CN114325910A - Step characteristic passband narrow-band optical filter - Google Patents
Step characteristic passband narrow-band optical filter Download PDFInfo
- Publication number
- CN114325910A CN114325910A CN202111538996.8A CN202111538996A CN114325910A CN 114325910 A CN114325910 A CN 114325910A CN 202111538996 A CN202111538996 A CN 202111538996A CN 114325910 A CN114325910 A CN 114325910A
- Authority
- CN
- China
- Prior art keywords
- film layer
- refractive index
- passband
- index material
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000003287 optical effect Effects 0.000 title claims abstract description 18
- 239000000463 material Substances 0.000 claims abstract description 45
- 239000000758 substrate Substances 0.000 claims abstract description 28
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 13
- 229910052681 coesite Inorganic materials 0.000 claims description 12
- 229910052906 cristobalite Inorganic materials 0.000 claims description 12
- 239000000377 silicon dioxide Substances 0.000 claims description 12
- 229910052682 stishovite Inorganic materials 0.000 claims description 12
- 229910052905 tridymite Inorganic materials 0.000 claims description 12
- PBCFLUZVCVVTBY-UHFFFAOYSA-N tantalum pentoxide Inorganic materials O=[Ta](=O)O[Ta](=O)=O PBCFLUZVCVVTBY-UHFFFAOYSA-N 0.000 claims description 7
- 229910001635 magnesium fluoride Inorganic materials 0.000 claims description 6
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 4
- 239000011521 glass Substances 0.000 claims description 4
- ZKATWMILCYLAPD-UHFFFAOYSA-N niobium pentoxide Chemical compound O=[Nb](=O)O[Nb](=O)=O ZKATWMILCYLAPD-UHFFFAOYSA-N 0.000 claims description 4
- 229910009815 Ti3O5 Inorganic materials 0.000 claims description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N ZrO2 Inorganic materials O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 claims description 2
- 239000005304 optical glass Substances 0.000 claims description 2
- 239000010408 film Substances 0.000 description 58
- 238000002834 transmittance Methods 0.000 description 31
- 238000001704 evaporation Methods 0.000 description 7
- 230000000694 effects Effects 0.000 description 6
- 230000008020 evaporation Effects 0.000 description 6
- 230000007423 decrease Effects 0.000 description 5
- 230000003595 spectral effect Effects 0.000 description 5
- 230000005540 biological transmission Effects 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 238000010884 ion-beam technique Methods 0.000 description 2
- 238000007747 plating Methods 0.000 description 2
- 238000005498 polishing Methods 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
Images
Landscapes
- Optical Filters (AREA)
Abstract
The invention provides a step characteristic passband narrow-band filter, which comprises: the device comprises a substrate, a first film layer and a second film layer are plated on two sides of the substrate respectively; the structure of the first film layer from the substrate to the outer side is as follows: a (HL) b (HL) (HL)sc (HL) d (HL); the structure of the second film layer from the substrate to the outer side is as follows: (HL)ny(H)(LH)nx(H)L[(HL)n2y(H)(LH)nL]m(HL)n+1y(H)(LH)n(ii) a Wherein H represents a high refractive index material film layer, and L represents a low refractive index material film layer; a. b, c, d, x and y represent the optical thickness of the bracket inner film layer structure, the thickness unit is lambda/4, 0 is more than a, b, c and d are less than 2, 1 is more than x and less than 1, and y is the multiple of the integer 2. m, n, s represent the number of repetitions of the structure in parentheses.
Description
Technical Field
The invention relates to the technical field of narrow-band filters, in particular to a step characteristic passband narrow-band filter.
Background
The narrow-band filter, belonging to band-pass filter, plays the role of filtering light and selecting spectral line in optical system, and is an important thin-film element. The function of the optical system is as follows: optical signals in a particular band are allowed to pass while optical signals on both sides outside the passband are blocked. Therefore, the interference of stray light in a non-working waveband can be reduced, and the signal-to-noise ratio of the system is improved. The common processing mode of the narrow-band filter is a multilayer film formed by alternately arranging high-refractive-index material film layers and low-refractive-index material film layers, and the characteristic of a passband spectral curve is similar to a Chinese character 'ji'. The narrow-band filter is very sensitive to the working angle, and when the working angle is gradually increased from 0 degree, the central wavelength position of the pass band can continuously move to the short wave. The top of the passband of a common narrow-band filter is flat, and the difference of transmittance values is small. When the product requires that the passband operating characteristics of the filter are that the transmittance in a small operating angle state is significantly lower or higher than that in a large operating angle state (the spectral passband is in a step characteristic), the design and processing method of the common narrowband filter cannot meet the requirement.
