CN114894120B - Dual-wavelength-based measurement range-adjustable surface morphology measurement device and measurement method - Google Patents
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Abstract
The invention discloses a dual-wavelength-based adjustable range surface morphology measuring device and a dual-wavelength-based adjustable range surface morphology measuring method, which relate to the field of surface morphology measurement and are used for solving the problems that the existing surface morphology measuring method has the influence of the limitation of a phase difference value range on the surface morphology measuring range, the processing process is complex, single-step long phase difference is greatly jumped and cannot be compensated, dual-wavelength light is injected into an FP interferometer formed by an optical fiber reflecting end surface and a surface to be measured through an optical fiber coupler, two beams of interference light divided by a wavelength division multiplexer are injected into a photoelectric detector and are converted into two paths of electric signals, and a data processing module extracts the phase difference between the signals; the optical fiber reflecting end face and the surface to be measured are subjected to relative transverse displacement, the cavity length of the FP interferometer is modulated by the surface to be measured, the modulation quantity is represented by the change of the phase difference, and the surface to be measured is obtained. The adjustment of the measuring range of the measuring device is realized by adjusting the wavelength difference of the dual-wavelength light.
Description
Technical Field
The invention relates to the field of surface topography measurement, in particular to a dual-wavelength-based measurement device and a dual-wavelength-based measurement method for the surface topography with adjustable measuring range.
Background
The development of society needs to acquire external information in multiple fields and high depth, and demands are made on various sensing technologies. Optical sensing, and in particular optical interference sensing, has received attention for its high sensitivity, immunity to electromagnetic interference and wide applicability. The current information technology has higher and higher performance requirements for electronic products and optical mirrors, which puts higher demands on the quality of wafers, which are raw materials of semiconductor integrated circuits. The degree of warpage of the wafer directly influences the yield of processes such as photoetching, wafer bonding and the like in the subsequent production process. Currently, methods for measuring wafer warpage are generally classified into an electron microscope method, an optical interferometry method and a mechanical probe method.
The electron microscope method uses a scanning electron microscope as a means to detect the surface morphology state. The method has high measurement accuracy, but the device has high price, has high requirements on measurement environment, and is not beneficial to large-scale production and application. The optical interferometry combines optical and electronic techniques, and has the defects of small dynamic range, poor universality, high manufacturing cost of the device and the like. The mechanical probe method is represented by an atomic force microscope, and the principle is that the surface characteristics of a sample to be measured are presented by utilizing Van der Waals force action among atoms, and the measuring efficiency is low and the surface of a wafer to be measured is damaged in a point-by-point measuring and data fitting mode.
Therefore, how to remedy the defects of the method, meet the requirements of high precision and low cost, improve the measurement efficiency, expand the measurement dynamic range and reduce the requirements of measurement on the environment are problems to be solved by the technicians in the field.
The optical interference signal phase difference measurement technology utilizes the phase difference change among the extracted interference signals to characterize the optical path change in the interferometer, such as the measurement of the cavity length change of the FP interferometer, which is mostly obtained by utilizing the phase difference change among the interference spectrum signals. And constructing an FP interferometer by using the surface to be measured and a certain reference surface, and modulating the cavity length of the FP interferometer according to the convex-concave distribution of the surface to be measured, wherein the appearance (convex-concave distribution) of the surface to be measured can be represented by the cavity length change of the FP interferometer.
The EFA algorithm can be used for solving the phase difference between interference signals, but the operation faces the limitation of the phase difference value range (0, pi) and the incapacitation of a small phase signal. The problem that the small-phase signal cannot work can be effectively avoided by loading cavity length modulation with a certain amplitude in the FP interferometer; the existing literature proposes a phase compensation and recovery technology to avoid the limitation of the phase difference value range (0, pi), but the processing process is complex, and the problem that the phase difference can not be compensated due to large jump of a single step length is faced, so that the application of using an EFA algorithm to calculate the phase difference in the surface topography measurement to be measured is limited.
Disclosure of Invention
The invention aims to solve the problems, and provides a dual-wavelength-based measuring device and a dual-wavelength-based measuring method for measuring the surface morphology of an adjustable measuring range, which can reduce the implementation cost of a sensing device and improve the measuring range and the practicability of a measuring system.
