CN219378176U - Wet high-pressure atomization glass substrate cleaning device for preventing static electricity - Google Patents
Wet high-pressure atomization glass substrate cleaning device for preventing static electricity Download PDFInfo
- Publication number
- CN219378176U CN219378176U CN202320388567.5U CN202320388567U CN219378176U CN 219378176 U CN219378176 U CN 219378176U CN 202320388567 U CN202320388567 U CN 202320388567U CN 219378176 U CN219378176 U CN 219378176U
- Authority
- CN
- China
- Prior art keywords
- glass substrate
- gas
- carbon dioxide
- pipeline
- ultrapure water
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Landscapes
- Cleaning By Liquid Or Steam (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Abstract
The utility model provides an antistatic wet high-pressure atomized glass substrate cleaning device, which relates to the technical field of LED glass substrate cleaning and comprises an ultrapure water supply tank, wherein a water outlet of the ultrapure water supply tank is communicated with a water inlet of a booster water pump through a pipeline, a water outlet of the booster water pump is communicated with a water inlet of a spray pipe through a pipeline, a plurality of atomized spray heads for cleaning an LED glass substrate are uniformly arranged on the spray pipe, and a mixing component for reducing the resistivity of ultrapure water is arranged on a communicating pipeline between the ultrapure water supply tank and the booster water pump.
Description
Technical Field
The utility model relates to the technical field of cleaning of LED glass substrates, in particular to a wet-process high-pressure atomization glass substrate cleaning device for static prevention.
Background
In recent years, the intelligent screen industry is more and more paid attention to, the demand of products is increased day by day, the LED screen production is in short supply, the production of the LED screen is increased rapidly, and the cleaning requirement and the cleaning time of the glass substrate are also greatly improved.
The cleaning of the LED glass substrate is usually carried out by an ultrapure water delivery pressurization system, and the LED glass substrate is subjected to wet high-pressure atomization flushing by pressurization.
The system for cleaning the LED glass substrate by using the ultrapure water is divided into three parts, namely a water supply link, a constant-pressure water supply link and a high-pressure wet atomization spraying link.
First, the water supply step is to supply ultrapure water into the buffer water tank.
And then, the supercharging system supercharges the water pump to pump ultrapure water, and the high-pressure wet high-pressure atomization spray cleans the LED glass substrate.
However, the existing ultrapure water cleaning system for the LED glass substrate has the problems that the resistivity of the ultrapure water reaches 18MΩ cm (25 ℃), and the system has almost no conductivity, so that static electricity is easily generated on the surface of the LED glass substrate, and damage such as static electricity adsorption pollution and static electricity discharge damage is easily caused to the LED glass substrate.
Disclosure of Invention
In order to overcome the defects of the prior art, the utility model provides a wet-process high-pressure atomized glass substrate cleaning device for preventing static electricity, which comprises an ultrapure water supply tank, wherein a water outlet of the ultrapure water supply tank is communicated with a water inlet of a booster water pump through a pipeline, a water outlet of the booster water pump is communicated with a water inlet of a spray pipe through a pipeline, a plurality of atomized spray heads for cleaning an LED glass substrate are uniformly arranged on the spray pipe, and a mixing assembly for reducing the resistivity of the ultrapure water is arranged on a communicating pipeline between the ultrapure water supply tank and the booster water pump.
In order to achieve the above purpose, the ultrapure water in the ultrapure water supply tank enters the spray pipe through the action of the booster water pump, the spray pipe and the atomizing nozzle are mutually communicated, the LED glass substrate is cleaned through the atomizing nozzle, the resistivity of the ultrapure water is reduced through the action of the mixing assembly, and further the secondary pollution generated by static electricity generated by single ultrapure water to the surface of the LED glass substrate in the cleaning process is reduced, so that the electrostatic discharge damage to the surface of the LED glass substrate is reduced.
Further, the mixing assembly comprises a carbon dioxide supply tank and a gas-liquid contactor, wherein an air inlet of the gas-liquid contactor is communicated with an air outlet of the carbon dioxide supply tank through a pipeline, a water inlet of the gas-liquid contactor is communicated with a water outlet of the ultrapure water supply tank through a pipeline, and a water outlet of the gas-liquid contactor is communicated with a water inlet of the booster water pump.
