CN114729919A - Automatic measurement and analysis system for emission reduction efficiency of emission reduction facility for greenhouse gas exhausted in semiconductor and display process - Google Patents
Automatic measurement and analysis system for emission reduction efficiency of emission reduction facility for greenhouse gas exhausted in semiconductor and display process Download PDFInfo
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Abstract
The invention relates to an automatic measurement and analysis system for emission reduction efficiency of emission reduction facilities of greenhouse gases discharged in a semiconductor and display process, in particular to the following automatic measurement and analysis system for emission reduction efficiency of emission reduction facilities of greenhouse gases discharged in a semiconductor and display process: the calibration and measurement method can be automatically performed based on the emission reduction efficiency measurement method guideline (national environmental academy of sciences) for greenhouse gas emission reduction facilities used in the semiconductor and display industry, which is specified in the greenhouse gas emission amount calculation method (korean industrial standard KS H NEW2017) in the semiconductor and display process.
Description
Technical Field
The invention relates to an automatic measurement and analysis system for emission reduction efficiency of emission reduction facilities of greenhouse gases discharged in a semiconductor and display process, in particular to the following automatic measurement and analysis system for emission reduction efficiency of emission reduction facilities of greenhouse gases discharged in a semiconductor and display process: the calibration and measurement method can be automatically performed based on the emission reduction efficiency measurement method guideline (national environmental academy of sciences) for greenhouse gas emission reduction facilities used in the semiconductor and display industry, which is specified in the greenhouse gas emission amount calculation method (korean industrial standard KS H NEW2017) in the semiconductor and display process.
Background
At present, international standards have established rules and guidelines for use at a regulatory level for quantifying and reporting the emission and removal of greenhouse gases, rules and guidelines for use at a project level for quantifying, monitoring and reporting the emission and removal of greenhouse gases, and rules and guidelines for use at a plausibility evaluation and verification of greenhouse gas announcements.
In particular, accurate evaluation of greenhouse gas emission amount and concentration is a cornerstone for all climate change-based studies, and evaluation of greenhouse gas emission concentration with high reliability can be used not only as a substantial basic material for all climate change predictions and model studies, but also as a necessary material for ensuring substantial and reliable greenhouse gas monitoring data on greenhouse gas production if it is desired to effectively cope with climate change by performing climate change coping technology development, greenhouse gas emission reduction technology development, emission reduction policy, plan establishment, and the like.
For this reason, various measurement systems for measuring the emission amount and concentration of greenhouse gases have been developed, and a remote management system for monitoring the emission amount of greenhouse gases has been developed in korean registered patent No. 10-0696163 (registration date 03/12, 2007) as follows: the management system is characterized in that the management system is divided into 4 steps of a monitoring item setting step, a basic environment management (measurement system management) step, an actual Greenhouse Gas emission amount calculation step and an uncertainty management (QA/QC) step, and is executed for executing each step, and comprises an interface part with a communication protocol, a database server storing various baseline methods and measurement data, and an operation server searching information from the database server and calculating the information in a mode of conforming to the information, wherein the operation server is composed of a program providing part for providing a Greenhouse Gas emission amount calculation program and various measurement programs, and an operation processing part for processing the input information, which is connected with a general computer through the internet for a user to receive services on the internet.
In addition, an on-line monitoring system for stack exhaust gas was developed in korean registered patent No. 10-1359940 (registration date 2014, 02/03), which is characterized by comprising: an exhaust gas inflow port 110 into which exhaust gas flows; a sample collection unit 200 for collecting the absorption liquid and the exhaust gas by a physical or chemical reaction; an ion analysis unit 400 for measuring the concentration of an ionic component by separating ionic substances in the sample collected by the sample collection unit 200 by ion chromatography; and a control unit 600 for controlling the on-line monitoring operation and the calibration operation in advance of the stack exhaust gas, generating a multi-point calibration curve in various concentration ranges using the standard solution, measuring the concentration of the calibration curve in a range in which the standard gas can be measured, storing the measured concentration, and generating a calibration curve based on the standard gas based on a correlation equation obtained by comparing the concentration measurement result of the standard gas and the concentration measurement result of the standard solution stored in the program of the control unit to perform calibration.
