CN114787093A - 磁记录介质基板用或磁记录再生装置用玻璃间隔物用的玻璃、磁记录介质基板、磁记录介质、磁记录再生装置用玻璃间隔物和磁记录再生装置 - Google Patents
磁记录介质基板用或磁记录再生装置用玻璃间隔物用的玻璃、磁记录介质基板、磁记录介质、磁记录再生装置用玻璃间隔物和磁记录再生装置 Download PDFInfo
- Publication number
- CN114787093A CN114787093A CN202080084350.4A CN202080084350A CN114787093A CN 114787093 A CN114787093 A CN 114787093A CN 202080084350 A CN202080084350 A CN 202080084350A CN 114787093 A CN114787093 A CN 114787093A
- Authority
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- China
- Prior art keywords
- glass
- magnetic recording
- less
- recording medium
- mol
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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- 239000011521 glass Substances 0.000 title claims abstract description 343
- 239000000758 substrate Substances 0.000 title claims abstract description 120
- 125000006850 spacer group Chemical group 0.000 title claims abstract description 73
- 229910018072 Al 2 O 3 Inorganic materials 0.000 claims abstract description 76
- 229910004298 SiO 2 Inorganic materials 0.000 claims abstract description 68
- 229910018068 Li 2 O Inorganic materials 0.000 claims abstract description 20
- 229910052760 oxygen Inorganic materials 0.000 claims abstract description 16
- 229910052708 sodium Inorganic materials 0.000 claims abstract description 8
- ODINCKMPIJJUCX-UHFFFAOYSA-N calcium oxide Inorganic materials [Ca]=O ODINCKMPIJJUCX-UHFFFAOYSA-N 0.000 claims description 65
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 claims description 58
- 230000005484 gravity Effects 0.000 claims description 19
- 230000009477 glass transition Effects 0.000 claims description 12
- QVQLCTNNEUAWMS-UHFFFAOYSA-N barium oxide Inorganic materials [Ba]=O QVQLCTNNEUAWMS-UHFFFAOYSA-N 0.000 claims description 3
- IATRAKWUXMZMIY-UHFFFAOYSA-N strontium oxide Inorganic materials [O-2].[Sr+2] IATRAKWUXMZMIY-UHFFFAOYSA-N 0.000 claims description 3
- 239000010410 layer Substances 0.000 description 52
- 238000000034 method Methods 0.000 description 40
- 238000005498 polishing Methods 0.000 description 31
- 239000000203 mixture Substances 0.000 description 27
- 238000004519 manufacturing process Methods 0.000 description 20
- 239000006060 molten glass Substances 0.000 description 17
- 238000010438 heat treatment Methods 0.000 description 14
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Substances [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 13
- 239000002994 raw material Substances 0.000 description 13
- 230000015572 biosynthetic process Effects 0.000 description 12
- 238000002844 melting Methods 0.000 description 12
- 230000008018 melting Effects 0.000 description 12
- 229910010413 TiO 2 Inorganic materials 0.000 description 11
- 239000000463 material Substances 0.000 description 11
- 238000005342 ion exchange Methods 0.000 description 10
- 238000000465 moulding Methods 0.000 description 9
- 229910006404 SnO 2 Inorganic materials 0.000 description 8
- 238000011156 evaluation Methods 0.000 description 8
- 239000000696 magnetic material Substances 0.000 description 8
- 229910052697 platinum Inorganic materials 0.000 description 7
- 229910045601 alloy Inorganic materials 0.000 description 6
- 239000000956 alloy Substances 0.000 description 6
- 230000000694 effects Effects 0.000 description 6
- 230000007246 mechanism Effects 0.000 description 6
- 238000012545 processing Methods 0.000 description 6
- 238000012360 testing method Methods 0.000 description 6
- 239000002585 base Substances 0.000 description 5
- 238000002354 inductively-coupled plasma atomic emission spectroscopy Methods 0.000 description 5
- 230000001050 lubricating effect Effects 0.000 description 5
- 230000000704 physical effect Effects 0.000 description 5
- 239000011241 protective layer Substances 0.000 description 5
- 239000000126 substance Substances 0.000 description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 238000000137 annealing Methods 0.000 description 4
- 238000005352 clarification Methods 0.000 description 4
- 239000013078 crystal Substances 0.000 description 4
- 239000010702 perfluoropolyether Substances 0.000 description 4
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- 230000002411 adverse Effects 0.000 description 3
- 229910001413 alkali metal ion Inorganic materials 0.000 description 3
- 238000005229 chemical vapour deposition Methods 0.000 description 3
- 238000004140 cleaning Methods 0.000 description 3
- 239000000470 constituent Substances 0.000 description 3
- -1 generally Substances 0.000 description 3
- 230000001965 increasing effect Effects 0.000 description 3
- 239000000075 oxide glass Substances 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 229910000838 Al alloy Inorganic materials 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 2
- 229910018979 CoPt Inorganic materials 0.000 description 2
- 229910005335 FePt Inorganic materials 0.000 description 2
- 229910002651 NO3 Inorganic materials 0.000 description 2
- NHNBFGGVMKEFGY-UHFFFAOYSA-N Nitrate Chemical compound [O-][N+]([O-])=O NHNBFGGVMKEFGY-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 229910052783 alkali metal Inorganic materials 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 229910052681 coesite Inorganic materials 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 229910052593 corundum Inorganic materials 0.000 description 2
- 229910052906 cristobalite Inorganic materials 0.000 description 2
- 238000002425 crystallisation Methods 0.000 description 2
- 230000008025 crystallization Effects 0.000 description 2
- 238000005520 cutting process Methods 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 238000003618 dip coating Methods 0.000 description 2
- 230000002708 enhancing effect Effects 0.000 description 2
- 230000001747 exhibiting effect Effects 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- 239000006249 magnetic particle Substances 0.000 description 2
- 230000005415 magnetization Effects 0.000 description 2
- 238000001755 magnetron sputter deposition Methods 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 238000007500 overflow downdraw method Methods 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 238000007493 shaping process Methods 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 235000012239 silicon dioxide Nutrition 0.000 description 2
- 229910052682 stishovite Inorganic materials 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- 230000003746 surface roughness Effects 0.000 description 2
- 230000000930 thermomechanical effect Effects 0.000 description 2
- 229910052905 tridymite Inorganic materials 0.000 description 2
- 229910001845 yogo sapphire Inorganic materials 0.000 description 2
- 238000007088 Archimedes method Methods 0.000 description 1
- 229910020707 Co—Pt Inorganic materials 0.000 description 1
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
- 239000005977 Ethylene Substances 0.000 description 1
- 238000006124 Pilkington process Methods 0.000 description 1
- 239000003082 abrasive agent Substances 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 229910052785 arsenic Inorganic materials 0.000 description 1
- GCPXMJHSNVMWNM-UHFFFAOYSA-N arsenous acid Chemical compound O[As](O)O GCPXMJHSNVMWNM-UHFFFAOYSA-N 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 229910052793 cadmium Inorganic materials 0.000 description 1
- 150000001721 carbon Chemical class 0.000 description 1
- 150000004649 carbonic acid derivatives Chemical class 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 230000008602 contraction Effects 0.000 description 1
- 238000000280 densification Methods 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000003280 down draw process Methods 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 239000006025 fining agent Substances 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 230000017525 heat dissipation Effects 0.000 description 1
- 150000004679 hydroxides Chemical class 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 1
- 238000005339 levitation Methods 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000012768 molten material Substances 0.000 description 1
- 150000002823 nitrates Chemical class 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 238000011002 quantification Methods 0.000 description 1
- 238000004445 quantitative analysis Methods 0.000 description 1
- 238000007670 refining Methods 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 239000002002 slurry Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 150000003467 sulfuric acid derivatives Chemical class 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 238000005303 weighing Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/62—Record carriers characterised by the selection of the material
- G11B5/73—Base layers, i.e. all non-magnetic layers lying under a lowermost magnetic recording layer, e.g. including any non-magnetic layer in between a first magnetic recording layer and either an underlying substrate or a soft magnetic underlayer
- G11B5/739—Magnetic recording media substrates
- G11B5/73911—Inorganic substrates
- G11B5/73921—Glass or ceramic substrates
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/095—Glass compositions containing silica with 40% to 90% silica, by weight containing rare earths
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/083—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound
- C03C3/085—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound containing an oxide of a divalent metal
- C03C3/087—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound containing an oxide of a divalent metal containing calcium oxide, e.g. common sheet or container glass
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B17/00—Guiding record carriers not specifically of filamentary or web form, or of supports therefor
- G11B17/02—Details
- G11B17/038—Centering or locking of a plurality of discs in a single cartridge
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B23/00—Record carriers not specific to the method of recording or reproducing; Accessories, e.g. containers, specially adapted for co-operation with the recording or reproducing apparatus ; Intermediate mediums; Apparatus or processes specially adapted for their manufacture
- G11B23/02—Containers; Storing means both adapted to cooperate with the recording or reproducing means
- G11B23/03—Containers for flat record carriers
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/187—Structure or manufacture of the surface of the head in physical contact with, or immediately adjacent to the recording medium; Pole pieces; Gap features
- G11B5/23—Gap features
- G11B5/235—Selection of material for gap filler
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/62—Record carriers characterised by the selection of the material
- G11B5/72—Protective coatings, e.g. anti-static or antifriction
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B41/00—Component parts such as frames, beds, carriages, headstocks
- B24B41/04—Headstocks; Working-spindles; Features relating thereto
- B24B41/047—Grinding heads for working on plane surfaces
- B24B41/053—Grinding heads for working on plane surfaces for grinding or polishing glass
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Life Sciences & Earth Sciences (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Ceramic Engineering (AREA)
- Inorganic Chemistry (AREA)
- Glass Compositions (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
- Magnetic Record Carriers (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2019-225368 | 2019-12-13 | ||
| JP2019225368 | 2019-12-13 | ||
| PCT/JP2020/046405 WO2021117897A1 (ja) | 2019-12-13 | 2020-12-11 | 磁気記録媒体基板用または磁気記録再生装置用ガラススペーサ用のガラス、磁気記録媒体基板、磁気記録媒体、磁気記録再生装置用ガラススペーサおよび磁気記録再生装置 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN114787093A true CN114787093A (zh) | 2022-07-22 |
Family
ID=76330058
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202080084350.4A Pending CN114787093A (zh) | 2019-12-13 | 2020-12-11 | 磁记录介质基板用或磁记录再生装置用玻璃间隔物用的玻璃、磁记录介质基板、磁记录介质、磁记录再生装置用玻璃间隔物和磁记录再生装置 |
Country Status (5)
| Country | Link |
|---|---|
| US (3) | US11999652B2 (https=) |
| JP (3) | JP7383050B2 (https=) |
| CN (1) | CN114787093A (https=) |
| MY (1) | MY208742A (https=) |
| WO (1) | WO2021117897A1 (https=) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US11081133B2 (en) * | 2016-11-14 | 2021-08-03 | Hoya Corporation | Glass for magnetic recording medium substrate, magnetic recording medium substrate, magnetic recording medium and glass spacer for magnetic recording and reproducing apparatus |
| MY204452A (en) | 2018-05-16 | 2024-08-29 | Hoya Corp | Glass for magnetic recording medium substrate, magnetic recording medium substrate, magnetic recording medium, glass spacer for magnetic recording and reproducing apparatus, and magnetic recording and reproducing apparatus |
| WO2020262702A1 (ja) * | 2019-06-28 | 2020-12-30 | Hoya株式会社 | ガラス板の製造方法および磁気ディスクの製造方法 |
| CN120441191A (zh) * | 2019-07-22 | 2025-08-08 | Hoya株式会社 | 玻璃、磁记录介质基板、磁记录介质、磁记录再生装置用玻璃间隔物和磁记录再生装置 |
| CN114787093A (zh) * | 2019-12-13 | 2022-07-22 | 豪雅株式会社 | 磁记录介质基板用或磁记录再生装置用玻璃间隔物用的玻璃、磁记录介质基板、磁记录介质、磁记录再生装置用玻璃间隔物和磁记录再生装置 |
| WO2023281610A1 (ja) * | 2021-07-05 | 2023-01-12 | Hoya株式会社 | ガラス板、円板状ガラス、および磁気ディスク用ガラス基板 |
| JP7766206B2 (ja) * | 2022-09-08 | 2025-11-07 | Hoya株式会社 | 磁気記録媒体基板用ガラス、磁気記録媒体基板および磁気記録再生装置 |
| JP2025010844A (ja) * | 2023-07-10 | 2025-01-23 | 日本板硝子株式会社 | 情報記録媒体用ガラス板 |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20120188663A1 (en) * | 2010-12-21 | 2012-07-26 | Hoya Corporation | Glass substrate for magnetic recording medium and its use |
| US20150087495A1 (en) * | 2012-06-05 | 2015-03-26 | Asahi Glass Company, Limited | Alkali-free glass and method for producing same |
| WO2019221102A1 (ja) * | 2018-05-16 | 2019-11-21 | Hoya株式会社 | 磁気記録媒体基板用ガラス、磁気記録媒体基板、磁気記録媒体、磁気記録再生装置用ガラススペーサおよび磁気記録再生装置 |
Family Cites Families (22)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6144732A (ja) * | 1984-08-06 | 1986-03-04 | Toshiba Corp | 基板用ガラス |
| MY118912A (en) * | 1996-09-04 | 2005-02-28 | Hoya Corp | Glass for information recording medium substrate and glass substrate |
| JP3011703B1 (ja) * | 1998-02-26 | 2000-02-21 | 株式会社オハラ | 情報磁気記憶媒体用高剛性ガラスセラミックス基板 |
| JP3022524B1 (ja) | 1998-02-26 | 2000-03-21 | 株式会社オハラ | 情報磁気記憶媒体用高剛性ガラスセラミックス基板 |
| JPH11278865A (ja) * | 1998-03-30 | 1999-10-12 | Ngk Insulators Ltd | 磁気ディスク基板用結晶化ガラス、磁気ディスク用基板、磁気ディスクおよび磁気ディスク基板用結晶化ガラスの製造方法 |
| JP2004288228A (ja) * | 2003-01-31 | 2004-10-14 | Hoya Corp | 情報記録媒体用基板、情報記録媒体およびその製造方法 |
| SG171640A1 (en) * | 2006-06-08 | 2011-06-29 | Hoya Corp | Glass for use in substrate for information recording medium, substrate for information recording medium and information recording medium, and their manufacturing method |
