CN116222415B - Surface morphology measuring device and method based on single wavelength-double FP cavity - Google Patents
Surface morphology measuring device and method based on single wavelength-double FP cavity Download PDFInfo
- Publication number
- CN116222415B CN116222415B CN202211556550.2A CN202211556550A CN116222415B CN 116222415 B CN116222415 B CN 116222415B CN 202211556550 A CN202211556550 A CN 202211556550A CN 116222415 B CN116222415 B CN 116222415B
- Authority
- CN
- China
- Prior art keywords
- optical fiber
- fiber coupler
- processing module
- data processing
- displacement modulator
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000000034 method Methods 0.000 title abstract description 22
- 239000013307 optical fiber Substances 0.000 claims abstract description 73
- 238000006073 displacement reaction Methods 0.000 claims abstract description 56
- 238000012545 processing Methods 0.000 claims abstract description 40
- 238000005259 measurement Methods 0.000 claims abstract description 34
- 230000033001 locomotion Effects 0.000 claims description 8
- 230000005540 biological transmission Effects 0.000 claims description 6
- 238000012876 topography Methods 0.000 claims description 6
- 239000000284 extract Substances 0.000 abstract description 2
- 238000011084 recovery Methods 0.000 description 11
- 230000003287 optical effect Effects 0.000 description 10
- 239000000835 fiber Substances 0.000 description 5
- 235000012431 wafers Nutrition 0.000 description 5
- 238000005516 engineering process Methods 0.000 description 4
- 238000001514 detection method Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 238000009826 distribution Methods 0.000 description 3
- 239000000523 sample Substances 0.000 description 3
- 101100001677 Emericella variicolor andL gene Proteins 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 238000005305 interferometry Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000000691 measurement method Methods 0.000 description 2
- 238000005411 Van der Waals force Methods 0.000 description 1
- 238000012512 characterization method Methods 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000009977 dual effect Effects 0.000 description 1
- 230000036039 immunity Effects 0.000 description 1
- 238000011031 large-scale manufacturing process Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000005457 optimization Methods 0.000 description 1
- 230000010363 phase shift Effects 0.000 description 1
- 238000001259 photo etching Methods 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E30/00—Energy generation of nuclear origin
- Y02E30/10—Nuclear fusion reactors
Abstract
The invention discloses a surface morphology measuring device and a surface morphology measuring method based on single wavelength-double FP cavities, and relates to the field of surface morphology measurement. The single-wavelength light is respectively input into two FP interferometers through the optical fiber coupler 1, the two interference light paths are injected into the photoelectric detector and converted into two electric signals, and the data processing module extracts the phase difference between the electric signals; the two FP interferometers are formed by two optical fiber reflecting end surfaces and a reference surface and a surface to be measured respectively, the transverse space positions of the reflecting end surfaces and the reference surface are fixed, the other optical fiber reflecting end surface and the surface to be measured are enabled to generate relative transverse displacement, the cavity length of the formed FP interferometer is modulated by the shape of the surface to be measured, the modulation quantity is represented by the change of a phase difference, and the shape of the surface to be measured is further represented by the change of the phase difference.
Description
Technical Field
The invention relates to the field of surface morphology measurement, in particular to a surface morphology measurement device and a surface morphology measurement method based on a single wavelength-dual FP cavity.
Background
The development of society needs to acquire external information in multiple fields and high depth, and demands are made on various sensing technologies. Optical sensing, and in particular optical interference sensing, has received attention for its high sensitivity, immunity to electromagnetic interference and wide applicability. The current information technology has higher and higher performance requirements for electronic products and optical mirrors, which puts higher demands on the quality of wafers, which are raw materials of semiconductor integrated circuits. The degree of warpage of the wafer directly influences the yield of processes such as photoetching, wafer bonding and the like in the subsequent production process. Currently, methods for measuring wafer warpage are generally classified into an electron microscope method, an optical interferometry method and a mechanical probe method.
