CN114709150A - Gallium diffusion equipment and process for manufacturing high-voltage protection device - Google Patents
Gallium diffusion equipment and process for manufacturing high-voltage protection device Download PDFInfo
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- CN114709150A CN114709150A CN202210327901.6A CN202210327901A CN114709150A CN 114709150 A CN114709150 A CN 114709150A CN 202210327901 A CN202210327901 A CN 202210327901A CN 114709150 A CN114709150 A CN 114709150A
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- 238000009792 diffusion process Methods 0.000 title claims abstract description 68
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 title claims abstract description 45
- 229910052733 gallium Inorganic materials 0.000 title claims abstract description 45
- 238000000034 method Methods 0.000 title claims abstract description 28
- 230000008569 process Effects 0.000 title claims abstract description 21
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 20
- 239000006185 dispersion Substances 0.000 claims abstract description 92
- 238000001816 cooling Methods 0.000 claims abstract description 86
- 238000010438 heat treatment Methods 0.000 claims abstract description 64
- 230000001681 protective effect Effects 0.000 claims abstract description 25
- 238000005485 electric heating Methods 0.000 claims abstract description 22
- 238000009434 installation Methods 0.000 claims abstract description 15
- 239000007789 gas Substances 0.000 claims description 56
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 53
- 238000006243 chemical reaction Methods 0.000 claims description 51
- 230000000694 effects Effects 0.000 claims description 29
- 230000000149 penetrating effect Effects 0.000 claims description 28
- 230000005540 biological transmission Effects 0.000 claims description 26
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 24
- 229910052710 silicon Inorganic materials 0.000 claims description 24
- 239000010703 silicon Substances 0.000 claims description 24
- 230000003647 oxidation Effects 0.000 claims description 21
- 238000007254 oxidation reaction Methods 0.000 claims description 21
- 238000012545 processing Methods 0.000 claims description 20
- 238000003860 storage Methods 0.000 claims description 20
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 15
- 239000000126 substance Substances 0.000 claims description 14
- 239000010453 quartz Substances 0.000 claims description 13
- 239000007788 liquid Substances 0.000 claims description 12
- 238000004321 preservation Methods 0.000 claims description 12
- 238000001914 filtration Methods 0.000 claims description 11
- 239000002912 waste gas Substances 0.000 claims description 11
- 230000000903 blocking effect Effects 0.000 claims description 10
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 claims description 8
- 239000002253 acid Substances 0.000 claims description 8
- 238000000151 deposition Methods 0.000 claims description 8
- 238000006386 neutralization reaction Methods 0.000 claims description 8
- 238000001259 photo etching Methods 0.000 claims description 8
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 claims description 6
- 229910052796 boron Inorganic materials 0.000 claims description 6
- 239000012295 chemical reaction liquid Substances 0.000 claims description 5
- 238000004140 cleaning Methods 0.000 claims description 5
- 238000003825 pressing Methods 0.000 claims description 5
- 241001075561 Fioria Species 0.000 claims description 4
- 238000004061 bleaching Methods 0.000 claims description 4
- 239000011248 coating agent Substances 0.000 claims description 4
- 238000000576 coating method Methods 0.000 claims description 4
- 230000008021 deposition Effects 0.000 claims description 4
- 238000005530 etching Methods 0.000 claims description 4
- 229910021421 monocrystalline silicon Inorganic materials 0.000 claims description 4
- 238000002791 soaking Methods 0.000 claims description 4
- 238000010521 absorption reaction Methods 0.000 claims description 3
- 230000008676 import Effects 0.000 claims description 2
- 238000005057 refrigeration Methods 0.000 description 29
- 235000012431 wafers Nutrition 0.000 description 27
- 235000012239 silicon dioxide Nutrition 0.000 description 13
- 230000001276 controlling effect Effects 0.000 description 11
- 239000012159 carrier gas Substances 0.000 description 10
- 239000013078 crystal Substances 0.000 description 9
- 238000007789 sealing Methods 0.000 description 5
- 238000000605 extraction Methods 0.000 description 3
- 230000003472 neutralizing effect Effects 0.000 description 3
- 230000009471 action Effects 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 230000008602 contraction Effects 0.000 description 2
- 239000000498 cooling water Substances 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000001125 extrusion Methods 0.000 description 2
- 238000011068 loading method Methods 0.000 description 2
- 238000012423 maintenance Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 2
- 229910010271 silicon carbide Inorganic materials 0.000 description 2
- 231100000331 toxic Toxicity 0.000 description 2
- 230000002588 toxic effect Effects 0.000 description 2
- 241000196324 Embryophyta Species 0.000 description 1
- 241000521257 Hydrops Species 0.000 description 1
- 206010030113 Oedema Diseases 0.000 description 1
- 238000009825 accumulation Methods 0.000 description 1
- 239000002775 capsule Substances 0.000 description 1
- 230000006835 compression Effects 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 229910021419 crystalline silicon Inorganic materials 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 230000009970 fire resistant effect Effects 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 239000007943 implant Substances 0.000 description 1
- 238000012994 industrial processing Methods 0.000 description 1
- 238000005468 ion implantation Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 238000005192 partition Methods 0.000 description 1
- 230000001012 protector Effects 0.000 description 1
- 239000012495 reaction gas Substances 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67098—Apparatus for thermal treatment
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/02—Elements
- C30B29/06—Silicon
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B31/00—Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor
- C30B31/06—Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor by contacting with diffusion material in the gaseous state
- C30B31/10—Reaction chambers; Selection of materials therefor
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B31/00—Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor
- C30B31/06—Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor by contacting with diffusion material in the gaseous state
- C30B31/14—Substrate holders or susceptors
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- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B31/00—Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor
- C30B31/06—Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor by contacting with diffusion material in the gaseous state
- C30B31/16—Feed and outlet means for the gases; Modifying the flow of the gases
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B33/00—After-treatment of single crystals or homogeneous polycrystalline material with defined structure
- C30B33/005—Oxydation
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/22—Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions; Interactions between two or more impurities; Redistribution of impurities
- H01L21/223—Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions; Interactions between two or more impurities; Redistribution of impurities using diffusion into or out of a solid from or into a gaseous phase
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
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Abstract
The utility model discloses gallium diffusion equipment and a process for manufacturing a high-voltage protection device, which comprise a high-temperature dispersion furnace and a closed door, wherein the closed door is installed on the front surface of the high-temperature dispersion furnace, two groups of installation disks are installed on the right side of the front surface of the high-temperature dispersion furnace, and a control panel is installed on the right side of the high-temperature dispersion furnace; the inner side of the high-temperature dispersion furnace is embedded with a protective frame, and the inner side of the protective frame is provided with an adjusting boat. The inside of high temperature dispersion stove installs the cooling wind channel, the inboard embedding in cooling wind channel is installed the water-cooled tube, the back mounted retort of protective frame. According to the utility model, the cooling air duct is arranged, so that the internal temperature can be quickly reduced by cooling the air in the heating layer, and the condition that the service life of the electric heating layer is shortened can be prevented by indirectly reducing the temperature of the heating layer.
Description
Technical Field
The utility model relates to the technical field of high-voltage protection device manufacturing, in particular to gallium diffusion equipment and a gallium diffusion process for manufacturing a high-voltage protection device.
Background
The high-voltage protector is an indispensable device in high-voltage power equipment and power engineering, and can play a certain protection effect, and the high-voltage protection device needs to carry out gallium diffusion processing on the high-voltage protection device in order to guarantee the trafficability characteristic of electric current, and the traditional device needs to use professional gallium diffusion equipment, namely a high-temperature dispersion furnace, and silicon dioxide covered on the surface is penetrated through inside high temperature and special gas when carrying out gallium diffusion, so that gallium diffusion is realized, but the traditional gallium diffusion equipment has the defects that need to be improved.
