CN115192475A - Nail polish base material and preparation method thereof - Google Patents
Nail polish base material and preparation method thereof Download PDFInfo
- Publication number
- CN115192475A CN115192475A CN202210019754.6A CN202210019754A CN115192475A CN 115192475 A CN115192475 A CN 115192475A CN 202210019754 A CN202210019754 A CN 202210019754A CN 115192475 A CN115192475 A CN 115192475A
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- nail polish
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- 239000000463 material Substances 0.000 title claims abstract description 14
- 238000002360 preparation method Methods 0.000 title claims description 7
- 239000007788 liquid Substances 0.000 claims abstract description 35
- 239000002002 slurry Substances 0.000 claims abstract description 28
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 claims abstract description 26
- 239000001569 carbon dioxide Substances 0.000 claims abstract description 13
- 229910002092 carbon dioxide Inorganic materials 0.000 claims abstract description 13
- 238000002156 mixing Methods 0.000 claims abstract description 5
- 239000002585 base Substances 0.000 claims description 61
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 claims description 60
- 238000003756 stirring Methods 0.000 claims description 50
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 22
- ZFOZVQLOBQUTQQ-UHFFFAOYSA-N Tributyl citrate Chemical compound CCCCOC(=O)CC(O)(C(=O)OCCCC)CC(=O)OCCCC ZFOZVQLOBQUTQQ-UHFFFAOYSA-N 0.000 claims description 22
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 claims description 20
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 claims description 20
- SVPXDRXYRYOSEX-UHFFFAOYSA-N bentoquatam Chemical compound O.O=[Si]=O.O=[Al]O[Al]=O SVPXDRXYRYOSEX-UHFFFAOYSA-N 0.000 claims description 14
- 239000000440 bentonite Substances 0.000 claims description 12
- 229910000278 bentonite Inorganic materials 0.000 claims description 12
- 239000004925 Acrylic resin Substances 0.000 claims description 11
- 229920000178 Acrylic resin Polymers 0.000 claims description 11
- 239000000020 Nitrocellulose Substances 0.000 claims description 11
- 229920001220 nitrocellulos Polymers 0.000 claims description 11
- XBDQKXXYIPTUBI-UHFFFAOYSA-M Propionate Chemical compound CCC([O-])=O XBDQKXXYIPTUBI-UHFFFAOYSA-M 0.000 claims description 9
- KXKVLQRXCPHEJC-UHFFFAOYSA-N acetic acid trimethyl ester Natural products COC(C)=O KXKVLQRXCPHEJC-UHFFFAOYSA-N 0.000 claims description 9
- 239000004645 polyester resin Substances 0.000 claims description 8
- 229920001225 polyester resin Polymers 0.000 claims description 8
- 239000000243 solution Substances 0.000 claims description 6
- 238000000034 method Methods 0.000 claims description 5
- 239000002966 varnish Substances 0.000 claims description 5
- FJWGYAHXMCUOOM-QHOUIDNNSA-N [(2s,3r,4s,5r,6r)-2-[(2r,3r,4s,5r,6s)-4,5-dinitrooxy-2-(nitrooxymethyl)-6-[(2r,3r,4s,5r,6s)-4,5,6-trinitrooxy-2-(nitrooxymethyl)oxan-3-yl]oxyoxan-3-yl]oxy-3,5-dinitrooxy-6-(nitrooxymethyl)oxan-4-yl] nitrate Chemical compound O([C@@H]1O[C@@H]([C@H]([C@H](O[N+]([O-])=O)[C@H]1O[N+]([O-])=O)O[C@H]1[C@@H]([C@@H](O[N+]([O-])=O)[C@H](O[N+]([O-])=O)[C@@H](CO[N+]([O-])=O)O1)O[N+]([O-])=O)CO[N+](=O)[O-])[C@@H]1[C@@H](CO[N+]([O-])=O)O[C@@H](O[N+]([O-])=O)[C@H](O[N+]([O-])=O)[C@H]1O[N+]([O-])=O FJWGYAHXMCUOOM-QHOUIDNNSA-N 0.000 claims description 3
- 239000011259 mixed solution Substances 0.000 claims description 3
- 239000000853 adhesive Substances 0.000 abstract description 2
- 230000001070 adhesive effect Effects 0.000 abstract description 2
- 239000003086 colorant Substances 0.000 abstract description 2
- 238000010422 painting Methods 0.000 abstract description 2
- 239000000049 pigment Substances 0.000 abstract description 2
- 239000004014 plasticizer Substances 0.000 abstract description 2
- 231100000252 nontoxic Toxicity 0.000 abstract 1
- 230000003000 nontoxic effect Effects 0.000 abstract 1
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 6
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- 229910000271 hectorite Inorganic materials 0.000 description 2
