CN114481095A - Cleaning process and equipment for internal fittings of chemical vapor deposition equipment - Google Patents

Abstract

The invention discloses a cleaning process and equipment for internal accessories of chemical vapor deposition equipment, and has the advantages that under complex process conditions and sequences, the deposition process can be transmitted in a multi-cavity according to the process sequence, particularly in a process section which can generate toxic and highly-polluted substances, a relatively independent cavity is particularly important, special materials and a safe treatment process can be adopted, cavity cleaning and tail gas treatment can be completed in a targeted manner, meanwhile, the risk of cross contamination generated in different process sections in the same cavity is avoided, the time of a deposition reaction is saved, the safety is increased, and the service lives of the cavity and the equipment are prolonged.

Description

Cleaning process and equipment for internal fittings of chemical vapor deposition equipment

Technical Field

The invention relates to the technical field of chemical vapor deposition film equipment, in particular to a cleaning process and equipment for internal accessories of the chemical vapor deposition equipment.

Background

Typical chemical vapor deposition processes expose a substrate to one or more different precursors, and allow the multiple vapors to chemically react and/or decompose under reaction conditions such as high temperature, plasma, etc., to produce a deposited film on the substrate surface. Compared with the plasma technology, the hot wire method can prepare large-area diamond films, has the lowest comprehensive cost and good industrial popularization potential,

at present, equipment of mainstream equipment manufacturers on the market generally only has one reaction cavity, and can not carry out multiple processes simultaneously, and because the components and the flow of gas phases are different and the required temperature is different when films with different layers and different sizes are deposited, when another process is carried out after one process is finished, the time for changing reaction conditions is longer, so that higher cost is caused, defects are also caused, and quality problems are caused. For example, when a diamond film material is deposited, the required working temperature ranges from 1600 ℃ to 2400 ℃, the reaction pressure is between 5 and 100 mbar, the reacted gas phase forms different permutation and combination in hydrogen, methane, diborane, oxygen and nitrogen, and the method is suitable for films with different forms, and the service life of the hot wire is greatly influenced by the process and gas phase adjustment, so that the quality is relatively poor, the operation cost is high, the equipment cavity is only suitable for one arrangement mode, and the yield of a single cavity is too low under the same reaction condition, so that the large-scale industrial production and market requirements cannot be met; the application scenarios of single-cavity devices are also often limited, and devices that lay flat on a substrate cannot be used for deposition of vertically placed substrates, so that the present application has been made in order to solve the above problems.

Disclosure of Invention

The technical scheme of the invention for realizing the aim is as follows: a cleaning apparatus for internal fittings of a chemical vapor deposition apparatus, comprising: the inner side of the chemical vapor deposition reaction box is arranged on the flow distribution cavity structure, the transportation structure, the cleaning structure and the gas regulation structure;

the shunting cavity structure includes: the system comprises a plurality of flow distribution reaction cavities, an active gas tank, a plurality of transfer boxes, a plurality of transfer drainage valves, an air pump, a flow distribution valve, a plurality of drainage tubes and a sealing assembly;

a plurality of the reposition of redundant personnel reaction chamber even install in the inboard of chemical vapor deposition reaction box, the active gas jar install in on the chemical vapor deposition reaction box, a plurality of the transfer case is installed respectively in a plurality of on the reposition of redundant personnel reaction chamber, a plurality of transfer drainage valve cartridge respectively in a plurality of on the reposition of redundant personnel reaction chamber, and a plurality of transfer drainage valve cartridge respectively in a plurality of on the transfer case, the aspiration pump install in on the active gas jar, the reposition of redundant personnel valve install in on the aspiration pump, just the reposition of redundant personnel valve is connected in a plurality of on the drainage tube, a plurality of the drainage tube cartridge respectively in a plurality of on the reposition of redundant personnel negative pressure chamber, seal assembly installs respectively in a plurality of on the reposition of redundant personnel reaction chamber.

Preferably, the transportation structure comprises: the device comprises a polynomial threaded rod, a plurality of carrying threaded pipes, a plurality of limiting shafts, a plurality of carrying concave carrying blocks, a carrying driver, a plurality of hot wires, a plurality of molybdenum electrodes, a plurality of hot wire brackets and a lifting assembly;

the multinomial threaded rod passes through the bearing cartridge in a plurality of on the reposition of redundant personnel reaction chamber, a plurality of spacing axle cartridge respectively in a plurality of on the reposition of redundant personnel reaction chamber, a plurality of the transport screwed pipe cartridge respectively in a plurality of carry on the concave type transport piece on, a plurality of the transport screwed pipe is suit respectively on the multinomial threaded rod, the transport driving machine install in on the chemical vapor deposition reaction box, a plurality of the heater support is installed in a plurality of through lifting unit respectively carry on the concave type transport piece of thing, a plurality of heater and a plurality of molybdenum electrode are installed respectively in a plurality of the heater support and a plurality of carry on the concave type transport piece of thing.

Preferably, the gas regulating structure comprises: the device comprises a plurality of shunt circular pipes, a plurality of reticular shunt pipes, a plurality of transfer collection boxes, a plurality of extraction collection pumps, a plurality of electric heating pipes, a plurality of cooling pipes and a plurality of radiators;

the split-flow circular tube is respectively installed on a plurality of on the split-flow reaction chamber, a plurality of netted shunt tubes are respectively connected on a plurality of on the drainage tube, and a plurality of netted shunt tubes are respectively connected in a plurality of on the split-flow circular tube, a plurality of the transfer collecting box is installed respectively in a plurality of on the split-flow reaction chamber, a plurality of the extraction collection pump is connected respectively in a plurality of on the transfer collecting box, and a plurality of the extraction collection pump other end is connected respectively in a plurality of on the split-flow reaction chamber, a plurality of electrothermal tube and a plurality of the cooling tube is connected respectively in a plurality of on the transfer case, a plurality of the radiator is installed respectively in a plurality of on the outside of transfer case.

Preferably, the cleaning structure comprises: the device comprises a plurality of limiting shaft tubes, a plurality of electromagnetic circular rings, a plurality of magnet circular rings, a plurality of square-shaped cleaning blocks and a plurality of square-shaped cleaning brushes;

the device comprises a plurality of shunting reaction cavities, a plurality of limiting shaft tubes, a plurality of clip-shaped cleaning blocks, a plurality of electromagnet rings, a plurality of clip-shaped cleaning blocks, a plurality of magnet rings, a plurality of clip-shaped cleaning blocks and a plurality of clip-shaped cleaning brushes, wherein the limiting shaft tubes are respectively arranged on the shunting reaction cavities in pairs in parallel, the clip-shaped cleaning blocks are respectively sleeved on the limiting shaft tubes, the electromagnet rings are respectively sleeved on the limiting shaft tubes in parallel, the plurality of magnet rings are respectively arranged on the clip-shaped cleaning blocks, and the clip-shaped cleaning brushes are respectively arranged on the clip-shaped cleaning blocks.

Preferably, the sealing assembly comprises: the device comprises a plurality of inflation pumps, a plurality of lifting hydraulic push rods, a plurality of convex sealing lifting auxiliary blocks, a plurality of lifting sealing concave slideways, a plurality of lifting sealing convex sliding blocks, a plurality of lifting sealing plates, a plurality of clip-shaped inflation pads, a plurality of convex sealing extrusion blocks and a plurality of sealing rubber pads;

a plurality of lifting hydraulic push rods are respectively arranged on a plurality of shunting reaction cavities, a plurality of convex sealing lifting auxiliary blocks are respectively arranged on the pushing ends of the lifting hydraulic push rods, a plurality of lifting sealing blocks are respectively arranged on a plurality of convex sealing lifting auxiliary blocks, a plurality of concave lifting sealing slideways are respectively arranged on a plurality of shunting reaction cavities, a plurality of convex lifting sealing sliders are respectively arranged on a plurality of lifting sealing plates, a plurality of convex lifting sealing sliders are respectively movably inserted into the inner sides of a plurality of concave lifting sealing slideways, extrusion ports are respectively arranged on a plurality of lifting sealing plates, a plurality of clip-shaped inflatable cushions are respectively arranged on a plurality of lifting sealing plates, a plurality of convex sealing extrusion blocks are respectively movably inserted into the inner sides of a plurality of extrusion ports, and a plurality of the convex sealing extrusion blocks are respectively connected with a plurality of the clip-shaped air cushion, and a plurality of the sealing rubber cushions are respectively arranged on a plurality of the convex sealing extrusion blocks.

Preferably, the lifting assembly comprises: the device comprises a plurality of lifting scissor brackets, a plurality of lifting hydraulic cylinders, a plurality of conveying shafts, a plurality of conveying wheels, a plurality of conveying chain wheels, a plurality of conveying chains and a plurality of conveying driving machines;

a plurality of the fork support is cut in the lift install respectively in a plurality of carry on the concave type transport piece, a plurality of hydraulic cylinder installs respectively in a plurality of carry on the concave type transport piece, a plurality of heater support installs respectively in a plurality of fork support and a plurality of are cut in the lift the promotion of hydraulic cylinder is served, a plurality of the transportation axle is installed in a plurality of through the bearing respectively on the heater support, a plurality of the haulage wheel is installed respectively in a plurality of transport epaxially, a plurality of transport sprocket is installed respectively in a plurality of transport epaxially, a plurality of transport driving machine drive end is connected respectively in a plurality of transport epaxially, a plurality of transport chain suit respectively in a plurality of transport sprocket is last.

Preferably, a plurality of the transportation driving machines and a plurality of the transportation chains are respectively provided with a protection plate.

Preferably, a plurality of the transfer boxes are respectively provided with a gas sensor at the inner side.

A cleaning process of internal fittings of chemical vapor deposition equipment comprises the following operation steps: step S1, conducting flow in gas transfer; step S2, heating and coating by gas; step S3, gas transfer and collection; step S4, raw material transportation;

step S1 gas transfer drainage: the gas to be used is guided to the inner side of the transfer box, and the gas of different raw materials is subjected to primary treatment through the transfer box;

step S2 gas heating coating: heating the plate through the transportation structure;

step S3 gas transit collection: recovering and collecting waste gas generated by the reaction;

step S4 raw material transportation: the raw materials are transported to be processed one by one.

In the step S2, the heights of the respective flow-dividing reaction chambers are adjusted at the same time by the transport structure, so as to achieve stability of transportation and deposition under different process parameters.

According to the cleaning process and the equipment for the internal fittings of the chemical vapor deposition equipment manufactured by the technical scheme, under complex process conditions and sequences, the deposition process can be transmitted in a multi-cavity according to the process sequence, particularly in a process section which can generate toxic and high-pollution substances, a relatively independent cavity is particularly important, special materials and a safe treatment process can be adopted, cavity cleaning and tail gas treatment can be completed in a targeted manner, meanwhile, the risk of cross contamination generated by different process sections in the same cavity is avoided, the time of deposition reaction is saved, the safety is increased, and the service lives of the cavity and the equipment are prolonged.

Drawings

FIG. 1 is a schematic front view of a chemical vapor deposition apparatus and a process for cleaning the internal parts of the apparatus according to the present invention.

Fig. 2 is an enlarged view of a portion "a" in fig. 1.

Fig. 3 is an enlarged view of a portion "B" in fig. 1.

In the figure: 1. a chemical vapor deposition reaction chamber; 2. a shunting reaction chamber; 3. a reactive gas tank; 4. a transfer box; 5. a transfer drainage valve; 6. an air pump; 7. a shunt valve; 8. a drainage tube; 9. a polynomial threaded rod; 10. carrying the threaded pipe; 11. a limiting shaft; 12. carrying concave carrying blocks; 13. carrying the driving machine; 14. a shunt ring pipe; 15. a mesh shunt tube; 16. a transfer collection box; 17. an air extraction collection pump; 18. a limiting shaft tube; 19. an electromagnetic ring; 20. a magnet ring; 21. a cleaning block in a shape of a Chinese character 'hui'; 22. a cleaning brush in a shape of a Chinese character 'hui'; 23. an inflator pump; 24. lifting a hydraulic push rod; 25. the convex sealing lifting auxiliary block; 26. a lifting sealing concave slideway; 27. lifting the sealing convex slide block; 28. lifting the sealing plate; 29. a clip-shaped inflatable cushion; 30. the convex seal extrusion block.