Through the technical scheme, through the effect of the ultrapure water supply tank and the carbon dioxide supply tank, the ultrapure water and the carbon dioxide gas are respectively connected into the gas-liquid contactor, the ultrapure water and the carbon dioxide gas are mixed and dissolved in the gas-liquid contactor to form carbon dioxide ionized water, the carbon dioxide ionized water enters the spray pipe and is discharged through the atomizing nozzle to clean the surface of the LED glass substrate, the carbon dioxide ionized water has the characteristic of low resistivity, the secondary pollution generated by static electricity generated by single ultrapure water to the surface of the LED glass substrate in the cleaning process can be reduced, and the electrostatic discharge damage to the surface of the LED glass substrate is reduced.
Further, the device also comprises a carbon dioxide exhaust collection tank, the gas-liquid contactor is provided with an exhaust port, the exhaust port of the gas-liquid contactor is communicated with the air inlet of the carbon dioxide exhaust collection tank through a pipeline, and a carbon dioxide exhaust valve for controlling the on-off of the pipeline is arranged on a connecting pipeline of the gas-liquid contactor and the carbon dioxide exhaust collection tank.
Through the technical scheme, after the ultrapure water in the gas-liquid contactor is contacted with the carbon dioxide gas, the redundant gas is discharged out of the gas outlet of the gas-liquid contactor and is discharged into the carbon dioxide gas collection tank, and the contact time of the carbon dioxide gas and the ultrapure water is controlled through the action of the carbon dioxide gas exhaust valve.
Further, a conductivity sensor is arranged on a communicating pipeline between the gas-liquid contactor and the booster water pump, and a pressure transmitter is arranged on a communicating pipeline between the booster water pump and the spray pipe.
Through above-mentioned technical scheme, gather the conductivity of carbon dioxide ion water through conductivity sensor's effect, be convenient for monitor conductivity value to control carbon dioxide discharge valve switch, be convenient for discharge unnecessary carbon dioxide gas, pressure transmitter sets up at the pipeline end, and pressure transmitter is used for real-time supervision to spray actual pressure, and then is convenient for control booster pump for booster pump reaches invariable water supply pressure, and the carbon dioxide ion water of being convenient for can constant voltage transport.
Further, a filter is arranged on a communicating pipeline between the booster water pump and the pressure transmitter.
Through above-mentioned technical scheme, filter the carbon dioxide ionized water of carrying through the effect of filter, get rid of impurity, guarantee the rear end and spray the quality, guarantee to spray the shower nozzle and can not block up, also avoid spraying in-process particulate matter to the damage of LED glass substrate.
Further, an A ultrapure water supply valve is arranged on a communicating pipe between the ultrapure water supply tank and the gas-liquid contactor.
Through the technical scheme, the on-off of the pipeline between the ultrapure water supply tank and the gas-liquid contactor is conveniently controlled through the action of the A ultrapure water supply valve.
In summary, the wet-process high-pressure atomization glass substrate cleaning device for preventing static has the following beneficial effects:
(1) This a wet process high pressure atomizing glass substrate belt cleaning device for preventing static makes the ultrapure water in the ultrapure water supply jar get into inside the shower through the effect of booster water pump, and shower and atomizer communicate each other, and rethread atomizer discharges, washs LED glass substrate, through mixing assembly's effect, reduces the resistivity of ultrapure water, and then reduces the single ultrapure water of cleaning process and produce the produced secondary pollution of static to LED glass substrate surface to reduce the damage of LED glass substrate surface electrostatic discharge.
(2) The wet-process high-pressure atomization glass substrate cleaning device for static prevention has the advantages that carbon dioxide ion water has weak acidity, and attachments such as organic matters, inorganic matters and microparticles attached to the surface of the LED glass substrate can be effectively removed in the high-pressure cleaning process.
(3) According to the wet-process high-pressure atomization glass substrate cleaning device for preventing static, the LED glass substrate is cleaned by using carbon dioxide ion water, so that the time for cleaning the LED glass substrate is obviously shortened, the cleaning efficiency is improved, and meanwhile, the cleaning quality is also ensured.
Drawings
The utility model is further described and illustrated below with reference to the accompanying drawings.
Fig. 1 is a schematic structural view of a preferred embodiment of the present utility model.
Reference numerals: 1. an ultrapure water supply tank; 2. a shower pipe; 3. an atomizing nozzle; 4. a carbon dioxide supply tank; 5. a gas-liquid contactor; 6. a carbon dioxide exhaust collection tank; 7. a carbon dioxide exhaust valve; 8. a ultrapure water supply valve; 9. a conductivity sensor; 10. a booster water pump; 11. a pressure transmitter; 12. b an ultrapure water supply valve; 13. and (3) a filter.
Detailed Description
The technical solution of the present utility model will be more clearly and completely explained by the description of the preferred embodiments of the present utility model with reference to the accompanying drawings.
As shown in fig. 1, a wet high pressure atomized glass substrate cleaning apparatus for preventing static electricity according to a preferred embodiment of the present utility model includes a carbon dioxide supply tank 4 for supplying a stable carbon dioxide gas of a certain concentration and an ultrapure water supply tank 1 for supplying a stable source of ultrapure water, a water outlet of the ultrapure water supply tank 1 is connected to a water inlet of an a ultrapure water supply valve 8 through a pipe, the a ultrapure water supply valve 8 has two water outlets, a water outlet of the first a ultrapure water supply valve 8 is connected to a water inlet pipe of a gas-liquid contactor 5 through a pipe, a water outlet of the second water outlet is connected to a water inlet of a B ultrapure water supply valve 12 through a pipe, a water outlet of the B ultrapure water supply valve 12 is connected to a water inlet of a conductivity sensor 9 through a pipe, on-off of the pipe between the a ultrapure water supply tank 1 and the B ultrapure water supply valve 5 is controlled by the action of the a ultrapure water supply valve 8, an air outlet of the carbon dioxide supply tank 4 is connected to an air inlet of the gas-liquid contactor 5 through a pipe, the ultrapure water supply tank 1 and the carbon dioxide gas is supplied into the gas-liquid contactor 5 through the action of the ultrapure water supply tank 4, the ultrapure water and the carbon dioxide gas is mixed in the gas-liquid contactor 5, the carbon dioxide ion-dissolved water is mixed with the carbon dioxide ion water is in the gas-liquid contactor 5, and the secondary pollution of the glass is reduced, and the surface of the static electricity is reduced, the surface is reduced, and the electrostatic discharge of the glass is caused by the surface is reduced, and the surface is a glass is cleaned, and the surface is a glass surface is cleaned.
The water outlet of the gas-liquid contactor 5 is communicated with the water inlet of the conductivity sensor 9 through a pipeline, and the conductivity of the carbon dioxide ionized water output by the gas-liquid contactor 5 is detected under the action of the conductivity sensor 9, so that the conductivity value of the carbon dioxide ionized water is conveniently monitored in real time;
the water outlet of the conductivity sensor 9 is communicated with the water inlet of the booster water pump 10 through a pipeline, and carbon dioxide ionized water in the gas-liquid contactor 5 is conveniently input into the spray pipe 2 at a constant pressure under the action of the booster water pump 10;
the water outlet of the booster water pump 10 is communicated with the water inlet of the filter 13 through a pipeline, the conveyed carbon dioxide ionized water is filtered through the effect of the filter 13, impurities are removed, the spray quality of the rear end is guaranteed, the spray nozzle is guaranteed not to be blocked, and the damage of particles to the LED glass substrate in the spray process is avoided.
The water outlet of the filter 13 is communicated with the water inlet of the pressure transmitter 11 through a pipeline, so that the actual spraying pressure can be conveniently monitored in real time through the pressure transmitter 11;
the water outlet of the pressure transmitter 11 is communicated with the water inlet of the spray pipe 2 through a pipeline, carbon dioxide ion water in the spray pipe 2 is discharged through the atomizing nozzle 3, and the atomizing nozzle 3 is arranged in an array manner, so that the LED glass substrate is cleaned uniformly, and the cleaning efficiency is improved.
