CN115055435A - Water jet cleaning system utilizing ultrahigh water pressure and carbon dioxide - Google Patents
Water jet cleaning system utilizing ultrahigh water pressure and carbon dioxide Download PDFInfo
- Publication number
- CN115055435A CN115055435A CN202210805632.XA CN202210805632A CN115055435A CN 115055435 A CN115055435 A CN 115055435A CN 202210805632 A CN202210805632 A CN 202210805632A CN 115055435 A CN115055435 A CN 115055435A
- Authority
- CN
- China
- Prior art keywords
- pressure
- water
- deionized water
- water supply
- mixed liquid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 title claims abstract description 126
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 title claims abstract description 94
- 229910002092 carbon dioxide Inorganic materials 0.000 title claims abstract description 64
- 238000004140 cleaning Methods 0.000 title claims abstract description 22
- 239000001569 carbon dioxide Substances 0.000 title claims abstract description 13
- 239000007788 liquid Substances 0.000 claims abstract description 70
- 239000008367 deionised water Substances 0.000 claims abstract description 34
- 229910021641 deionized water Inorganic materials 0.000 claims abstract description 34
- 238000002156 mixing Methods 0.000 claims abstract description 17
- 230000001105 regulatory effect Effects 0.000 claims description 6
- 239000011521 glass Substances 0.000 abstract description 17
- 239000000758 substrate Substances 0.000 abstract description 15
- 239000003344 environmental pollutant Substances 0.000 abstract description 7
- 231100000719 pollutant Toxicity 0.000 abstract description 7
- 239000002245 particle Substances 0.000 abstract description 6
- 230000005611 electricity Effects 0.000 abstract description 5
- 230000003068 static effect Effects 0.000 abstract description 5
- 239000000428 dust Substances 0.000 abstract description 3
- 230000000694 effects Effects 0.000 abstract description 3
- 239000007789 gas Substances 0.000 description 16
- 239000004973 liquid crystal related substance Substances 0.000 description 11
- 150000002500 ions Chemical class 0.000 description 7
- 238000000034 method Methods 0.000 description 4
- 238000001914 filtration Methods 0.000 description 3
- 230000002159 abnormal effect Effects 0.000 description 2
- 238000000889 atomisation Methods 0.000 description 2
- 230000003139 buffering effect Effects 0.000 description 2
- 230000003749 cleanliness Effects 0.000 description 2
- 230000005684 electric field Effects 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 238000002347 injection Methods 0.000 description 2
- 239000007924 injection Substances 0.000 description 2
- 230000000670 limiting effect Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000012544 monitoring process Methods 0.000 description 2
- 230000002829 reductive effect Effects 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 238000005507 spraying Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- YZCKVEUIGOORGS-IGMARMGPSA-N Protium Chemical compound [1H] YZCKVEUIGOORGS-IGMARMGPSA-N 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 230000001276 controlling effect Effects 0.000 description 1
- 239000008358 core component Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000003912 environmental pollution Methods 0.000 description 1
- 238000011010 flushing procedure Methods 0.000 description 1
- -1 hydrogen carbonate radical ions Chemical class 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000036961 partial effect Effects 0.000 description 1
- 230000000750 progressive effect Effects 0.000 description 1
- 230000002441 reversible effect Effects 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 239000008400 supply water Substances 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/02—Cleaning by the force of jets or sprays
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B11/00—Cleaning flexible or delicate articles by methods or apparatus specially adapted thereto
- B08B11/04—Cleaning flexible or delicate articles by methods or apparatus specially adapted thereto specially adapted for plate glass, e.g. prior to manufacture of windshields
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B13/00—Accessories or details of general applicability for machines or apparatus for cleaning
Landscapes
- Cleaning Or Drying Semiconductors (AREA)
Abstract
The invention discloses a water jet cleaning system utilizing ultrahigh water pressure and carbon dioxide, which comprises a deionized water supply system and the like, wherein a CO2 and water mixing structure comprises a Venturi tube type gas-liquid mixer; the supply port of the CO2 supply system is connected with the throat part of the Venturi tube type gas-liquid mixer; one end of the Venturi tube type gas-liquid mixer is provided with a deionized water supply inlet, and the other end is provided with a mixed liquid ejection outlet; an ion concentration meter and a high-pressure pump are sequentially arranged on an external circulation pipeline connected with the mixed liquid ejection port, an outlet of the high-pressure pump is respectively connected with a main pipeline and a branched liquid discharge pipeline, a first pressure gauge, a first filter, a second pressure gauge and a flowmeter are sequentially arranged on the main pipeline, and the tail end of the main pipeline is connected with a nozzle part. The mixed liquid sprayed by the invention can remove static electricity on the glass substrate, so that pollutants such as dust and the like are not adsorbed on the glass substrate any more; the mixed liquid can be sprayed through ultrahigh pressure to effectively clean pollutants with the particle size of 5-10um, so that the maximum cleaning effect is realized.