Further, korean registered patent No. 10-1662609 (registration date 2016, 09/28) discloses a real-time continuous monitoring system for exhaust gas concentration having a plurality of chambers, comprising: a plurality of chambers 100 including a lid, a fan, a sample collection port, and a sample reduction port; a chamber management unit 200 connected to the plurality of chambers 100, controlling a cover and a fan of each chamber 100, and monitoring temperature and pressure; a first transmission line 150, one side of which is connected to the sample sampling port of each chamber 100; a second transmission line 160 having one side connected to the sample reduction port of each chamber 100; a plurality of gas spectrum analyzers 300 including a gas inlet and a gas outlet, the gas inlet being connected to the other side of the first transfer line 150 and analyzing the composition of the gas flowing in from the first transfer line 150; a plurality of flowmeters 400, one side of which is connected to the gas outlet of the gas spectrum analyzer 300, and which measure the flow rate of the gas discharged from the gas spectrum analyzer 300; a plurality of pumps 500 each including a suction part connected to the other side of the flowmeter 400 and a discharge part connected to the other side of the second transmission line 160; a management unit 600 connected to the chamber management unit 200, the plurality of gas spectrum analysis units 300, the flow meter 400, and the pump 500, for managing information transmitted from the chamber management unit 200, the gas spectrum analysis units 300, and the flow meter 400, and for controlling the pumps 500 to control the flow of gas in a flow path connected from the sample collection port to the sample reduction port; and a user terminal unit 700 connected to the management unit 600, for transmitting a control command to the management unit 600 and monitoring information received from the management unit 600 in real time, wherein the plurality of chambers 100 are divided into a plurality of chamber groups each having the same cycle, the chambers are sealed at different time periods, the concentration of the exhaust gas in the same chamber group is measured at the same time period, the gas exhaust concentration is continuously monitored for 24 hours by the user terminal unit 700, the gas exhaust concentration is calculated during the time period of the sealed chamber by using data of the mole fraction of the gas in the chamber, the sealing performance of the chamber is analyzed based on the amount of change in the mole fraction of the gas in the chamber, the performance of the fan is analyzed based on the time when the mole fraction of the gas in the chamber is similar to the mole fraction in the atmosphere, the data of the time-overlapped period of the closed chamber is analyzed after the time period when the chamber groups are closed is overlapped at a certain time period, the reliability of the gas vent concentration measurement is determined by comparing the amount of change in the mole fraction of the gas within the chamber during the initial time of closing the chamber to the amount of change in the mole fraction of the gas within the chamber during the final time of closing the chamber.
Further, korean laid-open patent No. 10-2019-0008771 (publication date 2019, 01/25) discloses an efficiency measuring system of a greenhouse gas emission reduction facility as an efficiency measuring system of a greenhouse gas emission reduction facility connected to a QMS (quadrapole Mass Spectrometer), wherein the efficiency measuring system of a greenhouse gas emission reduction facility includes: a gas injection port into which a measurement component is injected; an auto calibration system (auto calibration system) connected to a branch pipe of the gas injection port, for calibrating the concentration of each of the injected measurement components; a pin-hole (pin-hole) located in a pipe connecting the gas injection port and the automatic calibration device; and auto calculation software (auto calculation S/W) respectively connected to the QMS and the auto-calibration device, for automatically calculating a removal efficiency (DRE) of the emission reduction facility based on the concentrations of the respective measurement components.
However, the above measurement system has the following problems: fluorine compounds such as CF4, C2F6, C3F8, C-C4F8, C-C4F8O, C4F6, C5F8, CHF3, CH2F2, NF3, and SF6, which are used for producing semiconductors and displays, and by-products thereof, that is, CF4, C2F6, CHF3, and C3F8, cannot be measured.
Therefore, in order to calculate the greenhouse gas emission amounts of fluorine compounds such as CF4, C2F6, C3F8, C-C4F8, C-C4F8O, C4F6, C5F8, CHF3, CH2F2, NF3 and SF6 and Non-CO2 greenhouse gas such as N2O, a greenhouse gas emission amount calculation method in semiconductor and display processes was established 12 months and 1 days in 2017 (Korean Industrial Standard KS H NEW 2017).
In particular, in the above-described method for calculating an emission amount of greenhouse gases in semiconductor and display processes (korean industrial standard KS H NEW2017), emission reduction efficiency of a greenhouse gas emission reduction facility is measured using emission reduction efficiency measurement method guidelines for a greenhouse gas emission reduction facility used in the semiconductor and display industry established by the national environmental academy.