The gas outlet of the gas-liquid contactor 5 is communicated with the gas inlet of the carbon dioxide exhaust valve 7 through a pipeline, the gas outlet of the carbon dioxide exhaust valve 7 is communicated with the gas inlet of the carbon dioxide exhaust collection tank 6 through a pipeline, a gas pump is arranged on the gas inlet of the carbon dioxide exhaust collection tank 6, gas in the gas-liquid contactor 5 is conveniently discharged into the carbon dioxide exhaust collection tank 6 through the action of the gas pump, and the on-off of the pipeline between the gas-liquid contactor 5 and the carbon dioxide exhaust collection tank 6 is conveniently controlled through the action of the carbon dioxide exhaust valve 7;
when the solar energy LED glass substrate cleaning device is used, a PLC AD module is arranged on the spray pipe 2, a carbon dioxide exhaust valve 7, a booster water pump 10, a conductivity sensor 9 and a pressure transmitter 11 are all in telecommunication connection with the PLC AD module, an A ultrapure water supply valve 8 is opened, ultrapure water in the ultrapure water supply tank 1 and carbon dioxide gas in the carbon dioxide supply tank 4 enter a gas-liquid contactor 5 to quantitatively mix and dissolve to form carbon dioxide ionized water, the C spray pipe 2 ionized water has the characteristic of low resistivity, secondary pollution caused by static electricity generated by single ultrapure water on the surface of the LED glass substrate in the cleaning process can be reduced, and electrostatic discharge damage to the surface of the LED glass substrate is reduced;
carbon dioxide ionized water formed in the gas-liquid contactor 5 enters the conductivity sensor 9, the conductivity value of the carbon dioxide ionized water is detected through the effect of the conductivity sensor 9, the conductivity value of the carbon dioxide ionized water detected by the conductivity sensor 9 is collected by the PLC AD module, when the conductivity value of the carbon dioxide ionized water reaches a set value, the carbon dioxide ionized water enters the filter 13 through the booster pump 10, the conveyed carbon dioxide ionized water is filtered through the effect of the filter 13, impurities are removed, the spray quality at the rear end is ensured, the spray nozzle is not blocked, particles in the spray process are prevented from damaging the LED glass substrate, the filtered carbon dioxide ionized water enters the pressure transmitter 11, the actual pressure is monitored in real time through the effect of the pressure transmitter 11, the pressure value displayed by the pressure transmitter 11 is collected by the PLC AD module, the booster pump 10 is adjusted according to the pressure value, so that the carbon dioxide ionized water can be conveyed in the spray pipe 2 at a constant pressure, the carbon dioxide ionized water enters the inside the spray pipe 2 through the booster pump 10, and is discharged through the atomizing nozzle 3, the LED glass substrate is cleaned, the C pipe 2 ions have weak acidity, the inorganic particles can be cleaned, the cleaning time of the LED glass substrate is also shortened, and the cleaning time of the glass substrate is shortened due to the cleaning efficiency of the cleaning of the inorganic particles in the high-pressure process, and the cleaning time of the cleaning of the glass substrate is also ensured, and the cleaning time of the glass substrate is obviously cleaned;
meanwhile, the PLC AD module controls to open the carbon dioxide exhaust valve 7, redundant carbon dioxide gas in the gas-liquid contactor 5 enters the carbon dioxide exhaust collection tank 6 through the carbon dioxide exhaust valve 7, the device cleans the LED glass substrate through forming carbon dioxide ionized water in the gas-liquid contactor 5, so that secondary pollution caused by static electricity generated on the surface of the super LED glass substrate by single ultrapure water in the cleaning process is reduced, electrostatic discharge damage to the surface of the LED glass substrate is reduced, meanwhile, C02 ionized water has weak acidity, and attachments such as organic matters, inorganic matters and microparticles attached to the surface of the LED glass substrate can be effectively removed in the high-pressure cleaning process, so that the cleaning time for cleaning the LED glass substrate is obviously shortened, the cleaning efficiency is improved, and meanwhile, the cleaning quality is also ensured.
The above detailed description is merely illustrative of the preferred embodiments of the present utility model and is not intended to limit the scope of the present utility model. Various modifications, substitutions and improvements of the technical scheme of the present utility model will be apparent to those skilled in the art from the description and drawings provided herein without departing from the spirit and scope of the utility model. The scope of the utility model is defined by the claims.
Claims (6)
1. A wet process high pressure atomizing glass substrate belt cleaning device for preventing static, a serial communication port, including ultrapure water supply jar (1), the delivery port of ultrapure water supply jar (1) is through pipeline intercommunication with the water inlet of booster pump (10), the delivery port of booster pump (10) is through pipeline intercommunication with the water inlet of shower (2), evenly be equipped with atomizing shower nozzle (3) of a plurality of cleaning LED glass substrates on shower (2), be equipped with the mixed subassembly that reduces ultrapure water resistivity on communicating pipe road between ultrapure water supply jar (1) and booster pump (10).
2. The wet high-pressure atomized glass substrate cleaning device for preventing static electricity according to claim 1, wherein the mixing assembly comprises a carbon dioxide supply tank (4) and a gas-liquid contactor (5), an air inlet of the gas-liquid contactor (5) is communicated with an air outlet of the carbon dioxide supply tank (4) through a pipeline, an water inlet of the gas-liquid contactor (5) is communicated with a water outlet of the ultrapure water supply tank (1) through a pipeline, and a water outlet of the gas-liquid contactor (5) is communicated with a water inlet of a booster water pump (10).