The electron microscope method uses a scanning electron microscope as a means to detect the surface morphology state. The method has high measurement accuracy, but the device has high price, has high requirements on measurement environment, and is not beneficial to large-scale production and application. The mechanical probe method is represented by an atomic force microscope, and the principle is that the surface characteristics of a sample to be measured are presented by utilizing Van der Waals force action among atoms, and the measuring efficiency is low and the surface of a wafer to be measured is damaged in a point-by-point measuring and data fitting mode. The optical phase-shift interferometry combines optical and electronic techniques, and has the defects of small measurement dynamic range, poor universality, high manufacturing cost of the device and the like.
Therefore, how to remedy the defects of the method, meet the requirements of high precision and low cost, improve the measurement efficiency, expand the measurement dynamic range and reduce the requirements of measurement on the environment are problems to be solved by the technicians in the field.
The optical interference signal phase difference measurement technology uses the phase difference change between interference signals to characterize the optical path change in the interferometer, such as measuring the FP interferometer cavity length change, which is mostly obtained by using the phase difference change between interference spectrum signals. And constructing an FP interferometer by using the surface to be measured and a certain reference surface, and modulating the cavity length of the FP interferometer according to the convex-concave distribution of the surface to be measured, wherein the appearance (convex-concave distribution) of the surface to be measured can be represented by the cavity length change of the FP interferometer.
The ellipse fitting algorithm can be used for solving the phase difference between time-domain interference signals, but the operation faces the limitation of the phase difference value range (0, pi) and the failure of the small-phase signal. The problem that the small-phase signal cannot work can be effectively avoided by loading cavity length modulation with a certain amplitude in the two FP interferometers; the existing literature proposes a phase compensation and recovery technology to avoid the limitation of the phase difference value range (0, pi), but the processing process is complex, and the problem that the phase difference can not be compensated due to large jump of a single step length is faced, so that the application of using an EFA algorithm to calculate the phase difference in the surface topography measurement to be measured is limited.
The surface topography measurement based on the dual wavelength-single FP cavity disclosed in patent application publication No. CN114894120a uses an ellipse fitting algorithm to calculate the phase difference of two interference signals, and for large-range measurement, by changing the wavelength difference to limit the change amount of the phase difference within the range of value, various measurement ranges are realized, and the limitation of the phase difference range (0, pi) is avoided. However, the above patent has limitation of detection resolution, and the measurement accuracy and resolution are limited, so that the requirements of submicron to nanometer detection cannot be met, and the detection accuracy and resolution accuracy are low.
Disclosure of Invention
The invention aims to solve the problems, and provides a surface morphology measuring device and a measuring method based on a single wavelength-dual FP cavity, which can realize the measurement resolution optimization of a measuring system. The aim of the invention can be achieved by the following technical scheme.
The surface morphology measuring device based on the single wavelength-double FP cavity comprises a single wavelength light source, an optical fiber coupler 1, an optical fiber coupler 2, an optical fiber coupler 3, an optical fiber, a fixed beam, an optical fiber reflecting end surface, a reference surface, a surface to be measured, an axial displacement modulator 1, an axial displacement modulator 2, a transverse displacement modulator, a photoelectric detector, a cable and a data processing module; the optical fiber reflecting end face and the surface to be measured form a measurement FP interferometer, and the optical fiber reflecting end face and the reference surface form a reference FP interferometer; the two output ends of the optical fiber coupler 1 are respectively connected with the optical fiber coupler 2 and the optical fiber coupler 3; light generated by the single-wavelength light source is split into two beams of light through the optical fiber coupler 1, the two beams of light are respectively input into the measurement FP interferometer and the reference FP interferometer through the optical fiber coupler 2 and the optical fiber coupler 3, and two paths of interference signals formed by the two beams of light are reversely injected into the photoelectric detector through the optical fiber coupler 2 and the optical fiber coupler 3; the photoelectric detector is used for converting two beams of interference light into two paths of electric signals and transmitting the two paths of electric signals to the data processing module; the data processing module is respectively connected with the axial displacement modulator 2, the axial displacement modulator 1 and the transverse displacement modulator through signal cables.
