CN114409271A - Double-layer coated photovoltaic glass and production method and production line thereof - Google Patents
Double-layer coated photovoltaic glass and production method and production line thereof Download PDFInfo
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- CN114409271A CN114409271A CN202210048026.8A CN202210048026A CN114409271A CN 114409271 A CN114409271 A CN 114409271A CN 202210048026 A CN202210048026 A CN 202210048026A CN 114409271 A CN114409271 A CN 114409271A
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/40—Coatings comprising at least one inhomogeneous layer
- C03C2217/43—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase
- C03C2217/46—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase characterized by the dispersed phase
- C03C2217/47—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase characterized by the dispersed phase consisting of a specific material
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/70—Properties of coatings
- C03C2217/73—Anti-reflective coatings with specific characteristics
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- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Surface Treatment Of Glass (AREA)
Abstract
The invention discloses double-layer coated photovoltaic glass, a production method and a production line thereof, wherein the production method of the double-layer coated photovoltaic glass comprises the following steps: providing a glass substrate, and edging and cleaning the glass substrate; wherein the glass substrate is ultra-white float glass; drying and preheating the glass substrate; when the temperature of the glass substrate is preheated to a first preset temperature, coating a coating liquid on the front surface of the glass substrate to form a bottom anti-reflection film, and curing the bottom anti-reflection film; cooling the glass substrate; when the temperature of the glass substrate is cooled to be less than or equal to a second preset temperature, coating a coating liquid on the surface of the bottom anti-reflection film, which is far away from the glass substrate, to form a surface anti-reflection film, and curing the surface anti-reflection film; and tempering the glass substrate to obtain the double-layer coated photovoltaic glass. According to the invention, the bottom layer reflecting film and the surface layer reflecting film are laminated on the front surface of the glass substrate, so that the double-layer coated photovoltaic glass applied to the solar cell can improve the utilization rate of light and the power generation efficiency.
Description
Technical Field
The invention relates to the technical field of glass production, in particular to double-layer coated photovoltaic glass and a production method and a production line thereof.
Background
The solar cell is a device which can effectively absorb solar radiation energy and convert the solar energy into electric energy by utilizing the photovoltaic effect, when the solar light irradiates on a semiconductor P-N Junction (P-N Junction), a new hole-electron pair (V-E pair) is formed, under the action of an electric field of the P-N Junction, a hole flows from an N area to the P area, an electron flows from the P area to the N area, and current is formed after a circuit is connected. The solid semiconductor device is also called a solar cell or a photovoltaic cell, and is an important component of a solar cell array power supply system because the solid semiconductor device converts solar energy into electric energy by utilizing the photovoltaic effect of various potential barriers.
The surface of the solar cell needs a glass cover plate as a protective layer, and the sunlight has about 9% reflection loss on the surface of the glass cover plate, so that the conversion efficiency of the solar cell is low.
Therefore, it is necessary to provide a new double-layer coated photovoltaic glass, a production method and a production line thereof to solve the above technical problems.
Disclosure of Invention
The invention mainly aims to provide double-layer coated photovoltaic glass, a production method and a production line thereof, and aims to solve the problem of low conversion efficiency of a solar cell caused by high reflectivity of a glass cover plate.
In order to achieve the purpose, the invention provides a production method of double-layer coated photovoltaic glass, which comprises the following steps:
providing a glass substrate, and edging and cleaning the glass substrate; wherein the glass substrate is ultra-white float glass;
drying and preheating the glass substrate;
when the temperature of the glass substrate is preheated to a first preset temperature, coating a coating liquid on the front surface of the glass substrate to form a bottom anti-reflection film, and curing the bottom anti-reflection film;
cooling the glass substrate;
when the temperature of the glass substrate is cooled to be less than or equal to a second preset temperature, coating a coating liquid on the surface of the bottom anti-reflection film, which is far away from the glass substrate, to form a surface anti-reflection film, and curing the surface anti-reflection film;
tempering the glass substrate to obtain double-layer coated photovoltaic glass; wherein the content of the first and second substances,
and a compact layer is formed between the surface antireflection film and the bottom antireflection film, and the refractive index of the surface antireflection film is greater than that of the bottom antireflection film.
In one embodiment, the thickness of the bottom anti-reflection film is 80nm to 90nm, the thickness of the surface anti-reflection film is 110nm to 130nm, and the sum of the thicknesses of the bottom anti-reflection film and the surface anti-reflection film is 200nm to 220 nm.
In one embodiment, when the temperature of the glass substrate is preheated to a first preset temperature, a first coating liquid is coated on the front surface of the glass substrate to form a bottom anti-reflection film, and the step of curing the bottom anti-reflection film includes:
when the temperature of the glass substrate is preheated to 25-30 ℃, a first coating liquid is coated on one side of the glass substrate by a roller coating coater, the rotating speed of a coating rubber roller of the roller coating coater is 10-10.5 m, the temperature in the roller coating coater is 22-25 ℃, and the humidity is 40-60%;
curing the bottom layer antireflection film at the temperature of 90-150 ℃.