Description
Technical Field
The present invention relates to the field of product cleaning, and more particularly, to a water jet cleaning system utilizing ultra-high water pressure and carbon dioxide.
Background
The Liquid Crystal Display (LCD) mainly comprises two glass substrates provided with transparent electrodes, polarizers arranged on the outer sides of the two glass substrates, alignment films and liquid crystal sandwiched between the alignment films. When the glass substrate is not electrified, liquid crystal molecules between the alignment films do not rotate, light rays can smoothly pass through the liquid crystal layer and the polarizer, and the light rays are displayed in a bright state; when the glass substrate is connected to an external power source, liquid crystal molecules rotate under the action of an electric field, light cannot pass through the liquid crystal layer and the polarizer, and the display is in a dark state. An electric field is designed for the area of the glass substrate where the pattern needs to be displayed, and the pattern needing to be displayed can be obtained by controlling the rotation of the liquid crystal molecules in the pattern area.
With the high integration of liquid crystal displays, it is important to control contaminants and environmental pollution during the manufacturing process thereof in order to control product yield and product quality. Therefore, a cleaning step for removing unnecessary substances and particles on the liquid crystal display is necessary in the process of manufacturing the liquid crystal display. Furthermore, in 80% of the current lcds, the glass substrate defect is caused by particles, so the cleaning step is more important. But the conventional cleaning device can not effectively clean the pollutants with the particle size of 5-10 um. Meanwhile, the glass substrate can generate static electricity due to friction and other reasons in the conveying process, so that pollutants are adsorbed on the surface of the glass and are not easy to separate from the glass, and secondary pollution is caused to the glass substrate.
Therefore, it is necessary to develop a high-performance cleaning tool for FPD products such as liquid crystal displays.
Disclosure of Invention
In view of the above, the present invention provides a water jet cleaning system using ultra-high water pressure and carbon dioxide, and the specific technical solution is as follows:
a water jet cleaning system utilizing ultrahigh water pressure and carbon dioxide comprises a deionized water supply system, a CO2 supply system, a CO2 and water mixing structure, an ion concentration meter, a high-pressure pump, a liquid discharge pipeline, a first filter, a flowmeter and a nozzle part, wherein the CO2 and water mixing structure comprises a Venturi tube type gas-liquid mixer, and the position with the smallest cross-sectional area of the Venturi tube type gas-liquid mixer is a throat part; a supply port of the CO2 supply system is connected with the throat part; one end of the Venturi tube type gas-liquid mixer is provided with a deionized water supply inlet, the other end of the Venturi tube type gas-liquid mixer is provided with a mixed liquid ejection outlet, a first one-way valve is installed at the deionized water supply inlet, and a buffer part is connected between the mixed liquid ejection outlet and the throat pipe part; the supply port of the deionized water supply system is connected with the deionized water supply inlet; the ion concentration meter and the high-pressure pump are sequentially installed on an external circulation pipeline connected with the mixed liquid ejection port along the flowing direction of the mixed liquid, the outlet of the high-pressure pump is respectively connected with a main pipeline and a branched liquid discharge pipeline, a first pressure gauge, the first filter, a second pressure gauge and the flowmeter are sequentially installed on the main pipeline along the flowing direction of the mixed liquid, and the tail end of the main pipeline is connected with the nozzle part; and a safety valve is arranged on the liquid discharge pipeline.
