CN114941170A - Method for improving 193nm laser irradiation hardness of calcium fluoride crystal - Google Patents

Method for improving 193nm laser irradiation hardness of calcium fluoride crystal Download PDF

Info

Publication number
CN114941170A
CN114941170A CN202210507490.9A CN202210507490A CN114941170A CN 114941170 A CN114941170 A CN 114941170A CN 202210507490 A CN202210507490 A CN 202210507490A CN 114941170 A CN114941170 A CN 114941170A
Authority
CN
China
Prior art keywords
calcium fluoride
raw material
crystal
gas
orbitals
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
CN202210507490.9A
Other languages
Chinese (zh)
Other versions
CN114941170B (en
Inventor
寇华敏
苏良碧
王华进
姜大朋
张博
王静雅
钱小波
张中晗
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shanghai Institute of Ceramics of CAS
Original Assignee
Shanghai Institute of Ceramics of CAS
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shanghai Institute of Ceramics of CAS filed Critical Shanghai Institute of Ceramics of CAS
Priority to CN202210507490.9A priority Critical patent/CN114941170B/en
Publication of CN114941170A publication Critical patent/CN114941170A/en
Application granted granted Critical
Publication of CN114941170B publication Critical patent/CN114941170B/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B11/00Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/10Inorganic compounds or compositions
    • C30B29/12Halides
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B33/00After-treatment of single crystals or homogeneous polycrystalline material with defined structure
    • C30B33/02Heat treatment

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)

Abstract

The invention discloses a method for improving 193nm laser irradiation hardness of calcium fluoride crystals. The method improves the radiation hardness of the calcium fluoride crystal by one or more of the combination of controlling the content of impurity cations in the calcium fluoride raw material, wherein the impurity cations have low s orbitals and d orbitals overlapped with an F-heart wave function, avoiding the formation of F, H and M centers in the calcium fluoride crystal, reducing the fluorine vacancy concentration in the calcium fluoride crystal and reducing the oxygen concentration in the calcium fluoride crystal.

Description

一种提高氟化钙晶体193nm激光辐照硬度的方法A method for improving the hardness of calcium fluoride crystal irradiated by 193nm laser

技术领域technical field

本发明涉及一种提高氟化钙晶体193nm激光辐照硬度的方法,属于氟化钙晶体技术领域。The invention relates to a method for improving the 193nm laser irradiation hardness of calcium fluoride crystals, and belongs to the technical field of calcium fluoride crystals.

背景技术Background technique

CaF2单晶的透过范围覆盖深紫外到中红外波段,且具有超低色散性能(阿贝系数:Vd=95.23)、超高折射率均匀性和负折射率温度系数(dn/dT=-10.6×10-6K-1),是光刻机曝光系统中不可替代的光学材料。随着半导体光刻技术的发展,光刻光源逐渐从汞灯光源发展到以具有更短辐射波长和更大单光子能量的深紫外激光光源,其中ArF-193nm为典型代表。光学材料长期处于较强的紫外/深紫外激光辐射状态时,材料特性将会发生改变,产生光致收缩效应,主要表现为折射率变化和透过率降低,从而影响整个系统的稳定性。因此,CaF2晶体的紫外激光诱导损伤是影响其服役性能的关键。The transmission range of CaF 2 single crystal covers the deep ultraviolet to mid-infrared band, and has ultra-low dispersion properties (Abbé coefficient: V d = 95.23), ultra-high refractive index uniformity and negative temperature coefficient of refractive index (dn/dT = -10.6×10 -6 K -1 ), which is an irreplaceable optical material in the lithography exposure system. With the development of semiconductor lithography technology, the lithography light source has gradually developed from a mercury light source to a deep ultraviolet laser light source with shorter radiation wavelength and greater single-photon energy, of which ArF-193nm is a typical representative. When the optical material is in the state of strong ultraviolet/deep ultraviolet laser radiation for a long time, the material properties will change, resulting in a photo-induced shrinkage effect, which is mainly manifested as a change in the refractive index and a decrease in transmittance, which affects the stability of the entire system. Therefore, the UV laser-induced damage of CaF2 crystal is the key to its service performance.

晶体的本征缺陷及加工造成的表面和亚表面缺陷均会影响材料的抗辐照损伤特性。表面加工产生的亚表面缺陷在应用中会导致光致热效应损伤和光场调制增强效应损伤。除了表面及亚表面缺陷,CaF2晶体内部还将不可避免地存在各种本征缺陷,按尺度从小到大可分为点缺陷、线缺陷、面缺陷、体缺陷。点缺陷通常由色心和杂质离子构成。晶体中的线缺陷主要是指位错。CaF2晶体中常见的面缺陷一般为小角度晶界、孪晶晶界、层错等。体缺陷为更大尺度上的气泡、空腔与包裹体等缺陷。氟化钙晶体的抗辐照损伤性能是宏观服役性能的综合体现,在激光与晶体的作用过程中,由CaF2晶体本征缺陷引起的吸收、散射、缺陷周围的应变场等均有可能降低光学性能的稳定性。因此,从材料本身来说,发现影响损伤的关键因素进而优化晶体制备工艺是提高氟化钙激光损伤阈值和提升其综合服役性能的重要途径。Intrinsic defects of crystals and surface and subsurface defects caused by processing can affect the radiation damage resistance of materials. Subsurface defects generated by surface processing can lead to photothermal damage and optical field modulation enhancement damage in applications. In addition to surface and subsurface defects, there will inevitably be various intrinsic defects inside the CaF 2 crystal, which can be divided into point defects, line defects, surface defects, and bulk defects according to the scale from small to large. Point defects are usually composed of color centers and impurity ions. Line defects in crystals mainly refer to dislocations. Common surface defects in CaF 2 crystals are generally small-angle grain boundaries, twin grain boundaries, stacking faults, etc. Bulk defects are defects such as bubbles, cavities and inclusions on a larger scale. The radiation damage resistance of calcium fluoride crystals is a comprehensive reflection of the macroscopic service performance. During the interaction between the laser and the crystal, the absorption, scattering, and strain fields around the defects caused by the intrinsic defects of the CaF 2 crystal may be reduced. Stability of optical properties. Therefore, from the perspective of the material itself, finding the key factors affecting the damage and then optimizing the crystal preparation process is an important way to improve the laser damage threshold of calcium fluoride and improve its comprehensive service performance.

发明内容SUMMARY OF THE INVENTION

发明人发现,氟化钙晶体中存在影响193nm抗辐照损伤性能的关键阳离子杂质,这些杂质离子通常具有与F心波函数重叠的低位s轨道与d轨道。同时,氟化钙晶体中的F空位及残余O均会一定程度降低其抗辐照损伤性能。针对上述问题,本发明提供一种提高氟化钙晶体193nm激光辐照硬度的方法,通过降低关键杂质阳离子含量、降低残余O含量以及降低晶体中F空位浓度等手段,特定控制氟化钙晶体中具有低位s轨道与d轨道的杂质阳离子含量,且控制O含量以及F空位浓度尽量低,获得的氟化钙晶体抗辐照损伤性能得到明显提升。The inventors found that there are key cation impurities in calcium fluoride crystals that affect the resistance to radiation damage at 193 nm, and these impurity ions usually have low-position s orbitals and d orbitals that overlap with the F-heart wave function. At the same time, the F vacancies and residual O in the calcium fluoride crystal will reduce its radiation damage resistance to a certain extent. In view of the above problems, the present invention provides a method for improving the hardness of calcium fluoride crystals by 193nm laser irradiation. With the impurity cation content of low s orbital and d orbital, and the control of O content and F vacancy concentration as low as possible, the obtained calcium fluoride crystal has significantly improved radiation damage resistance.

鉴于此,本发明提供一种提高氟化钙晶体193nm激光辐照硬度的方法。所述方法通过控制氟化钙原料中具有与F心波函数重叠的低位s轨道与d轨道的杂质阳离子含量来避免氟化钙晶体中F心、H心和M心的形成,降低氟化钙晶体中的氟空位浓度以及降低氟化钙晶体中的氧浓度的一种或多种的组合来提高氟化钙晶体的辐照硬度。In view of this, the present invention provides a method for improving the hardness of calcium fluoride crystal irradiated by 193nm laser. The method avoids the formation of F center, H center and M center in the calcium fluoride crystal by controlling the content of impurity cations with low-position s orbital and d orbital overlapping with the F heart wave function in the calcium fluoride raw material, reducing calcium fluoride. The combination of one or more of the concentration of fluorine vacancies in the crystal and reducing the concentration of oxygen in the calcium fluoride crystal increases the radiation hardness of the calcium fluoride crystal.

较佳地,所述方法包括:对氟化钙原料进行提纯使氟化钙原料中具有与F心波函数重叠的低位s轨道与d轨道的杂质阳离子含量在1ppm以下,并采用提纯后的氟化钙原料和除氧剂作为初始原料,通过坩埚下降法或温度梯度法进行氟化钙晶体的生长并在含氟气氛中退火,得到提高激光辐照硬度的氟化钙晶体。Preferably, the method includes: purifying the calcium fluoride raw material so that the content of impurity cations in the calcium fluoride raw material with low-position s orbital and d orbital overlapping with the F heart wave function is below 1 ppm, and using purified fluorine. The calcium fluoride raw material and the oxygen scavenger are used as the initial raw materials, and the calcium fluoride crystal is grown by the crucible descending method or the temperature gradient method and annealed in a fluorine-containing atmosphere to obtain the calcium fluoride crystal with improved laser irradiation hardness.

较佳地,所述具有与F心波函数重叠的低位s轨道与d轨道的杂质阳离子包括Y、La、Ce、Gd、Tb、Lu。Preferably, the impurity cations with low-position s orbital and d orbital overlapping with the F-heart wave function include Y, La, Ce, Gd, Tb, and Lu.

较佳地,采用化学沉淀法和/或区熔法对氟化钙原料进行提纯使氟化钙原料中具有与F心波函数重叠的低位s轨道与d轨道的杂质阳离子含量在1ppm以下。Preferably, the calcium fluoride raw material is purified by chemical precipitation method and/or zone melting method, so that the content of impurity cations in the calcium fluoride raw material with low-position s orbital and d orbital overlapping with the F-heart wave function is below 1 ppm.