In one embodiment, when the temperature of the glass substrate is cooled to be less than or equal to a second preset temperature, a second coating liquid is coated on the surface of the bottom anti-reflection film, which is far away from the glass substrate, to form a surface anti-reflection film, and the step of curing the surface anti-reflection film includes:
when the temperature of the glass substrate is cooled to be less than or equal to 40 ℃, plating a second coating liquid on the surface of the bottom anti-reflection film, which is far away from the glass substrate, by using a roller coating machine, wherein the rotating speed of a coating rubber roller of the roller coating machine is 11-11.5 m, the temperature in the roller coating machine is 22-25 ℃, and the humidity is 40-60%;
curing the surface antireflection film at the temperature of 150-250 ℃.
In one embodiment, when the temperature of the glass substrate is preheated to a first preset temperature, the step of coating the first coating liquid on the front surface of the glass substrate to form a bottom anti-reflection film further includes:
heating the core-shell particle dispersoid to 95-100 ℃;
dispersing the heated core-shell particle dispersoid in ethanol to obtain a mixed solution, and adding SiO into the mixed solution2Sol;
and adjusting the pH value of the mixed solution to 2-2.2, and preparing the coating solution with the preset solid content.
In one embodiment, the step of heating the core-shell particle dispersion to 100 ℃ is preceded by:
dissolving the epoxy resin;
cooling to 68-70 ℃, adding a non-ionic hydrophilic monomer, keeping the temperature at 68-70 ℃, and reacting for more than 1 h;
cooling to 58-60 ℃, adding a cationic hydrophilic monomer, keeping the temperature at 58-60 ℃, and reacting for more than 2 hours;
cooling to 45-50 ℃, adding citric acid and epoxy resin for neutralization, and pouring the epoxy resin into condensed water after neutralization to obtain epoxy resin emulsion;
adding TMOS into the epoxy resin emulsion drop by drop and stirring uniformly;
and adjusting the pH value of the epoxy resin emulsion to 2.3-2.5 to form the core-shell particle dispersion.
In one embodiment, when the temperature of the glass substrate is preheated to a first preset temperature, coating a coating liquid on the front surface of the glass substrate to form a bottom anti-reflection film, wherein in the step of curing the bottom anti-reflection film, the solid content of the coating liquid is 2.7 WT% -3.3 WT%;
when the temperature of the glass substrate is cooled to be less than or equal to a second preset temperature, coating film coating liquid on the surface of the bottom anti-reflection film, which is far away from the glass substrate, to form a surface anti-reflection film, wherein in the step of curing the surface anti-reflection film, the solid content of the film coating liquid is 2.9 WT% -3.5 WT%.
In one embodiment, the thickness of the glass substrate is 1.6mm to 4.0 mm.
In addition, the invention also provides double-layer coated photovoltaic glass which is manufactured by the production method of the double-layer coated photovoltaic glass, and the double-layer coated photovoltaic glass comprises a glass substrate, and a bottom layer antireflection film and a surface layer antireflection film which are sequentially coated on the front surface of the glass substrate.
In addition, the invention also provides a production line of the double-layer coated photovoltaic glass, which is characterized in that the production line of the double-layer coated photovoltaic glass is used for realizing the production method of the double-layer coated photovoltaic glass.
According to the technical scheme, the bottom anti-reflection film and the surface anti-reflection film are stacked on the front surface of the glass substrate, and under the combined action of the bottom anti-reflection film and the surface anti-reflection film, the compact layer is formed between the surface anti-reflection film and the bottom anti-reflection film, so that the compact layer is not easily corroded or abraded in conventional use, the durability is improved, and the optical performance of the compact layer can be effectively maintained within the service life. And the refractive index of the surface antireflection film is greater than that of the bottom antireflection film, and the pipeline reflected by the bottom antireflection film can be reflected to the glass substrate again, so that the light transmittance of the surface antireflection film and the bottom antireflection film under the combined action is improved. The surface layer antireflection film and the bottom layer antireflection film act together to enable the refractive index to approach 1.23, the refractive index is larger than that of air and smaller than that of glass, the reflectivity of sunlight is reduced, the transmittance of infrared band light is improved, and therefore higher sunlight transmittance is obtained. And the formed bottom anti-reflection film and the surface anti-reflection film have excellent weather resistance and stain resistance. Therefore, when the double-layer coated photovoltaic glass is applied to a solar cell, the utilization rate of light can be improved, and the power generation efficiency is improved.
Drawings
In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings used in the description of the embodiments or the prior art will be briefly described below, it is obvious that the drawings in the following description are only some embodiments of the present invention, and for those skilled in the art, other drawings can be obtained according to the structures shown in the drawings without creative efforts.
FIG. 1 is a flow chart of an embodiment of a method for producing a double-layer coated photovoltaic glass according to the present invention;
FIG. 2 is a schematic layout of a production line for double-layer coated photovoltaic glass according to the present invention;
FIG. 3 is a schematic illustration of the butt joint of the coating section and the post-treatment section in one embodiment of the present invention.
The reference numbers illustrate:
1. loading a sheet machine; 2. an edge grinding machine; 3. a cleaning machine; 4. preheating a furnace; 5. a first film coating machine; 6. a first curing oven; 7. a second film plating machine; 8. a second curing oven; 9. a toughening furnace; 11. storing a sheet machine; 12. a transition roller way; 13. an interchange roller way; 100. a pretreatment section; 200. coating a film section; 300. and (5) a post-treatment section.
