CN114894120A - Dual-wavelength-based measuring range-adjustable surface topography measuring device and measuring method - Google Patents
Dual-wavelength-based measuring range-adjustable surface topography measuring device and measuring method Download PDFInfo
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Abstract
The invention discloses a measuring range-adjustable surface topography measuring device and a measuring method based on dual wavelengths, which relate to the field of surface topography measurement and are used for solving the problems that the existing surface topography measuring method has the influence of phase difference value range limitation on the surface topography measuring range, the processing process is complex, and the existing surface topography measuring method is faced with the problem that single-step long phase difference large-amplitude jump cannot be compensated; the optical fiber reflecting end face and the surface to be measured generate relative transverse displacement, the cavity length of the FP interferometer is modulated by the surface morphology to be measured, and the modulation amount is expressed by the change of phase difference, so that the surface morphology to be measured is obtained. The range of the measuring device is adjusted by adjusting the wavelength difference of the dual-wavelength light.
Description
Technical Field
The invention belongs to the field of surface topography measurement, and particularly relates to a measuring device and a measuring method for surface topography with adjustable measuring range based on dual wavelengths.
Background
The development of the society needs to acquire external information in multiple fields and high depth, and demands are made on various sensing technologies. Optical sensing, and in particular optical interference sensing, is gaining attention for its high sensitivity, electromagnetic interference resistance, and broad applicability. The performance requirements of current information technology for electronic products and optical mirrors are higher and higher, which puts higher demands on the quality of the raw material, i.e., wafer, of semiconductor integrated circuits. The warping degree of the wafer directly influences the yield of the processes such as photoetching, wafer bonding and the like in the subsequent production process. At present, the measurement method for wafer warpage is generally divided into an electron microscope method, an optical interference method and a mechanical probe method.
The electron microscope method uses a scanning electron microscope as a means to detect the surface morphology state. The method has high measurement precision, but the device has high price, has high requirements on measurement environment, and is not beneficial to large-scale production and application. The optical interference method integrates optical and electronic technologies, and has the defects of small dynamic range of measurement, poor universality, high manufacturing cost of the device and the like. The mechanical probe method is represented by an atomic force microscope, and the principle is that van der waals force between atoms is utilized to present the surface characteristics of a measured sample, and the measurement efficiency is low and damage is generated on the surface of a measured wafer through point-by-point measurement and data fitting.
Therefore, how to make up for the defects of the above method, and at the same time, meet the requirements of high precision and low cost, improve the measurement efficiency, enlarge the measurement dynamic range, and reduce the requirements of the measurement on the environment is a problem to be solved by those skilled in the art.
The optical interference signal phase difference measurement technology utilizes the phase difference change among the extracted interference signals to represent the optical path change in the interferometer, for example, the cavity length change of the FP interferometer is measured, and the optical interference signal phase difference measurement technology mostly utilizes the phase difference change among the interference spectrum signals to obtain the optical path change. The FP interferometer is constructed by utilizing the surface to be measured and a certain reference surface, the cavity length of the FP interferometer is modulated according to the convex-concave distribution of the surface to be measured, and the appearance (convex-concave distribution) of the surface to be measured can be represented through the cavity length change of the FP interferometer.
The EFA algorithm can achieve the calculation of the phase difference between interference signals, but the operation of the EFA algorithm is limited by the fact that small-phase signals cannot work and the phase difference value range (0, pi). The problem that small-phase signals cannot work can be effectively avoided by loading cavity length modulation with a certain amplitude in the FP interferometer; the prior document proposes a phase compensation and recovery technology which can avoid the limitation of a phase difference value range (0, pi), but the processing process is complex, and the problem that the phase difference cannot be compensated due to single-step long phase difference large jump is faced, so that the application of utilizing an EFA algorithm to solve the phase difference in the measurement of the surface topography to be measured is limited.
Disclosure of Invention
The present invention is directed to solve the above-mentioned problems, and an object of the present invention is to provide a dual-wavelength-based measuring device and a measuring method for measuring surface topography with adjustable measurement range, which can reduce the cost of implementing a sensing device and improve the measurement range and the practicability of a measurement system.
