CN114839145A - Laser damage analysis test instrument - Google Patents
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- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/01—Arrangements or apparatus for facilitating the optical investigation
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- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
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Abstract
A laser damage analysis test instrument that combines ultraviolet laser spectroscopy and image recognition, comprising: the device comprises a working wavelength laser light source, an ultraviolet laser light source, a sample table, a side optical imaging module and a spectral analysis detector. In the invention, the sample is subjected to damage test by using the working wavelength laser, fine imaging analysis and spectral analysis are carried out in situ by using the coaxial ultraviolet laser, and refraction, scattering, component uniformity, defects, damage conditions and the like of the sample can be comprehensively collected by using optical signals generated by the working wavelength laser and the ultraviolet laser in a sample test area, so that the rapid detection of laser damage, the accurate positioning of the damage area, the differentiation of the damage type and the analysis of the damage cause are realized.
Description
Technical Field
The invention relates to the technical field of material performance testing, in particular to a laser damage analysis testing instrument combining ultraviolet laser spectrum analysis and image recognition.
Background
Laser light often has extremely high energy density, which is a significant difference from conventional light sources and a prerequisite for its application in many fields, such as nonlinear optics, laser synthesis, laser machining. Along with the improvement of laser energy density or power density, laser equipment inevitably encounters the problem that laser damages optical devices and optical materials, so that the laser damage resistance of the optical devices and the optical materials is required to be mastered, and a reliable reference is provided for the design and use of the laser. The laser damage analysis test is developed for judging the laser damage resistance of the optical device and the optical material, and a series of test standards are established to objectively evaluate the laser damage resistance of the optical device and the optical material.
In a conventional laser damage test, statistical analysis is usually required according to multiple test data, but the test result is often greatly disturbed in discreteness, or results given by different measurement laboratories have great differences, which is caused by different causes of laser damage. The causes of laser damage are quite complex, optical processing defects, material internal defects, composition non-uniformity, photorefractive, photoionization and the like can cause laser damage to optical devices and optical materials, and the types of damage caused by different laser energies or frequencies are completely different. In the conventional laser damage test, an analysis test is performed with few damage causes.
Therefore, how to analyze the laser damage and further rapidly determine the laser damage area and process becomes a technical problem to be solved in the prior art.
Disclosure of Invention
The invention aims to provide a laser damage analysis and measurement instrument, which combines working wavelength laser with ultraviolet laser, can accurately determine a laser damage area and master a laser damage process through in-situ high-resolution optical image analysis and related optical signal analysis when performing laser damage test on optical materials and optical devices, and further comprehensively analyzes the laser damage type and cause.
In order to achieve the purpose, the invention adopts the following technical scheme:
a laser damage analysis and measurement instrument is characterized by comprising the following components:
the device comprises a light source module, a sample table, a side optical imaging module and a spectral analysis detector;
the light source module comprises a working wavelength laser light source and an ultraviolet laser light source;
the working wavelength laser light source is used for emitting working wavelength laser to irradiate a sample and carrying out sample damage test, the working wavelength laser light source is pulse laser with high peak power, and the working wavelength, the pulse width, the peak power, the single pulse energy and/or the repetition frequency of the working wavelength laser light source are/is selected according to the test requirement;
the ultraviolet laser light source emits ultraviolet laser with the wavelength of 200-360 nm for spectral analysis;
the working wavelength laser and the ultraviolet laser emitted by the working wavelength laser source keep coaxial propagation with the working wavelength laser after passing through the reflector;
the working wavelength laser detector is used for measuring the energy, the pulse width and the beam distribution of the working wavelength laser in real time so as to ensure the precision of damage testing;
the sample stage is used for bearing a sample and can move in a three-dimensional direction to select a laser damage analysis test area;
the optical monitoring detector is positioned on the other side of the optical axis path of the sample and used for collecting image information of the laser irradiation area, transmitting the image information to the information processing system and carrying out optical image analysis;
the side optical imaging module is positioned on the side surface of the sample, can move in a certain dimension so as to control the imaging area of the imaging module, has optical zoom magnification capability, and is used for collecting light scattering and spectrum information of laser passing through a light path of the sample from the side surface of the sample, transmitting the light scattering and spectrum information to an information processing system and carrying out optical image analysis;
the spectral analysis detector is positioned on the side surface of the sample and comprises at least one spectral detector for collecting spectral change information generated after the sample is irradiated by the working wavelength laser and the ultraviolet laser, wherein the spectral change information comprises spectral line distribution and intensity.
Optionally, the sample analyzer further comprises a first 45 ° reflector, located at an optical path intersection point of the working wavelength laser and the ultraviolet laser, and configured to combine the working wavelength laser and the ultraviolet laser into a coaxial beam, and inject the combined beam into the sample, and reflect a part of the working wavelength laser onto the working wavelength laser detector;
and the second 45-degree reflector is positioned on the side surface of the sample, and is arranged between the sample and the side surface optical imaging module to split the laterally emitted optical signals generated when the sample is irradiated by the working wavelength laser and the ultraviolet laser, wherein a part of the optical signals directly enter the side surface optical imaging module through the second 45-degree reflector, the rest part of the optical signals are reflected by the second 45-degree reflector to enter the spectral analysis detector, and the second 45-degree reflector can select a proper splitting ratio according to the test requirement.
Optionally, the system further comprises an information processing system for controlling the light source module, the sample stage, the side optical imaging module and the spectral analysis detector, and acquiring information obtained by the light source module, the sample stage, the side optical imaging module and the spectral analysis detector, and performing synchronous processing and comparative analysis on the acquired information and information in the database.
Optionally, an optical monitoring detector is disposed at the laser emitting end of the sample, that is, the other side on the optical axis path of the sample, and the optical monitoring detector includes an optical lens and a detector with different magnifications, and an optical filter is disposed in front of the optical monitoring detector, and the spectral response range of the optical monitoring detector is from the ultraviolet laser frequency to the near-infrared light region, and the optical monitoring detector is used for detecting laser energy, laser scattering and nonlinear optical signals to determine various changes of the sample under laser irradiation.