Disclosure of Invention
The invention aims to provide a step characteristic passband narrow-band filter, which can ensure that the passband working characteristic of the filter is that the transmittance in a small working angle state is obviously lower or higher than that in a large working angle state.
A step-feature passband narrowband filter comprising: the device comprises a substrate, a first film layer and a second film layer, wherein the two sides of the substrate are respectively plated with the first film layer and the second film layer;
the structure of the first film layer from the substrate to the outer side is as follows:
a(HL)b(HL)(HL)s c(HL)d(HL)；
the structure of the second film layer from the substrate to the outer side is as follows:
(HL)n y(H)(LH)n x(H)L[(HL)n 2y(H)(LH)n L]m(HL)n+1y(H)(LH)n；
wherein H represents a high refractive index material film layer, and L represents a low refractive index material film layer; a. b, c, d, x and y represent the optical thickness of the bracket inner film layer structure, the thickness unit is lambda/4, lambda is the working wavelength, 0 is more than a, b, c and d are less than 2, 1 is more than x and less than 1, and y is the multiple of the integer 2. m, n, s represent the number of repetitions of the structure in parentheses.
Optionally, the material of the substrate is optical glass or colored glass.
Optionally, the high refractive index material has a refractive index value in the range of 2.0-3.0.
Optionally, the high refractive index material comprises TiO2、Ti3O5、Ta2O5、Nb2O5、ZrO2And ZnS.
Optionally, the total number of alternating layers of the high refractive index material and the low refractive index material in the first film layer is 30-50.
Optionally, the low refractive index material has a refractive index value in the range of 1.2-1.6.
Optionally, the low refractive index material comprises SiO2And MgF2At least one of (1).
Optionally, the total number of the alternately plated high refractive index material and low refractive index material in the first film layer is 30-50;
optionally, the total number of alternately plated layers of the high refractive index material and the low refractive index material in the second film layer is 40-60.
The invention has the beneficial effects that: the high-refractive-index material is selected from the all-dielectric Fabry-Perot film layer structure as a reflecting layer, so that the angle offset of the pass band of the optical filter can be weakened, and the multi-angle working performance of the optical filter is ensured. The unique asymmetric multi-cavity structure is adopted, a unique passband effect is modulated by a differential structure formed by different reflecting stack layers and reflecting layer thicknesses in each single cavity in the design, the center wavelength of a passband of the 1 st cavity can be shifted to long wave/short wave by increasing/reducing the thickness of a sensitive layer in the 1 st cavity, and further the transmittance of the tuned multi-cavity structure passband curve at the short wave end/long wave end is reduced, the passband is in a step characteristic, the effect that the transmittance in a small working angle state is obviously lower or higher than the transmittance in a large working angle state can be realized at the working wavelength, and the requirement that the transmittance values at different working angles show obvious difference can be met; meanwhile, the thin film design scheme still maintains the passband bandwidth characteristic and the cut-off effect of the common design scheme.
Drawings
FIG. 1 is a schematic diagram of a step feature passband narrowband filter of the present invention;
FIG. 2 is a graph of the passband spectral transmission of a filter according to an embodiment of the invention;
fig. 3 is a passband spectral transmission plot of a filter of another embodiment of the present invention.
In the above figures: 1, a substrate; 2 a first membrane layer; 3 a second film layer.
The present invention will be described in further detail with reference to the accompanying drawings and examples.
Detailed Description
The present invention will be explained in more detail and fully with reference to the following examples, which are intended to illustrate but not limit the scope of the invention.
The invention provides a step characteristic passband narrow-band filter, which comprises: the device comprises a substrate 1, wherein a first film layer 2 and a second film layer 3 are plated on two sides of the substrate 1 respectively;
the structure of the first film layer 2 from the substrate 1 to the outside is as follows:
a(HL)b(HL)(HL)s c(HL)d(HL)；
the structure of the second film layer 3 from the substrate 1 to the outside is as follows:
(HL)n y(H)(LH)n x(H)L[(HL)n 2y(H)(LH)n L]m(HL)n+1y(H)(LH)n；
wherein H represents a high refractive index material film layer, and L represents a low refractive index material film layer; a. b, c, d, x and y represent the optical thickness of the bracket inner film layer structure, the thickness unit is lambda/4, lambda is the working wavelength 1064nm, 0 is more than a, b, c and d and less than 2, 1 is more than x and less than 1, and y is the multiple of the integer 2. m, n, s represent the number of repetitions of the structure in parentheses.