Preferably, the single-wavelength light source adopts a single-wavelength narrow linewidth laser for outputting single-wavelength light.
Preferably, the data processing module is used for extracting the phase difference between the two paths of electric signals and representing the cavity length change of the FP interferometer through the change of the phase difference.
Preferably, the data processing module outputs a modulation signal to the axial displacement modulator 1; the axial displacement modulator 1 drives the reference surface and the surface to be measured to reciprocate with the same amplitude along the transmission direction of the light beam.
Preferably, the frequency of the reciprocating motion is 1kHz and the amplitude is 1/8 times of the wavelength of the single-wavelength light source.
Preferably, the data processing module outputs a modulation signal to the lateral displacement modulator; the transverse displacement modulator drives the surface to be measured, so that the optical fiber reflecting end surface and the surface to be measured are transversely displaced at a uniform speed.
Preferably, the data processing module outputs a modulation signal to the axial displacement modulator 2; the axial displacement modulator 2 outputs a direct-current voltage signal to drive the optical fiber reflection end face to move along the transmission direction of the light beam.
Preferably, a surface topography measurement method based on a single wavelength-dual FP cavity is adopted, comprising the following steps:
step one: the single-wavelength light source emits single-wavelength light beams which are respectively interfered by two FP interferometers, and two paths of interference light are converted into two paths of electric signals through the photoelectric detector (14), wherein the two paths of electric signals can be expressed as follows:
wherein,andfor the initial phase of the two interference signals,a 1 anda 2 for the direct-current quantity of the interference signal,b 1 andb 2 for the amount of traffic of the interference signal,is the phase difference of the two paths of signals,for the displacement of the axial displacement modulator 1 (10)L s The amount of phase that is generated in the interference signal,is the wavelength value of a single-wavelength light source (1),nfor the refractive index of the optical medium,L 1 andL 2 the initial cavity lengths of the measurement FP interferometer and the reference FP interferometer respectively,for the difference in cavity length between the two interferometers, when the initial cavity length of the FP interferometer is measuredL 1 Occurrence ofChange, the phase difference generates corresponding changeThe relation between the two is:。
the data processing module (15) transmits the modulated signal to the axial displacement modulator 1 (10) to generate a signal with a magnitude greater than that of the signalλReciprocating movement of/8, i.eMore than pi/2, and calculating two paths of electric signals by using an ellipse fitting algorithmV 1 AndV 2 phase difference between。
Step two: the data processing module (15) transmits a modulation signal to the transverse displacement modulator (12) to enable the surface (13) to be measured to do transverse uniform motion, and the data processing module (15) calculates and outputs the phase difference value measured in the process n And is also recorded as% n ,T n ）。
Step three: the data processing module (15) transmits another modulation signal to the axial displacement modulator (2) (9) to change the cavity length of the reference FP interferometer, thereby realizing the measurement starting point of the surface (13) to be measuredThe corresponding phase difference is any value in the range of (0, pi), and the baseline subtraction curve is obtained through phase recovery processing and baseline subtraction processing n ,T n ）。
Step four: according to the baseline subtraction curve obtained in the third step n ,T n ) By the following constitutionCalculating a corresponding surface topography curve to be measuredl n ,T n ）。
Compared with the prior art, the invention has the beneficial effects that.
(1) According to the invention, the single-wavelength light source is combined with the double-FP cavity structure, the appearance of the surface to be measured is represented through the phase difference of the double-FP cavity, the resolution value of surface appearance measurement can be effectively reduced, and the resolution precision of the surface appearance is greatly improved.
