CN114185175B - Laser beam shaping device and method - Google Patents
Laser beam shaping device and method Download PDFInfo
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- CN114185175B CN114185175B CN202111391163.3A CN202111391163A CN114185175B CN 114185175 B CN114185175 B CN 114185175B CN 202111391163 A CN202111391163 A CN 202111391163A CN 114185175 B CN114185175 B CN 114185175B
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- 238000007493 shaping process Methods 0.000 title claims abstract description 57
- 238000000034 method Methods 0.000 title claims abstract description 22
- 238000011156 evaluation Methods 0.000 claims abstract description 21
- 238000005192 partition Methods 0.000 claims description 14
- 238000012512 characterization method Methods 0.000 claims description 3
- 238000005516 engineering process Methods 0.000 abstract description 3
- 230000000694 effects Effects 0.000 abstract description 2
- 238000005457 optimization Methods 0.000 abstract description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- 241001270131 Agaricus moelleri Species 0.000 description 1
- 238000009825 accumulation Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 230000010365 information processing Effects 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000009828 non-uniform distribution Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
Classifications
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
- G02B27/0916—Adapting the beam shape of a semiconductor light source such as a laser diode or an LED, e.g. for efficiently coupling into optical fibers
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
- G02B27/0938—Using specific optical elements
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
- G02B27/0938—Using specific optical elements
- G02B27/0944—Diffractive optical elements, e.g. gratings, holograms
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
- G02B27/0938—Using specific optical elements
- G02B27/095—Refractive optical elements
- G02B27/0955—Lenses
- G02B27/0961—Lens arrays
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
- G02B27/0938—Using specific optical elements
- G02B27/095—Refractive optical elements
- G02B27/0972—Prisms
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- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
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Abstract
The invention belongs to the technical field of light field regulation and control, and discloses a laser beam shaping device and a method, wherein the beam shaping device comprises: the device comprises a laser, a beam expander, a spatial light modulator, a first lens, a diaphragm, a second lens, a beam splitting prism, a third lens, a CCD, a fourth lens, a computer, a sample surface and a mixed hologram; the computer is respectively connected with the spatial light modulator and the CCD camera and used for controlling CCD acquisition, mixed hologram calculation and control work of the spatial light modulator; according to the method, the light field evaluation index factor is calculated through data processing according to the information acquired by the light field, and compared with the expected light field evaluation index factor, the grating diffraction hologram is obtained through calculation and optimization. Compared with the existing modulator shaping technology, the method improves the energy utilization rate and the beam shaping effect, and improves the operation rate to a certain extent.
Description
[ Field of technology ]
The invention relates to the technical field of light field regulation, in particular to a laser beam shaping device and method.
[ Background Art ]
The laser has the characteristics of high energy density, good directivity, high coherence, small heat affected zone and the like, and is widely applied to the fields of precision machining, information processing technology, biomedicine, optical detection and the like.
However, the energy of the laser beam is generally gaussian, and the application of the laser is greatly limited due to the distribution characteristic of the energy. For example, during high power solid state laser applications, a gaussian distributed central area beam can cause damage to the laser crystal and optics, while a flat-top beam disperses and homogenizes the intensity across the spot size, which can greatly increase the damage threshold of the optics; in the laser processing process, the distribution characteristic of the energy can cause heat accumulation of the material in a local range, so that the consistency of the processing effect is affected; in the field of holographic storage applications, this non-uniform distribution of energy directly affects the quality of the storage, and so shaping the laser light into a uniform beam is an urgent need.
[ Invention ]
The invention aims to provide a laser beam shaping device which comprises a laser, a beam expander, a spatial light modulator, a first lens, a diaphragm, a second lens, a beam splitting prism, a third lens, a CCD, a fourth lens, a computer, a sample surface and a mixed hologram, wherein the first lens is a lens;
The first lens, the diaphragm and the second lens form a filter assembly;
The spatial light modulator, the filter component, the beam splitting prism, the third lens and the CCD form a beam shaping system;
The laser generated by the laser directly enters the spatial light modulator through the beam expander, and the modulated emergent light beam enters the beam splitting prism after passing through the filter assembly; the laser is divided into two parts after passing through the beam splitting prism, and the first part is transmitted into the CCD camera through the third lens after being reflected;
the other part is focused on the sample surface through a fourth lens after being transmitted;
the computer is connected with the spatial light modulator and the CCD camera respectively and is used for controlling the CCD acquisition, the mixed hologram calculation and the control work of the spatial light modulator.
A method of laser beam shaping comprising the steps of:
s1, calculating a partition grating diffraction hologram;
S2, a laser beam shaping device is built, a spatial light modulator in an optical path system is used for loading a partition grating diffraction hologram, and target field information is generated after diffraction and lens focusing of the spatial light modulator in the beam shaping system;
S3, acquiring and processing data, wherein a CCD in the beam shaping system is used for acquiring target field information, generating image information, and calculating a light field evaluation index factor from the image information data through a corresponding formula;
Comparing and analyzing the light field evaluation index factor with the expected index factor, and finishing shaping if the light field evaluation index factor is better than the expected index factor; if the data does not reach the expectation, the collected and calculated data are used for optimizing the partition grating diffraction hologram, and the corrected partition grating diffraction hologram is obtained;
And S4, reloading calculation, reloading the corrected partition grating diffraction hologram into a laser beam shaping device, and repeating the step S2.
Preferably, the S1 calculation zoned grating diffraction hologram comprises 2 areas inside and outside the mask area;
the mixed information of the characterization mask pattern and the diffraction grating in the mask area is used for horizontally translating the light spot information in the mask area to a certain distance, and the area is within an S range;
The mask region includes 8 sub-regions; the device comprises an upper left area, a right upper area, an upper right area, a left area, a right area, a lower left area, a right lower area and a lower right area;
Preferably, in S3, the light field evaluation index factor includes the following expression for calculating the spot uniformity σ, the mean square error e, and the shaping efficiency μ:
wherein I S is the intensity of the output light in the shaping area S which is actually collected, I input is the intensity of the incident light, I' is the ideal output light intensity, The average output light intensity in the actually collected shaping region S is obtained, and N is the number of the collected pixels of the shaping region S.
The laser beam shaping device and the laser beam shaping method provided by the invention have the beneficial effects that: according to the method, the light field evaluation index factor is calculated through data processing according to the information acquired by the light field, the light field evaluation index factor is compared with the expected light field evaluation index factor, the grating diffraction hologram is obtained through calculation and optimization, and the light beam shaping is realized through loading on the modulator hardware.
[ Description of the drawings ]
In order to more clearly illustrate the technical solutions of the embodiments of the present invention, the drawings that are needed in the description of the embodiments will be briefly described below, it being obvious that the drawings in the following description are only some embodiments of the present invention, and that other drawings may be obtained according to these drawings without inventive effort for a person skilled in the art.
FIG. 1 is a diagram of a laser beam shaping apparatus of the present invention;
FIG. 2 is a schematic diagram of a laser beam shaping implementation of the present invention;
Fig. 3 is a flow chart of laser beam shaping according to the present invention.
[ Detailed description ] of the invention
In order that those skilled in the art will better understand the present invention, a technical solution in the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings in which it is apparent that the described embodiments are only some embodiments of the present invention, not all embodiments. All other embodiments, which can be made by those skilled in the art based on the embodiments of the present invention without making any inventive effort, shall fall within the scope of the present invention.
It should be noted that the terms "first," "second," and the like in the description and the claims of the present invention and the above figures are used for distinguishing between similar objects and not necessarily for describing a particular sequential or chronological order. It is to be understood that the data so used may be interchanged where appropriate, such that the embodiments of the invention described herein may be implemented in sequences other than those illustrated or otherwise described herein. Furthermore, the terms "comprises," "comprising," and "having," and any variations thereof, are intended to cover a non-exclusive inclusion, such that a process, method, system, article, or apparatus that comprises a list of steps or elements is not necessarily limited to those steps or elements expressly listed but may include other steps or elements not expressly listed or inherent to such process, method, article, or apparatus.
Embodiments of the present invention will be described in further detail below with reference to the attached drawings,
A laser beam shaping device comprises a laser, a beam expander, a spatial light modulator, a first lens, a diaphragm, a second lens, a beam splitting prism, a third lens, a CCD, a fourth lens, a computer, a sample surface and a mixed hologram;
the first lens, the diaphragm and the second lens form a filter assembly;
the spatial light modulator, the filter component, the beam splitting prism, the third lens and the CCD form a beam shaping system;
the laser generated by the laser directly enters the spatial light modulator through the beam expander, and the modulated emergent light beam enters the beam splitting prism after passing through the filter assembly; the laser is divided into two parts after passing through the beam splitting prism, and the first part is transmitted into the CCD camera through the third lens after being reflected;
the other part is focused on the sample surface through the fourth lens after being transmitted;
the computer is respectively connected with the spatial light modulator and the CCD camera and used for controlling CCD acquisition, mixed hologram calculation and control work of the spatial light modulator.
A method of laser beam shaping comprising the steps of:
s1, calculating a partition grating diffraction hologram;
the S1 calculation of the partitioned grating diffraction hologram comprises 2 areas inside and outside a mask area;
The mixed information of the characterization mask pattern and the diffraction grating in the mask area is used for horizontally translating the light spot information in the mask area to a certain distance, and the area is within an S range;
The mask region comprises 8 sub-regions outside; the device comprises an upper left area, a right upper area, an upper right area, a left area, a right area, a lower left area, a right lower area and a lower right area;
The upper left region represents the 2-dimensional diffraction grating phase information to be loaded in the corresponding region and is used for translating the laser light spot of the upper left region into the area region S in the horizontal direction and the vertical direction;
the directly-upper region represents the 1-dimensional diffraction grating phase information to be loaded in the corresponding region and is used for translating the laser light spot of the directly-upper region to the area region S in the vertical direction;
The upper right region represents the 2-dimensional diffraction grating phase information to be loaded in the corresponding region and is used for translating the laser light spot of the upper right region into the area region S in the horizontal direction and the vertical direction;
The left region represents the 1-dimensional diffraction grating phase information to be loaded in the corresponding region and is used for translating the laser light spot of the left region to the horizontal direction into the area region S;
The right region represents the 1-dimensional diffraction grating phase information to be loaded in the corresponding region and is used for translating the laser light spot of the right region to the horizontal direction into the area region S;
The lower left area represents the 2-dimensional diffraction grating phase information to be loaded in the corresponding area and is used for translating the laser light spot of the lower left area into the area S in the horizontal direction and the vertical direction;
The directly-under region represents the 1-dimensional diffraction grating phase information to be loaded in the corresponding region and is used for translating the laser light spots of the directly-under region to the two vertical directions into the area region S;
the lower right region represents 2-dimensional diffraction grating phase information to be loaded in a corresponding region and is used for translating a laser spot of the lower right region into the area region S in horizontal and vertical directions;
s2, building the laser beam shaping device, using a spatial light modulator in the light path system for loading a partition grating diffraction hologram, and generating target field information after diffraction by the spatial light modulator and focusing by a lens in the beam shaping system;
S3, acquiring and processing data, using a CCD in the beam shaping system to acquire the target field information, generating image information, and calculating a light field evaluation index factor from the image information data through a corresponding formula;
Specifically, the detector is placed in the area region S to perform actual light field acquisition, and a corresponding light field evaluation index factor is calculated through information feedback and data processing;
Comparing and analyzing the light field evaluation index factor with the expected index factor, and finishing shaping if the light field evaluation index factor is better than the expected index factor; if the data does not reach the expectation, the collected and calculated data are used for optimizing the partition grating diffraction hologram, and the corrected partition grating diffraction hologram is obtained;
in the step S3, the light field evaluation index factor includes the following expression for calculating the light spot uniformity σ, the mean square error e and the shaping efficiency μ:
wherein I S is the intensity of the output light in the shaping area S which is actually collected, I input is the intensity of the incident light, I' is the ideal output light intensity, The average output light intensity in the shaping area S which is actually collected is given, and N is the number of the pixels of the shaping area S which is collected;
and S4, reloading calculation, reloading the corrected partition grating diffraction hologram into the laser beam shaping device, and repeating the step S2.
The foregoing embodiment numbers of the present invention are merely for the purpose of description, and do not represent the advantages or disadvantages of the embodiments.
In the foregoing embodiments of the present invention, the descriptions of the embodiments are emphasized, and for a portion of this disclosure that is not described in detail in this embodiment, reference is made to the related descriptions of other embodiments.
In summary, the invention calculates the light field evaluation index factor through data processing according to the information collected by the light field, compares the light field evaluation index factor with the expected light field evaluation index factor, calculates and optimizes to obtain the grating diffraction hologram, and realizes beam shaping by loading on the modulator hardware.
The foregoing is merely a preferred embodiment of the present invention and is not intended to limit the present invention in any way. Any person skilled in the art will make any equivalent substitution or modification to the technical solution and technical content disclosed in the invention without departing from the scope of the technical solution of the invention, and the technical solution of the invention is not departing from the scope of the invention.
