CN114938243A - Method and system for debugging BOSA (business-oriented architecture), debugging instrument and debugging method - Google Patents
Method and system for debugging BOSA (business-oriented architecture), debugging instrument and debugging method Download PDFInfo
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- H—ELECTRICITY
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- H04B10/00—Transmission systems employing electromagnetic waves other than radio-waves, e.g. infrared, visible or ultraviolet light, or employing corpuscular radiation, e.g. quantum communication
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- H04B10/073—Arrangements for monitoring or testing transmission systems; Arrangements for fault measurement of transmission systems using an out-of-service signal
- H04B10/0731—Testing or characterisation of optical devices, e.g. amplifiers
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- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
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- G01R27/02—Measuring real or complex resistance, reactance, impedance, or other two-pole characteristics derived therefrom, e.g. time constant
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R27/00—Arrangements for measuring resistance, reactance, impedance, or electric characteristics derived therefrom
- G01R27/02—Measuring real or complex resistance, reactance, impedance, or other two-pole characteristics derived therefrom, e.g. time constant
- G01R27/26—Measuring inductance or capacitance; Measuring quality factor, e.g. by using the resonance method; Measuring loss factor; Measuring dielectric constants ; Measuring impedance or related variables
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Abstract
A method for debugging BOSA relates to the field of optical communication, and comprises the following steps: connecting the debugging instrument with a test computer and a BOSA respectively; connecting the tail fiber of the BOSA with an eye chart oscilloscope; the testing computer sends out an instruction to enable the BOSA to emit light for a long time through the debugging instrument; adjusting an adjusting module of the debugging instrument according to the state of the eye pattern, and when the eye pattern is in a normal state; stopping adjusting the adjusting module, and reading the resistance-capacitance value of the BOSA matched with the adjusting module; according to the method and the device, the peripheral resistance-capacitance value of the BOSA is matched through the eye pattern state, so that the eye pattern of the BOSA reaches a normal state, the matched resistance-capacitance value can be directly used for application of a PCB (printed Circuit Board), and the matched resistance-capacitance value can be used as a reference standard, so that the complexity of debugging the peripheral resistance-capacitance matching of the BOSA is reduced, the workload of complexity and uncertainty is reduced, the determination degree of a debugging target direction is improved, and further the working efficiency is improved.
Description
Technical Field
The application relates to the field of optical communication, in particular to a method and a system for debugging BOSA, a debugging instrument and a debugging method.
Background
With the popularization of optical fiber in the home, optical communication has gone deep into thousands of households. The BOSA, a photoelectric conversion device of optical communication, is one of indispensable components on an electronic circuit, like resistors, capacitors, triodes and other components, and has the particularity that electrical parameters of the BOSA device can not be directly used like resistors, and the periphery of the BOSA device needs to be matched with some resistance-capacitance circuits to optimally shape a signal eye diagram to form a normal photoelectric communication channel.
Debugging the peripheral resistance-capacitance matching of the BOSA is a tedious work, no rule can be followed, different types of matching are different, different BOSA manufacturers are different in matching, the resistor and the capacitor need to be debugged respectively in the process, and the power-on needs to be confirmed repeatedly. As the peripheral resistance-capacitance matching of the BOSA is complex to debug, the workload of complexity and uncertainty is increased invisibly, and the working efficiency is reduced.
Disclosure of Invention
Object of the application
In view of this, an object of the present application is to provide a method, a system, a debugging apparatus and a debugging method for debugging BOSA, which are used to solve the technical problems in the prior art that peripheral resistance-capacitance matching for debugging BOSA is complex, the workload of complexity and uncertainty is increased, and the work efficiency is reduced.
(II) technical scheme
The application discloses a method for debugging BOSA, which comprises the following steps: s1, connecting the debugging instrument with a test computer and a BOSA respectively; connecting the tail fiber of the BOSA with an eye chart oscilloscope;
s2, sending an instruction by the testing computer to enable the BOSA to emit light for a long time through the debugging instrument;
s3, adjusting an adjusting module of the debugging instrument according to the state of the eye pattern, wherein when the eye pattern is in a normal state; and stopping adjusting the adjusting module, and reading the resistance-capacitance value of the BOSA matched with the adjusting module.
In a possible embodiment, the adjusting module for adjusting the debugger according to the state of the eye diagram comprises:
s31, adjusting a first adjusting unit of the debugging instrument to enable the first state of the normal state to meet the requirement;
s32, adjusting a second adjusting unit of the debugger to enable the second state of the normal state to reach the requirement, stopping adjusting and executing the step S33 when the second state reaches the requirement, and otherwise, returning to the step S31;
and S33, adjusting the third unit and the fourth unit of the debugging instrument to enable the third state and the fourth state in the normal state to meet the requirements, stopping adjustment when the third state and the fourth state in the normal state meet the requirements, and otherwise, continuing to execute the step.