- 230000002265 prevention Effects 0.000 description 2
- 238000007792 addition Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000005189 flocculation Methods 0.000 description 1
- 230000016615 flocculation Effects 0.000 description 1
- NLYAJNPCOHFWQQ-UHFFFAOYSA-N kaolin Chemical compound O.O.O=[Al]O[Si](=O)O[Si](=O)O[Al]=O NLYAJNPCOHFWQQ-UHFFFAOYSA-N 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 238000004062 sedimentation Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 231100000331 toxic Toxicity 0.000 description 1
- 230000002588 toxic effect Effects 0.000 description 1
- 230000001988 toxicity Effects 0.000 description 1
- 231100000419 toxicity Toxicity 0.000 description 1
Classifications
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
- A61K8/00—Cosmetics or similar toiletry preparations
- A61K8/18—Cosmetics or similar toiletry preparations characterised by the composition
- A61K8/72—Cosmetics or similar toiletry preparations characterised by the composition containing organic macromolecular compounds
- A61K8/84—Cosmetics or similar toiletry preparations characterised by the composition containing organic macromolecular compounds obtained by reactions otherwise than those involving only carbon-carbon unsaturated bonds
- A61K8/85—Polyesters
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
- A61K8/00—Cosmetics or similar toiletry preparations
- A61K8/18—Cosmetics or similar toiletry preparations characterised by the composition
- A61K8/19—Cosmetics or similar toiletry preparations characterised by the composition containing inorganic ingredients
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
- A61K8/00—Cosmetics or similar toiletry preparations
- A61K8/18—Cosmetics or similar toiletry preparations characterised by the composition
- A61K8/19—Cosmetics or similar toiletry preparations characterised by the composition containing inorganic ingredients
- A61K8/26—Aluminium; Compounds thereof
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
- A61K8/00—Cosmetics or similar toiletry preparations
- A61K8/18—Cosmetics or similar toiletry preparations characterised by the composition
- A61K8/30—Cosmetics or similar toiletry preparations characterised by the composition containing organic compounds
- A61K8/33—Cosmetics or similar toiletry preparations characterised by the composition containing organic compounds containing oxygen
- A61K8/34—Alcohols
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
- A61K8/00—Cosmetics or similar toiletry preparations
- A61K8/18—Cosmetics or similar toiletry preparations characterised by the composition
- A61K8/30—Cosmetics or similar toiletry preparations characterised by the composition containing organic compounds
- A61K8/33—Cosmetics or similar toiletry preparations characterised by the composition containing organic compounds containing oxygen
- A61K8/37—Esters of carboxylic acids
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
- A61K8/00—Cosmetics or similar toiletry preparations
- A61K8/18—Cosmetics or similar toiletry preparations characterised by the composition
- A61K8/72—Cosmetics or similar toiletry preparations characterised by the composition containing organic macromolecular compounds
- A61K8/73—Polysaccharides
- A61K8/731—Cellulose; Quaternized cellulose derivatives
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
- A61K8/00—Cosmetics or similar toiletry preparations
- A61K8/18—Cosmetics or similar toiletry preparations characterised by the composition
- A61K8/72—Cosmetics or similar toiletry preparations characterised by the composition containing organic macromolecular compounds
- A61K8/81—Cosmetics or similar toiletry preparations characterised by the composition containing organic macromolecular compounds obtained by reactions involving only carbon-to-carbon unsaturated bonds
- A61K8/8141—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
- A61K8/8147—Homopolymers or copolymers of acids; Metal or ammonium salts thereof, e.g. crotonic acid, (meth)acrylic acid; Compositions of derivatives of such polymers