The emission reduction efficiency measuring method criterion of the greenhouse gas emission reduction facility used in the semiconductor and display industry is suitable forMeasurement of various greenhouse gases (PFCs, HFCs, SF) for vapor deposition (CVD) and Etching (ETCH) in semiconductor and display manufacturing processes6And N2O, etc.) the treatment efficiency of the abatement facility, as shown in fig. 1, specifies the following: in a normal production process of a semiconductor and display process facility, in order to measure total flow rates of an inlet port and an outlet port, Kr gas is injected into the inlet port (He gas may be used instead of Kr when He is not used in the process), QMS is used for the inlet port and the outlet port of an emission reduction facility to measure a concentration of Kr gas, and FT-IR is used for measuring a concentration of fluorine-based greenhouse gas (F-GHG), thereby measuring a removal efficiency (DRE) of the emission reduction facility.
However, in the case of the emission reduction efficiency measuring method based on the emission reduction efficiency measuring method guideline for greenhouse gas emission reduction facilities used in the semiconductor and display industry, calibration of QMS and FT-IR and measurement of emission reduction efficiency have been performed by means of the respective measuring equations and by manual work so far in addition to the related measuring devices of QMS and FT-IR, and no research and development has been made on an automated system for realizing automatic measurement.
Disclosure of Invention
Technical subject
The present invention has been made to solve the above conventional problems, and a technical object of the present invention is to provide an automatic emission reduction efficiency measurement and analysis system for a facility for reducing emission of greenhouse gases emitted in a semiconductor and display process, the automatic emission reduction efficiency measurement and analysis system including: in the semiconductor and display process, calibration and measurement methods are automatically performed based on emission reduction efficiency measurement method guidelines (national environmental academy of sciences) for emission reduction facilities of greenhouse gases used or generated in the semiconductor and display industry, which are specified in the greenhouse gas emission amount calculation method (korean industrial standard KS H NEW 2017).
Means for solving the problems
In order to solve the above problems, the present invention provides an automatic measurement and analysis system for emission reduction efficiency of a facility for emission reduction of greenhouse gas emitted in a semiconductor and display process, wherein the automatic measurement and analysis system for emission reduction efficiency of a facility for emission reduction of greenhouse gas selected from the group consisting of fluorine compounds of CF4, C2F6, C3F8, C-C4F8, C-C4F8O, C4F6, C5F8, CHF3, CH2F2, NF3, SF6, and N2O, which are used or generated during deposition (CVD) and Etching (ETCH) in a semiconductor and display production process, the automatic measurement and analysis system comprising: a Kr gas supply device for measuring an inflow and an outflow of the emission reduction facility; a flow rate controller (MFC) that controls an injection amount of the Kr gas; a QMS (quadrapole Mass Spectrometer) which measures the concentration of Kr gas at the inflow port and outflow port of the emission reduction facility, respectively, and measures the total gas flow rate including the greenhouse gas; and an FT-IR (Fourier Transform Infrared Spectrometer) measuring concentrations of the greenhouse gases at an inflow port and an outflow port of the emission reduction facility, respectively, the QMS (quadrapole Mass Spectrometer) including a display unit to which analysis data is output and controlled by automatic analysis control software for Real-time (Real time) on-line analysis, the display unit including: a simulation scan (Analog Sacn) screen outputting a real-time measurement result including the total gas flow and ion current (ion current) of the greenhouse gas; a Calibration (Calibration) screen for outputting a Calibration curve using a standard substance, wherein a correlation coefficient R2 is 0.98 or more, the concentration at the center of the Calibration curve is repeatedly measured 5 times or more, and a Calibration condition is input and a Calibration curve is output so that a relative error σ is less than ± 5%; a Flow Monitoring (Flow Monitoring) screen that outputs a real-time measurement result including the total gas Flow rate of the greenhouse gas and the ion current (ion current) of each component of the total gas; and a Concentration Monitoring (Concentration Monitoring) screen that outputs a graph of a Concentration change of each component of the total gas and a real-time measurement result of an ion current of each component of the total gas.
As a technical solution, the above-mentioned Analog scan (Analog Sacn) screen includes: a graph output unit that shows an ion current (Y-axis) with respect to a total gas flow rate (X-axis) including the greenhouse gas; a flow rate display unit that displays the total gas flow rate including the greenhouse gas; and an ion current (ion current) display unit for displaying the total gas including the greenhouse gas.
As a technical solution, the Calibration (Calibration) frame includes: a standard substance concentration control input unit; a flow controller (MFC) control input; a calibration curve output unit that shows an ion current (Y-axis) with respect to the standard substance concentration (X-axis); a calibration standard display unit that shows that the correlation coefficient R2 is 0.98 or more and the relative error σ is less than ± 5%; and a graph output unit that shows ion current (Y-axis) of each component of the standard substance with respect to a measurement time (X-axis).
