CN114574833B - 搬送装置及成膜装置 - Google Patents

搬送装置及成膜装置 Download PDF

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Publication number
CN114574833B
CN114574833B CN202111373251.0A CN202111373251A CN114574833B CN 114574833 B CN114574833 B CN 114574833B CN 202111373251 A CN202111373251 A CN 202111373251A CN 114574833 B CN114574833 B CN 114574833B
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CN
China
Prior art keywords
adhesion preventing
conveying
preventing plate
ceiling portion
vapor deposition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN202111373251.0A
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English (en)
Chinese (zh)
Other versions
CN114574833A (zh
Inventor
砂川贵宏
佐藤功康
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Tokki Corp
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Canon Tokki Corp
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Publication date
Application filed by Canon Tokki Corp filed Critical Canon Tokki Corp
Publication of CN114574833A publication Critical patent/CN114574833A/zh
Application granted granted Critical
Publication of CN114574833B publication Critical patent/CN114574833B/zh
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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/568—Transferring the substrates through a series of coating stations
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Physical Vapour Deposition (AREA)
  • Electroluminescent Light Sources (AREA)
  • Chemical Vapour Deposition (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
CN202111373251.0A 2020-11-30 2021-11-19 搬送装置及成膜装置 Active CN114574833B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2020-198683 2020-11-30
JP2020198683A JP7213226B2 (ja) 2020-11-30 2020-11-30 搬送装置、および成膜装置

Publications (2)

Publication Number Publication Date
CN114574833A CN114574833A (zh) 2022-06-03
CN114574833B true CN114574833B (zh) 2023-09-12

Family

ID=81768150

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202111373251.0A Active CN114574833B (zh) 2020-11-30 2021-11-19 搬送装置及成膜装置

Country Status (3)

Country Link
JP (1) JP7213226B2 (ko)
KR (1) KR102690287B1 (ko)
CN (1) CN114574833B (ko)

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06136536A (ja) * 1992-10-22 1994-05-17 Kobe Steel Ltd 連続蒸着めっき装置
JPH06158305A (ja) * 1992-11-27 1994-06-07 Shimadzu Corp インラインスパッタリング装置
CN102119237A (zh) * 2008-09-19 2011-07-06 株式会社爱发科 对等离子体显示器面板的基板形成保护膜的方法以及该保护膜的形成装置
CN104947062A (zh) * 2014-03-26 2015-09-30 斯克林集团公司 真空成膜装置
CN106029938A (zh) * 2014-02-19 2016-10-12 堺显示器制品株式会社 成膜装置
CN206768212U (zh) * 2017-06-08 2017-12-19 合肥鑫晟光电科技有限公司 成膜设备

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20040256215A1 (en) 2003-04-14 2004-12-23 David Stebbins Sputtering chamber liner
US8668956B2 (en) 2011-03-14 2014-03-11 Sharp Kabushiki Kaisha Vapor deposition particle emitting device, vapor deposition apparatus, vapor deposition method
JP5951532B2 (ja) 2013-03-12 2016-07-13 住友重機械工業株式会社 成膜装置
SG11201701880WA (en) * 2015-08-20 2017-04-27 Ulvac Inc Sputtering apparatus and method of discriminating state thereof

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06136536A (ja) * 1992-10-22 1994-05-17 Kobe Steel Ltd 連続蒸着めっき装置
JPH06158305A (ja) * 1992-11-27 1994-06-07 Shimadzu Corp インラインスパッタリング装置
CN102119237A (zh) * 2008-09-19 2011-07-06 株式会社爱发科 对等离子体显示器面板的基板形成保护膜的方法以及该保护膜的形成装置
CN106029938A (zh) * 2014-02-19 2016-10-12 堺显示器制品株式会社 成膜装置
CN104947062A (zh) * 2014-03-26 2015-09-30 斯克林集团公司 真空成膜装置
CN206768212U (zh) * 2017-06-08 2017-12-19 合肥鑫晟光电科技有限公司 成膜设备

Also Published As

Publication number Publication date
KR20220076323A (ko) 2022-06-08
CN114574833A (zh) 2022-06-03
KR102690287B1 (ko) 2024-07-30
JP2022086585A (ja) 2022-06-09
JP7213226B2 (ja) 2023-01-26

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