CN1149237A - 等离子体发生器的起弧增强电路 - Google Patents

等离子体发生器的起弧增强电路 Download PDF

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Publication number
CN1149237A
CN1149237A CN96110503A CN96110503A CN1149237A CN 1149237 A CN1149237 A CN 1149237A CN 96110503 A CN96110503 A CN 96110503A CN 96110503 A CN96110503 A CN 96110503A CN 1149237 A CN1149237 A CN 1149237A
Authority
CN
China
Prior art keywords
voltage
plasma
detection circuit
negative
peak detection
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN96110503A
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English (en)
Chinese (zh)
Inventor
J·C·塞拉斯
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ENI Inc
Original Assignee
ENI Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ENI Inc filed Critical ENI Inc
Publication of CN1149237A publication Critical patent/CN1149237A/zh
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32009Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05HPLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00Generating plasma; Handling plasma
    • H05H1/24Generating plasma
    • H05H1/26Plasma torches
    • H05H1/32Plasma torches using an arc
    • H05H1/34Details, e.g. electrodes, nozzles
    • H05H1/36Circuit arrangements

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Plasma Technology (AREA)
  • Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
  • Ignition Installations For Internal Combustion Engines (AREA)
CN96110503A 1995-10-20 1996-06-25 等离子体发生器的起弧增强电路 Pending CN1149237A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US546,119 1983-10-27
US54611995A 1995-10-20 1995-10-20

Publications (1)

Publication Number Publication Date
CN1149237A true CN1149237A (zh) 1997-05-07

Family

ID=24178958

Family Applications (1)

Application Number Title Priority Date Filing Date
CN96110503A Pending CN1149237A (zh) 1995-10-20 1996-06-25 等离子体发生器的起弧增强电路

Country Status (6)

Country Link
US (1) US5717293A (enExample)
JP (1) JPH09148098A (enExample)
CN (1) CN1149237A (enExample)
DE (1) DE19627497A1 (enExample)
GB (1) GB2306808A (enExample)
TW (1) TW312890B (enExample)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN100347817C (zh) * 2001-11-27 2007-11-07 东京毅力科创株式会社 等离子体处理装置
CN100588102C (zh) * 2003-03-21 2010-02-03 许廷格电子有限及两合公司 用于产生输出dc电压的方法和等离子处理dc电压供电电源
CN104969665A (zh) * 2012-12-04 2015-10-07 欧瑞康美科股份公司,沃伦 用于运行等离子体产生装置的方法和控制装置
CN108886345A (zh) * 2016-02-18 2018-11-23 先进能源工业公司 用于rf发生器内的受控过冲的设备

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JP3425342B2 (ja) * 1997-10-06 2003-07-14 本田技研工業株式会社 可搬型電源装置
US7180758B2 (en) * 1999-07-22 2007-02-20 Mks Instruments, Inc. Class E amplifier with inductive clamp
US6469919B1 (en) * 1999-07-22 2002-10-22 Eni Technology, Inc. Power supplies having protection circuits
KR100344988B1 (ko) * 2000-06-27 2002-07-20 한국코트렐 주식회사 고전압 임펄스를 이용한 가스 중 방전형성장치
US8057468B2 (en) 2002-12-17 2011-11-15 Bovie Medical Corporation Method to generate a plasma stream for performing electrosurgery
US6822396B2 (en) * 2003-01-31 2004-11-23 Advanced Energy Industries, Inc. Transformer ignition circuit for a transformer coupled plasma source
JP4463096B2 (ja) * 2004-12-24 2010-05-12 オリジン電気株式会社 放電負荷用電源装置
US7777567B2 (en) 2007-01-25 2010-08-17 Mks Instruments, Inc. RF power amplifier stability network
US9649143B2 (en) * 2009-09-23 2017-05-16 Bovie Medical Corporation Electrosurgical system to generate a pulsed plasma stream and method thereof
US8795265B2 (en) 2010-01-28 2014-08-05 Bovie Medical Corporation Electrosurgical apparatus to generate a dual plasma stream and method thereof
US8344801B2 (en) 2010-04-02 2013-01-01 Mks Instruments, Inc. Variable class characteristic amplifier
TWI409558B (zh) 2010-07-30 2013-09-21 Chunghwa Picture Tubes Ltd 顯示面板及其訊號線修補方法
US9387269B2 (en) 2011-01-28 2016-07-12 Bovie Medical Corporation Cold plasma jet hand sanitizer
CN102695356B (zh) * 2012-03-30 2014-10-29 马鞍山市同力液压设备制造有限公司 脉冲射频双重点火的等离子体点火枪
US11939477B2 (en) 2014-01-30 2024-03-26 Monolith Materials, Inc. High temperature heat integration method of making carbon black
US10138378B2 (en) 2014-01-30 2018-11-27 Monolith Materials, Inc. Plasma gas throat assembly and method
US10100200B2 (en) 2014-01-30 2018-10-16 Monolith Materials, Inc. Use of feedstock in carbon black plasma process
US10370539B2 (en) 2014-01-30 2019-08-06 Monolith Materials, Inc. System for high temperature chemical processing
KR102497660B1 (ko) 2014-01-31 2023-02-07 모놀리스 머티어리얼스 인코포레이티드 플라즈마 토치 설계
WO2016126600A1 (en) 2015-02-03 2016-08-11 Monolith Materials, Inc. Regenerative cooling method and apparatus
KR102705340B1 (ko) 2015-02-03 2024-09-09 모놀리스 머티어리얼스 인코포레이티드 카본 블랙 생성 시스템
CA3032246C (en) * 2015-07-29 2023-12-12 Monolith Materials, Inc. Dc plasma torch electrical power design method and apparatus
EP3347306A4 (en) 2015-09-09 2019-04-17 Monolith Materials, Inc. CIRCULAR SINGLE-LAYER GRAPH
CA3034212C (en) 2015-09-14 2023-08-01 Monolith Materials, Inc. Carbon black from natural gas
US11129665B2 (en) 2015-12-02 2021-09-28 Apyx Medical Corporation Mixing cold plasma beam jets with atmopshere
MX2018013162A (es) 2016-04-29 2019-07-04 Monolith Mat Inc Adicion de calor secundario para el proceso y aparato de produccion de particulas.
ES2983689T3 (es) 2016-04-29 2024-10-24 Monolith Mat Inc Método y aparato del aguijón de la antorcha
US10918433B2 (en) 2016-09-27 2021-02-16 Apyx Medical Corporation Devices, systems and methods for enhancing physiological effectiveness of medical cold plasma discharges
WO2018165483A1 (en) 2017-03-08 2018-09-13 Monolith Materials, Inc. Systems and methods of making carbon particles with thermal transfer gas
CN115746586A (zh) 2017-04-20 2023-03-07 巨石材料公司 颗粒系统和方法
CA3074220A1 (en) 2017-08-28 2019-03-07 Monolith Materials, Inc. Systems and methods for particle generation
CA3074216A1 (en) 2017-08-28 2019-03-07 Monolith Materials, Inc. Particle systems and methods
WO2019084200A1 (en) 2017-10-24 2019-05-02 Monolith Materials, Inc. PARTICULAR SYSTEMS AND METHODS
US11456160B2 (en) * 2018-03-26 2022-09-27 Tokyo Electron Limited Plasma processing apparatus
EP4235739A1 (en) * 2022-02-28 2023-08-30 TRUMPF Huettinger Sp. Z o. o. High power generator and method of supplying high power pulses
US20250309772A1 (en) * 2024-03-27 2025-10-02 Advanced Energy Industries, Inc. Switched-in voltage doubler utilizing parallel/series rectifier output

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* Cited by examiner, † Cited by third party
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DE231918C (enExample) *
GB603579A (en) * 1945-03-14 1948-06-18 Standard Telephones Cables Ltd Improvements in or relating to the use of voltage doubling circuits for alternating electric currents
GB1425506A (en) * 1972-03-03 1976-02-18 Redelec High-voltage dc generator in an electrostatic apparatus
US3723846A (en) * 1972-03-15 1973-03-27 Radiation Dynamics High voltage power supply
IT1006799B (it) * 1973-02-01 1976-10-20 Air Ind Cascata moltiplicatrice e fistola di spruzzatura elettrostatica a ca scata incorporata
US3909666A (en) * 1973-12-26 1975-09-30 Stanley N Tenen Ballast circuit for gaseous discharge lamps
GB1564401A (en) * 1976-09-29 1980-04-10 Atomic Energy Authority Uk High voltage electrical power supply
KR910000273B1 (ko) * 1985-05-09 1991-01-23 마쯔시다덴기산교 가부시기가이샤 플라즈마 처리장치
US5057988A (en) * 1989-11-16 1991-10-15 K And M Electronics, Inc. Modular power supply
US5231564A (en) * 1992-03-30 1993-07-27 Lorad Corporation Power supply for producing excitation voltage for an x-ray tube filament

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN100347817C (zh) * 2001-11-27 2007-11-07 东京毅力科创株式会社 等离子体处理装置
CN100588102C (zh) * 2003-03-21 2010-02-03 许廷格电子有限及两合公司 用于产生输出dc电压的方法和等离子处理dc电压供电电源
CN104969665A (zh) * 2012-12-04 2015-10-07 欧瑞康美科股份公司,沃伦 用于运行等离子体产生装置的方法和控制装置
US9756713B2 (en) 2012-12-04 2017-09-05 Oerliken Metco Ag, Wohlen Method and control unit for operating a plasma generation apparatus
CN104969665B (zh) * 2012-12-04 2018-04-13 欧瑞康美科股份公司,沃伦 用于运行等离子体产生装置的方法和控制装置
CN108886345A (zh) * 2016-02-18 2018-11-23 先进能源工业公司 用于rf发生器内的受控过冲的设备
CN108886345B (zh) * 2016-02-18 2022-06-21 先进工程解决方案全球控股私人有限公司 用于rf发生器内的受控过冲的设备

Also Published As

Publication number Publication date
GB9611340D0 (en) 1996-08-07
TW312890B (enExample) 1997-08-11
JPH09148098A (ja) 1997-06-06
DE19627497A1 (de) 1997-04-24
US5717293A (en) 1998-02-10
GB2306808A (en) 1997-05-07

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C06 Publication
PB01 Publication
C01 Deemed withdrawal of patent application (patent law 1993)
WD01 Invention patent application deemed withdrawn after publication