CN114664868B - 阵列基板、显示装置和制备方法 - Google Patents

阵列基板、显示装置和制备方法 Download PDF

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CN114664868B
CN114664868B CN202210325360.3A CN202210325360A CN114664868B CN 114664868 B CN114664868 B CN 114664868B CN 202210325360 A CN202210325360 A CN 202210325360A CN 114664868 B CN114664868 B CN 114664868B
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light
cluster structure
sheet
blocking
heat
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CN114664868A (zh
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唐榕
李荣荣
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HKC Co Ltd
Mianyang HKC Optoelectronics Technology Co Ltd
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Mianyang HKC Optoelectronics Technology Co Ltd
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Abstract

本申请公开了一种阵列基板、显示装置和制备方法，所述阵列基板包括薄膜晶体管和衬底，所述薄膜晶体管设置在所述衬底上，所述薄膜晶体管包括半导体层，所述薄膜晶体管还包括挡光隔热层，所述半导体层设置在所述挡光隔热层上；所述挡光隔热层包括挡光基体和片状团簇结构，所述挡光基体设置有多孔结构，所述多孔结构包括多个孔洞，所述孔洞内设置所述片状团簇结构；其中，所述挡光隔热层用于遮挡入射光线，所述片状团簇结构用于吸收所述入射光线产生的热量，通过在薄膜晶体管内设置挡光隔热层，改善了背光模组的光照对薄膜晶体管造成的影响，提升液晶显示器的品质以及使用者的使用体验。

Description

阵列基板、显示装置和制备方法
技术领域
本申请涉及显示技术领域，尤其涉及一种阵列基板、显示装置和制备方法。
背景技术
液晶显示器中通常使用背光模组产生光源，背光模组生成的光会直接照射到显示面板内，从而为液晶显示器中的像素提供光源以进行画面显示，然而，显示面板内的薄膜晶体管对光照的强度以及光照产生的温度都非常敏感，受到长时间光照后的薄膜晶体管会产生电子空穴对，生成光生载流子，从而严重影响薄膜晶体管的稳定性，另外，背光模组生成的光在照射时会产生一定的热量，造成温度上升，温度上升也会对薄膜晶体管的性能造成一定的影响，因此，背光模组生成的光线对薄膜晶体管的影响会导致液晶显示器的显示出现串扰、残像等显示不良，从而影响液晶显示器的品质，降低了使用者的使用体验。
发明内容
本申请的目的是提供一种阵列基板、显示装置和制备方法，通过在薄膜晶体管内设置挡光隔热层，改善了背光模组的光照对薄膜晶体管造成的影响，提升液晶显示器的品质以及使用者的使用体验。