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61Q—SPECIFIC USE OF COSMETICS OR SIMILAR TOILETRY PREPARATIONS
- A61Q3/00—Manicure or pedicure preparations
- A61Q3/02—Nail coatings
Abstract
A nail polish base stock, characterized in that: the nail polish base stock comprises base liquid, anti-settling slurry and gas-phase carbon dioxide; wherein, the content of the base liquid is 70 percent to 78 percent, the content of the anti-settling slurry is 21 percent to 29 percent, and the content of the gas-phase carbon dioxide is 1 percent to 2 percent. The nail polish base material is safe to use, non-toxic and harmless (benzene-free, toluene-free and formaldehyde-free plasticizer) and convenient to use, nail polish with various colors can be prepared by adding color-mixing pigment or color paste, and the product is easy to form a film, quick and easy to dry, uniform in painting, excellent in gloss, good in adhesive force and stable in storage, and is a very good oily nail polish base material.
Description
Technical Field
The invention belongs to the field of makeup products, and particularly relates to a nail polish base material and a preparation method thereof.
Background
The existing nail polish often contains toxic and harmful substances, such as organic matters like toluene, formaldehyde and the like, and has the defects that in the actual use process, the drying needs a long time, the painting is not easy to be uniform, the performance is unstable, the nail polish is easy to deteriorate after being stored, and the like.
Disclosure of Invention
The solvent-type nail polish base material is safe to use, free of toxicity and harm (benzene, toluene and formaldehyde are avoided, no harmful plasticizer is contained), the use is convenient, nail polish with various colors can be prepared by adding color-mixing pigment or color paste, and the product is easy to form a film, easy to dry, uniform to paint, excellent in gloss, good in adhesive force and stable to store and is a very good oil-based nail polish base material.
This patent includes the following:
a nail polish base stock, characterized in that: the nail polish base stock comprises base liquid, anti-settling slurry and gas-phase carbon dioxide;
wherein the content of the base liquid is 70-78%, the content of the anti-settling slurry is 21-29%, and the content of the gas-phase carbon dioxide is 1-2%;
the base liquid comprises a first component, nitrocellulose, tributyl citrate, acrylic resin and polyester resin; in the base liquid, the content of the first component is 50-60%, the content of nitrocellulose is 5-15%, the content of tributyl citrate is 3-7%, the content of acrylic resin is 15-25%, and the content of polyester resin is 5-15%;
the first component comprises butyl acetate, ethyl acetate and methyl acetate, wherein in the base solution, the content of butyl acetate is 16-20%, the content of ethyl acetate is 20-30%, and the content of methyl acetate is 10-14%;
the anti-settling slurry comprises butyl acetate, ethyl acetate, bentonite, ethanol and base liquid; in the anti-settling slurry, the content of butyl acetate is 16-20%, the content of ethyl acetate is 25-35%, the content of bentonite is 6-10%, the content of ethanol is 2-6%, and the content of base liquid is 35-45%.
Preferably, the content of the base liquid is 74%, the content of the anti-settling slurry is 25%, and the content of the gas-phase carbon dioxide is 1%.
Preferably, said nail varnish base is characterized in that: in the base liquid, the content of the first component is 55%, the content of the nitrocellulose is 10%, the content of the tributyl citrate is 5%, the content of the acrylic resin is 20%, and the content of the polyester resin is 10%.
Preferably, the nail varnish base stock is characterized in that: in the anti-settling slurry, the content of butyl acetate is 18%, the content of ethyl acetate is 30%, the content of bentonite is 8%, the content of ethanol is 4%, and the content of a base liquid is 40%.