(2) According to the invention, the single-wavelength narrow linewidth laser is adopted as the light source, so that under the condition that the surface morphology displacement is the same, the measurement precision and the high measurement resolution of the dual-FP cavity structure in morphology measurement can be remarkably improved, namely, the linewidth of the light source generated by the single-wavelength narrow linewidth laser is narrower, and under the same displacement condition, the morphology resolution precision of phase difference characterization is higher, and the measurement resolution is higher.
Drawings
The present invention is further described below with reference to the accompanying drawings for the convenience of understanding by those skilled in the art.
Fig. 1 is a schematic structural view of the present invention.
FIG. 2 shows a "convex" phase difference curve n ,T n ) Schematic diagram.
FIG. 3 shows a concave phase difference curve n ,T n ) Schematic diagram.
FIG. 4 shows a phase difference curve of 'convex-concave' phase difference between phases n ,T n ) Schematic diagram.
Fig. 5 is a scanning graph obtained by scanning a surface to be measured by the measuring system.
Fig. 6 is a graph of phase recovery after measuring a phase close to 0rad and deflecting.
Fig. 7 is a graph of phase recovery after a measured phase is close to pi and deflection occurs.
Fig. 8 is a phase recovery graph after phase recovery of the scan curve data.
Fig. 9 is a baseline subtraction graph obtained after a baseline subtraction process is performed on a phase recovery curve.
Detailed Description
The technical solutions of the present invention will be clearly and completely described in connection with the embodiments, and it is obvious that the described embodiments are only some embodiments of the present invention, not all embodiments. All other embodiments, which can be made by those skilled in the art based on the embodiments of the invention without making any inventive effort, are intended to be within the scope of the invention.
As shown in fig. 1, a surface topography measuring device based on a single wavelength-dual FP cavity comprises a single wavelength light source (1), an optical fiber coupler 1 (2), an optical fiber coupler 2 (3), an optical fiber coupler 3 (4), an optical fiber (5), a fixed beam (6), optical fiber reflecting end surfaces (7, 8), a reference surface (11), a surface to be measured (13), an axial displacement modulator 1 (10), an axial displacement modulator 2 (9), a transverse displacement modulator (12), a photoelectric detector (14), a cable (16) and a data processing module (15); the optical fiber reflecting end face (7) and the surface to be measured (13) form a measurement FP interferometer, and the optical fiber reflecting end face (8) and the reference surface (11) form a reference FP interferometer; two output ends of the optical fiber coupler 1 (2) are respectively connected with the optical fiber coupler 2 (3) and the optical fiber coupler 3 (4); light generated by the single-wavelength light source (1) is split into two beams of light through the optical fiber coupler (1) and is input into a measurement FP interferometer and a reference FP interferometer through the optical fiber coupler (2) and the optical fiber coupler (3) and the optical fiber coupler (4) respectively, and two paths of interference signals formed by the two beams of light are reversely injected into the photoelectric detector (14) through the optical fiber coupler (2) and the optical fiber coupler (3) and the optical fiber coupler (4); the photoelectric detector (14) is used for converting two beams of interference light into two paths of electric signals and transmitting the two paths of electric signals to the data processing module (15); the data processing module (15) is respectively connected with the axial displacement modulator (2) (9), the axial displacement modulator (1) (10) and the transverse displacement modulator (12) through signal cables (16).
The single-wavelength light source (1) adopts a single-wavelength narrow linewidth laser and is used for outputting single-wavelength light. The data processing module (15) is used for extracting the phase difference between the two paths of electric signals and representing the cavity length change of the FP interferometer through the change of the phase difference. The data processing module (15) outputs a modulation signal to the axial displacement modulator 1 (10); the axial displacement modulator 1 (10) drives the reference surface (11) and the surface to be measured (13) to reciprocate with the same amplitude along the transmission direction of the light beam. The frequency of the reciprocating motion is 1kHz, and the amplitude of the reciprocating motion is 1/8 times of the wavelength of the single-wavelength light source (1).
The data processing module (15) outputs a modulation signal to the transverse displacement modulator (12); the transverse displacement modulator (12) drives the surface to be detected (13) to enable the optical fiber reflecting end face (7) and the surface to be detected (13) to transversely displace at a uniform speed. The data processing module (15) outputs a modulation signal to the axial displacement modulator 2 (9); the axial displacement modulator 2 (9) outputs a direct-current voltage signal to drive the optical fiber reflection end face to move along the light beam transmission direction. The fixed beam (6) is used for fixing the axial displacement modulator (2) (9) and preventing the optical fiber reflection end surfaces (7, 8) on two sides of the axial displacement modulator (2) (9) from moving in the longitudinal horizontal direction.
For a specific method for measuring the surface morphology by adopting the surface morphology measuring device based on the single wavelength-dual FP cavity, please refer to fig. 1-7. The surface morphology measuring device based on the single wavelength-dual FP cavity as described in fig. 1, comprises a single wavelength light source (1), an optical fiber coupler 1 (2), an optical fiber coupler 2 (3), an optical fiber coupler 3 (4), an optical fiber (5), a fixed beam (6), optical fiber reflecting end surfaces (7, 8), a reference surface (11), a surface to be measured (13), an axial displacement modulator 1 (10), an axial displacement modulator 2 (9), a transverse displacement modulator (12), a photoelectric detector (14), a cable (16) and a data processing module (15), and the working method of the morphology measuring device is as follows.
1) the cutting angle of the fiber end face tends to 0 degrees, the fiber reflection end face (7) and the surface to be measured (13) form a measurement FP interferometer, the reflection end face (8) and the reference surface (11) form a reference FP interferometer, and two output ends of the fiber coupler 1 (2) are respectively connected with the fiber coupler 2 (3) and the fiber coupler 3 (4).
2) A narrow linewidth laser with a wavelength lambda is used as a light source, the light source emits light with a single wavelength to the optical fiber coupler 1 (2), two beams of light split by the optical fiber coupler 1 (2) are respectively input into two FP interferometers through the optical fiber coupler 2 (3) and the optical fiber coupler 3 (4), two interference signals formed by the two FP interferometers are reversely injected into the photoelectric detector (14) through the optical fiber coupler 2 (3) and the optical fiber coupler 3 (4), and the photoelectric detector (14) is used for converting the two beams of light into two paths of electric signals and transmitting the two paths of electric signals to the data processing module (15).
3) The data processing module (15) sends a modulation signal to the axial displacement modulator 1 (10) to enable the frequency of the surface to be detected (13) and the reference surface (11) to be 1kHz and the amplitude to be 1kHz along the axial direction of the optical fiber 1 Vibration of/8.
4) The data processing module (15) extracts the phase difference between the two paths of electric signals. The process is as follows:
two paths of electrical signals can be expressed as:
wherein,andfor the initial phase of the two interference signals,a 1 anda 2 for the direct-current quantity of the interference signal,b 1 andb 2 for the amount of traffic of the interference signal,is the phase difference of the two paths of signals,for the displacement of the axial displacement modulator 1 (10)L s The amount of phase that is generated in the interference signal,is the wavelength value of a single-wavelength light source (1),nfor the refractive index of the optical medium,L 1 andL 2 the initial cavity lengths of the measurement FP interferometer and the reference FP interferometer respectively,for the difference in cavity length between the two interferometers, when the initial cavity length of the FP interferometer is measuredL 1 Occurrence ofChange, the phase difference generates corresponding changeThe relation between the two is:。
the data processing module (15) calculates two paths of signals by using an ellipse fitting algorithmV 1 AndV 2 phase difference between。
5) The data processing module (15) sends a modulation signal to the transverse displacement modulator (12) to enable the surface to be detected (13) to move leftwards, and the moving speed and the moving time are set to achieve uniform-speed movement of the surface to be detected for a certain distance. Because the surface to be measured (13) has convex-concave distribution, the cavity length of the measurement FP cavity formed by the upper reflecting surface and the optical fiber reflecting end surface is modulated, and the data processing module (15) calculates the phase difference value formed in the time period and records as [ ] n ,T n ) The subscript n indicates the number of phase difference values output during this period. The reference surface (11) does not move transversely while the surface (13) to be measured moves transversely, so that the cavity length difference change of the two interferometers is ensured to be caused by the cavity length change of the measurement interferometer.
6) Analyzing the measured phase difference curve n ,T n ) It is divided into a concave shape, a convex shape or a concave-convex shape.
When the curve is% n ,T n ) In the shape of a concave, see fig. 2, a data processing module (15) transmits a direct-current voltage signal to the axial displacement modulator 2 (9), and the amplitude of the direct-current voltage signal is adjusted to enable the phase difference of the starting point to be approximate to pi.
When the curve is% n ,T n ) In a convex shape, see fig. 3, a data processing module (15) transmits a direct-current voltage signal to an axial displacement modulator 2 (9) to adjust the amplitude of the direct-current voltage signal so as to enable the initial point to be out of phase 0 Approaching 0 rad.
When the curve is% n ,T n ) In the form of 'concave-convex' phase, see fig. 4, a data processing module (15) transmits a direct-current voltage signal to an axial displacement modulator 2 (9) to adjust the amplitude of the direct-current voltage signal so as to enable the initial point to have a phase difference 0 Is any value between (0, pi) and pi/2 to ensure the phase difference curve # n ,T n ) Upper phase difference value n Is close to pi/2.
7) According to the measurement, a scanning curve as shown in fig. 5 is obtained, and phase recovery processing is performed on the scanning curve, wherein the phase recovery processing method comprises the following steps: when the measured phase is close to 0rad and deflection occurs, the data is recovered n =0- n See fig. 6; when the measured phase is close to pi and deflection occurs, the data is recovered n =2π— n See fig. 7. Finally, the phase recovery curve shown in figure 8 is obtained n ,T n ) The method comprises the steps of carrying out a first treatment on the surface of the The phase recovery curve was subjected to a baseline subtraction process to obtain a baseline subtraction curve as shown in fig. 9.
8) According to the obtained baseline subtraction curve n ,T n ) Calculating a curve corresponding to the surface morphology to be measured according to the formula (4)l n ,T n ）。l n The expression of (2) is:
the preferred embodiments of the invention disclosed above are intended only to assist in the explanation of the invention. The preferred embodiments are not intended to be exhaustive or to limit the invention to the precise form disclosed. Obviously, many modifications and variations are possible in light of the above teaching. The embodiments were chosen and described in order to best explain the principles of the invention and the practical application, to thereby enable others skilled in the art to best understand and utilize the invention. The invention is limited only by the claims and the full scope and equivalents thereof.