本申请公开了一种阵列基板，所述阵列基板包括薄膜晶体管和衬底，所述薄膜晶体管设置在所述衬底上，所述薄膜晶体管包括半导体层，所述薄膜晶体管还包括挡光隔热层，所述半导体层设置在所述挡光隔热层上；所述挡光隔热层包括挡光基体和片状团簇结构，所述挡光基体设置有多孔结构，所述多孔结构包括多个孔洞，所述孔洞内设置所述片状团簇结构；其中，所述挡光隔热层用于遮挡入射光线，所述片状团簇结构可吸收所述入射光线产生的热量。
可选的，所述薄膜晶体管还包括栅极金属层、绝缘层、源极金属层、漏极金属层和钝化层，所述绝缘层设置在所述栅极金属层上且覆盖所述栅极金属层，所述半导体层设置在所述绝缘层上，所述源极金属层和所述漏极金属层相互间隔设置在所述半导体层上，所述钝化层覆盖设置在所述源极金属层、所述漏极金属层、所述半导体层以及所述绝缘层上；所述挡光隔热层设置在所述栅极金属层远离所述半导体层的一侧上，沿所述衬底的厚度方向上，所述栅极金属层的正投影覆盖所述半导体层，所述挡光隔热层的正投影覆盖所述栅极金属层。
可选的，所述片状团簇结构的体积随温度高低变化，所述片状团簇结构温度高时的体积比所述片状团簇结构温度低时的体积大。
可选的，所述片状团簇结构包括反光材料和吸热材料，所述反光材料和所述吸热材料混合形成所述片状团簇结构。
可选的，所述片状团簇结构包括反光材料和吸热材料，所述反光材料设置在所述吸热材料的外表面以形成所述片状团簇结构。
可选的，所述反光材料是银、铜、铝、铁和钛中的一种或其中至少两种的合金；所述吸热材料是石墨烯片、聚苯胺、碳纳米管、碳黑和氧化锌中任意一种；所述挡光基体是聚氨酯、乙烯/醋酸乙烯酯共聚物和交联聚乙烯中任意一种制成。
本申请还公开了一种显示装置，包括彩膜基板和如上所述的阵列基板，所述彩膜基板和所述阵列基板对盒设置。
本申请还公开了一种制备方法，应用于如上所述的挡光隔热层，包括步骤：
制备内部有多孔结构的挡光基体；
制备片状团簇结构；以及
将片状团簇结构采用油溶性溶剂进行分散，以涂布至所述挡光基体的多孔结构内形成挡光隔热层；
其中，所述片状团簇结构为亲水性材料制成。
可选的，所述制备片状团簇结构的步骤包括：
石墨烯片状粉体分散液中加入纳米反光材料粉末；
通过超声分散混合预设时间；
置于真空烘箱中真空干燥形成石墨烯材料和反光材料相互掺杂的片状团簇结构。
可选的，所述制备片状团簇结构的步骤包括：
石墨烯片状粉体置于设有纳米反光材料的蒸镀箱；
将纳米反光材料蒸镀于石墨烯片状分体表面形成片状团簇结构。
本申请通过在薄膜晶体管内设置挡光隔热层，挡光隔热层包括挡光基体和片状团簇结构，挡光基体内部设有多孔结构，多孔结构内设有多个孔洞，孔洞能够将入射光线所产生的热量隔绝在挡光隔热层上，降低了光线照射所产生的热量对薄膜晶体管造成的影响，同时片状团簇结构能吸收入射光线所产生的热量，进一步降低了光线照射所产生的热量对薄膜晶体管造成的影响，且挡光隔热层能遮挡背光模组生成的部分光线，避免背光模组生成的光线直接照射到半导体层上而使薄膜晶体管产生电子空穴对，生成光生载流子，改善了背光模组生成的光线对薄膜晶体管的稳定性造成的影响，降低液晶显示器出现显示不良的几率，从而提升了液晶显示器的品质以及使用者的使用体验。
附图说明
所包括的附图用来提供对本申请实施例的进一步的理解，其构成了说明书的一部分，用于例示本申请的实施方式，并与文字描述一起来阐释本申请的原理。显而易见地，下面描述中的附图仅仅是本申请的一些实施例，对于本领域普通技术人员来讲，在不付出创造性劳动性的前提下，还可以根据这些附图获得其他的附图。在附图中：
图1是本申请的第一实施例的一种阵列基板的整体结构示意图；
图2是本申请的第一实施例中挡光隔热层中挡光基体和片状团簇结构在温度低时的结构示意图；
图3是本申请的第一实施例中挡光隔热层中挡光基体和片状团簇结构在温度高时的结构示意图；
图4是本申请的第三实施例的一种制备方法的步骤流程图。
其中，100、挡光隔热层；110、挡光基体；120、片状团簇结构；200、栅极金属层；300、绝缘层；400、半导体层；500、源极金属层；600、漏极金属层；700、钝化层；800、衬底。
具体实施方式
需要理解的是，这里所使用的术语、公开的具体结构和功能细节，仅仅是为了描述具体实施例，是代表性的，但是本申请可以通过许多替换形式来具体实现，不应被解释成仅受限于这里所阐述的实施例。
在本申请的描述中，术语“第一”、“第二”仅用于描述目的，而不能理解为指示相对重要性，或者隐含指明所指示的技术特征的数量。由此，除非另有说明，限定有“第一”、“第二”的特征可以明示或者隐含地包括一个或者更多个该特征；“多个”的含义是两个或两个以上。术语“包括”及其任何变形，意为不排他的包含，可能存在或添加一个或更多其他特征、整数、步骤、操作、单元、组件和/或其组合。
另外，“中心”、“横向”、“上”、“下”、“左”、“右”、“竖直”、“水平”、“顶”、“底”、“内”、“外”等指示的方位或位置关系的术语，是基于附图所示的方位或相对位置关系描述的，仅是为了便于描述本申请的简化描述，而不是指示所指的装置或元件必须具有特定的方位、以特定的方位构造和操作，因此不能理解为对本申请的限制。
此外，除非另有明确的规定和限定，术语“安装”、“相连”、“连接”应做广义理解，例如可以是固定连接，也可以是可拆卸连接，或一体地连接；可以是机械连接，也可以是电连接；可以是直接相连，也可以通过中间媒介间接相连，或是两个元件内部的连通。对于本领域的普通技术人员而言，可以根据具体情况理解上述术语在本申请中的具体含义。
下面参考附图和可选的实施例对本申请作详细说明，需要说明的是,在不相冲突的前提下,以下描述的各实施例之间或各技术特征之间可以任意组合形成新的实施例。
如图1所示，作为本申请的第一实施例，公开了一种阵列基板，所述阵列基板包括薄膜晶体管和衬底800，所述薄膜晶体管设置在所述衬底800上，所述薄膜晶体管包括半导体层400，所述薄膜晶体管还包括挡光隔热层100，所述半导体层400设置在所述挡光隔热层100上，所述挡光隔热层100包括挡光基体110和片状团簇结构120，所述挡光基体110设置有多孔结构，所述多孔结构包括多个孔洞，所述孔洞内设置所述片状团簇结构120，所述挡光隔热层100用于遮挡入射光线，所述片状团簇结构120用于吸收所述入射光线产生的热量。
现有的薄膜晶体管中，通常会因为背光模组的光照而对薄膜晶体管造成一定的影响，例如受到长时间光照后的薄膜晶体管会产生电子空穴对，进而生成光生载流子，影响薄膜晶体管的稳定性，使液晶显示器的显示会出现串扰、残像等显示不良的作用，现有的处理办法一般是使用底栅结构的薄膜晶体管，底栅结构的薄膜晶体管的栅极金属层200一般设置在半导体层400的下方，栅极金属层200会对背光模组的光线起到一定的遮光作用，但是，栅极金属层200并不会隔绝背光模组的光线在照射时所产生的热量，光线所产生的热量仍然会对薄膜晶体管造成一定程度的影响，然而，在本实施例中，在薄膜晶体管中设置挡光隔热层100，所述半导体层400设置在所述挡光隔热层100的上方，挡光隔热层100包括挡光基体110和片状团簇结构120，挡光基体110内部设有多孔结构，多孔结构内设有多个孔洞，孔洞的设置可以将背光模组的入射光线所产生的热量进行隔绝，使得入射光线照射所产生的热量不会传导至薄膜晶体管内部的半导体层400内而对半导体层400造成影响，同时，片状团簇结构120也能够吸收照射到挡光隔热层100的挡光基体110上的光线所产生的热量，多孔结构的挡光基体110和片状团簇结构120的结合设计，降低了背光模组所生成的光线所产生的热量对薄膜晶体管造成的影响，且挡光隔热层100能遮挡背光模组生成的部分光线，背光模组生成的光线不会直接照射到半导体层400上而使得薄膜晶体管产生电子空穴对进而生成光生载流子，改善了背光模组生成的光线对薄膜晶体管的稳定性造成的影响，降低了使用该薄膜晶体管的液晶显示器出现显示不良的几率，从而提升了液晶显示器的品质以及使用者的使用体验。
其中，本实施例中的薄膜晶体管可以是具备顶栅结构的薄膜晶体管设计或是具备底栅结构的薄膜晶体管的设计，下面将以具备底栅结构的薄膜晶体管来进行叙述说明；
具体的，如图1所示，所述薄膜晶体管还包括栅极金属层200、绝缘层300、源极金属层500、漏极金属层600和钝化层700，所述绝缘层300设置在所述栅极金属层200上且覆盖所述栅极金属层200，所述半导体层400设置在所述绝缘层300上，所述源极金属层500和所述漏极金属层600相互间隔设置在所述半导体层400上，所述钝化层700覆盖设置在所述源极金属层500、所述漏极金属层600、所述半导体层400以及所述绝缘层300上；所述挡光隔热层100设置在所述栅极金属层200远离所述半导体层400的一侧上，沿所述衬底800的厚度方向上，即图1中的X轴方向，所述栅极金属层200的正投影覆盖所述半导体层400，所述挡光隔热层100的正投影覆盖所述栅极金属层200，即所述挡光隔热层100的宽度大于所述栅极金属层200的宽度，所述栅极金属层200的宽度大于所述半导体层400的宽度，这里宽度方向为图1中的Y轴方向，本实施例中，通过将栅极金属层200设置在挡光隔热层100的上方，栅极金属层200和挡光隔热层100结合对半导体层400形成二次挡光结构，使半导体层400不会直接受到光线的照射，改善了背光模组生成的光线对薄膜晶体管的稳定性造成的影响，同时，挡光隔热层100的宽度大于栅极金属层200的宽度，挡光隔热层100能完全遮挡住所述栅极金属层200，避免光线照射在栅极金属层200后光线产生的热量使得栅极金属层200的温度上升，而对薄膜晶体管造成一定程度上的影响。
其中，所述片状团簇结构120的体积能随着温度高低变化而变化，所述片状团簇结构120在温度高时的体积比所述片状团簇结构120在温度低时的体积要大，所述片状团簇结构120设置在挡光基体110的多孔结构的孔洞内，背光模组生成的光线照射在挡光隔热层100上时，部分光线会射入挡光基体110的多孔结构的孔洞内，光线照射时所产生的热量会被位于孔洞内的片状团簇结构120吸收，使得位于孔洞内的片状团簇结构120发生形变，如图3所示，填充孔洞的空间，所述片状团簇结构120将吸收的热量转换成形变时所需的能量，避免片状团簇结构120吸收热量过多而导致温度上升，造成影响，其中，所述片状团簇结构120吸收热量发生形变时，所述片状团簇结构120的体积不会将孔洞的空间完全填满，孔洞内依旧存在空间以隔绝热量，所述挡光隔热层100的隔热性能不会因片状团簇结构120发生形变而导致下降。
且在本实施例中，所述片状团簇结构120包括反光材料和吸热材料，所述反光材料和所述吸热材料共同制成所述片状团簇结构120，使得所述片状团簇结构120不仅具备吸收热量的功能的同时，还能对射入挡光基体110的多孔结构的孔洞内的光线进行部分反射，以提高背光模组生成的光线的光线利用率，同时，片状团簇结构120在吸收热量后会发生形变，增大片状团簇结构120的体积，即增加了片状团簇结构120被光线照射的区域，使得片状团簇结构120所能反射的光线增加，进一步提高了背光模组生成的光线的光线利用率，而当背光模组停止射出光线时，所述片状团簇结构120无法吸收热量，所述片状团簇结构120会缓慢恢复至接近未受到光线照射影响时的状态，如图2所示，以备下一次背光模组工作时进行光线的热量吸收以及光线的反射；
其中，所述反光材料可以是银、铜、铝、铁和钛中的一种或其中至少两种的合金，所述吸热材料可以是石墨烯片、聚苯胺、碳纳米管、碳黑和氧化锌中的任意一种，所述挡光基体110是聚氨酯、乙烯/醋酸乙烯酯共聚物和交联聚乙烯中的任意一种制成，设计人员也可以根据使用需求进行选择设计，此处不做限定。
所述反光材料和所述吸热材料可以是混合形成所述片状团簇结构120，也可以是所述反光材料设置在所述吸热材料的外表面以形成所述片状团簇结构120，制作人员可以根据实际生产工序的需求进行选择，此处不做限定。
作为本申请的第二实施例，公开了一种显示面板，包括阵列基板和如上实施例所述的薄膜晶体管，所述薄膜晶体管制备在所述阵列基板上。
作为本申请的第三实施例，公开了一种制备方法，应用于如第一实施例所述的挡光隔热层，包括步骤：
制备内部有多孔结构的挡光基体；
制备片状团簇结构；以及
将片状团簇结构采用油溶性溶剂进行分散，以涂布至所述挡光基体的多孔结构内形成挡光隔热层；
其中，所述片状团簇结构为亲水性材料制成，因片状团簇结构所用材料为亲水性材料，因此不溶于油溶性溶剂，采用油溶性溶剂将片状团簇结构进行分散，但片状团簇结构不溶解，即保持片状团簇结构的形态和结构，将油溶性溶剂分散的片状团簇结构涂布分散于挡光基体中，待油溶性溶剂挥发干燥后，即可得到挡光隔热层，所述挡光隔热层的厚度为0.2μm至2μm之间。
具体的，制备内部有多孔结构的挡光基体的具体步骤，下面将以挡光基体为聚氨酯为例进行说明：
称取20g三羟基聚醚，分别依次滴入0.2g硅油、2g二氯甲烷和0.6g二硅酸二丁基锡；
在40℃～70℃的温度下，均匀搅拌两小时；
加入0.15g三亚乙基二胺和0.2g二乙烯三胺，均匀搅拌一小时；
加入11g聚醚多元醇，在一分钟内搅拌至粘稠状物质；
粘稠状物质干燥后即可得到内部有多孔结构的挡光基体。
具体的，制备片状团簇结构的具体步骤有两种制备方法，下面将分别进行叙述说明；
当所述片状团簇结构为反光材料和吸热材料混合制成时，所述吸热材料以石墨烯材料为例，所述反光材料为纳米级别的银为例，所述片状团簇结构的制备方法的步骤如下：
石墨烯片状粉体分散液中加入纳米银粉末；
通过超声分散混合，时间两小时；
置于真空烘箱中真空干燥形成石墨烯材料和纳米银材料相互掺杂的片状团簇结构。
当所述片状团簇结构为反光材料设置在所述吸热材料的外表面制成时，所述吸热材料以石墨烯材料为例，所述反光材料为纳米级别的银为例，所述片状团簇结构的制备方法的步骤如下：
石墨烯片状粉体置于有纳米银的蒸镀箱，将纳米银蒸镀于石墨烯片的表面形成片状团簇结构；或/石墨烯片状粉体加入到纳米银分散液中，通过搅拌或超声的方式分散均匀，放入真空烘箱中干燥形成片状团簇结构。
本申请的技术方案可以广泛用于各种显示面板，如TN(Twisted Nematic，扭曲向列型)显示面板、IPS(In-Plane Switching，平面转换型)显示面板、VA(VerticalAlignment，垂直配向型)显示面板、MVA(Multi-Domain Vertical Alignment，多象限垂直配向型)显示面板，当然，也可以是其他类型的显示面板，如OLED(Organic Light-EmittingDiode，有机发光二极管)显示面板，均可适用上述方案。
需要说明的是，本申请的发明构思可以形成非常多的实施例，但是申请文件的篇幅有限，无法一一列出，因而，在不相冲突的前提下，以上描述的各实施例之间或各技术特征之间可以任意组合形成新的实施例，各实施例或技术特征组合之后，将会增强原有的技术效果。
以上内容是结合具体的可选实施方式对本申请所作的进一步详细说明，不能认定本申请的具体实施只局限于这些说明。对于本申请所属技术领域的普通技术人员来说，在不脱离本申请构思的前提下，还可以做出若干简单推演或替换，都应当视为属于本申请的保护范围。

Claims (9)

1.一种阵列基板，所述阵列基板包括薄膜晶体管和衬底，所述薄膜晶体管设置在所述衬底上，所述薄膜晶体管包括半导体层，其特征在于，所述薄膜晶体管还包括挡光隔热层，所述半导体层设置在所述挡光隔热层上；
所述挡光隔热层包括挡光基体和片状团簇结构，所述挡光基体设置有多孔结构，所述多孔结构包括多个孔洞，所述孔洞内设置所述片状团簇结构；
其中，所述挡光隔热层用于遮挡入射光线，所述片状团簇结构用于吸收所述入射光线产生的热量；
所述片状团簇结构的体积随温度高低变化，所述片状团簇结构温度高时的体积比所述片状团簇结构温度低时的体积大；
其中，光线照射时所产生的热量会被位于孔洞内的片状团簇结构吸收，使得位于孔洞内的片状团簇结构发生形变，所述片状团簇结构吸收热量发生形变时，所述片状团簇结构的体积不会将孔洞的空间完全填满；
当光线停止射出时，片状团簇结构无法吸收热量，片状团簇结构会缓慢恢复至接近未收到光线照射影响时的状态。
2.根据权利要求1所述的阵列基板，其特征在于，所述薄膜晶体管还包括栅极金属层、绝缘层、源极金属层、漏极金属层和钝化层，所述绝缘层设置在所述栅极金属层上且覆盖所述栅极金属层，所述半导体层设置在所述绝缘层上，所述源极金属层和所述漏极金属层相互间隔设置在所述半导体层上，所述钝化层覆盖设置在所述源极金属层、所述漏极金属层、所述半导体层以及所述绝缘层上；
所述挡光隔热层设置在所述栅极金属层远离所述半导体层的一侧上，沿所述衬底的厚度方向上，所述栅极金属层的正投影覆盖所述半导体层，所述挡光隔热层的正投影覆盖所述栅极金属层。
3.根据权利要求1所述的阵列基板，其特征在于，所述片状团簇结构包括反光材料和吸热材料，所述反光材料和所述吸热材料混合形成所述片状团簇结构。
4.根据权利要求1所述的阵列基板，其特征在于，所述片状团簇结构包括反光材料和吸热材料，所述反光材料设置在所述吸热材料的外表面以形成所述片状团簇结构。
5.根据权利要求3或4所述的阵列基板，其特征在于，所述反光材料是银、铜、铝、铁和钛中的一种或其中至少两种的合金；
所述吸热材料是石墨烯片、聚苯胺、碳纳米管、碳黑和氧化锌中任意一种；
所述挡光基体是聚氨酯、乙烯/醋酸乙烯酯共聚物和交联聚乙烯中任意一种制成。
6.一种显示装置，其特征在于，包括彩膜基板和如权利要求1-5任意一项所述的阵列基板，所述彩膜基板和所述阵列基板对盒设置。
7.一种制备方法，应用于如权利要求1-6任意一项所述的挡光隔热层，其特征在于，包括步骤：
制备内部有多孔结构的挡光基体；
制备片状团簇结构；以及
将片状团簇结构采用油溶性溶剂进行分散，以涂布至所述挡光基体的多孔结构内形成挡光隔热层；
其中，所述片状团簇结构为亲水性材料制成。
8.根据权利要求7所述的制备方法，其特征在于，所述制备片状团簇结构的步骤包括：
石墨烯片状粉体分散液中加入纳米反光材料粉末；
通过超声分散混合预设时间；
置于真空烘箱中真空干燥形成石墨烯材料和反光材料相互掺杂的片状团簇结构。
9.根据权利要求7所述的制备方法，其特征在于，所述制备片状团簇结构的步骤包括：
石墨烯片状粉体置于有纳米反光材料的蒸镀箱；
将纳米反光材料蒸镀于石墨烯片状粉体表面形成片状团簇结构。
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