A method for preparing nail polish base stock, which is characterized in that: the configuration method comprises the following steps:
the first step is as follows: preparing base liquid
1. Adding 55 mixed solution of 16-20% butyl acetate, 20-30% ethyl acetate and 10-14% methyl acetate in unit weight into a stirring kettle, adding 10 nitrocellulose in unit weight into the stirring kettle, and stirring at the stirring speed: time 1000-2000 n/min: 10min;
2. respectively adding 5 unit weight of tributyl citrate, 20 unit weight of acrylic resin and 10 unit weight of polyacetate, and stirring at a speed of: 3000 min: 15min; obtaining a base liquid;
the second step is as follows: preparation of anti-settling slurry
1. Adding 18 unit weights of butyl acetate and 30 unit weights of ethyl acetate into a stirring kettle, adding 8 unit weights of bentonite, stirring at a stirring speed: 3000n/min, time: 10min;
2. adding 4 ethanol with unit weight, stirring at 4000n/min for 5min;
3. adding the 40 base solutions produced in the first step in unit weight, further stirring at a stirring speed: 4000n/min, time: obtaining anti-settling slurry after 20min;
the third step: mixing the above products to obtain nail polish base material
1. Adding 74 base liquids with unit weight into a stirring kettle, introducing 1 gas-phase carbon dioxide with unit weight, stirring at a stirring speed: time 3000 n/min: 10min;
2. adding 25 anti-settling slurries with unit weight, continuing stirring at a stirring speed: time 4000 n/min: 20min;
3. adjusting the rotating speed to 500-1000n/min, and stirring for time: and 5min, defoaming to obtain the nail polish base material.
The invention uses Bentonite 27-hectorite organic modified bentonite to solve the problems of sedimentation prevention and flocculation prevention and effectively solve the problem of long-term storage stability.
Detailed Description
The present invention will be described in further detail with reference to examples, which are illustrative of the present invention and are not to be construed as being limited thereto.
Example (b):
a nail polish base stock comprises base liquid, anti-settling slurry and gas phase carbon dioxide;
wherein the content of the base liquid is 74 percent, the content of the anti-settling slurry is 25 percent, and the content of the gas-phase carbon dioxide is 1 percent;
the base liquid comprises a first component, nitrocellulose, tributyl citrate, acrylic resin and polyester resin; in the base liquid, the content of the first component is 55%, the content of nitrocellulose is 10%, the content of tributyl citrate is 5%, the content of acrylic resin is 20%, and the content of polyester resin is 10%;
the first component comprises butyl acetate, ethyl acetate and methyl acetate, wherein in the base liquid, the content of butyl acetate is 18 percent, the content of ethyl acetate is 25 percent, and the content of methyl acetate is 12 percent;
the anti-settling slurry comprises butyl acetate, ethyl acetate, bentonite, ethanol and base liquid; in the anti-settling slurry, the content of butyl acetate is 18%, the content of ethyl acetate is 30%, the content of bentonite is 8%, the content of ethanol is 4%, and the content of the base liquid is 40%.
The specific preparation process comprises the following steps:
the first step is as follows: preparing base liquid
1. Adding 55 mixed solutions of 16-20% butyl acetate, 20-30% ethyl acetate and 10-14% methyl acetate in unit weight into a stirring kettle, adding 10 nitrocellulose in unit weight into the stirring kettle, and stirring at a speed that: time 1000-2000 n/min: 10min;
2. respectively adding 5 unit weight of tributyl citrate, 20 unit weight of acrylic resin and 10 unit weight of polyacetate, and stirring at a speed of: 3000 min: 15min; obtaining a base liquid;
the second step is as follows: preparation of anti-settling slurry
1. Adding 18 unit weights of butyl acetate and 30 unit weights of ethyl acetate into a stirring kettle, adding 8 unit weights of bentonite, stirring at a stirring speed: 3000n/min, time: 10min;
2. adding 4 ethanol with unit weight, stirring at 4000n/min for 5min;
3. adding the 40 base solutions produced in the first step in unit weight, further stirring at a stirring speed: 4000n/min, time: obtaining anti-settling slurry after 20min;
the third step: mixing the above products to obtain nail polish base material
1. Adding 74 base liquids with unit weight into a stirring kettle, introducing 1 gas-phase carbon dioxide with unit weight, stirring at a stirring speed: time 3000 n/min: 10min;
2. adding 25 anti-settling slurries with unit weight, continuing stirring at a stirring speed: 4000n/min time: 20min;
3. regulating the rotating speed to 500-1000n/min, stirring for time: and defoaming for 5min to obtain the nail polish base material.