The implementation, functional features and advantages of the objects of the present invention will be further explained with reference to the accompanying drawings.
Detailed Description
It should be understood that the specific embodiments described herein are merely illustrative of the invention and are not intended to limit the invention.
In addition, the technical solutions in the embodiments of the present invention may be combined with each other, but it must be based on the realization of those skilled in the art, and when the technical solutions are contradictory or cannot be realized, such a combination of technical solutions should not be considered to exist, and is not within the protection scope of the present invention.
As shown in the drawings, in an embodiment of the present invention, a method for producing a double-layer coated photovoltaic glass includes:
step S10: providing a glass substrate, and edging and cleaning the glass substrate; wherein the glass substrate is ultra-white float glass;
the ultra-white float glass is ultra-transparent low-iron glass, has the transmittance of more than 91 percent, has good optical performance and is suitable for the substrate of a solar cell panel. The thickness of the glass substrate is 1.6 mm-4.0 mm, and in the solar cell, the glass substrate can play a role in sealing an internal photovoltaic module and has shock resistance. Before processing, the glass substrate is ground, so that the edge of the glass is ground into an arc edge, and four corners of the glass are chamfered at 45 degrees.
The cleaning comprises edging post-cleaning and coating pre-cleaning, wherein the edging post-cleaning mainly cleans visible impurities and water stains on the surface and corners of the glass substrate, and industrial water is used. The glass substrate needs to be cleaned before coating to meet the requirements of clean surface and no static electricity, and the glass substrate needs to be cleaned by pure water.
Step S20: drying and preheating the glass substrate;
and drying the surface of the cleaned glass substrate by using the preheating furnace, keeping the temperature at the normal temperature, and preparing for a coating process. The inlet and outlet of the preheating furnace are provided with 400mm long splicing roller ways, and the splicing section of the inlet/outlet is additionally provided with a dust cover, so that the glass is ensured to basically move stably and is not polluted by external dust.
Step S3: when the temperature of the glass substrate is preheated to a first preset temperature, coating a coating liquid on the front surface of the glass substrate to form a bottom anti-reflection film, and curing the bottom anti-reflection film;
specifically, in one embodiment, when the temperature of the glass substrate is preheated to 25-30 ℃, a roller coating machine is adopted to coat a first coating liquid on one side of the glass substrate, the rotating speed of a coating rubber roller of the roller coating machine is 10-10.5 m, the temperature in the roller coating machine is 22-25 ℃, and the humidity is 40-60%;
the bottom antireflection film and the surface antireflection film both adopt a roller coating type coating technology, a cleaned and dried glass substrate passes through a coating machine belt, a rubber roller with coating liquid above the coating machine belt reversely rotates, and the coating liquid is uniformly coated on the upper surface of the glass to realize single-sided coating of the glass. The thickness of the film layer is adjusted by adjusting the rotating speed of the rubber roller or the concentration of the film coating liquid, so that the glass can meet different light transmittance parameter requirements. The roller coating type coating has the advantages of high automation degree, good control of film thickness, good controllability of coating liquid quality, uniform coating film layer, high production efficiency and the like.
Curing the bottom layer antireflection film at the temperature of 90-150 ℃.
Step S40: cooling the glass substrate;
the cooling machine is mainly used for cooling after solidification, when the temperature of the glass substrate out of the solidification furnace is 70 ℃, the surface temperature of the glass is cooled to be less than or equal to 40 ℃ by the cooling machine, and preparation is made for a secondary coating process. The cooling machine adopts an air hole air knife mode, a fan is placed in a box body, air is filtered through primary and intermediate effects, a dust cover is additionally arranged on the exposed part of glass, and hot air is discharged from two sides and the lower part.
Step S50: when the temperature of the glass substrate is cooled to be less than or equal to a second preset temperature, coating a coating liquid on the surface of the bottom anti-reflection film, which is far away from the glass substrate, to form a surface anti-reflection film, and curing the surface anti-reflection film;
specifically, in one embodiment, when the temperature of the glass substrate is cooled to be less than or equal to 40 ℃, a roller coating machine is adopted to coat a second coating liquid on the surface of the bottom anti-reflection film, which is far away from the glass substrate, wherein the rotating speed of a coating rubber roller of the roller coating machine is 11 m-11.5 m, the temperature in the roller coating machine is 22 ℃ to 25 ℃, and the humidity is 40% to 60%;
curing the surface antireflection film at the temperature of 150-250 ℃.
The temperature of the curing furnace can be set between normal temperature and 300 ℃. The coating is used for drying after coating, so that the film layer is firmly combined with the glass substrate.
Step S60: and tempering the glass substrate to obtain the double-layer coated photovoltaic glass.
The toughening furnace is a continuous toughening furnace with a heating furnace length of 60m, and the glass substrate material is toughened. Therefore, the glass toughening speed is increased, the energy consumption is reduced, and the toughening performance is ensured.