| EP2465828A4 (en) * | 2009-08-10 | 2014-03-26 | Hoya Corp | GLASS FOR MAGNETIC RECORDING MEDIUM SUBSTRATE, MAGNETIC RECORDING MEDIUM SUBSTRATE AND METHOD FOR PRODUCING THE SAME, AND MAGNETIC RECORDING MEDIUM |
| SG184235A1 (en) * | 2010-03-31 | 2012-10-30 | Hoya Corp | Method of manufacturing glass blank for magnetic recording medium glass substrate, method of manufacturing magnetic recording medium glass substrate, and method of manufacturing magnetic recording medium |
| US8394516B2 (en) * | 2010-10-29 | 2013-03-12 | Hoya Corporation | Glass substrate for magnetic recording medium and magnetic recording medium |
| SG10201605515PA (en) * | 2012-05-16 | 2016-09-29 | Hoya Corp | Glass for magnetic recording medium substrate and usage thereof |
| CN104364215A (zh) * | 2012-06-05 | 2015-02-18 | 旭硝子株式会社 | 无碱玻璃及其制造方法 |
| WO2013183569A1 (ja) * | 2012-06-05 | 2013-12-12 | 旭硝子株式会社 | 磁気ディスクの製造方法および情報記録媒体用ガラス基板 |
| CN103708724B (zh) * | 2012-09-29 | 2017-02-08 | 成都光明光电股份有限公司 | 精密模压用光学玻璃、玻璃预制件、光学元件及光学仪器 |
| JP2015005479A (ja) | 2013-06-24 | 2015-01-08 | 株式会社Ｇｓユアサ | 蓄電素子 |
| CN105517966B (zh) | 2013-09-09 | 2017-12-19 | Hoya株式会社 | 玻璃基板 |
| JP6131154B2 (ja) * | 2013-09-11 | 2017-05-17 | Hoya株式会社 | 磁気記録媒体基板用ガラスおよび磁気記録媒体基板 |
| JP2015224150A (ja) | 2014-05-27 | 2015-12-14 | 旭硝子株式会社 | 無アルカリガラスの製造方法 |
| US11081133B2 (en) * | 2016-11-14 | 2021-08-03 | Hoya Corporation | Glass for magnetic recording medium substrate, magnetic recording medium substrate, magnetic recording medium and glass spacer for magnetic recording and reproducing apparatus |
| JP7276645B2 (ja) * | 2017-08-08 | 2023-05-18 | 日本電気硝子株式会社 | 磁気記録媒体用ガラス基板 |
| CN120441191A (zh) * | 2019-07-22 | 2025-08-08 | Hoya株式会社 | 玻璃、磁记录介质基板、磁记录介质、磁记录再生装置用玻璃间隔物和磁记录再生装置 |
| CN114787093A (zh) * | 2019-12-13 | 2022-07-22 | 豪雅株式会社 | 磁记录介质基板用或磁记录再生装置用玻璃间隔物用的玻璃、磁记录介质基板、磁记录介质、磁记录再生装置用玻璃间隔物和磁记录再生装置 |
-
2020
- 2020-12-11 CN CN202080084350.4A patent/CN114787093A/zh active Pending
- 2020-12-11 JP JP2021564073A patent/JP7383050B2/ja active Active
- 2020-12-11 WO PCT/JP2020/046405 patent/WO2021117897A1/ja not_active Ceased
- 2020-12-11 MY MYPI2022002939A patent/MY208742A/en unknown
- 2020-12-11 US US17/784,528 patent/US11999652B2/en active Active
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2023
- 2023-08-22 JP JP2023134923A patent/JP7621437B2/ja active Active
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2024
- 2024-05-03 US US18/655,216 patent/US12473225B2/en active Active
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2025
- 2025-01-14 JP JP2025004745A patent/JP2025061251A/ja active Pending
- 2025-10-29 US US19/373,071 patent/US20260055020A1/en active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20120188663A1 (en) * | 2010-12-21 | 2012-07-26 | Hoya Corporation | Glass substrate for magnetic recording medium and its use |
| US20150087495A1 (en) * | 2012-06-05 | 2015-03-26 | Asahi Glass Company, Limited | Alkali-free glass and method for producing same |
| WO2019221102A1 (ja) * | 2018-05-16 | 2019-11-21 | Hoya株式会社 | 磁気記録媒体基板用ガラス、磁気記録媒体基板、磁気記録媒体、磁気記録再生装置用ガラススペーサおよび磁気記録再生装置 |
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| US12473225B2 (en) | 2025-11-18 |
| US11999652B2 (en) | 2024-06-04 |
| MY208742A (en) | 2025-05-27 |
| JP7383050B2 (ja) | 2023-11-17 |
| JPWO2021117897A1 (https=) | 2021-06-17 |
| JP2025061251A (ja) | 2025-04-10 |
| US20240286946A1 (en) | 2024-08-29 |
| JP7621437B2 (ja) | 2025-01-24 |
| US20260055020A1 (en) | 2026-02-26 |
| WO2021117897A1 (ja) | 2021-06-17 |
| JP2023166439A (ja) | 2023-11-21 |
| US20230192530A1 (en) | 2023-06-22 |
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