CN114420789B - Film plating device and film plating method for solar thin film battery - Google Patents
Film plating device and film plating method for solar thin film battery Download PDFInfo
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- CN114420789B CN114420789B CN202111653897.4A CN202111653897A CN114420789B CN 114420789 B CN114420789 B CN 114420789B CN 202111653897 A CN202111653897 A CN 202111653897A CN 114420789 B CN114420789 B CN 114420789B
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- 238000007747 plating Methods 0.000 title claims abstract description 41
- 239000010408 film Substances 0.000 title claims abstract description 38
- 239000010409 thin film Substances 0.000 title claims abstract description 35
- 238000000034 method Methods 0.000 title claims description 30
- 239000000758 substrate Substances 0.000 claims abstract description 130
- 238000000576 coating method Methods 0.000 claims abstract description 122
- 239000011248 coating agent Substances 0.000 claims abstract description 120
- 238000006243 chemical reaction Methods 0.000 claims abstract description 100
- 239000007788 liquid Substances 0.000 claims abstract description 52
- 239000003153 chemical reaction reagent Substances 0.000 claims abstract description 39
- 239000002699 waste material Substances 0.000 claims abstract description 25
- 238000007599 discharging Methods 0.000 claims abstract description 22
- 239000003814 drug Substances 0.000 claims description 20
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 16
- 239000013043 chemical agent Substances 0.000 claims description 14
- 238000000926 separation method Methods 0.000 claims description 6
- 238000003860 storage Methods 0.000 claims description 6
- 230000005540 biological transmission Effects 0.000 claims description 5
- 230000008021 deposition Effects 0.000 abstract description 16
- 238000004519 manufacturing process Methods 0.000 abstract description 16
- 238000004140 cleaning Methods 0.000 abstract description 6
- 239000000126 substance Substances 0.000 description 17
- 238000000151 deposition Methods 0.000 description 15
- 230000008569 process Effects 0.000 description 9
- 239000000243 solution Substances 0.000 description 8
- 238000010586 diagram Methods 0.000 description 5
- 238000005260 corrosion Methods 0.000 description 4
- 230000007797 corrosion Effects 0.000 description 4
- 238000005299 abrasion Methods 0.000 description 3
- 239000002253 acid Substances 0.000 description 3
- 239000003513 alkali Substances 0.000 description 3
- 230000003028 elevating effect Effects 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 238000010248 power generation Methods 0.000 description 3
- KTSFMFGEAAANTF-UHFFFAOYSA-N [Cu].[Se].[Se].[In] Chemical compound [Cu].[Se].[Se].[In] KTSFMFGEAAANTF-UHFFFAOYSA-N 0.000 description 2
- 230000008878 coupling Effects 0.000 description 2
- 238000010168 coupling process Methods 0.000 description 2
- 238000005859 coupling reaction Methods 0.000 description 2
- 229910021419 crystalline silicon Inorganic materials 0.000 description 2
- 239000007888 film coating Substances 0.000 description 2
- 238000009501 film coating Methods 0.000 description 2
- 238000001746 injection moulding Methods 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 238000004321 preservation Methods 0.000 description 2
- WUPHOULIZUERAE-UHFFFAOYSA-N 3-(oxolan-2-yl)propanoic acid Chemical compound OC(=O)CCC1CCCO1 WUPHOULIZUERAE-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 1
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 description 1
- 239000005083 Zinc sulfide Substances 0.000 description 1
- LEVVHYCKPQWKOP-UHFFFAOYSA-N [Si].[Ge] Chemical compound [Si].[Ge] LEVVHYCKPQWKOP-UHFFFAOYSA-N 0.000 description 1
- 239000006096 absorbing agent Substances 0.000 description 1
- 229910052980 cadmium sulfide Inorganic materials 0.000 description 1
- 238000005234 chemical deposition Methods 0.000 description 1
- 238000009388 chemical precipitation Methods 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- HVMJUDPAXRRVQO-UHFFFAOYSA-N copper indium Chemical compound [Cu].[In] HVMJUDPAXRRVQO-UHFFFAOYSA-N 0.000 description 1
- 238000012864 cross contamination Methods 0.000 description 1
- ZZEMEJKDTZOXOI-UHFFFAOYSA-N digallium;selenium(2-) Chemical compound [Ga+3].[Ga+3].[Se-2].[Se-2].[Se-2] ZZEMEJKDTZOXOI-UHFFFAOYSA-N 0.000 description 1
- 230000003670 easy-to-clean Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005485 electric heating Methods 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- 238000009776 industrial production Methods 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 230000031700 light absorption Effects 0.000 description 1
- 238000001755 magnetron sputter deposition Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000011112 process operation Methods 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 230000002035 prolonged effect Effects 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 229910052711 selenium Inorganic materials 0.000 description 1
- 239000011669 selenium Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000011265 semifinished product Substances 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- 239000002351 wastewater Substances 0.000 description 1
- 229910052984 zinc sulfide Inorganic materials 0.000 description 1