As a second aspect of the present application, a system for debugging BOSA is also disclosed, which includes a debugger, a test computer, and an eye chart oscilloscope connected, where the debugger is used to test the connection between the computer and the BOSA, respectively, and the debugger is used to adjust a resistance-capacitance value matching the BOSA; the test computer is connected with the debugging instrument and used for sending out an instruction, and the instruction can enable the BOSA to emit light through the debugging instrument; the eye pattern oscilloscope is connected with the BOSA tail fiber and displays an eye pattern of the BOSA;
adjusting the capacitance values based on the eye diagram; and when the eye pattern is in a normal state, reading the capacitance and resistance value matched with the debugging instrument.
In a possible implementation manner, the debugger comprises an adjusting module, the adjusting module is used for matching a resistance-capacitance value of the BOSA, the adjusting module comprises a first adjusting unit, a second adjusting unit, a third adjusting unit and a fourth adjusting unit, and the first adjusting unit is used for adjusting the eye diagram to enable a first state of a normal state to meet requirements; the second adjusting unit is used for adjusting the eye pattern to enable the second state of the normal state to meet the requirement; the third adjusting unit is used for adjusting the eye pattern to enable the third state in the normal state to meet the requirement; the fourth adjusting unit is used for adjusting the eye pattern to adjust the eye pattern so that the fourth state of the normal state meets the requirement.
As a third aspect of the present application, a method for debugging BOSA is also disclosed, including the steps of:
s100, respectively connecting the BOSA and the test computer;
s200, receiving an instruction of a testing computer to drive the BOSA so that the BOSA emits light;
s300, receiving an adjusting operation of the matched resistance-capacitance value of the BOSA, and enabling the eye diagram of the BOSA to be in a normal state.
In a possible implementation, the operation of receiving an adjustment to the BOSA-matched rc value includes: s301, receiving a first operation to enable a first state of a normal state of an eye pattern to meet requirements;
s302, receiving a second operation to enable the second state of the normal state of the eye pattern to meet the requirement, and executing S03 when the second state of the normal state of the eye pattern meets the requirement; otherwise, returning to the step 301;
s303, receiving a third operation to enable the third state of the eye pattern in the normal state to meet the requirement;
s304, receiving a fourth operation to enable the fourth state of the normal state of the eye pattern to meet the requirement.
In a possible implementation, the first operation includes adjusting a first adjuster to adjust a resistance magnitude of a laser positive damping resistance; the second operation includes: adjusting the first part of adjuster to adjust the resistance of the laser cathode filter resistor and adjusting the second part of adjuster to adjust the capacitance of the laser cathode filter capacitor; the third operation comprises adjusting a third adjuster to adjust the resistance magnitude of the rising resistance; the fourth operation includes adjusting the fourth regulator to adjust a resistance magnitude of the droop resistance.
As a fourth aspect of the present application, there is also disclosed a debugger for debugging BOSA, comprising: the device comprises a control module, an adjusting module and a BOSA connection module; the control module is used for receiving an instruction of a test computer and controlling the BOSA to emit light for a long time; the adjusting module is used for receiving the adjusting operation of the matched resistance-capacitance value of the BOSA, so that the eye diagram of the BOSA is in a normal state; the BOSA connection module is used for being connected with the BOSA to drive the BOSA to emit light for a long time.
In a possible embodiment, the adjusting module comprises a first adjusting unit, a second adjusting unit, a third adjusting unit and a fourth adjusting unit, wherein the first adjusting unit is used for receiving a first operation; the second adjusting unit is used for receiving a second operation; the third adjusting unit is used for receiving a third operation; the fourth adjusting unit is used for receiving a fourth operation.
In one possible embodiment, the first adjusting unit comprises a laser anode damping resistor and a first adjuster for adjusting the resistance of the laser anode damping resistor; the second adjusting unit comprises a first adjusting part and a second adjusting part, wherein the first adjusting part comprises a laser cathode filter resistor and a first part adjuster for adjusting the resistance of the laser cathode filter resistor; the second adjusting part comprises a laser cathode filter capacitor and a second adjusting part for adjusting the size of the laser cathode filter capacitor; the third adjusting unit comprises a rising resistor and a third adjuster for adjusting the resistance of the rising resistor; the fourth adjusting unit includes a dropping resistor and a fourth adjuster adjusting a magnitude of a resistance thereof.
(III) advantageous effects
According to the method and the device, the peripheral resistance-capacitance value of the BOSA is matched through the eye pattern state, so that the eye pattern of the BOSA reaches a normal state, the matched resistance-capacitance value can be directly used for application of a PCB (printed circuit board), and the matched resistance-capacitance value can be used as a reference standard, so that the complexity of debugging the peripheral resistance-capacitance matching of the BOSA is reduced, the workload of complexity and uncertainty is reduced, the determination degree of a debugging target direction is improved, and further the working efficiency is improved.
Additional advantages, objects, and features of the application will be set forth in part in the description which follows and in part will become apparent to those having ordinary skill in the art upon examination of the following or may be learned from practice of the application. The objectives and other advantages of the present application may be realized and attained by the means of the instrumentalities and combinations particularly pointed out hereinafter.
Drawings
The embodiments described below with reference to the drawings are exemplary and intended to be used for explaining and illustrating the present application and should not be construed as limiting the scope of protection of the present application.
FIG. 1 is a system flow diagram of the present application;
FIG. 2 is a system block diagram of the present application;
FIG. 3 is a flow chart of a method for debugging a debugger according to the present application;
FIG. 4 is a block diagram of a debugger of the present application;
FIG. 5 is a pin circuit diagram of a debugger and BOSA;
FIG. 6 is a view showing the construction of a slide switch unit of the debugger;
wherein, 1, debugging the instrument; 2. testing the computer; 3. an eye chart oscilloscope; 4. BOSA; 11. a control module; 12. an adjustment module; 13. a BOSA connection module; 14. and a measuring module.
Detailed Description
In order to make the objects, technical solutions and advantages of the embodiments of the present application clearer, the technical solutions in the embodiments of the present application will be clearly and completely described below with reference to the drawings in the embodiments of the present application, and it is obvious that the described embodiments are some embodiments of the present application, but not all embodiments. The components of the embodiments of the present application, generally described and illustrated in the figures herein, can be arranged and designed in a wide variety of different configurations.
Thus, the following detailed description of the embodiments of the present application, presented in the accompanying drawings, is not intended to limit the scope of the claimed application, but is merely representative of selected embodiments of the application. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present application.
It should be noted that: like reference numbers and letters refer to like items in the following figures, and thus, once an item is defined in one figure, it need not be further defined and explained in subsequent figures.
In the above description of the present application, it should be noted that the terms "one side", "the other side", and the like, indicate orientations or positional relationships based on the orientations or positional relationships shown in the drawings or orientations or positional relationships that the products of the application usually place when using, are only used for convenience of description and simplification of description, and do not indicate or imply that the devices or elements that are referred to must have a specific orientation, be constructed in a specific orientation, and be operated, and thus, should not be construed as limiting the present application. Furthermore, the terms "first," "second," and the like are used merely to distinguish one description from another, and are not to be construed as indicating or implying relative importance.
As shown in fig. 1, the present embodiment provides a method for debugging BOSA, including the following steps: s1, connecting the debugging instrument with a test computer and a BOSA respectively; connecting the tail fiber of the BOSA with an eye chart oscilloscope;
s2, sending an instruction by the testing computer to enable the BOSA to emit light for a long time through the debugging instrument; the BOSA (laser diode) is driven by a debugger to emit light, and the initial value of the long light emission and the flash memory is a read call relation and is presented by an oscilloscope of 86100. The initial value is just like a data optical disk, the BOSA emits light to read the initial value, and the data is processed and exchanged by UX3320, RTL9601 and BOSA to be presented on an eye chart oscilloscope.
S3, adjusting an adjusting module of the debugging instrument according to the state of the eye pattern, wherein when the eye pattern is in a normal state; and stopping adjusting the adjusting module, and reading the resistance-capacitance value of the BOSA matched with the adjusting module. The normal state comprises a first state, a second state, a third state and a fourth state, and the normal state of the eye diagram is only when the first state, the second state, the third state and the fourth state all reach requirements. Wherein the requirement of the first state is that the eye pattern reaches 1 level and 0 level, is 0.5mm away from the standard line of the template, and does not touch the template, namely the index is reached: ER (11-14 dB), RMS (less than 14PS), J P-P (less than 90 PS). The second state requires that the eye jitter (RMS) does not exceed 14PS and that the eye pattern is graphically distortion free and that the eye pattern is graphically displayed without double eye lines. The third state may require that the rise time of the eye is less than 280 PS. The fourth state requires that the fall time of the eye is less than 280 PS. The adjusting module for adjusting the debugging instrument according to the state of the eye diagram comprises: s31, adjusting the first adjusting unit of the debugger, no matter what state the eye diagram is in, the first adjusting unit of the debugger can be adjusted at the beginning, but the 1 level can not be pushed to the reference line above the template, and the 0 electricity can not be pushed to the reference line above the templateThe eyeball cannot touch a datum line below the template, and the waveform of the middle ascending and descending eye line cannot press the eyeball of the template. Generally, when the level of the eye pattern 1 is shorter than the level of 0, the first adjusting unit of the debugger is adjusted to increase the resistance of the access BOSA, and when the level of 1 and the level of 0 are separated from the reticle reference line by about 0.5mm, the resistance of the access BOSA is stopped to increase, namely, the reticle reference line is ensured not to be touched; when the eye diagram 1 level and the 0 level touch the template datum line, the resistance of the access BOSA is reduced; when the distance from the standard line of the template is about 0.5mm, the adjustment is stopped to be small, so that the waveform of the middle orbit does not touch the template eyeball. S32, adjusting a second adjusting unit of the debugger to enable the second state of the normal state to reach the requirement, stopping adjusting and executing the step S33 when the second state reaches the requirement, and otherwise, returning to the step S31; the normal eye pattern signal 1 level does not touch the upper template reference line, the 0 level does not touch the lower template reference line, the middle orbit waveform does not touch the template eyeball, when the eye pattern jitter (RMS) is large (exceeding 14PS), the resistance is adjusted to be large or small, when the eye pattern has distortion or displays double eye lines, the capacitance is adjusted to be large or small; when the displayed poor eye pattern is a distorted waveform and a cluttered waveform, and the jitter RMS exceeds a certain value of 14PS, the process returns to step S31. S33, adjusting a third unit and a fourth unit of the debugging instrument to enable a third state and a fourth state in a normal state to meet requirements, stopping adjustment when the third state and the fourth state in the normal state meet the requirements, and otherwise, continuing to execute the step; when the rising time and the falling time of the eye pattern far exceed 280PS, such as 350PS, 400PS and the like, the step is adjusted, two resistors are adjusted without adjusting the capacitor, one resistor is used for adjusting the rising time and one resistor is used for adjusting the falling time, the step S33 is used for adjusting, and whether the rising time and the falling time of the eye pattern are less than 280PS is checked through the filtering of the eye pattern oscilloscope; if not, continuing to execute the rising time and the falling time of the adjusting eye pattern, and stopping adjusting when the rising time and the falling time are both less than 280 PS.
The eye pattern state is used for matching the peripheral resistance-capacitance value of the BOSA, so that the eye pattern of the BOSA reaches a normal state, the matched resistance-capacitance value can be directly used for matching the peripheral resistance-capacitance value of the BOSA on the PCB and is used as a reference standard, the complexity of debugging the peripheral resistance-capacitance matching of the BOSA is reduced, the workload of complexity and uncertainty is reduced, the determination degree of a debugging target direction is improved, and further the working efficiency is improved.
As shown in fig. 2, as a second aspect of the present application, a system for debugging a BOSA is also disclosed, which includes a debugger 1, a testing computer 2, and an eye chart oscilloscope 3, where the debugger is used to test the connection between the computer and the BOSA4, respectively, and the debugger is used to adjust a resistance-capacitance value matching the BOSA; the test computer is connected with the debugging instrument and used for sending out an instruction, and the instruction can enable the BOSA to emit light through the debugging instrument; the eye pattern oscilloscope is connected with the BOSA tail fiber and displays an eye pattern of the BOSA; adjusting the capacitance values based on the eye diagram; and when the eye pattern is in a normal state, reading the capacitance and resistance value matched with the debugging instrument.
In this embodiment, the debugging appearance includes the adjusting module, the adjusting module is used for matching BOSA's resistance-capacitance value, the adjusting module includes first regulating unit, second regulating unit, third regulating unit and fourth regulating unit, wherein, first regulating unit is used for adjusting the eye pattern and reaches 1 level and 0 level and leaves the template datum line 0.5mm, does not touch the template, reaches the index promptly: ER (11-14 dB), RMS (less than 14PS), J P-P (less than 90 PS); the second adjusting unit is used for adjusting the eye diagram jitter (RMS) of the eye diagram not to exceed 14PS and the figure of the eye diagram is not distorted and deformed, and the figure of the displayed eye diagram is not double-edged; the third adjusting unit is used for adjusting the rising time of the eye pattern to be less than 280 PS; the fall time for the eye diagram by the fourth adjustment unit is less than 280 PS.
As shown in fig. 3, as a third aspect of the present application, a method for debugging BOSA is also disclosed, which includes the following steps:
s100, respectively connecting the BOSA and the test computer;
s200, receiving an instruction of a testing computer to drive the BOSA so that the BOSA emits light;
s300, receiving an adjusting operation of the matched resistance-capacitance value of the BOSA, and enabling the eye diagram of the BOSA to be in a normal state.
After S100 is finished, the power supply is required to be connected, the current range is 1-2.5A, and the voltage is 4.5-18V.
Before step S300, a driver and its initial values are loaded, where the initial values include BOSA, UX3320 for driving BOSA, and initial values of peripheral circuits thereof, and after the loading is completed, the device can be in a standby debugging state.
In this embodiment, the operation of receiving the adjustment of the resistance-capacitance value matched to the BOSA includes: s301, receiving a first operation to enable a first state of a normal state of an eye pattern to meet requirements, wherein the first state is required
The eye diagram reaches 1 level and 0 level, is 0.5mm away from the standard line of the template, and reaches the index without touching the template: ER (11-14 dB), RMS (less than 14PS), JP-P (less than 90 PS).
S302, receiving a second operation, enabling a second state of the normal state of the eye pattern to meet the requirement, wherein the requirement of the second state is that eye pattern jitter (RMS) does not exceed 14PS, the pattern of the eye pattern is not distorted and deformed, the pattern of the displayed eye pattern is not provided with double-eye lines, and when the second state of the normal state of the eye pattern meets the requirement, executing S03; otherwise, when the poor eye pattern is distorted and disordered, the jitter RMS exceeds a certain value of 14PS and returns to step 301.
And S303, receiving a third operation to enable the third state in the normal state of the eye pattern to meet the requirement, checking whether the rising time of the eye pattern is less than 280PS through filtering of the eye pattern oscilloscope, stopping adjustment when the rising time is less than 280PS, and otherwise, continuously executing S303.
And S304, receiving a fourth operation to enable a fourth state of the normal state of the eye pattern to meet requirements, checking whether the falling time of the eye pattern is less than 280PS through filtering of the eye pattern oscilloscope, stopping adjustment when the falling time is less than 280PS, and otherwise, continuing to execute S304.
The first operation comprises the steps of adjusting a first adjuster to adjust the resistance of the laser anode damping resistor; the second operation includes: adjusting the first part of adjuster to adjust the resistance of the laser cathode filter resistor and adjusting the second part of adjuster to adjust the capacitance of the laser cathode filter capacitor; the third operation includes adjusting the third adjuster to adjust the magnitude of the resistance of the rising resistance and adjusting the fourth adjuster to adjust the magnitude of the resistance of the falling resistance. The first adjusting unit comprises a laser anode damping resistor (LD + R resistor) and a first adjuster for adjusting the resistance of the laser anode damping resistor, wherein the laser anode damping resistor (LD + R resistor) is connected with a T4 pin in BOSA; the second adjusting unit comprises a first adjusting part and a second adjusting part, wherein the first adjusting part comprises a laser negative filtering resistor (LD-R resistor) and a first part adjuster for adjusting the resistance of the laser negative filtering resistor, the anode of the laser negative filtering resistor (LD-R resistor) is connected with a T2 pin in BOSA, and the cathode of the laser negative filtering resistor is connected with the anode of the LD-C; the second adjusting part comprises a laser cathode filter capacitor (LD-C adjustable capacitor) and a second adjusting part for adjusting the capacitance of the laser cathode filter capacitor, wherein the anode of the laser cathode filter capacitor (LD-C adjustable capacitor) is connected with an LD-C pin, the cathode of the laser cathode filter capacitor (LD-C adjustable capacitor) is grounded, and the laser cathode filter capacitor (LD-C adjustable capacitor) is connected with a laser cathode filter resistor (LD-R resistor) in series; the third regulating unit comprises a rising resistor (Rise resistor) and a third regulator for regulating the resistance of the rising resistor; the fourth adjusting unit includes a falling resistance (Fall resistance) and a fourth adjuster that adjusts the magnitude of the resistance thereof.
As shown in fig. 4 to 6, as a fourth aspect of the present application, there is also disclosed a debugger for debugging BOSA, including: the device comprises a control module 11, an adjusting module 12 and a BOSA connecting module 13; the control module is used for receiving an instruction of a test computer and controlling the BOSA to emit light for a long time; the adjusting module is used for receiving the adjusting operation of the matched resistance-capacitance value of the BOSA, so that the eye diagram of the BOSA is in a normal state; the BOSA connection module is used for being connected with the BOSA to drive the BOSA to emit light for a long time.
In this embodiment, the adjusting module includes a first adjusting unit, a second adjusting unit, a third adjusting unit, and a fourth adjusting unit, where the first adjusting unit is configured to receive the first operation, adjust the eye pattern to make the first state of the normal state of the eye pattern meet the requirement, the eye pattern reaches 1 level and 0 level 0.5mm away from the reticle reference line, does not touch the reticle, and reaches the index: ER (11-14 dB), RMS (less than 14PS), J P-P (less than 90 PS); a second adjusting unit for receiving a second operation, adjusting the eye pattern to a second state of the normal state of the eye pattern, the eye pattern jitter (RMS) not exceeding 14PS and the eye pattern without distortion, and displayingThe eye diagram of (a) has no double-eye line; the third adjusting unit is used for receiving a third operation, adjusting the eye pattern to enable the third state of the normal state of the eye pattern to meet the requirement, and the rising time of the eye pattern is less than 280 PS; and the fourth adjusting unit is used for receiving the fourth operation, adjusting the eye pattern to enable the fourth state of the normal state of the eye pattern to reach the requirement, and the falling time of the eye pattern is less than 280 PS.
In this embodiment, the first adjusting unit includes a laser positive damping resistor (LD + R resistor) and a first adjuster that adjusts the resistance of the laser positive damping resistor (LD + R resistor), where the laser positive damping resistor (LD + R resistor) is connected to a T4 pin of the BOSA; the second adjusting unit comprises a first adjusting part and a second adjusting part, the first adjusting part comprises a laser negative filtering resistor (LD-R resistor) and a first part adjuster for adjusting the resistance of the laser negative filtering resistor, wherein the anode of the laser negative filtering resistor (LD-R resistor) is connected with a T2 pin in BOSA, and the cathode of the laser negative filtering resistor is connected with LD-C; the second adjusting part comprises a laser cathode filter capacitor (LD-C adjustable capacitor) and a second adjusting part for adjusting the capacitance of the laser cathode filter capacitor, wherein the anode of the laser cathode filter capacitor (LD-C adjustable capacitor) is connected with the LD-R cathode pin, the cathode of the laser cathode filter capacitor (LD-C adjustable capacitor) is grounded, and the laser cathode filter capacitor (LD-C adjustable capacitor) is connected with the laser cathode filter resistor (LD-R resistor) in series; the third adjusting unit comprises a rising resistor (Rise resistor) and a third adjuster for adjusting the resistance of the rising resistor; the fourth adjusting unit includes a falling resistance (Fall resistance) and a fourth adjuster that adjusts the magnitude of the resistance thereof.
Because the BOSA is a component, the factory parameter specification of the BOSA is produced according to a certain standard, the individual differences can be ignored for a designer using the BOSA, and after the differences are ignored, the BOSA can be regarded as a constant and a standard component; the BOSA device is finally placed in a circuit and placed on a PCB of an optical modem, when the PCB is manufactured, the BOSA TX/RX transmission signal line and the PCB have impedance control requirements, generally requiring 100ohm or 90ohm, for a designer, no matter the model or the model, the difference between the models can be ignored, and the model PCB can be regarded as a constant; furthermore, there are many driver ICs of BOSA, such as gnet GN25L95, EN7571 of MTK, etc., and these driver ICs do not have a large difference in driving BOSA eye pattern signal based on BOSA specifications, and the difference is negligible, and the driver ICs can be regarded as a constant. Therefore, the debugging of BOSA resistance-capacitance matching can be listed separately to be made into a debugging instrument, then the resistance-capacitance matching is firstly debugged and matched on the debugging instrument, so that the debugging accords with the resistance-capacitance value of a normal eye pattern signal, and finally the resistance-capacitance values are made on an actual machine type circuit and a PCB. Compared with a value actually debugged in a certain machine type, the matched resistance-capacitance value obtained by using a debugging instrument has the resistance value difference of 1-3 ohm and the capacitance value difference of 1-2 PF, and can be used as a reference when designing the matched resistance of the BOSA, and even if the resistance-capacitance differences are not counted, the obtained matched resistance-capacitance value is directly placed on the actual machine type, the BOSA eye pattern waveform of the BOSA eye pattern is not seriously distorted, and the obtained eye pattern is basically in a normal range.
In this embodiment, the debugger further includes a measuring module 14, which is configured to measure a peripheral rc value of the BOSA when an eye diagram of the BOSA is in a normal state, the measuring module comprises an MCU, an LCD reading unit and a sliding switch unit, the sliding switch unit is connected with the MCU and the MCU in the LCD reading unit in parallel, as shown in FIG. 6, the negative pole of the slide switch is connected with COM, the positive pole is connected with V-OHM-CAP, the PIN of V-OHM-CAP is connected with MCU S4 (PIN21 PIN23), COM is connected with MCU common ground, S4 PIN21 is connected with MCU capacitance detection PIN, S4 PIN23 is connected with MCU resistance detection PIN, the sliding switch unit is used for connecting one of the laser anode damping resistor, the laser cathode filter capacitor, the rising resistor and the falling resistor with the MCU and the LCD reading unit, and the MCU and the LCD reading unit are used for measuring the resistance value of the resistor or the capacitance value of the capacitor and displaying the specific resistance value of the resistor and the capacitance value of the capacitor through the LCD display screen; when the sliding switch unit slides to a preset position, namely the MCU and the LCD reading unit are connected with the corresponding resistor or capacitor connected at the position, and the resistance value of the resistor or the capacitance value of the capacitor of the MCU and the LCD reading unit. The resistance value of the resistor and the capacitance value of the capacitor read by the MCU and the LCD reading unit are effective values between the positive and negative terminals, and the position SW2 in the figure is a vacancy which indicates that the MCU and the LCD reading unit are not connected with the MCU and the LCD reading unit, namely the MCU and the LCD reading unit cannot be connected with one of the laser positive damping resistor, the laser negative filtering capacitor, the rising resistor and the falling resistor, so that the influence of the resistor of the MCU and the LCD reading unit connected into a peripheral circuit of the BOSA on the regulation of the peripheral resistance-capacitance value of the BOSA is avoided, and the reading accuracy of the peripheral resistance-capacitance value is reduced.
In the embodiment, the debugging instrument further comprises a power module, wherein the power module is used for supplying power to the debugging instrument and supplying power to the BOSA for driving, and in the embodiment, the power module is converted from two DCDCDCDC into 3.3V and 1.15V to provide continuous working energy for the debugging instrument; the used DCDC has overvoltage and overcurrent protection capability and can provide voltage with the current range of 1-2.5A and the voltage of 4.5-18V.
In this embodiment, the debugger further includes a flash memory module, where the flash memory module is used to store a driver, and the driver is used to drive the debugger and the BOSA to operate, that is, the driver needs to be embedded into the flash memory module, at an initialization stage of the debugger, the driver, the UX3320 including the BOSA and the driver BOSA, and an initial value of a peripheral circuit thereof are started to be loaded, and after the loading is completed, the debugger can be in a standby debugging state, and at this time, the eye diagram can be started to be debugged.
Finally, the above embodiments are only used for illustrating the technical solutions of the present application and not for limiting, although the present application is described in detail with reference to the preferred embodiments, it should be understood by those skilled in the art that modifications or equivalent substitutions can be made on the technical solutions of the present application without departing from the spirit and scope of the technical solutions of the present application, and all the technical solutions of the present application should be covered by the claims of the present application.
Claims (10)
1. The method for debugging the BOSA is characterized by comprising the following steps of: s1, connecting the debugging instrument with a test computer and a BOSA respectively; connecting the tail fiber of the BOSA with an eye chart oscilloscope;
s2, sending an instruction by the testing computer to enable the BOSA to emit light for a long time through the debugging instrument;
s3, adjusting an adjusting module of the debugging instrument according to the state of the eye pattern, wherein when the eye pattern is in a normal state; and stopping adjusting the adjusting module, and reading the resistance-capacitance value of the BOSA matched with the adjusting module.
2. The method of debugging a BOSA of claim 1, wherein adjusting an adjustment module of a debugger according to the state of the eye diagram comprises:
s31, adjusting a first adjusting unit of the debugging instrument to enable the first state of the normal state to meet the requirement;
s32, adjusting a second adjusting unit of the debugger to enable the second state of the normal state to reach the requirement, stopping adjusting and executing the step S33 when the second state reaches the requirement, and otherwise, returning to the step S31;
and S33, adjusting the third unit and the fourth unit of the debugging instrument to enable the third state and the fourth state in the normal state to meet the requirements, stopping adjustment when the third state and the fourth state in the normal state meet the requirements, and otherwise, continuing to execute the step.
3. The BOSA debugging system is characterized by comprising a debugging instrument, a testing computer and an eye chart oscilloscope which are connected, wherein the debugging instrument is used for respectively testing the connection between the computer and the BOSA, and is used for adjusting a resistance-capacitance value matched with the BOSA; the test computer is connected with the debugging instrument and used for sending out an instruction, and the instruction can enable the BOSA to emit light through the debugging instrument; the eye pattern oscilloscope is connected with the BOSA tail fiber and displays an eye pattern of the BOSA;
adjusting the capacitance values based on the eye diagram; and when the eye pattern is in a normal state, reading the capacitance and resistance value matched with the debugging instrument.
4. The system for debugging BOSA according to claim 3, wherein the debugger comprises an adjusting module, the adjusting module is used for matching resistance-capacitance values of the BOSA, the adjusting module comprises a first adjusting unit, a second adjusting unit, a third adjusting unit and a fourth adjusting unit, and the first adjusting unit is used for adjusting the eye diagram to enable the first state of the normal state to meet the requirement; the second adjusting unit is used for adjusting the eye pattern to enable the second state of the normal state to meet the requirement; the third adjusting unit is used for adjusting the eye pattern to enable the third state in the normal state to meet the requirement; the fourth adjusting unit is used for adjusting the eye pattern to adjust the eye pattern so that the fourth state of the normal state meets the requirement.
5. The BOSA debugging method is characterized by comprising the following steps:
s100, respectively connecting the BOSA and the test computer;
s200, receiving an instruction of a testing computer to drive the BOSA so that the BOSA emits light;
s300, receiving an adjusting operation of the resistance-capacitance value matched with the BOSA, and enabling an eye pattern of the BOSA to be in a normal state.
6. The BOSA debugging method of claim 5, wherein the receiving an adjustment of the BOSA-matched RC value comprises: s301, receiving a first operation to enable a first state of a normal state of an eye pattern to meet requirements;
s302, receiving a second operation to enable the second state of the normal state of the eye pattern to meet the requirement, and executing S03 when the second state of the normal state of the eye pattern meets the requirement; otherwise, returning to the step 301;
s303, receiving a third operation to enable the third state of the normal state of the eye pattern to meet the requirement;
s304, receiving a fourth operation to enable the fourth state of the normal state of the eye pattern to meet the requirement.
7. The BOSA debugging method of claim 6, wherein the first operation comprises adjusting a first adjuster to adjust a resistance of a laser anode damping resistor; the second operation includes: adjusting the first part of adjuster to adjust the resistance of the laser cathode filter resistor and adjusting the second part of adjuster to adjust the capacitance of the laser cathode filter capacitor; the third operation comprises adjusting a third adjuster to adjust a resistance magnitude of the rising resistance; the fourth operation includes adjusting a fourth adjuster to adjust a resistance magnitude of the falling resistance.
8. Debug BOSA's debugging appearance, its characterized in that includes: the device comprises a control module, an adjusting module and a BOSA connecting module; the control module is used for receiving an instruction of a test computer and controlling the BOSA to emit light for a long time; the adjusting module is used for receiving the adjusting operation of the matched resistance-capacitance value of the BOSA, so that the eye diagram of the BOSA is in a normal state; the BOSA connection module is used for being connected with the BOSA to drive the BOSA to emit light for a long time.
9. The debugger for debugging BOSA according to claim 8, wherein the adjusting module comprises a first adjusting unit, a second adjusting unit, a third adjusting unit, and a fourth adjusting unit, wherein the first adjusting unit is configured to receive a first operation; the second adjusting unit is used for receiving a second operation; the third adjusting unit is used for receiving a third operation; the fourth adjusting unit is used for receiving a fourth operation.
10. The debugger for debugging BOSA according to claim 9, wherein the first adjusting unit comprises a laser positive damping resistor and a first adjuster for adjusting the magnitude of the resistance; the second adjusting unit comprises a first adjusting part and a second adjusting part, wherein the first adjusting part comprises a laser cathode filter resistor and a first part adjuster for adjusting the resistance of the laser cathode filter resistor; the second adjusting part comprises a laser cathode filter capacitor and a second adjusting part for adjusting the size of the laser cathode filter capacitor; the third adjusting unit comprises a rising resistor and a third adjuster for adjusting the resistance of the rising resistor; the fourth adjusting unit includes a dropping resistor and a fourth adjuster adjusting a magnitude of a resistance thereof.
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN117375551A (en) * | 2023-10-13 | 2024-01-09 | 苏州异格技术有限公司 | Frequency compensation system, method, device, equipment and medium for sharing IO pins |
Citations (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20070263685A1 (en) * | 2006-05-11 | 2007-11-15 | Mitsubishi Electric Corporation | Laser diode drive circuit |
| CN101179331A (en) * | 2006-11-08 | 2008-05-14 | 中兴通讯股份有限公司 | Automatic debugging method and system of optical module |
| CN202014251U (en) * | 2011-04-18 | 2011-10-19 | 青岛海信宽带多媒体技术有限公司 | Self-luminous debugging system of optical network unit based on bosa on board (BOB) |
| CN102255654A (en) * | 2011-04-11 | 2011-11-23 | 成都新易盛通信技术有限公司 | Light emission component testing tool and applied circuit thereof |
| CN104796800A (en) * | 2011-12-31 | 2015-07-22 | 青岛海信宽带多媒体技术有限公司 | Optical module and passive optical network with same |
| CN105301712A (en) * | 2015-11-26 | 2016-02-03 | 武汉光迅科技股份有限公司 | BOSA device with power control function |
| CN106535010A (en) * | 2015-09-15 | 2017-03-22 | 青岛海信宽带多媒体技术有限公司 | Optical network unit of passive optical network, and optical module thereof |
| CN108242952A (en) * | 2017-12-20 | 2018-07-03 | 深圳市双翼科技股份有限公司 | A kind of BOB equipment Alignments system and method |
| CN110995360A (en) * | 2019-11-29 | 2020-04-10 | 四川天邑康和通信股份有限公司 | Receiving end hard pin connecting circuit based on 10G EPON ONU BOB optical module |
| CN214851240U (en) * | 2021-01-29 | 2021-11-23 | 厦门优迅高速芯片有限公司 | Optical transceiver driving chip and optical transceiver system |
-
2022
- 2022-07-22 CN CN202210864508.0A patent/CN114938243B/en active Active
Patent Citations (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20070263685A1 (en) * | 2006-05-11 | 2007-11-15 | Mitsubishi Electric Corporation | Laser diode drive circuit |
| CN101179331A (en) * | 2006-11-08 | 2008-05-14 | 中兴通讯股份有限公司 | Automatic debugging method and system of optical module |
| CN102255654A (en) * | 2011-04-11 | 2011-11-23 | 成都新易盛通信技术有限公司 | Light emission component testing tool and applied circuit thereof |
| CN202014251U (en) * | 2011-04-18 | 2011-10-19 | 青岛海信宽带多媒体技术有限公司 | Self-luminous debugging system of optical network unit based on bosa on board (BOB) |
| CN104796800A (en) * | 2011-12-31 | 2015-07-22 | 青岛海信宽带多媒体技术有限公司 | Optical module and passive optical network with same |
| CN106535010A (en) * | 2015-09-15 | 2017-03-22 | 青岛海信宽带多媒体技术有限公司 | Optical network unit of passive optical network, and optical module thereof |
| CN105301712A (en) * | 2015-11-26 | 2016-02-03 | 武汉光迅科技股份有限公司 | BOSA device with power control function |
| CN108242952A (en) * | 2017-12-20 | 2018-07-03 | 深圳市双翼科技股份有限公司 | A kind of BOB equipment Alignments system and method |
| CN110995360A (en) * | 2019-11-29 | 2020-04-10 | 四川天邑康和通信股份有限公司 | Receiving end hard pin connecting circuit based on 10G EPON ONU BOB optical module |
| CN214851240U (en) * | 2021-01-29 | 2021-11-23 | 厦门优迅高速芯片有限公司 | Optical transceiver driving chip and optical transceiver system |
Non-Patent Citations (1)
| Title |
|---|
| 顾峥峣: "基于板载光收发组件技术的吉比特无源光网络单元硬件电路设计与实现", 《中国优秀硕士学位论文全文数据库 信息科技辑》 * |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN117375551A (en) * | 2023-10-13 | 2024-01-09 | 苏州异格技术有限公司 | Frequency compensation system, method, device, equipment and medium for sharing IO pins |
| CN117375551B (en) * | 2023-10-13 | 2024-04-26 | 苏州异格技术有限公司 | Frequency compensation system, method, device, equipment and medium for sharing IO pins |
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