CN114457312A - 一种射频和直流共溅射灰色装饰膜层及其方法和应用 - Google Patents
一种射频和直流共溅射灰色装饰膜层及其方法和应用 Download PDFInfo
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Abstract
本发明提供一种射频和直流共溅射灰色装饰膜层的方法,包括以下步骤:将基材置于镀膜机中,将射频溅射电源连接石墨靶,直流溅射电源连接锆靶,开启真空抽气,通入氩气使真空度维持在4.0*10‑1~6.0*10‑1Pa,开启直流溅射电源,调节输出功率为50~100w,沉积金属锆5~10min打底;通入氩气,使腔体内真空度维持在4.0*10‑1~6.0*10‑1Pa,同时开启射频溅射电源和直流溅射电源,调节射频溅射电源输出功率为100~150w,直流溅射电源输出功率为50~100w,沉积30~60min,在基材上镀上了碳化锆灰色装饰膜层。本发明采用射频和直流共溅射获得灰色装饰膜层的方法,工艺简单,颜色可调,可镀于各种金属或非金属材料表面,所获得的灰色装饰膜层在空气中自然放置不会变色,可稳定通过盐雾测试,在装饰镀膜领域具备广阔的市场前景。
Description
技术领域
本发明涉及装饰镀膜技术领域,且特别涉及一种射频和直流共溅射灰色装饰膜层的方法,以及该方法的应用,以及通过该方法得到的镀装饰膜产品。
背景技术
当前,装饰性镀膜领域中灰色装饰膜层格外受到青睐,其从厨卫家具到个人消费品都有着巨大的市场。现有PVD(Physical Vapor Deposition,物理气相沉积)生产工艺大多采用离化金属靶材(如锆、铬等)同时通入含碳元素气体(如甲烷、乙炔等)参与反应沉积,形成金属碳化物灰色装饰膜层,该方法存在以下缺点:
(1)工艺控制要求较高,所镀灰色装饰膜层颜色波动大,易超出颜色管控范围。
(2)所得膜层在空气中自然放置容易变色(如ZrC膜层),或在电镀铜镍铬的基材上(基材本身可通过AASS48H/CASS8H盐雾测试)无法稳定通过AASS48H/CASS8H盐雾测试(如CrC膜层)的问题。
(3)生产需要用到易燃气体,存在安全隐患。
发明内容
本发明的目的是提供一种工艺控制要求低,所镀灰色装饰膜层颜色波动小,所得膜层在空气中自然放置不易变色,能稳定通过AASS48H/CASS8H盐雾测试,生产中不需要用到易燃气体的镀膜工艺,以解决以上背景技术问题。为此,本发明采取了以下技术方案。
本发明首先提出一种射频和直流共溅射灰色装饰膜层的方法,包括以下步骤:
S1,将基材置于镀膜机中,将射频溅射电源连接石墨靶,直流溅射电源连接锆靶;
S2,开启真空抽气系统,将腔体内的真空度抽至5.0*10-3~1.0*10-2Pa;
S3,通入氩气,使腔体内真空度维持在4.0*10-1~6.0*10-1Pa,开启直流溅射电源,调节输出功率为50~100w,沉积金属锆5~10min进行打底;
S4,通入氩气,使腔体内真空度维持在4.0*10-1~6.0*10-1Pa,同时开启射频溅射电源和直流溅射电源,调节射频溅射电源输出功率为100~150w,调节直流溅射电源输出功率为50~100w,共沉积30~60min,在所述基材上获得碳化锆灰色装饰膜层。
作为本发明的射频和直流共溅射灰色装饰膜层的方法的进一步改进,所述基材为金属导体材料或者非金属材料。
作为本发明的射频和直流共溅射灰色装饰膜层的方法的进一步改进,所述基材为表面电镀光滑铜镍铬膜的ABS塑料。
作为本发明的射频和直流共溅射灰色装饰膜层的方法的进一步改进,所述基材为表面电镀铜镍铬膜并拉丝的ABS塑料。
作为本发明的射频和直流共溅射灰色装饰膜层的方法的进一步改进,步骤S2中,将腔体内的真空度抽至8.0*10-3Pa。
作为本发明的射频和直流共溅射灰色装饰膜层的方法的进一步改进,步骤S3具体为,通入氩气使腔体内真空度维持在4.6*10-1Pa,开启直流溅射电源,调节直流溅射电源的输出功率为100w,沉积金属锆5min进行打底。