The production method of the double-layer coated photovoltaic glass has the advantages that the bottom layer antireflection film and the surface layer antireflection film are superposed on the front surface of the glass substrate, and under the combined action of the bottom layer antireflection film and the surface layer antireflection film, the compact layer is formed between the surface layer antireflection film and the bottom layer antireflection film, so that the compact layer is not easily corroded or abraded in conventional use, the durability is improved, and the optical performance of the double-layer coated photovoltaic glass can be effectively maintained in the service life. And the refractive index of the surface antireflection film is greater than that of the bottom antireflection film, and the pipeline reflected by the bottom antireflection film can be reflected to the glass substrate again, so that the light transmittance of the surface antireflection film and the bottom antireflection film under the combined action is improved. The surface layer antireflection film and the bottom layer antireflection film act together to enable the refractive index to approach 1.23, the refractive index is larger than that of air and smaller than that of glass, the reflectivity of sunlight is reduced, the transmittance of infrared band light is improved, and therefore higher sunlight transmittance is obtained. And the double-layer film has better light transmittance, spectral response and anti-freezing performance than the single-layer film.
In one embodiment, the thickness of the bottom anti-reflection film is 80nm to 90nm, the thickness of the surface anti-reflection film is 110nm to 130nm, and the sum of the thicknesses of the bottom anti-reflection film and the surface anti-reflection film is 200nm to 220 nm. The thickness of the bottom layer film and the surface layer film can be adjusted to further reduce the reflectivity of sunlight and improve the transmittance of infrared band light, so that the sunlight transmittance is higher than that of single-layer coated glass.
In the actual production process, the coating liquid only contains trace moisture, the quality of a coating film layer can be influenced when the moisture content of the coating liquid is increased to a certain proportion, the influence of moisture reduction must be paid attention to in the production process, and the following points are controlled:
A. water content of isopropyl alcohol or ethanol: less than 1 percent;
B. cleaning and drying glass: the surface of the glass is dry, clean and has no water mark before film coating;
C. and (3) process control: controlling the relative humidity of a film coating room by 30-60%, and controlling the optimal control interval: 30 to 45 percent; the glass temperature before coating is 5-10 ℃ higher than the temperature of a coating room, so that the condensation phenomenon before coating of the glass is avoided;
D. and (3) empty machine liquid circulation: when glass is processed without coating, the solvent volatilization of the liquid in the circulating process can simultaneously take away the heat of the coating roller, the quantitative roller and the graining roller, the temperature of the roller is reduced, the roller can also generate condensation phenomenon in the process of absorbing heat from the air, so that the moisture content of the circulating liquid is improved, if the production is stopped for 0.5-2 h, the circulating liquid is recommended to be replaced by new film liquid during the secondary production, the replaced circulating liquid can be used as a supplementary liquid, and if the time exceeds 2h, the machine is recommended to be cleaned, stopped and waits for the secondary production
E. The preheating furnace keeps the temperature of the cleaned glass substrate at normal temperature and prepares for a coating process. The inlet and outlet of the preheating furnace are provided with 400mm long splicing roller ways, and the splicing section of the inlet/outlet is additionally provided with a dust cover, so that the glass is ensured to basically move stably and is not polluted by external dust.
In one embodiment, when the temperature of the glass substrate is preheated to a first preset temperature, the step of coating the first coating liquid on the front surface of the glass substrate to form a bottom anti-reflection film further includes:
heating the core-shell particle dispersion to 100 ℃;
dispersing the heated core-shell particle dispersoid in ethanol to obtain a mixed solution, and adding SiO into the mixed solution2Sol;
and adjusting the pH value of the mixed solution to 2-2.2, and preparing the coating solution with the preset solid content.
Adding a certain amount of core-shell particle dispersoid into a three-neck round-bottom flask provided with a stirrer, a thermometer and a vacuum tap, heating to 100 ℃, pumping most of water, dispersing into ethanol, adding a certain amount of SiO2After sol is carried out, the PH value is adjusted to 2 by concentrated nitric acid, and the coating liquid with the solid content being a preset value is obtained.
In this example, a dispersion of core-shell particles was used as a raw material to prepare hollow SiO2The coating liquid is tightly bonded together, and the surface of the generated pattern layer is relatively smooth, namely, the bottom layer antireflection film and the surface layer antireflection film which are coated on the glass substrate by the coating liquid have smooth surfaces and few broken holes, are close to a closed surface, and have excellent weather resistance and stain resistance.
In one embodiment, the step of heating the core-shell particle dispersion to 100 ℃ is preceded by:
dissolving the epoxy resin;
heating the epoxy resin to 80-90 ℃ to completely dissolve the epoxy resin, measuring the temperature of the epoxy resin by a thermometer, and enabling the temperature of all parts of the epoxy resin to tend to be uniform by a stirrer.
Cooling to 68-70 ℃, adding a non-ionic hydrophilic monomer, keeping the temperature at 68-70 ℃, and reacting for more than 1 h;
specifically, the temperature is reduced to 70 ℃, polyether amine with the dosage of 3% is added, then the temperature is kept at 68-70 ℃ for reaction for more than 1 hour, the full reaction is ensured, and the specific duration can be determined according to the dosage.
Cooling to 58-60 ℃, adding a cationic hydrophilic monomer, keeping the temperature at 58-60 ℃, and reacting for more than 2 hours;
when the temperature is reduced to 60 ℃, dropwise adding diethylamine, wherein the diethylamine is diluted by isopropanol, reacting for more than 2 hours at 60 ℃ after the dropwise adding is finished, and the temperature is ensured to be between 58 ℃ and 60 ℃ during the dropwise adding diethylamine. Epoxy resin emulsion with different particle sizes can be obtained by changing the dosage of the cationic hydrophilic monomer.
Cooling to 45-50 ℃, adding citric acid and epoxy resin for neutralization, and pouring the epoxy resin into condensed water after neutralization to obtain epoxy resin emulsion;
adding TMOS into the epoxy resin emulsion drop by drop and stirring uniformly;
and adjusting the pH value of the epoxy resin emulsion to 2.3-2.5 to form the core-shell particle dispersion.
Specifically, TMOS was added dropwise to the mixture, stirred at room temperature, and finally concentrated nitric acid was added to adjust the system acidity to PH 2.5, forming a core-shell particle dispersion with a solids content of 4%. The pH value influences, the average particle diameter of the formed core-shell particle dispersoid can be increased along with the increase of the pH value, the condensation reaction speed of a TMOS hydrolysate can be accelerated along with the increase of the pH value in an acidic range, and large particles can be generated when the pH value is too large, so that the generation of the core-shell particle dispersoid with narrower particle diameter distribution is not facilitated. The pH value is within 2.5-4, and the method is suitable for SiO2The distribution of (2) is also favorable for the generation of the core-shell particle dispersion with uniform particle size distribution.
By changing the reaction time, the reaction PH and the TMOS dosage, the core-shell particle dispersoid with different particle diameters can be prepared.
Based on the embodiment, when the temperature of the glass substrate is preheated to a first preset temperature, coating the coating liquid on the front surface of the glass substrate to form a bottom anti-reflection film, wherein in the step of curing the bottom anti-reflection film, the solid content of the coating liquid is 2.7 WT% -3.3 WT%;
when the temperature of the glass substrate is cooled to be less than or equal to a second preset temperature, coating film coating liquid on the surface of the bottom anti-reflection film, which is far away from the glass substrate, to form a surface anti-reflection film, wherein in the step of curing the surface anti-reflection film, the solid content of the film coating liquid is 2.9 WT% -3.5 WT%.
That is, the coating liquid for coating the anti-reflective coating on the bottom layer and the coating liquid for coating the anti-reflective coating on the surface layer have different solid contents, in a preferred embodiment, the core-shell particle dispersions of the coating liquid for coating the anti-reflective coating on the bottom layer and the coating liquid for coating the anti-reflective coating on the surface layer have different particle sizes. The refractive index of the bottom antireflection film is inconsistent with that of the surface antireflection film, the refractive index of the bottom antireflection film is close to 1.23 under the combined action of the bottom antireflection film and the surface antireflection film, the refractive index of the bottom antireflection film is larger than the refractive index of air and smaller than the refractive index of glass, the reflectivity of sunlight is reduced, the transmittance of infrared wave band light is improved, and therefore higher sunlight transmittance is obtained.
In addition, the invention also provides double-layer coated photovoltaic glass which is manufactured by the production method of the double-layer coated photovoltaic glass, and the double-layer coated photovoltaic glass comprises a glass substrate, and a bottom layer antireflection film and a surface layer antireflection film which are sequentially coated on the front surface of the glass substrate. The bottom layer reflecting film and the surface layer reflecting film are laminated on the front surface of the glass substrate, and the light transmittance, the spectral response and the anti-freezing performance of the double-layer film are superior to those of a single-layer film. Therefore, when the double-layer coated photovoltaic glass is applied to a solar cell, the utilization rate of light can be improved, and the power generation efficiency is improved.
In addition, the invention also provides a production line of the double-layer coated photovoltaic glass, which is characterized in that the production line of the double-layer coated photovoltaic glass is used for realizing the production method of the double-layer coated photovoltaic glass.
The film loading machine 1 is used for grabbing a glass substrate to be coated;
the edge grinding machine 2 is used for grinding the edge of the glass substrate into an arc edge;
the cleaning machine 3 is used for cleaning the surface of the glass substrate and removing static electricity;
the preheating furnace 4 is used for drying the moisture on the surface of the glass substrate and maintaining the temperature of the glass substrate at a first preset temperature;
the first coating machine 5 is used for coating a first coating liquid on the surface of one side of the glass substrate to form a bottom anti-reflection film;
the first curing oven 6 is used for curing the bottom layer antireflection film;
the second coating machine 7 is used for coating a second coating liquid on the surface of the bottom anti-reflection film to form a surface anti-reflection film;
the second curing oven 8 is used for curing the surface antireflection film;
and the toughening furnace 9 is used for toughening the glass substrate plated with the bottom anti-reflection film and the surface anti-reflection film.
Because the processing object is a 1.6-4.0mm glass substrate material, the loading machine 1 adopts an intelligent robot to grab the loading, and then the conveying line conveys the high-transparency substrate material after the edge-approaching positioning is finished to the following processing equipment stations such as edge grinding and the like through a power roller way. Thereby improving the operation speed and reducing the breakage rate.
The cleaning machine 3 comprises an edging post-cleaning machine 3 and a coating pre-cleaning machine 3, and the edging post-cleaning machine is mainly used for cleaning visible impurities and water stains on the surface and corners of the glass substrate by using industrial water. The glass substrate needs to be cleaned before coating to meet the requirements of clean surface and no static electricity, and the glass substrate needs to be cleaned by pure water.
The variable speed roller way, the plate falling roller way, the plate storage machine 11, the detection roller way (with jacking and side rollers) and the positioning roller way (with variable speed function) are arranged between the edge grinding after-cleaning machine 3 and the film coating before-cleaning machine 3 in sequence. The speed-changing roller table and the edge-grinding after-cleaning machine 3 realize dynamic speed matching, and can effectively avoid the problems of glass oblique running, oblique running and collision and the like caused by the inconsistent speed of the speed-changing roller table and the edge-grinding after-cleaning machine. The bottom of the plate dropping roller is provided with a cullet bucket, and defective products generated by edge grinding can fall off at the position, so that centralized processing is realized, and the labor intensity of personnel is reduced. The sheet storage machine 11 can store productivity for the edge grinding machine 2 when the rear-end equipment fails, and maintain the running continuity of the edge grinding machine 2. The detection roller way (with jacking and side rollers) is used for carrying out quality inspection on the edge-polished glass under the condition of not influencing the production capacity, the jacking device lifts the glass when the quality of the glass needs to be detected, and the manual sheet inserting or sheet discharging is carried out, the continuously produced glass passes through the lower part of the jacking device, and the simultaneous detection of production, manual sheet inserting and sheet discharging can be realized. The speed of the cleaning machine 3 before film coating is dynamically matched by the positioning roller way (with a speed change function), and the cleaning machine 3 before film coating is used for correcting the position of glass, so that the glass can be prevented from obliquely entering the cleaning machine 3 before film coating, and the glass can be prevented from colliding in the cleaning machine 3.
Setting a positioning roller way in front of the first film plating machine 5 and the second film plating machine 7 to ensure the stability of the plate surface and indirectly ensure the quality of the film surface; a transition roller way 12 (with double-side rollers) is arranged behind the film plating machine, the transition roller way 12 can be used for film plating leveling, and the double-side rollers are convenient for being off-shelf and defective products.
Between the second curing furnace 8 and the toughening furnace 9 are a variable speed roller way (double power), a sheet storage machine 11, a transition roller way 12, an interchange roller way 13, a transition roller way 12 (with a jacking roller and a side roller), a detection roller way (with a jacking roller and a side roller), a positioning roller way and a variable speed roller way in sequence. The speed of the variable speed roller way is dynamically matched with the speed of the toughening furnace 9, and the space between the arranged glasses can be realized by double power. The sheet storage machine 11 can store the productivity of the front-end process, buffer the problem of glass discontinuity caused by the failure of front-end equipment or other reasons, and directly ensure the production capacity of the toughening furnace 9. The transition roller way 12, the interchange roller way 13, the positioning roller way and the speed changing roller way all have the function of arranging glass spacing, and the consistent glass spacing entering the toughening furnace 9 is realized.
When the toughening furnace 9 has a fault, the front end of the lower frame can be used for producing glass at the transition roller table 12, and after the toughening furnace 9 is recovered to operate, the glass on the lower frame can be recovered to be on-line at the transition roller table. The detection roller way (with jacking and side rollers) is used for carrying out quality inspection on the glass of the front section under the condition of not influencing the production capacity, the jacking device lifts the glass when the quality of the glass, the manual insertion sheet or the sheet discharging are required to be detected, the continuously produced glass passes through the lower part of the jacking device, and the simultaneous detection of the production, the manual insertion sheet and the sheet discharging can be realized.
A variable speed roller way, a plate falling roller way, a transition roller way 12, an interchange roller way 13, a positioning roller way, a wafer storage machine 11 and a variable speed roller way (with double-side rollers) are arranged between the toughening furnace 9 and the lower wafer cleaning machine 3 in sequence. The variable speed roller way, the transition roller way 12 and the positioning roller way have the function of arranging glass spacing, and the consistent glass spacing after the tapping furnace 9 is realized. The broken glass bucket is arranged at the bottom of the plate dropping roller channel, and defective products generated by tempering can fall off at the broken glass bucket, so that centralized processing is realized, and the labor intensity of personnel is reduced. The sheet storage machine 11 can store the capacity for the toughening furnace 9 when the rear-section equipment fails, and the operation continuity of the toughening furnace 9 is ensured. The speed of the speed changing roller way (with double side rollers) is dynamically matched with the speed of the cleaning machine 3 before the sheet discharging machine, and when the cleaning machine 3 breaks down or glass needs to be backwashed, manual sheet discharging and sheet discharging can be realized at the position.
The lower piece cleaning machine 3 is provided with an online detector, a speed changing roller way, a transition roller way 12, an interchange roller way 13, a piece storage machine 11 and a transition roller way 12 (with a jacking roller and a side roller) to the lower piece end. The online detector can continuously detect the quality defects of the products in real time, and detected unqualified products are conveyed to a scrap station. The speed of the online detector is dynamically matched by the variable speed roller way (double power). The transition roller way 12 and the interchange roller way 13 both have the function of accelerating the separation distance of the glass, and the glass can quickly reach the corresponding lower sheet station. When the sheet unloading machine is in fault, the sheet storage machine 11 can buffer the toughening capacity, and the tail end transition roller table 12 can be used for manually unloading glass, so that the continuous production is ensured.
In a preferred embodiment, the upper wafer machine 1 to the cleaning machine 3 are a pretreatment section 100, the preheating furnace 4 to the second curing furnace 8 are a coating section 200, the toughening furnace 9 to the lower wafer machine are a post-treatment section 300, in this embodiment, the pretreatment section 100 and the coating ends are all three and are connected in one-to-one correspondence, the rear ends of the second curing furnaces 8 in the three coating sections 200 are all butted with a wafer storage machine 11, and the wafer storage machines 11 in the three coating sections 200 are butted with the same post-treatment section 300 through a cross-over roller table 13 and a transition roller table 12, that is, in this embodiment, the three-in-one process layout is adopted to match performance parameters of production process equipment, and the process is arranged and combined, so that the process flow is simple, the operation is safe, and the purpose of high working efficiency of the coating production line is achieved.
It should be noted that, in this document, the terms "comprises," "comprising," or any other variation thereof, are intended to cover a non-exclusive inclusion, such that a process, method, article, or system that comprises a list of elements does not include only those elements but may include other elements not expressly listed or inherent to such process, method, article, or system. Without further limitation, an element defined by the phrase "comprising an … …" does not exclude the presence of other like elements in a process, method, article, or system that comprises the element.
The above-mentioned serial numbers of the embodiments of the present invention are merely for description and do not represent the merits of the embodiments.
Through the above description of the embodiments, those skilled in the art will clearly understand that the method of the above embodiments can be implemented by software plus a necessary general hardware platform, and certainly can also be implemented by hardware, but in many cases, the former is a better implementation manner.
The above description is only a preferred embodiment of the present invention, and not intended to limit the scope of the present invention, and all modifications of equivalent structures and equivalent processes, which are made by using the contents of the present specification and the accompanying drawings, or directly or indirectly applied to other related technical fields, are included in the scope of the present invention.
Claims (10)
1. A method for producing double-layer coated photovoltaic glass, which is characterized by comprising the following steps:
providing a glass substrate, and edging and cleaning the glass substrate; wherein the glass substrate is ultra-white float glass;
drying and preheating the glass substrate;
when the temperature of the glass substrate is preheated to a first preset temperature, coating a coating liquid on the front surface of the glass substrate to form a bottom anti-reflection film, and curing the bottom anti-reflection film;
cooling the glass substrate;
when the temperature of the glass substrate is cooled to be less than or equal to a second preset temperature, coating a coating liquid on the surface of the bottom anti-reflection film, which is far away from the glass substrate, to form a surface anti-reflection film, and curing the surface anti-reflection film;
tempering the glass substrate to obtain double-layer coated photovoltaic glass; wherein the content of the first and second substances,
and a compact layer is formed between the surface antireflection film and the bottom antireflection film, and the refractive index of the surface antireflection film is greater than that of the bottom antireflection film.
2. The method for producing a double-layer coated photovoltaic glass according to claim 1, wherein the thickness of the bottom anti-reflection film is 80nm to 90nm, the thickness of the top anti-reflection film is 110nm to 130nm, and the sum of the thicknesses of the bottom anti-reflection film and the top anti-reflection film is 200nm to 220 nm.
3. The method for producing double-layer coated photovoltaic glass according to claim 1, wherein the step of coating the first coating solution on the front surface of the glass substrate to form the bottom anti-reflection film when the temperature of the glass substrate is preheated to the first preset temperature, and the step of curing the bottom anti-reflection film comprises:
when the temperature of the glass substrate is preheated to 25-30 ℃, a first coating liquid is coated on one side of the glass substrate by a roller coating coater, the rotating speed of a coating rubber roller of the roller coating coater is 10-10.5 m, the temperature in the roller coating coater is 22-25 ℃, and the humidity is 40-60%;
curing the bottom layer antireflection film at the temperature of 90-150 ℃.
4. The method for producing a double-layer coated photovoltaic glass according to claim 1, wherein the step of coating a second coating solution on the surface of the bottom antireflection film facing away from the glass substrate to form the surface antireflection film when the temperature of the glass substrate is cooled to be less than or equal to a second preset temperature, and the step of curing the surface antireflection film comprises:
when the temperature of the glass substrate is cooled to be less than or equal to 40 ℃, plating a second coating liquid on the surface of the bottom anti-reflection film, which is far away from the glass substrate, by using a roller coating machine, wherein the rotating speed of a coating rubber roller of the roller coating machine is 11-11.5 m, the temperature in the roller coating machine is 22-25 ℃, and the humidity is 40-60%;
curing the surface antireflection film at the temperature of 150-250 ℃.