As a technical solution, the standard substance is a gas produced by mixing each component of the exhaust gas components generated in the semiconductor and display manufacturing process at a specific concentration.
As a technical solution, the Flow Monitoring (Flow Monitoring) screen includes: a flow rate graph output unit for each time, which shows the total gas flow rate (Y-axis) including the greenhouse gas with respect to the measurement time (X-axis); and a graph output unit that shows ion current (Y-axis) of each component of the total gas including the greenhouse gas with respect to a measurement time (X-axis).
As a technical solution, the Concentration Monitoring (Concentration Monitoring) screen includes: a concentration change graph output unit that shows a change in concentration (Y-axis) of each component of the total gas including the greenhouse gas with respect to a measurement time (X-axis); and a graph output unit that shows ion current (Y-axis) of each component of the total gas including the greenhouse gas with respect to a measurement time (X-axis).
Effects of the invention
The automatic measurement and analysis system for emission reduction efficiency of a facility for emission reduction of greenhouse gases emitted in a semiconductor and display process according to the present invention can automatically perform a calibration and measurement method based on the emission reduction efficiency measurement method criteria (national environmental academy) for a facility for emission reduction of greenhouse gases used or generated in the semiconductor and display industry, which is defined in the method for calculating emission amount of greenhouse gases in a semiconductor and display process (korean industrial standard KS H NEW2017), and thus has an excellent effect of being able to quickly and accurately measure the emission reduction efficiency of a facility for emission reduction of greenhouse gases, compared to the conventional method of performing manual work by using a measurement equation and hands.
Drawings
FIG. 1 is a flowchart of a process for measuring the treatment efficiency of a greenhouse gas emission reduction facility.
Fig. 2 is a diagram showing a simulation scan (Analog Sacn) screen of the present invention.
Fig. 3 is a diagram showing a Calibration (Calibration) screen of the present invention.
Fig. 4 is a diagram showing a Flow Monitoring (Flow Monitoring) screen according to the present invention.
Fig. 5 is a view showing a Concentration Monitoring (Concentration Monitoring) screen according to the present invention.
Detailed Description
The technical scheme of the invention is characterized in that the automatic measurement and analysis system for the emission reduction efficiency of the emission reduction facility of the greenhouse gas exhausted in the semiconductor and display process is used for measuring the emission reduction efficiency of the emission reduction facility of the greenhouse gas selected from CF4, C2F6, C3F8, C-C4F8, C-C4F8O, C4F6, C5F8, CHF3, CH2F2, NF3 and SF6 or N2O, which is used or generated in the evaporation (CVD) and Etching (ETCH) in the semiconductor and display production process, and comprises the following steps: a Kr gas supply device for measuring an inflow and an outflow of the emission reduction facility; a flow rate controller (MFC) that controls an injection amount of the Kr gas; a QMS (quadrapole Mass Spectrometer) which measures the concentration of Kr gas at the inflow port and outflow port of the emission reduction facility, respectively, and measures the total gas flow rate including the greenhouse gas; and an FT-IR (Fourier Transform Infrared Spectrometer) measuring concentrations of the greenhouse gases at an inflow port and an outflow port of the emission reduction facility, respectively, the QMS (quadrapole Mass Spectrometer) including a display unit to which analysis data is output and controlled by automatic analysis control software for Real-time (Real time) on-line analysis, the display unit including: a simulation scan (Analog Sacn) screen outputting a real-time measurement result including the total gas flow rate and the ion current (ion current) of the greenhouse gas; a Calibration (Calibration) screen for outputting a Calibration curve using a standard substance, wherein a correlation coefficient R2 is 0.98 or more, the concentration at the center of the Calibration curve is repeatedly measured 5 times or more, and a Calibration condition is input and a Calibration curve is output so that a relative error σ is less than ± 5%; a Flow Monitoring (Flow Monitoring) screen that outputs a real-time measurement result including the total gas Flow rate of the greenhouse gas and the ion current (ion current) of each component of the total gas; and a Concentration Monitoring (Concentration Monitoring) screen that outputs a graph of a Concentration change of each component of the total gas and a real-time measurement result of an ion current of each component of the total gas.
The technical solution is characterized in that the Analog scan (Analog Sacn) screen includes: a graph output unit that shows an ion current (Y-axis) with respect to a total gas flow rate (X-axis) including the greenhouse gas; a flow rate display unit that displays the total gas flow rate including the greenhouse gas; and an ion current (ion current) display unit for displaying the total gas including the greenhouse gas.