较佳地,采用化学沉淀法纯化氟化钙原料使氟化钙原料中具有与F心波函数重叠的低位s轨道与d轨道的杂质阳离子含量在1-10ppm之间,然后采用区熔法对氟化钙原料进一步纯化使氟化钙原料中具有与F心波函数重叠的低位s轨道与d轨道的杂质阳离子含量<1ppm。Preferably, the calcium fluoride raw material is purified by chemical precipitation so that the content of impurity cations in the calcium fluoride raw material with low-position s orbital and d orbital overlapping with the F-heart wave function is between 1-10 ppm, and then the zone melting method is used to purify the calcium fluoride raw material. The calcium fluoride raw material is further purified so that the content of impurity cations in the calcium fluoride raw material with low-position s orbital and d orbital overlapping with the F-heart wave function is less than 1 ppm.

较佳地,所述除氧剂为氟化铅和/或聚四氟乙烯。Preferably, the oxygen scavenger is lead fluoride and/or polytetrafluoroethylene.

较佳地,所述除氧剂占氟化钙原料的含量为0.3~4wt.%。Preferably, the content of the oxygen scavenger in the calcium fluoride raw material is 0.3-4 wt.%.

较佳地,所述含氟气氛为CF4气体,或者HF气体,或者CF4气体与惰性气体的混合气体,或者HF气体与惰性气体的混合气体,或者CF4气体与HF气体以及惰性气体的混合气体。Preferably, the fluorine - containing atmosphere is CF4 gas, or HF gas, or a mixed gas of CF4 gas and inert gas, or a mixed gas of HF gas and inert gas, or a mixture of CF4 gas, HF gas and inert gas. mixed composition.

较佳地,所述混合气体中CF4气体的体积分数为3~25%。Preferably, the volume fraction of CF 4 gas in the mixed gas is 3-25%.

较佳地,所述惰性气体是Ar和/或N2Preferably, the inert gas is Ar and/or N 2 .

本发明所述方法利用包括降低关键杂质阳离子含量、降低残余O含量以及降低晶体中F空位浓度等手段。当氟化钙晶体中的关键杂质阳离子总含量在1ppm以下,且O含量以及F空位浓度尽量低时,氟化钙晶体抗辐照损伤性能将得到明显提升。The method of the present invention utilizes means including reducing the content of key impurity cations, reducing the residual O content, and reducing the concentration of F vacancies in the crystal. When the total content of the key impurity cations in the calcium fluoride crystal is below 1 ppm, and the O content and the F vacancy concentration are as low as possible, the radiation damage resistance of the calcium fluoride crystal will be significantly improved.

附图说明Description of drawings

图1为实施例1制备的氟化钙晶体样品在193nm辐照(损伤)前后的晶体照片;Fig. 1 is the crystal photograph of the calcium fluoride crystal sample prepared in Example 1 before and after irradiation (damage) at 193 nm;

图2为实施例1制备的氟化钙晶体样品经193nm辐照前后的吸收光谱;Fig. 2 is the absorption spectrum of the calcium fluoride crystal sample prepared in Example 1 before and after 193nm irradiation;

图3为实施例1与实施例3制备的氟化钙晶体样品辐照的EPR图谱;Fig. 3 is the EPR spectrum of the calcium fluoride crystal sample irradiation of embodiment 1 and embodiment 3 preparation;

图4为实施例1-5制备的氟化钙晶体样品的双晶摇摆曲线;Fig. 4 is the double crystal rocking curve of the calcium fluoride crystal sample prepared by embodiment 1-5;

图5为实施例1-5制备的氟化钙晶体样品的损伤阈值情况。FIG. 5 shows the damage threshold of the calcium fluoride crystal samples prepared in Examples 1-5.

具体实施方式Detailed ways

通过下述实施方式进一步说明本发明,应理解,下述实施方式仅用于说明本发明,而非限制本发明。以下示例性说明本发明所述提高氟化钙晶体193nm激光辐照硬度的方法。也可以称为提高193nm激光辐照下氟化钙晶体抗体损伤的方法。The present invention is further described by the following embodiments, and it should be understood that the following embodiments are only used to illustrate the present invention, but not to limit the present invention. The following exemplifies the method for improving the hardness of calcium fluoride crystal irradiated by 193 nm laser in the present invention. It can also be referred to as a method for enhancing the antibody damage of calcium fluoride crystals under 193 nm laser irradiation.

通过对氟化钙晶体损伤样品进行吸收光谱、电子顺磁共振(electronparamagnanetic resonance,EPR)、拉曼光谱(Raman)、损伤形貌、典型的线缺陷等综合分析,结合模拟计算,获得了影响ArF-193nm准分子激光辐照下损伤的关键影响因素。在此基础上,本发明对上述关键影响因素进行调控,实现提升氟化钙晶体在193nm下的辐照硬度。Through the comprehensive analysis of absorption spectrum, electron paramagnanetic resonance (EPR), Raman spectrum (Raman), damage morphology and typical line defects of calcium fluoride crystal damaged samples, combined with simulation calculation, the influence of ArF was obtained. -Key influencing factors of damage under 193nm excimer laser irradiation. On this basis, the present invention regulates the above-mentioned key influencing factors, so as to improve the irradiation hardness of calcium fluoride crystals at 193 nm.

对辐照硬度不同的氟化钙晶体进行吸收光谱分析,发现出现明显体损伤的样品表现出几个明显的色心吸收峰,色心分别对应于F心(氟空位捕获电子)、Vk心或H心(Vk心为100方向间隙氟与晶格氟的二聚体F2 -;H心为111方向间隙氟与晶格氟的二聚体F2 -)、M心(F心的聚集体)以及和O杂质相关的色心吸收峰。这些色心吸收带主要由关键杂质离子的低位s轨道与d轨道与F心波函数发生重叠导致。EPR结果表明:发生体损伤的样品中单电子中心除受F核影响外,还受到自旋量子数I=5/2的磁性核影响。通过引入不同种类及含量的阳离子杂质,在保证均具有高光学质量的前提下,借助193nm下的辐照实验确定了影响193nm抗辐照性能的关键阳离子杂质为具有低位s轨道与d轨道杂质阳离子。具有低位s轨道与d轨道杂质阳离子,包括但不限于Y、La、Ce、Gd、Tb、Lu等离子。这些杂质阳离子的存在将会加速氟化钙晶体中F心、H心和M心的形成。The absorption spectrum analysis of calcium fluoride crystals with different irradiation hardnesses shows that the samples with obvious bulk damage show several obvious color center absorption peaks, and the color centers correspond to the F center (fluorine vacancy captures electrons) and V k center respectively. Or H heart (V k heart is the dimer F 2 - of interstitial fluorine and lattice fluorine in 100 direction; H heart is the dimer F 2 - of interstitial fluorine and lattice fluorine in 111 direction), M heart (of F heart aggregates) and color center absorption peaks associated with O impurities. These color center absorption bands are mainly caused by the overlapping of the low-position s and d orbitals of the key impurity ions with the F-center wave function. The EPR results show that the single electron center in the samples with bulk damage is not only affected by the F nucleus, but also by the magnetic nucleus with the spin quantum number I=5/2. By introducing different types and contents of cationic impurities, on the premise of ensuring high optical quality, the key cationic impurities affecting the radiation resistance at 193nm were determined by the irradiation experiments at 193nm to be cations with low s orbital and d orbital impurities . Impurity cations with low s orbital and d orbital, including but not limited to Y, La, Ce, Gd, Tb, Lu plasma. The presence of these impurity cations will accelerate the formation of F, H and M hearts in calcium fluoride crystals.

发现纯化后氟化钙原料中具有低位s轨道与d轨道的杂质阳离子Y、La、Ce、Gd、Tb、Lu等总含量优选低于<1ppm。上述杂质含量引起的晶格畸变在可控范围,不会造成晶体开裂等缺陷,能够保证晶体生长质量。而且,也能够保证特定应用波段范围内无吸收。在实际应用中,可放宽对其他阳离子杂质的要求以有效降低成本。It is found that the total content of impurity cations Y, La, Ce, Gd, Tb, Lu, etc. with low-position s orbital and d orbital in the calcium fluoride raw material after purification is preferably less than <1ppm. The lattice distortion caused by the above impurity content is in a controllable range, and defects such as crystal cracking will not be caused, and the crystal growth quality can be guaranteed. Moreover, it can also ensure that there is no absorption in the specific application band range. In practical applications, the requirements for other cationic impurities can be relaxed to effectively reduce costs.

提纯方法包括但不限于化学沉淀法和/或区熔法。两种提纯方法的目的都是为了将关键阳离子含量降低至1ppm以下,以防止在辐照过程中诱发色心。可以仅采用化学沉淀法或区熔法将氟化钙原料纯化至杂质阳离子总含量低于<1ppm。但是单一的提纯方法相对存在局限性,例如化学提纯法,在经过离子交换树脂两次吸附后,提纯效果就大大下降,而区熔法对于分凝系数接近1的杂质离子难以做到有效排杂。因此优选采用多种提纯方法组合的方式来控制关键杂质阳离子的含量。Purification methods include, but are not limited to, chemical precipitation and/or zone melting. Both purification methods aim to reduce the critical cation content below 1 ppm to prevent the induction of color centers during irradiation. The calcium fluoride feedstock can be purified to <1 ppm total impurity cations using only chemical precipitation or zone melting. However, a single purification method is relatively limited. For example, chemical purification method, after two adsorptions by ion exchange resin, the purification effect is greatly reduced, and the zone melting method is difficult to achieve effective impurity removal for impurity ions with a segregation coefficient close to 1 . Therefore, it is preferable to use a combination of various purification methods to control the content of key impurity cations.