By adopting the technical scheme, the CO2 and the deionized water are fully mixed in the CO2 and water mixed structure and then ionized, so that static electricity on the glass substrate is removed in the subsequent washing step, pollutants such as dust and the like are not adsorbed on the glass substrate, and the later-stage emission of CO2 is environment-friendly and pollution-free; the mixed liquid is subjected to the steps of pressurization, filtration and the like, and finally the pollutants with the particle size of 5-10um can be effectively cleaned through the ultrahigh-pressure injection by the nozzle part, so that the maximum cleaning effect is realized.
The CO2 and water mixing structure in the invention can realize the high-efficiency mixing of CO2 and deionized water by adopting a Venturi tube type structure.
Preferably, a water supply valve is installed on a water supply pipeline of the deionized water supply system, and a supply port of the deionized water supply system is arranged at the tail end of the water supply pipeline.
Preferably, a manual valve, a gas flow meter, a pneumatic valve, a pressure regulating valve, a second filter and a second one-way valve are sequentially installed on a gas supply pipeline of the CO2 supply system along the flow direction of gas, and the tail end of the gas supply pipeline is a supply port of the CO2 supply system.
With the CO2 supply system configured as described above, stable supply of CO2 gas can be achieved by adjusting the respective valves and monitoring the gas flow meter.
Preferably, an alarm is mounted on the gas flowmeter.
Preferably, a plurality of perforated plates are arranged in the buffer part along the axial direction of the buffer part, and the perforated plates can form turbulent flow on the mixed liquid of CO2 and water, so that the CO2 and the water can be more fully mixed.
Preferably, the nozzle part is formed by arranging and assembling a plurality of high-pressure nozzles, and the total water inlets of the plurality of high-pressure nozzles are connected with the tail end of the main pipeline.
Preferably, a transparent outer cover is integrally arranged outside the spraying parts of the plurality of high-pressure nozzles, and the transparent outer cover can limit the atomized liquid in the cover body, so that the loss of the atomized liquid is reduced, and the flushing efficiency is ensured.
Drawings
In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings used in the description of the embodiments or the prior art will be briefly described below, and it is obvious that the drawings in the following description are only embodiments of the present invention, and for those skilled in the art, other drawings can be obtained according to the provided drawings without creative efforts.
FIG. 1 is a schematic view of the overall structure of the present invention.
FIG. 2 is a schematic structural diagram of a CO2 and water mixing structure according to the present invention.
Fig. 3 is a schematic view of the structure of the nozzle part of the present invention.
In the figure: 1-deionized water supply system, 2-CO2 supply system, 3-CO2 and water mixing structure, 4-ion concentration meter, 5-high pressure pump, 6-liquid discharge pipeline, 7-first filter, 8-flow meter, 9-nozzle part, 10-venturi tube type gas-liquid mixer, 11-throat pipe part, 12-first one-way valve, 13-buffer part, 14-main pipeline, 15-first pressure gauge, 16-second pressure gauge, 17-safety valve, 18-water supply valve, 19-manual valve, 20-gas flow meter, 21-pneumatic valve, 22-pressure regulating valve, 23-second filter, 24-second one-way valve, 25-high pressure nozzle, 26-transparent cover and 27-glass substrate.
Detailed Description
Reference will now be made in detail to embodiments of the present invention, examples of which are illustrated in the accompanying drawings, wherein like or similar reference numerals refer to the same or similar elements or elements having the same or similar function throughout. The embodiments described below with reference to the drawings are illustrative and intended to be illustrative of the invention and are not to be construed as limiting the invention.
In the description of the present invention, it is to be understood that the terms "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", etc., indicate orientations or positional relationships based on those shown in the drawings, and are only for convenience of description and simplicity of description, but do not indicate or imply that the referenced devices or elements must have a particular orientation, be constructed and operated in a particular orientation, and thus, are not to be construed as limiting the present invention.