In addition, it should be noted that the names and the like of the components of the specific examples described in the present specification may be different. Equivalent or simple changes made according to the characteristics and principles of the invention, including the use of Bentone 27-hectorite organically modified bentonite for preparing the anti-settling slurry, are included in the protection scope of the invention. Various modifications, additions and substitutions for the specific embodiments described may be made by those skilled in the art without departing from the scope of the invention as defined in the accompanying claims.
Claims (5)
1. A nail polish base stock, characterized in that: the nail polish base stock comprises base liquid, anti-settling slurry and gas-phase carbon dioxide;
wherein the content of the base liquid is 70-78%, the content of the anti-settling slurry is 21-29%, and the content of the gas-phase carbon dioxide is 1-2%;
the base liquid comprises a first component, nitrocellulose, tributyl citrate, acrylic resin and polyester resin; in the base liquid, the content of the first component is 50-60%, the content of nitrocellulose is 5-15%, the content of tributyl citrate is 3-7%, the content of acrylic resin is 15-25%, and the content of polyester resin is 5-15%;
the first component comprises butyl acetate, ethyl acetate and methyl acetate, wherein in the base solution, the content of butyl acetate is 16-20%, the content of ethyl acetate is 20-30%, and the content of methyl acetate is 10-14%;
the anti-settling slurry comprises butyl acetate, ethyl acetate, bentonite, ethanol and base liquid; in the anti-settling slurry, the content of butyl acetate is 16-20%, the content of ethyl acetate is 25-35%, the content of bentonite is 6-10%, the content of ethanol is 2-6%, and the content of base liquid is 35-45%.
2. Nail varnish base according to claim 1, characterised in that: the content of the base liquid is 74%, the content of the anti-settling slurry is 25%, and the content of the gas-phase carbon dioxide is 1%.
3. Nail varnish base according to claim 2, characterised in that: in the base solution, the content of the first component is 55%, the content of nitrocellulose is 10%, the content of tributyl citrate is 5%, the content of acrylic resin is 20%, and the content of polyester resin is 10%.
4. Nail varnish base according to claim 2, characterised in that: in the anti-settling slurry, the content of butyl acetate is 18%, the content of ethyl acetate is 30%, the content of bentonite is 8%, the content of ethanol is 4%, and the content of a base liquid is 40%.