The defects of the gallium diffusion equipment in the prior art are as follows:
1. patent document CN202792912U discloses a high-temperature diffusion furnace with a cooling system, which comprises a horizontal furnace body (1) and an outer box (6) for fixing the furnace body, wherein the furnace body comprises a heating layer (2), a fire-resistant layer (3) and an insulating layer (4) which are sequentially stacked from inside to outside; still including the control circuit of electricity connection zone of heating and implementing control to it, cooling water pipe (5) are put to the heat preservation inner disc, and cooling water pipe is connected with external cooling tower or cooling tank through valve (10) of its port. Compared with the prior art, the utility model adopts the water cooling and air cooling system, solves the influence of the heating of the furnace body on the environmental temperature at the source, further reduces the failure rate of electrical equipment, accelerates the process cooling speed and improves the production efficiency; adopt the assembled structure of layering, under the unchangeable prerequisite of whole function, the volume of single part has been reduced, the transportation of being convenient for to tear open, thereby the ready transportation difficult problem of large-scale high temperature diffusion furnace has been solved, the market competitiveness of the product has been improved, but the device is when using, install the outside at the zone of heating with water cooling plant, cool down through directly to the zone of heating, thereby realize that the heat transfer cools down internals and heating gas, speed through heat-conduction cooling is slower, and the temperature of slump leads to the condition that life's the shortening of zone of heating appears easily, be unfavorable for the device to cool down
2. Patent document CN215138305U discloses a high-temperature diffusion furnace exhaust gas filtering and discharging device, which belongs to the technical field of industrial processing equipment; the high-temperature diffusion furnace comprises a high-temperature diffusion furnace body, wherein one end of the high-temperature diffusion furnace body is connected with a waste gas discharge pipeline, the waste gas discharge pipeline is connected with a filter box, a filter bin is arranged in the filter box, an air blower is arranged in the middle of the waste gas discharge pipeline, a cold air pipe is arranged at the bottom of one side of the filter box in a penetrating manner, a cold air spray head is arranged at one end of the filter box, which is positioned in the filter bin, a water inlet pipeline is arranged at the top end of the filter box in a penetrating manner, a water outlet pipeline is arranged at the bottom end of one side of the filter box in a penetrating manner, an exhaust pipeline is arranged at the top end of the filter box in a penetrating manner, a fixing groove is arranged at one side of the filter bin, a first fixing block is movably connected with the fixing groove, and the first fixing block is connected with a filter plate. But thereby traditional filtration mode adopts and directly to filter gas through the filter and reach filterable effect, and the gaseous filter that produces after the fastening reaction can not guarantee to accomplish through the filter and absorb the filtration to directly utilize the filter to filter and can lead to filter life to shorten, need often change the incremental cost.
3. Patent document CN213013168U discloses a diffusion furnace, including "diffusion furnace body", the both sides of diffusion furnace body are furnace gate and stove tail respectively, being located of diffusion furnace body the hole that holds the extension pipe is seted up to the medial surface position of stove tail one side bottom, the one end of extension pipe is connected to admission line, and the other end is located inside being close to of diffusion furnace body the position of furnace gate, just the export of diffusion furnace body stove tail is connected to in proper order and gives vent to anger pipeline and evacuating device. The application provides an above-mentioned diffusion furnace, can avoid fire door accumulation acidizing fluid to produce the corruption, improve the life of quartz capsule, reduce the frequency of maintenance, avoid the hydrops to get into the vacuum pump and cause the damage, improve the life of vacuum pump, but traditional device directly uses the furnace gate to fix, long-time opening and shutting is closed and can appear the junction and produce the gap and the not hard up condition, and need the staff manual to fix, can not guarantee the inside gas tightness of device, the processing effect that gas flow will directly influence the device appears, thereby cause the unqualified condition of processing.
4. Patent document CN205347629U discloses a low-pressure high-temperature diffusion furnace comprising: a furnace body, wherein high-temperature heating areas for heating the furnace body are arranged on two sides of the furnace body; a crystal boat which is arranged in the furnace body and is used for loading silicon wafers, wherein the material of the crystal boat is quartz or silicon carbide; a vacuum valve pivoted on one side of the furnace body; the vacuum pump is connected with the vacuum valve; the quartz exhaust pipe is arranged on the other side of the furnace body and is connected with the furnace body; the quartz air inlet pipe is arranged in the furnace body and is provided with a plurality of exhaust holes. The utility model has the following beneficial effects: compared with the traditional diffusion furnace, the low-pressure high-temperature diffusion furnace has the advantages that the diffusion furnace is connected with the vacuum pump, so that the diffusion furnace is in a low-pressure vacuum state, reaction gas can reach a stable and steady flow, the boat for loading silicon wafers is made of quartz or silicon carbide, the silicon wafers are heated more uniformly, the yield can be improved, the photoelectric conversion efficiency of solar cells is improved, and the like.
5. Patent document CN206558484U discloses a heating device for a diffusion furnace, which includes a heat-conducting tube and a heating element for transferring heat to the heat-conducting tube, wherein an air inlet of the heat-conducting tube is connected to a carrier gas source through a first one-way valve to receive carrier gas from the carrier gas source, and an air outlet of the heat-conducting tube is connected to a diffusion furnace through a second one-way valve to deliver carrier gas to the diffusion furnace. By additionally arranging the heating device, after the furnace door of the diffusion furnace is opened, high-temperature carrier gas in the heating device is introduced into the diffusion furnace, the temperature of the crystalline silicon solar cell can be quickly made to meet the process requirement, the stability of the atmosphere in the tube is kept, the temperature rise time is shortened, and the productivity in unit time can be improved. The utility model also provides a heat-preservation diffusion furnace system which comprises a carrier gas source, a diffusion source, an air inlet pipe, a diffusion furnace and the heating device, wherein carrier gas in the carrier gas source carries diffusion elements in the diffusion source and is uniformly conveyed into the diffusion furnace through the air inlet pipe, and carrier gas in the carrier gas source is heated by the heating device and then conveyed into the diffusion furnace; the other method is to use ion implantation to implant on the surface of the silicon wafer uniformly, push the junction and dope boron, and the process has high cost.
Disclosure of Invention
It is an object of the present invention to provide a gallium diffusion apparatus for high voltage protection device fabrication that solves the problems set forth in the background above.
In order to achieve the purpose, the utility model provides the following technical scheme: the gallium diffusion equipment for manufacturing the high-voltage protection device comprises a high-temperature dispersion furnace and a closing door, wherein the closing door is installed on the front side of the high-temperature dispersion furnace, two groups of installation disks are installed on the right side of the front side of the high-temperature dispersion furnace, and a control panel is installed on the right side of the high-temperature dispersion furnace;
the inner side of the high-temperature dispersion furnace is embedded with a protective frame, and the inner side of the protective frame is provided with an adjusting boat.
The inside of high temperature dispersion stove installs the cooling wind channel, the inboard embedding in cooling wind channel is installed the water-cooled tube, the back mounted retort of protective frame.
Preferably, the installation cover plate is embedded and installed on the right side of the high-temperature dispersion furnace and located above the control panel, the movable box door is embedded and installed on the front side of the high-temperature dispersion furnace and located below the closed door, the movable handle is arranged on the front side of the movable box door, the embedding groove is formed in the front side of the high-temperature dispersion furnace and located on the right side of the closed door.
Preferably, a rotating shaft penetrates through the back surface of the closing door, a positioning frame is mounted on the back surface of the outer side of the rotating shaft and is positioned on the front surface of the high-temperature dispersion furnace, an embedded block is mounted on the right side of the closing door, and a quartz cap is mounted on the right side of the embedded block.
Preferably, the back surface of the mounting disc is provided with an electric push rod, the electric push rod is positioned on the inner side of the high-temperature dispersion furnace, the back surface of the electric push rod is provided with a driving motor, the output end of the electric push rod is provided with a piston rod, and the front surface of the piston rod is provided with a rotary limiting block.
Preferably, the display screen is installed in control panel's right side embedding, and a plurality of groups control button are installed in control panel's right side embedding, and control button is located the back of display screen, and a plurality of groups adjust knob are installed on control panel's right side, and adjust knob is located control button's below.
Preferably, the heat preservation is installed to the inboard of protective frame, and the electric heating layer is installed to the inboard of heat preservation, and the electric heating layer is located the regulation brilliant boat outside, and the heating bath is installed to the inboard of electric heating layer, and the heating bath is located the outside of adjusting the regulation brilliant boat.