The film layer structure is a periodic band-pass filter film stack. The third film layer 3 is alternately plated with high refractive index material film layers and low refractive index materials, and the structure of the third film layer 3 is an all-dielectric Fabry-Perot structure.
The technical principle of the invention can be briefly stated that the full-medium Fabry-Perot film layer structure is utilized to realize the cut-off of long-wave and short-wave light rays in a certain range except for the working wavelength, the band-pass filter film stack is utilized to realize the cut-off of the light rays in the wave bands except for the material absorption wave band of the substrate 1 and the cut-off wave band of the Fabry-Perot film layer structure, and finally the pass band bandwidth characteristics and the cut-off band cut-off effect of the narrow pass band and the wide cut-off band are formed. In the all-dielectric Fabry-Perot structure, a high-refractive-index material is selected as a reflecting layer, so that the angle offset of a pass band of the optical filter can be weakened, and the multi-angle working performance of the optical filter is ensured.
In the first film layer 2, (HL)sThe filter film structure is a main part of a band-pass filter film structure and can inhibit light in a specified wavelength range from transmitting, and a (HL) b (HL) and c (HL) d (HL) on two sides can inhibit the generation of passband ripple and improve the performance through proper proportion.
The differential structure formed by different reflecting stack layers and reflecting layer thicknesses in each single cavity modulates a unique passband effect, the center wavelength of a passband of a 1 st cavity can be shifted to long wave/short wave by increasing/reducing the thickness of a sensitive layer in the 1 st cavity, and further, the transmittance of a tuned multi-cavity structure passband curve at a short wave end/a long wave end is reduced, the passband is in a step characteristic, and the effect that the transmittance in a small working angle state is obviously lower or higher than that in a large working angle state can be realized at the working wavelength.
Example 1
Now, a specific embodiment is provided for explaining, the material of the substrate 1 in the narrowband filter with step characteristic passband of the invention is HWB850 glass, and the high refractive index film layer H is Ta2O5The material of the low refractive index film layer L is SiO2Material, polishing and cleaning substrate 1, and evaporating Ta on one surface of substrate 12O5Layer and SiO2Layer, thereby forming the first film layer 2, Ta in the first film layer 22O5Layer and SiO2The total number of layers was 33. Ta is evaporated on the other surface of the substrate 1 alternately2O5Layer and SiO2Layer, Ta in the second film layer 32O5Layer and SiO2The total number of layers was 46. Ta in the first and second film layers 2, 32O5The thickness of the layer was set to 130nm, SiO2The thickness of the layer was set to 190nm, Ta2O5The refractive index of the material at 546nm is 2.20, SiO2A refractive index at 546nm of 1.48; ion beam assisted evaporation of Ta2O5Layer and SiO2Layer of Ta2O5Has an evaporation rate of 0.2nm/s, Ar of 15sccm, O2At 85sccm, the ion source energy was 7000w, SiO2Has an evaporation rate of 0.3nm/s, Ar of 15sccm, O2At 15sccm, the ion source energy is 8000 w.
The film system obtained in this example had the following structure:
first film layer 2: the central wavelength is 880nm and the central wavelength is 880nm,
0.8(HL)0.9(HL)(HL)110.8(HL)1.5(HL)；
second film layer 3: the central wavelength is 1070nm and the wavelength of the light source,
(HL)2(2)H(LH)2(0.5)HL[(HL)2(4)H(LH)2L]2(HL)3(2)H(LH)2；
wherein, H: a Ta2O5 film layer; l: a film layer of SiO2 material.
When the working angle of the optical filter prepared in this embodiment is 12 °, the transmittance in the phase of the wavelength 1040 and 1045nm is almost 0, the transmittance in the phase of the wavelength 1045 and 1050nm starts to increase to 5%, the transmittance in the phase of the wavelength 1050 and 1055nm exponentially increases to 60%, the transmittance in the phase of the wavelength 1055 and 1057nm hardly changes, the transmittance in the phase of the wavelength 1057 and 1063nm exponentially increases to 85%, the transmittance in the phase of the wavelength 1063 and 1068nm remains unchanged at 85%, the transmittance in the phase of the wavelength 1068 and 1085nm exponentially decreases to 1%, and the transmittance in the phase of the wavelength 1085 and 1100nm slowly decreases to 0, as shown in fig. 2.
When the working angle of the optical filter prepared in the embodiment is 0 °, the transmittance is almost 0 at the phase of wavelength 1040-.
As can be seen from FIG. 2, at the wavelength of 1045-1071nm, the transmittance of the filter at the large operating angle (12 °) is significantly higher than that at the small operating angle (0 °); in the wavelength 1071-1090nm stage, the transmittance of the filter in the state of a small working angle (0 ℃) is obviously lower than that in the state of a large working angle (12 ℃). The operating wavelength λ is 1064nm, and the transmittance of the filter at a large operating angle (12 °) is significantly higher than that at a small operating angle (0 °).
Example 2
In another embodiment, the invention provides a method for manufacturing a narrow-band filter with step-feature passbandThe sheet 1 is made of HWB850 glass, the high-refractive-index film layer H is made of ZnS, and the low-refractive-index film layer L is made of MgF2Polishing and cleaning a substrate 1, and alternately plating a ZnS layer and MgF on one surface of the substrate 12Layer, thereby forming a first film layer 2, and alternately plating a ZnS layer and MgF on the other surface of the substrate 12Thereby forming the second film layer 3. ZnS layer and MgF in the first film layer2The total number of layers is 33, and the ZnS layer and MgF in the second film layer 32The total number of layers is 46, the thickness of each ZnS layer is set to 120nm, and each MgF layer is set to2The thickness of the layer was set to 200nm, the refractive index of the ZnS material at 546nm was 2.30, MgF2The refractive index of the material at 546nm is 1.38; adopting ion beam assisted evaporation, the evaporation rate of ZnS is 0.2nm/s, Ar is 20sccm, the ion source power is 300W, and MgF2The evaporation rate of (2) was 0.6nm/s, Ar was 20sccm, and the ion source power was 300W.
The film system obtained in this example had the following structure:
first film layer 2: the central wavelength is 880nm and the central wavelength is 880nm,
0.8(HL)0.9(HL)(HL)110.8(HL)1.5(HL)；
second film layer 3: the central wavelength is 1070nm and the wavelength of the light source,
(HL)2(2)H(LH)2(0.44)HL[(HL)2(4)H(LH)2L]2(HL)3(2)H(LH)2；
wherein, H: a ZnS material film layer; l: MgF2A film layer of material.
When the working angle of the optical filter prepared in this embodiment is 12 °, the transmittance at the wavelength of 1040-.
When the working angle of the optical filter prepared in this embodiment is 0 °, the transmittance is almost 0 at the phase of 1040 and 1060nm, the transmittance exponentially increases to 37% at the phase of 1060 and 1065nm, the transmittance decreases to 36% at the phase of 1065 and 1067nm, the transmittance exponentially increases to 75% at the phase of 1067 and 1073nm, the transmittance slowly decreases to 74% at the phase of 1073 and 1075nm, the transmittance exponentially decreases to nearly 0 at the phase of 1077 and 1085nm, and the transmittance is almost 0 at the phase of 1085 and 1100 nm.
As can be seen from FIG. 3, in the stage of wavelength 1050-; in the 1069-1085nm wavelength stage, the transmittance of the filter in the large operating angle (12 °) state is significantly lower than that in the small operating angle (0 °). The operating wavelength λ is 1064nm, and the transmittance of the filter at a large operating angle (12 °) is significantly higher than that at a small operating angle (0 °).
The above description is only for the preferred embodiment of the present invention, but the scope of the present invention is not limited thereto, and any changes or substitutions that can be easily conceived by those skilled in the art within the technical scope of the present invention are included in the scope of the present invention. Therefore, the protection scope of the present invention shall be subject to the protection scope of the claims. The components and structures of the present embodiments that are not described in detail are well known in the art and do not constitute essential structural elements or elements.