- DRDVZXDWVBGGMH-UHFFFAOYSA-N zinc;sulfide Chemical compound [S-2].[Zn+2] DRDVZXDWVBGGMH-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02612—Formation types
- H01L21/02617—Deposition types
- H01L21/02623—Liquid deposition
- H01L21/02628—Liquid deposition using solutions
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/0248—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
- H01L31/0256—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by the material
- H01L31/0264—Inorganic materials
- H01L31/032—Inorganic materials including, apart from doping materials or other impurities, only compounds not provided for in groups H01L31/0272 - H01L31/0312
- H01L31/0322—Inorganic materials including, apart from doping materials or other impurities, only compounds not provided for in groups H01L31/0272 - H01L31/0312 comprising only AIBIIICVI chalcopyrite compounds, e.g. Cu In Se2, Cu Ga Se2, Cu In Ga Se2
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Abstract
The scheme relates to a film plating device of a solar thin film battery. The device comprises: the device comprises a substrate clamping device, a vacuum generating device, a coating reaction tank and a waste liquid discharging device; the substrate clamping device is arranged above the coating reaction tank and is used for clamping and discharging Chi Jiban; the vacuum generating device is connected with the substrate clamping device and comprises a vacuum chuck which is adsorbed on the battery substrate; a coating chemical reagent is contained in the coating reaction tank; the substrate clamping device and the vacuum generating device are matched with each other to enable one surface of the battery substrate far away from the vacuum chuck to react with the coating chemical reagent; the waste liquid discharge device is arranged at the bottom of the coating reaction tank and discharges the chemical reagent after the reaction in the coating reaction tank. The vacuum sucker is adsorbed on the battery substrate, so that the non-deposition surface of the battery substrate can be protected from being contacted with chemical reagents during film plating, and the non-deposition surface is protected; and the cleaning step of the non-deposition surface is reduced, the production efficiency is improved, and the cost is reduced.
Description
Technical Field
The application relates to the technical field of solar cell production, in particular to a film plating device and a film plating method of a solar thin film cell.
Background
Along with the rapid development of solar cell technology in recent years, the application of crystalline silicon solar cells and thin film solar cell technology is widely focused, wherein a CIGS copper indium gallium diselenide thin film cell is one of the most potential high-efficiency and low-cost solar thin film cells at present, the highest conversion efficiency of a laboratory preparation cell can reach 21.5%, and the solar thin film cell has the advantages of weaker light property, less light attenuation and the like compared with the crystalline silicon cell. The solar thin film battery has the main components of copper, indium, gallium and selenium, and has the advantages of strong light absorption capacity, good power generation stability, high conversion efficiency, long daytime power generation time, high power generation quantity, low production cost, short energy recovery period and the like compared with other battery technologies such as germanium-silicon batteries, dye sensitized batteries and the like. CIGS thin film cells generally consist of a glass substrate, a back electrode, an absorber layer, a buffer layer, and a window layer; the prepared cadmium sulfide layer or zinc sulfide is used as a buffer layer, the buffer layer is an important layer in each layer of film of the copper indium gallium selenide film solar cell, belongs to an N layer semiconductor of the cell, forms PN junction of the cell by diffusing ions on the interface of the copper indium gallium selenide layer, and is a transition layer between a low band gap CIGS absorbing layer and a high band gap ZnO window layer, so that band gap and lattice mismatch between the low band gap CIGS absorbing layer and the high band gap ZnO window layer are reduced, electric leakage is prevented, and the buffer layer plays an important role in improving the performance of the film cell. There are various methods for preparing the buffer layer, such as chemical deposition, magnetron sputtering, chemical water bath deposition, etc., according to the advantages and disadvantages of the methods, the buffer layer is prepared by adopting the chemical water bath deposition method which is efficient, simple and easy to control, and low in production cost in large-scale industrial production, and as the film layer is deposited on all surfaces of the glass substrate in the common chemical water bath deposition mode, the buffer film layer deposited on the non-deposition surface is chemically etched or removed by adopting the physical abrasion method in the subsequent process, the process steps are increased, the battery manufacturing time is prolonged, the production efficiency is reduced, excessive chemical agents participate in the reaction for preparing the buffer film layer, and great cost pressure is brought to the residual chemical agents which are not fully reacted in the subsequent process.
Therefore, the traditional film plating mode of the solar film battery has the problems of complex process, low film plating efficiency and waste of chemical reagents.
Disclosure of Invention
Based on the above, in order to solve the above technical problems, a film plating device and a film plating method for a solar thin film battery are provided, which can simplify the film plating process, improve the film plating efficiency, and avoid the waste of chemical reagents.
A coating apparatus for a solar thin film battery, the apparatus comprising: the device comprises a substrate clamping device, a vacuum generating device, a coating reaction tank and a waste liquid discharging device; the substrate clamping device is arranged above the coating reaction tank and is used for clamping and discharging Chi Jiban; the vacuum generating device is connected with the substrate clamping device and comprises a vacuum chuck, and the vacuum chuck is adsorbed on the battery substrate; the coating reaction tank contains a coating chemical reagent; the substrate clamping device and the vacuum generating device are matched with each other to enable one surface of the battery substrate far away from the vacuum chuck to react with the coating chemical reagent; the waste liquid discharge device is arranged at the bottom of the coating reaction tank and is used for discharging the chemical reagent reacted in the coating reaction tank.
In one embodiment, the substrate clamping device comprises a machine crown block, a bracket, a motor and a lifting slide rail; the support is arranged on the lifting slide rail and is connected with the vacuum chuck; the motor is connected with the lifting slide rail; the machine crown block is used for clamping the battery substrate onto the bracket; the motor supplies power for the lifting slide rail, the lifting slide rail is controlled to move the support, and the support drives the battery substrate to enter the coating reaction tank to react with the coating chemical reagent.
In one embodiment, the vacuum generating device comprises a vacuum generator and a vacuum pipeline; the vacuum pipeline is connected with the vacuum generator and the vacuum chuck.
In one embodiment, the vacuum generating device further comprises a water separator filter; the water-vapor separation filter is connected with the vacuum pipeline and is used for discharging water vapor generated on the battery substrate.
In one embodiment, the vacuum generating device further comprises a compressed air storage device, a compressed air transmission tube; the compressed air transmission pipe is connected with the compressed air storage device and the vacuum pipeline and used for transmitting compressed air to the vacuum chuck and separating the battery substrate from the vacuum chuck.
In one embodiment, the vacuum pipeline is provided with a plurality of vacuum pipelines, and the vacuum suction cups are uniformly distributed on each vacuum pipeline.
In one embodiment, the device further comprises a plating chemical reagent treatment device; the film plating chemical reagent treatment device comprises a medicine inlet pipe, a circulating pump, a heater, a flowmeter and a circulating pipeline; the circulating pump, the heater and the flowmeter are all arranged on the medicine inlet pipe; one end of the circulating pipeline is connected with the flowmeter, and the other end of the circulating pipeline is connected with the coating reaction tank.
In one embodiment, the coating reaction tank is provided with an overflow port, the overflow port is connected with an overflow pipe, and the overflow pipe is connected with the medicine inlet pipe.
In one embodiment, the waste liquid discharge device comprises a liquid discharge pipeline and a liquid discharge pump; one end of the liquid discharge pipeline is connected with the liquid discharge pump, and the other end of the liquid discharge pipeline is connected with the coating reaction tank.
A method of coating a solar thin film cell, the method comprising:
the substrate clamping device clamps the battery substrate above the coating reaction tank, and the vacuum chuck is contacted with the battery substrate;
the vacuum generating device continuously works to generate vacuum, and the vacuum reaches the vacuum chuck, so that the battery substrate is adsorbed in the vacuum chuck;
the battery substrate is placed in the coating reaction tank, and the battery substrate reacts with the coating chemical reagent;
and the waste liquid discharge device discharges the chemical reagent reacted in the coating reaction tank, and the vacuum sucker is separated from the battery substrate to complete coating of the battery substrate.
The device comprises a substrate clamping device, a vacuum generating device, a film coating reaction tank and a waste liquid discharging device; the substrate clamping device is arranged above the coating reaction tank and is used for clamping and discharging Chi Jiban; the vacuum generating device is connected with the substrate clamping device and comprises a vacuum chuck, and the vacuum chuck is adsorbed on the battery substrate; the coating reaction tank contains a coating chemical reagent; the substrate clamping device and the vacuum generating device are matched with each other to enable one surface of the battery substrate far away from the vacuum chuck to react with the coating chemical reagent; the waste liquid discharge device is arranged at the bottom of the coating reaction tank and is used for discharging the chemical reagent reacted in the coating reaction tank. The vacuum sucker is adsorbed on the battery substrate, so that the non-deposition surface of the battery substrate can be protected from being contacted with chemical reagents during film plating, and the non-deposition surface is protected; and the non-deposition surface of the battery substrate is not required to be removed by a chemical method or a physical abrasion method, so that the cleaning steps and working procedures of the non-deposition surface are reduced, the production efficiency is improved, and the production cost is reduced.
Drawings
FIG. 1 is a block diagram of a coating apparatus for a solar thin film battery in one embodiment;
FIG. 2 is a block diagram of a coating apparatus for a solar thin film battery according to another embodiment;
FIG. 3 is a block diagram of a coating apparatus for a solar thin film battery according to still another embodiment;
FIG. 4 is a block diagram of a vacuum chuck and vacuum lines in one embodiment;
FIG. 5 is a block diagram of a coating apparatus for a solar thin film battery according to still another embodiment;
fig. 6 is a flow chart of a method of coating a solar thin film cell in one embodiment.
Detailed Description
The present application will be described in further detail with reference to the drawings and examples, in order to make the objects, technical solutions and advantages of the present application more apparent. It should be understood that the specific embodiments described herein are for purposes of illustration only and are not intended to limit the scope of the application.
In one embodiment, as shown in fig. 1, there is provided a coating apparatus for a solar thin film battery, including: a substrate holding device 100, a vacuum generating device 200, a coating reaction tank 300, and a waste liquid discharging device 400; the substrate clamping device 100 is arranged above the coating reaction tank 300 and is used for clamping the discharge cell substrate 500; the vacuum generating device 200 is connected with the substrate clamping device 100, and the vacuum generating device 200 comprises a vacuum chuck 210, and the vacuum chuck 210 is adsorbed on the battery substrate 500; the plating reaction tank 300 accommodates a plating chemical; the substrate clamping device 100 and the vacuum generating device 200 are matched with each other to enable one surface of the battery substrate 500 away from the vacuum chuck to react with the coating chemical reagent; the waste liquid discharging device 400 is disposed at the bottom of the coating reaction tank 300, and is used for discharging the chemical reagent reacted in the coating reaction tank 300.
The substrate holding device 100 may be disposed above the coating reaction tank 300, and the substrate holding device 100 may be used to clamp the battery substrate 500 and control the battery substrate 500 to be placed in the coating reaction tank 300 or control the battery substrate 500 to be taken out of the coating reaction tank 300.
In this embodiment, the cell substrate 500 may be a semi-finished product of a CIGS thin film solar cell production line, and is a two-piece semi-finished CIGS thin film solar cell.
The vacuum generating device 200 may be used to generate a vacuum, wherein the vacuum generating device 200 may comprise a vacuum chuck 210. The vacuum generating device 200 may be connected to the substrate clamping device 100, and in particular, the vacuum chuck 210 may be connected to the substrate clamping device 100, and the vacuum chuck 210 may be attached to the battery substrate 500 after the vacuum generating device 200 starts to continuously operate to generate vacuum.
The coating reaction tank 300 may be a reaction tank for coating the battery substrate 500, and the coating reaction tank 300 may contain a coating chemical agent for coating the battery substrate 500. The plating chemical in the plating reaction tank 300 needs to be sufficiently stirred to make its concentration and temperature uniform.
The substrate clamping device 100 may cooperate with the vacuum generating device 200 to react one surface of the battery substrate 500 away from the vacuum chuck with a plating chemical reagent, the plating chemical reagent reacts chemically at a specific temperature and flow, the buffer film layer begins to be deposited on the reaction surface to be deposited of the battery substrate 500, and the plating chemical reagent in the plating reaction tank 300 may circularly impact the battery substrate 500, so that the preparation of the buffer film layer on the battery substrate 500 is successful.
The waste liquid discharge device 400 may be disposed at the bottom of the plating reaction tank 300, and after the battery substrate 500 is successfully provided with the buffer film layer, the plating chemical agent in the plating reaction tank 300 becomes waste water and may be discharged through the waste liquid discharge device 400, i.e., the waste liquid discharge device 400 may be used to discharge the chemical agent after reaction in the plating reaction tank 300.
After the reacted chemical is discharged, the vacuum generating device 200 may stop generating vacuum so that the vacuum chuck 210 is separated from the battery substrate 500.
In this embodiment, a film plating device for a solar thin film battery is provided, including: a substrate holding device 100, a vacuum generating device 200, a coating reaction tank 300, and a waste liquid discharging device 400; the substrate clamping device 100 is arranged above the coating reaction tank 300 and is used for clamping the discharge cell substrate 500; the vacuum generating device 200 is connected with the substrate clamping device 100, and the vacuum generating device 200 comprises a vacuum chuck 210, and the vacuum chuck 210 is adsorbed on the battery substrate 500; the plating reaction tank 300 accommodates a plating chemical; the substrate clamping device 100 and the vacuum generating device 200 are matched with each other to enable one surface of the battery substrate 500 away from the vacuum chuck 210 to react with the coating chemical reagent; the waste liquid discharging device 400 is disposed at the bottom of the coating reaction tank 300, and is used for discharging the chemical reagent reacted in the coating reaction tank 300. Because the vacuum chuck 210 is adsorbed on the battery substrate 500, the non-deposition surface of the battery substrate 500 can be protected from being contacted with chemical reagents during film plating, and the non-deposition surface is protected; and the non-deposition surface of the battery substrate 500 is not required to be removed by a chemical method or a physical abrasion method, so that the cleaning steps and working procedures of the non-deposition surface are reduced, the production efficiency is improved, and the production cost is reduced.
As shown in fig. 2, in one embodiment, the substrate clamping device 100 includes a machine crown block 110, a bracket 120, a motor 130, and a lifting slide rail 140; the bracket 120 is arranged on the lifting slide rail 140, and the bracket 120 is connected with a vacuum chuck 210; the motor 130 is connected with the lifting slide rail 140; the machine crown block 110 is used for clamping the battery substrate 500 onto the bracket 120; the motor 130 supplies power to the lifting slide rail 140, and controls the lifting slide rail 140 to move the bracket 120, and the bracket 120 drives the battery substrate 500 to enter the coating reaction tank 300 to react with the coating chemical reagent.
The machine crown block 110 may be disposed at the top of the coating reaction tank 300, and the machine crown block 110 may clamp the battery substrate 500 to a suitable position above the coating reaction tank 300, and since the vacuum chuck 210 is connected to the bracket 120, the bracket 120 is disposed on the lifting slide rail 140, the vacuum chuck 210 may be lifted to the tab position under the driving of the bracket 120 and the lifting slide rail 140. The robot crown block 110 can clamp the battery substrate 500 into place against the vacuum chuck 210.
The bracket 120 can be made of a firm, light and thin material with acid and alkali corrosion resistance, and has the characteristics of strong rigidity and difficult deformation.
The motor 130 may be connected to the elevating slide rail 140 and supply power to the elevating slide rail 140, thereby controlling the elevating slide rail 140 to move the stand 120 up and down. Under the driving of the motor 130, the bracket 120 can contact the vacuum chuck 210 with the battery substrate 500, and after the vacuum chuck 210 is clung to the battery substrate 500, the motor 130 can drive the bracket 120 to slide, so as to drive the battery substrate 500 to enter the coating reaction tank 300 to react with the coating chemical reagent, and further complete coating.
In this embodiment, the coating reaction tank 300 is a tank container welded by using a plate made of C-PVC or other similar materials, and is fixed on the bracket 120 for holding chemical reaction agents, various connecting pipes, the vacuum chuck 210 and the battery substrate 500, and a heat preservation device is laid around the coating reaction tank 300 and has a heat preservation function.
The lifting slide rail 140 may be fixed to the coating device body of the solar thin film battery or the coating reaction tank 300, and the structure may include, but is not limited to, a screw rod, a rack, a slide rail, and the lifting motion is stable.
In this embodiment, by arranging the machine crown block 110, the bracket 120, the motor 130, the lifting slide rail 140 and other devices, the battery substrate 500 can be controlled to be attached to the vacuum chuck 210, and then enter the coating reaction tank 300 to react with the coating chemical agent to complete coating, so that the process is simple and easy to control, and the battery manufacturing time is reduced.
In one embodiment, as shown in FIG. 3, the vacuum generating device 200 includes a vacuum generator 220, a vacuum line 230; the vacuum line 230 is connected to the vacuum generator 220 and the vacuum chuck 210.
The vacuum generator 220 is a novel, efficient, clean, economical and small-sized vacuum component for generating a negative pressure air source by utilizing a positive pressure air source, so that the negative pressure can be easily and conveniently obtained at a place where compressed air exists, and the vacuum generator 220 comprises, but is not limited to, a vacuum pump, a vacuum component and other devices capable of generating a vacuum function, such as equipment and devices.
The vacuum pipeline 230 can be a hard pipeline adopting C-PVC particle injection molding, or other pipelines with the function, can not deform, corrode or pollute solution under the condition of vacuum, and can be used for connecting working components such as the vacuum generator 220, the vacuum chuck 210 and the like.
The vacuum chuck 210 may be a vacuum chuck designed according to the specifications of the battery piece produced by the existing production line, and the total dimension specification may be length 1190 mm and width 790 mm, or may be designed and adjusted according to different dimension schemes of the battery piece product. The vacuum chuck 210 can be produced from rubber materials which are resistant to corrosion by chemical agents such as acid and alkali, resistant to high temperature and easy to clean, and when in use, a part of the vacuum chuck 210 can be installed on the inner side of the coating reaction tank 300, or can be firstly adsorbed on the battery substrate 500 and placed into the coating reaction tank 300 along with the battery substrate 500, and according to the production condition, after a period of use, for example, a part of buffer film layer is deposited on the surface of the vacuum chuck 210, and the buffer film layer which is thoroughly deposited on the cleaning surface can be detached for re-installation and use.
As shown in fig. 3, in one embodiment, the vacuum generating device 200 further comprises a water separator filter 240; the water vapor separation filter 240 is connected to the vacuum line 230 for discharging water vapor generated on the battery substrate 500.
The water vapor separation filter 240 is a device that separates gas and liquid in a liquid-containing line from the solution flowing into the vacuum line 230 due to breakage of the partial vacuum chuck 210 or other causes in extreme cases, and serves to protect the line-connected vacuum generator 220 from damage caused by liquid immersion.
In one embodiment, as shown in FIG. 3, the vacuum generating device 220 further comprises a compressed air storage device, a compressed air delivery tube 250; the compressed air transfer pipe 250 is connected to the compressed air storage device, the vacuum line 230, for transferring compressed air to the vacuum chuck 210 and detaching the battery substrate 500 from the vacuum chuck 210.
As shown in fig. 4, in one embodiment, the vacuum lines 230 are provided with a plurality of vacuum chucks 210 uniformly distributed on each vacuum line 230.
In this embodiment, the whole vacuum chuck 210 is uniformly distributed with small-sized chucks and connected with each other according to the size of the vacuum chuck 210, so as to increase the adsorption force of each part of the whole vacuum chuck 210, and prevent local unprotected due to the deformation of the battery substrate.
In one embodiment, as shown in fig. 5, a coating apparatus for a solar thin film battery may further include a coating chemical agent treatment apparatus 600; the coating chemical treatment apparatus 600 includes a medicine inlet pipe 610, a circulation pump 620, a heater 630, a flowmeter 640, and a circulation line 650; the circulating pump 620, the heater 630 and the flowmeter 640 are all arranged on the medicine feeding pipe 610; one end of the circulation line 650 is connected to the flow meter 640, and the other end is connected to the coating reaction tank 300.
Wherein, the medicine feeding pipe 610 can be a hard pipeline and a fluorine resin Pipe (PFA) which adopt C-PVC particle thermal injection molding, and the pipe has the advantages of firmness, thinness, acid and alkali corrosion resistance, no cross contamination to solution in the process scheme of a production line, and the like, and can not generate deformation, corrosion or pollution to solution under the condition of passing chemical reagent, and the like, and is used for connecting the film plating reaction tank 300 with the circulating pump 620, the vacuum chuck 210 and other working components.
The circulation pump 620 may be a pump equipped with mechanical bearings and complete seals on the coupling shaft and the impeller, respectively, for stirring the chemical agent in the coating reaction tank 300 sufficiently to make its concentration and temperature uniform.
The heater 630 may be an auxiliary heater, and maintains the temperature of the chemical solution in the chemical feeding tube 610 at a set reaction temperature by means of electric heating, and controls the chemical agent in the coating reaction tank 300 to maintain a constant temperature state under the circulation of the circulation pump 620.
As shown in FIG. 5, in one embodiment, the coating reaction tank 300 is provided with an overflow port 310, an overflow pipe 320 is connected to the overflow port 310, and the overflow pipe 320 is connected to the medicine inlet pipe 610.
Specifically, in the circulation state of the circulation pump 620, the chemical liquid overflows from the inside of the coating reaction tank 300 to the circulation line 330, the chemical liquid overflowed from the overflow port 310 flows into the circulation line 330, the chemical liquid in the circulation line 330 is pumped by the circulation pump 620 to enter the coating reaction tank 300 again, and the chemical liquid flows sufficiently, so that the chemical precipitation is reduced.
As shown in fig. 5, in one embodiment, the waste drain 400 includes a drain line 410, a drain pump 420; one end of the drain pipe 410 is connected to the drain pump 420, and the other end is connected to the plating reaction tank 300.
The drain pipe 410 may be a hard pipe with C-PVC particles injection molded, or other pipes capable of performing the function, and the solution is not deformed, corroded or polluted under the condition of passing the solution, so as to connect the working components such as the coating reaction tank 300 and the drain pipe 410.
The drain pump 420 is a pump equipped with mechanical bearings and a complete seal on the coupling shaft and the impeller, respectively, for discharging chemical agent or cleaning DI water at the end of the process in the coating reaction tank 300 to the drain line 410.
In one embodiment, as shown in fig. 6, a film plating method of a solar thin film battery is provided, and specific method steps include:
in step 602, the substrate clamping device clamps the battery substrate above the coating reaction tank, and the vacuum chuck contacts the battery substrate.
In step 604, the vacuum generator continuously works to generate vacuum, and the vacuum reaches the vacuum chuck, so that the battery substrate is adsorbed in the vacuum chuck.
In step 606, the well-configured plating chemical reagent is placed in the plating reaction tank, and the substrate clamping device and the vacuum generating device are matched with each other to place the battery substrate into the plating reaction tank, so that the battery substrate reacts with the plating chemical reagent.
In step 608, the waste liquid discharging device discharges the chemical reagent after the reaction in the coating reaction tank, and the vacuum chuck is separated from the battery substrate, so as to complete the coating of the battery substrate.
In the embodiment, the non-deposition surface of the battery substrate can be protected from being contacted with the liquid medicine during film coating, and only one surface of the battery substrate, on which the buffer film layer needs to be deposited, is involved in the deposition reaction.
In one embodiment, a method for coating a solar thin film battery is provided, which comprises the following steps:
the machine crown block clamps two battery substrates to a proper position above the coating reaction tank at the same time, a vacuum chuck fixed on the bracket is driven by a motor to rise to a splicing position along the lifting slide rail, and the machine crown block clamps the battery substrates to a position close to the vacuum chuck;
the vacuum generator starts to continuously work to generate vacuum, and the vacuum tightly adsorbs the battery substrate on the vacuum suction cups on the two sides through the vacuum pipeline, the vacuum suction cups and a plurality of grid vacuum suction cup devices attached to the vacuum suction cups, so that the non-reaction surface of the battery substrate is protected from being contacted with liquid medicine.
Chemical agents with proper volumes, temperatures and concentrations are released into the coating reaction tank through a medicine inlet pipe, a circulating pump, an auxiliary heater, a flowmeter and a circulating pipeline. The auxiliary heater keeps the liquid medicine at a set reaction temperature, the circulating pump enables the liquid medicine to be fully and circularly stirred and flow to achieve uniform concentration of the liquid medicine, and the liquid medicine is subjected to chemical reaction at a specific temperature and flow;
then the bracket drives the vacuum chuck and the battery substrate to descend to the coating reaction tank along the lifting guide rail, the vacuum generator continuously keeps a vacuum state, the buffer film layer starts to be deposited on the reaction surface to be deposited of the battery substrate, and the liquid medicine overflowed through the overflow port flows into the circulating pipeline and the coating reaction tank again under the continuous operation of the circulating pump until the coating process reaction is finished and the liquid medicine is discharged; the water vapor possibly generated under the vacuum effect or the liquid medicine generated under the extreme condition is discharged by the water vapor separation filter;
after the set process for preparing the buffer film layer is finished, the required buffer film layer is attached to the surface to be deposited of the battery substrate, the circulating pump, the auxiliary heater and the like stop working, and under the working of the liquid discharge pump, the reacted chemical liquid is discharged to a factory end waste liquid pool through the liquid discharge pipeline and the liquid discharge pump;
in the waste liquid discharge process, the crown block moves to a splicing position, the bracket drives the vacuum chuck and the battery substrate to rise to the upper part of the coating reaction tank along the lifting guide rail under the drive of the motor, the vacuum generator stops working to release vacuum after the crown block clamps the battery substrate, the compressed air transmission pipe is controlled to reversely blow out positive pressure cleaning gas which can help to quickly release vacuum into the pipeline, the vacuum chuck does not adsorb the battery substrate, the battery substrate is separated from the vacuum chuck, and then the bracket descends into the coating reaction tank along the lifting guide rail;
and the crown block takes the double-glass substrate to the next process position to clean the residual chemical agent on the surface, so that the whole process operation for depositing the buffer film layer is finished.
The technical features of the above embodiments may be arbitrarily combined, and all possible combinations of the technical features in the above embodiments are not described for brevity of description, however, as long as there is no contradiction between the combinations of the technical features, they should be considered as the scope of the description.
The above examples illustrate only a few embodiments of the application, which are described in detail and are not to be construed as limiting the scope of the application. It should be noted that it will be apparent to those skilled in the art that several variations and modifications can be made without departing from the spirit of the application, which are all within the scope of the application. Accordingly, the scope of protection of the present application is to be determined by the appended claims.
Claims (9)
1. A coating device for a solar thin film battery, the device comprising: the device comprises a substrate clamping device, a vacuum generating device, a coating reaction tank and a waste liquid discharging device; the substrate clamping device is arranged above the coating reaction tank and is used for clamping and discharging Chi Jiban; the vacuum generating device is connected with the substrate clamping device and comprises a vacuum chuck, and the vacuum chuck is adsorbed on the battery substrate; the coating reaction tank contains a coating chemical reagent; the substrate clamping device and the vacuum generating device are matched with each other to enable one surface of the battery substrate far away from the vacuum chuck to react with the coating chemical reagent; the substrate clamping device comprises a machine crown block, a bracket, a motor and a lifting slide rail; the support is arranged on the lifting slide rail and is connected with the vacuum chuck; the motor is connected with the lifting slide rail; the machine crown block is used for clamping the battery substrate onto the bracket; the motor supplies power to the lifting slide rail, the lifting slide rail is controlled to move the bracket, and the bracket drives the battery substrate to enter the coating reaction tank to react with the coating chemical reagent; the waste liquid discharge device is arranged at the bottom of the coating reaction tank and is used for discharging the chemical reagent reacted in the coating reaction tank.
2. The coating device of a solar thin film battery according to claim 1, wherein the vacuum generating device comprises a vacuum generator and a vacuum pipeline; the vacuum pipeline is connected with the vacuum generator and the vacuum chuck.
3. The coating apparatus of a solar thin film battery according to claim 2, wherein the vacuum generating apparatus further comprises a water-vapor separation filter; the water-vapor separation filter is connected with the vacuum pipeline and is used for discharging water vapor generated on the battery substrate.
4. The coating device of a solar thin film battery according to claim 2, wherein the vacuum generating device further comprises a compressed air storage device, a compressed air transmission tube; the compressed air transmission pipe is connected with the compressed air storage device and the vacuum pipeline and used for transmitting compressed air to the vacuum chuck and separating the battery substrate from the vacuum chuck.
5. The coating device of a solar thin film battery according to claim 2, wherein a plurality of vacuum pipelines are arranged, and the vacuum sucking discs are uniformly distributed on each vacuum pipeline.
6. The coating apparatus of a solar thin film cell according to claim 1, further comprising a coating chemical agent treatment apparatus; the film plating chemical reagent treatment device comprises a medicine inlet pipe, a circulating pump, a heater, a flowmeter and a circulating pipeline; the circulating pump, the heater and the flowmeter are all arranged on the medicine inlet pipe; one end of the circulating pipeline is connected with the flowmeter, and the other end of the circulating pipeline is connected with the coating reaction tank.
7. The coating device of the solar thin film battery according to claim 6, wherein an overflow port is arranged on the coating reaction tank, an overflow pipe is connected to the overflow port, and the overflow pipe is connected to the medicine feeding pipe.
8. The coating device of a solar thin film battery according to claim 1, wherein the waste liquid discharge device comprises a liquid discharge pipeline and a liquid discharge pump; one end of the liquid discharge pipeline is connected with the liquid discharge pump, and the other end of the liquid discharge pipeline is connected with the coating reaction tank.
9. A coating method corresponding to the coating apparatus of a solar thin film battery according to any one of claims 1 to 8, characterized in that the method comprises:
the substrate clamping device clamps the battery substrate above the coating reaction tank, and the vacuum chuck is contacted with the battery substrate;
the vacuum generating device continuously works to generate vacuum, and the vacuum reaches the vacuum chuck, so that the battery substrate is adsorbed in the vacuum chuck;
the battery substrate is placed in the coating reaction tank, and the battery substrate reacts with the coating chemical reagent;
and the waste liquid discharge device discharges the chemical reagent reacted in the coating reaction tank, and the vacuum sucker is separated from the battery substrate to complete coating of the battery substrate.
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