5. The method for producing a double-layer coated photovoltaic glass according to any one of claims 1 to 4, wherein the step of coating the first coating liquid on the front surface of the glass substrate to form the bottom anti-reflection film when the temperature of the glass substrate is preheated to the first preset temperature further comprises the steps of:
heating the core-shell particle dispersoid to 95-100 ℃;
dispersing the heated core-shell particle dispersoid in ethanol to obtain a mixed solution, and adding SiO into the mixed solution2Sol;
and adjusting the pH value of the mixed solution to 2-2.2, and preparing the coating solution with the preset solid content.
6. The method of claim 5, wherein the step of heating the core-shell particle dispersion to a temperature of 95 ℃ to 100 ℃ is preceded by:
dissolving the epoxy resin;
cooling to 68-70 ℃, adding a non-ionic hydrophilic monomer, keeping the temperature at 68-70 ℃, and reacting for more than 1 h;
cooling to 58-60 ℃, adding a cationic hydrophilic monomer, keeping the temperature at 58-60 ℃, and reacting for more than 2 hours;
cooling to 45-50 ℃, adding citric acid and epoxy resin for neutralization, and pouring the epoxy resin into condensed water after neutralization to obtain epoxy resin emulsion;
adding TMOS into the epoxy resin emulsion drop by drop and stirring uniformly;
and adjusting the pH value of the epoxy resin emulsion to 2.3-2.5 to form the core-shell particle dispersion.
7. The method for producing a double-layer coated photovoltaic glass according to claim 5, wherein the coating solution is applied to the front surface of the glass substrate to form a bottom anti-reflection film when the temperature of the glass substrate is preheated to a first predetermined temperature, and the coating solution has a solid content of 2.7 WT% to 3.3 WT% in the step of curing the bottom anti-reflection film;
when the temperature of the glass substrate is cooled to be less than or equal to a second preset temperature, coating film coating liquid on the surface of the bottom anti-reflection film, which is far away from the glass substrate, to form a surface anti-reflection film, wherein in the step of curing the surface anti-reflection film, the solid content of the film coating liquid is 2.9 WT% -3.5 WT%.
8. The method for producing double-coated photovoltaic glass according to any one of claims 1 to 4, wherein the thickness of the glass substrate is 1.6mm to 4.0 mm.
9. A double-layer coated photovoltaic glass manufactured by the method for manufacturing a double-layer coated photovoltaic glass according to any one of claims 1 to 7, wherein the double-layer coated photovoltaic glass comprises a glass substrate and a bottom layer antireflection film and a surface layer antireflection film which are sequentially coated on the front surface of the glass substrate.
10. A production line of double-layer coated photovoltaic glass, characterized in that it is used to implement the production method of double-layer coated photovoltaic glass according to any one of claims 1 to 8.
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Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6410173B1 (en) * | 1998-11-30 | 2002-06-25 | Denglas Technologies, Llc | Antireflection coatings and other multilayer optical coatings for heat-treatable inorganic substrates and methods for making same |
| CN107140844A (en) * | 2016-11-03 | 2017-09-08 | 辽宁中迅科技有限公司 | A kind of preparation method of the non-conductive coated glass of the adjustable automatically cleaning of T/R values |
| US20190348557A1 (en) * | 2018-05-08 | 2019-11-14 | Beijing Hanergy Solar Power Investment Co., Ltd. | Coated plate, preparation method thereof and solar module |
| CN111246997A (en) * | 2017-10-19 | 2020-06-05 | Ａｇｃ株式会社 | Transparent substrate laminate and method for producing same |
| WO2021111813A1 (en) * | 2019-12-03 | 2021-06-10 | コニカミノルタ株式会社 | Optical member and production method therefor |
| CN113782620A (en) * | 2021-08-25 | 2021-12-10 | 中国建材国际工程集团有限公司 | Solar photovoltaic cover plate glass, deep processing method and production line thereof |
-
2022
- 2022-01-17 CN CN202210048026.8A patent/CN114409271A/en active Pending
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6410173B1 (en) * | 1998-11-30 | 2002-06-25 | Denglas Technologies, Llc | Antireflection coatings and other multilayer optical coatings for heat-treatable inorganic substrates and methods for making same |
| CN107140844A (en) * | 2016-11-03 | 2017-09-08 | 辽宁中迅科技有限公司 | A kind of preparation method of the non-conductive coated glass of the adjustable automatically cleaning of T/R values |
| CN111246997A (en) * | 2017-10-19 | 2020-06-05 | Ａｇｃ株式会社 | Transparent substrate laminate and method for producing same |
| US20190348557A1 (en) * | 2018-05-08 | 2019-11-14 | Beijing Hanergy Solar Power Investment Co., Ltd. | Coated plate, preparation method thereof and solar module |
| WO2021111813A1 (en) * | 2019-12-03 | 2021-06-10 | コニカミノルタ株式会社 | Optical member and production method therefor |
| CN113782620A (en) * | 2021-08-25 | 2021-12-10 | 中国建材国际工程集团有限公司 | Solar photovoltaic cover plate glass, deep processing method and production line thereof |
Non-Patent Citations (2)
| Title |
|---|
| 王振廷: "《薄膜光学与真空镀膜技术》", 哈尔滨工业大学出版社, pages: 111 * |
| 金小花: "基于阳/非离子型聚合物-SiO2核壳粒子分散体的减反射涂层研究", no. 06, pages 109 - 40 * |
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Application publication date: 20220429 |