Claims (8)
1. A step-feature passband narrowband filter comprising: the film comprises a substrate (1), wherein a first film layer (2) and a second film layer (3) are plated on two sides of the substrate (1) respectively;
the structure of the first film layer (2) from the substrate (1) to the outer side is as follows:
a(HL)b(HL)(HL)s c(HL)d(HL)；
the structure of the second film layer (3) from the substrate (1) to the outer side is as follows:
(HL)n y(H)(LH)n x(H)L[(HL)n 2y(H)(LH)n L]m(HL)n+1y(H)(LH)n；
wherein H represents a high refractive index material film layer, and L represents a low refractive index material film layer; a. b, c, d, x and y represent the optical thickness of the bracket inner film layer structure, the thickness unit is lambda/4, lambda is the working wavelength, 0 is more than a, b, c and d are less than 2, 1 is more than x and less than 1, and y is the multiple of an integer 2; m, n, s represent the number of repetitions of the structure in parentheses.
2. The step-feature passband narrowband filter according to claim 1, characterized in that the material of the substrate (1) is optical glass or colored glass.
3. The step-feature passband narrowband filter according to claim 1, wherein the high index material has a refractive index value in the range of 2.0-3.0.
4. The step-feature passband narrowband filter according to claim 3, wherein the high index material comprises TiO2、Ti3O5、Ta2O5、Nb2O5、ZrO2And ZnS.
5. The step-feature passband narrowband filter according to claim 3 or 4, characterized in that the first film layer (2) comprises a total number of layers of alternating layers of high refractive index material and low refractive index material of 30-50.
6. The step-feature passband narrowband filter according to claim 1, wherein the low index material has a refractive index value in the range of 1.2-1.6.
7. The step-feature passband narrowband filter according to claim 6, wherein the low index material comprises SiO2And MgF2At least one of (1).
8. The step-feature passband narrowband filter according to claim 6 or 7, characterized in that the second film layer (3) has a total number of layers of alternating layers of high refractive index material and low refractive index material of 40-60.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202111538996.8A CN114325910B (en) | 2021-12-15 | 2021-12-15 | Step characteristic passband narrowband optical filter |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202111538996.8A CN114325910B (en) | 2021-12-15 | 2021-12-15 | Step characteristic passband narrowband optical filter |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN114325910A true CN114325910A (en) | 2022-04-12 |
| CN114325910B CN114325910B (en) | 2024-02-09 |
Family
ID=81053031
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202111538996.8A Active CN114325910B (en) | 2021-12-15 | 2021-12-15 | Step characteristic passband narrowband optical filter |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN114325910B (en) |
Citations (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH11326633A (en) * | 1998-05-18 | 1999-11-26 | Japan Aviation Electronics Ind Ltd | Wavelength selecting element and optical device using the same |
| TW520447B (en) * | 2001-05-23 | 2003-02-11 | Univ Tsinghua | Interference filter |
| US6522469B1 (en) * | 2001-09-19 | 2003-02-18 | The Aerospace Corporation | Tunable solid state thin film optical filter |
| JP2003207753A (en) * | 2002-01-16 | 2003-07-25 | Sun Tec Kk | Variable wavelength band-pass filter |
| US20050018301A1 (en) * | 2003-06-10 | 2005-01-27 | Noboru Uehara | Optical element and optical add-drop module |
| JP2005062291A (en) * | 2003-08-08 | 2005-03-10 | Hitachi Maxell Ltd | Optical band pass filter |
| US20050174664A1 (en) * | 2004-02-03 | 2005-08-11 | The Furukawa Electric Co., Ltd. | Dielectric multi layer thin film optical filter having predetermined wavelength optical characteristics, a method of manufacturing the same, a program for designing the same, and an optical add-drop system using the dielectric multi layer thin film optical filter |
| US20060147212A1 (en) * | 2003-07-14 | 2006-07-06 | Roger Netterfield | Optical filter, an optical interleaver and associated methods of manufacture |
| CN103217730A (en) * | 2013-04-18 | 2013-07-24 | 同济大学 | Narrow-band negative filter plate membrane system with gradually-changing optical thicknesses |