Preferably, the inner side of the adjusting boat is provided with a component bearing table, the bottom of the adjusting boat is provided with a rotary screw in a penetrating manner, two sides of the rotary screw are provided with positioning bearings, the positioning bearings are located on the inner side of the heating tank, three sets of meshing gears are arranged on the outer side and the bottom of the positioning bearings, the back of each meshing gear is provided with an adjusting motor, and the adjusting motors are located at the bottom of the protection frame.
Preferably, the control valve is installed at the top of cooling wind channel both sides, and the control valve is located the bottom of protective frame, and the back mounted in cooling wind channel has rotatory air draft motor, and the transfer line is installed to air draft motor's output, and the transfer line is located the inboard in cooling wind channel, and two sets of mounting brackets are installed in the inboard embedding of transfer line, and the mounting bracket is located the inboard in cooling wind channel, and the front installation of transfer line also has the extraction fan leaf, and the extraction fan leaf) is located the inside back in cooling wind channel.
Preferably, the refrigeration pump is installed to the bottom of water-cooled tube, and the mount is installed at the top of refrigeration pump, and the mount is located the bottom of protective frame, and the refrigeration motor is installed to the bottom of refrigeration pump, and the back mounted of refrigeration pump has the water storage box, and the water storage box is located the bottom in cooling wind channel.
Preferably, the inside of retort is run through and is installed the gas-supply pipe, and discharge valve is installed in the front of gas-supply pipe bottom, and discharge valve's front is connected with the cooling wind channel through the pipeline, and the back mounted of retort has two sets of reaction liquid to import and export, and the filter tank is installed at the top of retort.
Preferably, the gallium diffusion equipment comprises the following processing steps:
s1, diffusion pretreatment: adopting an N-type monocrystalline silicon wafer, and carrying out chemical treatment on the surface of the silicon wafer through procedures of acid, SC3# formula cleaning and the like; and (3) oxidation: growing an oxide layer on the silicon wafer subjected to diffusion pretreatment in an oxidation furnace at 1150 ℃; pre-expanding gallium: putting the oxidized silicon wafer into a furnace for gallium pre-expansion at 1200 ℃ for 17H, so that the surface resistance of the silicon wafer is about 21; 100% hydrofluoric acid etching: adopting a boron coating source process, depositing for about 100 minutes at high temperature to obtain a proper low-concentration deposition layer, and pushing the P + depth to a proper depth required by the product by means of a subsequent pushing flow to form a wide P + layer region; 100% HF bleaching acid: soaking and removing the oxide layer; and (3) oxidation: growing a 5-8K oxidation layer on the surface of the silicon wafer; and (3) groove photoetching: selecting a required size to carry out groove photoetching; then, by pressing a control button on a control panel on the right side of the high-temperature dispersion furnace, two groups of electric push rods used for controlling the high-temperature dispersion furnace to be embedded and installed are controlled, a driving motor on the back of each electric push rod drives a piston rod to extend, a front rotary limiting block is rotated after the piston rod extends, the limiting block is prevented from blocking a closed door, the closed door is rotated and opened along a rotating shaft penetrating through the inside of a positioning frame, an adjusting motor inside the closed door is controlled to operate by the control button after the closed door is opened, the adjusting motor is electrified to drive a meshing gear structure of an output end to rotate, a rotating screw rod penetrating and installed inside a meshing gear driving the top can be transmitted to rotate through gear meshing, the rotating screw rod can be rotated and adjusted along a positioning bearing when rotating, the adjusting boat on the top can be transmitted to move along the rotating screw rod, the adjusting boat can be moved to the front of the high-temperature dispersion furnace and moved out through rotation, will need to process and paint the protection processing component of gallium and place the top at the component plummer, put the completion back, inside adjusting motor drives meshing gear reverse rotation, thereby will adjust the crystal boat and remove into the inside heating bath region of high temperature dispersion furnace again, the closed door is adjusted along the rotation axis in the upset, install the gomphosis piece gomphosis in the inboard in gomphosis groove, adjust shrink piston rod under electric putter's drive behind the rotatory stopper, utilize rotatory stopper to tighten up the restriction to the closed door, the gas tightness of the increase device that can be very big degree, the condition of gas leakage prevents to appear.
S2, after the processing element is stored on an element bearing table in the high-temperature dispersion furnace, the device is set by using the control button and the adjusting knob on the right side, so that the electric heating layer of the high-temperature dispersion furnace is electrified and generates heat to penetrate through an oxidation structure on the surface of the internal element, special gas is added into the high-temperature dispersion furnace by using a pipeline structure in the heating process to assist in penetrating the oxidation layer on the surface of the element, the effect of dispersing gallium elements is achieved, and the electric heating layer is used for continuously heating the inside of the device until the internal reaction is finished.
S3, after the heating of the internal element structure is completed, the temperature needs to be quickly reduced, the control button on the right side is used for controlling the operation of a refrigeration motor inside the high-temperature dispersion furnace, so as to drive a refrigeration pump at the top to pump out the water inside the water storage box and refrigerate the water, the refrigerated water is added into the inner side of the water-cooling tube through the output end of the refrigeration pump, after the internal heating is completed, two groups of control valves are automatically opened, an air draft motor on the back side of the cooling air channel is electrified to drive a transmission rod for output to rotate, a fan blade on the front side is driven to rotate, when the fan blade rotates, the air flow inside the air flow is driven to flow, the air flow enters the heating groove from the pipeline on the right side of the cooling air channel, the hot air inside the heating groove is pushed to enter the air channel, and the air entering the air channel can be quickly absorbed by the water-cooling tube after passing through the outer side of the water-cooling tube, the water after absorbing the heat gets into the water storage box once more, and the gas after the cooling gets into the effect that the inside circulation in proper order of heating tank flows can realize rapid cooling once more, promotes the effect of cooling.
S4, after the temperature of the gas inside the reaction kettle is reduced to normal temperature, the control panel device automatically closes the control valve on the back and opens the exhaust valve, the gas enters the bottommost part of the reaction kettle through the exhaust valve and along the gas pipe, the gas will tumble and flow upwards after entering, the gas and the reaction neutralization liquid inside the reaction kettle fully react in the flowing process, so that the reaction neutralization liquid can absorb and neutralize harmful substances in the waste gas to a certain extent, the gas after reaction is filtered and discharged through the filter kettle on the top, the waste gas and harmful substances generated in the using process are reduced through double filtration reaction, the gas inside the reaction kettle after a period of reaction is used for controlling the two groups of electric push rods embedded and installed in the high-temperature dispersion kettle by pressing the control button on the control panel on the right side of the high-temperature dispersion kettle, the driving motor on the back of the electric push rod is controlled to drive the piston rod of the output to extend, the rotary limiting block on the front is rotated after the piston rod is extended, the limiting block is prevented from blocking the closing door, the closing door is rotated and opened along a rotating shaft penetrating through the inside of the positioning frame, the control button is utilized to control the operation of the adjusting motor inside after the opening is finished, the adjusting motor is electrified to drive the meshing gear structure of the output end to rotate, the gear mesh can transmit and drive the rotating screw rod which is arranged in the meshing gear at the top in a penetrating way to rotate, the rotating screw rod can rotate and adjust along the positioning bearing when rotating, the transmission can drive the adjusting boat at the top to move along the rotating screw rod, the wafer boat is adjusted to move to the front side of the high-temperature dispersion furnace and move out through rotation, and a worker takes down the processed component from the component bearing table to carry out next processing.
Compared with the prior art, the utility model has the beneficial effects that:
1. when the device is used, two groups of control valves at the top of the cooling air channel are directly fixed with the bottom of the heating reaction device, and the inside of the device realizes the circulation effect, the control valves can directly control the internal gas flow to ensure that the device can normally realize circulation and cooling, the air draft motor at the right side is electrified to drive the transmission rod at the output end to rotate, the air draft motor can provide kinetic energy for air circulation for the device to ensure that the device can be normally used, the transmission rod drives the front exhaust fan blade to rotate through rotation, so that the air in the cooling air channel realizes circulation and circulation, when the internal air circulates, the refrigeration pump arranged at the bottom of the fixing frame can carry out refrigeration processing under the action of the refrigeration motor, water is pumped out through the inside of the water storage box through the transmission pipeline, and the water cooling pipe absorbs the heat in the cooling air channel after recompression refrigeration, inside the thermal water of absorption recirculation got into the water storage box, can reduce inside temperature fast through the inside air of cooling to the condition that life shortened can prevent to appear in the electric heating layer in the temperature of the reduction zone of indirectness.
2. According to the reaction tank, the control device is used for controlling the exhaust valve to open when the reaction tank is used, internal gas can enter the reaction tank along the gas conveying pipe, the gas conveying pipe can ensure normal exhaust emission, the gas can ascend along the partition plate after entering the reaction tank, and can react with internal reaction neutralization liquid when flowing inside, so that toxic and harmful substances are neutralized, the internal liquid can be added and replaced through the reaction liquid inlet and outlet on the back side, and the residual gas is secondarily filtered through the filter tank on the top, so that the filtering burden of the filter tank is reduced, and the filtering effect of the reaction tank is improved.
3. The utility model ensures the stability of the electric push rod by installing the electric push rod, when the device is used, the electric push rod is fixed with the main body device through the installation disc, the electric push rod is connected with the control device through the driving motor on the back, the piston rod at the output end can be electrified to drive to contract, the closing door is turned over and closed through the rotating shaft before the contraction, the closing door is a blocking device for heating and sealing the device, the internal heat can be prevented from being dissipated, the closing door can be fixed through the positioning frame, the stability of the closing door is ensured, the embedding block is embedded and installed in the embedding groove when the closing door is closed, the quartz cap can be embedded and installed on the inner side of the main body device, the effective heat preservation effect can be achieved, the rotating limiting block can be fixed on the outer side of the closing door after the piston rod is contracted, and the sealing effect can be increased through extrusion, the processing effect of the device is effectively prevented from being influenced by the leakage of the internal gas.
4. According to the adjustable boat, the adjustable boat is installed, when the device is used, the adjusting motor at the bottom can drive the meshing gear at the output end to rotate, the adjusting motor can provide kinetic energy for moving adjustment for the adjustable boat device, the device can be guaranteed to run normally, the meshing gear can drive the rotating screw rod through meshing rotation, the adjustable boat at the top is driven to move in a transmission mode, the adjustable boat is in contact with an internal structure to play a guiding effect, the adjustable boat can be moved out automatically through movement, manual operation and control of workers are not needed, and therefore working pressure of the workers is effectively reduced.
5. According to the utility model, by installing the quartz cap, when the device is used, a special and appropriate N-type substrate corrosion surface single crystal material is selected according to the characteristics of market application, gallium diffusion is firstly used for forming a slowly-changed PN junction, boron is pre-diffused for improving the surface concentration, and compared with the traditional device, the device has the advantages of low leakage current, low VC value, high voltage consistency, strong surge resistance and strong high-temperature reverse bias performance.
Drawings
FIG. 1 is a schematic perspective view of the present invention;
FIG. 2 is a schematic view of a closure door according to the present invention;
FIG. 3 is a schematic view of the electric putter of the present invention;
FIG. 4 is a schematic diagram of a control panel structure according to the present invention;
FIG. 5 is a schematic cross-sectional view of an adjustable boat according to the present invention;
FIG. 6 is a schematic cross-sectional view of a cooling duct according to the present invention;
FIG. 7 is a schematic cross-sectional view of a water cooled tube of the present invention;
FIG. 8 is a schematic cross-sectional view of a canister of the present invention;
FIG. 9 is a schematic diagram of the structure of the quartz cap of the present invention.
In the figure: 1. a high temperature dispersion furnace; 101. installing a cover plate; 102. a movable box door; 103. a movable handle; 104. a fitting groove; 2. closing the door; 201. a positioning frame; 202. a rotating shaft; 203. a fitting block; 204. a quartz cap; 3. an electric push rod; 301. installing a disc; 302. a junction box; 303. a piston rod; 304. rotating the limiting block; 4. a control panel; 401. a display screen; 402. a control button; 403. adjusting a knob; 5. a heating tank; 501. a protective frame; 502. a heat-insulating layer; 503. an electric heating layer; 6. adjusting the wafer boat; 601. positioning a bearing; 602. rotating the screw; 603. a meshing gear; 604. adjusting the motor; 605. a component carrier; 7. a cooling air duct; 701. a control valve; 702. a mounting frame; 703. an air draft motor; 704. a transmission rod; 705. an extraction fan blade; 8. a water-cooled tube; 801. a fixed mount; 802. a refrigeration pump; 803. a refrigeration motor; 804. a water storage tank; 9. a reaction tank; 901. an exhaust valve; 902. a gas delivery pipe; 903. an inlet and an outlet of the reaction solution; 904. and (7) filtering the tank.
Detailed Description
The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be obtained by a person skilled in the art without making any creative effort based on the embodiments in the present invention, belong to the protection scope of the present invention.
In the description of the present invention, it should be noted that the terms "upper", "lower", "inner", "outer", "front", "rear", "both ends", "one end", "the other end", and the like indicate orientations or positional relationships that are based on orientations or positional relationships illustrated in the drawings, and are only for convenience of description and simplification of description, but do not indicate or imply that the device or element referred to must have a specific orientation, be configured in a specific orientation, and operate, and thus, should not be construed as limiting the present invention. Furthermore, the terms "first" and "second" are used for descriptive purposes only and are not to be construed as indicating or implying relative importance.
In the description of the present invention, it is to be noted that, unless otherwise explicitly specified or limited, the terms "mounted," "disposed," "connected," and the like are to be construed broadly, such as "connected," which may be fixedly connected, detachably connected, or integrally connected; can be mechanically or electrically connected; they may be connected directly or indirectly through intervening media, or they may be interconnected between two elements. The specific meanings of the above terms in the present invention can be understood in specific cases to those skilled in the art.
Referring to fig. 1, fig. 2, fig. 3, fig. 4, fig. 5, fig. 6, fig. 7, fig. 8, and fig. 9, an embodiment of the present invention: a gallium diffusion apparatus for high voltage protection device fabrication;
the high-temperature dispersion furnace comprises a high-temperature dispersion furnace 1, wherein an installation cover plate 101 is embedded and installed on the right side of the high-temperature dispersion furnace 1, the installation cover plate 101 is positioned above a control panel 4, a movable box door 102 is embedded and installed on the front side of the high-temperature dispersion furnace 1, the movable box door 102 is positioned below a closed door 2, a movable handle 103 is arranged on the front side of the movable box door 102, an embedding groove 104 is opened on the front side of the high-temperature dispersion furnace 1, the embedding groove 104 is positioned on the right side of the closed door 2, the high-temperature dispersion furnace 1 is a main structure of the device and used for providing an installation position for an internal device and ensuring the stability of the device, the installation cover plate 101 on the right side can be movably disassembled and maintains the inside, a worker can conveniently use the device, the movable box door 102 of the device can be opened through the movable handle 103, the high-temperature dispersion furnace also has the effect of facilitating the disassembly and maintenance of the worker, and the combination of the embedding groove 104 on the front side and an embedding block 203 of the closed door 2 can increase the sealing effect, the normal heating in the device is ensured, the front of the high-temperature dispersion furnace 1 is provided with the closing door 2, the back of the closing door 2 is provided with the rotating shaft 202 in a penetrating way, the back of the outer side of the rotating shaft 202 is provided with the locating frame 201, the locating frame 201 is positioned on the front of the high-temperature dispersion furnace 1, the right side of the closing door 2 is provided with the embedded block 203, the right side of the embedded block 203 is provided with the quartz cap 204, the right side of the front of the high-temperature dispersion furnace 1 is provided with two groups of mounting discs 301, the back of the mounting discs 301 is provided with the electric push rod 3, the electric push rod 3 is positioned on the inner side of the high-temperature dispersion furnace 1, the back of the electric push rod 3 is provided with the driving motor 302, the output end of the electric push rod 3 is provided with the piston rod 303, the front of the piston rod 303 is provided with the rotation limiting block 304, the electric push rod 3 is fixed with the main body device through the mounting discs 301, thereby ensuring the stability of the electric push rod 3, the electric push rod 3 is connected with the control device through the driving motor 302 on the back, the piston rod 303 which can be electrified to drive the output end to contract, the closed door 2 is turned over and closed through the rotating shaft 202 before contraction, the closed door 2 is a blocking device for heating and sealing the device, internal heat loss can be prevented, the positioning frame 201 can fix the closed door 2, the stability of the closed door 2 is ensured, when the closed door 2 is closed, the embedding block 203 is embedded and installed inside the embedding groove 104, the quartz cap 204 can be embedded and installed inside the main body device, an effective heat preservation effect can be achieved, the rotating limiting block 304 can be fixed outside the closed door 2 after the piston rod 303 contracts, the sealing effect can be increased through extrusion, the processing effect of the device is effectively prevented from being influenced by internal gas leakage, the control panel 4 is installed on the right side of the high-temperature dispersion furnace 1, the display screen 401 is embedded and installed on the right side of the control panel 4, and a plurality of groups of control buttons 402 are embedded and installed on the right side of the control panel 4, and control button 402 is located the back of display screen 401, and a plurality of groups of adjust knob 403 are installed to the right side of control panel 4, and adjust knob 403 is located the below of control button 402, and control panel 4 is the control structure of device, can directly control the device wholly through control button 402 and adjust knob 403 to when controlling, the data that the device shows will directly present on display screen 401, and the staff of being convenient for carries out the analysis to the device fast.
The inner side of the high-temperature dispersion furnace 1 is embedded with a protective frame 501, the inner side of the protective frame 501 is provided with a heat preservation layer 502, the inner side of the heat preservation layer 502 is provided with an electric heating layer 503, the electric heating layer 503 is positioned on the outer side of an adjusting crystal boat 6, the inner side of the electric heating layer 503 is provided with a heating tank 5, the heating tank 5 is positioned on the outer side of the adjusting crystal boat 6, the protective frame 501 is a main body structure arranged in the device and can provide an installation position for an inner heating structure, the heat preservation layer 502 can greatly increase the heat preservation effect of the inner device, the electric heating layer 503 is connected with a circuit of a control structure, the inner structure is heated by electrifying, so that the device can be normally used, the inner side of the protective frame 501 is provided with the adjusting crystal boat 6, the inner side of the adjusting crystal boat 6 is provided with a component bearing platform 605, the bottom of the adjusting crystal boat 6 is provided with a rotating screw 602 in a penetrating way, and positioning bearings 601 are arranged on two sides of the rotating screw 602, the positioning bearing 601 is located on the inner side of the heating tank 5, three sets of meshing gears 603 are installed on the outer side and the bottom of the positioning bearing 601, the adjusting motor 604 is installed on the back face of the meshing gear 603, the adjusting motor 604 is located at the bottom of the protection frame 501, the meshing gear 603 at the output end can be driven to rotate through the adjusting motor 604 at the bottom, the adjusting motor 604 can provide kinetic energy for movement adjustment for the device for adjusting the boat 6, the device can operate normally, the meshing gear 603 can drive the rotating screw 602 through meshing rotation, the adjusting boat 6 at the top is driven to move through transmission, the adjusting boat 6 can be guided through contact with the inner structure, the adjusting boat 6 can move out automatically through movement, manual operation of workers is not needed, and therefore the working pressure of the workers is effectively reduced.
A cooling air duct 7 is arranged inside the high-temperature dispersion furnace 1, control valves 701 are arranged at the tops of two sides of the cooling air duct 7, the control valves 701 are positioned at the bottom of the protective frame 501, a rotary air draft motor 703 is arranged at the back of the cooling air duct 7, a transmission rod 704 is arranged at the output end of the air draft motor 703, the transmission rod 704 is positioned at the inner side of the cooling air duct 7, two sets of mounting frames 702 are embedded and arranged at the inner side of the transmission rod 704, the mounting frames 702 are positioned at the inner side of the cooling air duct 7, an air draft fan blade 705 is also arranged at the front of the transmission rod 704, the air draft fan blade 705 is positioned at the back of the cooling air duct 7, a water cooling pipe 8 is embedded and arranged at the inner side of the cooling air duct 7, a refrigeration pump 802 is arranged at the bottom of the water cooling pipe 8, a fixing frame 801 is arranged at the top of the refrigeration pump 802, the fixing frame 801 is positioned at the bottom of the protective frame 501, a refrigeration motor 803 is arranged at the bottom of the refrigeration pump 802, a water storage tank 804 is arranged at the back of the refrigeration pump 802, the water storage tank 804 is positioned at the bottom of the cooling air duct 7, two groups of control valves 701 at the top of the cooling air duct 7 are directly fixed with the bottom of the heating reaction device, and the inside of the cooling air duct 7 realizes the circulation effect, the control valves 701 can directly control the internal gas flow to ensure that the device can normally realize circulation cooling, the air draft motor 703 at the right side is electrified to drive the transmission rod 704 at the output end to rotate, the air draft motor 703 can provide kinetic energy for air circulation for the device to ensure that the device can be normally used, the transmission rod 704 drives the front exhaust fan blade 705 to rotate through rotation, so that the air inside the cooling air duct 7 realizes circulation, when the internal air circulates, the refrigeration pump 802 arranged at the bottom of the fixing frame 801 can carry out refrigeration processing under the action of the refrigeration motor 803, and water is pumped out through the transmission duct inside the water storage tank 804, the heat in the cooling air duct 7 is absorbed through the water cooling pipe 8 after the compression refrigeration, the water absorbing the heat enters the water storage tank 804 again in a circulating manner, the temperature in the water storage tank can be quickly reduced through the air in the cooling air, the temperature of the heating layer is indirectly reduced, the condition that the service life of the electric heating layer 503 is shortened can be prevented, the reaction tank 9 is installed on the back surface of the protection frame 501, the air conveying pipe 902 is installed in the reaction tank 9 in a penetrating manner, the exhaust valve 901 is installed on the front surface of the bottom of the air conveying pipe 902, the front surface of the exhaust valve 901 is connected with the cooling air duct 7 through a pipeline, two groups of reaction liquid inlets and outlets 903 are installed on the back surface of the reaction tank 9, the filter tank 904 is installed on the top of the reaction tank 9, the exhaust valve 901 is controlled to be opened by the control device, the gas in the reaction tank 902 can enter the reaction tank 9 along with the air conveying pipe, and the air conveying pipe can ensure the normal exhaust emission, gas gets into 9 inside backs of retort and will rise along the baffle, will react with inside reaction neutralization liquid when flowing inside, realizes neutralizing toxic and harmful substance, and inside liquid can be imported and exported 903 through the reaction liquid at the back and add and change, and remaining gas carries out the secondary filter through the filter tank 904 at top again, reduces filter tank 904's filtration burden, the filter effect of hoisting device simultaneously.
The gallium diffusion equipment comprises the following process steps:
s1, diffusion pretreatment: adopting an N-type monocrystalline silicon wafer, and carrying out chemical treatment on the surface of the silicon wafer through procedures of acid, SC3# formula cleaning and the like; and (3) oxidation: growing an oxide layer on the silicon wafer subjected to diffusion pretreatment in an oxidation furnace at 1150 ℃; pre-expanding gallium: putting the oxidized silicon wafer into a furnace for gallium pre-expansion at 1200 ℃ for 17H, so that the surface resistance of the silicon wafer is about 21; 100% hydrofluoric acid etching: adopting a boron coating source process, depositing for about 100 minutes at high temperature to obtain a proper low-concentration deposition layer, and pushing the depth of P + to a proper depth required by the product by means of a subsequent pushing flow to form a wide P + layer region; 100% HF bleaching acid: soaking and removing the oxide layer; and (3) oxidation: growing a 5-8K oxide layer on the surface of the silicon wafer; and (3) groove photoetching: selecting a required size to carry out groove photoetching; then, by pressing a control button 402 on a control panel 4 on the right side of the high-temperature dispersion furnace 1, two groups of electric push rods 3 for controlling the high-temperature dispersion furnace 1 to be embedded and installed are controlled, a driving motor 302 on the back of each electric push rod 3 drives an output piston rod 303 to extend, a front rotary limiting block 304 is rotated after the piston rod extends, the limiting block is prevented from blocking a closing door 2, the closing door 2 is rotated and opened along a rotating shaft 202 penetrating through the positioning frame 201, an internal adjusting motor 604 is controlled to operate by using the control button 402 after the opening is completed, the adjusting motor 604 is electrified to drive a meshing gear 603 structure of an output end to rotate, a rotating screw 602 penetrating and installed inside the meshing gear 603 at the top can be transmitted and driven to rotate through gear meshing, the rotating screw 602 rotates along a positioning bearing 601 when rotating, and the adjusting boat 6 at the top can be driven to move along the rotating screw 602 by transmission, move through rotatory drive regulation boat 6 to the front of high temperature dispersion furnace 1 and remove, will need to process and scribble the protection processing component of gallium and place at the top of component plummer 605, put the completion back, inside regulating motor 604 drives meshing gear 603 counter rotation, thereby will adjust boat 6 and remove into the inside heating bath region of high temperature dispersion furnace 1 again, closed door 2 is adjusted along rotation axis 202 in the upset, install the gomphosis piece 203 gomphosis in the inboard of gomphosis groove 104, adjust shrink piston rod 303 under electric putter 3's drive behind the rotatory stopper 304, utilize rotatory stopper 304 to tighten up the restriction to closed door 2, the gas tightness of the increase device that can the very big degree, prevent the condition of gas leakage.
S2, after the processing element is stored on the element bearing table 605 in the high-temperature dispersion furnace 1, the control button 402 and the adjusting knob 403 on the right side are used for setting the device, so that the electric heating layer 503 of the high-temperature dispersion furnace 1 is electrified and generates heat to penetrate through the oxidation structure on the surface of the element in the device, in the heating process, special gas is added into the high-temperature dispersion furnace 1 by using a pipeline structure to assist in penetrating through the oxidation layer on the surface of the element, the effect of dispersing gallium elements is achieved, and the electric heating layer 503 is used for continuously heating the inside of the device until the reaction in the device is finished.
S3, after the heating of the internal element structure is completed, the temperature needs to be rapidly reduced, the control button 402 on the right side is used for controlling the operation of the refrigeration motor 803 in the high-temperature dispersion furnace 1, thereby driving the refrigeration pump 802 at the top to pump out the water in the water storage tank 804 and refrigerate the water, the refrigerated water is added into the inner side of the water-cooling pipe 8 through the output end of the refrigeration pump 802, after the internal heating is completed, the two groups of control valves 701 are automatically opened, the exhaust motor 703 on the back of the cooling air duct 7 is electrified to drive the output transmission rod 704 to rotate, and the transmission drives the exhaust fan blade 705 on the front to rotate, when the exhaust fan blade 705 rotates, the internal airflow is driven to flow, the pipeline on the right side of the cooling air duct 7 enters the heating groove 5, then the hot air in the heating groove 5 is pushed to enter the air duct, the air entering the air duct 5 can be rapidly absorbed by the water-cooling pipe 8 after passing through the outer side of the water-cooling pipe 8, the water after absorbing the heat gets into water storage box 804 once more, and the gas after the cooling gets into heating tank 5 inside circulation flow in proper order once more can realize rapid cooling's effect, promotes the effect of cooling.
S4, after the temperature of the gas in the high temperature dispersion furnace 1 is reduced to normal temperature, the control panel 4 will automatically close the control valve 701 on the back and open the exhaust valve 901, the gas will enter the bottommost part of the reaction tank 9 through the exhaust valve 901 and along the gas pipe 902, the gas will tumble and flow upwards after entering, and fully mix and react with the reaction neutralizing liquid in the reaction tank 9 during the flowing process, so that the reaction neutralizing liquid can absorb and neutralize the harmful substances in the waste gas to a certain extent, the gas after reaction is filtered and discharged through the filter tank 904 on the top, the waste gas and harmful substances generated during the use process are reduced through double filtration reaction, the gas in the high temperature dispersion furnace 1 after reaction for a period will be pressed by the control button 402 on the control panel 4 on the right side of the high temperature dispersion furnace 1 for controlling the two groups of electric push rods 3 embedded in the high temperature dispersion furnace 1, the driving motor 302 on the back of the electric push rod 3 is controlled to drive the output piston rod 303 to extend, the front rotary limiting block 304 is rotated after the piston rod is extended, the limiting block is prevented from blocking the closing door 2, the closing door 2 is rotated and opened along the rotating shaft 202 penetrating through the positioning frame 201, the adjusting motor 604 inside is controlled to operate by the control button 402 after the opening is completed, the adjusting motor 604 is electrified to drive the meshing gear 603 structure on the output end to rotate, the gear engagement can transmit and drive the rotating screw 602 which is arranged in the meshing gear 603 on the top and penetrates through the inside to rotate, the rotating screw 602 can rotate and adjust along the positioning bearing 601 when rotating, the transmission can drive the adjusting boat 6 on the top to move along the rotating screw 602, the wafer boat 6 is adjusted by rotation and moved to the front of the high temperature dispersion furnace 1, and the worker takes the processed component off the component carrier 605 for further processing.
The working principle is as follows: diffusion pretreatment: adopting an N-type monocrystalline silicon wafer, and carrying out chemical treatment on the surface of the silicon wafer through procedures of acid, SC3# formula cleaning and the like; and (3) oxidation: growing an oxide layer on the silicon wafer subjected to diffusion pretreatment in an oxidation furnace at 1150 ℃; pre-expanding gallium: putting the oxidized silicon wafer into a furnace for gallium pre-expansion at 1200 ℃ for 17H, so that the surface resistance of the silicon wafer is about 21; 100% hydrofluoric acid etching: adopting a boron coating source process, depositing for about 100 minutes at high temperature to obtain a proper low-concentration deposition layer, and pushing the P + depth to a proper depth required by the product by means of a subsequent pushing flow to form a wide P + layer region; 100% HF bleaching acid: soaking and cleaning the oxide layer; and (3) oxidation: growing a 5-8K oxide layer on the surface of the silicon wafer; and (3) groove photoetching: selecting a required size to carry out groove photoetching; then, by pressing a control button 402 on a control panel 4 on the right side of the high-temperature dispersion furnace 1, two groups of electric push rods 3 for controlling the high-temperature dispersion furnace 1 to be embedded and installed are controlled, a driving motor 302 on the back of each electric push rod 3 drives an output piston rod 303 to extend, a front rotary limiting block 304 is rotated after the piston rod extends, the limiting block is prevented from blocking a closing door 2, the closing door 2 is rotated and opened along a rotating shaft 202 penetrating through the positioning frame 201, an internal adjusting motor 604 is controlled to operate by using the control button 402 after the opening is completed, the adjusting motor 604 is electrified to drive a meshing gear 603 structure of an output end to rotate, a rotating screw 602 penetrating and installed inside the meshing gear 603 at the top can be transmitted and driven to rotate through gear meshing, the rotating screw 602 rotates along a positioning bearing 601 when rotating, and the adjusting boat 6 at the top can be driven to move along the rotating screw 602 by transmission, the wafer boat 6 is driven to move to the front of the high-temperature dispersion furnace 1 by rotation and move out, protective processing components which need to be processed and coated with gallium are placed at the top of a component bearing platform 605, after the placing is finished, an internal adjusting motor 604 drives a meshing gear 603 to rotate reversely, so that the wafer boat 6 is moved into a heating groove area inside the high-temperature dispersion furnace 1 again, the adjusting closed door 2 is turned over and adjusted along a rotating shaft 202, an embedding block 203 is embedded and installed at the inner side of an embedding groove 104, a piston rod 303 is contracted under the driving of an electric push rod 3 after the rotating limiting block 304 is adjusted, the rotating limiting block 304 is utilized to tighten and limit the closed door 2, the air tightness of the device can be increased to a great extent, the gas leakage condition is prevented, the processing components are stored on the component bearing platform 605 inside the high-temperature dispersion furnace 1, and the device is set by using a control button 402 and an adjusting knob 403 on the right side, the electric heating layer 503 of the high-temperature dispersion furnace 1 is electrified and generates heat to penetrate an oxidation structure on the surface of an internal element, special gas is added into the high-temperature dispersion furnace 1 by utilizing a pipeline structure in the heating process to assist in penetrating an oxidation layer on the surface of the element, so that the effect of dispersing gallium is achieved, the electric heating layer 503 is utilized to continuously heat the inside of the device until the reaction of the inside is finished, the internal element structure needs to be rapidly cooled after being heated, a control button 402 on the right side is utilized to control a refrigeration motor 803 in the high-temperature dispersion furnace 1 to operate, so that a refrigeration pump 802 on the top is driven to pump out water in a water storage box 804 and refrigerate the water, the refrigerated water is added into the inner side of a water cooling pipe 8 through the output end of the refrigeration pump 802, and two groups of control valves 701 are automatically opened after the internal heating is finished, the air draft motor 703 at the back of the cooling air duct 7 drives the transmission rod 704 which is powered to drive the output to rotate, the transmission drives the front air draft fan blade 705 to rotate, when the air draft fan blade 705 rotates, the air flow in the air draft fan blade will be driven to flow, the air flow enters the heating groove 5 from the pipeline at the right side of the cooling air duct 7, the hot air in the heating groove 5 is pushed to enter the air duct, the air entering the air duct 5 can be quickly absorbed by the water cooling pipe 8 after passing through the outer side of the water cooling pipe 8, the water after absorbing the heat enters the water storage tank 804 again, the air after cooling enters the heating groove 5 again to sequentially circulate and flow, the effect of quick cooling can be realized, the effect of cooling is improved, then after the temperature of the air in the air duct is reduced to the normal temperature, the control panel 4 device will automatically close the control valve 701 at the back and open the exhaust valve 901, the air can enter the bottommost portion 902 of the reaction tank 9 through the exhaust valve 901 and along the air pipe 901, the gas will tumble and flow upwards after entering, the gas fully reacts with the reaction neutralization liquid in the reaction tank 9 in the flowing process, so that the harmful substances in the waste gas are absorbed and neutralized to a certain extent by the reaction neutralization liquid, the gas after the reaction is filtered and discharged by the filter tank 904 at the top, the waste gas and the harmful substances generated in the using process are reduced by the double-filtering reaction, the gas in the high-temperature dispersion furnace 1 is reacted for a period of time and then is pressed by the control button 402 on the control panel 4 at the right side of the high-temperature dispersion furnace 1, two groups of electric push rods 3 for controlling the embedded installation of the high-temperature dispersion furnace 1, the driving motor 302 at the back of the electric push rods 3 drives the output piston rod 303 to extend, the rotary limiting block 304 at the front side is prevented from blocking the closed door 2 after extending, and the closed door 2 is opened by rotating along the rotating shaft 202 penetrating through the positioning frame 201, after the start is finished, the control button 402 is used for controlling the operation of the internal adjusting motor 604, the adjusting motor 604 is electrified to drive the structure of the meshing gear 603 at the output end to rotate, the rotating screw 602 which is arranged inside the meshing gear 603 at the top in a penetrating mode can be transmitted and driven to rotate through gear meshing, the rotating screw 602 rotates and is adjusted along the positioning bearing 601 when rotating, the adjusting boat 6 at the top can be driven to move along the rotating screw 602 in a position, the adjusting boat 6 is driven to move to the front of the high-temperature dispersion furnace 1 and move out through rotation, and a worker can take down the processed components from the component bearing table 605 to perform the next processing.
It will be evident to those skilled in the art that the utility model is not limited to the details of the foregoing illustrative embodiments, and that the present invention may be embodied in other specific forms without departing from the spirit or essential attributes thereof. The present embodiments are therefore to be considered in all respects as illustrative and not restrictive, the scope of the utility model being indicated by the appended claims rather than by the foregoing description, and all changes which come within the meaning and range of equivalency of the claims are therefore intended to be embraced therein. Any reference sign in a claim should not be construed as limiting the claim concerned.
Claims (11)
1. Gallium diffusion equipment for the manufacture of high-voltage protection devices, comprising a high-temperature diffusion furnace (1) and a closing door (2), characterized in that: the front side of the high-temperature dispersion furnace (1) is provided with a closing door (2), the right side of the front side of the high-temperature dispersion furnace (1) is provided with two groups of mounting discs (301), and the right side of the high-temperature dispersion furnace (1) is provided with a control panel (4);
a protective frame (501) is embedded into the inner side of the high-temperature dispersion furnace (1), and an adjusting boat (6) is arranged on the inner side of the protective frame (501).
The inside mounting of high temperature dispersion stove (1) has cooling wind channel (7), the inboard embedding in cooling wind channel (7) is installed water-cooled tube (8), the back mounted retort (9) of protective frame (501).
2. The gallium diffusion apparatus for high voltage protection device fabrication according to claim 1, wherein: the right side of the high-temperature dispersion furnace (1) is embedded with an installation cover plate (101), the installation cover plate (101) is located above the control panel (4), a movable door (102) is embedded into the front side of the high-temperature dispersion furnace (1), the movable door (102) is located below the closed door (2), a movable handle (103) is arranged on the front side of the movable door (102), an embedded groove (104) is formed in the front side of the high-temperature dispersion furnace (1), and the embedded groove (104) is located on the right side of the closed door (2).
3. A gallium diffusion apparatus for high voltage protection device fabrication according to claim 1, wherein: the back of the closed door (2) is provided with a rotating shaft (202) in a penetrating mode, the back of the outer side of the rotating shaft (202) is provided with a positioning frame (201), the positioning frame (201) is located on the front of the high-temperature dispersion furnace (1), the right side of the closed door (2) is provided with an embedded block (203), and the right side of the embedded block (203) is provided with a quartz cap (204).
4. A gallium diffusion apparatus for high voltage protection device fabrication according to claim 1, wherein: the back mounting of mounting disc (301) has electric putter (3), and electric putter (3) are located the inboard of high temperature dispersion stove (1), and the back mounting of electric putter (3) has driving motor (302), and piston rod (303) are installed to the output of electric putter (3), and rotation limiting block (304) are installed in the front of piston rod (303).
5. A gallium diffusion apparatus for high voltage protection device fabrication according to claim 1, wherein: display screen (401) are installed in the right side embedding of control panel (4), and a plurality of groups control button (402) are installed in the right side embedding of control panel (4), and control button (402) are located the back of display screen (401), and a plurality of groups adjust knob (403) are installed on the right side of control panel (4), and adjust knob (403) are located the below of control button (402).
6. A gallium diffusion apparatus for high voltage protection device fabrication according to claim 1, wherein: heat preservation (502) are installed to the inboard of protective frame (501), and electric heating layer (503) are installed to the inboard of heat preservation (502), and electric heating layer (503) are located and adjust the brilliant boat (6) outside, and heating bath (5) are installed to the inboard of electric heating layer (503), and heating bath (5) are located and adjust the outside of adjusting brilliant boat (6).
7. A gallium diffusion apparatus for high voltage protection device fabrication according to claim 1, wherein: the inside of adjusting boat (6) is installed component plummer (605), the bottom of adjusting boat (6) is run through and is installed rotatory screw rod (602), location bearing (601) are installed to the both sides of rotatory screw rod (602), and location bearing (601) are located the inboard of heating bath (5), three sets of meshing gear (603) are installed to the outside and the bottom of location bearing (601), the back mounted of meshing gear (603) has adjusting motor (604), and adjusting motor (604) are located the bottom of protective frame (501).
8. A gallium diffusion apparatus for high voltage protection device fabrication according to claim 1, wherein: control valve (701) is installed at the top of cooling wind channel (7) both sides, and control valve (701) are located the bottom of protective frame (501), the back mounted of cooling wind channel (7) has rotatory air draft motor (703), transfer line (704) are installed to the output of air draft motor (703), and transfer line (704) are located the inboard in cooling wind channel (7), two sets of mounting bracket (702) are installed in the inboard embedding of transfer line (704), and mounting bracket (702) are located the inboard in cooling wind channel (7), the front installation of transfer line (704) also has exhaust fan leaf (705), and exhaust fan leaf 705) is located the inside back in cooling wind channel (7).
9. A gallium diffusion apparatus for high voltage protection device fabrication according to claim 1, wherein: refrigerating pump (802) is installed to the bottom of water-cooled tube (8), and mount (801) are installed at the top of refrigerating pump (802), and mount (801) are located the bottom of protective frame (501), and refrigerating motor (803) are installed to the bottom of refrigerating pump (802), and water storage box (804) are located the bottom in cooling wind channel (7) to the back mounted of refrigerating pump (802), and water storage box (804).
10. A gallium diffusion apparatus for high voltage protection device fabrication according to claim 1, wherein: the inside of retort (9) is run through and is installed gas-supply pipe (902), and discharge valve (901) are installed to the front of gas-supply pipe (902) bottom, and the front of discharge valve (901) is connected through pipeline and cooling wind channel (7), and the back mounted of retort (9) has two sets of reaction liquid to import and export (903), and filter tank (904) are installed at the top of retort (9).
11. The gallium diffusion apparatus and the process thereof for manufacturing high voltage protection device according to any one of claims 1-10, wherein the process steps of the gallium diffusion apparatus are as follows:
s1, diffusion pretreatment: adopting an N-type monocrystalline silicon wafer, and carrying out chemical treatment on the surface of the silicon wafer through procedures of acid, SC3# formula cleaning and the like; and (3) oxidation: growing an oxide layer on the silicon wafer subjected to diffusion pretreatment in an oxidation furnace at 1150 ℃; pre-expanding gallium: putting the oxidized silicon wafer into a furnace for gallium pre-expansion at 1200 ℃ for 17H, so that the surface resistance of the silicon wafer is about 21; 100% hydrofluoric acid etching: adopting a boron coating source process, depositing for about 100 minutes at high temperature to obtain a proper low-concentration deposition layer, and pushing the depth of P + to a proper depth required by the product by means of a subsequent pushing flow to form a wide P + layer region; 100% HF bleaching acid: soaking and removing the oxide layer; and (3) oxidation: growing a 5-8K oxide layer on the surface of the silicon wafer; and (3) groove photoetching: selecting a required size to carry out groove photoetching; then, by pressing a control button (402) on a control panel (4) on the right side of the high-temperature dispersion furnace (1), two groups of electric push rods (3) used for controlling the high-temperature dispersion furnace (1) to be embedded and installed are controlled, a drive motor (302) on the back of each electric push rod (3) is controlled to drive a piston rod (303) to extend, a front rotary limiting block (304) is rotated after extending, the limiting block is prevented from blocking a closing door (2), the closing door (2) is rotated and opened along a rotating shaft (202) penetrating through the inside of a positioning frame (201), after the opening is completed, an internal adjusting motor (604) is controlled to operate by the control button (402), the adjusting motor (604) is electrified to drive a meshing gear (603) structure of an output end to rotate, and a rotating screw (602) penetrating through and installed inside the meshing gear (603) at the top can be transmitted and driven to rotate through gear meshing, the rotary screw (602) rotates and is adjusted along the positioning bearing (601), the adjustment boat (6) at the top can be driven to move along the rotary screw (602) through transmission, the adjustment boat (6) is driven to move to the front of the high-temperature dispersion furnace (1) through rotation and is moved out, a protective processing element which needs to be processed and is coated with gallium is placed at the top of the element bearing table (605), after the arrangement is completed, the internal adjusting motor (604) drives the meshing gear (603) to rotate reversely, the adjustment boat (6) is moved into a heating groove area in the high-temperature dispersion furnace (1), the adjusting closing door (2) is turned over and adjusted along the rotating shaft (202), the embedding block (203) is embedded and installed at the inner side of the embedding groove (104), the piston rod (303) is contracted under the driving of the electric push rod (3) after the rotation limiting block (304) is adjusted, the closing door (2) is tightened and limited by the aid of the rotating limiting block (304), air tightness of the device can be greatly improved, and gas leakage is prevented.
S2, after the processing element is stored on an element bearing table (605) in the high-temperature dispersion furnace (1), the device is set by using a control button (402) and an adjusting knob (403) on the right side, so that an electric heating layer (503) of the high-temperature dispersion furnace (1) is electrified and generates heat to penetrate through an oxidation structure on the surface of the element in the high-temperature dispersion furnace, special gas is added into the high-temperature dispersion furnace (1) by using a pipeline structure in the heating process to assist in penetrating through the oxidation layer on the surface of the element, the effect of dispersing gallium elements is achieved, continuous heating is performed on the inside of the device by using the electric heating layer (503) until the reaction in the inside is finished.
S3, after the heating of the internal element structure is finished, the temperature needs to be quickly reduced, a control button (402) on the right side is used for controlling a refrigerating motor (803) inside a high-temperature dispersion furnace (1) to operate, so that a refrigerating pump (802) on the top is driven to pump out water inside a water storage tank (804), and the water is refrigerated, the refrigerated water is added into the inner side of a water cooling pipe (8) through the output end of the refrigerating pump (802), after the internal heating is finished, two groups of control valves (701) are automatically opened, an air draft motor (703) on the back of a cooling air channel (7) drives a transmission rod (704) which is electrified to drive output to rotate, transmission drives an air draft fan blade (705) on the front side to rotate, the air draft fan blade (705) drives the internal air flow to flow when rotating, hot air enters the heating channel (5) through a pipeline on the right side of the cooling air channel (7), and then pushes the air channel inside the heating channel (5) to enter the air channel, get into the inside gas in wind channel (5) and can be fast by water-cooled tube (8) absorption heat behind the outside of water-cooled tube (8), the water after the absorption heat gets into water storage box (804) once more, and the gas after the cooling gets into heating tank (5) inside circulation flow in proper order once more can realize rapid cooling's effect, promotes the effect of cooling.
S4, after the temperature of the gas inside the high temperature dispersion furnace is reduced to normal temperature, the control panel (4) device automatically closes the control valve (701) on the back and opens the exhaust valve (901), the gas enters the bottommost part of the reaction tank (9) through the exhaust valve (901) and along the gas pipe (902), the gas will tumble and flow upwards after entering, fully and mixedly react with the reaction neutralization liquid inside the reaction tank (9) in the flowing process, so that the reaction neutralization liquid can absorb and neutralize harmful substances in the waste gas to a certain extent, the gas after reaction is filtered and discharged through the filter tank (904) on the top, the waste gas and the harmful substances generated in the using process are reduced through double filtration reaction, the gas inside is reacted for a period of time and then is pressed through the control button (402) on the control panel (4) on the right side of the high temperature dispersion furnace (1), two groups of electric push rods (3) used for controlling the embedded installation of the high-temperature dispersion furnace (1), a drive motor (302) at the back of the electric push rods (3) is controlled to drive a piston rod (303) to extend, a front rotary limiting block (304) is rotated after the piston rod is extended, the limiting block is prevented from blocking a closing door (2), the closing door (2) is rotated and opened along a rotating shaft (202) penetrating through the inside of a positioning frame (201), a control button (402) is used for controlling an inner adjusting motor (604) to operate after the opening is completed, the adjusting motor (604) is electrified to rotate a meshing gear (603) structure driving an output end, a rotating screw (602) penetrating through and installed inside a meshing gear (603) at the top can be transmitted and driven to rotate through gear meshing, the rotating screw (602) is rotatably adjusted along a positioning bearing (601) during rotation, the transmission can drive an adjusting boat (6) at the top to move along the rotating screw (602), the adjusting boat (6) is driven to move to the front side of the high-temperature dispersion furnace (1) and move out through rotation, and a worker takes down the processed element from the element bearing table (605) to carry out next processing.
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