5. A method for preparing a nail polish base material is characterized by comprising the following steps: the configuration method comprises the following steps:
the first step is as follows: preparing base liquid
1. Adding 55 mixed solution of 16-20% butyl acetate, 20-30% ethyl acetate and 10-14% methyl acetate in unit weight into a stirring kettle, adding 10 nitrocellulose in unit weight into the stirring kettle, and stirring at the stirring speed: time 1000-2000 n/min: 10min;
2. respectively adding 5 unit weights of tributyl citrate, 20 unit weights of acrylic resin and 10 unit weights of polyacetate, and stirring at a speed of: 3000 min: 15min; obtaining a base solution;
the second step is as follows: preparation of anti-settling slurry
1. Adding 18 unit weights of butyl acetate and 30 unit weights of ethyl acetate into a stirring kettle, adding 8 unit weights of bentonite, stirring at a stirring speed: 3000n/min, time: 10min;
2. adding 4 ethanol with unit weight, stirring at 4000n/min for 5min;
3. adding the 40 base liquids produced in the step one in unit weight, further stirring at the stirring speed: 4000n/min, time: obtaining anti-settling slurry after 20min;
the third step: mixing the above products to obtain nail polish base material
1. Adding 74 base liquids with unit weight into a stirring kettle, introducing 1 gas-phase carbon dioxide with unit weight, stirring at a stirring speed: time 3000 n/min: 10min;
2. adding 25 anti-settling slurries with unit weight, continuing stirring at a stirring speed: time 4000 n/min: 20min;
3. adjusting the rotating speed to 500-1000n/min, and stirring for time: and defoaming for 5min to obtain the nail polish base material.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202210019754.6A CN115192475A (en) | 2022-01-10 | 2022-01-10 | Nail polish base material and preparation method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202210019754.6A CN115192475A (en) | 2022-01-10 | 2022-01-10 | Nail polish base material and preparation method thereof |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN115192475A true CN115192475A (en) | 2022-10-18 |
Family
ID=83574192
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202210019754.6A Pending CN115192475A (en) | 2022-01-10 | 2022-01-10 | Nail polish base material and preparation method thereof |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN115192475A (en) |
Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6177065B1 (en) * | 1998-10-15 | 2001-01-23 | Taisei Chemical Industries, Ltd. | Method for producing aqueous nail enamel composition |
| CN1362874A (en) * | 2000-03-01 | 2002-08-07 | 株式会社资生堂 | Compositions forming film soldifying in water and nail-care products and nail-care method with use of same |
| US20050202982A1 (en) * | 2004-03-15 | 2005-09-15 | Daniel Perlman | pH-buffered alkylene carbonate nail polish and paint remover |
| CN1767806A (en) * | 2003-03-28 | 2006-05-03 | 纳幕尔杜邦公司 | Nail enamel composition and preparation method thereof |
| CN104997649A (en) * | 2015-06-29 | 2015-10-28 | 金华市名仕科技股份有限公司 | Nail polish |
| CN108299929A (en) * | 2016-09-06 | 2018-07-20 | 昭和电工气体产品株式会社 | Coating composition suitable for carbon dioxide application |
| CN109125100A (en) * | 2018-10-29 | 2019-01-04 | 蔡银中 | A kind of powdered nail polish |
| CN109431874A (en) * | 2019-01-02 | 2019-03-08 | 中山市美源化妆品有限公司 | A kind of metal nail polish and its manufacturing method |
-
2022
- 2022-01-10 CN CN202210019754.6A patent/CN115192475A/en active Pending
Patent Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6177065B1 (en) * | 1998-10-15 | 2001-01-23 | Taisei Chemical Industries, Ltd. | Method for producing aqueous nail enamel composition |
| CN1362874A (en) * | 2000-03-01 | 2002-08-07 | 株式会社资生堂 | Compositions forming film soldifying in water and nail-care products and nail-care method with use of same |
| CN1767806A (en) * | 2003-03-28 | 2006-05-03 | 纳幕尔杜邦公司 | Nail enamel composition and preparation method thereof |
| US20050202982A1 (en) * | 2004-03-15 | 2005-09-15 | Daniel Perlman | pH-buffered alkylene carbonate nail polish and paint remover |
| CN104997649A (en) * | 2015-06-29 | 2015-10-28 | 金华市名仕科技股份有限公司 | Nail polish |
| CN108299929A (en) * | 2016-09-06 | 2018-07-20 | 昭和电工气体产品株式会社 | Coating composition suitable for carbon dioxide application |
| CN109125100A (en) * | 2018-10-29 | 2019-01-04 | 蔡银中 | A kind of powdered nail polish |
| CN109431874A (en) * | 2019-01-02 | 2019-03-08 | 中山市美源化妆品有限公司 | A kind of metal nail polish and its manufacturing method |
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