The technical solution is characterized in that the Calibration (Calibration) frame includes: a standard substance concentration control input unit; a flow controller (MFC) control input; a calibration curve output unit that shows an ion current (Y-axis) with respect to the standard substance concentration (X-axis); a calibration standard display unit that shows that the correlation coefficient R2 is 0.98 or more and the relative error σ is less than ± 5%; and a graph output unit that shows ion current (Y-axis) of each component of the standard substance with respect to a measurement time (X-axis).
The standard substance is a gas produced by mixing each component of the exhaust gas components generated in the semiconductor and display production process at a specific concentration.
The Flow Monitoring (Flow Monitoring) screen includes: a flow rate graph output unit for each time, which shows the total gas flow rate (Y-axis) including the greenhouse gas with respect to the measurement time (X-axis); and a graph output unit that shows ion current (Y-axis) of each component of the total gas including the greenhouse gas with respect to a measurement time (X-axis).
The Concentration Monitoring (Concentration Monitoring) screen includes: a concentration change graph output unit that shows changes in the concentration (Y-axis) of each component of the total gas including the greenhouse gas with respect to a measurement time (X-axis); and a graph output unit that shows ion current (Y-axis) of each component of the total gas including the greenhouse gas with respect to a measurement time (X-axis).
The present invention will be described in detail below with reference to examples and drawings, and those skilled in the art can easily practice the present invention. However, the present invention may be embodied in various forms, and is not limited to the embodiments and drawings described herein.
First, as shown in fig. 1, the automatic emission reduction efficiency measurement and analysis system for an emission reduction facility of greenhouse gases emitted in a semiconductor and display process according to the present invention includes, in order to measure emission reduction efficiencies of emission reduction facilities of greenhouse gases selected from the group consisting of fluorine compounds of CF4, C2F6, C3F8, C-C4F8, C-C4F8O, C4F6, C5F8, CHF3, CH2F2, NF3, SF6, and N2O, which are used or generated at the time of evaporation (CVD) and Etching (ETCH) in a semiconductor and display production process: a Kr gas supply device for measuring an inflow and an outflow of the emission reduction facility; a flow rate controller (MFC) that controls an injection amount of the Kr gas; a QMS (quadrapole Mass Spectrometer) which measures the concentration of Kr gas at the inflow port and outflow port of the emission reduction facility, respectively, and measures the total gas flow rate including the greenhouse gas; and an FT-IR (Fourier Transform Infrared Spectrometer) that measures the concentration of the greenhouse gas at an inflow port and an outflow port of the emission reduction facility, respectively, and the QMS (quadrapole Mass Spectrometer) includes a display unit to which analysis data is output and controlled by automatic analysis control software for Real-time (Real time) on-line analysis.
In this case, the display unit includes: a simulation scan (Analog Sacn) screen outputting a real-time measurement result including the total gas flow and ion current (ion current) of the greenhouse gas; a Calibration (Calibration) screen for outputting a Calibration curve using a standard substance, wherein a correlation coefficient R2 is 0.98 or more, the concentration at the center of the Calibration curve is repeatedly measured 5 times or more, and a Calibration condition is input and a Calibration curve is output so that a relative error σ is less than ± 5%; a Flow Monitoring (Flow Monitoring) screen that outputs a real-time measurement result including the total gas Flow rate of the greenhouse gas and the ion current (ion current) of each component of the total gas; and a Concentration Monitoring (Concentration Monitoring) screen that outputs a graph of a Concentration change of each component of the total gas and a real-time measurement result of an ion current of each component of the total gas.
In the calibration of the standard substance using the QMS (quadrapole Mass Spectrometer), the FT-IR and QMS calibrations are based on the principle of measuring an 8-Point calibration Point (calibration Point) after measuring an 8-Point calibration Point using a calibration device and a standard substance (at least, a secondary standard substance or more) and are used in AM0078(Point of Use absorption device to Reduce emission related CDM industry SF6 emissions in LCD Manufacturing Operations) which is a relevant CDM industry SF6 emission reduction method for calibration and measurement of the emission reduction efficiency of emission reduction facilities based on the emission reduction efficiency measurement method criteria (national environmental academy) of greenhouse gases used or generated in the semiconductor and display industry. (if the measurement is performed at a 5-point calibration point, it can be used as long as the correlation coefficient R2 is satisfied to be 0.98 or more).
The calibration procedure described above is briefly summarized as follows: the concentration of the calibration point is adjusted by controlling the flow rate of the flow rate controller in the calibration device, and the calibration point of the highest concentration is the concentration of the undiluted standard substance. The concentration at the following calibration point was measured at 8 points by increasing the flow rate of the diluent gas (balance gas N2, 5N) and decreasing the flow rate uniformly, thereby performing calibration for alignment.
At this time, the measurement data at each calibration point is measured using a minimum measurement average value of 20 points or more. When the linearity calibration is completed, the midpoint concentration of the calibration curve is repeatedly measured 5 times or more so that the relative error σ becomes less than ± 5%.
However, as described above, since the preparation of the calibration curve depends on mathematical expressions and manual work, there is a problem that the emission reduction efficiency of the greenhouse gas emission reduction facility cannot be measured quickly and accurately, and in order to solve the problem, a QMS (Quadrupole Mass Spectrometer) used in the present invention includes a display unit to which analysis data is output and controlled by automatic analysis control software for Real-time (Real time) online analysis, and the display unit includes: a simulation scan (Analog Sacn) screen outputting a real-time measurement result including the total gas flow and ion current (ion current) of the greenhouse gas; a Calibration (Calibration) screen for outputting a Calibration curve using a standard substance, wherein a correlation coefficient R2 is 0.98 or more, and the Calibration condition and the Calibration curve are input and output such that the central concentration of the Calibration curve is repeatedly measured 5 times or more and the relative error σ is less than ± 5%; a Flow Monitoring (Flow Monitoring) screen that outputs a real-time measurement result including a total gas Flow rate of the greenhouse gas and an ion current (ion current) of each component of the total gas; a Concentration Monitoring (Concentration Monitoring) screen that outputs a graph of a change in Concentration of each component of the total gas and a result of real-time measurement of an ion current (ion current) of each component of the total gas, thereby enabling automatic calibration of QMS, automatic measurement of the total gas flow rate including the greenhouse gas, and automatic measurement of emission reduction efficiency, as characteristic configurations and effects.
Here, the QMS (quadrapole Mass Spectrometer) performs automatic calibration of the QMS, automatic measurement of the total gas flow rate including the greenhouse gas, and automatic measurement of emission reduction efficiency, and is performed by automatic analysis control software for performing Real time on-line analysis.
In addition, regarding the emission reduction efficiency described above, the total amount of each greenhouse gas measured by FT-IR will be calculated separately while the total amount of gases including greenhouse gases simultaneously measured at the inflow port and the outflow port of the emission reduction facility during the process cycle is integrated by QMS, and the calculation algorithm thereof is as follows, which is performed by automatic analysis control software.
Emission reduction efficiency (DRE) ═ 100% (1-Vout/Vin)%
Vin total amount of individual greenhouse gases (SL-Standard Liter) flowing into the abatement facility during a normally operating process cycle
Vout-Total amount of respective greenhouse gases (SL-Standard Liter) emitted by abatement facility during a normally operating process cycle
In the above formula, Vin and Vout are total cumulative flow rates of F-GHG (fluorinated greenhouse gas) measured at the inflow/outflow port during a certain period of time, and are calculated by the following formula.
(Vi: denoted by in and out (sl), Δ t: measurement period of FT-IT, Fi: Total flow (SLM), Ci: FGHF gas measurement concentration (ppmv))
In particular, in the present invention, by a combination of FT-IR that measures the amount of greenhouse gas and QMS system that measures the entire flow rate including the gas, for example, although 90% reduction amount of greenhouse gas is measured, if the dilution amount is increased by a factor of 10, only 9% reduction can be achieved.
Therefore, in the present invention, a QMS (quadrapole Mass Spectrometer) that can measure a monatomic molecular gas is used because the total amount of trace gas (tracer gas) used for the purpose of correcting emission reduction by dilution is measured and reflected in the measurement of the amount of emission reduction by the QMS (quadrapole Mass Spectrometer), and at this time, the trace gas (tracer gas) used for the measurement of the dilution amount is used for the entire process or a gas (gas) that cannot generate a by-product (typically Kr) is used.
On the other hand, referring to fig. 2, in the present invention, the Analog scan (Analog Sacn) screen includes: a graph output unit 101 that shows an ion current (Y-axis) with respect to the total gas flow rate (X-axis) including the greenhouse gas; a flow rate display unit 102 that displays the total gas flow rate including the greenhouse gas; an ion current (ion current) display unit 103 for all gases including the greenhouse gas.
That is, the total gas flow rate including the greenhouse gas and the total amount of the ion current are uniformly measured and output on the Analog scan (Analog Sacn) screen.