一些技术方案中,通过化学沉淀法纯化原料,采用区熔法进一步纯化原料,监测具有低位s轨道与d轨道的杂质阳离子含量。优选地,采用化学沉淀法纯化高纯氟化钙原料,控制Y、La、Ce、Gd、Tb、Lu等阳离子杂质含量在1-10ppm;然后采用区熔法提纯对氟化钙原料进行继续纯化处理,控制Y、La、Ce、Gd、Tb、Lu等阳离子杂质含量<1ppm。结合化学沉淀法与区熔法的两种纯化方法以控制晶体中的关键杂质离子的含量。试验发现,就具有低位s轨道与d轨道,能与F心波函数发生重叠的阳离子而言,其主要都为三价重金属阳离子杂质。因此可以考虑采用离子交换树脂进行进一步提纯。阳离子交换树脂对高价、离子半径大的阳离子具有更强的吸附性,适合用来提出氟化钙原料中的关键杂质离子。In some technical solutions, the raw material is purified by chemical precipitation method, and the raw material is further purified by zone melting method, and the content of impurity cations with low s orbital and d orbital is monitored. Preferably, chemical precipitation is used to purify high-purity calcium fluoride raw materials, and the content of cationic impurities such as Y, La, Ce, Gd, Tb, Lu, etc. is controlled at 1-10 ppm; Treatment, control the content of cationic impurities such as Y, La, Ce, Gd, Tb, Lu, etc. <1ppm. Combining two purification methods of chemical precipitation and zone melting to control the content of key impurity ions in the crystal. The experiment found that the cations with low-position s orbital and d orbital that can overlap with the F-heart wave function are mainly trivalent heavy metal cation impurities. Therefore, ion exchange resins can be considered for further purification. Cation exchange resin has stronger adsorption to cations with high price and large ionic radius, and is suitable for extracting key impurity ions in calcium fluoride raw materials.

作为示例,化学沉淀法纯化氟化钙原料的步骤为:As an example, the steps of chemical precipitation purification of calcium fluoride raw materials are:

采用直接沉淀法合成晶体生长所需的高纯氟化钙原料。反应原料为分析纯的硝酸钙和氟化钾。为去除原料中的关键杂质阳离子,首先将硝酸钙和氟化钾溶液进行纯化。将150g硝酸钙配制成0.15g/mL的硝酸钙溶液,加入1000mL吡啶-2,6二羧酸钠,通过加入硝酸将pH调整在1.6-2之间,然后将该混合液以2-3mL/min的速率泵入含有500mL伯乐Bio-RadAG1-X4阴离子交换树脂的色谱柱中,流过色谱柱后得到一次纯化的原料。将以上纯化步骤重复三次以得到纯化原料。在这个过程中,吡啶-2,6二羧酸与杂质阳离子形成阴离子络合物,当混合液流过色谱柱时,该络合物被吸附在阴离子交换树脂上,从而达到提纯的目的。氟化钾采用类似步骤进行排杂。将150g氟化钾配置成0.15g/mL的氟化钾溶液,加入1000mL吡啶-2,6二羧酸钠,通过加入硝酸将pH调整在1.6-2之间,然后将该混合液以2-3mL/min的速率泵入含有500mL伯乐Bio-Rad AG1-X4阴离子交换树脂的色谱柱中,流过色谱柱后得到一次纯化的原料。将以上纯化步骤重复三次以得到纯化原料。将纯化过的氟化钾直接导入纯化过的硝酸钙溶液中反应,待反应充分后陈化3小时,经过高速离心获得氟化钙凝胶,再经过超声分散的过程,以去掉氟化钙凝胶吸附的K+离子以及硝酸根离子,并重复离心和洗涤过程3次,经过冷冻干燥以及研磨即可获得高纯的氟化钙原料。The high-purity calcium fluoride raw material required for crystal growth is synthesized by the direct precipitation method. The raw materials for the reaction were analytically pure calcium nitrate and potassium fluoride. In order to remove the key impurity cations in the raw material, calcium nitrate and potassium fluoride solutions are first purified. 150g calcium nitrate was prepared into 0.15g/mL calcium nitrate solution, 1000mL sodium pyridine-2,6 dicarboxylate was added, the pH was adjusted between 1.6-2 by adding nitric acid, and then the mixed solution was added to 2-3mL/ It was pumped into a chromatographic column containing 500 mL of Bio-Rad AG1-X4 anion exchange resin at the rate of min, and the purified raw material was obtained after passing through the chromatographic column. The above purification steps were repeated three times to obtain purified starting materials. In this process, pyridine-2,6 dicarboxylic acid and impurity cations form an anion complex. When the mixed solution flows through the chromatographic column, the complex is adsorbed on the anion exchange resin, so as to achieve the purpose of purification. Potassium fluoride uses a similar procedure for impurity removal. 150 g of potassium fluoride was prepared into a 0.15 g/mL potassium fluoride solution, 1000 mL of sodium pyridine-2,6 dicarboxylate was added, and the pH was adjusted between 1.6-2 by adding nitric acid, and then the mixture was adjusted to 2- The rate of 3mL/min was pumped into a chromatographic column containing 500mL of Bio-Rad AG1-X4 anion exchange resin, and the primary purified raw material was obtained after passing through the chromatographic column. The above purification steps were repeated three times to obtain purified starting materials. The purified potassium fluoride is directly introduced into the purified calcium nitrate solution to react, and after the reaction is sufficient, it is aged for 3 hours, and the calcium fluoride gel is obtained by high-speed centrifugation, and then goes through the process of ultrasonic dispersion to remove the calcium fluoride gel K + ions and nitrate ions adsorbed by the gel, and repeat the centrifugation and washing process 3 times, after freeze-drying and grinding, high-purity calcium fluoride raw materials can be obtained.

优选地,在高真空炉中对直接沉淀法合成的氟化钙粉体进行脱氧、氟化处理后获得纯度优于99.9999%(6N量级)的粉体原料。反应温度为500℃~900℃,保温时间为6h~20h,氟化剂是CF4。还可根据不同杂质元素氟化物沸点的差异性,采用高温熔融方式通过物理升华的方法进一步去除原料中的杂质离子和含氧杂质,获得更高纯度的晶态原料。Preferably, the calcium fluoride powder synthesized by the direct precipitation method is deoxidized and fluorinated in a high vacuum furnace to obtain a powder raw material with a purity better than 99.9999% (6N order). The reaction temperature is 500℃~900℃, the holding time is 6h~20h, and the fluorinating agent is CF 4 . According to the difference in the boiling point of fluorides of different impurity elements, the impurity ions and oxygen-containing impurities in the raw materials can be further removed by physical sublimation by means of high-temperature melting to obtain higher-purity crystalline raw materials.

作为示例,区熔法提纯氟化钙原料的步骤为:通过对晶体中杂质元素的分布进行分析,获得了部分杂质离子在晶体中分布规律:尾部高于头部、中心高于边界处。为了进一步提高晶体的纯度,一方面基于Ce、La、Gd等杂质在CaF2晶格中的分凝特性,精确控制生长界面(微凸)和结晶速率(原子层堆积),极致利用晶体生长过程中的晶格自我排杂能力实现晶体的提纯;另一方面采用两次生长排杂,并结合多次化学纯化(煅烧、溶解、沉淀)的方案,最终突破Ce、La、Gd等杂质含量的已有极限,使得晶体原料纯度达到7N量级。As an example, the step of purifying calcium fluoride raw material by zone melting method is: by analyzing the distribution of impurity elements in the crystal, the distribution law of some impurity ions in the crystal is obtained: the tail is higher than the head, and the center is higher than the boundary. In order to further improve the purity of the crystal, on the one hand, based on the segregation characteristics of impurities such as Ce, La, Gd in the CaF 2 lattice, the growth interface (micro-convexity) and crystallization rate (atomic layer stacking) are precisely controlled, and the crystal growth process is fully utilized. The self-extracting ability of the crystal lattice in the crystal can realize the purification of the crystal; on the other hand, two times of growth and impurity removal, combined with multiple chemical purification (calcination, dissolution, precipitation) schemes, finally break through the impurity content of Ce, La, Gd and so on. There is a limit, so that the purity of the crystal raw material reaches the order of 7N.

另一些技术方案中,先纯化氟化钙原料,控制关键杂质阳离子含量在1-10ppm;然后采用化学沉淀法对氟化钙原料进行继续纯化处理,控制杂质阳离子含量<1ppm。In other technical solutions, the calcium fluoride raw material is first purified, and the content of key impurity cations is controlled at 1-10 ppm; then the calcium fluoride raw material is continuously purified by chemical precipitation, and the impurity cation content is controlled to be less than 1 ppm.

通过对F心、H心、M心等典型色心的形成过程分析,发现其形成均与晶体中的F空位相关,因此控制氟化钙晶体中的F空位浓度是提高辐照硬度的另一手段。在氟化钙晶体的生长过程中通入含F气氛,有助于降低晶体中F空位的浓度。另外,对发生体损伤样品进行吸收光谱分析表明,480nm处的吸收峰与氧杂质相关,考虑到氧的掺入会导致晶体中F空位的增加,氟化钙原料及晶体生长过程中又难以避免氧的污染,所以尽可能降低晶体中的残余氧也是提高辐照硬度的重要手段。By analyzing the formation process of typical color centers such as F, H, and M centers, it is found that their formation is related to the F vacancies in the crystal. Therefore, controlling the concentration of F vacancies in the calcium fluoride crystal is another way to improve the irradiation hardness. means. During the growth of calcium fluoride crystals, the F-containing atmosphere is introduced to help reduce the concentration of F vacancies in the crystals. In addition, the absorption spectrum analysis of the damaged samples showed that the absorption peak at 480 nm is related to oxygen impurities. Considering that the incorporation of oxygen will lead to the increase of F vacancies in the crystal, it is difficult to avoid the calcium fluoride raw material and the crystal growth process. Therefore, reducing the residual oxygen in the crystal as much as possible is also an important means to improve the irradiation hardness.