Furthermore, the terms "first", "second" and "first" are used for descriptive purposes only and are not to be construed as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include one or more of that feature. In the description of the present invention, "a plurality" means two or more unless specifically defined otherwise.
Example (b):
as shown in fig. 1, an embodiment of the present invention is a water jet cleaning system using ultra-high water pressure and carbon dioxide, which has a stable CO2 supply and deionized water supply system, a high-efficiency CO2 and water mixing structure, and an ultra-high pressure jet striking capability, and specifically, the water jet cleaning system includes a deionized water supply system 1, a CO2 supply system 2, a CO2 and water mixing structure 3, an ion concentration meter 4, a high-pressure pump 5, a liquid discharge line 6, a first filter 7, a flow meter 8, and a nozzle portion 9.
Wherein the content of the first and second substances,
the CO2 and water mixing structure 3 comprises a Venturi tube type gas-liquid mixer 10, and the position of the Venturi tube type gas-liquid mixer 10 with the smallest cross-sectional area is a throat part 11; the supply port of the CO2 supply system 2 is connected to the venturi 11; one end of the Venturi tube type gas-liquid mixer 10 is a deionized water supply inlet, the other end is a mixed liquid ejection outlet, a first one-way valve 12 for preventing backflow is installed at the deionized water supply inlet, a buffer part 13 is connected between the mixed liquid ejection outlet and the throat pipe part 11, and a plurality of porous plates are arranged in the buffer part 13 along the axial direction of the buffer part; the supply port of the deionized water supply system 1 is connected to the deionized water supply inlet.
As shown in fig. 2, the venturi-type gas-liquid mixer 10 used in the present invention is a core component of the CO2 and water mixing structure 3, and it mainly uses an internal structure (the internal structure forms a differential pressure, and a partial vacuum is realized) to achieve sufficient mixing of CO2 and deionized water. Deionized water enters the Venturi tube type gas-liquid mixer 10 from a deionized water supply inlet through the first check valve 12, the pipeline at the front half section of the Venturi tube type gas-liquid mixer is firstly thinned from thick, the flow velocity of the deionized water is increased, meanwhile, the pressure in the pipe is reduced, so that negative pressure is formed at the inlet of the throat tube part 11, CO2 is sucked at the inlet of the throat tube part 11, and the deionized water and CO2 are fully and efficiently mixed in the pipeline at the rear half section of the Venturi tube type gas-liquid mixer 10, which is thinned and thickened.
Then, the mixed liquid enters the buffer part 13, and forms turbulent flow to the mixed liquid through the plurality of porous plates, so that the mixed liquid is further mixed repeatedly under the action of the turbulent flow, and the separation of CO2 and water is avoided.
The buffer part 13 of the present invention is designed to avoid the uneven mixing of CO2 and water, and can be designed to be equipped with a porous plate, and can also be designed to be provided with a hollow structure to realize buffering to avoid the separation of CO2 and water, that is, the internal structure of the buffer part 13 of the present invention is not limited to the use of a porous plate, and can be applied to other existing structures capable of realizing buffering effect.
In a further specific embodiment, a water supply valve 18 for operator operation is installed on a water supply line of the deionized water supply system 1, and the water supply line terminates in a supply port of the deionized water supply system 1.
In a further specific embodiment, the CO2 supply system 2 has an air supply line, which is terminated with a supply port of the CO2 supply system 2, on which a manual valve 19, a gas flow meter 20, a pneumatic valve 21, a pressure regulating valve 22, a second filter 23, and a second check valve 24 are mounted in that order along the flow direction of the gas. Further, an alarm is mounted on the gas flow meter 20.
The manual valve 19 on the air supply pipeline of the CO2 supply system 2 is matched with the pneumatic valve 21 for use, so that the normal air supply work, the maintenance work and the like of the CO2 supply system 2 are completed; the gas flow meter 20 is used for monitoring whether CO2 is normally input, and an alarm arranged on the gas flow meter can give an alarm in time when the flow is abnormal; the pressure regulating valve 22 is used for regulating the supply pressure of CO 2; the second filter 23 is used for filtering out pipeline debris or impurities doped in the CO2 gas and the like, so as to ensure the cleanliness of CO 2; the second check valve 24 mainly prevents reverse flow of gas and liquid. The CO2 supply system structure in the invention realizes stable supply of CO2 gas.
An ion concentration meter 4 and a high-pressure pump 5 are sequentially arranged on an external circulation pipeline connected with the mixed liquid ejection port along the flowing direction of the mixed liquid, the outlet of the high-pressure pump 5 is respectively connected with a main pipeline 14 and a branched liquid discharge pipeline 6, a first pressure gauge 15, a first filter 7, a second pressure gauge 16 and a flowmeter 8 are sequentially arranged on the main pipeline 14 along the flowing direction of the mixed liquid, and the tail end of the main pipeline 14 is connected with a nozzle part 9; a safety valve 17 is mounted on the drainage pipe 6.
In a further specific embodiment, as shown in fig. 3, the nozzle portion 9 is formed by arranging and assembling a plurality of high-pressure nozzles 25, and the total water inlets of the plurality of high-pressure nozzles 25 are connected to the end of the main pipe 14. The high-pressure nozzle 25 can spray atomized liquid of uniform striking power, which can be obtained by direct purchase.
Meanwhile, the transparent outer cover 26 is integrally arranged outside the spraying parts of the plurality of high-pressure nozzles 25, so that the maximum atomization inside the outer cover can be realized, and the higher the atomization degree is, the stronger the cleaning capability is.
The working principle of the invention is as follows:
CO2 and deionized water are fully and efficiently mixed and dissolved in the CO2 and water mixing structure 3, the deionized water is added with carbon dioxide to form carbonic acid, hydrogen radical ions and hydrogen carbonate radical ions ionized from the carbonic acid in water can remove static electricity on the glass substrate 27 in the subsequent washing process, so that pollutants such as dust and the like are not adsorbed on the glass substrate 27 any more and are easy to be washed and separated; the mixed liquid ejected from the CO2 and water mixing structure 3 is subjected to ion concentration measurement by an ion concentration meter 4 to ensure that the ion concentration can achieve the effect of removing static electricity; then, high pressure is provided by a high-pressure pump 5 to enable the mixed liquid to become high-pressure mixed liquid (100KG/f) easy to wash particles, the high-pressure mixed liquid sequentially passes through a first pressure gauge 15, a first filter 7, a second pressure gauge 16 and a flowmeter 8 on a main pipeline 14, the first filter 7 is used for filtering impurities such as debris and the like generated in the high-pressure mixed liquid to ensure the cleanliness of the mixed liquid, the first pressure gauge 15 and the second pressure gauge 16 are matched for use, so that a worker can judge whether the first filter 7 is damaged by pressure and works normally and whether blockage, liquid leakage and the like occur, and the flowmeter 8 is used for judging whether the flow of the mixed liquid is enough so as to adjust corresponding parameters of an ionized water supply system, a CO2 supply system 2 and the high-pressure pump 5 in time; the final mixed liquid is ejected from a plurality of high-pressure nozzles 25 in the nozzle portion 9, and the high-pressure nozzles 25 can eject atomized liquid with uniform striking power.
When the high-pressure pump 5 is abnormal, resulting in overlarge outlet liquid pressure, or the first filter 7 is blocked, the safety valve 17 (also a one-way valve) on the liquid discharge pipeline 6 is opened under the pushing of the pressure, so that the mixed liquid is discharged for pressure relief, and the safe operation of the whole water injection cleaning system is ensured.
The embodiments in the present description are described in a progressive manner, each embodiment focuses on differences from other embodiments, and the same and similar parts among the embodiments are referred to each other. The device disclosed by the embodiment corresponds to the method disclosed by the embodiment, so that the description is simple, and the relevant points can be referred to the method part for description.