| CN107703576A (en) * | 2017-09-29 | 2018-02-16 | 苏州京浜光电科技股份有限公司 | A kind of small offset narrow band pass filter of wide-angle and preparation method thereof |
| CN109716217A (en) * | 2016-09-20 | 2019-05-03 | 依视路国际公司 | The optical goods of blue light cut-off, high UV cut-off and the high grade of transparency |
| CN211857109U (en) * | 2020-03-25 | 2020-11-03 | 南阳市康力达光学仪器有限责任公司 | Multifunctional optical lens |
| WO2021036387A1 (en) * | 2019-08-30 | 2021-03-04 | 福州高意光学有限公司 | Optical filter applied in wide angle |
-
2021
- 2021-12-15 CN CN202111538996.8A patent/CN114325910B/en active Active
Patent Citations (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH11326633A (en) * | 1998-05-18 | 1999-11-26 | Japan Aviation Electronics Ind Ltd | Wavelength selecting element and optical device using the same |
| TW520447B (en) * | 2001-05-23 | 2003-02-11 | Univ Tsinghua | Interference filter |
| US6522469B1 (en) * | 2001-09-19 | 2003-02-18 | The Aerospace Corporation | Tunable solid state thin film optical filter |
| JP2003207753A (en) * | 2002-01-16 | 2003-07-25 | Sun Tec Kk | Variable wavelength band-pass filter |
| US20050018301A1 (en) * | 2003-06-10 | 2005-01-27 | Noboru Uehara | Optical element and optical add-drop module |
| US20060147212A1 (en) * | 2003-07-14 | 2006-07-06 | Roger Netterfield | Optical filter, an optical interleaver and associated methods of manufacture |
| JP2005062291A (en) * | 2003-08-08 | 2005-03-10 | Hitachi Maxell Ltd | Optical band pass filter |
| US20050174664A1 (en) * | 2004-02-03 | 2005-08-11 | The Furukawa Electric Co., Ltd. | Dielectric multi layer thin film optical filter having predetermined wavelength optical characteristics, a method of manufacturing the same, a program for designing the same, and an optical add-drop system using the dielectric multi layer thin film optical filter |
| CN103217730A (en) * | 2013-04-18 | 2013-07-24 | 同济大学 | Narrow-band negative filter plate membrane system with gradually-changing optical thicknesses |
| CN109716217A (en) * | 2016-09-20 | 2019-05-03 | 依视路国际公司 | The optical goods of blue light cut-off, high UV cut-off and the high grade of transparency |
| CN107703576A (en) * | 2017-09-29 | 2018-02-16 | 苏州京浜光电科技股份有限公司 | A kind of small offset narrow band pass filter of wide-angle and preparation method thereof |
| WO2021036387A1 (en) * | 2019-08-30 | 2021-03-04 | 福州高意光学有限公司 | Optical filter applied in wide angle |
| CN211857109U (en) * | 2020-03-25 | 2020-11-03 | 南阳市康力达光学仪器有限责任公司 | Multifunctional optical lens |
Also Published As
| Publication number | Publication date |
|---|---|
| CN114325910B (en) | 2024-02-09 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US4896928A (en) | Chromatically invariant multilayer dielectric thin film coating | |
| CN1979230B (en) | Dielectric multilayer filter | |
| CN108459368B (en) | Optical filter and sensor system | |
| US5200855A (en) | Absorbing dichroic filters | |
| JP7299346B2 (en) | Near-infrared bandpass optical filter and optical sensing system | |
| WO2011158635A1 (en) | Infrared blocking filter | |
| CN101389982A (en) | Dichroic filter | |
| TWI227796B (en) | Polarization beam splitter and polarizer using the same | |
| CN107479191B (en) | Laser rectangular filter for visible light deep cut-off and design method | |
| JP2000329933A (en) | Multilayered film filter | |
| CN106405709A (en) | Wide band cut-off ultra-narrow-band filter | |
| CN108469645A (en) | A kind of polarizing filter element and preparation method thereof | |
| CN112444898B (en) | Optical filter for wide-angle application | |
| US20130215499A1 (en) | Notch filter system using spectral inversion | |
| JPH10268130A (en) | Light absorbing filter | |
| CN107783218B (en) | Deep ultraviolet band-pass filter and preparation method thereof | |
| CN203786316U (en) | Attenuation band-pass optical filter | |
| CN111290064A (en) | Polarization-independent optical filter | |
| JP3381150B2 (en) | Infrared transmission filter and manufacturing method thereof | |
| US7315420B2 (en) | CWDM filter with four channels | |
| CN114325910B (en) | Step characteristic passband narrowband optical filter | |
| CN106597591B (en) | Quasi-rectangular narrow-band filter with high cut-off and low ripple | |
| JP4981456B2 (en) | ND filter | |
| EP3514584A1 (en) | Angle of incidence restriction for optical filters | |
| CN111552018A (en) | Quasi-rectangular narrow-band filter with wide cut-off and high transmittance |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant |