CN114488399A - Template for preparing optical waveguide device and preparation method and application thereof - Google Patents
Template for preparing optical waveguide device and preparation method and application thereof Download PDFInfo
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- CN114488399A CN114488399A CN202210114101.6A CN202210114101A CN114488399A CN 114488399 A CN114488399 A CN 114488399A CN 202210114101 A CN202210114101 A CN 202210114101A CN 114488399 A CN114488399 A CN 114488399A
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B6/13—Integrated optical circuits characterised by the manufacturing method
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B6/12004—Combinations of two or more optical elements
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B2006/12166—Manufacturing methods
Abstract
The application discloses a method for preparing a template of an optical waveguide device, and further discloses the template of the optical waveguide device prepared by the method, a method for manufacturing the optical waveguide device by using the template, the optical waveguide device prepared by using the method and application. The fluorinated polyimide is used as a material for preparing the optical waveguide device capable of being applied to optical interconnection, so that the harsh high-temperature and high-pressure conditions during the preparation of a PCB (printed circuit board) can be endured, and the service temperature of the prepared optical waveguide device is increased from 100 ℃ to 200 ℃ or above. The optical waveguide device prepared by the method has extremely low optical absorption loss at optical communication wave bands of 1330nm and 1550nm, and can effectively meet the application requirements of optical communication devices.
Description
Technical Field
The application relates to a template for preparing an optical waveguide device, and belongs to the technical field of etching.
Background
In recent years, with the continuous improvement of semiconductor process technology, especially the continuous increase of scale and density of integrated circuits, the conventional electrical interconnection technology is subject to its physical characteristics, and is inevitable to suffer from parasitic effect, signal delay, serious crosstalk, high power consumption, and the like when high-speed and high-frequency signals are transmitted. Therefore, researchers are more and more paying attention to the scheme of using light beams to replace the traditional metal copper wires for information transmission, namely, optical interconnection is used for replacing electrical interconnection.
At present, there are two types of optical interconnection technology implementation modes studied more: optical fiber-based optical interconnection technology and optical waveguide-based optical interconnection technology.
1. Optical fiber optical interconnection technology
The optical interconnection realized by the optical fiber has the advantages of simple structure, lower cost and mature technology, and is widely used for realizing cabinet-level optical interconnection.
In board-level optical fiber interconnection, optical fibers are usually buried in a PCB (printed circuit board) to realize high-speed interconnection between the transmitting and receiving modules. However, in order to embed the optical fiber into the PCB, a groove with a special shape needs to be manufactured for fixing, and the groove placement or batch manufacturing is difficult. In addition, the optical fiber embedding has a problem of process compatibility compared with the conventional PCB. The traditional PCB manufacture needs high temperature (170-180 ℃) and high pressure (15 kP/cm)2) The fiber under such conditions will have a change in its spacing and also risks deformation under stress and oxidative degradation at high temperatures. The optical fibers that are currently common are mainly Glass Optical Fibers (GOF) and Polymer Optical Fibers (POF). The former has a high melting temperature (250 ℃), but is likely to cause problems such as lip formation and peeling during the end face treatment. The latter is the greatest disadvantage of poor high temperature resistance, for example, the limit temperature of a conventional plexiglass core is about 80 ℃, the temperature of a fluorinated polycarbonate core is as high as 165 ℃, but it is also difficult to cope with the harsh manufacturing environment of a PCB.
2. Optical waveguide fiber interconnection technology
The optical interconnection technology based on the optical waveguide is to use the optical waveguide as a transmission medium of an optical signal, wherein a light beam is bound in the optical waveguide, and a transmission path and a transmission direction of the light beam are completely defined by the transmission medium. In order to satisfy the total reflection condition, the refractive index of the core layer in the optical waveguide needs to be larger than that of the cladding layer.
The polymer material is more and more widely applied to photoelectric devices mainly due to the characteristics of low cost, easy preparation and acquisition and capability of being coated on various types of substrates to be integrated with other photoelectric devices. The polymer materials commonly used for preparing the optical waveguide device at present comprise polymethyl methacrylate (PMMA), polysiloxane, various epoxy resins, polyimide and the like. Among these polymer materials, polyimide is the most promising polymer optical waveguide material at present because it can resist very low temperature, such as brittle failure in liquid helium at-269 ℃ and can resist heat temperature up to 380 ℃ and above.
Disclosure of Invention
According to one aspect of the present application, a method of fabricating an optical waveguide device template is provided.
A method of fabricating an optical waveguide device template, the method comprising the steps of:
(1-1) placing a substrate on a three-dimensional piezoelectric platform, focusing laser on the surface of the substrate to form laser spots, and performing laser etching to generate grooves to obtain a laser-etched substrate;
(1-2) fixing the substrate subjected to laser etching in a processing cavity, performing reactive ion etching, and processing the groove to obtain a substrate subjected to reactive ion etching;
and (1-3) putting the substrate etched by the reactive ions into a washing and etching device, washing and etching, and further processing the groove to obtain the optical waveguide device template.
Specifically, on one hand, a 1080nm femtosecond laser amplifier is used for processing quartz, the laser irradiated area is modified, and then a sample is etched through reactive ion etching (RIE/ICP). Since the femtosecond laser processed region can generate the change of chemical energy, the region can generate the difference of etching speed with the unmodified region and can be etched at a higher speed. And the etching time is continuously increased, so that the etched groove is expanded outwards, the size is increased, and finally the optical waveguide device template groove with better roughness and regular shape is obtained.
Optionally, in the step (1-1):
the focusing is carried out by adopting an objective lens, and the magnification of the objective lens is 50-100 times; the numerical aperture of the objective lens is 0.42-0.9.
Preferably, the laser etching is performed by using a femtosecond laser source.
Preferably, the femtosecond laser source has the wavelength of 1023-1033nm, the repetition frequency of 50-100KHz, the laser processing power of 1-1.5W and the pulse scanning rate of 1-1.2 mm/s.
Preferably, the laser spot has a diameter of 1-2 μm.
Preferably, in the step (1-2):
fixing, namely fixing the laser etched substrate in a processing cavity by adopting heat-conducting glue;
the reactive ion etching adopts argon as gas; the gas flow rate is 100-; the etching time is 20-180 s.
Preferably, in the step (1-3):
the washing and etching are carried out by adopting hydrofluoric acid; the washing and etching time is 20-30 min; the concentration of the hydrofluoric acid is 0.3% -0.4%.
In order to further improve the roughness condition of the inner surface of the groove and reduce the roughness and undulation degree of the upper surface of the optical waveguide device prepared by using the template as a template, thereby reducing the scattering loss of light beams during transmission in the optical waveguide device, hydrofluoric acid is adopted for etching, and the etching is carried out for 20-30min (the etching time cannot be too long, otherwise, the size of the groove of the template can be further enlarged), so that the template of the optical waveguide device with better effect can be obtained.
In a second aspect of the present application, there is provided an optical waveguide device template obtained by the above-mentioned fabrication method.
The optical waveguide device template obtained by the preparation method of the optical waveguide device template comprises the following steps:
the surface smoothness of the grooves of the optical waveguide device template is 20-50 nm.
The smoothness of the surface of the concave part of the groove of the optical waveguide device template can influence the fluctuation degree of the upper surface of the ridge waveguide of the core layer of the optical waveguide device, thereby influencing the transmission loss of light in the waveguide device. Therefore, it is necessary to control the size of the optical fiber to be within λ/10(λ 1550nm) to reduce the rayleigh scattering loss caused by the optical fiber.
The inventor of the application believes that the optical waveguide device template obtained by the method can have very high smoothness, which is beneficial to the subsequent preparation of the optical waveguide device with a smooth upper surface and reduces the transmission loss of the optical waveguide device.
In a third aspect of the present application, a method of making an optical waveguide device using the above-described optical waveguide device template is provided.
A method for manufacturing an optical waveguide device, comprising the steps of:
(2-1) obtaining a low refractive index polyamic acid slurry;
(2-2) obtaining a high refractive index polyamic acid slurry;
(2-3) coating the high-refractive-index polyamic acid slurry obtained in the step (2-2) on the surface of the optical waveguide device template to fill polyamic acid in the groove of the optical waveguide device, and heating to cure and thermally imidize the high-refractive-index polyamic acid slurry to obtain the optical waveguide device template with the high-refractive-index polyimide film on the surface;
the final filling degree of polyimide in the grooves of the template can affect the size consistency of the finally prepared optical waveguide device and the designed optical waveguide device template, thereby affecting the mode field distribution condition of light in the waveguide device, and the mode field distribution condition needs to be controlled to be more than 60%. Preferably, the filling level is 80% to 100%.
(2-4) coating the low-refractive-index polyamic acid slurry obtained in the step (2-3) on the optical waveguide device template with the high-refractive-index polyimide film on the surface, which is obtained in the step (2-4), and heating to cure and thermally imidize the low-refractive-index polyamic acid slurry to obtain the optical waveguide device template with the low-refractive-index polyimide film outer layer and the high-refractive-index polyimide film inner layer;
(2-5) placing the optical waveguide device template with the low-refractive-index polyimide film outer layer and the high-refractive-index polyimide film inner layer obtained in the step (2-4) in water, soaking and stripping to obtain an optical waveguide device with a ridge type made of a high-refractive-index polyimide film and a ridge type back surface covered with the low-refractive-index polyimide film;
(2-6) coating the low-refractive-index polyamide acid slurry obtained in the step (2-1) on the ridge surface of the optical waveguide device with the ridge shape obtained in the step (2-5) being a high-refractive-index polyimide film and the back surface of the ridge shape being covered with the low-refractive-index polyimide film, heating to cure the polyamide acid slurry, and performing thermal imidization to obtain the optical waveguide device;
and (3) the optical waveguide device template obtained in the step (2-3) is the optical waveguide device template obtained by the preparation method.
The inventors of the present application have found that polyimides prepared by TFDB and 6FDA contain a trifluoromethyl group which is completely fluorinated. Because the fluoroalkyl is a natural electronegative group, the fluoroalkyl can disturb a molecular chain, so that the flexibility and the free volume of the molecular chain are increased, electron clouds are blocked, and the interchain effect is reduced. The molecular chain spacing is increased, the PI solubility is increased, and the processing and forming are facilitated. And the fluoride has less natural infrared absorption wave band, and can effectively reduce the optical loss in the communication wave band. In addition, the fluorinated polyimide not only can keep the characteristics of high thermal stability and chemical stability of the polyimide, but also can reduce the dielectric constant, the refractive index, the moisture absorption rate and the thermal expansion coefficient along with the increase of the fluorine content, improve the light transmission and reduce the light absorption loss of a communication waveband.
Optionally, after the step (2-6), there is a step (2-7):
(2-7) the section of the obtained optical waveguide device with the polyimide film coated on both sides is cut and polished by a dicing saw to obtain a clean optical waveguide device with the polyimide film coated on both sides.
Alternatively, the step of obtaining the low refractive index polyamic acid paste is:
(2-1) reacting 2,2' -bis (trifluoromethyl) -4,4' -diaminobiphenyl and 4,4' - (hexafluoroisopropylidene) diphthalic anhydride in an atmosphere of an inert gas to obtain polyamic acid;
and dissolving polyamide acid in N, N-dimethylacetamide to obtain the low-refractive-index polyamide acid slurry.
Optionally, the step of obtaining the high refractive index polyamic acid slurry is:
and (2-2) adding the nano particles into the low-refractive-index polyamic acid slurry obtained in the step (2-1), and stirring to obtain the high-refractive-index polyamic acid slurry.
Preferably, the nanoparticles have a particle size of 10nm to 70 nm.
Preferably, the nanoparticles are selected from NaYF4：Er3+,Yb3+、NaCeF4：Er3+,Yb3+、BaYF5：Er3+,Yb3+And the like.
The nano particles are uniform in size and are uniformly dispersed in the polyamic acid slurry.