作为本发明的射频和直流共溅射灰色装饰膜层的方法的进一步改进,步骤S4中,通入氩气使腔体内真空度维持在4.6*10-1Pa,同时开启射频溅射电源和直流溅射电源,调节射频溅射电源输出功率为100w,调节直流溅射电源输出功率为100w,共沉积30min,获得灰色装饰膜层。
作为本发明的射频和直流共溅射灰色装饰膜层的方法的进一步改进,步骤S4中,通入氩气使腔体内真空度维持在4.6*10-1Pa,同时开启射频溅射电源和直流溅射电源,调节射频溅射电源输出功率为150w,调节直流溅射电源输出功率为50w,共沉积30min,获得灰色装饰膜层。
本发明其次还提出一种如上所述的射频和直流共溅射灰色装饰膜层的方法的应用,应用于装饰性镀膜领域,获得灰色装饰性膜层。
本发明最后提出一种镀有灰色装饰膜层的镀件,根据上述的射频和直流共溅射灰色装饰膜层的方法制备得到。所述镀件包括基材,以及溅镀在所述基材表面的灰色装饰膜层。
本发明的有益效果是:镀膜过程中不需要在基材上施加偏压,基材为金属导体材料和非金属材料的表面均可获得灰色装饰膜层。使用锆靶和石墨靶共溅射沉积碳化锆工艺获得灰色装饰膜层,镀膜过程中除了通入惰性气体氩气外,无需使用甲烷、乙炔等易燃危险气体,工艺安全且可以稳定重现。通过调整镀膜时间,锆靶和石墨靶的溅射功率,可获得不同L、a、b值的灰色装饰膜层,且在本方案的参数范围内,所镀灰色装饰膜层颜色波动小,易于管控颜色,工艺控制简单。通过该方法获得的灰色装饰膜层在空气中自然放置后不会变色,且在已经电镀铜镍铬的基材上(已电镀的基材本身可通过AASS48H/CASS8H盐雾测试)镀该膜层也可稳定通过AASS48H/CASS8H盐雾测试。
附图说明
为了更清楚地说明本发明实施例的技术方案,下面将对实施例中所需要使用的附图作简单地介绍,应当理解,以下附图仅示出了本发明的某些实施例,因此不应被看作是对范围的限定,对于本领域普通技术人员来讲,在不付出创造性劳动的前提下,还可以根据这些附图获得其他相关的附图。
图1为射频和直流共溅射灰色装饰膜层的方法的一种实施流程图。
具体实施方式
为使本发明实施例的目的、技术方案和优点更加清楚,下面将对本发明实施例中的技术方案进行清楚、完整地描述。实施例中未注明具体条件者,按照常规条件或制造商建议的条件进行。所用试剂或仪器未注明生产厂商者,均为可以通过市售购买获得的常规产品。
下面对本发明的一种射频和直流共溅射灰色装饰膜层的方法进行具体说明。
请参阅图1,一种射频和直流共溅射灰色装饰膜层的方法,包括以下步骤:
S1,将基材进行清洁后,置于镀膜机腔体内的转台上,将射频溅射电源连接石墨靶,直流溅射电源连接锆靶;
S2,开启真空抽气系统,将腔体内的真空度抽至5.0*10-3~1.0*10-2Pa;
S3,通入氩气,使腔体内真空度维持在4.0*10-1~6.0*10-1Pa,开启直流溅射电源,调节输出功率为50~100w,沉积金属锆打底5~10min;
S4,通入氩气,使腔体内真空度维持在4.0*10-1~6.0*10-1Pa,同时开启射频溅射电源和直流溅射电源,调节射频溅射电源输出功率为100~150w,调节直流溅射电源输出功率为50~100w,共沉积30~60min,在所述基材上获得碳化锆灰色装饰膜层。
本实施方式中所使用的镀膜机为沈阳科晶自动化设备有限公司生产的VTC-600-2HD双靶磁控溅射仪。
传统PVD工艺,不仅要使用到甲烷、乙炔等含碳反应气体,而且要在基材上加载偏压,其溅射金属靶材获得的灰色装饰膜层常见的有碳化锆和碳化铬,碳化锆膜层能通过盐雾测试,但却易变色,碳化铬膜层虽然不易变色,但却不耐盐雾腐蚀,均存在缺点。本发明采用射频和直流共溅射获得碳化锆灰色装饰膜层的方法,工艺过程中不涉及甲烷、乙炔等易燃含碳危险气体,工艺简单,颜色可调,可镀于各种金属或非金属材料表面,所获得的灰色装饰膜层在空气中自然放置不会变色,可稳定通过AASS48H/CASS8H盐雾测试,在装饰镀膜领域具备广阔的市场前景。
实施例1