The purpose of the invention can be realized by the following technical scheme: a measuring range-adjustable surface topography measuring device based on dual wavelengths comprises a dual-wavelength light source, an optical fiber coupler, an optical fiber reflecting end face, a surface to be measured, an axial displacement modulation device, a transverse displacement modulation device, a wavelength division multiplexer, a photoelectric detector and a data processing module;
the working method of the appearance measuring device comprises the following steps:
the optical fiber reflecting end face and the surface to be measured form an FP interferometer;
the double-wavelength light emitted by the light source is injected into the FP interferometer through the optical fiber coupler, the output light of the FP interferometer is injected into the wavelength division multiplexer through the optical fiber coupler, the two split beams of light are injected into the photoelectric detector and converted into two paths of electric signals, the data processing module extracts the phase difference between the two paths of electric signals, and the cavity length change of the FP interferometer is represented through the change of the phase difference;
the optical fiber reflecting end face and the surface to be measured are transversely displaced through the transverse displacement modulation device, the cavity length of the FP interferometer is modulated by the shape of the surface to be measured, and the modulation amount is expressed through the change of phase difference, so that the shape of the surface to be measured is obtained.
The range of the measuring device is adjusted by adjusting the wavelength difference of dual-wavelength light;
as a preferred embodiment of the present invention, the dual-wavelength light source emits light beams containing two wavelengths, and the implementation pattern may be that two single-wavelength light sources generate light, or that a single light source generates light of two wavelengths;
as a preferred embodiment of the present invention, the optical fiber coupler may be replaced by an optical fiber circulator;
as a preferred embodiment of the present invention, the axial displacement adjusting device can realize the adjustment of the FP cavity length by vibration at a certain frequency and also realize the adjustment of a fixed displacement value; the axial displacement adjusting device can act on the end surface of the optical fiber, can also act on the surface to be measured, or simultaneously acts on the end surface and the surface to be measured;
as a preferred embodiment of the present invention, the lateral displacement modulation device implements lateral displacement between the optical fiber reflection end surface and the surface to be measured, which can be implemented by laterally moving the optical fiber reflection end surface or the surface to be measured;
as a preferred embodiment of the present invention, the data processing module extracts the phase difference between the two signals, and generates an electrical signal to modulate the lateral displacement modulation device and the axial displacement modulation device;
a measuring method of a measuring device for measuring surface topography with adjustable measuring range based on dual wavelengths comprises the following steps:
the double-wavelength light emitted by the double-wavelength light source respectively interferes in the FP interferometer, the interference light is divided into two paths of optical signals by the wavelength division multiplexer, and the two paths of optical signals are converted into two paths of electric signals by the photoelectric detector, which can be expressed as
Wherein,
and
is the initial phase of two interference signals, a 1 And a 2 Is the DC component of the interference signal, b 1 And b 2 Is the alternating flow of interference signals, beta is the phase difference of two paths of signals, theta s N is the refractive index of the optical medium, Δ λ is the difference of the wavelengths of light generated by the light source, and the cavity length L is obtained 0 The change of delta l and the corresponding change of phase difference delta beta occur, and the relationship between the two is as follows
The data processing module transmits a modulation signal to the axial displacement modulation device to enable the FP cavity length to generate an amplitude larger than lambda/8, namely theta s Greater than pi/2. Calculating two paths of signals V by using ellipse fitting algorithm 1 And V 2 The phase difference therebetween.
Step two, the data processing module transmits a modulation signal to the transverse displacement modulator to enable the surface to be measured to do transverse motion along a certain direction, and the data processing module calculates and outputs the phase difference value beta measured in the process n And is denoted as (. beta.) n ,T n )；
Step three, the data processing module transmits another modulation signal to the axial displacement modulator to change the FP cavity length, so that the phase difference corresponding to the measurement starting point of the surface to be measured is (0, pi), and the phase difference can be pi/2 or approach to 0 or approach to pi;
step four, if (beta) n ,T n ) If the variation range of the retardation value exceeds pi, the wavelength difference value delta lambda is reduced to (beta) n ,T n ) The variation range of the phase difference is smaller than and tends to pi, when (beta) n ,T n ) If the range of variation of retardation value in (1) is too small, the wavelength difference Δ λ is increased to (β) n ,T n ) The variation range of the phase difference is smaller than and tends to pi;
step five, according to the finally obtained (beta) n ,T n ) Calculating the corresponding curve (l) of the surface topography to be measured according to the formula (2) n ,T n )；
Compared with the prior art, the invention has the beneficial effects that:
1. the invention realizes the adjustment of the surface appearance measuring range by adjusting the wavelength difference of dual-wavelength light, and avoids the influence of the phase difference value range limitation on the surface appearance measuring range;
2. the invention realizes the adjustment of the surface appearance range by adjusting the wavelength difference of dual-wavelength light, so that the measuring system has the functions of high measuring resolution and large measuring range.
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In order to facilitate understanding for those skilled in the art, the present invention will be further described with reference to the accompanying drawings.
FIG. 1 is a schematic structural diagram of a dual-wavelength-based adjustable-range surface topography measurement apparatus according to the present invention;
FIG. 2 is a phase difference curve (. beta.) of "convex" shape n ,T n ) A schematic diagram;
FIG. 3 is a phase difference curve (. beta.) of a "concave" shape n ,T n ) A schematic diagram;
FIG. 4 is a phase difference curve (β) between convex and concave n ,T n ) A schematic diagram;
fig. 5 is a schematic diagram of a relationship between a wavelength difference and a phase difference value range of the same surface to be measured.
Detailed Description
The technical solutions of the present invention will be described clearly and completely with reference to the following embodiments, and it should be understood that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
Referring to fig. 1-5, a dual wavelength based device for measuring surface topography with adjustable measurement range; referring to fig. 1, the embodiment discloses a dual-wavelength-based range-adjustable surface topography measurement device, the device includes a dual-wavelength light source 1, an optical fiber coupler 2, an optical fiber 3, an optical fiber reflection end surface 11, a surface to be measured 10, a first axial displacement modulator 9, a second axial displacement modulator 12, a transverse displacement modulator 8, a wavelength division multiplexer 4, a photoelectric detector 5, a signal cable 7 and a data processing module 6, and the working method of the topography measurement device sequentially includes:
1) the cutting angle of the optical fiber end face tends to 0 degree, so that the optical fiber reflecting end face 11 and the surface to be measured 10 form an FP interferometer.
2) Using a wavelength of λ 1 And λ 2 The two narrow linewidth lasers are used as light sources, light with two wavelengths emitted by the light sources is injected into the FP interferometer through the optical fiber coupler 2, the generated interference light is injected into the wavelength division multiplexer 4 through the optical fiber coupler 2, and the wavelength lambda is split 1 And λ 2 Two corresponding beams of interference light are respectively injected into the photoelectric detectors 5 and converted into two paths of electric signals, and the number of the photoelectric detectors 5 is two;
3) the data processing module 6 sends a modulation signal to the second axial displacement modulator 12, so that the reflecting end face of the optical fiber has the frequency of 1kHz and the amplitude of lambda along the axial direction of the optical fiber 2 Vibration of/8 (selected wavelength lambda) 1 Less than λ 2 ) And the data processing module 6 extracts the phase difference between the two paths of electric signals.
Two electrical signals, which can be expressed as
Wherein,
and
is the initial phase of two interference signals, a 1 And a 2 Is the DC component of the interference signal, b 1 And b 2 Is the alternating flow of interference signals, beta is the phase difference of two paths of signals, theta s Is derived from the displacement generated by the axial displacement modulator 1, n is the refractive index of the optical medium, Δ λ is the difference of the wavelengths of light generated by the light source, when the cavity length L 0 The change of delta l and the corresponding change of phase difference delta beta occur, and the relationship between the two is as follows
The data processing module 6 calculates two paths of signals V by utilizing an ellipse fitting algorithm 1 And V 2 The phase difference therebetween.
4) The data processing module 6 sends a modulation signal to the lateral displacement modulation device to enable the surface to be measured to move leftwards, and the moving speed and time are set to realize that the surface to be measured moves for a certain distance at a constant speed. Because the surface to be measured has convex-concave distribution, the length of the FP cavity formed by the upper reflecting surface and the reflecting end surface of the optical fiber is modulated, and the data processing module 6 calculates the phase difference value formed in the time period and records the phase difference value as (beta) n ,T n ) The index n indicates the number of phase difference values output during this period.
5) Analysis of the measured phase difference Curve (. beta.) n ,T n ) Judgment of beta n The range of variation of (d) is related to pi. When beta is n Is greater than pi, beta is caused to be smaller by reducing the wavelength difference delta lambda according to equation (5) n The variation range of (a) is smaller than and tends to pi; when beta is n Is much smaller than pi, beta is made to be larger by increasing the wavelength difference delta lambda according to equation (5) n Is less than and tends towards pi.
If the optical wavelengths generated by the dual-wavelength light source 1 are 1550nm and 1570nm respectively, the delta lambda is 20nm, and the fluctuation range of the surface to be measured is 10 μm, the variation range of the generated phase difference is 1.0456rad (59.9 degrees); when the optical wavelength is 1550nm and 1590nm, Δ λ is 40nm, and the fluctuation range of the surface to be measured is 10 μm, the variation range of the generated phase difference is 2.0911rad (119.9 °), as shown in fig. 5.
6) Analysis of the measured phase difference Curve (. beta.) n ,T n ) It is divided into a concave shape, a convex shape or a concave-convex shape. Curve when (beta) n ,T n ) Is concave and transmits direct current to the axial displacement modulation device I (9) through the data processing module 6The amplitude of the pressure signal is adjusted to make the phase difference of the starting point approach pi; curve when (beta) n ,T n ) The signal is in a convex shape, and transmits a direct current voltage signal to a first axial displacement regulating device (9) through a data processing module 6 to regulate the amplitude of the direct current voltage signal so that the phase difference beta of a starting point is enabled 0 Is approximately 0 rad; curve when (beta) n ,T n ) For the shape of concave-convex interphase, a direct current voltage signal is transmitted to a first axial displacement modulation device (9) through a data processing module 6, the amplitude of the direct current voltage signal is adjusted, and the phase difference beta of a starting point is enabled to be 0 Is any value between (0, pi) and can be pi/2 to ensure the phase difference curve (beta) n ,T n ) Upper phase difference beta n The median of (a) approaches pi/2 rad;
7) according to the obtained curve (. beta.) n ,T n ) And calculating a corresponding curve (l) of the surface topography to be measured according to the formula (4) n ,T n )。l n Is expressed as
The preferred embodiments of the invention disclosed above are intended to be illustrative only. The preferred embodiments are not intended to be exhaustive or to limit the invention to the precise forms disclosed. Obviously, many modifications and variations are possible in light of the above teaching. The embodiments were chosen and described in order to best explain the principles of the invention and the practical application, to thereby enable others skilled in the art to best utilize the invention. The invention is limited only by the claims and their full scope and equivalents.
Claims (5)
1. A measuring range-adjustable surface topography measuring device based on dual wavelengths comprises a dual-wavelength light source (1), an optical fiber coupler (2), an optical fiber (3), an optical fiber reflecting end face (11), a surface to be measured (10), an axial displacement modulation device, a transverse displacement modulation device, a wavelength division multiplexer (4), a photoelectric detector (5) and a data processing module (6); the optical fiber reflecting end face (11) and the surface to be measured (10) form an FP interferometer; the dual-wavelength optical source is characterized in that the dual-wavelength optical source (1) is used for emitting a dual-wavelength light beam to the optical fiber coupler (2), the optical fiber coupler (2) is connected with the wavelength division multiplexer (4) through an optical fiber (3), and output light of the FP interferometer is injected into the wavelength division multiplexer (4) through the optical fiber coupler (2); the wavelength division multiplexer (4) is used for injecting the two received beams of light into the photoelectric detector (5) and the two split beams of light, and the photoelectric detector (5) is used for converting the two beams of light into two paths of electric signals and transmitting the two paths of electric signals to the data processing module (6); the data processing module (6) is used for extracting the phase difference between the two paths of electric signals and representing the cavity length change of the FP interferometer through the change of the phase difference;
the data processing module (6) is respectively connected with the axial displacement modulation device and the transverse displacement modulation device through signal cables (7); the transverse displacement modulation device enables the optical fiber reflecting end face and the surface to be measured to generate transverse displacement.
2. The dual-wavelength-based tunable range surface topography measurement device according to claim 1, wherein the dual-wavelength light source (1) emits a dual-wavelength light beam containing two wavelengths, and the dual-wavelength light source (1) is two light sources generating a single wavelength or a single light source generating two wavelengths.
3. The dual wavelength based tunable range surface topography measurement device as claimed in claim 1, wherein said lateral displacement modulation means is a lateral displacement modulator (8) and said axial displacement modulation means comprises a first axial displacement modulator (9) and a second axial displacement modulator (12).
4. The dual wavelength based tunable range surface topography measurement device according to claim 1, wherein said data processing module (6) is further adapted to generate electrical signals for modulating the lateral displacement modulation means and the axial displacement modulation means.
5. The dual-wavelength range-adjustable surface topography measuring device according to any of the claims 1-4, characterized in that the measuring method of the device comprises the following steps:
the method comprises the following steps: dual wavelength light source (1) sends dual wavelength light beam and takes place to interfere respectively at the FP interferometer, and interference light divides into two light signal through wavelength division multiplexer (4), forms two way electrical signals through photoelectric detector (5) conversion, specifically does:
wherein,
and
is the initial phase of two interference signals, a 1 And a 2 Is the DC component of the interference signal, b 1 And b 2 Is the alternating flow of interference signals, beta is the phase difference of two paths of signals, theta s N is the refractive index of the optical medium, Δ λ is the difference of the wavelengths of light generated by the light source, and the cavity length L is obtained 0 The change of delta l occurs, and the corresponding change of the phase difference delta beta occurs, and the relation between the two is as follows: Δ l ═ Δ β/4 π;
the data processing module (6) transmits a modulation signal to the axial displacement modulation device to enable the FP cavity length to generate an amplitude larger than lambda/8, namely theta s Greater than pi/2, and calculating two paths of electric signals V by using ellipse fitting algorithm 1 And V 2 A phase difference therebetween;
step two: the data processing module (6) transmits a modulation signal to the transverse displacement modulation device to enable the surface to be measured to do transverse motion along a certain direction, and the data processing module (6) calculates and outputs the phase difference value beta measured in the process n And is denoted as (. beta.) n ,T n )；
Step three: the data processing module (6) transmits another modulation signal to the axial displacement modulation device to change the FP cavity length, so that the phase difference corresponding to the measurement starting point of the surface to be measured is any value within the range of (0, pi);
step four: if (beta) n ,T n ) If the variation range of the retardation value exceeds pi, the wavelength difference value delta lambda is reduced to (beta) n ,T n ) The variation range of the phase difference is smaller than and tends to pi, when (beta) n ,T n ) If the range of variation of retardation value in (1) is too small, the wavelength difference Δ λ is increased to (β) n ,T n ) The variation range of the phase difference is smaller than and tends to pi;
step five: according to the finally obtained (. beta.) n ,T n ) Calculating corresponding to the surface topography curve to be measured (l) from delta l to delta beta/4 pi n ,T n )。
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| CN116222802A (en) * | 2023-05-06 | 2023-06-06 | 深圳市中图仪器股份有限公司 | Measuring method and measuring device for central wavelength of light source |
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