3. The wet-process high-pressure atomization glass substrate cleaning device for preventing static electricity according to claim 2, further comprising a carbon dioxide exhaust collection tank (6), wherein an exhaust port is arranged on the gas-liquid contactor (5), the exhaust port of the gas-liquid contactor (5) is communicated with an air inlet of the carbon dioxide exhaust collection tank (6) through a pipeline, and a carbon dioxide exhaust valve (7) for controlling the on-off of the pipeline is arranged on a connecting pipeline of the gas-liquid contactor (5) and the carbon dioxide exhaust collection tank (6).
4. The wet-process high-pressure atomized glass substrate cleaning device for preventing static electricity according to claim 2, wherein a conductivity sensor (9) is arranged on a communicating pipeline of the gas-liquid contactor (5) and the booster water pump (10), and a pressure transmitter (11) is arranged on a communicating pipeline of the booster water pump (10) and the spray pipe (2).
5. The wet high-pressure atomized glass substrate cleaning device for preventing static electricity according to claim 4, wherein a filter (13) is arranged on a communicating pipeline between the booster water pump (10) and the pressure transmitter (11).
6. The wet high-pressure atomized glass substrate cleaning device for preventing static electricity according to claim 1, wherein an a ultrapure water supply valve (8) is provided on a communication pipe between the ultrapure water supply tank (1) and the gas-liquid contactor (5).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202320388567.5U CN219378176U (en) | 2023-03-03 | 2023-03-03 | Wet high-pressure atomization glass substrate cleaning device for preventing static electricity |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202320388567.5U CN219378176U (en) | 2023-03-03 | 2023-03-03 | Wet high-pressure atomization glass substrate cleaning device for preventing static electricity |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN219378176U true CN219378176U (en) | 2023-07-21 |
Family
ID=87192138
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202320388567.5U Active CN219378176U (en) | 2023-03-03 | 2023-03-03 | Wet high-pressure atomization glass substrate cleaning device for preventing static electricity |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN219378176U (en) |
-
2023
- 2023-03-03 CN CN202320388567.5U patent/CN219378176U/en active Active
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN203990190U (en) | Automatically control aerosol dust suppression system | |
| CN100594994C (en) | Dry-wet mixed dedusting processing system and dedusting method thereof | |
| CN201183029Y (en) | Pneumatic self-cleaning nozzle | |
| CN201454425U (en) | Water-air mix cleaning device for ultrafiltration membrane | |
| CN219378176U (en) | Wet high-pressure atomization glass substrate cleaning device for preventing static electricity | |
| CN208465374U (en) | Phosphorizing residue removal system | |
| CN214809552U (en) | Circulating filtering type energy-saving water washing tower | |
| CN207295577U (en) | A kind of flusher on municipal administration sprinkling truck | |
| CN209985111U (en) | Atomizing dust removal device | |
| CN214715255U (en) | Water mist dust settling device of laboratory fan dust removal system | |
| CN209865632U (en) | High-pressure atomization dust-settling deodorization equipment | |
| CN110976092A (en) | Novel electrostatic spray dust removal device | |
| CN210410185U (en) | Acid mist-proof waste gas equipment | |
| CN103041680B (en) | Method for treating waste gas in tobacco production | |
| CN202893169U (en) | Device for simultaneously generating ozone, desulfurizing and denitrating by high-pressure electrostatic dust collection electric field of coal-fired unit | |
| CN219272553U (en) | Opposite spraying dust removing equipment | |
| CN221816970U (en) | Water jet cleaning system utilizing ultrahigh water pressure and CO2 | |
| CN216726424U (en) | Dust collector of atmosphere pollution control equipment system | |
| CN114704352B (en) | Diesel generator tail gas treatment device and treatment method thereof | |
| CN221311659U (en) | Water-saving photovoltaic compression atomization cleaning device | |
| CN221536217U (en) | Supply device for flue gas desulfurization and denitrification | |
| CN217391938U (en) | Coal-fired particulate matter collecting system that discharges | |
| CN214347321U (en) | Paint pipeline | |
| CN216825433U (en) | Injection type water smoke dust remover | |
| CN220478470U (en) | Dust collector is used in concrete production and processing |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| GR01 | Patent grant | ||
| GR01 | Patent grant |