Claims (3)
1. A laser beam shaping method is characterized in that: the shaping method is implemented by a laser beam shaping device, wherein the laser beam shaping device comprises a laser, a beam expander, a spatial light modulator, a first lens, a diaphragm, a second lens, a beam splitting prism, a third lens, a CCD, a fourth lens, a computer, a sample surface and a hybrid hologram;
the first lens, the diaphragm and the second lens form a filter assembly;
the spatial light modulator, the filter component, the beam splitting prism, the third lens and the CCD form a beam shaping system;
The laser generated by the laser directly enters the spatial light modulator through the beam expander, and the modulated emergent light beam enters the beam splitting prism after passing through the filter assembly; the laser is divided into two parts after passing through the beam splitting prism, and the first part is transmitted into the CCD camera through the third lens after being reflected;
the other part is focused on the sample surface through the fourth lens after being transmitted;
The computer is respectively connected with the spatial light modulator and the CCD camera and used for controlling CCD acquisition, mixed hologram calculation and control work of the spatial light modulator;
the laser beam shaping method comprises the following steps:
s1, calculating a partition grating diffraction hologram;
s2, constructing a laser beam shaping system, using a spatial light modulator in the beam shaping system to load a partitioned grating diffraction hologram, and generating target field information after diffraction by the spatial light modulator and focusing by a lens in the beam shaping system;
S3, acquiring and processing data, using a CCD in the beam shaping system to acquire the target field information, generating image information, and calculating a light field evaluation index factor from the image information data through a corresponding formula;
Comparing and analyzing the light field evaluation index factor with the expected index factor, and finishing shaping if the light field evaluation index factor is better than the expected index factor; if the data does not reach the expectation, the collected and calculated data are used for optimizing the partition grating diffraction hologram, and the corrected partition grating diffraction hologram is obtained;
And S4, reloading calculation, reloading the corrected partition grating diffraction hologram into the laser beam shaping system, and repeating the step S2.
2. The laser beam shaping method according to claim 1, wherein the S1 calculated area grating diffraction hologram comprises 2 areas inside and outside a mask area;
The mixed information of the characterization mask pattern and the diffraction grating in the mask area is used for horizontally translating the light spot information in the mask area to a certain distance, and the area is within an S range;
The mask region comprises 8 sub-regions outside; the left upper region, the right upper region, the left region, the right region, the left lower region, the right lower region, and the right lower region, respectively.
3. The laser beam shaping method according to claim 1, wherein in S3, the light field evaluation index factor includes spot uniformityMean square error/>Shaping efficiency/>The calculated expression of (2) is characterized as follows:
In the method, in the process of the invention, For the output light intensity in the actually collected shaping region S,/>For the intensity of incident light,/>For the ideal output light intensity,/>The average output light intensity in the actually collected shaping region S is obtained, and N is the number of the collected pixels of the shaping region S.
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|---|---|---|---|---|
| JP2001125040A (en) * | 1999-10-27 | 2001-05-11 | Minolta Co Ltd | Laser irradiation optical system |
| JP2001255490A (en) * | 2000-03-10 | 2001-09-21 | Mitsubishi Electric Corp | Laser beam machining device, laser beam machining method and method for manufacturing optical waveguide by the machining method |
| CN102109676A (en) * | 2011-02-25 | 2011-06-29 | 中国科学院上海光学精密机械研究所 | Designing method for multi-partition optical phase plate in photo-etching illumination |
| CN106646895A (en) * | 2017-01-13 | 2017-05-10 | 湖北工业大学 | Laser beam shaping device and laser beam shaping method based on spatial light modulator |
| CN111736356A (en) * | 2020-07-17 | 2020-10-02 | 西安交通大学 | Variable multi-beam MOPA laser output system and method based on light field regulation |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| GB201516870D0 (en) * | 2015-09-23 | 2015-11-04 | Roadmap Systems Ltd | Optical systems |
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Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001125040A (en) * | 1999-10-27 | 2001-05-11 | Minolta Co Ltd | Laser irradiation optical system |
| JP2001255490A (en) * | 2000-03-10 | 2001-09-21 | Mitsubishi Electric Corp | Laser beam machining device, laser beam machining method and method for manufacturing optical waveguide by the machining method |
| CN102109676A (en) * | 2011-02-25 | 2011-06-29 | 中国科学院上海光学精密机械研究所 | Designing method for multi-partition optical phase plate in photo-etching illumination |
| CN106646895A (en) * | 2017-01-13 | 2017-05-10 | 湖北工业大学 | Laser beam shaping device and laser beam shaping method based on spatial light modulator |
| CN111736356A (en) * | 2020-07-17 | 2020-10-02 | 西安交通大学 | Variable multi-beam MOPA laser output system and method based on light field regulation |
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