Optionally, the coating method is spin coating, and the method comprises the following steps:
firstly, placing a device to be coated on rotary coating equipment, dropwise adding the required polyamic acid slurry, rotating at the rotating speed of 600-650 r/min for 6-10 s to ensure that the required polyamic acid slurry is uniformly distributed, and then rotating at 5000-7000 r/min for 20-30 s to remove the redundant polyamic acid slurry;
the method for curing and thermally imidizing the polyamic acid slurry comprises the following steps:
placing the device obtained after spin coating in heating equipment, drying and curing, wherein the drying temperature is 80-100 ℃, and the drying time is 10-30 min; drying, and performing gradient thermal imidization at a heating rate of 1.5-2 deg.C/min, a temperature step of 30-50 deg.C, a step heat preservation time of 30-50 min, and a maximum temperature of 300-350 deg.C.
In a fourth aspect of the present application, there is provided an optical waveguide device obtained by the above method.
An optical waveguide device prepared according to the above method:
the thickness of the polyimide film with the low refractive index is 40-50 mu m;
the thickness of the polyimide film with the high refractive index is 1.5-2.4 μm;
preferably, the percentage of the difference between the refractive indexes of the high refractive index polyimide film and the low refractive index polyimide film and the refractive index of the cladding layer is delta n/n 00 to 3 percent.
Optionally, the optical waveguide device:
when the wavelength of incident light is 1.30 mu m, the light absorption loss is 0.7dB/cm-1.5 dB/cm;
the light absorption loss is 0.3dB/cm to 1.5dB/cm at the wavelength of 1.55 μm.
In a fifth aspect of the present application, there is provided the above optical waveguide device, and the use of the optical waveguide device obtained by the above method in an optical waveguide device for PCB board level optical interconnection.
The beneficial effects that this application can produce include:
1) the fluorinated polyimide is used as a material for preparing the optical waveguide device capable of being applied to optical interconnection, so that the harsh high-temperature and high-pressure conditions during the preparation of a PCB (printed circuit board) can be endured, and the service temperature of the prepared optical waveguide device is increased from 100 ℃ to 200 ℃ or above.
2) The optical waveguide device prepared by the method has extremely low optical absorption loss (fluorine is introduced) at 1330nm and 1550nm of optical communication wave bands, and can effectively meet the application requirements of the optical communication device.
3) The method for preparing the optical waveguide device by the layer-by-layer template method is simple and easy to operate, can inherit the shape of the template groove without large-scale equipment, and can be applied to large-scale production.
Drawings
FIG. 1 is a schematic view of the synthesis of polyamic acid and polyimide in example 1 of the present application;
fig. 2 is a schematic end view of a process of processing a femtosecond laser template assisted by dry-wet etching in example 1 of the present application, in which (a) represents femtosecond laser pulse processing, (b) represents dry etching treatment of a basic template obtained in (a), and (c) represents further hydrofluoric acid etching of the template;
FIG. 3 is a flowchart of a layer-by-layer template method for manufacturing an optical waveguide device in example 1 of the present application;
FIG. 4 is a front side metallographic microscopic view (magnified 50 times) of a base optical waveguide device prepared by a template method according to example 1 of the present application;
FIG. 5 is a front side metallographic microscopic view (magnified 200 times) of a base optical waveguide device prepared by a template method according to example 1 of the present application;
FIG. 6 is a side end microscopic view (100 times magnified) of the basic optical waveguide device prepared by the template method in example 1 of the present application;
FIG. 7 is a light transmittance test chart of a basic optical waveguide device prepared by a template method in example 1 of the present application;
fig. 8 is a flowchart of an optical waveguide device fabricated by the templating method in example 4 of the present application.
Detailed Description
The present application will be described in detail with reference to examples, but the present application is not limited to these examples.
Unless otherwise specified, the raw materials and catalysts in the examples of the present application were purchased commercially, and the raw materials and catalysts were purchased from Wuhan Yimaide New materials science and technology, Inc.
EXAMPLE 1 preparation of Polyamic acid syrup
Perfluorinated diamine TFDB and dianhydride 6FDA are selected as synthesis raw materials, and are fully stirred and reacted for 24 hours under the protection of nitrogen in a water removal solvent DMAC, so that a polyimide precursor solution, namely polyamic acid (PAA) dissolved in the DMAC can be prepared.
EXAMPLE 2 preparation of template by reactive ion etching
An end view schematic diagram of the experimental process is shown in fig. 2, a 1080nm femtosecond laser amplifier is used for processing quartz, a laser irradiated area is modified, and then a sample is etched through reactive ion etching (RIE/ICP).
The template manufacturing method comprises the following steps:
(1) and respectively placing the quartz plates in deionized water, acetone, isopropanol and ethanol in sequence, carrying out ultrasonic treatment for 20min by using an ultrasonic machine, and blow-drying by using nitrogen to obtain clean and dry quartz plates.
(2) The processed quartz sample is placed on a three-dimensional piezoelectric platform, a femtosecond laser light source with the wavelength of 1080nm is used for experiments, the repetition frequency is selected to be 50KHz, the magnification factor of an objective lens is 50 times, the numerical aperture is 0.42, the femtosecond laser is conducted through a light path and focused on the surface of a quartz piece through a focusing objective lens to carry out laser processing on the quartz piece, and the diameter of a light spot focused on the surface of the quartz piece is about 1.5 um. The three-dimensional displacement platform can be controlled by the computer program to move, the specific laser processing power is set to be 1W, the laser pulse scanning rate is set to be 1mm/s, a specific optical waveguide device sample graph is drawn, and the initial optical waveguide device template can be obtained through processing. And after the laser processing is finished, placing the sample into deionized water for ultrasonic treatment, and removing some particles remained after the processing.
(3) And fixing the sample processed by the femtosecond laser in the reactive ion etching processing cavity by using heat-conducting glue, wherein the gas used for etching is argon, and when the flow rate of the etching gas is 100sccm, a stable etching damage rate (a direct current bias value of 340V) can be obtained. And adjusting the etching time according to the etching effect to finally obtain the optical waveguide device template groove with a regular shape and low inner surface roughness.
(4) And (4) putting the structure obtained in the step (3) into hydrofluoric acid, and carrying out washing and etching for 20-30min (the washing and etching time cannot be too long, otherwise, the size of the groove of the template can be further enlarged), so that the optical waveguide device template with better effect can be obtained.
Since the femtosecond laser processed region can generate the change of chemical energy, the region can generate the difference of etching speed with the unmodified region and can be etched at a faster speed, and a structure similar to the structure of fig. 2(b) is formed. And the etching time is continuously increased, so that the etched groove is expanded outwards, the size is increased, and finally the optical waveguide device template groove with better roughness and regular shape is obtained.
EXAMPLE 3 hydrofluoric acid etch preparation of template
In order to further improve the roughness of the inner surface of the groove and reduce the roughness of the upper surface of the optical waveguide device prepared by using the groove as the template, thereby reducing the scattering loss of light beams during transmission in the optical waveguide device, the structure in fig. 2(b) can be put into hydrofluoric acid for washing and etching for 30min (the washing and etching time cannot be too long, otherwise, the size of the groove of the template can be further enlarged), and a better-effect optical waveguide device template can be obtained, as shown in fig. 2 (c).
EXAMPLE 4 fabrication of optical waveguide device
(1) And respectively placing the prepared optical waveguide device template in deionized water, acetone, isopropanol and ethanol in sequence, carrying out ultrasonic treatment for 15-20min by using an ultrasonic machine, and blow-drying by using nitrogen to obtain a clean and dry template sheet.
(2) Placing a template sheet on a rotary table of a spin coater, performing vacuum adsorption, dropwise adding a proper amount of prepared PAA slurry (with high refractive index and rare earth nano particle doping) on the template sheet, and uniformly spreading the PAA slurry with high viscosity at the rotating speed of 650r/min for 6 s; and then the surplus slurry is removed by spinning at the rotating speed of 5000r/min for 30 s.
(3) Putting the whole into a baking oven with programmable temperature control, drying the surface of the product at 80 ℃ for 30min, and gradually heating the product to 300 ℃ from 100 ℃ by taking the temperature difference of 50 ℃ as a step to finish thermal curing and thermal imidization. The obtained inverted ridge type optical waveguide device core layer can well inherit the shape of the template groove, and the thickness of the bottom region (thin film) of the inverted ridge type waveguide is about 1.5 mu m.
(4) And dropwise adding a proper amount of PAA slurry on the obtained core layer, and rotating at the rotating speed of 400r/min for 30 s. And (4) placing the core layer into an oven, controlling the temperature to 300 ℃ with the procedure in the step (3), and obtaining the cladding layer tightly combined with the core layer.
(5) And (5) soaking the structure obtained in the step (4) in deionized water for 5min, peeling the whole core layer and the cladding layer of the waveguide device from the template sheet, and drying by using nitrogen.
(6) And (3) sticking the whole of the core layer and the cladding layer of the waveguide device with the core layer facing upwards on a clean glass substrate by using a high-temperature resistant double-sided adhesive tape, dripping a proper amount of PAA slurry, and rotating at the rotating speed of 400r/min for 30 s. And (3) placing the optical waveguide device in an oven, controlling the temperature to 300 ℃ according to the procedure in the step (3), and obtaining a complete optical waveguide device structure.
(7) And cutting and cleaving the obtained complete optical waveguide device end face by using a dicing saw, and polishing the end face to obtain the optical waveguide device applicable to optical interconnection, wherein the optical waveguide device can also be independently subjected to subsequent optical tests.
The prepared optical waveguide device is subjected to preliminary light transmission test, the used test wavelength is 1550nm (c waveband, communication lowest loss window), and the result is shown in fig. 7, so that the prepared optical waveguide device has better light condensation and light transmission capacity;
the prepared optical waveguide device is subjected to preliminary loss test, the used test wavelength is 1550nm (c waveband, communication lowest loss window), the used test method is optical fiber end face coupling, the influence of coupling loss is eliminated by a truncation method, and finally the transmission loss of the optical waveguide device is measured to be 1.14 dB/cm.
Although the present application has been described with reference to a few embodiments, it should be understood that various changes, substitutions and alterations can be made herein without departing from the spirit and scope of the application as defined by the appended claims.
Claims (10)
1. A method for preparing a template of an optical waveguide device, the method comprising the steps of:
(1-1) placing a substrate on a three-dimensional piezoelectric platform, focusing laser on the surface of the substrate to form laser spots, and performing laser etching to generate grooves to obtain a laser-etched substrate;
(1-2) fixing the substrate subjected to laser etching in a processing cavity, performing reactive ion etching, and processing the groove to obtain a substrate subjected to reactive ion etching;
and (1-3) putting the substrate etched by the reactive ions into a washing and etching device, washing and etching, and further processing the groove to obtain the optical waveguide device template.
2. The method of making an optical waveguide device template according to claim 1, wherein in step (1-1):
the focusing is carried out by adopting an objective lens, and the magnification of the objective lens is 50-100 times; the numerical aperture of the objective lens is 0.42-0.9;
preferably, the laser etching is performed by using a femtosecond laser light source;
preferably, the femtosecond laser light source has the wavelength of 1023-1033nm, the repetition frequency of 50-100KHz, the laser processing power of 1-1.5W and the pulse scanning rate of 1-1.2 mm/s;
preferably, the diameter of the laser spot is 1-2 μm;
preferably, in the step (1-2):
fixing, namely fixing the laser etched substrate in a processing cavity by adopting heat-conducting glue;
the reactive ion etching adopts argon as gas; the gas flow rate is 100-; the etching time is 20-180 s;
preferably, in the step (1-3):
the washing and etching are carried out by adopting hydrofluoric acid; the washing and etching time is 20-30 min; the concentration of the hydrofluoric acid is 0.3% -0.4%.
3. An optical waveguide device template obtained by the method for producing an optical waveguide device template according to any one of claims 1 or 2, characterized in that:
the surface smoothness of the grooves of the optical waveguide device template is 20-50 nm.
4. A method for manufacturing an optical waveguide device, comprising the steps of:
(2-1) obtaining a low refractive index polyamic acid slurry;
(2-2) obtaining a high refractive index polyamic acid slurry;
(2-3) coating the high-refractive-index polyamic acid slurry obtained in the step (2-2) on the surface of the optical waveguide device template to fill polyamic acid in the groove of the optical waveguide device, and heating to cure and thermally imidize the high-refractive-index polyamic acid slurry to obtain the optical waveguide device template with the high-refractive-index polyimide film on the surface;
(2-4) coating the low-refractive-index polyamic acid slurry obtained in the step (2-1) on the optical waveguide device template with the high-refractive-index polyimide film on the surface, which is obtained in the step (2-3), and heating to cure and thermally imidize the low-refractive-index polyamic acid slurry to obtain the optical waveguide device template with the low-refractive-index polyimide film outer layer and the high-refractive-index polyimide film inner layer;
(2-5) placing the optical waveguide device template with the low-refractive-index polyimide film outer layer and the high-refractive-index polyimide film inner layer obtained in the step (2-4) in water, soaking and stripping to obtain an optical waveguide device with a ridge type made of a high-refractive-index polyimide film and a ridge type back surface covered with the low-refractive-index polyimide film;
(2-6) coating the low-refractive-index polyamide acid slurry obtained in the step (2-1) on the ridge surface of the optical waveguide device with the ridge shape obtained in the step (2-5) being a high-refractive-index polyimide film and the back surface of the ridge shape being covered with the low-refractive-index polyimide film, heating to cure the polyamide acid slurry, and performing thermal imidization to obtain the optical waveguide device;
the optical waveguide device template according to step (2-3), which is the optical waveguide device template obtained by the production method according to any one of claims 1-2.
5. The method for producing an optical waveguide device according to claim 4, wherein the step of obtaining the low refractive index polyamic acid paste is:
(2-1) reacting 2,2' -bis (trifluoromethyl) -4,4' -diaminobiphenyl and 4,4' - (hexafluoroisopropylidene) diphthalic anhydride in an atmosphere of an inert gas to obtain polyamic acid;
and dissolving polyamide acid in N, N-dimethylacetamide to obtain the low-refractive-index polyamide acid slurry.
6. The method for producing an optical waveguide device according to claim 4, wherein: the steps for obtaining the high-refractive index polyamic acid slurry are as follows:
(2-2) adding the nano particles into the low-refractive-index polyamic acid slurry obtained in the step (2-1), and stirring to obtain a high-refractive-index polyamic acid slurry;
preferably, the particle size of the nanoparticles is 10nm to 70 nm;
preferably, the nanoparticles are selected from NaYF4：Er3+,Yb3+、NaCeF4：Er3+,Yb3+、BaYF5：Er3+,Yb3+At least one of (1).
7. The method for producing an optical waveguide device according to claim 4,
the coating method is spin coating and comprises the following steps:
firstly, placing a device to be coated on rotary coating equipment, dropwise adding the required polyamic acid slurry, rotating at the rotating speed of 600-650 r/min for 6-10 s to enable the required polyamic acid slurry to be uniformly distributed, then rotating at 5000-7000 r/min for 20-30 s, and throwing off the redundant polyamic acid slurry;
the method for curing and thermally imidizing the polyamic acid slurry comprises the following steps:
placing the device obtained after spin coating in heating equipment, drying and curing, wherein the drying temperature is 80-100 ℃, and the drying time is 10-30 min; drying, and performing gradient thermal imidization at a heating rate of 1.5-2 deg.C/min, a temperature step of 30-50 deg.C, a step heat preservation time of 30-50 min, and a maximum temperature of 300-350 deg.C.
8. An optical waveguide device obtained by the method according to any one of claims 4 to 7, wherein:
the thickness of the polyimide film with the low refractive index is 40-50 mu m;
the thickness of the polyimide film with the high refractive index is 1.5-2.4 μm;
preferably, the percentage of the difference between the refractive indexes of the high-refractive-index polyimide film and the low-refractive-index polyimide film and the refractive index of the cladding layer is delta n/n00 to 3 percent.
9. The optical waveguide device of claim 8, wherein the optical waveguide device:
when the wavelength of incident light is 1.30 mu m, the light absorption loss is 0.7dB/cm-1.5 dB/cm;
the light absorption loss is 0.3dB/cm to 1.5dB/cm at the wavelength of 1.55 μm.
10. An optical waveguide device obtained by the manufacturing method of any one of claims 4 to 7, and use of the optical waveguide device of any one of claims 8 to 9 in PCB board level optical interconnection.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
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