The previous description of the disclosed embodiments is provided to enable any person skilled in the art to make or use the present invention. Various modifications to these embodiments will be readily apparent to those skilled in the art, and the generic principles defined herein may be applied to other embodiments without departing from the spirit or scope of the invention. Thus, the present invention is not intended to be limited to the embodiments shown herein but is to be accorded the widest scope consistent with the principles and novel features disclosed herein.
Claims (7)
1. A water jet cleaning system utilizing ultrahigh water pressure and carbon dioxide is characterized by comprising a deionized water supply system, a CO2 supply system, a CO2 and water mixing structure, an ion concentration meter, a high-pressure pump, a liquid discharge pipeline, a first filter, a flow meter and a nozzle part, wherein the CO2 and water mixing structure comprises a Venturi tube type gas-liquid mixer, and the position of the Venturi tube type gas-liquid mixer with the smallest cross-sectional area is a throat part; the supply port of the CO2 supply system is connected with the throat part; one end of the Venturi tube type gas-liquid mixer is provided with a deionized water supply inlet, the other end of the Venturi tube type gas-liquid mixer is provided with a mixed liquid ejection outlet, a first one-way valve is installed at the deionized water supply inlet, and a buffer part is connected between the mixed liquid ejection outlet and the throat pipe part; the supply port of the deionized water supply system is connected with the deionized water supply inlet; the ion concentration meter and the high-pressure pump are sequentially installed on an external circulation pipeline connected with the mixed liquid ejection port along the flowing direction of the mixed liquid, the outlet of the high-pressure pump is respectively connected with a main pipeline and a branched liquid discharge pipeline, a first pressure gauge, the first filter, a second pressure gauge and the flowmeter are sequentially installed on the main pipeline along the flowing direction of the mixed liquid, and the tail end of the main pipeline is connected with the nozzle part; and a safety valve is arranged on the liquid discharge pipeline.
2. The water jet cleaning system using ultra-high water pressure and carbon dioxide as claimed in claim 1, wherein a water supply valve is installed on a water supply line of the deionized water supply system, and the water supply line terminates in a supply port of the deionized water supply system.
3. The system of claim 1, wherein the air supply line of the CO2 supply system is sequentially installed with a manual valve, a gas flow meter, a pneumatic valve, a pressure regulating valve, a second filter and a second one-way valve along the flow direction of the air, and the end of the air supply line is the supply port of the CO2 supply system.
4. The water jet cleaning system using ultra-high water pressure and carbon dioxide as claimed in claim 3, wherein an alarm is installed on the gas flow meter.
5. The water jet cleaning system using ultra-high water pressure and carbon dioxide as claimed in claim 1, wherein a plurality of perforated plates are provided in the buffer part along an axial direction thereof.
6. The system of claim 1, wherein the nozzle part is formed by assembling a plurality of high pressure nozzles, and the total water inlets of the plurality of high pressure nozzles are connected to the end of the main pipe.