1.采用表面已电镀铜镍铬并拉丝的ABS基材测试板,经表面清洁处理后置于镀膜机腔体中的转台上,将射频溅射电源连接石墨靶,直流溅射电源连接锆靶;
2.开启真空抽气系统,将腔体内的真空度抽至8.0*10-3Pa;
3.通入氩气,使腔体内真空度维持在4.6*10-1Pa,开启直流溅射电源,调节锆靶输出功率为100w,沉积金属Zr 5min作为底层;
4.通入氩气,使腔体内真空度维持在4.6*10-1Pa,同时开启射频溅射电源和直流溅射电源,调节射频溅射电源输出功率为100w,调节直流溅射电源输出功率为100w,共沉积30min,即可获得灰色装饰膜层。采用分光光度计在样品表面随机取三个点测试其Lab数值,数据如下:
L | a | b | |
点1 | 59.12 | 1.23 | 3.65 |
点2 | 59.75 | 1.31 | 3.87 |
点3 | 59.06 | 1.28 | 3.77 |
备注:Lab模式是根据Commission International Eclairage(CIE)在1931年所制定的一种测定颜色的国际标准建立的。于1976年被改进,并且命名的一种色彩模式。Lab颜色模型由三个要素组成,一个要素是亮度(L),a和b是两个颜色通道。a包括的颜色是从深绿色(低亮度值)到灰色(中亮度值)再到亮粉红色(高亮度值);b是从亮灰色(低亮度值)到灰色(中亮度值)再到黄色(高亮度值)。
实施例2
1.采用表面已电镀铜镍铬并拉丝的ABS基材测试板,经表面清洁处理后置于镀膜机腔体中的转台上,将射频溅射电源连接石墨靶,直流溅射电源连接锆靶;
2.开启真空抽气系统,将腔体内的真空度抽至5.0*10-3Pa;
3.通入氩气,使腔体内真空度维持在4.0*10-1Pa,开启直流溅射电源,调节锆靶输出功率为50w,沉积金属Zr 5min打底;
4.通入氩气,使腔体内真空度维持在4.0*10-1Pa,同时开启射频溅射电源和直流溅射电源,调节射频溅射电源输出功率为100w,调节直流溅射电源输出功率为50w,共沉积40min,即可获得灰色装饰膜层。采用分光光度计在样品表面随机取三个点测试其Lab数值,数据如下:
实施例3
1.采用表面已电镀铜镍铬并拉丝的ABS基材筒状件,经表面清洁处理后置于镀膜机腔体中的转台上,将射频溅射电源连接石墨靶,直流溅射电源连接锆靶;
2.开启真空抽气系统,将腔体内的真空度抽至1.0*10-2Pa;
3.通入氩气,使腔体内真空度维持在6.0*10-1Pa,开启直流溅射电源,调节锆靶输出功率为100w,沉积金属Zr 10min打底;
4.通入氩气,使腔体内真空度维持在6.0*10-1Pa,同时开启射频溅射电源和直流溅射电源,调节射频溅射电源输出功率为150w,调节直流溅射电源输出功率为100w,共沉积60min,即可获得灰色装饰膜层。采用分光光度计在样品表面随机取三个点测试其Lab数值,数据如下:
L | a | b | |
点1 | 58.80 | 1.37 | 3.84 |
点2 | 58.22 | 1.43 | 3.95 |
点3 | 58.39 | 1.32 | 3.86 |
实施例4
1.采用表面电镀铜镍铬的ABS基材测试板,其表面为光亮面,经表面清洁处理后置于镀膜机腔体中的转台上将射频溅射电源连接石墨靶,直流溅射电源连接锆靶;
2.开启真空抽气系统,将腔体内的真空度抽至8.0*10-3Pa;
3.通入氩气,使腔体内真空度维持在4.6*10-1Pa,开启直流溅射电源,调节锆靶输出功率为100w,沉积金属Zr 5min打底;
4.通入氩气,使腔体内真空度维持在4.6*10-1Pa,同时开启射频溅射电源和直流溅射电源,调节射频溅射电源输出功率为150w,调节直流溅射电源输出功率为50w,共沉积30min,即可获得灰色装饰膜层。采用分光光度计在样品表面随机取三个点测试其Lab数值,数据如下:
L | a | b | |
点1 | 60.34 | 1.35 | 3.94 |
点2 | 60.19 | 1.25 | 3.82 |
点3 | 60.45 | 1.22 | 3.96 |
实施例5
1.采用表面电镀铜镍铬的ABS基材测试板,其表面为光亮面,经表面清洁处理后置于镀膜机腔体中的转台上将射频溅射电源连接石墨靶,直流溅射电源连接锆靶;
2.开启真空抽气系统,将腔体内的真空度抽至5.5*10-3Pa;
3.通入氩气,使腔体内真空度维持在4.2*10-1Pa,开启直流溅射电源,调节锆靶输出功率为60w,沉积金属Zr 6min打底;
4.通入氩气,使腔体内真空度维持在4.2*10-1Pa,同时开启射频溅射电源和直流溅射电源,调节射频溅射电源输出功率为110w,调节直流溅射电源输出功率为60w,共沉积35min,即可获得灰色装饰膜层。采用分光光度计在样品表面随机取三个点测试其Lab数值,数据如下:
L | a | b | |
点1 | 59.71 | 1.28 | 3.82 |
点2 | 59.98 | 1.34 | 3.87 |
点3 | 60.05 | 1.26 | 3.94 |
实施例6
1.采用表面电镀铜镍铬的ABS基材测试板,其表面为光亮面,经表面清洁处理后置于镀膜机腔体中的转台上将射频溅射电源连接石墨靶,直流溅射电源连接锆靶;
2.开启真空抽气系统,将腔体内的真空度抽至9.0*10-3Pa;
3.通入氩气,使腔体内真空度维持在5.8*10-1Pa,开启直流溅射电源,调节锆靶输出功率为90w,沉积金属Zr 9min打底;
4.通入氩气,使腔体内真空度维持在5.8*10-1Pa,同时开启射频溅射电源和直流溅射电源,调节射频溅射电源输出功率为150w,调节直流溅射电源输出功率为100w,共沉积50min,即可获得灰色装饰膜层。采用分光光度计在样品表面随机取三个点测试其Lab数值,数据如下:
实施例7
1.采用ABS基材测试板,经表面清洁处理后置于镀膜机腔体中的转台上将射频溅射电源连接石墨靶,直流溅射电源连接锆靶;
2.开启真空抽气系统,将腔体内的真空度抽至8.0*10-3Pa;
3.通入氩气,使腔体内真空度维持在4.6*10-1Pa,开启直流溅射电源,调节锆靶输出功率为80w,沉积金属Zr 8min打底;
4.通入氩气,使腔体内真空度维持在4.6*10-1Pa,同时开启射频溅射电源和直流溅射电源,调节射频溅射电源输出功率为120w,调节直流溅射电源输出功率为60w,共沉积45min,即可获得灰色装饰膜层。采用分光光度计在样品表面随机取三个点测试其Lab数值,数据如下:
L | a | b | |
点1 | 60.05 | 1.24 | 3.73 |
点2 | 59.77 | 1.31 | 3.85 |
点3 | 59.56 | 1.38 | 3.92 |
实施例8
1.采用PETP(聚对苯二甲酸乙二醇酯,简称聚酯)基材测试板,经表面清洁处理后置于镀膜机腔体中的转台上将射频溅射电源连接石墨靶,直流溅射电源连接锆靶;
2.开启真空抽气系统,将腔体内的真空度抽至8.0*10-3Pa;
3.通入氩气,使腔体内真空度维持在4.6*10-1Pa,开启直流溅射电源,调节锆靶输出功率为100w,沉积金属Zr 5min打底;
4.通入氩气,使腔体内真空度维持在4.6*10-1Pa,同时开启射频溅射电源和直流溅射电源,调节射频溅射电源输出功率为150w,调节直流溅射电源输出功率为50w,共沉积30min,即可获得灰色装饰膜层。采用分光光度计在样品表面随机取三个点测试其Lab数值,数据如下:
L | a | b | |
点1 | 60.81 | 1.23 | 3.87 |
点2 | 60.94 | 1.19 | 3.72 |
点3 | 60.26 | 1.20 | 3.76 |
对比例1
1.采用表面已电镀铜镍铬并拉丝的ABS基材测试板,经表面清洁处理后,用不锈钢导电挂具固定,置于某型装饰镀膜机(炉腔尺寸为:高度1.6米、直径1.5米),采用中频溅射锆靶(靶材尺寸为:外径100mm,高度1.4米),配合乙炔气体,获得灰色碳化锆膜层;
2.开启真空抽气系统,将腔体内的真空度抽至7.0*10-3Pa;
3.通入氩气,使腔体内真空度维持在4.0*10-1Pa,开启中频溅射电源,调节中频溅射电源输出电流35A,输出功率为14kw,沉积金属Zr 5min打底;
4.通入氩气和乙炔,使腔体内真空度维持在,4.5*10-1Pa,开启中频溅射电源,中频溅射电源输出电流25A,输出功率为10kw,沉积10min,即可获得灰色ZrC膜层。采用分光光度计在样品表面随机取三个点测试其Lab数值,数据如下:
对比例2
1.采用表面已电镀铜镍铬并拉丝的ABS基材测试板,经表面清洁处理后,用不锈钢导电挂具固定,置于某型装饰镀膜机(炉腔尺寸为:高度1.6米、直径1.5米),采用中频溅射锆靶(靶材尺寸为:外径100mm,高度1.4米),配合乙炔气体,获得灰色碳化锆膜层;
2.开启真空抽气系统,将腔体内的真空度抽至7.0*10-3Pa;
3.通入氩气,使腔体内真空度维持在4.0*10-1Pa,开启中频溅射电源,调节中频溅射电源输出电流35A,输出功率为14kw,沉积金属Zr 5min打底;
4.通入氩气和乙炔,使腔体内真空度维持在,4.8*10-1Pa,开启中频溅射电源,中频溅射电源输出电流25A,输出功率为10kw,沉积10min,即可获得灰色ZrC膜层。采用分光光度计在样品表面随机取三个点测试其Lab数值,数据如下:
L | a | b | |
点1 | 58.23 | 1.02 | 3.28 |
点2 | 57.65 | 0.96 | 3.02 |
点3 | 58.49 | 1.26 | 3.37 |
对比例3
1.采用表面已电镀铜镍铬并拉丝的ABS基材测试板,经表面清洁处理后,用不锈钢导电挂具固定,置于某型装饰镀膜机(炉腔尺寸为:高度1.6米、直径1.5米),采用中频溅射铬靶(靶材尺寸为:外径100mm,高度1.4米),配合乙炔气体,获得灰色碳化铬膜层;
2.开启真空抽气系统,将腔体内的真空度抽至7.0*10-3Pa;
3.通入氩气,使腔体内真空度维持在4.0*10-1Pa,开启中频溅射电源,调节中频溅射电源输出电流35A,输出功率为14kw,沉积金属Cr 5min打底;
4.通入氩气和乙炔,使腔体内真空度维持在,4.5*10-1Pa,开启中频溅射电源,中频溅射电源输出电流25A,输出功率为10kw,沉积10min,即可获得灰色CrC膜层。采用分光光度计在样品表面随机取三个点测试其Lab数值,数据如下:
L | a | b | |
点1 | 59.51 | 1.25 | 3.77 |
点2 | 58.93 | 1.15 | 3.59 |
点3 | 59.34 | 1.33 | 3.66 |
由实施例1-3的对比可以看出:以表面已电镀铜镍铬并拉丝的ABS测试板或筒状件作为基材,适当改变镀膜参数,所得灰色装饰膜层颜色相对较稳定,变化不大,工艺稳定性和重复性较好,工艺参数区间较大。
由实施例4-6的对比可以看出:以表面电镀光亮铜镍铬的ABS测试板为基材,适当改变实施例中的镀膜参数,所得灰色装饰膜层颜色相对较稳定,变化不大,工艺稳定性和重复性较好,工艺参数区间较大。
由对比例1、对比例2比较可以看出采用传统溅射金属锆靶配合乙炔反应气体镀ZrC制备灰色装饰膜层的工艺,对工艺条件比较敏感,镀膜时真空度较轻微的变化,即引起膜层颜色较大的变化,工艺稳定性和重复性均较差。
试验例1
将实施例1~8和对比例1~3制得的镀膜产品进行放置1个月观察颜色变化和进行盐雾测试,测试项目包括为AASS48H(乙酸盐雾测试48小时),以及CASS8H(铜离子加速醋酸盐雾试验8小时)。AASS48H测试按ASTM G85-02el Annex A1标准执行。CASS8H测试按照ASTMB368-97(2003)e1标准执行。
试验结果:如下表1
表1盐雾测试结果统计
由表1可以看出,在进行AASS48H以及CASS8H盐雾测试后,实施例1~8的镀膜产品未出现腐蚀现象,对比例3的镀膜产品在两项测试中出现黄色腐蚀现象,表明传统工艺制备的CrC灰色装饰膜层不耐盐雾腐蚀,性质不稳定。
将实施例1~8的镀膜产品在空气中自然放置一个月后不会变色,将对比例1~3的镀膜产品在空气中自然放置一个月后,对比例2的镀膜产品在空气中自然放置一个月后出现变色发彩的现象,表明传统工艺制备的ZrC灰色装饰膜层有一定的概率会出现变色现象,性质不稳定。
本发明的射频和直流共溅射灰色装饰膜层的方法,将射频溅射电源连接石墨靶,直流溅射电源连接锆靶,在镀膜过程中不需要在基材上施加偏压,基材为金属导体材料和非金属材料的表面均可获得灰色装饰膜层。使用锆靶和石墨靶共溅射沉积碳化锆工艺获得灰色装饰膜层,镀膜过程中除了通入惰性气体氩气外,无需使用甲烷、乙炔等易燃危险气体,工艺安全且可以稳定重现。通过调整镀膜时间,锆靶和石墨靶的溅射功率,可获得不同L、a、b值的灰色装饰膜层,且在本方案的参数范围内,所镀灰色装饰膜层颜色波动小,易于管控颜色,工艺控制简单。
以上所描述的实施例是本发明一部分实施例,而不是全部的实施例。本发明的实施例的详细描述并非旨在限制要求保护的权利范围,而是仅仅表示本发明的选定实施例。基于本发明中的实施例,本领域普通技术人员在没有作出创造性劳动前提下所获得的所有其他实施例,都属于本发明要求保护的范围。
Claims (10)
1.一种射频和直流共溅射灰色装饰膜层的方法,其特征在于,包括以下步骤:
S1,将基材置于镀膜机中,将射频溅射电源连接石墨靶,直流溅射电源连接锆靶;
S2,开启真空抽气系统,将腔体内的真空度抽至5.0*10-3~1.0*10-2Pa;
S3,通入氩气,使腔体内真空度维持在4.0*10-1~6.0*10-1Pa,开启直流溅射电源,调节输出功率为50~100w,沉积金属锆5~10min进行打底;
S4,通入氩气,使腔体内真空度维持在4.0*10-1~6.0*10-1Pa,同时开启射频溅射电源和直流溅射电源,调节射频溅射电源输出功率为100~150w,调节直流溅射电源输出功率为50~100w,共沉积30~60min,在所述基材上获得碳化锆灰色装饰膜层。
2.根据权利要求1所述的射频和直流共溅射灰色装饰膜层的方法,其特征在于,所述基材为金属导体材料或者非金属材料。
3.根据权利要求1所述的射频和直流共溅射灰色装饰膜层的方法,其特征在于,所述基材为表面电镀光滑铜镍铬膜的ABS塑料。
4.根据权利要求1所述的射频和直流共溅射灰色装饰膜层的方法,其特征在于,所述基材为表面电镀铜镍铬膜并拉丝的ABS塑料。
5.根据权利要求1所述的射频和直流共溅射灰色装饰膜层的方法,其特征在于,步骤S2中,将腔体内的真空度抽至8.0*10-3Pa。
6.根据权利要求4所述的射频和直流共溅射灰色装饰膜层的方法,其特征在于,步骤S3具体为,通入氩气使腔体内真空度维持在4.6*10-1Pa,开启直流溅射电源,调节直流溅射电源的输出功率为100w,沉积金属锆5min进行打底。
7.根据权利要求4所述的射频和直流共溅射灰色装饰膜层的方法,其特征在于,步骤S4中,通入氩气使腔体内真空度维持在4.6*10-1Pa,同时开启射频溅射电源和直流溅射电源,调节射频溅射电源输出功率为100w,调节直流溅射电源输出功率为100w,共沉积30min,获得灰色装饰膜层。
8.根据权利要求4所述的射频和直流共溅射灰色装饰膜层的方法,其特征在于,步骤S4中,通入氩气使腔体内真空度维持在4.6*10-1Pa,同时开启射频溅射电源和直流溅射电源,调节射频溅射电源输出功率为150w,调节直流溅射电源输出功率为50w,共沉积30min,获得灰色装饰膜层。
9.如权利要求1~8任意一项所述的射频和直流共溅射灰色装饰膜层的方法的应用,其特征在于,应用于装饰性镀膜领域。
10.一种镀有灰色装饰膜层的镀件,其特征在于,根据权利要求1~8任意一项所述的射频和直流共溅射灰色装饰膜层的方法制备得到;所述镀件包括基材,以及溅镀在所述基材表面的灰色装饰膜层。
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