采用提纯后的氟化钙原料和除氧剂作为初始原料,通过坩埚下降法或温度梯度法在真空气氛下进行氟化钙晶体的生长,并在含氟气氛中退火,得到高激光辐照硬度的氟化钙晶体。Using purified calcium fluoride raw material and oxygen scavenger as initial raw materials, calcium fluoride crystals are grown in vacuum atmosphere by crucible descending method or temperature gradient method, and annealed in fluorine-containing atmosphere to obtain high laser irradiation hardness of calcium fluoride crystals.

在氟化钙晶体生长过程中加入适量的除氧剂,可以降低晶体中的O含量。除氧剂可以是氟化铅或聚四氟乙烯。除氧剂占氟化钙原料的质量百分比范围为0.3~3wt.%。作为示例,除氧剂占氟化钙原料的质量百分比是2.5wt.%。Adding an appropriate amount of oxygen scavenger during the growth of calcium fluoride crystals can reduce the O content in the crystals. The oxygen scavenger can be lead fluoride or Teflon. The mass percentage of the oxygen scavenger in the calcium fluoride raw material ranges from 0.3 to 3 wt.%. As an example, the mass percentage of the oxygen scavenger in the calcium fluoride raw material is 2.5 wt.%.

所述含氟退火气氛为CF4气体,或者HF气体,或者CF4气体与惰性气体的混合气体,或者HF气体与惰性气体的混合气体,或者CF4气体与HF气体与惰性气体的混合气体。一些技术方案中,混合气体的CF4的浓度范围为3%~25%。 The fluorine - containing annealing atmosphere is CF4 gas, or HF gas, or a mixed gas of CF4 gas and inert gas, or a mixed gas of HF gas and inert gas, or a mixed gas of CF4 gas, HF gas and inert gas. In some technical solutions, the concentration of CF 4 in the mixed gas ranges from 3% to 25%.

以坩埚下降法为例生长氟化钙晶体并在含氟气氛中退火的步骤为:Taking the crucible descending method as an example, the steps of growing calcium fluoride crystals and annealing in a fluorine-containing atmosphere are:

配料:使用纯度为5N级的药品经去除关键阳离子杂质后的原料,掺入2.5wt.%的PbF2作为除氧剂。Ingredients: Use the raw materials of 5N-grade pharmaceuticals after removing key cation impurities, and add 2.5wt.% PbF 2 as an oxygen scavenger.

混料:将称量好的原料放入混料桶,在混料机上搅拌24h使其混合均匀。Mixing: Put the weighed raw materials into the mixing bucket, and stir on the mixer for 24 hours to make them evenly mixed.

晶体生长与气氛退火:装炉完毕后,抽真空至大于5×10-3Pa,然后升温化料,首先升温至200℃,保温10h以排除原料中的水分及空气;20~50℃/h继续升温至800℃,保温15h;之后继续加热升温至1400-1450℃,保温化料10h,化料结束后开始缓慢下降坩埚进行长晶。下降速度为0.1~0.5mm/h,晶体生长完成后以20~50℃/h的速率降至室温。静置5h后充入体积分数为15%的四氟化碳和氩气的混合气体进行退火,以20~50℃/h的升温速率升温至900~1100℃,然后恒温20~60h,再以小于20℃/h的降温速率降至室温。Crystal growth and atmosphere annealing: after the furnace is installed, vacuumize to more than 5×10 -3 Pa, then heat up the material, first heat up to 200°C, and keep it for 10h to remove moisture and air in the raw material; 20~50°C/h Continue to heat up to 800°C and hold for 15h; then continue to heat up to 1400-1450°C, keep the material for 10 hours, and slowly lower the crucible to grow crystals after the material is finished. The descending speed is 0.1-0.5 mm/h, and after the crystal growth is completed, the temperature is lowered to room temperature at a rate of 20-50 °C/h. After standing for 5 hours, it was filled with a mixture of carbon tetrafluoride and argon with a volume fraction of 15% for annealing. The cooling rate of less than 20°C/h drops to room temperature.

以温度梯度法为例生长氟化钙晶体并在含氟气氛中退火的步骤为:Taking the temperature gradient method as an example, the steps of growing calcium fluoride crystals and annealing in a fluorine-containing atmosphere are:

配料:使用纯度为5N级的药品经去除关键杂质阳离子杂质后的原料,掺入2.5wt.%的PbF2作为除氧剂。Ingredients: Use the raw materials of 5N-grade pharmaceuticals after removing key impurities and cationic impurities, and add 2.5wt.% PbF 2 as an oxygen scavenger.

混料:将称量好的原料放入混料桶,在混料机上搅拌24h使其混合均匀。Mixing: Put the weighed raw materials into the mixing bucket, and stir on the mixer for 24 hours to make them evenly mixed.

晶体生长与气氛退火:将混合后的原料装入坩埚,并放入配置有高真空密闭炉腔的温度梯度法晶体生长设备的温度梯度区间,具体位置选择视晶体生长设备的温度分布设计而异。优选地,下装料仓底部的位置与发热体底部边缘持平。采用扩散泵或者涡轮分子泵将炉腔内抽成高真空状态(优于10-3Pa量级)。生长过程中腔体内保持高真空或者充入高纯(优于99.999%)氩气、CF4为保护气氛。以20~80℃/h的升温速率将坩埚加热至高于原料熔点10~100℃的温度进行化料(以放置于坩埚底部的热偶测量的温度为准),其间在150~300℃恒温5~30h以烘干原料中的水分,在600~900℃恒温12h以发挥除氧剂的作用。于化料温度恒温5~30h之后,以0.2~5℃/h的降温速率降温100~200℃,优选地,以0.5~2℃/h的降温速率降温150℃,完成晶体结晶过程。最后,以10~30℃/h的降温速率降至常温。静置5h后充入体积分数为15%的四氟化碳和氩气的混合气体,以20~50℃/h的升温速率升温至900~1100℃,然后恒温20~60h,再以小于20℃/h的降温速率降至室温。Crystal growth and atmosphere annealing: put the mixed raw materials into the crucible and put it into the temperature gradient range of the temperature gradient method crystal growth equipment equipped with a high vacuum closed furnace chamber. The specific location selection depends on the temperature distribution design of the crystal growth equipment. . Preferably, the position of the bottom of the lower charging bin is flush with the bottom edge of the heating element. Use a diffusion pump or a turbomolecular pump to evacuate the furnace chamber into a high vacuum state (better than 10 -3 Pa). During the growth process, the cavity is kept in high vacuum or filled with high-purity (better than 99.999%) argon and CF4 as protective atmosphere. Heat the crucible to a temperature 10-100°C higher than the melting point of the raw material at a heating rate of 20-80°C/h (subject to the temperature measured by a thermocouple placed at the bottom of the crucible), during which a constant temperature of 150-300°C for 5 ~30h to dry the moisture in the raw materials, and keep the temperature at 600~900℃ for 12h to play the role of oxygen scavenger. After the temperature of the chemical is kept constant for 5-30 hours, the temperature is lowered by 100-200°C at a cooling rate of 0.2-5°C/h, preferably, the temperature is lowered by 150°C at a cooling rate of 0.5-2°C/h to complete the crystal crystallization process. Finally, the temperature is lowered to normal temperature at a cooling rate of 10-30°C/h. After standing for 5 hours, fill with a mixture of carbon tetrafluoride and argon with a volume fraction of 15%, and heat up to 900 to 1100 °C at a heating rate of 20 to 50 °C/h, and then keep the temperature for 20 to 60 hours. The cooling rate of ℃/h was reduced to room temperature.

事实上,由于努尔森扩散机制,在极低气压下,仍存在一定含量的氧扩散,因此,仅靠抽真空难以保证晶体中氧被去除,因此,需要通过化学反应去除晶体中的氧。为保证晶体生长过程中晶体生长界面的控制,采用抽真空生长,气氛退火方式除氧。引入四氟乙烯,其主要除氧机理为:In fact, due to the Nurson diffusion mechanism, there is still a certain amount of oxygen diffusing under extremely low pressure. Therefore, it is difficult to ensure that the oxygen in the crystal is removed by vacuuming alone. Therefore, it is necessary to remove the oxygen in the crystal through a chemical reaction. In order to ensure the control of the crystal growth interface during the crystal growth process, vacuum growth and atmosphere annealing are used to remove oxygen. Introducing tetrafluoroethylene, its main deoxygenation mechanism is:

Figure BDA0003637983810000061
Figure BDA0003637983810000061

C2F4+2CaO+O2→2CO2↑+2CaF2 C 2 F 4 +2CaO+O 2 →2CO 2 ↑+2CaF 2

在现有技术中,在长晶前通过引入四氟化碳气体和氩气的混合气体氟化原料,但在长晶过程中仍采用抽真空的方式进行生长。这种方法主要能够去除吸附在晶体表面的小分子化合物,所能改善的透过率主要为红外波段小分子振动吸收导致的透过率下降现象。但是影响氟化钙晶体辐照硬度的氧空位对在抽真空生长时仍会出现,因此本发明在退火环节充入含氟气氛例如四氟化碳和氩气的混合气体来改善晶体生长过程中出现的氧空位对情况。同时,这里含氟气氛还有另外的重要目的,则是在氟过量的气氛下减少氟化钙晶体中的氟空位。In the prior art, the raw material is fluorinated by introducing a mixed gas of carbon tetrafluoride gas and argon gas before crystal growth, but the growth is still performed by vacuuming during crystal growth. This method can mainly remove the small molecule compounds adsorbed on the crystal surface, and the transmittance that can be improved is mainly the decrease in transmittance caused by the vibrational absorption of small molecules in the infrared band. However, the oxygen vacancy pairs that affect the irradiation hardness of calcium fluoride crystals will still appear during vacuum growth. Therefore, in the present invention, a fluorine-containing atmosphere such as a mixed gas of carbon tetrafluoride and argon is charged in the annealing process to improve the crystal growth process. Oxygen vacancy pairs that arise. At the same time, the fluorine-containing atmosphere here has another important purpose, which is to reduce the fluorine vacancies in the calcium fluoride crystal under the fluorine excess atmosphere.

现有技术从晶体生长的角度,加入的PbF2或者聚四氟乙烯均是作为除氧剂,这是由于在晶体生长过程中,即使在抽真空的情况下,仍可能会有一定的氧分压,另外,氟化钙当中的某些杂质元素是以氧化物的形式存在,因此,从制备角度来说,在氟化物晶体的生长过程中加入除氧剂是比较常用的手段。本发明则是从提高氟化钙晶体的抗辐照损伤性能出发,基于对激光辐照损伤实验结果的分析,提出了影响氟化钙晶体抗辐照损伤的三大关键因素:5d轨道相关的关键杂质离子含量、氟空位和晶格氧。本发明提出控制氧的依据是损伤机理分析,此处晶格氧指的是晶体中进入晶格位置处的氧,会与晶格处空位形成氧空位对,空位捕获电子形成色心导致晶体产生损伤。而抑制晶格氧最好的方法是将除氧剂与原料混合使用,因为氟化钙原料多为高纯粉末状,由于粉末比表面积更大,并且氟与氢同样能形成氢键作用,其对空气中小分子化合物的吸附作用更大,因此在原料粉末表面吸附的类似氢氧根、水分子等小分子化合物仅通过在除氧剂托盘中加入除氧剂粉末难以排尽,还是应通过混料的方式消除可能进入晶格中的氧。本发明进一步提高了PbF2除氧剂比例,并增加混料时间,以尽可能的消除晶格氧的存在。在晶体生长体系中,Pb杂质存在形式仅为PbF2或PbO,在实际生长晶体过程中,可以通过设置控温程序,将这两种物质挥发排出。在实际测试中也证实了Pb杂质基本被排出,对193nm激光辐照硬度基本无影响。而且,本发明使用含氟气氛并非是用来氟化原料,而是在晶体的退火环节使用含氟气氛,主要目的是在减少或消除氟空位。From the perspective of crystal growth in the prior art, the added PbF or polytetrafluoroethylene are used as oxygen scavengers, because during the crystal growth process, even in the case of vacuuming, there may still be a certain amount of oxygen. In addition, some impurity elements in calcium fluoride exist in the form of oxides. Therefore, from the perspective of preparation, adding an oxygen scavenger during the growth of fluoride crystals is a more common method. The present invention starts from improving the anti-irradiation damage performance of calcium fluoride crystals, based on the analysis of the results of laser irradiation damage experiments, and proposes three key factors affecting the anti-irradiation damage of calcium fluoride crystals: 5d orbital related Key impurity ion content, fluorine vacancies and lattice oxygen. The basis for controlling oxygen in the present invention is the analysis of damage mechanism. Here, lattice oxygen refers to the oxygen entering the lattice position in the crystal, which will form oxygen-vacancy pairs with vacancies in the lattice, and the vacancies capture electrons to form color centers, resulting in the formation of crystals. damage. The best way to suppress lattice oxygen is to mix the oxygen scavenger with the raw materials, because the calcium fluoride raw materials are mostly high-purity powders, because the powder has a larger specific surface area, and fluorine and hydrogen can also form hydrogen bonds. It has a greater adsorption effect on small molecular compounds in the air. Therefore, the small molecular compounds such as hydroxide and water molecules adsorbed on the surface of the raw material powder are difficult to be exhausted only by adding the deoxidizer powder to the deoxidizer tray, or should be mixed. In this way, the oxygen that may enter the crystal lattice is eliminated. The invention further improves the ratio of PbF 2 oxygen scavenger and increases the mixing time to eliminate the existence of lattice oxygen as much as possible. In the crystal growth system, the Pb impurity exists only in the form of PbF 2 or PbO. In the actual crystal growth process, the temperature control program can be set to volatilize and discharge these two substances. In the actual test, it was also confirmed that the Pb impurity was basically discharged and had no effect on the hardness of the 193nm laser irradiation. Moreover, the fluorine-containing atmosphere used in the present invention is not used to fluoride the raw materials, but the fluorine-containing atmosphere is used in the annealing process of the crystal, and the main purpose is to reduce or eliminate fluorine vacancies.

综上,降低关键杂质阳离子含量、降低残余O含量以及降低晶体中F空位浓度这三种手段共用,可以从源头上避免了色心的形成以提高晶体抗辐照性能。在一些技术方案中,通过原料处理及生长工艺控制,控制Y、La、Ce、Gd、Tb、Lu等杂质离子总含量低于<1ppm,添加0.3~4wt%除氧剂,并通入3%~25%含氟气氛时,氟化钙晶体在193nm下的抗辐照损伤性能得到明显提升,经七千万脉冲的辐照后仍未出现损伤情况。In summary, the three methods of reducing the content of key impurity cations, reducing the residual O content and reducing the concentration of F vacancies in the crystal can avoid the formation of color centers from the source and improve the radiation resistance of the crystal. In some technical solutions, through raw material treatment and growth process control, the total content of impurity ions such as Y, La, Ce, Gd, Tb, Lu, etc. is controlled to be less than 1ppm, 0.3-4wt% deoxidizer is added, and 3% In an atmosphere containing ~25% fluorine, the anti-irradiation damage performance of calcium fluoride crystals at 193 nm is significantly improved, and no damage occurs after 70 million pulses of irradiation.

对生长晶体进行定向和加工,获得

Figure BDA0003637983810000071
的(111)面氟化钙晶体。晶体进行超精密抛光,粗糙度小于1nm。采用MLI-FBG准分子激光器,调节能量密度、频率和脉宽,对不同的晶体进行193nm下的辐照损伤测试。Orientation and processing of the growing crystal yields
Figure BDA0003637983810000071
(111) face calcium fluoride crystals. The crystal is ultra-precisely polished with a roughness of less than 1nm. The MLI-FBG excimer laser was used to adjust the energy density, frequency and pulse width, and different crystals were tested for radiation damage at 193 nm.

下面进一步例举实施例以详细说明本发明。同样应理解,以下实施例只用于对本发明进行进一步说明,不能理解为对本发明保护范围的限制,本领域的技术人员根据本发明的上述内容作出的一些非本质的改进和调整均属于本发明的保护范围。下述示例具体的工艺参数等也仅是合适范围中的一个示例,即本领域技术人员可以通过本文的说明做合适的范围内选择,而并非要限定于下文示例的具体数值。The following further examples are given to illustrate the present invention in detail. It should also be understood that the following examples are only used to further illustrate the present invention, and should not be construed as limiting the protection scope of the present invention. Some non-essential improvements and adjustments made by those skilled in the art according to the above content of the present invention belong to the present invention. scope of protection. The specific process parameters and the like in the following examples are only an example of a suitable range, that is, those skilled in the art can make selections within the suitable range through the description herein, and are not intended to be limited to the specific numerical values exemplified below.

在下述实施例中,分别制备不同杂质含量、不同O含量及不同F空位浓度的氟化钙晶体。采用坩埚下降法生长晶体。杂质含量主要由不同的原料纯度来调节。不同的O含量通过脱氧剂的用量来调节。F空位浓度通过含氟气氛的浓度来调节。In the following examples, calcium fluoride crystals with different impurity contents, different O contents and different F vacancy concentrations were prepared respectively. The crystals were grown by the crucible descent method. The impurity content is mainly adjusted by the different raw material purities. Different O contents are adjusted by the amount of deoxidizer. The F vacancy concentration is adjusted by the concentration of the fluorine-containing atmosphere.

实施例1Example 1

氟化钙原料(硝酸钙、氟化钾)为商业购买。吡啶-2,6二羧酸钠、伯乐Bio-Rad AG1-X4阴离子交换树脂也均为商业化购买。氟化钙原料的Y、La、Ce、Gd、Tb、Lu等关键杂质阳离子的总含量为30.124ppm。Calcium fluoride raw materials (calcium nitrate, potassium fluoride) were purchased commercially. Sodium pyridine-2,6 dicarboxylate and Bio-Rad AG1-X4 anion exchange resin are also commercially available. The total content of key impurity cations such as Y, La, Ce, Gd, Tb, and Lu in the calcium fluoride raw material is 30.124 ppm.

利用坩埚下降法生长CaF2单晶。选择的坩埚材料为石墨坩埚,坩埚底部放入经X射线衍射仪定向端面法线方向为[111]的CaF2单晶棒,在高真空气氛中进行晶体生长。具体为:The CaF2 single crystal was grown by the crucible descent method. The selected crucible material is graphite crucible, and the bottom of the crucible is put into the CaF 2 single crystal rod with the normal direction of the end face oriented by X-ray diffractometer as [111], and the crystal growth is carried out in a high vacuum atmosphere. Specifically:

配料:使用纯度为5N级的药品原料,掺入0.5wt.%的PbF2作为除氧剂;Ingredients: Use 5N-grade pharmaceutical raw materials, mixed with 0.5wt.% PbF 2 as an oxygen scavenger;

混料:将称量好的原料放入混料桶,在混料机上搅拌24h使其混合均匀;Mixing: put the weighed raw materials into the mixing bucket, and stir on the mixer for 24 hours to make it evenly mixed;

晶体生长:装炉完毕后,抽真空至大于5×10-3Pa,然后升温化料,首先升温至200℃,保温10h以排除原料中的水分及空气;20~50℃/h继续升温至800℃,保温15h;之后继续加热升温至1400~1450℃,保温化料10h,化料结束后开始缓慢下降坩埚进行长晶。下降速度为0.1~0.5mm/h,晶体生长完成后以20~50℃/h的速率降至室温。Crystal growth: After the furnace is installed, vacuumize to more than 5×10 -3 Pa, then heat up the material, first heat it up to 200°C, and keep it for 10 hours to remove the moisture and air in the raw material; 20~50°C/h continue to heat up to 800 ℃, heat preservation for 15 hours; then continue to heat up to 1400 ~ 1450 ℃, heat preservation for 10 hours, and slowly lower the crucible to grow crystals after the material is finished. The descending speed is 0.1-0.5 mm/h, and after the crystal growth is completed, the temperature is lowered to room temperature at a rate of 20-50 °C/h.

实施例2Example 2

氟化钙原料经化学沉淀法提纯。提纯后的氟化钙原料的Y、La、Ce、Gd、Tb、Lu等关键杂质阳离子的总含量为8.623ppm。The calcium fluoride raw material is purified by chemical precipitation method. The total content of key impurity cations such as Y, La, Ce, Gd, Tb, and Lu in the purified calcium fluoride raw material was 8.623 ppm.

采用直接沉淀法合成晶体生长所需的高纯氟化钙原料,反应原料为分析纯的硝酸钙和氟化钾,为去除原料中的关键杂质阳离子,首先将硝酸钙和氟化钾溶液进行纯化。将150g硝酸钙配置成0.15g/mL的硝酸钙溶液,加入1000mL吡啶-2,6二羧酸钠,通过加入硝酸将pH调整在1.6-2之间,然后将该混合液以2-3mL/min的速率泵入含有500mL伯乐Bio-RadAG1-X4阴离子交换树脂的色谱柱中,流过色谱柱后得到一次纯化的原料,将以上纯化步骤重复三次以得到纯化原料。在这个过程中,吡啶-2,6二羧酸与杂质阳离子形成阴离子络合物,当混合液流过色谱柱时,该络合物被吸附在阴离子交换树脂上,从而达到提纯的目的。氟化钾采用类似步骤进行排杂:将150g氟化钾配置成0.15g/mL的氟化钾溶液,加入1000mL吡啶-2,6二羧酸钠,通过加入硝酸将pH调整在1.6-2之间,然后将该混合液以2-3mL/min的速率泵入含有500mL伯乐Bio-Rad AG1-X4阴离子交换树脂的色谱柱中,流过色谱柱后得到一次纯化的原料,将以上纯化步骤重复三次以得到纯化原料。The high-purity calcium fluoride raw materials required for crystal growth are synthesized by the direct precipitation method. The reaction raw materials are analytically pure calcium nitrate and potassium fluoride. In order to remove the key impurity cations in the raw materials, the calcium nitrate and potassium fluoride solutions are first purified. . 150g calcium nitrate was prepared into 0.15g/mL calcium nitrate solution, 1000mL sodium pyridine-2,6 dicarboxylate was added, the pH was adjusted between 1.6-2 by adding nitric acid, and then the mixed solution was added to 2-3mL/ The pump was pumped into a chromatographic column containing 500 mL of Bio-Rad AG1-X4 anion exchange resin at a rate of min, and the purified raw material was obtained after passing through the chromatographic column. The above purification steps were repeated three times to obtain purified raw materials. In this process, pyridine-2,6 dicarboxylic acid and impurity cations form an anion complex. When the mixed solution flows through the chromatographic column, the complex is adsorbed on the anion exchange resin, so as to achieve the purpose of purification. Potassium fluoride uses similar steps to remove impurities: 150g potassium fluoride is prepared into a 0.15g/mL potassium fluoride solution, 1000mL sodium pyridine-2,6 dicarboxylate is added, and the pH is adjusted by adding nitric acid between 1.6-2 Then, the mixture was pumped into a chromatographic column containing 500 mL of Bio-Rad AG1-X4 anion exchange resin at a rate of 2-3 mL/min. After passing through the chromatographic column, a purified raw material was obtained, and the above purification steps were repeated. three times to obtain purified starting material.

将纯化过的氟化钾直接导入纯化过的硝酸钙溶液中反应,待反应充分后陈化3小时,经过高速离心获得氟化钙凝胶,再经过超声分散的过程,以去掉氟化钙凝胶吸附的K+离子以及硝酸根离子,并重复离心和洗涤过程3次,经过冷冻干燥以及研磨后即可获得高纯的氟化钙原料。还可以在高真空炉中对所制备的CaF2粉体进行脱氧、氟化处理获得纯度优于99.9999%(6N量级)的粉体原料,反应温度为700℃,保温时间为13h,氟化剂选择的是CF4The purified potassium fluoride is directly introduced into the purified calcium nitrate solution to react, and after the reaction is sufficient, it is aged for 3 hours, and the calcium fluoride gel is obtained by high-speed centrifugation, and then goes through the process of ultrasonic dispersion to remove the calcium fluoride gel K + ions and nitrate ions adsorbed by the gel, and repeat the centrifugation and washing process 3 times, after freeze-drying and grinding, high-purity calcium fluoride raw materials can be obtained. The prepared CaF 2 powder can also be deoxidized and fluorinated in a high vacuum furnace to obtain powder raw materials with a purity of better than 99.9999% (6N order), the reaction temperature is 700 ° C, the holding time is 13h, and the fluorination The agent of choice is CF 4 .

晶体生长工艺与实施例1相同。区别在于采用化学沉淀法去除关键阳离子杂质后的药品原料。The crystal growth process was the same as that of Example 1. The difference lies in the pharmaceutical raw material after chemical precipitation is used to remove key cationic impurities.

实施例3Example 3

采用与实施例2相同的方法对氟化钙原料经化学沉淀法提纯。化学沉淀法提纯的氟化钙原料中Y、La、Ce、Gd、Tb、Lu等关键杂质阳离子的总含量为8.623ppm。The calcium fluoride raw material was purified by chemical precipitation in the same manner as in Example 2. The total content of key impurity cations such as Y, La, Ce, Gd, Tb, Lu in the calcium fluoride raw material purified by chemical precipitation is 8.623 ppm.

对化学沉淀法提纯后的氟化钙原料经区熔法进一步提纯。区熔法提纯后的氟化钙原料中Y、La、Ce、Gd、Tb、Lu等关键杂质阳离子的总含量为0.801ppm。区熔法提纯的具体操作为采用坩埚下降法进行晶体生长,生长结束后,取上等径(晶体等径部位向上取三分之二)晶体作为二次纯化的原料,二次生长后再同样取上等级(晶体等径向上取三分之二)晶体作为最终晶体生长的原料。The calcium fluoride raw material purified by chemical precipitation method is further purified by zone melting method. The total content of key impurity cations such as Y, La, Ce, Gd, Tb, Lu in the calcium fluoride raw material purified by the zone melting method is 0.801 ppm. The specific operation of the purification by zone melting method is to use the crucible descending method to carry out crystal growth. After the growth, take the same diameter (two-thirds of the crystal equal diameter part upwards) crystal as the raw material for secondary purification, and then the same after the secondary growth. The upper grade (two-thirds of the crystal isometrically taken) was taken as the raw material for the final crystal growth.

晶体生长工艺与实施例1相同。区别在于采用化学沉淀法和区融法去除关键阳离子杂质后的药品原料。The crystal growth process was the same as that of Example 1. The difference lies in the use of chemical precipitation and zone melting to remove key cationic impurities in the pharmaceutical raw materials.

实施例4Example 4

采用与实施例2相同的方法对氟化钙原料经化学沉淀法提纯。化学沉淀法提纯的氟化钙原料中Y、La、Ce、Gd、Tb、Lu等关键杂质阳离子的总含量为8.623ppm。The calcium fluoride raw material was purified by chemical precipitation in the same manner as in Example 2. The total content of key impurity cations such as Y, La, Ce, Gd, Tb, Lu in the calcium fluoride raw material purified by chemical precipitation is 8.623 ppm.

采用与实施例3相同的方法对对化学沉淀法提纯后的氟化钙原料经区熔法进一步提纯。区熔法提纯后的氟化钙原料中Y、La、Ce、Gd、Tb、Lu等关键杂质阳离子的总含量为0.801ppm。The calcium fluoride raw material purified by the chemical precipitation method was further purified by the zone melting method using the same method as in Example 3. The total content of key impurity cations such as Y, La, Ce, Gd, Tb, Lu in the calcium fluoride raw material purified by the zone melting method is 0.801 ppm.

晶体生长工艺与实施例1基本相同,区别在于除氧剂的含量不同。利用坩埚下降法生长CaF2单晶。选择的坩埚材料为石墨坩埚,坩埚底部放入经X射线衍射仪定向端面法线方向为[111]的CaF2单晶棒,在高真空气氛中进行晶体生长。具体为:The crystal growth process is basically the same as that of Example 1, except that the content of the oxygen scavenger is different. The CaF2 single crystal was grown by the crucible descent method. The selected crucible material is graphite crucible, and the bottom of the crucible is put into the CaF 2 single crystal rod with the normal direction of the end face oriented by X-ray diffractometer as [111], and the crystal growth is carried out in a high vacuum atmosphere. Specifically:

配料:使用化学沉淀法及区熔法纯化后的药品原料,掺入2.5wt.%的PbF2作为除氧剂;Ingredients: use chemical precipitation method and zone melting method to purify the raw material of medicine, mix with 2.5wt.% PbF 2 as oxygen scavenger;

混料:将称量好的原料放入混料桶,在混料机上搅拌24h使其混合均匀;Mixing: put the weighed raw materials into the mixing bucket, and stir on the mixer for 24 hours to make it evenly mixed;

晶体生长:装炉完毕后,抽真空至大于5×10-3Pa,然后升温化料,首先升温至200℃,保温10h以排除原料中的水分及空气;20~50℃/h继续升温至800℃,保温15h;之后继续加热升温至1400~1450℃,保温化料10h,化料结束后开始缓慢下降坩埚进行长晶。下降速度为0.1~0.5mm/h,晶体生长完成后以20~50℃/h的速率降至室温。Crystal growth: After the furnace is installed, vacuumize to more than 5×10 -3 Pa, then heat up the material, first heat it up to 200°C, and keep it for 10 hours to remove the moisture and air in the raw material; 20~50°C/h continue to heat up to 800 ℃, heat preservation for 15 hours; then continue to heat up to 1400 ~ 1450 ℃, heat preservation for 10 hours, and slowly lower the crucible to grow crystals after the material is finished. The descending speed is 0.1-0.5 mm/h, and after the crystal growth is completed, the temperature is lowered to room temperature at a rate of 20-50 °C/h.