7. The system for cleaning with water jet using ultra high water pressure and carbon dioxide as claimed in claim 6, wherein a transparent cover is integrally installed outside the jetting part of the plurality of high pressure nozzles.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202210805632.XA CN115055435A (en) | 2022-07-08 | 2022-07-08 | Water jet cleaning system utilizing ultrahigh water pressure and carbon dioxide |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202210805632.XA CN115055435A (en) | 2022-07-08 | 2022-07-08 | Water jet cleaning system utilizing ultrahigh water pressure and carbon dioxide |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN115055435A true CN115055435A (en) | 2022-09-16 |
Family
ID=83206762
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202210805632.XA Pending CN115055435A (en) | 2022-07-08 | 2022-07-08 | Water jet cleaning system utilizing ultrahigh water pressure and carbon dioxide |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN115055435A (en) |
Citations (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1077473A2 (en) * | 1999-08-19 | 2001-02-21 | Lucent Technologies Inc. | Method and apparatus for cleaning a surface of a semiconductor wafer |
| JP2003022994A (en) * | 2001-07-06 | 2003-01-24 | Sony Corp | Wafer washing method |
| KR20130073805A (en) * | 2011-12-23 | 2013-07-03 | 김덕수 | Discharging system of liquid containing powder |
| CN103846026A (en) * | 2014-02-10 | 2014-06-11 | 西安交通大学 | Venturi mixer with adjustable shrinkage hole on throat |
| CN104082945A (en) * | 2014-07-18 | 2014-10-08 | 上海行恒科技有限公司 | Hair washing and hair care equipment with dissolved air water |
| CN203981039U (en) * | 2014-08-08 | 2014-12-03 | 葛洲坝易普力股份有限公司 | Down-hole emulsion safe transport monitoring device |
| CN104923504A (en) * | 2014-03-20 | 2015-09-23 | 中芯国际集成电路制造(上海)有限公司 | Chip cleaning method and device |
| CN204674083U (en) * | 2015-06-05 | 2015-09-30 | 湖北中烟工业有限责任公司 | A kind of rod-pressing machine cooling pipe |
| CN205084887U (en) * | 2015-09-30 | 2016-03-16 | 河南东大矿业股份有限公司 | Judge device of deslagging box jam |
| CN105675764A (en) * | 2016-03-17 | 2016-06-15 | 成都创源油气技术开发有限公司 | Gas chromatograph for monitoring blocking condition |
| CN106076926A (en) * | 2016-06-20 | 2016-11-09 | 北京七星华创电子股份有限公司 | Bubbling-cleaning system and method |
| CN106252260A (en) * | 2016-08-08 | 2016-12-21 | 北京七星华创电子股份有限公司 | Wafer cleaning device and cleaning method |
| CN108907376A (en) * | 2018-08-24 | 2018-11-30 | 南京航空航天大学 | Electrical discharge machining and atomization ablation atomizing medium generating means system |
| CN110639870A (en) * | 2018-06-26 | 2020-01-03 | 联合汽车电子有限公司 | Gas-liquid mixing flushing system |
| CN113522070A (en) * | 2020-03-31 | 2021-10-22 | 显示器生产服务株式会社 | Carbon dioxide dissolving module and substrate processing apparatus including the same |
| CN215179965U (en) * | 2021-06-23 | 2021-12-14 | 中国石油化工股份有限公司 | Natural gas organic sulfur hydrolysis catalyst evaluation device |
| CN215194061U (en) * | 2021-06-21 | 2021-12-17 | 河南牧原智能科技有限公司 | High-pressure foam cleaning system |
| CN216574401U (en) * | 2020-12-28 | 2022-05-24 | 苏州晶洲装备科技有限公司 | Ultrahigh-pressure fine particle spraying system for cleaning glass substrate |
-
2022
- 2022-07-08 CN CN202210805632.XA patent/CN115055435A/en active Pending
Patent Citations (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1077473A2 (en) * | 1999-08-19 | 2001-02-21 | Lucent Technologies Inc. | Method and apparatus for cleaning a surface of a semiconductor wafer |
| JP2003022994A (en) * | 2001-07-06 | 2003-01-24 | Sony Corp | Wafer washing method |
| KR20130073805A (en) * | 2011-12-23 | 2013-07-03 | 김덕수 | Discharging system of liquid containing powder |
| CN103846026A (en) * | 2014-02-10 | 2014-06-11 | 西安交通大学 | Venturi mixer with adjustable shrinkage hole on throat |
| CN104923504A (en) * | 2014-03-20 | 2015-09-23 | 中芯国际集成电路制造(上海)有限公司 | Chip cleaning method and device |