As shown in fig. 3, the Calibration (Calibration) screen includes: the standard substance concentration control input unit 201; a flow controller (MFC) control input 202; a calibration curve output unit 203 for showing an ion current (Y-axis) with respect to the standard substance concentration (X-axis); a calibration standard display unit 204 that shows that the correlation coefficient R2 is 0.98 or more and the relative error σ is less than ± 5%; and a graph output unit 205 for showing the ion current (Y-axis) of each component of the standard substance with respect to the measurement time (X-axis).
That is, in order to verify the total amount of the gas Flow and the ion current (ion current) including the greenhouse gas output from the simulation scan (Analog Sacn) screen, the Calibration screen outputs a Calibration curve using a standard substance, the linearity (correlation coefficient, R2) of the Calibration curve and the relative standard deviation σ of the Calibration curve point value are automatically calculated, the Flow Monitoring (Flow Monitoring) described below is executed when the linearity (correlation coefficient, R2) value is 0.98 or more, that is, R2 is not less than 0.98, and the relative standard deviation σ value is ± 5% or less, that is, σ is not more than ± 5%, and when the level is not reached, the Calibration condition is input again and re-measurement is performed.
In this case, the standard substance used is a gas produced by mixing each component of the exhaust gas components generated in the semiconductor and display production process at a specific concentration.
As shown in fig. 4, the Flow Monitoring (Flow Monitoring) screen includes: a flow rate graph output unit 301 for each time, which shows the total gas flow rate (Y-axis) including the greenhouse gas with respect to the measurement time (X-axis); and a graph output unit 302 that shows ion current (Y-axis) of each component of the total gas including the greenhouse gas with respect to the measurement time (X-axis).
That is, when a Calibration standard in which a linearity (correlation coefficient, R2) value of a Calibration curve outputted to a Calibration (Calibration) screen is 0.98 or more and a relative standard deviation σ value is ± 5% or less is satisfied, an ion current (ion current) including the total gas flow rate of the greenhouse gas and each component of the total gas is measured.
As shown in fig. 5, the Concentration Monitoring (Concentration Monitoring) screen includes: a concentration change graph output unit 401 that shows changes in the concentration (Y-axis) of each component of the total gas including the greenhouse gas with respect to the measurement time (X-axis); and a graph output unit 402 that shows ion current (Y-axis) of each component of the total gas including the greenhouse gas with respect to the measurement time (X-axis).
In this case, when the Concentration change curve showing the change in the Concentration (Y axis) of each component of the total gas including the greenhouse gas with respect to the measurement time (X axis) shows a substantially uniform tendency, the Concentration Monitoring (Concentration Monitoring) screen can measure a uniform emission reduction efficiency.
As described above, the emission reduction efficiency is measured by measuring the total gas flow rate of the greenhouse gas, the ion current (ion current) of each component of the total gas, and the concentration of the greenhouse gas based on FT-IR at the inflow port and the outflow port of the emission reduction facility.
The above description is merely an exemplary description of the technical idea of the present invention, and those skilled in the art can make various modifications and variations without departing from the essential characteristics of the present invention. Therefore, the embodiments and drawings disclosed in the present invention do not limit the technical spirit of the present invention, but explain the present invention, and the scope of the technical spirit of the present invention is not limited to the embodiments and drawings. The scope of the invention should be construed by the claims that follow, and all technical ideas within the same scope are included in the scope of the claims.
Industrial applicability of the invention
The automatic measurement and analysis system for emission reduction efficiency of a facility for emission reduction of greenhouse gases emitted in a semiconductor and display process according to the present invention can automatically perform a calibration and measurement method based on the emission reduction efficiency measurement method criteria (national environmental academy) for the facility for emission reduction of greenhouse gases used or generated in the semiconductor and display industry, which is defined in the method for calculating emission amount of greenhouse gases in the semiconductor and display process (korean industrial standard KS H NEW2017), and thus has an excellent effect of being able to quickly and accurately measure the emission reduction efficiency of the facility for emission reduction of greenhouse gases, compared to the conventional method of performing manual work by using a measurement equation and hands, and thus can be industrially used.