Claims (2)
1. A surface morphology measuring device based on single wavelength-two FP chambeies, its characterized in that: the optical fiber sensor comprises a single-wavelength light source (1), an optical fiber coupler 1 (2), an optical fiber coupler 2 (3), an optical fiber coupler 3 (4), an optical fiber (5), a fixed beam (6), optical fiber reflecting end surfaces (7 and 8), a reference surface (11), a surface to be measured (13), an axial displacement modulator 1 (10), an axial displacement modulator 2 (9), a transverse displacement modulator (12), a photoelectric detector (14), a cable (16) and a data processing module (15); the optical fiber reflecting end face (7) and the surface to be measured (13) form a measurement FP interferometer; the optical fiber reflection end face (8) and the reference face (11) form a reference FP interferometer, and the single-wavelength light source (1) adopts a single-wavelength narrow linewidth laser; the data processing module (15) is used for extracting the phase difference between the two paths of electric signals and representing the cavity length change of the FP interferometer through the change of the phase difference; the data processing module (15) outputs a modulation signal to the axial displacement modulator 1 (10); the axial displacement modulator 1 (10) drives the reference surface (11) and the surface to be detected (13) to do reciprocating motion with the same amplitude along the transmission direction of the light beam; the data processing module (15) outputs a modulation signal to the transverse displacement modulator (12); the transverse displacement modulator (12) drives the surface to be detected (13) to enable the optical fiber reflecting end face (7) and the surface to be detected (13) to transversely displace at a uniform speed; the data processing module (15) outputs a modulation signal to the axial displacement modulator 2 (9); the axial displacement modulator 2 (9) outputs a direct-current voltage signal to drive the optical fiber reflecting end face (8) to move along the light beam transmission direction; two output ends of the optical fiber coupler 1 (2) are respectively connected with the optical fiber coupler 2 (3) and the optical fiber coupler 3 (4); light generated by the single-wavelength light source (1) is split into two beams of light through the optical fiber coupler (1) and is input into a measurement FP interferometer and a reference FP interferometer through the optical fiber coupler (2) and the optical fiber coupler (3) and the optical fiber coupler (4) respectively, and two paths of interference signals formed by the two beams of light are reversely injected into the photoelectric detector (14) through the optical fiber coupler (2) and the optical fiber coupler (3) and the optical fiber coupler (4); the photoelectric detector (14) is used for converting two beams of interference light into two paths of electric signals and transmitting the two paths of electric signals to the data processing module (15); the data processing module (15) is connected with the axial displacement modulator (2) (9), the axial displacement modulator (1) (10) and the transverse displacement modulator (12) through cables (16) respectively.
2. A surface topography measuring device based on a single wavelength-dual FP cavity according to claim 1, wherein the reciprocating motion has a frequency of 1kHz and an amplitude of 1/8 times the wavelength of the single wavelength light source (1).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202211556550.2A CN116222415B (en) | 2022-12-06 | 2022-12-06 | Surface morphology measuring device and method based on single wavelength-double FP cavity |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202211556550.2A CN116222415B (en) | 2022-12-06 | 2022-12-06 | Surface morphology measuring device and method based on single wavelength-double FP cavity |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN116222415A CN116222415A (en) | 2023-06-06 |
| CN116222415B true CN116222415B (en) | 2023-11-28 |
Family
ID=86573792
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202211556550.2A Active CN116222415B (en) | 2022-12-06 | 2022-12-06 | Surface morphology measuring device and method based on single wavelength-double FP cavity |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN116222415B (en) |
Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1201901A (en) * | 1998-03-20 | 1998-12-16 | 清华大学 | Wave-length scanning and interfering system and signal process method therefor |
| CN104677296A (en) * | 2015-03-09 | 2015-06-03 | 北京交通大学 | System for measurement of displacement through self-mixing interference fusion of beat waves and single waves of fiber laser |
| CN107014412A (en) * | 2017-04-17 | 2017-08-04 | 北京理工大学 | A kind of fiber-sensing measuring method and device of dual interferometer matching demodulation |
| CN112197849A (en) * | 2020-09-18 | 2021-01-08 | 华中科技大学 | Sound wave measuring system and method |
| CN113091882A (en) * | 2021-04-20 | 2021-07-09 | 安徽大学 | Double-cavity device for detecting membrane surface vibration and demodulation method thereof |
| CN114894120A (en) * | 2022-05-26 | 2022-08-12 | 安徽大学 | Dual-wavelength-based measuring range-adjustable surface topography measuring device and measuring method |
| CN115371587A (en) * | 2022-08-24 | 2022-11-22 | 智慧星空(上海)工程技术有限公司 | Surface topography measuring device and method and object surface height calculating method |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2012132665A1 (en) * | 2011-03-30 | 2012-10-04 | 株式会社フジクラ | Phase shift interferometer |
-
2022
- 2022-12-06 CN CN202211556550.2A patent/CN116222415B/en active Active
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1201901A (en) * | 1998-03-20 | 1998-12-16 | 清华大学 | Wave-length scanning and interfering system and signal process method therefor |
| CN104677296A (en) * | 2015-03-09 | 2015-06-03 | 北京交通大学 | System for measurement of displacement through self-mixing interference fusion of beat waves and single waves of fiber laser |
| CN107014412A (en) * | 2017-04-17 | 2017-08-04 | 北京理工大学 | A kind of fiber-sensing measuring method and device of dual interferometer matching demodulation |
| CN112197849A (en) * | 2020-09-18 | 2021-01-08 | 华中科技大学 | Sound wave measuring system and method |
| CN113091882A (en) * | 2021-04-20 | 2021-07-09 | 安徽大学 | Double-cavity device for detecting membrane surface vibration and demodulation method thereof |
| CN114894120A (en) * | 2022-05-26 | 2022-08-12 | 安徽大学 | Dual-wavelength-based measuring range-adjustable surface topography measuring device and measuring method |
| CN115371587A (en) * | 2022-08-24 | 2022-11-22 | 智慧星空(上海)工程技术有限公司 | Surface topography measuring device and method and object surface height calculating method |
Also Published As
| Publication number | Publication date |
|---|---|
| CN116222415A (en) | 2023-06-06 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN114894120B (en) | Dual-wavelength-based measurement range-adjustable surface morphology measurement device and measurement method | |
| CN106289068B (en) | A kind of two degrees of freedom heterodyne grating interferometer displacement measurement method | |
| US6753969B2 (en) | Microinterferometer for measuring distance with improved sensitivity | |
| CN102353327A (en) | Double-frequency laser raster interference measuring method and measuring system thereof | |
| WO2018014325A1 (en) | Phase modulation-based dual-laser single-frequency interferometric nanometer displacement measurement device and method | |
| WO2021082707A1 (en) | Nonlinear error correction method for optical fiber michelson interferometer | |
| GB2493585A (en) | Scanning probe microscopy cantilever comprising an electromagnetic sensor | |
| CN109029265A (en) | A kind of high-precision micro displacement measurement method and system based on spatial light modulator | |
| CN104655025A (en) | Laser interferometric wavelength lever-type absolute distance measurement method and device | |
| Sun et al. | Application of contact laser interferometry in precise displacement measurement | |
| CN116222415B (en) | Surface morphology measuring device and method based on single wavelength-double FP cavity | |
| US5394240A (en) | High-accuracy air refractometer utilizing two nonlinear optical crystal producing 1st and 2nd second-harmonic-waves | |
| CN104330147A (en) | Micro-cantilever thermal shock signal measuring apparatus | |
| CN112097680B (en) | Surface topography testing device and testing method based on multi-cavity FP interferometer | |
| KR20120004578A (en) | Apparatus of measuring nanometric displacement and surface profile using fiber-optic fizeau interferometer | |
| CN110879040B (en) | Displacement measurement method of Michelson heterodyne interferometer based on double acousto-optic modulator | |
| CN201548201U (en) | Vibration-resistant dynamic interferometer | |
| CN101706253B (en) | Filtering phase discriminator type dynamic interferometry system | |
| CN112304225B (en) | Symmetrical semiconductor laser self-mixing grating interference three-dimensional displacement measurement system and measurement method thereof | |
| CN1147702C (en) | All-optical fiber and large range displacement measurer | |
| Chow et al. | A Low-Cost Submicrolinear Incremental Encoder Based on 3$\times $3 Fiber-Optic Directional Coupler | |
| Cheng et al. | Intensity modulation of VCSELs under feedback with two reflectors and self-mixing interferometer | |
| CN1641318A (en) | Optical fiber sensor based on laser feedback | |
| CN116045817B (en) | Micro-displacement measuring device and method based on photoelectric oscillator | |
| Yang et al. | Traceable atomic force microscope based on monochromatic light interference |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant |