CN114609778B - Optimization method and optical path structure of dynamic focusing scanning galvanometer system - Google Patents

Optimization method and optical path structure of dynamic focusing scanning galvanometer system Download PDF

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Publication number
CN114609778B
CN114609778B CN202210384792.1A CN202210384792A CN114609778B CN 114609778 B CN114609778 B CN 114609778B CN 202210384792 A CN202210384792 A CN 202210384792A CN 114609778 B CN114609778 B CN 114609778B
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lens
galvanometer
module
axis
dynamic focusing
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CN114609778A (en
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肖荣诗
苏坤
黄婷
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Suzhou Feeltek Laser Technology Co ltd
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Suzhou Feeltek Laser Technology Co ltd
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    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/0012Optical design, e.g. procedures, algorithms, optimisation routines
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/10Scanning systems
    • G02B26/101Scanning systems with both horizontal and vertical deflecting means, e.g. raster or XY scanners
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/09Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
    • G02B27/0938Using specific optical elements
    • G02B27/095Refractive optical elements
    • G02B27/0955Lenses

Abstract

The invention provides an optimization method and an optical path structure of a dynamic focusing scanning galvanometer system. The optimization method integrally considers the dynamic focusing scanning galvanometer system, simulates different working states of the dynamic focusing mirror and the two-axis galvanometer, evaluates the quality of focusing light spots of the system in different working states, and optimizes the system from the whole angle. The optical path structure comprises a first lens, a second lens, an X-axis galvanometer, a Y-axis galvanometer, a third lens, a fourth lens, a fifth lens and a sixth lens; the invention can improve the roundness of Jiao Guangban in the working area of the dynamic focusing scanning galvanometer system and improve the quality of focusing light spots.