Claims (6)
1. An automatic measurement and analysis system for emission reduction efficiency of emission reduction facilities of greenhouse gases emitted in semiconductor and display processes is characterized in that,
for measuring the use or generation of a gas selected from CF during evaporation (CVD) and Etching (ETCH) in semiconductor and display manufacturing processes4、C2F6、C3F8、c-C4F8、c-C4F8O、C4F6、C5F8、CHF3、CH2F2、NF3、SF6Or N is fluorine compound2Emission reduction efficiency of an emission reduction facility for greenhouse gases of O, comprising:
a Kr gas supply device for measuring an inflow and an outflow of the emission reduction facility;
a flow rate controller (MFC) that controls an injection amount of the Kr gas;
a quadrupole Mass spectrometer (qms) (quadrupole Mass spectrometer) for measuring a concentration of Kr gas at an inflow port and an outflow port of the emission reduction facility, respectively, and measuring a total gas flow rate including the greenhouse gas; and
a Fourier Transform Infrared Spectrophotometer (FT-IR) for measuring the concentration of the greenhouse gas at the inflow port and the outflow port of the emission reduction facility,
the quadrupole Mass spectrometer, qms (quadrapole Mass spectrometer), includes a display unit to which analysis data is output and controlled by automatic analysis control software for Real time (Real time) on-line analysis,
the display unit includes: a simulation scan (Analog Sacn) screen outputting a real-time measurement result including the total gas flow and ion current (ion current) of the greenhouse gas; calibration (Calibration) frame, which outputs Calibration curve, correlation coefficient (R) using standard substance2) Repeatedly measuring the central concentration of the calibration curve for 5 times or more, and outputting the calibration curve while inputting calibration conditions so that the relative error (σ) is less than ± 5%; a Flow Monitoring (Flow Monitoring) screen that outputs a real-time measurement result including the total gas Flow rate of the greenhouse gas and the ion current (ion current) of each component of the total gas; and a Concentration Monitoring (Concentration Monitoring) screen that outputs a graph of a Concentration change of each component of the total gas and a real-time measurement result of an ion current of each component of the total gas.
2. The system for automatic measurement and analysis of emission reduction efficiency of facility for emission reduction of greenhouse gases emitted in semiconductor and display processes according to claim 1,
the Analog scan (Analog Sacn) screen includes: a graph output unit (101) that shows an ion current (Y-axis) for all gas flow rates (X-axis) including the greenhouse gas; a flow rate display unit (102) that displays the total gas flow rate including the greenhouse gas; and an ion current display unit (103) for displaying the ion current (ion current) of all the gases including the greenhouse gas.
3. The automatic measurement and analysis system for emission reduction efficiency of an emission reduction facility for greenhouse gases emitted in semiconductor and display processes according to claim 1,
the Calibration (Calibration) frame includes: the standard substance concentration control input part (201); a flow controller (MFC) control input (202); a calibration curve output unit (203) that shows the ion current (Y-axis) with respect to the standard substance concentration (X-axis); a calibration standard display unit (204) which displays the correlation coefficient (R)2) 0.98 or more and a relative error (σ) of less than ± 5%; and a graph output unit (205) that shows the ion current (Y-axis) of each component of the standard substance with respect to the measurement time (X-axis).
4. The automatic measurement and analysis system for emission reduction efficiency of an emission reduction facility for greenhouse gases emitted in semiconductor and display processes according to claim 1 or 3,
the standard substance is a gas produced by mixing each component of the exhaust gas components generated in the semiconductor and display production process at a specific concentration.
5. The system for automatic measurement and analysis of emission reduction efficiency of facility for emission reduction of greenhouse gases emitted in semiconductor and display processes according to claim 1,
the Flow Monitoring (Flow Monitoring) screen includes: a flow rate graph output unit (301) for each time, which shows the total gas flow rate (Y-axis) including the greenhouse gas with respect to the measurement time (X-axis); and a graph output unit (302) that shows ion current (Y-axis) of each component of the total gas including the greenhouse gas with respect to a measurement time (X-axis).
6. The system for automatic measurement and analysis of emission reduction efficiency of facility for emission reduction of greenhouse gases emitted in semiconductor and display processes according to claim 1,
the Concentration Monitoring (Concentration Monitoring) screen includes: a concentration change graph output unit (401) that shows changes in the concentration (Y-axis) of each component of the total gas including the greenhouse gas with respect to a measurement time (X-axis); and a graph output unit (402) that shows ion current (Y-axis) of each component of the total gas including the greenhouse gas with respect to a measurement time (X-axis).
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| KR10-2019-0166319 | 2019-12-13 | ||
| KR1020190166319A KR102154671B1 (en) | 2019-03-27 | 2019-12-13 | Reduction efficiency measurement and analysis automation system for reduction facility of greenhouse gas emissions in semiconduct and display process |
| PCT/KR2020/012688 WO2021118022A1 (en) | 2019-03-27 | 2020-09-21 | System for automatically measuring and analyzing reduction efficiency of semiconductor and display process emission greenhouse gas reduction facilities |
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