| CN104082945A (en) * | 2014-07-18 | 2014-10-08 | 上海行恒科技有限公司 | Hair washing and hair care equipment with dissolved air water |
| CN203981039U (en) * | 2014-08-08 | 2014-12-03 | 葛洲坝易普力股份有限公司 | Down-hole emulsion safe transport monitoring device |
| CN204674083U (en) * | 2015-06-05 | 2015-09-30 | 湖北中烟工业有限责任公司 | A kind of rod-pressing machine cooling pipe |
| CN205084887U (en) * | 2015-09-30 | 2016-03-16 | 河南东大矿业股份有限公司 | Judge device of deslagging box jam |
| CN105675764A (en) * | 2016-03-17 | 2016-06-15 | 成都创源油气技术开发有限公司 | Gas chromatograph for monitoring blocking condition |
| CN106076926A (en) * | 2016-06-20 | 2016-11-09 | 北京七星华创电子股份有限公司 | Bubbling-cleaning system and method |
| CN106252260A (en) * | 2016-08-08 | 2016-12-21 | 北京七星华创电子股份有限公司 | Wafer cleaning device and cleaning method |
| CN110639870A (en) * | 2018-06-26 | 2020-01-03 | 联合汽车电子有限公司 | Gas-liquid mixing flushing system |
| CN108907376A (en) * | 2018-08-24 | 2018-11-30 | 南京航空航天大学 | Electrical discharge machining and atomization ablation atomizing medium generating means system |
| CN113522070A (en) * | 2020-03-31 | 2021-10-22 | 显示器生产服务株式会社 | Carbon dioxide dissolving module and substrate processing apparatus including the same |
| CN216574401U (en) * | 2020-12-28 | 2022-05-24 | 苏州晶洲装备科技有限公司 | Ultrahigh-pressure fine particle spraying system for cleaning glass substrate |
| CN215194061U (en) * | 2021-06-21 | 2021-12-17 | 河南牧原智能科技有限公司 | High-pressure foam cleaning system |
| CN215179965U (en) * | 2021-06-23 | 2021-12-14 | 中国石油化工股份有限公司 | Natural gas organic sulfur hydrolysis catalyst evaluation device |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN106824680B (en) | Waste liquid discharge groove for slit nozzle and slit nozzle cleaning device | |
| CN111482027B (en) | Water bath turbulent mixing jet flow flue gas purification equipment | |
| CN201454425U (en) | Water-air mix cleaning device for ultrafiltration membrane | |
| CN105797455A (en) | Screen filter capable of recycling pollution discharge water and achieving automatic cleaning | |
| CN115055435A (en) | Water jet cleaning system utilizing ultrahigh water pressure and carbon dioxide | |
| CN212285080U (en) | Small-size apron cleaning machine | |
| CN116212648A (en) | Reverse osmosis membrane online cleaning device and cleaning method thereof | |
| CN108654294A (en) | A kind of exhaust-gas treatment retracting device | |
| CN213682304U (en) | Water intaking device and cleaning vehicle | |
| CN114434960A (en) | Printing oil detection and storage device of printing and packaging machinery | |
| CN209128168U (en) | A kind of trade effluent pond removal of ammonia and nitrogen device | |
| CN205627363U (en) | Automatically cleaning air cleaner | |
| CN213965709U (en) | A imitate wet dust collector by force for metal is polished | |
| CN114712976B (en) | Waste gas treatment device for cathode carbon demolding and forming | |
| CN219851224U (en) | High-efficient belt cleaning device of compressor washing water tank | |
| CN216778483U (en) | Be used for exhaust-gas treatment acid-base treatment fluid reuse device | |
| CN212188359U (en) | Air suction device for paint production workshop | |
| CN217163590U (en) | Air pollution prevention and control equipment applied to coating field | |
| CN212375389U (en) | Acid liquor automatic cycle formula stainless steel pickling bath | |
| CN219252105U (en) | Roasting furnace dust collector that carbon production was used | |
| CN217449504U (en) | A industrial waste gas preprocessing device for environmental protection | |
| CN219378176U (en) | Wet high-pressure atomization glass substrate cleaning device for preventing static electricity | |
| CN216537409U (en) | Neopentyl glycol tail gas emergency treatment device | |
| CN211159245U (en) | Simple and easy type desulfurization treatment facility for chemical waste gas | |
| CN211400133U (en) | Automatic clean dustless workshop purifier |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination |