Google Patents
Evaporation source device and evaporation equipment Download PDFInfo
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- CN115233160A CN115233160A CN202210726317.8A CN202210726317A CN115233160A CN 115233160 A CN115233160 A CN 115233160A CN 202210726317 A CN202210726317 A CN 202210726317A CN 115233160 A CN115233160 A CN 115233160A
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- 238000001704 evaporation Methods 0.000 title claims abstract description 78
- 230000008020 evaporation Effects 0.000 title claims abstract description 76
- 239000000463 material Substances 0.000 claims abstract description 69
- 238000004891 communication Methods 0.000 claims abstract description 4
- 239000007921 spray Substances 0.000 claims abstract description 4
- 230000007423 decrease Effects 0.000 claims description 7
- 239000007787 solid Substances 0.000 claims description 3
- 239000011248 coating agent Substances 0.000 description 14
- 238000000576 coating method Methods 0.000 description 14
- 238000007740 vapor deposition Methods 0.000 description 14
- 238000009834 vaporization Methods 0.000 description 14
- 230000008016 vaporization Effects 0.000 description 14
- 238000002347 injection Methods 0.000 description 7
- 239000007924 injection Substances 0.000 description 7
- 239000002699 waste material Substances 0.000 description 6
- 238000010586 diagram Methods 0.000 description 5
- 230000000903 blocking effect Effects 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 239000011368 organic material Substances 0.000 description 4
- 230000008569 process Effects 0.000 description 4
- 230000000694 effects Effects 0.000 description 3
- 239000002184 metal Substances 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 238000004020 luminiscence type Methods 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
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Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/042—Coating on selected surface areas, e.g. using masks using masks
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/243—Crucibles for source material
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The application discloses evaporation source device and evaporation equipment, this evaporation source device includes: the crucible is provided with a cavity for accommodating an evaporation material; a plurality of nozzles disposed on the top surface of the crucible and in communication with the cavity, wherein the plurality of nozzles includes a first nozzle; and a guide member at least partially located on the spray path of the first nozzle. The application provides an evaporation source device can improve evaporation material's utilization ratio.
Description
Technical Field
The application belongs to the technical field of evaporation, especially relates to an evaporation source device and evaporation equipment.
Background
An OLED (Organic Light-Emitting Diode) display panel has become one of the hottest display technologies because it has the advantages of unique self-luminescence, wide viewing angle, high contrast, high brightness, low power consumption, fast response speed, thin panel, etc. The core part of the OLED display panel is composed of an anode metal film layer, an organic material film layer and a cathode metal film layer. The organic material film layer is formed by adopting an evaporation process. At present, when an organic material film layer is formed by adopting an evaporation process, evaporation materials are wasted.
Disclosure of Invention
The application provides an evaporation source device and coating by vaporization equipment, can improve coating by vaporization material's utilization ratio.
A first aspect of embodiments of the present application provides an evaporation source device, including: the crucible is provided with a cavity, and the cavity is used for containing evaporation materials; a plurality of nozzles disposed on a top surface of the crucible and in communication with the cavity, wherein the plurality of nozzles includes a first nozzle; a guide at least partially located on a spray path of the first nozzle.
Wherein, from the direction of the central point of the top surface of crucible position to the edge position, a plurality of the axis of nozzle with the contained angle of the top surface of crucible reduces, wherein, first nozzle is in among a plurality of nozzles, from the central point of the top surface of crucible position to the edge position direction be in the outermost nozzle.
Wherein the plurality of nozzles and the guide member are arranged in a row, the guide member is located on a side of the first nozzle facing away from the other nozzles, wherein at least a part of the guide member exceeds an exit surface of the first nozzle, and at least a part of the projection of the guide member exceeding the exit surface is located on an ejection path of the first nozzle.
Wherein at least part of the surface of the guide facing the first nozzle is flush with at least part of the surface of the first nozzle facing the guide; preferably, the surface of the guide facing the first nozzle completely conforms to the surface of the first nozzle facing the guide.
Wherein a surface of the protrusion facing the first nozzle is a convex curved surface or a concave curved surface.
Wherein a surface of the guide facing away from the first nozzle is disposed perpendicular to a top surface of the crucible.
Wherein the guide is a solid structure.
Wherein, the crucible includes the crucible body and sets up the crucible lid in crucible body exit, the top surface of crucible is the crucible lid is kept away from the surface of crucible body, the material of guide with the material of crucible lid is the same.
Wherein the guide is integrally formed with the first nozzle; preferably, the guide member is integrally provided with the crucible cover; preferably, a plurality of the nozzles are integrally formed with the crucible cover.
A second aspect of the embodiments of the present application provides an evaporation apparatus, including the evaporation source device described above.
The beneficial effects are that: this application sets up the guide piece that corresponds first nozzle to make at least part of guide piece be located the injection route of first nozzle, when the partial coating by vaporization material that spouts from first nozzle spouts to invalid area, the guide piece can shelter from this part coating by vaporization material that sprays towards invalid area, makes this part coating by vaporization material can not all spout to invalid area, thereby can reduce coating by vaporization material's waste, improves coating by vaporization material's utilization ratio.
Drawings
In order to more clearly illustrate the technical solutions in the embodiments of the present application, the drawings needed to be used in the description of the embodiments are briefly introduced below, it is obvious that the drawings in the following description are only some embodiments of the present application, and other drawings can be obtained by those skilled in the art without inventive efforts, wherein:
FIG. 1 is a schematic structural diagram of an evaporation source device according to the present application when an evaporation material is evaporated;
FIG. 2 is an enlarged schematic view at A in FIG. 1;
FIG. 3 is a schematic view of a simple structure of the crucible of FIG. 1;
FIG. 4 is a schematic diagram of relative positions of an element to be evaporated, a mask plate and a plurality of nozzles in an application scene;
FIG. 5 is a schematic diagram of relative positions of an element to be evaporated, a mask plate and a plurality of nozzles in another application scene;
FIG. 6 is a schematic view of a portion of the nozzle in FIG. 1;
fig. 7 is a schematic structural diagram of an embodiment of an evaporation apparatus according to the present application.
Detailed Description
The technical solutions in the embodiments of the present application will be described clearly and completely with reference to the drawings in the embodiments of the present application, and it is obvious that the described embodiments are only some embodiments of the present application, and not all embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present application.
It should be noted that the evaporation source device in the present application can be used for evaporating an organic material film layer in an OLED display panel, and can be used for evaporating any kind of film layer.
Referring to fig. 1 and 2, in an embodiment of the present application, an evaporation source apparatus 100 includes a crucible 110, a nozzle 120, and a guide 130.
While referring to fig. 3, the crucible 110 is provided with a cavity 1101, and the cavity 1101 is used for accommodating evaporation materials, in this embodiment, the crucible 110 is a linear crucible, and includes a crucible body 111 and a crucible cover 112 disposed at an outlet of the crucible body 111, and a surface of the crucible cover 112 away from the crucible body 111 is a top surface 101 of the crucible 110. The evaporation material is heated in the crucible body 111 by means of, for example, resistance wire heating, and then evaporated by the plurality of nozzles 120 and sprayed to the member to be evaporated 200. The member to be evaporated 200 can be any type of workpiece to be evaporated, for example, in an application scenario, the member to be evaporated 200 is a glass plate. In the present application, the type of the crucible 110 is not limited, but for convenience of description, the crucible 110 is hereinafter described as a linear crucible.
With continued reference to fig. 1 and 2, a plurality of nozzles 120 are disposed on the top surface 101 of the crucible 110 and are in communication with the cavity 1101, wherein the plurality of nozzles 120 includes a first nozzle 121. While the guide member 130 is at least partially positioned on the injection path of the first nozzle 121 to block and guide the evaporation material injected from the first nozzle 121.
In the related art, since the injection direction of the vapor deposition material injected from the first nozzle 121 is determined entirely by the first nozzle 121, specifically, the mounting position and the mounting angle of the first nozzle 121 determine the injection direction of the vapor deposition material, the injection direction of the vapor deposition material is fixed when the mounting position, the mounting angle, and the like of the first nozzle 121 are determined. In some application scenarios, after the first nozzle 121 is installed at the target position to be vapor-deposited corresponding to the member 200 to be vapor-deposited, the vapor deposition material ejected from the first nozzle 121 is inevitably ejected to the peripheral position of the target position to be vapor-deposited while being ejected to the target position to be vapor-deposited, thereby easily causing material waste.
However, in the present embodiment, at least a portion where the guide 130 is provided is located on the injection path of the first nozzle 121, and the vapor deposition material discharged from the first nozzle 121 can be blocked and guided, so that the vapor deposition material discharged from the first nozzle 121 is discharged to the target position to be vapor deposited on the member to be vapor deposited 200, and the vapor deposition material can be prevented from being discharged to an ineffective area around the target position to be vapor deposited, thereby preventing the waste of the vapor deposition material.
In the present embodiment, a part of the vapor deposition material discharged from the first nozzle 121 is discharged toward the vapor deposition material 200, and another part is discharged toward the ineffective region. Specifically, among the plurality of nozzles 120, if a part of the vapor deposition material discharged from a certain nozzle 120 is discharged toward the member to be vapor deposited 200 and another part is discharged toward the ineffective region, the nozzle 120 is defined as a first nozzle 121.
In a practical application scenario, a part of the evaporation material sprayed from the first nozzle 121 is sprayed toward the to-be-evaporated material 200, and another part of the evaporation material is inevitably sprayed toward an ineffective area outside the to-be-evaporated material 200 due to factors such as an angle of the first nozzle 121, and if the evaporation material is sprayed onto the ineffective area, on one hand, the evaporation material is wasted, and on the other hand, since the periphery of the crucible 110 is usually surrounded by the anti-adhesion plate 1 (as shown in fig. 1), the anti-adhesion plate 1 is used for blocking the evaporation material sprayed from the crucible 110 from being sprayed to the outside, the evaporation material sprayed onto the ineffective area is easily accumulated on the anti-adhesion plate 1, and the evaporation material accumulated on the anti-adhesion plate 1 becomes thicker with time, and when the thickness is increased to a certain degree, the evaporation material may cause blockage of the first nozzle 121.
Therefore, in the present embodiment, as shown in fig. 1 and 2, a guide member 130 is provided corresponding to the first nozzle 121, and the guide member 130 is at least partially located on the ejection path of the first nozzle 121 to block at least part of the vapor deposition material from being ejected toward the ineffective area.
Specifically, under the block of the guide member 130, during the process that the material sprayed from the first nozzle 121 is sprayed toward the ineffective area, at least a part of the material is blocked by the guide member 130, compared with the prior art, the part of the evaporation material sprayed toward the ineffective area is not sprayed to the area completely because at least a part of the evaporation material is blocked by the guide member 130, so that on one hand, the waste of the evaporation material can be reduced, on the other hand, because of the block of the guide member 130, a part of the evaporation material can change the spraying direction and is finally sprayed to the member to be evaporated 200, thereby increasing the content of the evaporation material on the member to be evaporated 200 and improving the utilization rate of the evaporation material.
With continued reference to fig. 1 and 2, in the present embodiment, the angle between the central axis of the plurality of nozzles 120 and the top surface 101 of the crucible 110 decreases from the center position of the top surface 101 of the crucible 110 toward the edge position, and the first nozzle 121 is the outermost nozzle 120 of the plurality of nozzles 120 in the direction from the center position of the top surface 101 of the crucible 110 toward the edge position.
Specifically, the angle between the central axis of the nozzle 120 and the top surface 101 of the crucible 110 means the angle between the central axis of the nozzle 120 and the top surface 101 of the crucible 110 of [0,90 ° ]. That is, the plurality of nozzles 120 are inclined to the crucible 110 to increase from the center position to the edge position of the top surface 101 of the crucible 110.
Specifically, the included angle between the central axis of the nozzle 120 and the top surface 101 of the crucible 110 decreases from the center of the top surface 101 of the crucible 110 to the edge, or the included angle between the central axis of the nozzle 120 and the top surface 101 of the crucible 110 decreases gradually, or the included angle between the central axis of the nozzle 120 and the top surface 101 of the crucible 110 decreases in a step shape.
Specifically, the fact that the included angle between the central axis of the nozzle 120 and the top surface 101 of the crucible 110 gradually decreases means that the included angle between the central axis of any nozzle 120 and the top surface 101 of the crucible 110 is smaller than the included angle between the central axis of the previous nozzle 120 and the top surface 101 of the crucible 110 in the direction from the center position to the edge position of the top surface 101 of the crucible 110.
The fact that the included angle between the central axis of the nozzle 120 and the top surface 101 of the crucible 110 decreases in a step shape means that the included angle between the central axis of a part of the nozzles 120 and the top surface 101 of the crucible 110 is smaller than the included angle between the central axis of the previous nozzle 120 and the top surface 101 of the crucible 110, and the included angle between the central axis of a part of the nozzles 120 and the top surface 101 of the crucible 110 is equal to the included angle between the central axis of the previous nozzle 120 and the top surface 101 of the crucible 110. That is, there are several nozzles 120 in series with their central axes at the same angle to the top surface 101 of the crucible 110.
Theoretically, through the coating by vaporization, treat that the region that coating by vaporization piece corresponds the mask plate opening should be scribbled with coating by vaporization material, but along with evaporation source device 100 with treat that the distance of coating by vaporization piece 200 increases, treat that the edge of the region that coating by vaporization piece corresponds the mask plate opening often does not form coating by vaporization material because of the sheltering from of mask plate, this kind of phenomenon is called shadow (shadow effect), along with evaporation source device 100 with treat that the distance of coating by vaporization piece 200 increases, this kind of shadow phenomenon is more obvious.
In order to reduce the shadow effect, it is common practice to reduce the total length of the nozzles 120 arranged in a row in combination with fig. 4 and 5, so as to increase the incident angle of the evaporation material and reduce the shadow effect, wherein reference numeral 3 in fig. 4 and 5 denotes a mask plate.
Along with the reduction of the total length of the plurality of nozzles 120, the evaporation materials sprayed by the plurality of nozzles 120 to the edge of the piece to be evaporated 200 are correspondingly reduced, so that the evaporation materials sprayed by the plurality of nozzles 120 to the edge of the piece to be evaporated 200 are reduced, and the uniformity of the thickness of the evaporation film is further influenced.
With the inclined design of the nozzles 120 on both sides, a part of the evaporation material ejected from the outermost nozzle 120 of the plurality of nozzles 120 is ejected toward the ineffective area, which results in waste of the material, and the evaporation material ejected toward the ineffective area accumulates over time, which results in blocking the outermost nozzle 120 when the evaporation material accumulates to a certain thickness, so that in the present embodiment, the first nozzle 121 is provided as the nozzle 120 of the plurality of nozzles 120, and the nozzle 120 located at the outermost side in the direction from the center position of the top surface 101 of the crucible 110 toward the edge position is blocked by the guide 130, and the evaporation material ejected from the first nozzle 120 is blocked toward the ineffective area, which can increase the utilization rate of the evaporation material and prevent waste, and can also prevent blocking of the first nozzle 121, and can improve the uniformity of the film layer, and because of the blocking of the guide 130, the part of the evaporation material ejected from the first nozzle 121 changes the ejection direction and is finally ejected toward the evaporation material, so that the amount of the evaporation material at the edge position of the evaporation material 200 can be increased, compared with the prior art, if the amount of the evaporation material at the edge position of the nozzle 120 is maintained is not changed, and the amount of the nozzle 120 can be reduced.
With continued reference to fig. 1 and 2, in the present embodiment, the plurality of nozzles 120 and the guides 130 are arranged in a row, and the guides 130 are located on a side of the first nozzle 120 facing away from the other nozzles 120, wherein at least a portion of the guides 130 protrudes beyond the exit surface 1201 of the first nozzle 120, and at least a portion of the guides 130 protrudes beyond the projection 131 of the exit surface 1201 and is located on the ejection path of the first nozzle 121.
It is understood that when the plurality of nozzles 120 are arranged in a line, in this case, the number of the nozzles 120 located at the outermost side among the plurality of nozzles 120 is two, that is, the number of the first nozzles 121 is two, and thus the guide 130 may be provided corresponding to each of the first nozzles 121.
In the present embodiment, the vapor deposition material is ejected from the exit surface 1201 of the first nozzle 120 to the outside, and the guide 130 partially protrudes from the exit surface 1201, where the protruding portion is defined as the protrusion 131, and at least part of the protrusion 131 is used to block and guide the vapor deposition material.
With continued reference to fig. 1, in the present embodiment, at least a portion of the surface of the guide member 130 facing the first nozzle 121 is attached to at least a portion of the surface of the first nozzle 121 facing the guide member 130.
Specifically, by providing at least a portion of the surface of the guide 130 facing the first nozzle 121 to be in contact with at least a portion of the surface of the first nozzle 121 facing the guide 130, the heat content of the first nozzle 121 can be increased, and heat loss can be reduced.
To further reduce heat loss, the surface of the guide 130 facing the first nozzle 121 completely conforms to the surface of the first nozzle 121 facing the guide 130. The attaching manner of the guide 130 and the first nozzle 121 may refer to the attaching manner of two adjacent nozzles 120 in fig. 6.
In another embodiment, the surface of the guide 130 may not be in contact with the surface of the first nozzle 121 facing the guide 130, and the surface may be spaced apart from each other, without considering heat loss. In this case, when the first nozzle 121 and the crucible 110 are spaced apart from each other, the inclination angle of the first nozzle with respect to the crucible 110 may be the same as or different from the inclination angle of the guide 130 with respect to the crucible 110.
In the present embodiment, the guide 130 is provided as a solid structure in order to further reduce the heat loss. Of course, in other embodiments, the guide 130 may be a hollow structure.
Meanwhile, in the present embodiment, the surface of the protrusion 131 facing the first nozzle 121 is a convex curved surface or a concave curved surface, and may be specifically designed according to actual requirements.
In the present embodiment, while avoiding the guide 130 from affecting the arrangement of the shield plate 1, the surface of the guide 130 facing away from the first nozzle 121 is arranged perpendicular to the top surface 101 of the crucible 110.
Of course, in other embodiments, the surface of the guide 130 facing away from the first nozzle 121 may not be perpendicular to the top surface 101.
Wherein, in order to achieve the same heat transfer and reduce heat loss during the heat transfer, the material of the guide 130 is the same as that of the crucible cover 112, and the guide 130 is integrally provided with the first nozzle 121. Specifically, the arrangement of the guide 130 and the first nozzle 121 are integrally formed, so that the heat content of the first nozzle 121 can be increased, the heat loss rate can be reduced, and the first nozzle 121 can be prevented from being blocked.
Wherein the guide 130 is integrally formed with the crucible cover 112 in order to further reduce heat loss during heat transfer.
Similarly, the plurality of nozzles 120 may be integrally formed with the crucible cover 112, or the plurality of nozzles 120, the guide 130, and the crucible cover 112 may be integrally formed.
The structure, shape, installation position, inclination angle, and the like of the guide 130 are not limited in the present application as long as at least part of the guide is located on the injection path of the first nozzle 120.
Referring to fig. 7, fig. 7 is a schematic structural diagram of an embodiment of an evaporation apparatus 300 of the present application, the evaporation apparatus 300 includes an evaporation source device 310, and the evaporation source device 310 has the same structure as the evaporation source device 100 in any of the above embodiments, and specific reference may be made to the above embodiments, which are not repeated herein.
The above description is only an example of the present application, and is not intended to limit the scope of the present application, and all equivalent structures or equivalent processes performed by the present application and the contents of the attached drawings, which are directly or indirectly applied to other related technical fields, are also included in the scope of the present application.
Claims (10)
1. An evaporation source apparatus, comprising:
the crucible is provided with a cavity, and the cavity is used for containing evaporation materials;
a plurality of nozzles disposed on a top surface of the crucible and in communication with the cavity, wherein the plurality of nozzles includes a first nozzle;
a guide at least partially located on a spray path of the first nozzle.
2. The evaporation source apparatus according to claim 1, wherein an angle between a central axis of the plurality of nozzles and the top surface of the crucible decreases from a center position to an edge position of the top surface of the crucible, and wherein the first nozzle is the nozzle that is outermost in a direction from the center position to the edge position of the top surface of the crucible among the plurality of nozzles.
3. The evaporation source apparatus according to claim 1, wherein the plurality of nozzles and the guides are arranged in a row, the guides being located on a side of the first nozzle facing away from the other nozzles, wherein at least a portion of the guides exceeds an exit surface of the first nozzle, and at least a portion of the projections of the guides exceeding the exit surface is located on an ejection path of the first nozzle.
4. The evaporation source device according to claim 3, wherein at least a portion of a surface of the guide facing the first nozzle is flush with at least a portion of a surface of the first nozzle facing the guide;
preferably, the surface of the guide facing the first nozzle completely conforms to the surface of the first nozzle facing the guide.
5. The evaporation source apparatus according to claim 3, wherein a surface of the convex portion facing the first nozzle is a convex curved surface or a concave curved surface.
6. The evaporation source apparatus according to claim 3, wherein the surface of the guide facing away from the first nozzle is disposed perpendicular to the top surface of the crucible.
7. The evaporation source device according to claim 1, wherein the guide is a solid structure.
8. The evaporation source apparatus according to claim 1, wherein the crucible includes a crucible body and a crucible cover provided at an outlet of the crucible body, a top surface of the crucible is a surface of the crucible cover away from the crucible body, and a material of the guide is the same as a material of the crucible cover.
9. The evaporation source device according to claim 8, wherein the guide is integrally provided with the first nozzle;
preferably, the guide is integrally formed with the crucible cover;
preferably, a plurality of the nozzles are integrally formed with the crucible cover.
10. An evaporation apparatus comprising the evaporation source device according to any one of claims 1 to 9.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202210726317.8A CN115233160A (en) | 2022-06-23 | 2022-06-23 | Evaporation source device and evaporation equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202210726317.8A CN115233160A (en) | 2022-06-23 | 2022-06-23 | Evaporation source device and evaporation equipment |
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| CN115233160A true CN115233160A (en) | 2022-10-25 |
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| CN202210726317.8A Pending CN115233160A (en) | 2022-06-23 | 2022-06-23 | Evaporation source device and evaporation equipment |
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Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103710682A (en) * | 2012-10-09 | 2014-04-09 | 三星显示有限公司 | Depositing apparatus and method for manufacturing organic light emitting diode display using the same |
| US20170222191A1 (en) * | 2016-11-28 | 2017-08-03 | Shanghai Tianma AM-OLED Co., Ltd. | Vacuum evaporation device and method thereof, and organic light-emitting display panel |
| CN108977773A (en) * | 2018-08-24 | 2018-12-11 | 京东方科技集团股份有限公司 | Angle board component and evaporation coating device |
| CN110592538A (en) * | 2019-09-26 | 2019-12-20 | 京东方科技集团股份有限公司 | Evaporation device, evaporation source and nozzle |
| CN215251124U (en) * | 2021-07-20 | 2021-12-21 | 上海和辉光电股份有限公司 | Crucible, evaporation source and evaporation device |
| CN114231912A (en) * | 2021-12-30 | 2022-03-25 | 武汉天马微电子有限公司 | Evaporation device and control method thereof |
-
2022
- 2022-06-23 CN CN202210726317.8A patent/CN115233160A/en active Pending
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103710682A (en) * | 2012-10-09 | 2014-04-09 | 三星显示有限公司 | Depositing apparatus and method for manufacturing organic light emitting diode display using the same |
| US20170222191A1 (en) * | 2016-11-28 | 2017-08-03 | Shanghai Tianma AM-OLED Co., Ltd. | Vacuum evaporation device and method thereof, and organic light-emitting display panel |
| CN108977773A (en) * | 2018-08-24 | 2018-12-11 | 京东方科技集团股份有限公司 | Angle board component and evaporation coating device |
| CN110592538A (en) * | 2019-09-26 | 2019-12-20 | 京东方科技集团股份有限公司 | Evaporation device, evaporation source and nozzle |
| CN215251124U (en) * | 2021-07-20 | 2021-12-21 | 上海和辉光电股份有限公司 | Crucible, evaporation source and evaporation device |
| CN114231912A (en) * | 2021-12-30 | 2022-03-25 | 武汉天马微电子有限公司 | Evaporation device and control method thereof |
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