CN115058045A - 一种稳定型镭射pva水转印膜 - Google Patents

一种稳定型镭射pva水转印膜 Download PDF

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CN115058045A
CN115058045A CN202210863878.2A CN202210863878A CN115058045A CN 115058045 A CN115058045 A CN 115058045A CN 202210863878 A CN202210863878 A CN 202210863878A CN 115058045 A CN115058045 A CN 115058045A
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pva
flame
polyvinyl alcohol
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倪少华
罗加祥
黎文丰
赵正东
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Shishi Jinyuan Sporting Goods Co ltd
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Abstract

本发明公开了一种稳定型镭射pva水转印膜，所述稳定性镭射pva水转印膜包括聚乙烯醇膜层和阻燃pva膜层，所述聚乙烯醇膜层由以下重量百分数计的组分组成：聚乙烯醇粉、石蜡、甘油、增塑剂、消泡剂和水，所述阻燃pva膜层包括以下重量份的组分：环糊精、聚氧乙烯脂肪醇醚、阻燃剂、PVA树脂份、纳米二氧化硅粉末份、聚二甲基硅氧烷和水，以聚乙烯醇膜层作为基底进行负载，阻燃PVA膜层提高了水转印膜的平整度和耐热性，使得热压形成的光油层更加平整；该数码打印水转印膜能够展现良好平整的图案，而且耐热性、机械强度良好，保存寿命长。

Description

一种稳定型镭射pva水转印膜
技术领域
本发明涉及水转印膜领域，尤其涉及一种稳定型镭射pva水转印膜。
背景技术
水转印技术是超越任何印像技术方式的最新数码影像技术，它是运用纳米材料制作的专用纸张和特殊环保墨水，实现在任何固体介质上印制图像。
本申请在现有技术下进行改进，现有技术中，pva水转印膜制备后其在制备时未加有阻燃剂或耐热材料，使得制得的pva水转印膜的阻燃性较低。
发明内容
本发明的目的是为了解决现有技术中存在的缺点，而提出的一种稳定型镭射pva水转印膜。
为了实现上述目的，本发明采用了如下技术方案：
一种稳定型镭射pva水转印膜，所述稳定性镭射pva水转印膜包括聚乙烯醇膜层和阻燃pva膜层，所述聚乙烯醇膜层由以下重量百分数计的组分组成：聚乙烯醇粉10-15wt％、石蜡0.6-1wt％、甘油1.8-2.4wt％、增塑剂0.8-1.2wt％、消泡剂0.3-0.6wt％和水70-85wt％，所述阻燃pva膜层包括以下重量份的组分：环糊精3-6份、聚氧乙烯脂肪醇醚0.5-2份、阻燃剂0.2-1.5份、PVA树脂15-25份、纳米二氧化硅粉末2-5份、聚二甲基硅氧烷0.1-0.2份和水50-70份。
一种稳定型镭射pva水转印膜的制备工艺，所述稳定型镭射pva水转印膜的制备工艺包括以下步骤：S1：将环糊精、聚氧乙烯脂肪醇醚、阻燃剂和水计入至反应釜内，加热，之后加入PVA树脂，搅拌至完全溶解，加入纳米二氧化硅粉末和聚二甲基硅氧烷，搅拌混合后，静置消泡；S2：将聚乙烯醇粉、石蜡、甘油、增塑剂、消泡剂和水加入至反应釜内搅拌溶解，对反应釜内部进行加热加压使其内部溶液充分溶解，通过涂布机加工制得聚乙烯醇薄膜；S3：在聚乙烯醇薄膜的表面涂覆步骤S1中制得的阻燃PVA溶液，通过热压制得阻燃PVA膜层，即制得稳定型镭射pva水转印膜。
作为本发明进一步的方案：所述阻燃PVA膜层厚度为10-15μm。
作为本发明进一步的方案：所述步骤S3中热压成型时控制含湿量为4-6％。
本发明具有如下有益效果：
本发明中，以聚乙烯醇膜层作为基底进行负载，阻燃PVA膜层提高了水转印膜的平整度和耐热性，使得热压形成的光油层更加平整；该数码打印水转印膜能够展现良好平整的图案，而且耐热性、机械强度良好，保存寿命长。
具体实施方式
下面将结合本发明实施例，对本发明实施例中的技术方案进行清楚、完整地描述，显然，所描述的实施例仅仅是本发明一部分实施例，而不是全部的实施例。基于本发明中的实施例，本领域普通技术人员在没有做出创造性劳动前提下所获得的所有其他实施例，都属于本发明保护的范围。
实施例一
一种稳定型镭射pva水转印膜，稳定性镭射pva水转印膜包括聚乙烯醇膜层和阻燃pva膜层，聚乙烯醇膜层由以下重量百分数计的组分组成：聚乙烯醇粉10wt％、石蜡0.6wt％、甘油1.8wt％、增塑剂0.8wt％、消泡剂0.3wt％和水70wt％，阻燃pva膜层包括以下重量份的组分：环糊精3份、聚氧乙烯脂肪醇醚0.5份、阻燃剂0.2份、PVA树脂15份、纳米二氧化硅粉末2份、聚二甲基硅氧烷0.1份和水50份。
一种稳定型镭射pva水转印膜的制备工艺，稳定型镭射pva水转印膜的制备工艺包括以下步骤：
S1：将环糊精、聚氧乙烯脂肪醇醚、阻燃剂和水计入至反应釜内，加热，之后加入PVA树脂，搅拌至完全溶解，加入纳米二氧化硅粉末和聚二甲基硅氧烷，搅拌混合后，静置消泡；
S2：将聚乙烯醇粉、石蜡、甘油、增塑剂、消泡剂和水加入至反应釜内搅拌溶解，对反应釜内部进行加热加压使其内部溶液充分溶解，通过涂布机加工制得聚乙烯醇薄膜；
S3：在聚乙烯醇薄膜的表面涂覆步骤S1中制得的阻燃PVA溶液，通过热压制得阻燃PVA膜层，热压成型时控制含湿量为4％，阻燃PVA膜层厚度为10μm，即制得稳定型镭射pva水转印膜。
实施例二
一种稳定型镭射pva水转印膜，稳定性镭射pva水转印膜包括聚乙烯醇膜层和阻燃pva膜层，聚乙烯醇膜层由以下重量百分数计的组分组成：聚乙烯醇粉12wt％、石蜡0.8wt％、甘油2wt％、增塑剂1wt％、消泡剂0.5wt％和水80wt％，阻燃pva膜层包括以下重量份的组分：环糊精4份、聚氧乙烯脂肪醇醚1份、阻燃剂1份、PVA树脂18份、纳米二氧化硅粉末3份、聚二甲基硅氧烷0.1份和水60份。
一种稳定型镭射pva水转印膜的制备工艺，稳定型镭射pva水转印膜的制备工艺包括以下步骤：
S1：将环糊精、聚氧乙烯脂肪醇醚、阻燃剂和水计入至反应釜内，加热，之后加入PVA树脂，搅拌至完全溶解，加入纳米二氧化硅粉末和聚二甲基硅氧烷，搅拌混合后，静置消泡；
S2：将聚乙烯醇粉、石蜡、甘油、增塑剂、消泡剂和水加入至反应釜内搅拌溶解，对反应釜内部进行加热加压使其内部溶液充分溶解，通过涂布机加工制得聚乙烯醇薄膜；
S3：在聚乙烯醇薄膜的表面涂覆步骤S1中制得的阻燃PVA溶液，通过热压制得阻燃PVA膜层，热压成型时控制含湿量为6％，阻燃PVA膜层厚度为15μm，即制得稳定型镭射pva水转印膜。
实施例三
一种稳定型镭射pva水转印膜，稳定性镭射pva水转印膜包括聚乙烯醇膜层和阻燃pva膜层，聚乙烯醇膜层由以下重量百分数计的组分组成：聚乙烯醇粉14wt％、石蜡0.6wt％、甘油1.8wt％、增塑剂0.9wt％、消泡剂0.4wt％和水85wt％，阻燃pva膜层包括以下重量份的组分：环糊精5份、聚氧乙烯脂肪醇醚1.2份、阻燃剂0.8份、PVA树脂17份、纳米二氧化硅粉末4份、聚二甲基硅氧烷0.2份和水60份。
一种稳定型镭射pva水转印膜的制备工艺，稳定型镭射pva水转印膜的制备工艺包括以下步骤：
S1：将环糊精、聚氧乙烯脂肪醇醚、阻燃剂和水计入至反应釜内，加热，之后加入PVA树脂，搅拌至完全溶解，加入纳米二氧化硅粉末和聚二甲基硅氧烷，搅拌混合后，静置消泡；
S2：将聚乙烯醇粉、石蜡、甘油、增塑剂、消泡剂和水加入至反应釜内搅拌溶解，对反应釜内部进行加热加压使其内部溶液充分溶解，通过涂布机加工制得聚乙烯醇薄膜；
S3：在聚乙烯醇薄膜的表面涂覆步骤S1中制得的阻燃PVA溶液，通过热压制得阻燃PVA膜层，热压成型时控制含湿量为6％，阻燃PVA膜层厚度为15μm，即制得稳定型镭射pva水转印膜。
实施例四
一种稳定型镭射pva水转印膜，稳定性镭射pva水转印膜包括聚乙烯醇膜层和阻燃pva膜层，聚乙烯醇膜层由以下重量百分数计的组分组成：聚乙烯醇粉12wt％、石蜡0.7wt％、甘油2.2wt％、增塑剂1wt％、消泡剂0.6wt％和水85wt％，阻燃pva膜层包括以下重量份的组分：环糊精6份、聚氧乙烯脂肪醇醚2份、阻燃剂1.5份、PVA树脂25份、纳米二氧化硅粉末5份、聚二甲基硅氧烷0.2份和水70份。
一种稳定型镭射pva水转印膜的制备工艺，稳定型镭射pva水转印膜的制备工艺包括以下步骤：
S1：将环糊精、聚氧乙烯脂肪醇醚、阻燃剂和水计入至反应釜内，加热，之后加入PVA树脂，搅拌至完全溶解，加入纳米二氧化硅粉末和聚二甲基硅氧烷，搅拌混合后，静置消泡；
S2：将聚乙烯醇粉、石蜡、甘油、增塑剂、消泡剂和水加入至反应釜内搅拌溶解，对反应釜内部进行加热加压使其内部溶液充分溶解，通过涂布机加工制得聚乙烯醇薄膜；
S3：在聚乙烯醇薄膜的表面涂覆步骤S1中制得的阻燃PVA溶液，通过热压制得阻燃PVA膜层，热压成型时控制含湿量为6％，阻燃PVA膜层厚度为10μm，即制得稳定型镭射pva水转印膜。
实施例五
一种稳定型镭射pva水转印膜，稳定性镭射pva水转印膜包括聚乙烯醇膜层和阻燃pva膜层，聚乙烯醇膜层由以下重量百分数计的组分组成：聚乙烯醇粉15wt％、石蜡1wt％、甘油2.4wt％、增塑剂1.2wt％、消泡剂0.6wt％和水85wt％，阻燃pva膜层包括以下重量份的组分：环糊精6份、聚氧乙烯脂肪醇醚2份、阻燃剂1.5份、PVA树脂25份、纳米二氧化硅粉末5份、聚二甲基硅氧烷0.2份和水70份。
一种稳定型镭射pva水转印膜的制备工艺，稳定型镭射pva水转印膜的制备工艺包括以下步骤：
S1：将环糊精、聚氧乙烯脂肪醇醚、阻燃剂和水计入至反应釜内，加热，之后加入PVA树脂，搅拌至完全溶解，加入纳米二氧化硅粉末和聚二甲基硅氧烷，搅拌混合后，静置消泡；
S2：将聚乙烯醇粉、石蜡、甘油、增塑剂、消泡剂和水加入至反应釜内搅拌溶解，对反应釜内部进行加热加压使其内部溶液充分溶解，通过涂布机加工制得聚乙烯醇薄膜；
S3：在聚乙烯醇薄膜的表面涂覆步骤S1中制得的阻燃PVA溶液，通过热压制得阻燃PVA膜层，热压成型时控制含湿量为6％，阻燃PVA膜层厚度为15μm，即制得稳定型镭射pva水转印膜。
最后应说明的是：以上所述仅为本发明的优选实施例而已，并不用于限制本发明，尽管参照前述实施例对本发明进行了详细的说明，对于本领域的技术人员来说，其依然可以对前述各实施例所记载的技术方案进行修改，或者对其中部分技术特征进行等同替换，凡在本发明的精神和原则之内，所作的任何修改、等同替换、改进等，均应包含在本发明的保护范围之内。

Claims (4)

1.一种稳定型镭射pva水转印膜，其特征在于：所述稳定性镭射pva水转印膜包括聚乙烯醇膜层和阻燃pva膜层，所述聚乙烯醇膜层由以下重量百分数计的组分组成：聚乙烯醇粉10-15wt％、石蜡0.6-1wt％、甘油1.8-2.4wt％、增塑剂0.8-1.2wt％、消泡剂0.3-0.6wt％和水70-85wt％，所述阻燃pva膜层包括以下重量份的组分：环糊精3-6份、聚氧乙烯脂肪醇醚0.5-2份、阻燃剂0.2-1.5份、PVA树脂15-25份、纳米二氧化硅粉末2-5份、聚二甲基硅氧烷0.1-0.2份和水50-70份。
2.一种稳定型镭射pva水转印膜的制备工艺，其特征在于：所述稳定型镭射pva水转印膜的制备工艺包括以下步骤：
S1：将环糊精、聚氧乙烯脂肪醇醚、阻燃剂和水计入至反应釜内，加热，之后加入PVA树脂，搅拌至完全溶解，加入纳米二氧化硅粉末和聚二甲基硅氧烷，搅拌混合后，静置消泡；
S2：将聚乙烯醇粉、石蜡、甘油、增塑剂、消泡剂和水加入至反应釜内搅拌溶解，对反应釜内部进行加热加压使其内部溶液充分溶解，通过涂布机加工制得聚乙烯醇薄膜；
S3：在聚乙烯醇薄膜的表面涂覆步骤S1中制得的阻燃PVA溶液，通过热压制得阻燃PVA膜层，即制得稳定型镭射pva水转印膜。
3.根据权利要求2所述的一种稳定型镭射pva水转印膜的制备工艺，其特征在于：所述阻燃PVA膜层厚度为10-15μm。
4.根据权利要求2所述的一种稳定型镭射pva水转印膜的制备工艺，其特征在于：所述步骤S3中热压成型时控制含湿量为4-6％。
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JP2009214420A (ja) * 2008-03-11 2009-09-24 Dainippon Printing Co Ltd 水圧転写用シート、及び水圧転写方法
WO2010061790A1 (ja) * 2008-11-28 2010-06-03 株式会社クラレ 水圧転写フィルムの製造方法
CN110328980A (zh) * 2019-08-26 2019-10-15 泉州颖彩彩印有限公司 一种镭射复合型水转印膜的印刷层及其制备方法
CN112757801A (zh) * 2020-12-19 2021-05-07 马鞍山悠思电子科技有限公司 一种数码打印水转印膜及其制备方法

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JP2009214420A (ja) * 2008-03-11 2009-09-24 Dainippon Printing Co Ltd 水圧転写用シート、及び水圧転写方法
WO2010061790A1 (ja) * 2008-11-28 2010-06-03 株式会社クラレ 水圧転写フィルムの製造方法
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