Detailed Description

All the electrical components in the present application are connected with the power supply adapted to the electrical components through the wires, and an appropriate controller should be selected according to actual conditions to meet the control requirements, and specific connection and control sequences should be obtained.

Example 1

As shown in fig. 1 to 3, the inside of the chemical vapor deposition reaction chamber 1 is installed in a distribution chamber structure, a transport structure, a cleaning structure, and a gas conditioning structure;

specifically, the shunting cavity structure includes: the device comprises a plurality of flow dividing reaction cavities 2, an active gas tank 3, a plurality of transfer boxes 4, a plurality of transfer drainage valves 5, an air pump 6, a flow dividing valve 7, a plurality of drainage tubes 8 and a sealing component;

specifically, a plurality of the shunting reaction chambers 2 are uniformly arranged on the inner side of the chemical vapor deposition reaction box 1, the active gas tank 3 is arranged on the chemical vapor deposition reaction box 1, a plurality of the transit boxes 4 are respectively arranged on a plurality of the diversion reaction cavities 2, a plurality of the transit drainage valves 5 are respectively inserted on a plurality of the diversion reaction cavities 2, and a plurality of the transfer drainage valves 5 are respectively inserted on a plurality of the transfer boxes 4, the air pump 6 is installed on the active gas tank 3, the shunt valve 7 is installed on the air pump 6, and the shunt valve 7 is connected on a plurality of the drainage tubes 8, the drainage tubes 8 are respectively inserted on the shunt negative pressure cavities, and the sealing components are respectively arranged on the shunt reaction cavities 2.

During the use, through the inboard of bleeder valve 7 with the reaction gas drainage of 3 inboards of active gas jar through aspiration pump 6, through the inboard of bleeder valve 7 with gas drainage to a plurality of transfer case 4, mix through adding different gases in the transfer case 4 to a plurality of, later through a plurality of transfer drainage valve 5 with the inboard air drainage of transfer case 4 to the inboard of a plurality of reposition of redundant personnel reaction chamber 2 to reach and inject different gases according to the demand of difference to the inboard of reposition of redundant personnel reaction chamber 2.

Example 2

As shown in fig. 1-3, the transport structure comprises: the device comprises a polynomial threaded rod 9, a plurality of carrying threaded pipes 10, a plurality of limiting shafts 11, a plurality of carrying concave carrying blocks 12, a carrying driver 13, a plurality of hot wires, a plurality of molybdenum electrodes, a plurality of hot wire brackets and a lifting assembly;

specifically, polynomial threaded rod 9 passes through the bearing cartridge in a plurality of on the reposition of redundant personnel reaction chamber 2, a plurality of spacing axle 11 cartridge respectively in a plurality of on the reposition of redundant personnel reaction chamber 2, a plurality of transport screwed pipe 10 cartridge respectively in a plurality of carry on the concave type transport piece 12, a plurality of transport screwed pipe 10 suit respectively on polynomial threaded rod 9, transport driving machine 13 install in on the chemical vapor deposition reaction box 1, a plurality of the heater support is installed in a plurality of respectively through lifting unit carry on the concave type transport piece 12 of thing, a plurality of heater and a plurality of molybdenum electrode are installed respectively in a plurality of heater support and a plurality of carry on the concave type transport piece 12 of thing.

During the use, through carrying the operation of driving machine 13, it is rotatory to drive polynomial threaded rod 9 on the driving end of carrying driving machine 13, it removes to drive a plurality of transport screwed pipe 10 on it through polynomial threaded rod 9, thereby reach and carry out relative movement with a plurality of transport screwed pipe 10, later reverse operation, a plurality of transport screwed pipe 10 reverse operation, it moves to carry concave type transport piece 12 of year thing on it respectively through a plurality of transport screwed pipe 10, carry the lifting unit on it through carrying concave type transport piece 12, heat the electrode pair through a plurality of heater and a plurality of molybdenum raw material plate and gas, carry the raw materials through lifting unit, thereby reach and carry out relative transport with the gas of 2 inboards of a plurality of reposition of redundant personnel reaction chamber and remove.

Example 3

As shown in fig. 1-3, the gas regulating structure comprises: the device comprises a plurality of shunt circular ring pipes 14, a plurality of reticular shunt pipes 15, a plurality of transfer collection boxes 16, a plurality of extraction collection pumps 17, a plurality of electric heating pipes, a plurality of cooling pipes and a plurality of radiators;

specifically, a plurality of reposition of redundant personnel ring tube 14 is installed respectively in a plurality of on reposition of redundant personnel reaction chamber 2, a plurality of netted shunt tubes 15 is connected respectively in a plurality of on drainage tube 8, and a plurality of netted shunt tubes 15 is connected respectively in a plurality of on reposition of redundant personnel ring tube 14, a plurality of transfer collecting box 16 is installed respectively in a plurality of on reposition of redundant personnel reaction chamber 2, a plurality of air suction collection pump 17 is connected respectively in a plurality of on transfer collecting box 16, and a plurality of air suction collection pump 17 other end is connected respectively in a plurality of on reposition of redundant personnel reaction chamber 2, a plurality of electrothermal tube and a plurality of the cooling tube is connected respectively in a plurality of on transfer case 4, a plurality of the radiator is installed respectively in a plurality of on the outside of transfer case 4.

During the use, through the inboard of the gas drainage to reposition of redundant personnel ring tube 14 of the inboard of diversion drainage valve 5 of the netted shunt tubes 15 of a plurality of, spray gas emission to the inboard of a plurality of reposition of redundant personnel reaction chamber 2 through reposition of redundant personnel ring tube 14, through a plurality of air exhaust collection pump 17 with the inboard gaseous drainage to the inboard of the reaction of a plurality of reposition of redundant personnel reaction chamber to the inboard of transfer collecting box 16, heat or cool off the gas in the transfer box 4 through a plurality of electrothermal tube and a plurality of cooling tube.

Example 4

As shown in fig. 1-3, the cleaning structure comprises: the device comprises a plurality of limiting shafts 11, a plurality of electromagnetic rings 19, a plurality of magnet rings 20, a plurality of square-shaped cleaning blocks 21 and a plurality of square-shaped cleaning brushes 22;

specifically, a plurality of the limiting shaft 11 pipes are respectively installed on the plurality of shunting reaction chambers 2 in a pairwise parallel manner, a plurality of the clip-shaped cleaning blocks 21 are respectively sleeved on the plurality of limiting shaft 11 pipes, a plurality of the electromagnet rings 20 are respectively sleeved on the plurality of limiting shaft 11 pipes in a horizontal parallel manner, a plurality of the magnet rings 20 are respectively installed on the plurality of clip-shaped cleaning blocks 21, and a plurality of the clip-shaped cleaning brushes 22 are respectively installed on the plurality of clip-shaped cleaning blocks 21.

During the use, circular ring 20 is switched on in proper order through a plurality of electro-magnet to reach magnetism in proper order and drive magnet circular ring 20 and rise, thereby reach magnet circular ring 20 and go up and down, through the lift of a plurality of magnet circular ring 20, drive the shape cleaning block 21 that returns on it respectively and go up and down, drive the shape cleaning brush 22 that returns on it through returning shape cleaning block 21, through returning shape cleaning brush 22 with shunting reaction chamber 2 inside survey and go up and down to clean.

Example 5

As shown in fig. 1-3, the seal assembly comprises: the device comprises a plurality of inflation pumps 23, a plurality of lifting hydraulic push rods 24, a plurality of convex sealing lifting auxiliary blocks 25, a plurality of lifting sealing concave slideways 26, a plurality of lifting sealing convex sliding blocks 27, a plurality of lifting sealing plates 28, a plurality of clip-shaped inflation pads 29, a plurality of convex sealing extrusion blocks 30 and a plurality of sealing rubber pads;

specifically, a plurality of the lifting hydraulic push rods 24 are respectively installed on a plurality of the shunting reaction chambers 2, a plurality of the convex sealing lifting auxiliary blocks 25 are respectively installed on the pushing ends of a plurality of the lifting hydraulic push rods 24, a plurality of the lifting sealing blocks are respectively installed on a plurality of the convex sealing lifting auxiliary blocks 25, a plurality of the lifting sealing concave slideway 26 are respectively installed on a plurality of the shunting reaction chambers 2, a plurality of the lifting sealing convex sliding blocks 27 are respectively installed on a plurality of the lifting sealing plates 28, a plurality of the lifting sealing convex sliding blocks 27 are respectively movably inserted inside a plurality of the lifting sealing concave slideway 26, a plurality of the lifting sealing plates 28 are respectively provided with extrusion ports, a plurality of the rectangular inflatable cushions 29 are respectively installed on a plurality of the lifting sealing plates 28, the plurality of convex sealing extrusion blocks 30 are respectively movably inserted into the inner sides of the plurality of extrusion openings, the plurality of convex sealing extrusion blocks 30 are respectively connected to the plurality of clip-shaped inflatable cushions 29, and the plurality of sealing rubber cushions are respectively arranged on the plurality of convex sealing extrusion blocks 30.

During the use, go up and down through a plurality of lift hydraulic push rod 24, it goes up and down to drive lift hydraulic push rod 24 and drive protruding type sealed lift auxiliary block 25 above that, it goes up and down to drive lift sealing plate 28 above that through protruding type sealed lift auxiliary block 25, through going up and down lift sealing plate 28 between before the reaction of a plurality of reposition of redundant personnel, aerify the inflation pad 29 to a plurality of time shape through a plurality of pump 23, it is flexible to drive protruding type sealed extrusion piece 30 above that through time shape inflatable pad 29, it is sealed to extrude a plurality of reposition of redundant personnel reaction chamber 2 through the flexible of protruding type sealed extrusion piece 30.

Example 6

As shown in fig. 1-3, the lifting assembly comprises: the device comprises a plurality of lifting scissor brackets, a plurality of lifting hydraulic cylinders, a plurality of conveying shafts, a plurality of conveying wheels, a plurality of conveying chain wheels, a plurality of conveying chains and a plurality of conveying driving machines;

specifically, a plurality of the fork support is cut in a plurality of respectively to the lift install in a plurality of carry on the concave type transport piece 12, a plurality of hydraulic cylinder installs respectively in a plurality of carry on the concave type transport piece 12, a plurality of heater support installs respectively in a plurality of fork support and a plurality of are cut in the lift the promotion of hydraulic cylinder is served, a plurality of the transportation axle is installed in a plurality of through the bearing respectively on the heater support, a plurality of the haulage wheel is installed respectively in a plurality of on the transportation axle, a plurality of the transportation sprocket is installed respectively in a plurality of on the transportation axle, a plurality of the transportation driving machine drive end is connected respectively in a plurality of on the transportation axle, a plurality of transportation chain suit is in a plurality of respectively on the transportation sprocket.

When the device is used, the hot wire supports on the hot wire supports are respectively driven to lift through the lifting of the plurality of lifting hydraulic cylinders, the transport driving machine on the hot wire supports runs to drive the transport chain wheels on the driving end of the transport driving machine to rotate, the transport chain wheels on the transport driving machine are driven to rotate through the transport chain wheels, the transport chain wheels on the transport chain wheels are driven to rotate through the transport chain wheels, the transport shaft on the transport chain wheels and the transport wheels on the transport shaft are respectively driven to lift through the transport chain wheels, so that the plate is transported, the plate is transported in the plurality of shunting reaction cavities 2, the plurality of shunting reaction cavities 2 are sealed through the sealing assembly, the vacuum is pumped to 100 millibars, the hot wire heating is started, wafers or substrates in the shunting reaction cavities 2 are preheated to 100 degrees and 150 degrees, and the partition plates between the shunting reaction cavities 2 and the shunting reaction cavities 2 are opened, the wafer is sequentially transported to the inner side of the other shunting reaction cavity 2 through the transportation structure, so as to be preheated to a specified temperature, hydrogen and silicon-containing gas are introduced, the hot wafer or the substrate is heated to 400-450 ℃ and is kept for a period of time, in the treatment process of the shunting reaction cavity 2, the shunting reaction cavity 2 is opened, the window connection between the cavity and the cavity is closed, the vacuum is pumped to 50 mbar, the hot wire heating is started, in the quenching process, the process is repeated, the three processes of preheating, high-temperature treatment and low-temperature quenching are continuously completed, the temperature does not need to be repeatedly adjusted, the time of the whole process is reduced, the influence of process change on the hot wire is reduced, and the operation cost is saved.

Preferably, the plurality of transport driving machines and the plurality of transport chains are respectively provided with a protection plate.

Preferably, a plurality of gas sensors are respectively arranged inside the transfer boxes 4.

The technical solutions described above only represent the preferred technical solutions of the present invention, and some possible modifications to some parts of the technical solutions by those skilled in the art all represent the principles of the present invention, and fall within the protection scope of the present invention.

Claims (10)

1. A cleaning apparatus for internal parts of a chemical vapor deposition apparatus, comprising: the chemical vapor deposition reaction box is characterized in that the inner side of the chemical vapor deposition reaction box is arranged on a flow distribution cavity structure, a transportation structure, a cleaning structure and a gas regulation structure;

the shunting cavity structure includes: the system comprises a plurality of flow distribution reaction cavities, an active gas tank, a plurality of transfer boxes, a plurality of transfer drainage valves, an air pump, a flow distribution valve, a plurality of drainage tubes and a sealing assembly;

a plurality of the reposition of redundant personnel reaction chamber even install in the inboard of chemical vapor deposition reaction box, the active gas jar install in on the chemical vapor deposition reaction box, a plurality of the transfer case is installed respectively in a plurality of on the reposition of redundant personnel reaction chamber, a plurality of transfer drainage valve cartridge respectively in a plurality of on the reposition of redundant personnel reaction chamber, and a plurality of transfer drainage valve cartridge respectively in a plurality of on the transfer case, the aspiration pump install in on the active gas jar, the reposition of redundant personnel valve install in on the aspiration pump, just the reposition of redundant personnel valve is connected in a plurality of on the drainage tube, a plurality of the drainage tube cartridge respectively in a plurality of on the reposition of redundant personnel negative pressure chamber, seal assembly installs respectively in a plurality of on the reposition of redundant personnel reaction chamber.

2. The apparatus of claim 1, wherein the transport structure comprises: the device comprises a polynomial threaded rod, a plurality of carrying threaded pipes, a plurality of limiting shafts, a plurality of carrying concave carrying blocks, a carrying driver, a plurality of hot wires, a plurality of molybdenum electrodes, a plurality of hot wire brackets and a lifting assembly;

the multinomial threaded rod passes through the bearing cartridge in a plurality of on the reposition of redundant personnel reaction chamber, a plurality of spacing axle cartridge respectively in a plurality of on the reposition of redundant personnel reaction chamber, a plurality of the transport screwed pipe cartridge respectively in a plurality of carry on the concave type transport piece on, a plurality of the transport screwed pipe is suit respectively on the multinomial threaded rod, the transport driving machine install in on the chemical vapor deposition reaction box, a plurality of the heater support is installed in a plurality of through lifting unit respectively carry on the concave type transport piece of thing, a plurality of heater and a plurality of molybdenum electrode are installed respectively in a plurality of the heater support and a plurality of carry on the concave type transport piece of thing.

3. The apparatus of claim 2, wherein the gas conditioning structure comprises: the device comprises a plurality of shunt circular pipes, a plurality of reticular shunt pipes, a plurality of transfer collection boxes, a plurality of extraction collection pumps, a plurality of electric heating pipes, a plurality of cooling pipes and a plurality of radiators;

the split-flow circular tube is respectively installed on a plurality of on the split-flow reaction chamber, a plurality of netted shunt tubes are respectively connected on a plurality of on the drainage tube, and a plurality of netted shunt tubes are respectively connected in a plurality of on the split-flow circular tube, a plurality of the transfer collecting box is installed respectively in a plurality of on the split-flow reaction chamber, a plurality of the extraction collection pump is connected respectively in a plurality of on the transfer collecting box, and a plurality of the extraction collection pump other end is connected respectively in a plurality of on the split-flow reaction chamber, a plurality of electrothermal tube and a plurality of the cooling tube is connected respectively in a plurality of on the transfer case, a plurality of the radiator is installed respectively in a plurality of on the outside of transfer case.

4. The apparatus of claim 3, wherein the cleaning structure comprises: the device comprises a plurality of limiting shaft tubes, a plurality of electromagnetic circular rings, a plurality of magnet circular rings, a plurality of square-shaped cleaning blocks and a plurality of square-shaped cleaning brushes;

the limiting shaft tubes are respectively installed on the shunting reaction chambers in a pairwise parallel mode, the square-shaped cleaning blocks are respectively sleeved on the limiting shaft tubes, the electromagnet circular rings are respectively sleeved on the limiting shaft tubes in a horizontally parallel mode, the magnet circular rings are respectively installed on the square-shaped cleaning blocks, and the square-shaped cleaning brushes are respectively installed on the square-shaped cleaning blocks.

5. The apparatus of claim 4, wherein the sealing assembly comprises: the device comprises a plurality of inflation pumps, a plurality of lifting hydraulic push rods, a plurality of convex sealing lifting auxiliary blocks, a plurality of lifting sealing concave slideways, a plurality of lifting sealing convex sliding blocks, a plurality of lifting sealing plates, a plurality of clip-shaped inflation pads, a plurality of convex sealing extrusion blocks and a plurality of sealing rubber pads;

a plurality of lifting hydraulic push rods are respectively arranged on a plurality of shunting reaction cavities, a plurality of convex sealing lifting auxiliary blocks are respectively arranged on the pushing ends of the lifting hydraulic push rods, a plurality of lifting sealing blocks are respectively arranged on a plurality of convex sealing lifting auxiliary blocks, a plurality of concave lifting sealing slideways are respectively arranged on a plurality of shunting reaction cavities, a plurality of convex lifting sealing sliders are respectively arranged on a plurality of lifting sealing plates, a plurality of convex lifting sealing sliders are respectively movably inserted into the inner sides of a plurality of concave lifting sealing slideways, extrusion ports are respectively arranged on a plurality of lifting sealing plates, a plurality of clip-shaped inflatable cushions are respectively arranged on a plurality of lifting sealing plates, a plurality of convex sealing extrusion blocks are respectively movably inserted into the inner sides of a plurality of extrusion ports, and a plurality of the convex sealing extrusion blocks are respectively connected with a plurality of the clip-shaped air cushion, and a plurality of the sealing rubber cushions are respectively arranged on a plurality of the convex sealing extrusion blocks.

6. The apparatus of claim 5, wherein the lift assembly comprises: the device comprises a plurality of lifting scissor brackets, a plurality of lifting hydraulic cylinders, a plurality of conveying shafts, a plurality of conveying wheels, a plurality of conveying chain wheels, a plurality of conveying chains and a plurality of conveying driving machines;

a plurality of the fork support is cut in the lift install respectively in a plurality of carry on the concave type transport piece, a plurality of hydraulic cylinder installs respectively in a plurality of carry on the concave type transport piece, a plurality of heater support installs respectively in a plurality of fork support and a plurality of are cut in the lift the promotion of hydraulic cylinder is served, a plurality of the transportation axle is installed in a plurality of through the bearing respectively on the heater support, a plurality of the haulage wheel is installed respectively in a plurality of transport epaxially, a plurality of transport sprocket is installed respectively in a plurality of transport epaxially, a plurality of transport driving machine drive end is connected respectively in a plurality of transport epaxially, a plurality of transport chain suit respectively in a plurality of transport sprocket is last.

7. The apparatus according to claim 6, wherein a plurality of the transport drivers and a plurality of the transport chains are respectively provided with a protection plate.

8. The apparatus for cleaning internal fittings of a chemical vapor deposition apparatus as claimed in claim 7, wherein a plurality of the transfer boxes are respectively provided with a gas sensor inside.

9. A cleaning process of internal fittings of chemical vapor deposition equipment comprises the following operation steps: step S1, conducting flow in gas transfer; step S2, heating and coating by gas; step S3, gas transfer and collection; step S4, raw material transportation;

step S1 gas transfer drainage: the gas to be used is guided to the inner side of the transfer box, and the gas of different raw materials is subjected to primary treatment through the transfer box;

step S2 gas heating coating: heating the plate through the transportation structure;

step S3 gas transit collection: recovering and collecting waste gas generated by the reaction;

step S4 raw material transportation: the raw materials are transported to be processed one by one.

10. The process of claim 9, wherein in step S2, the height of each split-flow reaction chamber is adjusted simultaneously by the transportation structure, so as to achieve stability of transportation and achieve deposition under different process parameters.

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