Description

Optimization method and optical path structure of dynamic focusing scanning galvanometer system
Technical Field
The invention relates to an optimization method of a dynamic focusing scanning galvanometer system and a light path structure of the system, which are applied to the advanced laser manufacturing fields of laser welding, laser cutting, laser marking and the like.
Background
The dynamic focusing scanning galvanometer system in the prior art mainly has two structures. The first is a structure comprising a dynamic focusing lens group and a biaxial galvanometer, and the defocusing errors at different positions in a three-dimensional space are compensated by the dynamic focusing lens. The second type is a structure comprising a dynamic focusing module, a biaxial galvanometer module and an F-Theta field lens module, wherein the F-Theta field lens realizes two-dimensional scanning on a plane, and the F-Theta field lens is matched with the dynamic focusing module to control the position of a field lens focal plane in the Z direction so as to realize scanning processing in a three-dimensional space.
Patent document application publication No. CN107666981A discloses a method for adjusting the size and position of a laser focus, and patent document publication No. CN21143858U discloses an ultraviolet scanning galvanometer field lens. At present, the optimal design of a dynamic focusing scanning galvanometer system is mainly carried out independently for each module in the system, and in the actual system work, the change of the position of the dynamic focusing mirror and the deflection of the angle of the scanning galvanometer can cause the change of the focusing characteristic of a laser beam on a focal plane, and the independent design and optimization of the dynamic focusing system and an F-Theta field lens can not fully reflect the integral imaging quality of the system.
Disclosure of Invention
Aiming at the problems in the prior art, the invention aims to provide the optimization method of the dynamic focusing scanning galvanometer system, which builds the integral optical path structure of the dynamic focusing scanning galvanometer system, simulates the quality of focusing light spots of the system in different working states, and the simulation result is more in line with the actual working state of the system, optimizes the optical parameters of the system from the integral angle and improves the quality of focusing light spots in the scanning range.
The technical scheme of the invention is as follows.
The first aspect of the invention provides an optimization method of a dynamic focusing scanning galvanometer system, which comprises the following steps:
step S1, carrying out modularized design on a dynamic focusing scanning galvanometer system, dividing the dynamic focusing scanning galvanometer system into a dynamic focusing module, a galvanometer module and an F-Theta field lens module, and respectively carrying out preliminary optimization;
and S2, respectively performing preliminary optimization on the dynamic focusing module, the galvanometer module and the F-Theta field lens module in the step S1, and then combining the two modules together to perform overall optimization on the dynamic focusing scanning galvanometer system.
Preferably, the step S1 further includes:
step S11, designing the dynamic focusing module, and realizing the change of the focusing position of a focusing light spot in the Z-axis direction by controlling the position of a dynamic focusing mirror, and performing preliminary optimization;
step S12, designing the F-Theta field lens module, performing preliminary optimization on the field lens in the F-Theta field lens module, and compensating the defocus error on a scanning plane through the flat field characteristic of the field lens to realize the scanning of the dynamic focusing scanning galvanometer system in the X, Y direction;
s13, designing the galvanometer module; and adding a galvanometer module into the F-Theta field lens module after preliminary optimization, wherein the galvanometer module comprises an X-axis galvanometer and a Y-axis galvanometer, and optimizing two parameters of the distance between the X-axis galvanometer and the Y-axis galvanometer and the distance between the Y-axis galvanometer and the field lens.
Preferably, the step S2 further includes: and combining the three modules subjected to preliminary optimization, and further optimizing to simulate the quality of the focusing light spots of the dynamic focusing mirror and the vibrating mirror in different states in the dynamic focusing scanning vibrating mirror system.
Preferably, in the step S2, when the positions of the dynamic focusing mirrors are-2 mm, 0mm and +2mm, the X-axis galvanometer and the Y-axis galvanometer deflect the light rays in the working states of 0 °, 3 °, 5 °, 7 ° and 10 ° respectively, so as to obtain the focusing condition of the laser beam in the working area, and the focusing position of the tracking light rays is restrained to improve the imaging quality of the whole system and the roundness of the focusing light spots.
A second aspect of the present invention provides an optical path structure of a dynamic focusing scanning galvanometer system designed according to the optimization method of any one of the first aspect of the present invention, including a dynamic focusing module, a galvanometer module, and an F-Theta field lens module;
the dynamic focusing module comprises a first lens and a second lens, the first lens is a dynamic focusing lens, the dynamic moving range is +/-2 mm, and the controlled focusing light spot variable range is +/-10 mm;
the F-Theta field lens module comprises a third lens, a fourth lens, a fifth lens and a sixth lens, the focal length of the F-Theta field lens module is 250mm, and the angle of view is +/-25 degrees;
the vibrating mirror module comprises an X-axis vibrating mirror and a Y-axis vibrating mirror, wherein the two-axis vibrating mirror is characterized by a plane reflecting mirror, and the maximum mechanical deflection angle is +/-10 degrees;
the laser beam sequentially passes through the first lens, the second lens, the X-axis vibrating mirror, the Y-axis vibrating mirror, the third lens, the fourth lens, the fifth lens and the sixth lens and then is focused on a focal plane.
Preferably, the first lens is a biconcave negative lens, the second lens is a biconvex positive lens, the third lens is a biconcave lens, the fourth lens is a meniscus positive lens, the fifth lens is a meniscus positive lens, and the sixth lens is a biconvex positive lens.
Preferably, the radius of curvature of the front surface of the first lens is-20.5 mm, and the radius of curvature of the rear surface is-83.1 mm; the center thickness of the first lens is 2.0mm, and the interval between the first lens and the second lens is 49.2mm; the refractive index of the first lens material is 1.46, and the Abbe's coefficient is 67.8.
Preferably, the radius of curvature of the front surface of the second lens is 137.7mm, and the radius of curvature of the rear surface is-75.9 mm; the center thickness of the second lens is 2.3mm, and the interval between the second lens and the X-axis vibrating mirror is 80.0mm; the refractive index of the second lens material was 1.46, and the Abbe's coefficient was 67.8.
Preferably, the interval between the X-axis vibrating mirror and the Y-axis vibrating mirror is 20.9mm, and the interval between the Y-axis vibrating mirror and the third lens is 35.2mm.
Preferably, the wavelength of the laser beam is 1064nm and the entrance pupil diameter is 5.6mm.
The optimization method of the dynamic focusing scanning galvanometer disclosed by the invention is used for integrally considering the dynamic focusing scanning galvanometer system, evaluating the quality of the focusing light spots of the system under different working states, and optimizing the system from an overall angle, so that the working state of the scanning galvanometer system in practical application is accurately simulated, the focusing capability of the system under different working states is simulated, and each optical element in the system is deeply optimized. The invention also applies the optimization method, designs a dynamic focusing scanning galvanometer system, improves the roundness of a focusing light spot of the system, obtains better imaging quality, and can meet the application requirements in the fields of laser welding, laser cutting, laser marking and the like.
Drawings
Fig. 1 is a schematic diagram of an optical path structure of a dynamic focusing module of a scanning galvanometer system according to the present invention.
FIG. 2 is a schematic diagram of the optical path structure of the F-Theta field lens of the scanning galvanometer system of the invention.
FIG. 3 is a point column diagram of an F-Theta field lens of the scanning galvanometer system of the invention.
FIG. 4 is a schematic diagram of field curvature and distortion of the F-Theta field lens of the scanning galvanometer system of the invention.
FIG. 5 is a schematic view of the optical path structure of the dynamic focus scanning galvanometer system of the invention.
FIG. 6 is a point column diagram of a dynamic focus scanning galvanometer system prior to optimization.
FIG. 7 is a point column diagram of an optimized dynamic focus scanning galvanometer system.
Detailed Description
Embodiments of the present invention will be described in detail below with reference to the accompanying drawings.
The optimization method of the dynamic focusing scanning galvanometer system is to carry out modularized design and integrity optimization on the system. The dynamic focusing scanning galvanometer system of the invention can be divided into a dynamic focusing module, a galvanometer module and an F-Theta field lens module. Specifically, the optimization method comprises the following four steps:
(1) The dynamic focusing module of the system is designed. As shown in fig. 1, the focusing position of the focusing spot in the Z-axis direction can be changed by controlling the position of the dynamic focusing mirror, and preliminary optimization is performed by optical design software. The dynamic focusing module comprises a first lens and a second lens, wherein the first lens is a dynamic focusing lens, the dynamic movement range is +/-2 mm, and the controlled focusing light spot can be changed within a range of +/-10 mm.
(2) And designing an F-Theta field lens module of the system. As shown in fig. 2, the field lens is initially optimized by using optical design software, and the defocus error on the scanning plane is compensated by the flat field characteristic of the field lens, so that the scanning of the dynamic focusing scanning galvanometer system in the X, Y direction is realized. The F-Theta field lens comprises a third lens, a fourth lens, a fifth lens and a sixth lens, the focal length of the F-Theta field lens is 250mm, and the angle of view is +/-25 degrees.
(3) And designing a galvanometer module of the system. And adding a galvanometer module into the F-Theta field lens module after preliminary optimization, wherein the galvanometer module comprises an X-axis galvanometer and a Y-axis galvanometer, the characteristics of the two-axis galvanometers are plane mirrors, and the maximum mechanical deflection angle is +/-10 degrees. And optimizing two parameters of the distance between the X-axis vibrating mirror and the Y-axis vibrating mirror and the distance between the Y-axis vibrating mirror and the field lens in optical design software.
(4) And optimizing the dynamic focusing scanning galvanometer system. As shown in fig. 5, the above-mentioned three modules which are preliminarily optimized are combined, and further optimized by using optical design software, so as to simulate the quality of focusing light spots of a dynamic focusing mirror and a galvanometer in different states in a system. In the dynamic focusing scanning galvanometer system designed by the invention, when the positions of the dynamic focusing mirrors are considered to be-2 mm, 0mm and +2mm, the X-axis galvanometer and the Y-axis galvanometer deflect working states of 0 DEG, 3 DEG, 5 DEG, 7 DEG and 10 DEG respectively, the light rays in the different working states are tracked, the focusing condition of the laser beam in a working area is obtained, and the imaging quality of the whole system and the roundness of focusing light spots are improved by restricting the focusing position of the tracked light rays.
In the dynamic focusing scanning galvanometer system, laser beams are focused on a focal plane after passing through a first lens, a second lens, an X-axis galvanometer, a Y-axis galvanometer, a third lens, a fourth lens, a fifth lens and a sixth lens in sequence.
The first lens is a biconcave negative lens. In a preferred embodiment, the radius of curvature of the front surface of the first lens is-20.5 mm, the radius of curvature of the rear surface is-83.1 mm, the center thickness of the first lens is 2.0mm, and the interval between the first lens and the second lens is 49.2mm. The refractive index of the first lens material was 1.46, and the abbe's coefficient was 67.8.
The second lens is a biconvex lens type positive lens. In a preferred embodiment, the radius of curvature of the front surface of the second lens is 137.7mm, the radius of curvature of the rear surface is-75.9 mm, the center thickness of the second lens is 2.3mm, and the distance between the second lens and the X-axis vibrating mirror is 80.0mm. The refractive index of the second lens material was 1.46, and the abbe's coefficient was 67.8.
As shown in fig. 1, the first lens and the second lens form a dynamic focusing module, and the focal point position can be controlled by changing the first lens (dynamic focusing lens).
The X-axis vibrating mirror is a plane reflecting mirror, and the interval between the X-axis vibrating mirror and the Y-axis vibrating mirror is 20.9mm.
The Y-axis vibrating mirror is a plane reflecting mirror, and the interval between the Y-axis vibrating mirror and the third lens is 35.2mm.
The third lens is a biconcave lens. In a preferred embodiment, the radius of curvature of the front surface of the third lens is-64.5 mm, the radius of curvature of the rear surface of the third lens is-1196.0 mm, the center thickness of the third lens is 7.7mm, and the distance between the third lens and the fourth lens is 1.2mm. The refractive index of the third lens material was 1.74, and the abbe's coefficient was 49.4.
The fourth lens is a meniscus positive lens. In a preferred embodiment, the radius of curvature of the front surface of the fourth lens is-904.2 mm, the radius of curvature of the rear surface of the fourth lens is-257.9 mm, the center thickness of the fourth lens is 7.4mm, and the interval between the fourth lens and the fifth lens is 1.9mm. The refractive index of the fourth lens material was 1.67, and the abbe's coefficient was 47.1.
The fifth lens is a meniscus positive lens. In a preferred embodiment, the radius of curvature of the front surface of the fifth lens is-205.767 mm, the radius of curvature of the rear surface of the fifth lens is-86.357 mm, the center thickness of the fifth lens is 11.4mm, and the interval between the fifth lens and the sixth lens is 1.9mm. The refractive index of the fifth lens material was 1.80, and the abbe's coefficient was 28.4.
The sixth lens is a biconvex positive lens. In a preferred embodiment, the radius of curvature of the front surface of the sixth lens is 3814.8mm, the radius of curvature of the rear surface is-189.7 mm, and the center thickness of the sixth lens is 25.0mm. The refractive index of the sixth lens material was 1.99, and the abbe's coefficient was 20.9.
As shown in fig. 2, the third, fourth, fifth and sixth lenses constitute an F-Theta field lens module, and fig. 3 and 4 are a point column diagram and a curvature of field/distortion diagram of the F-Theta field lens. From the figure, it can be seen that the F-Theta field lens module is diffraction limited.
The whole light path structure of the dynamic focusing scanning galvanometer system is shown in figure 5. The state of the galvanometer system during operation can be simulated by setting the dynamic focusing lens position and the galvanometer deflection angle in optical design software.
FIG. 6 is a plot of the system's points at different locations when the individual modules that have undergone preliminary optimization are not being optimized as a whole. FIG. 7 is a plot of points of the system at different locations after the overall optimization of the various modules of the preliminary optimization using the optimization method described by the present invention. Comparing the two images, the roundness of the focusing light spot of the system is obviously improved after the optimization, and the imaging quality of the system is obviously improved in the scanning range.
By applying the optimization method of the invention, the designed dynamic focusing scanning galvanometer system has the laser wavelength of 1064nm, the entrance pupil diameter of 5.6mm, the maximum working range of not more than 160mm multiplied by 20mm, the preferred processing range of 100mm multiplied by 20mm, the focusing light spot of the system is smaller than 50um, the focusing light spot is small, the roundness of the focusing light spot is high, and the light spot consistency is good.
The optimization method of the dynamic focusing scanning galvanometer can more accurately simulate the working state of the scanning galvanometer system in practical application, simulate the focusing capability of the system under different working states, and perform deeper optimization on each optical element in the system. By applying the optimization method, a dynamic focusing scanning galvanometer system is designed, the roundness of focusing light spots of the system is improved, better imaging quality is obtained, and the application requirements in the fields of laser welding, laser cutting, laser marking and the like can be met.

Claims (10)

1. The optimizing method of the dynamic focusing scanning galvanometer system is characterized by comprising the following steps of:
step S1, carrying out modularized design on a dynamic focusing scanning galvanometer system, dividing the dynamic focusing scanning galvanometer system into a dynamic focusing module, a galvanometer module and an F-Theta field lens module, and respectively carrying out preliminary optimization; the dynamic focusing module comprises a first lens and a second lens, the first lens is a dynamic focusing lens, the dynamic moving range is +/-2 mm, and the controlled focusing light spot variable range is +/-10 mm; the F-Theta field lens module comprises a third lens, a fourth lens, a fifth lens and a sixth lens, the focal length of the F-Theta field lens module is 250mm, and the angle of view is +/-25 degrees; the vibrating mirror module comprises an X-axis vibrating mirror and a Y-axis vibrating mirror, wherein the two-axis vibrating mirror is characterized by a plane reflecting mirror, and the maximum mechanical deflection angle is +/-10 degrees; the laser beam sequentially passes through the first lens, the second lens, the X-axis vibrating mirror, the Y-axis vibrating mirror, the third lens, the fourth lens, the fifth lens and the sixth lens and then is focused on a focal plane; the first lens is a biconcave negative lens, the second lens is a biconvex positive lens, the third lens is a biconcave lens, the fourth lens is a meniscus positive lens, the fifth lens is a meniscus positive lens, and the sixth lens is a biconvex positive lens;
and S2, respectively performing preliminary optimization on the dynamic focusing module, the galvanometer module and the F-Theta field lens module in the step S1, and then combining the two modules together to perform overall optimization on the dynamic focusing scanning galvanometer system.
2. The method for optimizing a dynamic focus scanning galvanometer system according to claim 1, wherein the step S1 further comprises:
step S11, designing the dynamic focusing module, and realizing the change of the focusing position of a focusing light spot in the Z-axis direction by controlling the position of a dynamic focusing mirror, and performing preliminary optimization;
step S12, designing the F-Theta field lens module, performing preliminary optimization on the field lens in the F-Theta field lens module, and compensating the defocus error on a scanning plane through the flat field characteristic of the field lens to realize the scanning of the dynamic focusing scanning galvanometer system in the X, Y direction;
s13, designing the galvanometer module; and adding a galvanometer module into the F-Theta field lens module after preliminary optimization, wherein the galvanometer module comprises an X-axis galvanometer and a Y-axis galvanometer, and optimizing two parameters of the distance between the X-axis galvanometer and the Y-axis galvanometer and the distance between the Y-axis galvanometer and the field lens.
3. The method for optimizing a dynamic focus scanning galvanometer system according to claim 2, wherein the step S2 further comprises: and combining the three modules subjected to preliminary optimization, and further optimizing to simulate the quality of the focusing light spots of the dynamic focusing mirror and the vibrating mirror in different states in the dynamic focusing scanning vibrating mirror system.
4. The optimizing method of a dynamic focusing scanning galvanometer system according to claim 3, wherein the step S2 performs tracking on the light beams in the working states of 0 °, 3 °, 5 °, 7 ° and 10 ° respectively deflected by the X-axis galvanometer and the Y-axis galvanometer when the position of the dynamic focusing mirror is-2 mm, 0mm and +2mm, so as to obtain the focusing condition of the laser beam in the working area, and improves the imaging quality of the whole system and the roundness of the focusing light spot by restricting the focusing position of the tracking light beam.
5. The optical path structure of the dynamic focusing scanning galvanometer system designed by the optimization method according to any one of claims 1 to 4, which is characterized by comprising a dynamic focusing module, a galvanometer module and an F-Theta field lens module;
the dynamic focusing module comprises a first lens and a second lens, the first lens is a dynamic focusing lens, the dynamic moving range is +/-2 mm, and the controlled focusing light spot variable range is +/-10 mm;
the F-Theta field lens module comprises a third lens, a fourth lens, a fifth lens and a sixth lens, the focal length of the F-Theta field lens module is 250mm, and the angle of view is +/-25 degrees;
the vibrating mirror module comprises an X-axis vibrating mirror and a Y-axis vibrating mirror, wherein the two-axis vibrating mirror is characterized by a plane reflecting mirror, and the maximum mechanical deflection angle is +/-10 degrees;
the laser beam sequentially passes through the first lens, the second lens, the X-axis vibrating mirror, the Y-axis vibrating mirror, the third lens, the fourth lens, the fifth lens and the sixth lens and then is focused on a focal plane;
the first lens is a biconcave negative lens, the second lens is a biconvex positive lens, the third lens is a biconcave lens, the fourth lens is a meniscus positive lens, the fifth lens is a meniscus positive lens, and the sixth lens is a biconvex positive lens.
6. The optical path structure of claim 5, wherein the first lens has a front surface radius of curvature of-20.5 mm and a rear surface radius of curvature of-83.1 mm; the center thickness of the first lens is 2.0mm, and the interval between the first lens and the second lens is 49.2mm; the refractive index of the first lens material is 1.46, and the Abbe's coefficient is 67.8.
7. The optical path structure of claim 5, wherein the second lens has a front surface radius of curvature of 137.7mm and a rear surface radius of curvature of-75.9 mm; the center thickness of the second lens is 2.3mm, and the interval between the second lens and the X-axis vibrating mirror is 80.0mm; the refractive index of the second lens material was 1.46, and the Abbe's coefficient was 67.8.
8. The optical path structure of claim 5, wherein a distance between the X-axis galvanometer and the Y-axis galvanometer is 20.9mm, and a distance between the Y-axis galvanometer and the third lens is 35.2mm.
9. The optical path structure of claim 5, wherein the laser beam has a wavelength of 1064nm and an entrance pupil diameter of 5.6mm.
10. The optical path structure according to any one of claims 6 to 8, wherein the laser beam has a wavelength of 1064nm and an entrance pupil diameter of 5.6mm.
CN202210384792.1A 2022-04-13 2022-04-13 Optimization method and optical path structure of dynamic focusing scanning galvanometer system Active CN114609778B (en)