Optionally, the operating wavelength laser light source further includes one or more of an optical filter, an optical polarizer, a wave plate, an optical shaping lens and an adjustable diaphragm between the operating wavelength laser light source and the first 45 ° reflecting mirror, wherein the optical filter is configured to filter light other than the operating wavelength laser light, the optical polarizer and the wave plate are configured to control a polarization state of the operating wavelength laser light, the optical shaping lens is configured to shape the operating wavelength laser light to control transmission quality, energy distribution and a focal position of the laser light beam, and the adjustable diaphragm is configured to suppress stray light and control a beam shape of the transmitted operating wavelength laser light;
the ultraviolet laser light source further comprises one or more of an optical switch, a second optical filter, an optical shaping lens group and an adjustable diaphragm between the ultraviolet laser light source and the first 45-degree reflector, wherein the optical switch is used for controlling the output of ultraviolet laser light, the optical filter is used for filtering light except the ultraviolet laser light and adjusting the intensity of the ultraviolet laser light, the optical shaping lens group is used for shaping the ultraviolet laser light so as to control the transmission quality, the energy distribution and the focal position of a laser beam, and the adjustable diaphragm is used for inhibiting stray light and controlling the beam shape of the transmitted laser light.
Optionally, the average power of the ultraviolet laser is greater than 1mW, and the beam size of the ultraviolet laser is close to that of the laser with the working wavelength.
Optionally, when the first 45-degree reflector is placed at 45 degrees, the transmittance of the first 45-degree reflector to the fundamental laser is greater than 95%, the reflectance of the first 45-degree reflector to the ultraviolet laser is greater than 80%, and the fundamental laser and the ultraviolet laser are coaxially and co-directionally transmitted after passing through the first 45-degree reflector;
the second 45 degree mirror selects the appropriate splitting ratio according to the test requirements.
Optionally, the sample stage is used for carrying an optical sample used for measurement, and moves in different directions according to test requirements, the displacement resolution is better than 10 μm, and the displacement repeated positioning precision is better than 10 μm.
Optionally, the side optical imaging module is configured to perform optical image analysis, and includes an optical lens and an imaging detector with different magnifications, and accurately controls an imaging area through displacement; the side optical imaging module uses an auxiliary optical device to meet the requirement of collecting image information of a laser irradiation area, and the auxiliary optical device comprises an optical attenuation sheet, an optical filter, an optical polarization device and an adjustable diaphragm;
the spectral analysis detector is a single detector or a plurality of detectors, and the detectors comprise an optical imaging CCD detector, a silicon photoelectric detector and a photomultiplier;
an auxiliary optical device is arranged in front of each detection window of the spectrum analysis detector, and the auxiliary optical device comprises an optical attenuation sheet, an optical filter, an optical polarization device and an adjustable diaphragm.
Optionally, the information processing system can synchronously control the light source module, the sample stage, the side optical imaging module and the spectral analysis detector, and synchronously acquire information obtained by the light source module, the sample stage, the side optical imaging module and the spectral analysis detector for comprehensive analysis and processing;
the database comprises spectral information, image information and energy information, and the information processing system can be used for positioning the damage region and distinguishing the damage types and can be used for developing damage cause analysis by combining the database information.
The invention has the following advantages:
1) the laser damage analysis test is carried out by combining working wavelength laser with ultraviolet laser, and the laser damage area can be accurately determined and the laser damage process can be mastered through in-situ high-resolution optical image analysis and related optical signal analysis, so that the laser damage type and cause can be comprehensively analyzed.
2) Through the detection of the ultraviolet laser before damage, the damage test area of the sample can be selected more pertinently, and the test consistency and the accuracy of the measurement result are improved.
3) The in-situ analysis of the ultraviolet laser enables the laser damage analysis test to be more targeted, and can complete the rapid and accurate test of specific types and area objects.
4) The intelligent analysis testing technology is combined with a database, so that the laser damage testing experiment can be automatically, efficiently and accurately completed.
Drawings
Fig. 1 is a schematic view of a laser damage analysis measuring instrument according to an embodiment of the present invention.
The reference numerals in the drawings respectively refer to the technical features:
6. a sample stage; 7. a sample; 10. an operating wavelength laser; 11. an ultraviolet laser; 20. a first optical filter; 21. a wave plate; 22. a second optical filter; 23. a third optical filter; 24. a fourth optical filter; 25. a fifth optical filter; 26. a sixth optical filter; 27. a seventh optical filter; 30. a first 45 ° mirror; 31. a second 45 ° mirror; 32. a third 45 ° mirror; 33. a fourth 45 ° mirror; 40. a working wavelength laser detector; 41. a lateral optical imaging module; 42. a first spectral detector; 43. a second spectral detector; 44. a third spectral detector; 45. an optical monitoring probe; 50. an optical polarizer; 51. an optical shaping lens group.
Detailed Description
The present invention will be described in further detail with reference to the accompanying drawings and examples. It is to be understood that the specific embodiments described herein are merely illustrative of the invention and are not limiting of the invention. It should be further noted that, for the convenience of description, only some of the structures related to the present invention are shown in the drawings, not all of the structures.
The invention is characterized in that: the laser damage testing method comprises the steps of using a high-power laser operating at a working wavelength to emit laser of the working wavelength to carry out laser damage testing on a sample, enabling the working frequency, the peak power and the single pulse energy of the laser of the working wavelength to be variable, enabling the laser to be incident into the sample, using coaxial ultraviolet laser as assistance, gradually compressing pulse width, improving repetition frequency, peak power or single pulse energy until the sample is damaged, carrying out in-situ laser damage testing on the sample, analyzing various parameters of the sample before, during and after the damage testing by using spectral information, scattering signals and high-definition images of the ultraviolet laser, and efficiently and automatically completing the laser damage analysis testing on the sample through intelligent comparison and database analysis.
Specifically, referring to fig. 1, a schematic diagram of a laser damage analysis and measurement instrument according to an embodiment of the present invention is shown, including the following components:
the device comprises a light source module, a sample table, a side optical imaging module and a spectral analysis detector;
the light source module comprises a working wavelength laser light source 10 and an ultraviolet laser light source 11;
the working wavelength laser light source 10 is used for emitting working wavelength laser to irradiate a sample and carry out sample damage test, the working wavelength laser light source is pulse laser with high peak power, and the laser wavelength, the pulse width, the peak power, the single pulse energy and/or the repetition frequency are/is selected according to the test requirement;
as will be understood by those skilled in the art, the selection refers to setting the corresponding pulse width and repetition frequency according to the measurement standard requirements in the sample loss test, and adjusting the laser output energy until the sample generates optical damage, so as to perform the laser damage test of the sample.
The working wavelength refers to the wavelength of laser commonly used in the working of the sample. For example, for a nonlinear crystal, the operating wavelength is the fundamental wavelength, and for other optical materials, it may be the wavelength at which it is in the operating state.
The ultraviolet laser light source 11 emits ultraviolet laser with the wavelength of 200-360 nm for spectral analysis;
the working wavelength laser and the ultraviolet laser emitted by the working wavelength laser light source 10 keep coaxial transmission with the working wavelength laser after passing through a first 45-degree reflector;
the first 45-degree reflector 30 is positioned at the intersection point of the light paths of the working wavelength laser and the ultraviolet laser, and is used for combining the working wavelength laser and the ultraviolet laser into a coaxial beam, irradiating the beam to a sample and reflecting a part of the working wavelength laser to the working wavelength laser detector 40;
the working wavelength laser detector 40 is used for measuring the energy, the pulse width and the beam distribution of the working wavelength laser in real time so as to ensure the precision of the damage test;
the sample stage 6 is used for bearing a sample 7 and can move in a three-dimensional direction to select a laser damage analysis test area;
the side optical imaging module 41 is located on the side of the sample, can move in a certain dimension so as to control the imaging area of the imaging module, has optical zoom magnification capability, and is used for collecting light scattering and spectrum information of laser passing through the optical path of the sample from the side of the sample, and transmitting the light scattering and spectrum information to an information processing system for optical image analysis;
the spectral analysis detector is positioned on the side surface of the sample and comprises at least one spectral detector for collecting spectral change information generated after the sample is irradiated by the working wavelength laser and the ultraviolet laser, wherein the spectral change information comprises spectral line distribution and intensity.
The second 45 ° reflector is located on the side of the sample, and between the sample and the side optical imaging module 41, the second 45 ° reflector splits a laterally emitted optical signal generated when the sample is irradiated by the working wavelength laser and the ultraviolet laser, wherein a part of the optical signal directly enters the side optical imaging module 41 through the second 45 ° reflector, and the rest part of the optical signal is reflected by the second 45 ° reflector and enters the spectral analysis detector, and the second 45 ° reflector can select a proper splitting ratio according to the test requirements.
Therefore, the laser damage test method utilizes the working wavelength laser and the ultraviolet laser to analyze and measure the laser damage, sets the corresponding pulse width and the repetition frequency for the working wavelength laser according to the measurement standard requirement, and adjusts the output energy of the laser until the sample generates the optical damage, thereby carrying out the laser damage test of the sample; for ultraviolet laser, the ultraviolet laser and the working wavelength laser are coaxially and unidirectionally transmitted after being combined, in-situ analysis before, during and after working laser irradiation can be performed on an optical sample, component change, thermal distortion, scattering, nonlinear effects and the like of the sample in a test process are known through signal change of laser beams, fluctuation of laser energy is obtained, the whole process of laser damage, such as the position of a damage area, the type of damage, the stage of damage generation or the influence of sample defects on laser damage performance and the like, is evaluated, and laser damage measurement of the sample can be synchronously, efficiently and accurately completed.
In the past, in the laser damage analysis test, the selection of a region to be tested of a test sample is generally selected randomly or according to the standard established by the laser damage test, so that the uniformity and consistency of the test sample are required to be quite good, and in fact, the material is difficult to reach the ideal state, and the surface state, components, internal wrappings or bubbles, stress state and the like of the material can influence the laser damage performance of the material; in order to improve the reliability and accuracy of the laser damage test, a sample is detected and analyzed before the laser damage test is carried out, a region with excellent and uniform quality is selected for testing, or damage measurement is carried out aiming at a certain specific defect, which is a very effective method, but related detection and analysis are generally carried out before the laser damage test, and are difficult to accurately coincide with the region of the laser damage test, so that the accuracy, reliability and repeatability of a test result are influenced; even if some testing means are introduced for in-situ analysis, dynamic research of the laser damage test is difficult to realize.
The in-situ laser damage test is carried out by introducing ultraviolet laser and matching with working wavelength laser, and the laser damage analysis test process can be rapidly, efficiently, accurately and deeply completed through accurate area analysis before the irradiation of the working wavelength laser, dynamic assistance in the irradiation of the working wavelength laser and timely analysis after the irradiation of the working wavelength laser; meanwhile, aiming at part of samples, high-energy ultraviolet laser can be used to enable the samples to be in an excited state, and then damage analysis and test are carried out by working wavelength laser.
In the invention, the working wavelength laser and the ultraviolet laser irradiate the test sample after being combined, so that the working wavelength laser and the ultraviolet laser start to reach the surface of the sample and then propagate in the sample until leaving the sample, the working areas are kept consistent, the accurate in-situ test can be realized, and the accuracy of the test area is ensured. Before a working wavelength laser irradiates a test sample, the ultraviolet laser is selected as an analysis light source to irradiate the sample to carry out comprehensive analysis on the optical quality of the sample based on the performance consideration of the sensitivity of an ultraviolet band to chemical components, optical absorption characteristics and the like of materials, for example, fused silica glass commonly used for laser devices is used, important factors influencing the laser damage performance of the fused silica glass are metal impurities and hydroxyl, the hydroxyl content in the region can be measured by 266nm ultraviolet laser through the optical absorption coefficient (an optical monitoring detector 45) and excitation spectrum (a spectral analysis detector) of the silica glass, the optical resolution of the ultraviolet laser is high, the energy density is high, and the discovery of the hydroxyl content in the region is facilitatedThe surface defects, internal wrapping, bubbles and stripes (a side optical imaging module 41) can provide reference basis for selecting a test area by analyzing the optical quality of the sample by using ultraviolet laser; when the working wavelength laser irradiates a test sample, the ultraviolet laser carries out real-time in-situ analysis on the damage test of the working wavelength laser by virtue of an excitation signal (a spectral analysis detector), optical distortion and scattering (a side optical imaging module 41 and an optical monitoring detector 45), optical absorption coefficient change (the optical monitoring detector 45) and the like, the most simple method is to carry out dynamic analysis on the laser damage (the optical monitoring detector 45) by virtue of the loss condition of the ultraviolet laser in the optical sample, and according to the energy and beam distortion of the ultraviolet laser, the time when the sample starts to have damage signs, when the damage is aggravated, when the sample forms final damage and the thermal stress distribution in the whole process can be analyzed; also as CaF 2 The crystal is easy to generate a color center under high-energy state irradiation, and in a damage test of working wavelength laser, if obvious optical scattering is generated at a certain point in a light path in a sample, and the point is irradiated by ultraviolet laser, the spectral characteristics emitted by the point can accord with the characteristics generated by the color center, so that the change of the area at the point can be accurately analyzed; similarly, after the sample is irradiated by the laser with the working wavelength to generate damage, the damage region of the laser can be quickly determined in the invention, the optical signal of the ultraviolet laser in the region can be used for quick in-situ analysis, for example, the change of the material composition of the damage region can be analyzed by the signal of the Raman spectrum, the appearance of the damage can be researched by the high optical resolution image, and the time domain characteristic of the damage can be tracked.
Furthermore, the invention can also carry out laser damage test under the ultraviolet excitation state. Under the excitation of ultraviolet laser with certain energy, some optical materials or defects of the materials are in an ultraviolet excited state, and the laser damage resistance of the materials is influenced, so that the research on the characteristics provides reference for the selection and the use of optical components under severe conditions.
In addition, the side optical imaging module 41 and the spectral analysis detector are arranged on the side of the light path, so that the position of the laser damage region, namely the position of the laser damage region on the light path can be determined, on one hand, the light scattering signal on the whole light path region can be observed from the side, and the corresponding emission spectrum signal can also be collected, on the other hand, the scattering signal of the damage occurring region can be obviously enhanced, and other interference can be easily avoided from the side, so that the damage on the surface or inside of the sample can be determined.
Further, the operating wavelength laser light source 10 further has one or more of a first optical filter 20, an optical polarizer 50, a wave plate 21, an optical shaping lens 51 and an adjustable diaphragm between the operating wavelength laser light source and the first 45 ° reflecting mirror 30, wherein the first optical filter 20 is used for filtering light except the operating wavelength laser light, the optical polarizer 50 and the wave plate 21 are used for controlling the polarization state of the operating wavelength laser light, the optical shaping lens 51 is used for shaping the operating wavelength laser light to control the transmission quality, the energy distribution and the focal position of the laser light beam, and the adjustable diaphragm is used for suppressing stray light and controlling the beam shape of the transmitted operating wavelength laser light.
The uv laser light source 11 further includes one or more of an optical switch, a second optical filter 22, an optical shaping lens group, and an adjustable diaphragm between the first 45 ° reflecting mirror 30 and the optical switch, wherein the optical switch is used to control the output of the uv laser, the second optical filter 22 is used to filter light other than the uv laser and adjust the intensity of the uv laser, the optical shaping lens group is used to shape the uv laser to control the transmission quality, energy distribution, and focal position of the laser beam, and the adjustable diaphragm is used to suppress stray light and control the beam shape of the transmitted laser.
The information processing system is used for controlling the light source module, the sample stage, the side optical imaging module and the spectral analysis detector, and acquiring information acquired by the light source module, the sample stage, the side optical imaging module and the spectral analysis detector and synchronously processing and contrastively analyzing the acquired information and the information in the database.
Specifically, the information processing system can synchronously control the light source module, the sample stage, the side optical imaging module and the spectral analysis detector, and synchronously acquire information obtained by the light source module, the sample stage, the side optical imaging module and the spectral analysis detector for comprehensive analysis and processing;
the database comprises spectral information, image information and energy information, and the information processing system can be used for positioning the damage region and distinguishing the damage types and can be used for developing damage cause analysis by combining the database information.
In an alternative embodiment, the average power of the uv laser is greater than 1mW, and the beam size of the uv laser is close to the operating wavelength laser, so that the frequency and energy density of the uv laser are sufficient to generate the portion of the spectral signal and the image information required for laser damage analysis when the sample is irradiated by the uv laser.
The first 45 ° mirror 30 has dichroism when placed at 45 °, and has total reflectance to ultraviolet laser light and can split the operating wavelength laser light in a certain ratio. Illustratively, when the first 45 ° reflector is placed at 45 °, the transmittance of the first 45 ° reflector to the laser with the operating wavelength is greater than 95%, the reflectance of the first 45 ° reflector to the ultraviolet laser is greater than 80%, the fundamental laser and the ultraviolet laser coaxially and unidirectionally propagate (combine) after passing through the first 45 ° reflector, and meanwhile, the fundamental laser enters the optical detector through the laser reflected by the first 45 ° reflector, and the fundamental laser is monitored by the optical detector in real time.
It is further preferred that more than 98% of the operating wavelength laser light passes directly through the mirror and less than 2% of the operating wavelength laser light is reflected to the operating wavelength laser detector 40.
The second 45 ° reflecting mirror 31 is located on the side of the test sample, and is a dichroic mirror placed at 45 °, and its spectral transmittance and emission characteristics are selectively designed according to the needs of the instrument, so as to meet the information acquisition requirements of the side optical imaging module 41 and the first to third spectral detectors 42, 43, 44.
The spectrum analysis detector can comprise a plurality of spectrum detectors, and the spectrum detectors are used for splitting light through a plurality of light splitting lenses so that spectrum signals corresponding to spectrum areas respectively enter different spectrum detectors, thereby expanding the sample analysis range of the invention, and being suitable for laser in a wide wavelength range aiming at different samples to analyze different samples.
For example, the spectral analysis detector includes first to third spectral detectors 42, 43, and 44, and the third 45 ° mirror 32 and the fourth 45 ° mirror 33 are dichroic mirrors disposed at 45 ° for splitting the spectral signal reflected by the second 45 ° mirror, and the spectral reflection and transmission characteristics thereof can be selectively designed according to the measurement requirements, so that the spectral signal corresponding to the spectral region respectively enters the first spectral detector 42, the second spectral detector 43, and the third spectral detector 44, and the spectral change information generated after the sample is irradiated with the operating wavelength laser and the ultraviolet laser, including spectral line distribution and intensity, is acquired.
The sample 7 to be measured is an optical material or an optical device, the sample 7 is directly placed on the sample table 6, the sample table 6 has three-dimensional high-speed translation capability and high-precision repeated positioning capability, the displacement resolution is better than 10 micrometers, the displacement repeated positioning precision is better than 10 micrometers, and the test area of the sample 7 is selected through the movement of the sample table in the measuring process; the sample stage has a marking function, and can accurately correspond the acquired image and spectral information to corresponding areas on the sample 7, or directly mark information on the sample 7.
Before the laser damage analysis test is carried out, the sample table 6 is adjusted, the sample 7 is subjected to ultraviolet laser scanning analysis, the optical quality of the sample 7 is comprehensively evaluated according to the optical imaging information and the spectral information, and the optical quality is associated with the related coordinate information, so that a criterion is provided for selection of a laser damage analysis test area, and comparison of a subsequent process is facilitated.
The side optical imaging module 41 is configured to perform optical image analysis, and includes optical lenses and imaging detectors with different magnifications, where the optical lenses may work in an ultraviolet spectrum region, a visible spectrum region, and a near infrared spectrum region according to measurement requirements, an adjustable diaphragm and/or a replaceable filter may be placed in front of the optical lenses, the adjustable diaphragm is configured to control an incident light signal intensity, suppress stray light, and adjust an imaging depth of field, and the filter is configured to control a spectral range and a signal intensity of signal light entering the side optical imaging module, and includes but is not limited to a narrow-band filter, a band-pass filter, a polarization optical device, and an optical attenuator; the imaging detector has high-resolution optical imaging capability and is a black-and-white imaging detector or a color imaging detector, and the acquired image information and related optical device parameters are comprehensively transmitted to the information processing system.
The spectral analysis detector is used for performing spectral analysis including but not limited to signal light spectral distribution analysis, characteristic spectral intensity analysis and characteristic spectral imaging analysis.
The spectral analysis detector may be composed of, but not limited to, a first spectral detector 42, a second spectral detector 43, and a third spectral detector 44, or only one of the first spectral detector 42, the second spectral detector 43, and the third spectral detector 44, a spectral signal reflected from the second 45 ° reflective mirror is split by the third 45 ° reflective mirror 32 and the fourth 45 ° reflective mirror 33 and enters the first spectral detector 42, the second spectral detector 43, and the third spectral detector 44, the third 45 ° reflective mirror 32 and the fourth 45 ° reflective mirror 33 may be replaced according to the requirement of spectral analysis, and may be a fixed splitting ratio dichroic mirror, or a band pass filter, or a narrow band pass filter; the first spectral detector 42, the second spectral detector 43, and the third spectral detector 44 may be, but are not limited to, an optical imaging CCD detector, a silicon photo-detector, and a photomultiplier according to the requirements of optical signals, optical filters 24, 25, and 26 and adjustable diaphragms are disposed in front of the detectors, the optical filters 24, 25, and 26 are respectively used to control the spectral ranges and signal intensities of the signal lights entering the first spectral detector 42, the second spectral detector 43, and the third spectral detector 44, and include, but are not limited to, a narrow-band filter, a band-pass filter, a polarizing optical device, and an optical attenuator, and the adjustable diaphragms are used to control the incident light signal intensity, suppress stray light, and adjust the imaging depth of field.
The spectral information collected by the spectral analysis detector and the parameter information of the optical element used by the spectral analysis detector and the data generated by the side optical imaging module are synchronously transmitted to the signal processing system.
The information processing system includes a control section, an information processing section, and a database section,
the information processing system can synchronously control the light source module, the sample table, the side optical imaging module and the spectral analysis detector, and synchronously acquire information acquired by the light source module, the sample table, the side optical imaging module and the spectral analysis detector for comprehensive analysis and processing.
The information processing system comprises a relevant database, and the database information comprises instrument relevant parameters and operation rules, standard spectrum and image information, standard sample analysis and test result information, sample analysis and test information and comprehensive analysis result information.
The information processing system also has a database, and can compare the spectrum with the image by means of the database information to analyze the signal difference in the measuring process.
Further, an optical monitoring detector 45 is disposed at the laser emitting end of the sample 7, i.e. the other side of the optical axis path of the sample, the optical monitoring detector 45 includes optical lenses and detectors with different magnifications, and a seventh optical filter 27 is disposed in front of the optical monitoring detector 45, and the spectral response range of the optical monitoring detector is from the ultraviolet laser frequency to the near-infrared light region, and the optical monitoring detector is used for detecting laser energy, laser scattering and nonlinear optical signals so as to determine various changes of the sample 7 under laser irradiation.
The optical monitoring detector 45 may be an image acquisition detector, or may be composed of a plurality of photoelectric detection devices, such as PIN, detection laser width, power meter, energy monitoring, beam analyzer, beam quality, and can detect the beam on the optical axis, for example, when the working wavelength laser is 1064nm laser propagating along the phase matching direction of the crystal, the detector may also be dedicated to 532nm laser detection, and measure the frequency doubling conversion efficiency and beam quality of the laser, as the basis for damage judgment.
An adjustable diaphragm and a replaceable filter device can be placed in front of the optical lens, the adjustable diaphragm is used for controlling the intensity of incident light signals, inhibiting stray light and adjusting the depth of imaging field, the filter device is used for controlling the frequency spectrum range and the signal intensity of signal light entering the lateral optical imaging module and comprises one or more of a narrow-band filter, a band-pass filter, a polarization optical device and an optical attenuation plate, the imaging detector has high-resolution optical imaging capability, and acquired image information and related optical device parameters are comprehensively transmitted to an information processing system.
Further, a typical workflow of the optical analysis instrument of the present invention is as follows:
1) self-calibration of the instrument;
2) ultraviolet laser scanning a sample;
3) testing laser damage;
4) evaluating and analyzing the damaged sample;
5) and outputting a test result.
The following examples are used to illustrate the process of the present invention for measuring photo damage of a sample, but those skilled in the art will appreciate that the present invention is not so limited and other variations and options are possible:
example 1: a typical optical glass material.
1) Self-calibration of the instrument: the instrument is started, and after preheating for a certain time, the calibration of spectrum, beam quality and light intensity, and the calibration of optical elements and electrical equipment of the instrument are carried out.
A. And (3) calibrating the detector: self-detection is carried out according to a calibration program of the detector, so that each detection device is in a normal working state and comprises a working wavelength laser detector 40, a side optical imaging module 41, a first spectrum detector 42, a second spectrum detector 43, a third spectrum detector 44 and an optical monitoring detector 45;
B. confirming and verifying optical element parameters: according to a manual made by tests, confirming each optical element of the whole system and verifying related parameters, wherein the optical elements comprise but are not limited to each optical filter 20-27, a first 45-degree reflector 30, a second 45-degree reflector 31, a third 45-degree reflector 32, a fourth 45-degree reflector 33, an optical polarizer 50 and an optical shaping lens group 51;
C. and (3) working wavelength laser verification: the working wavelength laser 10 is preheated for a certain time and then is subjected to state detection, the ultraviolet laser 11 does not output laser, and the working wavelength laser detector 40 and the optical monitoring detector 45 jointly detect information such as beam quality, single pulse energy, pulse width, polarization state, wavelength and energy fluctuation of the working wavelength laser, so that the stability of the splitting ratio of the first 45-degree reflector 30 in a working area is determined.
D. Ultraviolet laser verification: the ultraviolet laser 11 is preheated for a certain time and then is subjected to state detection, the working wavelength laser 10 has no output, and information such as beam quality, light intensity, energy fluctuation and the like of the ultraviolet laser is detected by the optical monitoring detector 45
E. Laser coaxial analysis: the working wavelength laser 10 and the ultraviolet laser 11 output laser simultaneously, and the coaxiality, the beam divergence degree and the predicted focal position of the working wavelength laser and the ultraviolet laser behind the first 45-degree reflecting mirror 30 are inspected;
F. and (3) standard sample verification: a set standard sample is placed on the sample table 6, and the imaging detection working state of the side optical imaging module 41 is inspected; inspecting the spectral detection capability of the spectral analysis detector composed of the first spectral detector 42, the second spectral detector 43 and the third spectral detector 44; the ability of the inspection optical monitoring detector 45 to analyze the uv laser light scattering.
G. Sample stage verification: and (4) calibrating the sample table 6 according to a formulated manual, wherein the calibration comprises parameter indexes such as sample table coordinate system establishment, displacement control and precision, repeated positioning precision and the like.
The information collected in each process is transmitted to an information processing system to complete the self-calibration process, and relevant data can be called for the subsequent process.
2) Measurement of sample processing: the method comprises the steps of processing a test sample according to a formulated manual, wherein main indexes comprise the size of an optical light-passing surface of the sample and the length of the sample, an optical surface is required to be processed on the side surface of the sample to serve as a window of a side optical imaging module and a spectral analysis detector, and processing parameters of each optical surface are required to meet the requirements of a measurement standard.
3) Ultraviolet laser scanning of a sample: the sample 7 meeting the requirements of the test manual is placed on the sample table 6 to be fixed, and corresponding sample coordinates are established, so that the area of the sample for laser damage testing and the subsequent positioning of damage analysis are conveniently and accurately controlled. 266nm ultraviolet laser with the average power of more than 1mW is used as an ultraviolet laser light source, light beams are near-circular light spots, the diameter of the light spots is smaller than 1mm, a measurement sample 7 is scanned through the movement of a sample table 6, the optical uniformity, stimulated emission spectrum signals, photoinduced effect conditions and degree and the like of each area of the sample are analyzed according to optical information collected by a side optical imaging module 41, an optical monitoring detector 45, a first spectrum detector 42, a second spectrum detector 43 and a third spectrum detector 44, and relevant information enters an information processing system.
4) And (3) laser damage testing:
A. selecting a test area: and selecting an area for carrying out the laser damage test according to the result of the ultraviolet laser scanning sample. Optical quartz glass is used as a measurement sample, and is processed according to the processing requirements of the measurement sample, for example, a sheet sample with an optical light-passing surface of 20mm multiplied by 20mm and a thickness of 2mm exists, a region without bubbles and with little hydroxyl content, a region with more bubbles and with little hydroxyl content, a region without bubbles and with high hydroxyl content and a region with more bubbles and with high hydroxyl content exist in the sample, laser scattering information and spectrum information obtained by ultraviolet laser scanning can be calibrated, and optical damage tests are respectively carried out.
B. Single working wavelength laser damage test: according to the laser damage test standard, various parameters of the working wavelength laser are adjusted, the laser damage test is carried out on the selected area, the state of the sample is monitored in real time according to the optical information collected by the side optical imaging module 41, the optical monitoring detector 45, the first spectrum detector 42, the second spectrum detector 43 and the third spectrum detector 44, the damaged area and the damage occurrence time of the sample are accurately judged, and the collected information is synchronously transmitted to the information processing system.
C. And (3) testing the working wavelength laser damage accompanied by ultraviolet laser: according to the laser damage test standard, various parameters of working wavelength laser are adjusted, laser damage test is carried out on the selected area, in the test process, ultraviolet laser irradiates the same area of the measurement sample 7 in the whole process, the state of the sample is monitored in real time according to optical information collected by the side optical imaging module 41, the optical monitoring detector 45, the first spectral detector 42, the second spectral detector 43 and the third spectral detector 44, the damage area and the damage occurrence time of the sample are accurately judged, and the collected information is synchronously transmitted to the information processing system.
The above processes B and C may select one of them, or may perform a comparison of the measurement results of both.
5) Evaluation and analysis after sample damage: the step is carried out along with a laser damage test, once the sample is damaged by laser, the damage analysis can be synchronously carried out on the sample, including the moment of damage generation, the damaged area, the corresponding scattering degree, the spectrum change and the like, and various collected information enters an information processing system, so that an analysis and judgment result can be preliminarily given, and the analysis and judgment result can also be used as the basis for the subsequent analysis.
6) And (3) outputting a test result: and (4) giving a test result according to the comparison of the database, storing the test result, and giving the overall evaluation of the measurement sample according to the process.
Example 2:
the KTP crystal uses 1064nm pulse laser as the working wavelength laser and 355nm laser as the ultraviolet laser light source.
1) Self-calibration of the instrument: the same as the above;
2) measurement of sample processing: processing a sample with a light-passing section of 5mm multiplied by 5mm and a length of 10mm by the KTP crystal according to a phase matching direction of 1064nm, and performing other processing according to the requirements of a test manual on the sample;
3) ultraviolet laser scanning of a sample: as before, the grade of the test area is divided for the KTP crystal according to signals such as scattering, spectrum and the like;
4) and (3) laser damage testing: as mentioned above, in the optical signal analysis, in addition to the above-mentioned signal collection, the optical monitoring detector 45 is also required to collect the nonlinear optical signal of the crystal and monitor the change of the nonlinear conversion efficiency of the crystal;
5) evaluation and analysis after sample damage: the same as the above;
6) and (3) outputting a test result: as before.
The invention has the following advantages:
1) the laser damage analysis test is carried out by combining working wavelength laser with ultraviolet laser, and the laser damage area can be accurately determined and the laser damage process can be mastered through in-situ high-resolution optical image analysis and related optical signal analysis, so that the laser damage type and cause can be comprehensively analyzed.
2) Through the detection of the ultraviolet laser before damage, the damage test area of the sample can be selected more pertinently, and the test consistency and the accuracy of the measurement result are improved.
3) The in-situ analysis of the ultraviolet laser enables the laser damage analysis test to be more targeted, and can complete the rapid and accurate test of specific types and area objects.
4) The intelligent analysis testing technology is combined with a database, so that the laser damage testing experiment can be automatically, efficiently and accurately completed.
While the invention has been described in further detail with reference to specific preferred embodiments thereof, it will be understood by those skilled in the art that various changes in form and details may be made therein without departing from the spirit and scope of the invention as defined by the appended claims.
Claims (10)
1. A laser damage analysis and measurement instrument is characterized by comprising the following components:
the device comprises a light source module, a sample table, a side optical imaging module and a spectral analysis detector;
the light source module comprises a working wavelength laser light source and an ultraviolet laser light source;
the working wavelength laser light source is used for emitting working wavelength laser to irradiate a sample and carrying out sample damage test, the working wavelength laser light source is pulse laser with high peak power, and the working wavelength, the pulse width, the peak power, the single pulse energy and/or the repetition frequency of the working wavelength laser light source are/is selected according to the test requirement;
the ultraviolet laser light source emits ultraviolet laser with the wavelength of 200-360 nm for spectral analysis;
the working wavelength laser and the ultraviolet laser emitted by the working wavelength laser source keep coaxial propagation with the working wavelength laser after passing through the reflector;
the working wavelength laser detector is used for measuring the energy, the pulse width and the beam distribution of the working wavelength laser in real time so as to ensure the precision of damage testing;
the sample stage is used for bearing a sample and can move in a three-dimensional direction to select a laser damage analysis test area;
the optical monitoring detector is positioned on the other side of the optical axis path of the sample and used for collecting image information of the laser irradiation area, transmitting the image information to the information processing system and carrying out optical image analysis;
the side optical imaging module is positioned on the side surface of the sample, can move in a certain dimension so as to control the imaging area of the imaging module, has optical zoom magnification capability, and is used for collecting light scattering and spectrum information of laser passing through a light path of the sample from the side surface of the sample, transmitting the light scattering and spectrum information to an information processing system and carrying out optical image analysis;
the spectral analysis detector is positioned on the side surface of the sample and comprises at least one spectral detector for collecting spectral change information generated after the sample is irradiated by the working wavelength laser and the ultraviolet laser, wherein the spectral change information comprises spectral line distribution and intensity.
2. The laser damage analysis and measurement instrument of claim 1,
the laser device is also provided with a first 45-degree reflector, is positioned at the intersection point of the light paths of the working wavelength laser and the ultraviolet laser, and is used for combining the working wavelength laser and the ultraviolet laser into a coaxial beam, irradiating the beam to a sample and reflecting one part of the working wavelength laser to the working wavelength laser detector;
and the second 45-degree reflector is positioned on the side surface of the sample, and is arranged between the sample and the side surface optical imaging module to split the laterally emitted optical signals generated when the sample is irradiated by the working wavelength laser and the ultraviolet laser, wherein a part of the optical signals directly enter the side surface optical imaging module through the second 45-degree reflector, the rest part of the optical signals are reflected by the second 45-degree reflector to enter the spectral analysis detector, and the second 45-degree reflector can select a proper splitting ratio according to the test requirement.
3. The laser damage analysis and measurement instrument of claim 2,
further comprising:
the information processing system is used for controlling the light source module, the sample stage, the optical imaging module and the spectral analysis detector, and acquiring information acquired by the light source module, the sample stage, the optical imaging module and the spectral analysis detector and synchronously processing and contrastively analyzing the acquired information and information in the database.
4. The laser damage analysis and measurement instrument according to claim 2,
an optical monitoring detector is arranged at the laser emergent end of the sample, namely the other side on the optical axis path of the sample, the optical monitoring detector comprises optical lenses with different magnifications and a detector, an optical filter is arranged in front of the optical monitoring detector, the spectral response range of the optical monitoring detector is from ultraviolet laser frequency to near infrared light region, and the optical monitoring detector is used for detecting laser energy, laser scattering and nonlinear optical signals so as to determine various changes of the sample under laser irradiation.
5. The laser damage analysis and measurement instrument of claim 2,
the working wavelength laser light source is also provided with one or more of an optical filter, an optical polarizer, a wave plate, an optical shaping lens and an adjustable diaphragm between the working wavelength laser light source and the first 45-degree reflecting mirror, wherein the optical filter is used for filtering light except the working wavelength laser light, the optical polarizer and the wave plate are used for controlling the polarization state of the working wavelength laser light, the optical shaping lens is used for shaping the working wavelength laser light to control the transmission quality, the energy distribution and the focus position of the laser light beam, and the adjustable diaphragm is used for inhibiting stray light and controlling the beam shape of the transmitted working wavelength laser light;
the ultraviolet laser light source further comprises one or more of an optical switch, a second optical filter, an optical shaping lens group and an adjustable diaphragm between the ultraviolet laser light source and the first 45-degree reflector, wherein the optical switch is used for controlling the output of ultraviolet laser light, the optical filter is used for filtering light except the ultraviolet laser light and adjusting the intensity of the ultraviolet laser light, the optical shaping lens group is used for shaping the ultraviolet laser light so as to control the transmission quality, the energy distribution and the focal position of a laser beam, and the adjustable diaphragm is used for inhibiting stray light and controlling the beam shape of the transmitted laser light.
6. The laser damage analysis and measurement instrument of claim 2,
the average power of the ultraviolet laser is larger than 1mW, and the beam size of the ultraviolet laser is close to that of the working wavelength laser.
7. The laser damage analysis and measurement instrument of claim 2,
when the first 45-degree reflector is placed at 45 degrees, the transmittance of the first 45-degree reflector to fundamental laser is greater than 95%, the reflectance of the first 45-degree reflector to ultraviolet laser is greater than 80%, and the fundamental laser and the ultraviolet laser are coaxially and cocurrently transmitted after passing through the first 45-degree reflector;
the second 45 degree mirror selects the appropriate splitting ratio according to the test requirements.
8. The laser damage analysis and measurement instrument according to claim 2,
the sample stage is used for bearing an optical sample used for measurement, moves in different directions according to test requirements, and has displacement resolution superior to 10 mu m and displacement repeated positioning precision superior to 10 mu m.
9. The laser damage analysis and measurement instrument of claim 2,
the side optical imaging module is used for carrying out optical image analysis, comprises optical lenses with different magnification ratios and an imaging detector, and accurately controls an imaging area through displacement; the side optical imaging module uses an auxiliary optical device to meet the requirement of collecting image information of a laser irradiation area, and the auxiliary optical device comprises an optical attenuation sheet, an optical filter, an optical polarization device and an adjustable diaphragm;
the spectral analysis detector is a single detector or a plurality of detectors, and the detectors comprise an optical imaging CCD detector, a silicon photoelectric detector and a photomultiplier;
an auxiliary optical device is arranged in front of each detection window of the spectrum analysis detector, and the auxiliary optical device comprises an optical attenuation sheet, an optical filter, an optical polarization device and an adjustable diaphragm.
10. The laser damage analysis and measurement instrument of claim 3,
the information processing system can synchronously control the light source module, the sample stage, the side optical imaging module and the spectral analysis detector, and synchronously acquire information acquired by the light source module, the sample stage, the side optical imaging module and the spectral analysis detector for comprehensive analysis and processing;
the database comprises spectral information, image information and energy information, and the information processing system can be used for positioning the damage region and distinguishing the damage types and can be used for developing damage cause analysis by combining the database information.
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| CN115112579A (en) * | 2022-08-26 | 2022-09-27 | 光谱时代(北京)科技有限公司 | Spectrum collection equipment |
| CN115747036A (en) * | 2023-01-05 | 2023-03-07 | 中国人民解放军空军特色医学中心 | Method and device for searching and screening laser wavelength capable of being strongly absorbed by flora |
| CN116223450A (en) * | 2023-03-23 | 2023-06-06 | 中南大学 | Instrument and method for measuring concentration of transparent liquid |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN115112579A (en) * | 2022-08-26 | 2022-09-27 | 光谱时代(北京)科技有限公司 | Spectrum collection equipment |
| CN115112579B (en) * | 2022-08-26 | 2022-11-25 | 光谱时代(北京)科技有限公司 | Spectrum collection equipment |
| CN115747036A (en) * | 2023-01-05 | 2023-03-07 | 中国人民解放军空军特色医学中心 | Method and device for searching and screening laser wavelength capable of being strongly absorbed by flora |
| CN115747036B (en) * | 2023-01-05 | 2023-05-02 | 中国人民解放军空军特色医学中心 | Method for searching and screening laser wavelength capable of being strongly absorbed by flora |
| CN116223450A (en) * | 2023-03-23 | 2023-06-06 | 中南大学 | Instrument and method for measuring concentration of transparent liquid |
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