CN114019765A - Common-path phase modulation laser direct writing method and device based on edge light suppression - Google Patents

Common-path phase modulation laser direct writing method and device based on edge light suppression Download PDF

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CN114019765A
CN114019765A CN202111240501.3A CN202111240501A CN114019765A CN 114019765 A CN114019765 A CN 114019765A CN 202111240501 A CN202111240501 A CN 202111240501A CN 114019765 A CN114019765 A CN 114019765A
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light
slm
laser
phase modulation
suppression
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CN114019765B (en
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匡翠方
刘秋兰
杨臻垚
张智敏
朱大钊
徐良
刘旭
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Zhejiang University ZJU
Zhejiang Lab
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Zhejiang University ZJU
Zhejiang Lab
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
    • G03F7/2053—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning

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  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

The invention discloses a double-beam common-path phase modulation laser direct writing method and device based on edge light inhibition. The two beams of collimated light are combined in a mutually perpendicular linear polarization state, and the two combined beams of light are subjected to phase modulation through the same Spatial Light Modulator (SLM). Dividing the SLM into two parts, modulating the phase of the exciting light corresponding to polarization by a first part of the SLM for aberration correction, and finally focusing by an objective lens to form a circular solid light spot; and the suppression light vertical to the polarization of the excitation light is modulated by the second part of the SLM to form a phase, and finally, the suppression light is focused by the objective lens to form an annular hollow light spot. The circular solid light spot of the exciting light is superposed with the center of the inhibiting light annular hollow light spot. The invention realizes common-path phase modulation by distinguishing and multiplexing the SLM and simultaneously carrying out light field regulation and control on the double beams of the laser direct writing technology based on edge light inhibition.

Description

Common-path phase modulation laser direct writing method and device based on edge light suppression
Technical Field
The invention relates to the field of ultra-precise optical writing, in particular to a common-path phase modulation laser direct writing method and device based on edge light suppression.
Background
The laser direct writing technology is a micro-nano processing method for directly generating a pattern to be written by scanning a substrate with a photosensitive coating through laser, does not need a mask plate, and has the characteristics of low cost and strong flexibility. With the continuous development of nanotechnology, the size of device structures required to be processed in various fields becomes smaller and smaller. However, any optical system is limited by optical diffraction, and in the laser direct writing system, the resolution is always limited to R = k λ/NA (where k is a constant related to the writing process, λ is the laser wavelength, and NA is the numerical aperture of the writing objective lens), so that it is urgently required to improve the resolution of the laser direct writing technology.
With the appearance of femtosecond pulse laser, a two-photon absorption nonlinear effect of light and materials is introduced in the direct writing process, the processing of a three-dimensional complex micro-nano structure is realized, the transverse direct writing resolution is improved to sub-hundred nanometer scale, and the axial resolution is greatly improved. In addition, inspired by stimulated radiation loss microscopy (STED) in super-resolution microscopy, the laser direct writing technology utilizes double beams to act on the photoresist simultaneously, wherein one beam of converged Gaussian light acts on the photoresist to cause polymerization reaction, and the other beam of hollow light converges at the edge of the solid light spot to cause the solid light spot to generate an edge light inhibition effect (PPI), so that the polymerization reaction of the edge region of the solid light spot is inhibited, only the region of the central region of the hollow light spot, the light intensity of which is close to zero, is polymerized, and the direct writing resolution is improved to sub-50 nm.
In the existing double-beam laser direct writing technology based on marginal light suppression, the phase of a suppressed beam is modulated by a vortex phase plate to be changed into a hollow light spot, the modulation phase cannot be flexibly regulated and controlled when the light spot is modulated, and the aberration problem caused by a system cannot be compensated in the process of light path adjustment. In order to solve the problem, the SLM is introduced to regulate and control the light field of the inhibiting light, the method can freely set the loaded phase of the light field, flexibly modulate the shape of the light spot, and simultaneously compensate the aberration introduced into the light path. However, this method can only modulate the phase of the suppressed beam, and cannot guarantee the spot deformation caused by aberration in the excitation optical path.
Based on the background, the SLM is subjected to division multiplexing, the double beams in the edge light suppression-based laser direct writing technology are subjected to light field regulation and control at the same time, common-path phase modulation is achieved, aberration introduced in the double beam light paths can be corrected at the same time, the stability of the system light paths is improved on the basis that the double beams are guaranteed to obtain required modulation light spots, the SLM pixel utilization rate is high, the use of devices is reduced, and the system structure is more compact.
Disclosure of Invention
The invention aims to provide a double-beam common-path phase modulation laser direct writing device based on edge light suppression, aiming at the defects of the prior art.
The specific technical scheme of the invention is as follows:
a double-beam common-path phase modulation laser direct writing device based on edge light inhibition comprises an excitation light path for initiating photo-polymerization reaction of photoresist, an inhibition light path for inhibiting photo-polymerization reaction of photoresist, and a beam combination light path of excitation light and inhibition light,
the exciting light path sequentially passes through a first laser, a first beam reducer, a first acousto-optic modulator, a first beam expander, a first reflector and a first half-wave plate;
the inhibition light path sequentially passes through a second laser, a second beam reducer, a second acousto-optic modulator, a second beam expander and a second half-wave plate;
the beam combination light path sequentially passes through a polarization beam combiner, a third half-wave plate, a second reflector, a first SLM part, a first quarter-wave plate, a third reflector, a first quarter-wave plate, a second SLM part, a fourth reflector, a first lens, a fifth reflector, a field lens, a first quarter-wave plate, an objective lens, a precise displacement platform and a photoresist sample;
further comprising: and the computer is respectively connected with the first acousto-optic modulator, the second acousto-optic modulator, the SLM and the precise displacement platform.
Preferably, the first laser may be a continuous laser for initiating a single photon absorption polymerization reaction of the photoresist, or a picosecond or femtosecond pulse laser for initiating a two-photon absorption polymerization reaction of the photoresist.
Preferably, the second laser is a continuous light laser.
Preferably, the first laser and the second laser have the same wavelength.
Preferably, the third reflector is disposed at a front focal plane of the first lens.
Preferably, the first lens is confocal with the field lens.
Preferably, the following components: the field lens is confocal with the objective lens.
A double-beam common-path phase modulation laser direct writing method based on edge light inhibition,
the method comprises the following steps:
(1) after laser emitted by a first laser passes through a first beam reducer as excitation light, the diameter of a light spot is reduced to a diameter capable of passing through a first acousto-optic modulator arranged behind the first acousto-optic modulator, the laser passes through the first acousto-optic modulator to modulate the on-off and the intensity of the first acousto-optic modulator, then the light beam is collimated and expanded through a first beam expander, the size of the expanded light spot is ensured to be close to half of the size of a working surface of a subsequently installed SLM when the expanded light spot enters the SLM, the light path is turned through a first reflector, and then the linear polarization direction of the expanded light spot is adjusted through a first half wave plate;
(2) after laser emitted by a second laser passes through a second beam reducer as inhibiting light, the diameter of a light spot is reduced to a diameter capable of passing through a second acoustic optical modulator arranged behind the second laser, the diameter of the light spot is modulated by the second acoustic optical modulator, the switch and the intensity of the light beam are modulated, the light beam is collimated and expanded by a second beam expander, the size of the expanded light spot is ensured to be close to half of the size of a working surface of a subsequently arranged SLM, and then the linear polarization direction of the expanded light spot is adjusted by a second half-wave plate;
(3) the exciting light and the inhibiting light are combined through a polarization beam combiner, and the linear polarization directions of the exciting light and the inhibiting light are simultaneously adjusted through a third half-wave plate, so that the polarization direction of the exciting light is consistent with the working polarization direction corresponding to the SLM;
(4) the combined beam enters a first part of the SLM which is divided into two parts after being reflected by the second reflector, and a gray image which is used for correcting aberration generated by an exciting light path is loaded on the first part of the SLM so that the exciting light beam generates corresponding phase modulation; the suppression light simultaneously incident to the first part of the SLM with the exciting light is vertical to the polarization of the suppression light, so that no phase modulation is generated when the suppression light beam passes through the first part of the SLM; the modulated exciting light and the unmodulated inhibiting light simultaneously pass through the first quarter-wave plate, then are reflected by the third reflector and then pass through the first quarter-wave plate again, so that the linear polarization directions of the exciting light and the inhibiting light are respectively changed by 90 degrees, and then are incident to the second part of the SLM; loading a gray image corresponding to the hollow light spot on a second part of the SLM, wherein only the inhibiting light with the same working polarization direction of the SLM is subjected to light field regulation by the SLM so that the inhibiting light carries a corresponding phase; the excitation light which is incident to the second part of the SLM together with the inhibition light does not generate phase modulation because the polarization direction of the excitation light is vertical to the working polarization direction of the SLM;
(5) the excitation light and the suppression light beams modulated by the SLM phase are reflected by a fourth reflector, then converged by a first lens, reflected by a fifth reflector and incident on a field lens, collimated excitation light and suppression light emitted by the field lens pass through a second quarter-wave plate, the second quarter-wave plate is adjusted to enable the excitation light and the suppression light to be respectively changed into left-handed circularly polarized light and right-handed circularly polarized light, and then the excitation light and the suppression light are converged by an objective lens to enable the excitation light to be focused on a sample surface to form a circular solid light spot; and focusing the inhibition light on the sample surface to form an annular hollow light spot.
Preferably, the third reflector is imaged to the entrance pupil surface of the objective lens through the first lens and the field lens.
Preferably, the computer is connected with the first acousto-optic modulator, the second acousto-optic modulator, the SLM and the precise displacement platform and outputs control signals to adjust the first acousto-optic modulator and the second acousto-optic modulator, so that the light intensity and the switch of exciting light and inhibiting light are adjusted, and the writing process of the micro-nano structure is controlled; the computer respectively outputs gray image signals to two partitions of the SLM, and the light field phases of exciting light and inhibiting light are adjusted; the computer outputs a control signal to the precision displacement platform to control the two-dimensional or three-dimensional movement of the precision displacement platform of the sample. Compared with the prior art, the invention has the following beneficial technical effects:
(1) by carrying out division multiplexing on the SLM and carrying out light field regulation and control on the double beams of the laser direct writing technology based on edge light inhibition, aberration introduced in an excitation light path can be corrected while inhibiting light from becoming hollow light spots, and a better direct writing effect of laser direct writing is ensured;
(2) by distinguishing and multiplexing the SLM, the common-path phase modulation of the exciting light and the inhibiting light is realized, the system has higher stability, the utilization rate of SLM pixels is increased, the use of devices is reduced, and the system structure is more compact.
Drawings
FIG. 1 is a schematic diagram of a dual-beam common-path phase modulation laser direct writing device based on edge light suppression according to the present invention;
FIG. 2 is a schematic diagram of polarization of excitation light and suppression light in an SLM module according to the present invention;
FIG. 3 (a) is a schematic diagram of a gray scale image of a first part of an SLM modulating excitation light to form a circular solid light spot according to the present invention;
FIG. 3 (b) is a schematic diagram of a gray scale image of the invention loaded on a second portion of the SLM modulating suppressed light to form annular hollow spots;
FIG. 4 (a) is a diagram of a circular solid spot formed on a sample surface by excitation light according to the present invention;
fig. 4 (b) is a diagram of the present invention for suppressing the formation of annular hollow spots on the sample surface by light.
Detailed Description
The present invention will be described in detail with reference to the following examples and drawings, but the present invention is not limited thereto.
As shown in fig. 1, the dual-beam common-path phase modulation laser direct writing device based on edge light suppression of the present invention includes:
the excitation light path is used for initiating the photoresist to generate photopolymerization; a light-inhibiting path for inhibiting photo-polymerization of the photoresist; a beam combining path of the exciting light and the inhibiting light;
the excitation light path sequentially passes through a first laser 1, a first beam reducer 2, a first acousto-optic modulator 3, a first beam expander 4, a first reflector 5 and a first half-wave plate 6;
the inhibition light path sequentially passes through a second laser 7, a second beam reducer 8, a second acousto-optic modulator 9, a second beam expander 10 and a second half-wave plate 11;
the beam combination light path sequentially passes through a polarization beam combiner 12, a third half-wave plate 13, a second reflecting mirror 14, a first part of an SLM15, a first quarter-wave plate 16, a third reflecting mirror 17, a first quarter-wave plate 16, a second part of an SLM15, a fourth reflecting mirror 18, a first lens 19, a fifth reflecting mirror 20, a field lens 21, a first quarter-wave plate 22, an objective lens 23, a precise displacement platform 24 and a photoresist sample 25;
further comprising: and a computer 26, wherein the computer 26 is respectively connected with the first acousto-optic modulator 3, the second acousto-optic modulator 9, the SLM15 and the precision displacement platform 24.
The working process of the dual-beam common-path phase modulation laser direct writing device based on edge light suppression in the embodiment is as follows:
(1) after laser emitted by a first laser 1 passes through a first beam reducer 2 as excitation light, the diameter of a light spot is reduced to a first acousto-optic modulator 3 which can be placed behind the laser, the laser passes through the first acousto-optic modulator 3 to modulate the on-off and the intensity of the laser, then the light beam is collimated and expanded through a first beam expander 4, the expanded light spot size is close to half of the size of a working surface of a subsequently installed SLM15 when entering the SLM15, the light path is turned through a first reflector 5, and then the linear polarization direction of the laser is adjusted through a first half-wave plate 6;
(2) after laser emitted by the second laser 7 passes through the second beam reducer 8 as inhibiting light, the diameter of a light spot is reduced to a diameter that can pass through a second sound light modulator 9 arranged behind the second laser, the laser passes through the second sound light modulator 9 to modulate the switch and the intensity of the laser, then the light beam is collimated and expanded through the second beam expander 10, the size of the expanded light spot is ensured to be close to half of the size of a working surface of a subsequently installed SLM15 when the laser enters the subsequently installed SLM15, and then the linear polarization direction of the laser is adjusted through the second half-wave plate 11;
(3) the exciting light and the inhibiting light are combined by a polarization beam combiner 12, and the linear polarization directions of the exciting light and the inhibiting light are simultaneously adjusted by a third half-wave plate 13, so that the polarization direction of the exciting light is consistent with the working polarization direction corresponding to the SLM 15;
(4) the combined beam is reflected by the second mirror 14 and enters the first part of the SLM15 divided into two parts (as shown in fig. 2), and a gray scale image corresponding to the aberration generated by correcting the optical path of the excitation light is loaded on the first part of the SLM15, as shown in fig. 3 (a), so that the excitation light beam generates corresponding phase modulation; the suppressed light, which is incident on the first portion of the SLM15 simultaneously with the excitation light, is not phase modulated when the suppressed light beam passes through the first portion of the SLM15 because of its perpendicular polarization (as shown in FIG. 2); the modulated excitation light and the unmodulated suppression light simultaneously pass through the first quarter-wave plate 16, are reflected by the third reflector 17, pass through the first quarter-wave plate 16 again, change the linear polarization directions of the excitation light and the suppression light by 90 degrees respectively, and enter the second part of the SLM 15; loading a gray image corresponding to the generated hollow light spot on the second part of the SLM15, as shown in fig. 3 (b), only the inhibiting light with the working polarization direction of the SLM15 is subjected to light field regulation by the SLM15, so that the inhibiting light carries a corresponding phase; the excitation light, which is incident on the second portion of the SLM15 along with the suppressed light, does not produce phase modulation because its polarization direction is perpendicular to the operating polarization direction of the SLM15 (as shown in FIG. 2);
(5) exciting light and inhibiting light beams which are subjected to phase modulation by the SLM15 are reflected by the fourth reflector 18, then are converged by the first lens 19, and are reflected by the fifth reflector 20 to be incident on the field lens 21, collimated exciting light and inhibiting light emitted by the field lens 21 pass through the second quarter-wave plate 22, the second quarter-wave plate 22 is adjusted to enable the exciting light and the inhibiting light to be respectively changed into left-handed circularly polarized light and right-handed circularly polarized light, and then are converged by the objective lens 23, so that the exciting light is focused on the surface of the photoresist sample 25 to form a circular solid light spot, as shown in fig. 4 (a); focusing the suppressed light onto the surface of the photoresist sample 25 to form an annular hollow light spot, as shown in fig. 4 (b);
(6) the computer 26 outputs control signals to adjust the first acousto-optic modulator 3 and the second acousto-optic modulator 9, so that the light intensity and the switch of exciting light and inhibiting light are adjusted, and the writing process of the micro-nano structure is controlled; meanwhile, the computer 26 outputs gray image signals to two partitions of the SLM15, respectively, and adjusts the light field phases of the excitation light and the suppression light; in addition, the computer outputs a control signal to the precise displacement platform 24 to control the two-dimensional or three-dimensional movement of the platform of the sample, thereby realizing the processing of the micro-nano structure.
The above description is only exemplary of the preferred embodiments of the present invention, and is not intended to limit the present invention, and any modifications, equivalents, improvements, etc. made within the spirit and principle of the present invention should be included in the protection scope of the present invention.

Claims (10)

1. The utility model provides a two beam common path phase modulation laser direct write devices based on marginal light restraines, is including the excitation light path that is used for initiating the photoresist to produce photopolymerization, is used for restraining the photoresist light to produce photopolymerization's suppression light path, excitation light and the beam combining light path of suppression light, its characterized in that:
the excitation light path sequentially passes through a first laser (1), a first beam reducer (2), a first acousto-optic modulator (3), a first beam expander (4), a first reflector (5) and a first half-wave plate (6);
the inhibition light path sequentially passes through a second laser (7), a second beam reducer (8), a second acousto-optic modulator (9), a second beam expander (10) and a second half-wave plate (11);
the beam combination light path sequentially passes through a polarization beam combiner (12), a third half-wave plate (13), a second reflecting mirror (14), a first part of an SLM (15), a first quarter-wave plate (16), a third reflecting mirror (17), a first quarter-wave plate (16), a second part of the SLM (15), a fourth reflecting mirror (18), a first lens (19), a fifth reflecting mirror (20), a field lens (21), a first quarter-wave plate (22), an objective lens (23), a precise displacement platform (24) and a photoresist sample (25);
further comprising: and the computer (26), and the computer (26) is respectively connected with the first acousto-optic modulator (3), the second acousto-optic modulator (9), the SLM (15) and the precision displacement platform (24).
2. The dual-beam common-path phase modulation laser direct writing device based on edge light suppression as claimed in claim 1, wherein: the first laser (1) can be a continuous light laser for initiating single photon absorption polymerization reaction of the photoresist, and can also be a picosecond or femtosecond pulse laser for initiating two-photon absorption polymerization reaction of the photoresist.
3. The dual-beam common-path phase modulation laser direct writing device based on edge light suppression as claimed in claim 1, wherein: the second laser (7) is a continuous light laser or a pulsed laser.
4. The dual-beam common-path phase modulation laser direct writing device based on edge light suppression as claimed in claim 1, wherein: the first laser (1) and the second laser (7) have the same wavelength.
5. The dual-beam common-path phase modulation laser direct writing device based on edge light suppression as claimed in claim 1, wherein: the third reflector (17) is placed at the front focal plane of the first lens (19).
6. The dual-beam common-path phase modulation laser direct writing device based on edge light suppression as claimed in claim 1, wherein: the first lens (19) is confocal with a field lens (21).
7. The dual-beam common-path phase modulation laser direct writing device based on edge light suppression as claimed in claim 1, wherein: the field lens (21) is confocal with the objective lens (23).
8. A double-beam common-path phase modulation laser direct writing method based on edge light suppression is characterized by comprising the following steps:
the method comprises the following steps:
(1) after laser emitted by a first laser (1) passes through a first beam reducer (2) as excitation light, the diameter of a light spot is reduced to a first acousto-optic modulator (3) which can be placed behind the laser, the light spot is modulated in switching and intensity by the first acousto-optic modulator (3), then the light beam is collimated and expanded by a first beam expander (4), the expanded light spot size is close to half of the size of a working surface of a SLM (15) which is installed subsequently, a light path is turned by a first reflector (5), and then the linear polarization direction of the SLM is adjusted by a first half-wave plate (6);
(2) after laser emitted by a second laser (7) passes through a second beam reducer (8) as suppression light, the diameter of a light spot is reduced to a diameter capable of passing through a second acoustic optical modulator (9) arranged behind, the light spot passes through the second acoustic optical modulator (9) to modulate the on-off and the intensity of the laser, then the light beam is collimated and expanded through a second beam expander (10), the size of the expanded light spot is ensured to be close to half of the size of a working surface of a subsequently arranged SLM (15), and then the linear polarization direction of the laser is adjusted through a second half-wave plate (11);
(3) the exciting light and the inhibiting light are combined through a polarization beam combiner (12), and the linear polarization directions of the exciting light and the inhibiting light are adjusted through a third half-wave plate (13) at the same time, so that the polarization direction of the exciting light is consistent with the working polarization direction corresponding to the SLM;
(4) the combined beam enters a first part of an SLM (15) divided into two parts after being reflected by a second reflecting mirror (14), and a gray image corresponding to aberration generated by an exciting light path is loaded on the first part of the SLM (15) so as to generate corresponding phase modulation on the exciting light beam; suppression light simultaneously incident on a first part of the SLM (15) with excitation light is polarized perpendicular thereto so that no phase modulation is generated when the suppression light beam passes through said first part of the SLM; the modulated exciting light and the unmodulated inhibiting light simultaneously pass through a first quarter-wave plate (16), then are reflected by a third reflecting mirror (17) and pass through the first quarter-wave plate (16) again, so that the linear polarization directions of the exciting light and the inhibiting light are respectively changed by 90 degrees, and then are incident to a second part of the SLM (15); loading a gray image corresponding to the hollow light spot on a second part of the SLM (15), wherein only the inhibiting light with the same working polarization direction of the SLM is subjected to light field regulation by the SLM (15) at the moment, so that the inhibiting light carries a corresponding phase; the excitation light incident on the second part of the SLM (15) together with the suppression light does not generate phase modulation because the polarization direction of the excitation light is vertical to the working polarization direction of the SLM;
(5) exciting light and inhibiting light beams which are subjected to phase modulation by the SLM (15) are reflected by a fourth reflector (18), then are converged by a first lens (19), are reflected by a fifth reflector (20) and are incident on a field lens (21), collimated exciting light and inhibiting light emitted by the field lens (21) pass through a second quarter-wave plate (22), the second quarter-wave plate (22) is adjusted to enable the exciting light and the inhibiting light to be respectively changed into left-handed circularly polarized light and right-handed circularly polarized light, and are converged by an objective lens (23) to enable the exciting light to be focused on a sample surface to form a circular solid light spot; and focusing the inhibition light on the surface of the sample (25) to form an annular hollow light spot.
9. The method of claim 8 for direct writing with dual-beam common-path phase modulation laser based on edge light suppression, wherein: the third reflector (17) is imaged to the entrance pupil surface of the objective lens (23) through the first lens (19) and the field lens (21).
10. The method of claim 8 for direct writing with dual-beam common-path phase modulation laser based on edge light suppression, wherein: the computer (26) is connected with the first acousto-optic modulator (3), the second acousto-optic modulator (9), the SLM (15) and the precise displacement platform (24) and outputs control signals to adjust the first acousto-optic modulator (3) and the second acousto-optic modulator (9) so as to adjust the light intensity and the switch of the exciting light and the inhibiting light and further control the writing process of the micro-nano structure; the computer (26) respectively outputs gray image signals to two partitions of the SLM (15) and adjusts the light field phases of the exciting light and the inhibiting light; the computer (26) outputs a control signal to the precision displacement stage (24) to control the two-dimensional or three-dimensional movement of the precision displacement stage (24) of the sample.
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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN117289563A (en) * 2023-11-27 2023-12-26 浙江大学杭州国际科创中心 Amplitude type calculation hologram realization device and method

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