实施例5Example 5

采用与实施例2相同的方法对氟化钙原料经化学沉淀法提纯。化学沉淀法提纯的氟化钙原料中Y、La、Ce、Gd、Tb、Lu等关键杂质阳离子的总含量为8.623ppm。The calcium fluoride raw material was purified by chemical precipitation in the same manner as in Example 2. The total content of key impurity cations such as Y, La, Ce, Gd, Tb, Lu in the calcium fluoride raw material purified by chemical precipitation is 8.623 ppm.

采用与实施例3相同的方法对对化学沉淀法提纯后的氟化钙原料经区熔法进一步提纯。区熔法提纯后的氟化钙原料中Y、La、Ce、Gd、Tb、Lu等关键杂质阳离子的总含量为0.801ppm。The calcium fluoride raw material purified by the chemical precipitation method was further purified by the zone melting method using the same method as in Example 3. The total content of key impurity cations such as Y, La, Ce, Gd, Tb, Lu in the calcium fluoride raw material purified by the zone melting method is 0.801 ppm.

晶体生长工艺与实施例1基本相同,区别在于除氧剂的含量不同和在含氟气氛下进行退火。单晶的生长方法为坩埚下降法。选择的坩埚材料为石墨坩埚,坩埚底部放入经X射线衍射仪定向端面法线方向为[111]的CaF2单晶棒,晶体在CF4与Ar的混合气氛中生长。混合气氛中CF4的体积分数是40%。具体为:The crystal growth process is basically the same as that of Example 1, except that the content of the oxygen scavenger is different and the annealing is carried out in a fluorine-containing atmosphere. The single crystal growth method is the crucible descending method. The selected crucible material is graphite crucible, and the bottom of the crucible is put into the CaF2 single crystal rod with the normal direction of the end face being [111] oriented by the X - ray diffractometer, and the crystal grows in the mixed atmosphere of CF4 and Ar. The volume fraction of CF4 in the mixed atmosphere was 40%. Specifically:

配料:使用化学沉淀法及区熔法纯化后的药品原料,掺入2.5wt.%的PbF2作为除氧剂;Ingredients: use chemical precipitation method and zone melting method to purify the raw material of medicine, mix with 2.5wt.% PbF 2 as oxygen scavenger;

混料:将称量好的原料放入混料桶,在混料机上搅拌24h使其混合均匀;Mixing: put the weighed raw materials into the mixing bucket, and stir on the mixer for 24 hours to make it evenly mixed;

晶体生长与气氛退火:装炉完毕后,抽真空至大于5×10-3Pa,然后升温化料,首先升温至200℃,保温10h以排除原料中的水分及空气;20~50℃/h继续升温至800℃,保温15h;之后继续加热升温至1400-1450℃,保温化料10h,化料结束后开始缓慢下降坩埚进行长晶。下降速度为0.1~0.5mm/h,晶体生长完成后以20~50℃/h的速率降至室温。静置5h后充入体积分数为15%的四氟化碳和氩气的混合气体进行退火,以20~50℃/h的升温速率升温至900~1100℃,然后恒温20~60h,再以小于20℃/h的降温速率降至室温。Crystal growth and atmosphere annealing: after the furnace is installed, vacuumize to more than 5×10 -3 Pa, then heat up the material, first heat up to 200°C, and keep it for 10h to remove moisture and air in the raw material; 20~50°C/h Continue to heat up to 800°C and hold for 15h; then continue to heat up to 1400-1450°C, keep the material for 10 hours, and slowly lower the crucible to grow crystals after the material is finished. The descending speed is 0.1-0.5 mm/h, and after the crystal growth is completed, the temperature is lowered to room temperature at a rate of 20-50 °C/h. After standing for 5 hours, it was filled with a mixture of carbon tetrafluoride and argon with a volume fraction of 15% for annealing. The cooling rate of less than 20°C/h drops to room temperature.

实施例1-5制备的氟化钙晶体分别标记为1#、2#、3#、4#、5#样品。The calcium fluoride crystals prepared in Examples 1-5 are marked as samples 1#, 2#, 3#, 4#, and 5#, respectively.

表1氧含量测试结果Table 1 Oxygen content test results

Figure BDA0003637983810000111
Figure BDA0003637983810000111

表1的测试结果表明通过提高除氧剂的使用量能在一定程度上减少晶体中氧的掺入。The test results in Table 1 show that the incorporation of oxygen into the crystal can be reduced to a certain extent by increasing the amount of oxygen scavenger used.

图1为实施例1制备的氟化钙晶体在193nm辐照前后的晶体照片。辐照所用晶体为

Figure BDA0003637983810000112
的(111)面氟化钙晶体。辐照前为无色透明晶体,辐照后晶体表面损伤区域出现明显黑色损伤。Fig. 1 is the crystal photograph of the calcium fluoride crystal prepared in Example 1 before and after irradiation at 193 nm. The crystal used for irradiation is
Figure BDA0003637983810000112
(111) face calcium fluoride crystals. Before irradiation, it was a colorless and transparent crystal, and after irradiation, obvious black damage appeared in the damaged area of the crystal surface.

图2为实施例1样品经193nm辐照前后的吸收光谱。辐照前晶体无明显吸收峰,辐照后晶体吸收光谱主要呈现出四个吸收峰,分别为326nm(Vk心或H心);378nm(F心);480nm(氧相关);600nm(F心聚集体相关),这些吸收峰主要由杂质离子的d轨道与F心的1s轨道和2p轨道杂化形成的吸收能级导致。FIG. 2 is the absorption spectrum of the sample of Example 1 before and after being irradiated at 193 nm. There are no obvious absorption peaks in the crystal before irradiation, and the absorption spectrum of the crystal after irradiation mainly presents four absorption peaks, which are 326 nm (V k center or H center); 378 nm (F center); 480 nm (oxygen-related); 600 nm (F These absorption peaks are mainly caused by the absorption energy levels formed by the hybridization of the d orbital of the impurity ion with the 1s orbital and 2p orbital of the F core.

图3为实施例1与实施例3辐照样品的的EPR图谱。实施例1晶体辐照后的EPR谱呈现六个接近等强度的峰,主要由带有d轨道活性的单个杂质阳离子与F心发生超精细相互作用引起,说明实施例1晶体中出现色心主要由杂质阳离子主导。而实施例3的晶体辐照后EPR谱呈现强度正比于(1+x)6的二项式展开系数的七条谱线,这主要由氟化钙晶体中F原子与F心之间的超精细相互作用导致,说明实施例3中的色心主要由晶体中存在的空位引起。FIG. 3 is the EPR spectra of the irradiated samples of Example 1 and Example 3. FIG. The EPR spectrum after irradiation of the crystal of Example 1 presents six peaks with nearly equal intensity, which are mainly caused by the hyperfine interaction between a single impurity cation with d orbital activity and the F center, indicating that the color center in the crystal of Example 1 mainly occurs. Dominated by impurity cations. However, the EPR spectrum of the crystal of Example 3 after irradiation presents seven spectral lines whose intensity is proportional to the binomial expansion coefficient of (1+x) 6 , which is mainly caused by the hyperfineness between the F atom and the F core in the calcium fluoride crystal. The interaction results, indicating that the color center in Example 3 is mainly caused by the vacancies present in the crystal.

图4为实施例1-5制备的氟化钙晶体的双晶摇摆曲线。由图可知,当晶体中杂质离子含量较多时,会影响晶体接近性能,其中实施例1的结晶性能最差,半峰宽为0.213°,当晶体中杂质离子含量下降后,晶体均能保持一个良好的结晶性能,半峰宽在0.010°左右。Figure 4 is the twin rocking curve of the calcium fluoride crystals prepared in Examples 1-5. It can be seen from the figure that when the content of impurity ions in the crystal is large, it will affect the crystal proximity performance. Among them, the crystallization performance of Example 1 is the worst, and the half-peak width is 0.213°. When the impurity ion content in the crystal decreases, the crystal can maintain a Good crystallization properties, the half-peak width is about 0.010°.

图5为实施例1-5制备的氟化钙晶体的损伤阈值情况。可以发现,通过化学沉淀法和区熔法减少晶体中具有d轨道活性的杂质阳离子含量;以及通过提高除氧剂含量,充入含氟气氛减少晶体中空位数,均在一定程度上提高了晶体的辐照硬度。其中实施例1-4在辐照实验中均出现损伤情况,实施例5在七千万脉冲的辐照后仍未出现损伤情况,表明通过经过这三种组合工艺处理后,晶体已具备了较强的辐照硬度。FIG. 5 shows the damage thresholds of calcium fluoride crystals prepared in Examples 1-5. It can be found that the content of impurity cations with d orbital activity in the crystal is reduced by chemical precipitation and zone melting; and by increasing the content of oxygen scavenger and filling fluorine-containing atmosphere to reduce the number of vacancies in the crystal, both improve the crystal to a certain extent. radiation hardness. Among them, examples 1-4 all showed damage in the irradiation experiment, and example 5 did not show any damage after the irradiation of 70 million pulses, indicating that after the three combined processes, the crystal has a relatively high quality. Strong radiation hardness.

Claims (10)

1. A method for improving 193nm laser irradiation hardness of calcium fluoride crystals, which is characterized in that the method avoids the formation of F centers, H centers and M centers in the calcium fluoride crystals by controlling the content of impurity cations in raw calcium fluoride materials with low s orbitals and d orbitals overlapped with F center wave functions, reduces the concentration of fluorine vacancies in the calcium fluoride crystals and reduces the concentration of oxygen in the calcium fluoride crystals to improve the irradiation hardness of the calcium fluoride crystals.
2. The method according to claim 1, characterized in that it comprises: purifying the calcium fluoride raw material to enable the content of impurity cations of a low s orbit and a d orbit which are overlapped with an F heart wave function in the calcium fluoride raw material to be below 1ppm, adopting the purified calcium fluoride raw material and an oxygen scavenger as initial raw materials, growing the calcium fluoride crystal by a Bridgman method or a temperature gradient method, and annealing in a fluorine-containing atmosphere to obtain the calcium fluoride crystal with improved laser irradiation hardness.
3. The method of claim 1 or 2, wherein the impurity cations having low s-orbitals and d-orbitals overlapping with the F-cardiowave function comprise Y, La, Ce, Gd, Tb, Lu.
4. A method according to claim 2 or 3, characterized in that the calcium fluoride raw material is purified by chemical precipitation and/or zone melting to make the content of impurity cations having low s-orbitals and d-orbitals overlapping with the F-core wave function in the calcium fluoride raw material below 1 ppm.
5. The method according to claim 4, wherein the calcium fluoride raw material is purified by a chemical precipitation method so that the content of impurity cations having low s orbitals and d orbitals overlapping with F heart wave functions in the calcium fluoride raw material is between 1 and 10ppm, and then further purified by a zone melting method so that the content of impurity cations having low s orbitals and d orbitals overlapping with F heart wave functions in the calcium fluoride raw material is less than 1 ppm.
6. The method of any of claims 2 to 5, characterized in that the oxygen scavenger is lead fluoride and/or polytetrafluoroethylene.
7. The method according to any one of claims 2 to 6, wherein the oxygen scavenger is present in an amount of 0.3 to 4wt.% of the calcium fluoride raw material.
8. The method according to any one of claims 2 to 7, wherein the fluorine-containing atmosphere is CF 4 Gas, or HF gas, or CF 4 Mixed gas of gas and inert gas, or mixed gas of HF gas and inert gas, or CF 4 A mixed gas of a gas, an HF gas and an inert gas.
9. The method of claim 8, wherein the mixed gas comprises CF 4 The volume fraction of the gas is 3-25%.
10. The method according to claim 8 or 9, wherein the inert gas is Ar and/or N 2
CN202210507490.9A 2022-05-11 2022-05-11 Method for improving 193nm laser irradiation hardness of calcium fluoride crystal Active CN114941170B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202210507490.9A CN114941170B (en) 2022-05-11 2022-05-11 Method for improving 193nm laser irradiation hardness of calcium fluoride crystal

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202210507490.9A CN114941170B (en) 2022-05-11 2022-05-11 Method for improving 193nm laser irradiation hardness of calcium fluoride crystal

Publications (2)

Publication Number Publication Date
CN114941170A true CN114941170A (en) 2022-08-26
CN114941170B CN114941170B (en) 2024-02-06

Family

ID=82907359

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202210507490.9A Active CN114941170B (en) 2022-05-11 2022-05-11 Method for improving 193nm laser irradiation hardness of calcium fluoride crystal

Country Status (1)

Country Link
CN (1) CN114941170B (en)

Citations (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0938030A1 (en) * 1998-02-19 1999-08-25 Nikon Corporation Projection exposure apparatus
US20030048872A1 (en) * 2001-08-27 2003-03-13 Pell Michael A. Method of making <200 nm wavelength fluoride crystal lithogrphy/laser optical elements
US20040031436A1 (en) * 2002-08-07 2004-02-19 Price Michael W. Scatter-free UV optical fluoride crystal elements for <200NM laser lithography and methods
WO2004088288A1 (en) * 2003-03-28 2004-10-14 Stella Chemifa Corporation Method for analyzing impurities (color centers) of fluoride and process for producing material for growing single crystal
CN1635193A (en) * 2004-12-02 2005-07-06 中国科学院上海光学精密机械研究所 Reduction of Yb in ytterbium-doped calcium fluoride crystals2+Method of concentration
US20070113777A1 (en) * 2005-09-19 2007-05-24 Von Der Goenna Gordon CaF2 single crystals with increased laser resistance, method for their preparation and use thereof
CN102025099A (en) * 2008-10-31 2011-04-20 康宁股份有限公司 Calcium fluoride optics with improved laser durability
US20120120481A1 (en) * 2010-11-14 2012-05-17 Kla-Tencor Corporation High damage threshold frequency conversion system
CN103576214A (en) * 2012-07-18 2014-02-12 康宁股份有限公司 Calcium fluoride optics with improved laser durability
CN103643301A (en) * 2013-12-20 2014-03-19 中国科学院上海硅酸盐研究所 Method for annealing large-size calcium fluoride crystal
CN104294362A (en) * 2014-10-31 2015-01-21 秦皇岛本征晶体科技有限公司 Preparation method for large-sized square calcium fluoride crystals
CN110607557A (en) * 2019-09-04 2019-12-24 同济大学 Spectrum-doped lead fluoride visible-band laser crystal and preparation method thereof
CN111379024A (en) * 2018-12-29 2020-07-07 北京首量科技股份有限公司 Preparation process and equipment of calcium fluoride
CN111379023A (en) * 2018-12-29 2020-07-07 北京首量科技股份有限公司 Preparation method of calcium fluoride single crystal
CN113070273A (en) * 2020-01-03 2021-07-06 中国科学院上海硅酸盐研究所 Surface treatment method for improving laser damage threshold of calcium fluoride crystal optical element

Patent Citations (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0938030A1 (en) * 1998-02-19 1999-08-25 Nikon Corporation Projection exposure apparatus
US20030048872A1 (en) * 2001-08-27 2003-03-13 Pell Michael A. Method of making <200 nm wavelength fluoride crystal lithogrphy/laser optical elements
US20040031436A1 (en) * 2002-08-07 2004-02-19 Price Michael W. Scatter-free UV optical fluoride crystal elements for <200NM laser lithography and methods
WO2004088288A1 (en) * 2003-03-28 2004-10-14 Stella Chemifa Corporation Method for analyzing impurities (color centers) of fluoride and process for producing material for growing single crystal
CN1635193A (en) * 2004-12-02 2005-07-06 中国科学院上海光学精密机械研究所 Reduction of Yb in ytterbium-doped calcium fluoride crystals2+Method of concentration
US20070113777A1 (en) * 2005-09-19 2007-05-24 Von Der Goenna Gordon CaF2 single crystals with increased laser resistance, method for their preparation and use thereof
CN102025099A (en) * 2008-10-31 2011-04-20 康宁股份有限公司 Calcium fluoride optics with improved laser durability
US20120120481A1 (en) * 2010-11-14 2012-05-17 Kla-Tencor Corporation High damage threshold frequency conversion system
CN103576214A (en) * 2012-07-18 2014-02-12 康宁股份有限公司 Calcium fluoride optics with improved laser durability
CN103643301A (en) * 2013-12-20 2014-03-19 中国科学院上海硅酸盐研究所 Method for annealing large-size calcium fluoride crystal
CN104294362A (en) * 2014-10-31 2015-01-21 秦皇岛本征晶体科技有限公司 Preparation method for large-sized square calcium fluoride crystals
CN111379024A (en) * 2018-12-29 2020-07-07 北京首量科技股份有限公司 Preparation process and equipment of calcium fluoride
CN111379023A (en) * 2018-12-29 2020-07-07 北京首量科技股份有限公司 Preparation method of calcium fluoride single crystal
CN110607557A (en) * 2019-09-04 2019-12-24 同济大学 Spectrum-doped lead fluoride visible-band laser crystal and preparation method thereof
CN113070273A (en) * 2020-01-03 2021-07-06 中国科学院上海硅酸盐研究所 Surface treatment method for improving laser damage threshold of calcium fluoride crystal optical element

Non-Patent Citations (3)

* Cited by examiner, † Cited by third party
Title
NURUL NAZLI ROSLI ET AL.: "A review of graphene based transparent conducting films for use in solar photovoltaic applications", 《RENEWABLE AND SUSTAINABLE ENERGY REVIEWS》, vol. 99, no. 2019, pages 83 - 99, XP085546263, DOI: 10.1016/j.rser.2018.09.011 *
董永军, 周国清, 苏良碧, 杨卫桥, 徐军: "温度梯度法生长氟化钙晶体", 人工晶体学报, no. 06, pages 601 - 604 *
郑金祥;李晓辉;吴庆辉;姜大朋;王静雅;张博;刘荣荣;梅炳初;苏良碧;: "氟化钙晶体缺陷对应力双折射影响机制的研究", 人工晶体学报, no. 06, pages 1049 - 1056 *

Also Published As

Publication number Publication date
CN114941170B (en) 2024-02-06

Similar Documents

Publication Publication Date Title
US6364946B2 (en) Methods for growing large-volume single crystals from calcium fluoride and their uses
Cohen et al. Ultraviolet and infrared absorption of fused germania
TWI421222B (en) Silica container and method of manufacturing the same
US7452518B2 (en) Process for treating synthetic silica powder and synthetic silica powder treated thereof
CN106917142A (en) The growing method of high purity quartz crystal
JPH02289416A (en) Production of low silanol silica
JPH0388742A (en) Synthetic silica glass optical body and its manufacturing method
CN114941170B (en) Method for improving 193nm laser irradiation hardness of calcium fluoride crystal
EP0384284A2 (en) Process for preparing silica having a low silanol content
EP1888457A1 (en) Synthesis of a starting material with improved outgassing for the growth of fluoride crystals
JP2008230958A (en) Method for producing BaLiF3 single crystal
JP2001240497A (en) Method and equipment for manufacturing single crystal fluoride
WO2000039038A1 (en) Method for producing optical quartz glass for excimer lasers
JPH0829960B2 (en) Ultraviolet laser optical components
JP2005505486A (en) Preparation of alkaline earth and alkali metal fluoride feedstocks
JPH02283082A (en) Method of improving fluolescence of titanium-doped oxide laser which can be tuned
JP6035584B2 (en) Method for producing fluorite crystals
JPH0624997B2 (en) Optical components for laser light
CN115198343A (en) Scandium-rubidium-lithium fluosilicate nonlinear optical crystal and preparation method and application thereof
JPH07300325A (en) Laser resistant optical member and method of manufacturing the same
US7014703B2 (en) Method for annealing group IIA metal fluoride crystals
JP2003221297A (en) Method for producing calcium fluoride crystal
CN118422312A (en) A method for improving the radiation damage resistance of calcium fluoride crystals in the visible band by doping with trace elements
JP2004315255A (en) Method for manufacturing fluoride crystal, fluoride crystal, optical system, and optical lithography device
Schultheiss et al. Single crystal growth and structure analysis of BiLiF4

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
GR01 Patent grant
GR01 Patent grant