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Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102012554A (en) * 2010-10-26 2011-04-13 中国航天科工集团第三研究院第八三五八研究所 Large-caliber F-Theta scanning lens with output light perpendicular to image surface
CN110426831A (en) * 2019-06-17 2019-11-08 华南师范大学 A kind of focus illumination system and method
CN110749986A (en) * 2019-11-11 2020-02-04 中国科学院上海技术物理研究所 Infrared continuous zooming area array scanning optical system and image motion compensation method
CN114185165A (en) * 2021-11-12 2022-03-15 中林信达(北京)科技信息有限责任公司 Image space scanning optical system based on large-field-of-view objective lens and single point source detector

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003127455A (en) * 2001-10-24 2003-05-08 Ricoh Co Ltd Optical scanner

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102012554A (en) * 2010-10-26 2011-04-13 中国航天科工集团第三研究院第八三五八研究所 Large-caliber F-Theta scanning lens with output light perpendicular to image surface
CN110426831A (en) * 2019-06-17 2019-11-08 华南师范大学 A kind of focus illumination system and method
CN110749986A (en) * 2019-11-11 2020-02-04 中国科学院上海技术物理研究所 Infrared continuous zooming area array scanning optical system and image motion compensation method
CN114185165A (en) * 2021-11-12 2022-03-15 中林信达(北京)科技信息有限责任公司 Image space scanning optical system based on large-field-of-view objective lens and single point source detector

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