CN114196919B - 一种模具用高结合力硬质涂层及其制备工艺 - Google Patents
一种模具用高结合力硬质涂层及其制备工艺 Download PDFInfo
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Abstract
本发明公开了一种模具用高结合力硬质涂层及其制备工艺，涉及表面强化领域，包括复合过渡层、缓冲层和功能层，所述复合过渡层沉积于基底表面，所述缓冲层设置于复合过渡层和功能层之间；其中，所述复合过渡层由AlCr和TiSi交替沉积或者由AlTi和TiSi交替沉积而成，所述缓冲层由CrN沉积而成，所述功能层由TiSiN沉积而成，制备工艺包括：模具前处理、PVD真空镀膜和镀膜后处理。本发明提出的模具用高结合力硬质涂层制备工艺，有效的解决了传统TiSi类涂层在硬度低的基材上沉积时易发生脱落的问题，实现TiSi类涂层在模具表面强化的稳定应用，制备的涂层与基体结合力好，不易产生裂纹；使用后抗氧化性能好，抗剥离强度高，涂层不易脱落。
Description
技术领域
本发明涉及表面强化领域，具体是涉及一种模具用高结合力硬质涂层及其制备工艺。
背景技术
现有模具生产中为保证模具的表面强度以及其他力学性能，通常会在模具表面进行涂层处理，现有技术中，TiSi类涂层具有最高的硬度和耐温性，硬度高达HV4200，耐温性达到1200℃，但是涂层沉积过程中应力累积导致其内部应力很大，在镀膜过程中需要基材硬度高，对于硬度低的基材、由于其膨胀系数高；而涂层自身硬度高、膨胀系数低，有凹凸、异性的模具表面在高温成膜结束出炉后，随着温度的降低，涂层和基体热涨冷缩的不同，易导致造成涂层直接在基材上脱落，影响镀膜效果。
发明内容
为解决上述技术问题，提供一种模具用高结合力硬质涂层及其制备工艺，本技术方案解决了上述的但是涂层沉积过程中应力累积导致其内部应力很大，在镀膜过程中需要基材硬度高(一般镀在钨钢材料刀具上)，对于基材硬度低的基材、由于其膨胀系数高；而涂层自身硬度高、膨胀系数低，在高温成膜结束出炉后，随着温度的降低，涂层和基体热涨冷缩的不同，易导致造成涂层直接在基材上脱落，影响镀膜效果的问题。
为达到以上目的，本发明采用的技术方案为：
一种模具用高结合力硬质涂层，包括复合过渡层、缓冲层和功能层，所述复合过渡层沉积于基底表面，所述缓冲层设置于复合过渡层和功能层之间；
其中，所述复合过渡层由AlCr和TiSi交替沉积或者由AlTi和TiSi交替沉积而成，所述缓冲层由CrN沉积而成，所述功能层由TiSiN沉积而成。
进一步的，提出一种模具用高结合力硬质涂层制备工艺，包括如下步骤：
模具前处理：将模具进行超声清洗、烘干和真空脱气步骤后，再对模具进行喷砂处理；
PVD真空镀膜：对真空腔内部进行抽真空处理，并升温至镀膜温度后依次在模具表面沉积括复合过渡层、缓冲层和功能层；
镀膜后处理：对真空腔进行降温至出料温度后取出镀膜完成的模具，并进行表面处理。
优选的，所述模具前处理具体包括如下步骤：
碱性清洗：模具放入70℃、5％碱性清洗液中超声波清洗20分钟；
去离子水清洗：模具放入70℃、10MΩ去离子水中超声波漂洗20分钟；
烘干：模具放入70℃烘干槽中烘干10分钟；
真空脱气：模具放入真空烘烤炉中进行真空脱气处理，温度为350℃、恒温时间4H、真空度为5.0×10-3Pa；
喷漆处理：模具真空脱气处理后对模具进行喷砂处理，喷砂处理采用300目玻璃砂，处理压力为0.5-0.8KG。
优选的，所述PVD真空镀膜具体包括如下步骤：
升温：模具放进真空炉腔进行抽真空处理，温度设定350℃，恒温2H；
清洗：当真空度达到5.0×10-3Pa时，对模具进行PET清洗，清洗时间为60分钟；
复合过渡层沉积：进行AlCr+TiSi+AlCr+TiSi+AlCr+TiSi复合过渡层沉积或者进行AlTi+TiSi+AlTi+TiSi+AlTi+TiSi复合过渡层沉积，沉积时间为110-120分钟；
缓冲层沉积：进行CrN缓冲层沉积，沉积时间为5分钟；
功能层沉积：进行TiSiN功能层沉积，沉积时间为20分钟。
优选的，所述复合过渡层沉积具体步骤为：施加-40～-150V的沉积负偏压脉冲，向真空腔内部通入保护气体，并保持真空腔内部气压为2Pa-3Pa，之后交替开启AlCr靶和TiSi靶或者交替开启AlTi靶和TiSi靶，电弧靶电流150A，进行复合过渡层沉积。
优选的，所述缓冲层沉积的具体步骤为：施加-40～-60V的沉积负偏压脉冲，向真空腔内部通入氮气，并保持真空腔内部气压为0.4Pa-0.6Pa，开启Cr靶，进行缓冲层沉积。
优选的，所述功能层沉积具体步骤为：施加-40～-60V的沉积负偏压脉冲，向真空腔内部通入氮气，并保持真空腔内部气压为2Pa-3Pa，开启TiSi靶，电弧靶电流150A，进行功能层沉积。
优选的，所述镀膜后处理具体包括如下步骤：
降温：对真空沉积腔进行降温，当真空沉积腔内部温度降至120℃时，真空沉积腔破真空，将镀膜完成的模具取出；
涂层喷砂处理：对涂层表面进行喷砂处理，喷砂处理采用300目玻璃砂，处理压力为0.5-0.8KG。
与现有技术相比，本发明的优点在于：
本发明采用新型涂层制备工艺，在模具在镀膜前增加喷砂处理，对模具表面进行清洁同时提高模具表面的粗糙度，提高其与涂层的结合力，同时将镀膜温度调整至350℃，减低镀膜完成后的温度变化差，减低涂层与基体之间的热涨冷缩差，同时在复合过渡层和功能层之间沉积一层极薄的CrN缓冲层，在不影响涂层自身强度的情况下，为表层的TiSiN功能层预留出热脏冷缩形变空间，有效的防止了涂层在基材上脱落的情况发生，提高镀膜质量。
附图说明
图1为本发明提出的制备工艺流程图。
具体实施方式
以下描述用于揭露本发明以使本领域技术人员能够实现本发明。以下描述中的优选实施例只作为举例，本领域技术人员可以想到其他显而易见的变型。
实施例一：
一种模具用高结合力硬质涂层制备工艺，具体包括如下步骤：
碱性清洗：模具放入70℃、5％碱性清洗液中超声波清洗20分钟；
去离子水清洗：模具放入70℃、10MΩ去离子水中超声波漂洗20分钟；
烘干：模具放入70℃烘干槽中烘干10分钟；
真空脱气：模具放入真空烘烤炉中进行真空脱气处理，温度为350℃、恒温时间4H、真空度为5.0×10-3Pa；
喷漆处理：模具真空脱气处理后对模具进行喷砂处理，喷砂处理采用300目玻璃砂，处理压力为0.5-0.8KG；
升温：模具放进真空炉腔进行抽真空处理，温度设定350℃，恒温2H；
清洗：当真空度达到5.0×10-3Pa时，对模具进行PET清洗，清洗时间为60分钟；
复合过渡层沉积：施加-40～-150V的沉积负偏压脉冲，向真空腔内部通入保护气体，并保持真空腔内部气压为2Pa-3Pa，之后交替开启AlCr靶和TiSi靶，，进行AlCr+TiSi+AlCr+TiSi+AlCr+TiSi复合过渡层沉积，电弧靶电流150A，沉积时间为110-120分钟；
缓冲层沉积：施加-40～-60V的沉积负偏压脉冲，向真空腔内部通入氮气，并保持真空腔内部气压为0.5Pa-1.2Pa，开启Cr靶，进行缓冲层沉积CrN缓冲层沉积，沉积时间为5分钟；
功能层沉积：施加-40～-60V的沉积负偏压脉冲，向真空腔内部通入氮气，并保持真空腔内部气压为2Pa-3Pa，开启TiSi靶，电弧靶电流150A，进行TiSiN功能层沉积，沉积时间为20分钟；
降温：对真空沉积腔进行降温，当真空沉积腔内部温度降至120℃时，真空沉积腔破真空，将镀膜完成的模具取出；
涂层喷砂处理：对涂层表面进行喷砂处理，喷砂处理采用300目玻璃砂，处理压力为0.5-0.8KG。
对涂层进行性能检测，检测结果如下：
实施例二：
一种模具用高结合力硬质涂层制备工艺，具体包括如下步骤：
碱性清洗：模具放入70℃、5％碱性清洗液中超声波清洗20分钟；
去离子水清洗：模具放入70℃、10MΩ去离子水中超声波漂洗20分钟；
烘干：模具放入70℃烘干槽中烘干10分钟；
真空脱气：模具放入真空烘烤炉中进行真空脱气处理，温度为350℃、恒温时间4H、真空度为5.0×10-3Pa；
喷漆处理：模具真空脱气处理后对模具进行喷砂处理，喷砂处理采用300目玻璃砂，处理压力为0.5-0.8KG；
升温：模具放进真空炉腔进行抽真空处理，温度设定350℃，恒温2H；
清洗：当真空度达到5.0×10-3Pa时，对模具进行PET清洗，清洗时间为60分钟；
复合过渡层沉积：施加-40～-150V的沉积负偏压脉冲，向真空腔内部通入氮气，并保持真空腔内部气压为2Pa-3Pa，之后交替开启AlTi靶和TiSi靶，电弧靶电流150A，进行AlTi+TiSi+AlTi+TiSi+AlTi+TiSi复合过渡层沉积，沉积时间为110-120分钟；
缓冲层沉积：施加-40～-60V的沉积负偏压脉冲，向真空腔内部通入氮气，并保持真空腔内部气压为0.5Pa-1.2Pa，开启Cr靶，进行缓冲层沉积CrN缓冲层沉积，沉积时间为5分钟；
功能层沉积：施加-40～-60V的沉积负偏压脉冲，向真空腔内部通入氮气，并保持真空腔内部气压为2Pa-3Pa，开启TiSi靶，电弧靶电流150A，进行TiSiN功能层沉积，沉积时间为20分钟；
降温：对真空沉积腔进行降温，当真空沉积腔内部温度降至120℃时，真空沉积腔破真空，将镀膜完成的模具取出；
涂层喷砂处理：对涂层表面进行喷砂处理，喷砂处理采用300目玻璃砂，处理压力为0.5-0.8KG。
对涂层进行性能检测，检测结果如下：
综上所述，本发明提出的模具用高结合力硬质涂层制备工艺制备得到涂层，有效的解决了传统TiSi类涂层在硬度低的基材上沉积时易发生脱落的问题，实现TiSi类涂层在模具表面强化的稳定应用，制备的涂层与基体结合力好，不易产生裂纹；使用后抗氧化性能好，抗剥离强度高，涂层不易脱落。
以上显示和描述了本发明的基本原理、主要特征和本发明的优点。本行业的技术人员应该了解，本发明不受上述实施例的限制，上述实施例和说明书中描述的只是本发明的原理，在不脱离本发明精神和范围的前提下本发明还会有各种变化和改进，这些变化和改进都落入要求保护的本发明的范围内。本发明要求的保护范围由所附的权利要求书及其等同物界定。
Claims (2)
1.一种模具用高结合力硬质涂层制备工艺，其特征在于，包括复合过渡层、缓冲层和功能层，所述复合过渡层沉积于基底表面，所述缓冲层设置于复合过渡层和功能层之间；
其中，所述复合过渡层由AlCr和TiSi交替沉积或者由AlTi和TiSi交替沉积而成，所述缓冲层由CrN沉积而成，所述功能层由TiSiN沉积而成；
制备工艺包括以下步骤：
模具前处理：将模具进行超声清洗、烘干和真空脱气步骤后，再对模具进行喷砂处理；
PVD真空镀膜：对真空腔内部进行抽真空处理，并升温至镀膜温度后依次在模具表面沉积括复合过渡层、缓冲层和功能层；
镀膜后处理：对真空沉积腔进行降温，当真空沉积腔内部温度降至120℃时，真空沉积腔破真空，将镀膜完成的模具取出，对涂层表面进行喷砂处理，喷砂处理采用300目玻璃砂，处理压力为0.5-0.8KG；
其中，所述PVD真空镀膜具体包括如下步骤：
升温：模具放进真空炉腔进行抽真空处理，温度设定350℃，恒温2H；
清洗：当真空度达到5.0×10-3Pa时，对模具进行PET清洗，清洗时间为60分钟；
复合过渡层沉积：进行AlCr+TiSi+AlCr+TiSi+AlCr+TiSi复合过渡层沉积或者进行AlTi+TiSi+AlTi+TiSi+AlTi+TiSi复合过渡层沉积，沉积时间为110-120分钟，电弧靶电流150A；
其中，复合过渡层沉积时，施加-40～-150V的沉积负偏压脉冲，向真空腔内部通入保护气体，并保持真空腔内部气压为2Pa-3Pa，之后交替开启AlCr靶和TiSi靶或者交替开启AlTi靶和TiSi靶，电弧靶电流150A，进行复合过渡层沉积；
缓冲层沉积：沉积时间为5分钟，施加-40～-60V的沉积负偏压脉冲，向真空腔内部通入氮气，并保持真空腔内部气压为0.4Pa-0.6Pa，开启Cr靶，进行CrN缓冲层沉积；
功能层沉积：沉积时间为20分钟，施加-40～-60V的沉积负偏压脉冲，向真空腔内部通入氮气，并保持真空腔内部气压为2Pa-3Pa，开启TiSi靶，电弧靶电流150A进行TiSiN功能层沉积。
2.根据权利要求1所述的一种模具用高结合力硬质涂层制备工艺，其特征在于，所述模具前处理具体包括如下步骤：
碱性清洗：模具放入70℃、5％碱性清洗液中超声波清洗20分钟；
去离子水清洗：模具放入70℃、10MΩ去离子水中超声波漂洗20分钟；
烘干：模具放入70℃烘干槽中烘干10分钟；
真空脱气：模具放入真空烘烤炉中进行真空脱气处理，温度为350℃、恒温时间4H、真空度为5.0×10-3Pa；
喷砂处理：模具真空脱气处理后对模具进行喷砂处理，喷砂处理采用300目玻璃砂，处理压力为0.5-0.8KG。
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