The aim of the invention can be achieved by the following technical scheme: the utility model provides a measurement device is formed to adjustable range surface appearance based on dual wavelength, includes dual wavelength light source, fiber coupler, optic fibre reflecting end face, surface to be measured, axial displacement modulating device, horizontal displacement modulating device, wavelength division multiplexer, photoelectric detector and data processing module;
the working method of the morphology measuring device comprises the following steps:
the optical fiber reflecting end face and the surface to be measured form an FP interferometer;
the dual-wavelength light emitted by the light source is injected into the FP interferometer through the optical fiber coupler, the output light of the FP interferometer is injected into the wavelength division multiplexer through the optical fiber coupler, the two split light beams are injected into the photoelectric detector and are converted into two paths of electric signals, the data processing module extracts the phase difference between the two paths of electric signals, and the cavity length change of the FP interferometer is represented by the change of the phase difference;
the transverse displacement modulation device is used for enabling the optical fiber reflecting end face and the surface to be measured to be transversely displaced, the cavity length of the FP interferometer is modulated by the surface morphology to be measured, the modulation quantity of the FP interferometer is represented by the change of the phase difference, and the surface morphology to be measured is obtained.
The adjustment of the measuring range of the measuring device is realized by adjusting the wavelength difference of the dual-wavelength light;
as a preferred embodiment of the present invention, the dual-wavelength light source is configured to emit light beams with two wavelengths, and the implementation mode of the dual-wavelength light source may be that two single-wavelength light sources generate, or that a single light source generates light with two wavelengths;
as a preferred embodiment of the present invention, the optical fiber coupler may be replaced by an optical fiber circulator;
as a preferred implementation mode of the invention, the axial displacement modulation device can realize the vibration adjustment of the FP cavity length according to a certain frequency and also can realize the adjustment of a fixed displacement value; the axial displacement modulation device can act on the end face of the optical fiber, can act on the surface to be tested, or can act on both the surfaces at the same time;
as a preferred embodiment of the present invention, the lateral displacement modulation device implements lateral displacement between the optical fiber reflecting end surface and the surface to be measured, which may be implemented by laterally moving the optical fiber reflecting end surface or the surface to be measured;
as a preferred embodiment of the present invention, the data processing module extracts a phase difference between two signals, and generates an electrical signal to modulate the lateral displacement modulation device and the axial displacement modulation device;
a measurement method of a dual wavelength-based adjustable range surface topography measurement device, the method comprising:
the dual-wavelength light emitted by the dual-wavelength light source is respectively interfered in the FP interferometer, the interference light is divided into two paths of optical signals through the wavelength division multiplexer, and the two paths of optical signals are converted into two paths of electric signals through the photoelectric detector, which can be expressed as
Wherein,and->For the initial phase of two interference signals, a 1 And a 2 As direct current of interference signal, b 1 And b 2 Beta is the phase difference of two paths of signals, theta is the alternating current quantity of the interference signals s For the displacement generated by the axial displacement modulation device, n is the refractive index of the optical medium, delta lambda is the difference of the wavelength of the light generated by the light source, and when the cavity length L 0 Changes in Δl and corresponding changes in Δβ in phase difference occur, the relationship between the two is as follows
The data processing module transmits a modulation signal to the axial displacement modulation device to enable the FP cavity length to generate amplitude larger than lambda/8, namely theta s Greater than pi/2. Using ellipsesTwo paths of signals V are calculated by a fitting algorithm 1 And V 2 Phase difference between them.
Step two, the data processing module transmits a modulation signal to the transverse displacement modulator to enable the surface to be detected to transversely move along a certain direction, and the data processing module calculates and outputs a phase difference value beta measured in the process n And is denoted as (beta) n ,T n )；
Step three, the data processing module transmits another modulation signal to the axial displacement modulator to change the FP cavity length, so that the phase difference corresponding to the measurement starting point of the surface to be measured is (0, pi), and if the phase difference can be pi/2 or approaching 0 or approaching pi;
step four, if (beta) n ,T n ) If the variation range of the phase difference value exceeds pi, the wavelength difference value Deltalambda is reduced until (beta) n ,T n ) The variation range of the phase difference value is smaller than and tends to pi, when (beta) n ,T n ) If the variation range of the phase difference value is too small, the wavelength difference value Deltalambda is increased until (beta) n ,T n ) The variation range of the phase difference value is smaller than and tends to pi;
step five, according to the finally obtained (beta) n ,T n ) Calculating a corresponding surface topography curve (l) to be measured according to the formula (2) n ,T n )；
Compared with the prior art, the invention has the beneficial effects that:
1. according to the invention, the adjustment of the surface morphology measuring range is realized by adjusting the wavelength difference value of the dual-wavelength light, so that the influence of the limitation of the phase difference value range on the surface morphology measuring range is avoided;
2. the invention realizes the adjustment of the surface morphology measuring range by adjusting the wavelength difference value of the dual-wavelength light, so that the measuring system has the functions of high measuring resolution and large measuring range.
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The present invention is further described below with reference to the accompanying drawings for the convenience of understanding by those skilled in the art.
FIG. 1 is a schematic diagram of a dual wavelength-based adjustable range surface topography measurement device of the present invention;
FIG. 2 is a graph of "convex" phase difference curve (. Beta n ,T n ) A schematic diagram;
FIG. 3 is a graph of "concave" phase difference curve (. Beta n ,T n ) A schematic diagram;
FIG. 4 is a graph of phase difference between "convex and concave" phase difference curve (. Beta.) n ,T n ) A schematic diagram;
FIG. 5 is a schematic diagram showing the relationship between the wavelength difference and the phase difference range of the same surface to be measured.
Detailed Description
The technical solutions of the present invention will be clearly and completely described in connection with the embodiments, and it is obvious that the described embodiments are only some embodiments of the present invention, not all embodiments. All other embodiments, which can be made by those skilled in the art based on the embodiments of the invention without making any inventive effort, are intended to be within the scope of the invention.
Referring to fig. 1-5, a dual wavelength-based adjustable range surface topography measuring device is shown; referring to fig. 1, the embodiment discloses a dual-wavelength-based adjustable range surface morphology measurement device, which comprises a dual-wavelength light source 1, an optical fiber coupler 2, an optical fiber 3, an optical fiber reflecting end face 11, a surface to be measured 10, an axial displacement modulator one 9, an axial displacement modulator two 12, a transverse displacement modulator 8, a wavelength division multiplexer 4, a photoelectric detector 5, a signal cable 7 and a data processing module 6, wherein the morphology measurement device sequentially comprises the following working methods:
1) The cutting angle of the end face of the optical fiber tends to 0 degrees, so that the reflecting end face 11 of the optical fiber and the surface 10 to be measured form an FP interferometer.
2) Using a wavelength lambda 1 And lambda (lambda) 2 Light with two wavelengths emitted by the light source is injected into an FP interferometer through an optical fiber coupler 2, the generated interference light is injected into a wavelength division multiplexer 4 through the optical fiber coupler 2, and the wavelength lambda is after light is split 1 And lambda (lambda) 2 The two corresponding interference lights are respectively injected into the photoelectric detectors 5 and converted into two paths of electric signals, and the number of the photoelectric detectors 5 is two;
3) Data processingThe module 6 sends a modulation signal to the second axial displacement modulator 12 to make the reflection end face of the optical fiber have a frequency of 1kHz and an amplitude of lambda along the axial direction of the optical fiber 2 Vibration of/8 (selected wavelength lambda 1 Less than lambda 2 ) The data processing module 6 extracts the phase difference between the two electrical signals.
Two paths of electrical signals can be expressed as
Wherein,and->For the initial phase of two interference signals, a 1 And a 2 As direct current of interference signal, b 1 And b 2 Beta is the phase difference of two paths of signals, theta is the alternating current quantity of the interference signals s For the displacement generated by the axial displacement modulator 1, n is the refractive index of the optical medium, deltalambda is the difference of the wavelength of light generated by the light source, and when the cavity length L 0 Changes in Δl and corresponding changes in Δβ in phase difference occur, the relationship between the two is as follows
The data processing module 6 calculates two paths of signals V by using an ellipse fitting algorithm 1 And V 2 Phase difference between them.
4) The data processing module 6 sends a modulation signal to the transverse displacement modulation device to enable the surface to be measured to move leftwards, and the moving speed and the moving time are set to achieve uniform speed movement of the surface to be measured for a certain distance. Because of the convex-concave distribution of the surface to be measured, the FP cavity length formed by the upper reflecting surface and the reflecting end surface of the optical fiber is modulated, and the data processing module 6 calculates the phase difference value formed in this period of time and marks as (beta) n ,T n ) The subscript n indicates that during this period of timeThe number of phase difference values to be outputted.
5) Analysis of the measured phase difference curve (. Beta.) n ,T n ) Judging beta n The range of variation of (c) is related to pi. When beta is n Is varied by a range greater than pi by decreasing the wavelength difference Deltalambda according to equation (5) n The range of variation of (2) is less than and tends to pi; when beta is n Is varied by a range much smaller than pi, beta is obtained by increasing the wavelength difference Deltalambda according to formula (5) n The range of variation of (2) is less than and tends to pi.
If the light wavelength generated by the dual-wavelength light source 1 is 1550nm and 1570nm, delta lambda is 20nm, the fluctuation range of the surface to be measured is 10 mu m, and the generated phase difference change range is 1.0456rad (59.9 degrees); when the wavelengths of light are 1550nm and 1590nm, respectively, deltalambda is 40nm, and the fluctuation range of the surface to be measured is 10 mu m, the variation range of the phase difference generated is 2.0911rad (119.9 DEG), as shown in FIG. 5.
6) Analysis of the measured phase difference curve (. Beta.) n ,T n ) It is divided into a concave shape, a convex shape or a concave-convex shape. When curve (. Beta.) n ,T n ) In a concave shape, a data processing module 6 transmits a direct-current voltage signal to an axial displacement modulation device I (9) and adjusts the amplitude of the direct-current voltage signal to enable the phase difference of a starting point to approach pi; when curve (. Beta.) n ,T n ) In a convex shape, a data processing module 6 transmits a direct-current voltage signal to an axial displacement modulation device I (9), and the amplitude of the direct-current voltage signal is adjusted to enable a starting point phase difference beta 0 Approaching 0rad; when curve (. Beta.) n ,T n ) In the shape of 'concave-convex' phase, the data processing module 6 transmits a direct-current voltage signal to the axial displacement modulation device I (9), adjusts the amplitude of the direct-current voltage signal and enables the initial point phase difference beta 0 Is any value between (0, pi) and can be pi/2 to ensure a phase difference curve (beta) n ,T n ) Upper phase difference beta n Is approximately pi/2 rad;
7) From the resulting curve (. Beta n ,T n ) And (4) calculating a corresponding surface topography curve (l) n ,T n )。l n The expression of (2) is
The preferred embodiments of the invention disclosed above are intended only to assist in the explanation of the invention. The preferred embodiments are not intended to be exhaustive or to limit the invention to the precise form disclosed. Obviously, many modifications and variations are possible in light of the above teaching. The embodiments were chosen and described in order to best explain the principles of the invention and the practical application, to thereby enable others skilled in the art to best understand and utilize the invention. The invention is limited only by the claims and the full scope and equivalents thereof.
Claims (4)
1. The utility model provides a adjustable range surface appearance measuring device based on dual wavelength, includes dual wavelength light source (1), fiber coupler (2), optic fibre (3), optic fibre reflecting end face (11), surface to be measured (10), axial displacement modulating device, horizontal displacement modulating device, wavelength division multiplexer (4), photoelectric detector (5) and data processing module (6); the optical fiber reflecting end face (11) and the surface to be measured (10) form an FP interferometer; characterized in that the dual-wavelength light source (1) is used for emitting dual wavelength lambda 1 And lambda (lambda) 2 The optical fiber coupler (2) is connected with the wavelength division multiplexer (4) through an optical fiber (3), and the FP interferometer output light is injected into the wavelength division multiplexer (4) through the optical fiber coupler (2); the wavelength division multiplexer (4) is used for injecting the received two beams of light and the split two beams of light into the photoelectric detector (5), and the photoelectric detector (5) is used for converting the two beams of light into two paths of electric signals and transmitting the two paths of electric signals to the data processing module (6); the data processing module (6) is used for extracting the phase difference between the two paths of electric signals and representing the cavity length change of the FP interferometer through the change of the phase difference;
the data processing module (6) is respectively connected with the axial displacement modulation device and the transverse displacement modulation device through signal cables (7); the transverse displacement modulation device enables the optical fiber reflecting end face and the surface to be measured to transversely displace; the axial displacement modulation device comprises an axial displacement modulator I (9) and an axial displacement modulator II (12);
the measuring method of the device comprises the following steps:
step one: the dual-wavelength light source (1) emits dual-wavelength light beams to interfere in the FP interferometer respectively, the interference light is divided into two paths of optical signals through the wavelength division multiplexer (4), two paths of electrical signals are formed through the conversion of the photoelectric detector (5), and the data processing module (6) emits modulation signals to the axial displacement modulator II (12) so that the frequency of the optical fiber reflection end face along the optical fiber axial direction is 1kHz and the amplitude is lambda 2 Vibration of/8, wavelength lambda 1 Less than lambda 2 The data processing module (6) extracts the phase difference between the two paths of electric signals; the method comprises the following steps:
；
wherein,and->For the initial phase of two interference signals, a1 and a2 are the direct current quantity of the interference signals, b1 and b2 are the alternating current quantity of the interference signals, beta is the phase difference of the two signals, thetas is the displacement quantity generated by an axial displacement modulator II (12), n is the refractive index of an optical medium, delta lambda is the difference of the light wavelength generated by a light source, when the cavity length L0 changes, the phase difference generates corresponding change delta beta, and the relationship between the two is: Δl=Δβ/4pi;
the data processing module (6) transmits a modulation signal to the second axial displacement modulator (12) to enable the cavity length of the FP interferometer to generate a amplitude larger than lambda 2 And (8) calculating the phase difference between the two paths of electric signals V1 and V2 by using an elliptic fitting algorithm, wherein θs is larger than pi/2;
step two: the data processing module (6) transmits a modulation signal to the transverse displacement modulation device to enable the surface to be detected to transversely move along a certain direction, the data processing module (6) calculates and outputs a phase difference value beta n measured in the process and records the phase difference value beta n as (beta n, tn), and the subscript n represents the number of the phase difference values output in the time period;
step three: analyzing the measured phase difference curves (beta n, tn), dividing the curves into concave shapes, convex shapes and concave-convex shapes, transmitting another modulation signal to an axial displacement modulation device I (9) through a data processing module (6) to be a direct-current voltage signal when the curves (beta n, tn) are concave shapes, and adjusting the amplitude of the direct-current voltage signal to enable the FP cavity length to change, so that the phase difference corresponding to the measurement starting point of the surface to be measured is approximate to pi; when the curve (beta n, tn) is in a convex shape, transmitting another modulation signal to the axial displacement modulation device I (9) through the data processing module (6) to be a direct-current voltage signal, and adjusting the amplitude of the direct-current voltage signal to change the FP cavity length, so that the phase difference corresponding to the measurement starting point of the surface to be measured is approximately 0rad; when the curves (beta n, tn) are in a concave-convex interphase shape, transmitting another modulation signal to the axial displacement modulation device I (9) through the data processing module (6), and adjusting the amplitude of the modulation signal to be a direct-current voltage signal, so that the FP cavity length is changed, and the phase difference corresponding to the measurement starting point of the surface to be measured is an arbitrary value between (0, pi);
step four: analyzing the measured phase difference curve (beta n, tn), if the phase difference value change range in the curve (beta n, tn) exceeds pi, reducing the wavelength difference delta lambda until the phase difference value change range in the curve (beta n, tn) is smaller than pi and tends to pi, and when the phase difference value change range in the curve (beta n, tn) is far smaller than pi, increasing the wavelength difference delta lambda until the phase difference value change range in the curve (beta n, tn) is smaller than pi and tends to pi;
step five: from the resulting (βn, tn), from Δl=Δβ n And/4 pi to obtain corresponding surface topography curves (ln, tn) to be measured,。
2. the dual wavelength adjustable range surface topography measuring device of claim 1, wherein the dual wavelength light source (1) emits a dual wavelength light beam having two wavelengths, and the dual wavelength light source (1) is two light sources generating a single wavelength or a single light source generating two wavelengths of light.
3. The dual wavelength based adjustable range surface topography measuring device of claim 1, wherein the lateral displacement modulation device is a lateral displacement modulator (8).
4. A dual wavelength based adjustable range surface topography measuring device according to claim 1, wherein the data processing module (6) is further adapted to generate an electrical signal for modulating the lateral displacement modulating means and the axial displacement modulating means.
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