CN113970243A - Thin-wall heat-insulating layer structure of beam source furnace - Google Patents
Thin-wall heat-insulating layer structure of beam source furnace Download PDFInfo
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- CN113970243A CN113970243A CN202111194806.5A CN202111194806A CN113970243A CN 113970243 A CN113970243 A CN 113970243A CN 202111194806 A CN202111194806 A CN 202111194806A CN 113970243 A CN113970243 A CN 113970243A
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
- F27B14/00—Crucible or pot furnaces
- F27B14/08—Details peculiar to crucible or pot furnaces
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B23/00—Single-crystal growth by condensing evaporated or sublimed materials
- C30B23/02—Epitaxial-layer growth
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- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
- C30B25/02—Epitaxial-layer growth
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
- F27B14/00—Crucible or pot furnaces
- F27B14/08—Details peculiar to crucible or pot furnaces
- F27B2014/0843—Lining or casing
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- Crystallography & Structural Chemistry (AREA)
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- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Mechanical Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Physical Vapour Deposition (AREA)
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- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
Abstract
The invention belongs to the field of molecular beam source furnaces, and particularly relates to a thin-wall heat-insulating layer structure of a beam source furnace. The side heat-insulating layer, the upper heat-insulating layer and the lower heat-insulating layer are used for insulating the enclosed inner space to form a suspended heat-insulating structure for the crucible; the weight of the heat-insulating layers, the crucible, the beam source furnace heater and the like is supported by the outermost tantalum cylinder, so that the heat conduction distance is maximized; through the arrangement of the bulge on the tantalum cylinder of the side heat-insulating layer, the contact area between the adjacent tantalum cylinders can be reduced, and the heat conduction is reduced. The invention can be suitable for being used in an ultrahigh vacuum environment, adopts the side heat-insulating layer of the tantalum cylinder with the bulge and the integral suspension type heat-insulating layer structure, can effectively reduce heat conduction, improves the heat radiation shielding effect, and realizes the heat-insulating function of the beam source furnace with high efficiency, uniformity, stability and energy conservation.
Description
Technical Field
The invention belongs to the field of molecular beam source furnaces, and particularly relates to a thin-wall heat-insulating layer structure of a beam source furnace.
Background
The molecular beam epitaxy technology is a new means for growing semiconductor films under the condition of ultrahigh vacuum, and the emergence of the molecular beam epitaxy technology creates a new era for the development of materials science, semiconductor materials and devices. The molecular beam source furnace is a key component of a molecular beam epitaxy technology, the molecular beam source furnace is required to have extremely high thermal stability when in use, in the prior art, a protective layer of a tantalum thin plate winding structure is generally adopted at present, the interlayer gaps are uneven and are not fixed easily, and the heat insulation effect is uneven.
Disclosure of Invention
In view of the above problems, the present invention aims to provide a thin-wall insulating layer structure of a beam source furnace.
The purpose of the invention is realized by the following technical scheme:
a thin-wall heat-insulating layer structure of a beam source furnace comprises a side heat-insulating layer, an upper heat-insulating layer, a lower heat-insulating layer and a plurality of supporting frames for supporting a crucible and a beam source furnace heater, wherein the crucible and the beam source furnace heater are arranged in an internal space defined by the side heat-insulating layer, the upper heat-insulating layer and the lower heat-insulating layer, and the side heat-insulating layer, the upper heat-insulating layer and the lower heat-insulating layer are used for insulating the defined internal space;
the side heat-insulating layer comprises a plurality of layers of tantalum cylinders which are sequentially sleeved from outside to inside, wherein the lower end opening of one of the tantalum cylinders is fixedly connected with the beam source furnace bracket; a tantalum ring is welded on the upper part of the inner wall of the outermost tantalum cylinder, and the upper ends of the tantalum cylinders except the outermost tantalum cylinder are welded with the tantalum ring; the lower heat-insulating layer and the support frames are respectively arranged on the tantalum cylinder at the innermost layer;
the lower heat-insulating layer is arranged below the whole body formed by the crucible, the beam source furnace heater and the support frame, the lower heat-insulating layer is arranged above the beam source furnace bracket, and gaps are respectively arranged among the lower heat-insulating layer, the beam source furnace bracket and the crucible;
the upper heat-insulating layer is arranged on the outermost upper end opening of the tantalum cylinder, and the tantalum ring supports the bottom of the upper heat-insulating layer.
The lower end opening of the outermost tantalum cylinder is fixedly connected with the beam source furnace bracket, and gaps are reserved between the lower ends of the tantalum cylinders except the outermost tantalum cylinder and the beam source furnace bracket.
Convex and/or concave bulges are punched on the surface of each tantalum cylinder except for the tantalum cylinder on the outermost layer and the tantalum cylinder on the innermost layer, and the bulge of each tantalum cylinder abuts against the surface of the adjacent tantalum cylinder.
The bulges are uniformly arranged on the surface of the tantalum cylinder.
The tantalum tube on the innermost layer is punched with a plurality of convex edges along the length direction, each convex edge is respectively provided with a plurality of insertion grooves for inserting the lower heat-insulating layer and each support frame, and the lower heat-insulating layer and each support frame are respectively inserted into the tantalum tube on the innermost layer through each convex edge provided with the insertion grooves.
The lower heat-insulating layer comprises a pyrolytic boron nitride sheet A and a plurality of layers of tantalum sheets A, each tantalum sheet A is sequentially stacked from top to bottom, the tantalum sheet A at the lowest layer is arranged above the pyrolytic boron nitride sheet A, convex and/or concave textures A are stamped on the surface of each tantalum sheet A, the texture A of each tantalum sheet A is abutted against the surface of the adjacent tantalum sheet A, and the lower heat-insulating layer is integrally connected with the tantalum cylinder at the innermost layer and formed by the pyrolytic boron nitride sheet A and the tantalum sheet A in a stacked mode.
The distance between the lower heat-insulating layer and the bottom of the crucible is 20-30 mm.
The upper heat-insulating layer comprises pyrolytic boron nitride sheets B, pyrolytic boron nitride sheets C, brackets and a plurality of layers of tantalum sheets B, the lower surfaces of the pyrolytic boron nitride sheets B are abutted to the tantalum ring, the brackets are placed on the pyrolytic boron nitride sheets B, the tantalum sheets B are sequentially stacked in the brackets from bottom to top, convex and/or concave textures B are punched on the surfaces of the tantalum sheets B, the textures B of the tantalum sheets B are abutted to the surfaces of the adjacent tantalum sheets B or the adjacent brackets, and the pyrolytic boron nitride sheets C are placed on the brackets; the upper heat-insulating layer is integrally accommodated in the opening at the upper end of the outermost tantalum cylinder, and the crucible opening penetrates through the upper heat-insulating layer.
The bracket is formed by punching a tantalum sheet.
Each support frame is made of boron nitride sheets.
The invention has the advantages and positive effects that:
according to the invention, the lower heat-insulating layer, the support frames and the convex edges provided with the inserting grooves are matched, so that the lower heat-insulating layer and the support frames can be conveniently connected with the tantalum cylinder at the innermost layer of the side heat-insulating layer respectively, the crucible and the beam source furnace heater are supported, the side heat-insulating layer, the upper heat-insulating layer and the lower heat-insulating layer are used for insulating the enclosed inner space, and a suspension type heat-insulating structure is formed for the crucible; the weight of the heat-insulating layers, the crucible, the beam source furnace heater and the like is supported by the outermost tantalum cylinder, so that the heat conduction distance is maximized; through the arrangement of the bulge on the tantalum cylinder of the side heat-insulating layer, the contact area between the adjacent tantalum cylinders can be reduced, and the heat conduction is reduced. The invention can be suitable for being used in an ultrahigh vacuum environment, adopts the side heat-insulating layer of the tantalum cylinder with the bulge and the integral suspension type heat-insulating layer structure, can effectively reduce heat conduction, improves the heat radiation shielding effect, and realizes the heat-insulating function of the beam source furnace with high efficiency, uniformity, stability and energy conservation.
Drawings
FIG. 1 is a schematic view of the overall mounting structure of the present invention;
FIG. 2 is a cross-sectional view taken at A-A of FIG. 1;
FIG. 3 is an enlarged view of FIG. 2 at D;
FIG. 4 is a schematic structural view of the tantalum cylinder of the present invention;
FIG. 5 is an enlarged view of FIG. 1 at B;
fig. 6 is an enlarged view of fig. 1 at C.
In the figure: 1 is a side heat-insulating layer, 101 is a tantalum cylinder, 1011 is a convex edge, 1012 is a splicing groove, 1013 is a bulge, 102 is a tantalum ring, 2 is an upper heat-insulating layer, 201 is a pyrolytic boron nitride sheet B, 202 is a pyrolytic boron nitride sheet C, 203 is a bracket, 204 is a tantalum sheet B, 3 is a lower heat-insulating layer, 301 is a pyrolytic boron nitride sheet A, 302 is a tantalum sheet A, 4 is a support frame, 001 is a beam source furnace holder, 002 is a crucible, and 003 is a beam source furnace heater.
Detailed Description
The invention is described in further detail below with reference to figures 1-6.
The utility model provides a thin wall heat preservation layer structure of beam source stove, as shown in figure 1, including side heat preservation layer 1, go up heat preservation layer 2, heat preservation layer 3 and a plurality of support frame 4 that is used for supporting crucible 002 and beam source stove heater 003 down, crucible 002 and beam source stove heater 003 set up in the inner space that side heat preservation layer 1, go up heat preservation layer 2 and heat preservation layer 3 enclose down, side heat preservation layer 1, go up heat preservation layer 2 and heat preservation layer 3 down keep warm to the inner space that encloses, form suspension type heat preservation structure to crucible 002.
In the embodiment, the side heat-insulating layer 1 comprises a plurality of layers of tantalum cylinders 101 which are sequentially sleeved from outside to inside, the total thickness of the side heat-insulating layer 1 is about 2mm, the lower end opening of the outermost layer of tantalum cylinder 101 is welded with the beam source furnace holder 001, the upper part of the inner wall of the outermost layer of tantalum cylinder 101 is welded with the tantalum ring 102, the upper ends of the tantalum cylinders 101 except the outermost layer of tantalum cylinder 101 are welded with the tantalum ring 102, gaps are formed between the lower ends of the tantalum cylinders 101 except the outermost layer of tantalum cylinder 101 and the beam source furnace holder 001, and the weight of the heat-insulating layers, the crucible 002, the beam source furnace heater 003 and the like is finally supported by the outermost layer of tantalum cylinder 101, so that the heat conduction distance is maximized; a plurality of convex edges 1011 are punched on the innermost tantalum cylinder 101 along the length direction, a plurality of insertion grooves 1012 used for inserting the lower heat-insulating layer 3 and each support frame 4 are respectively formed in each convex edge 1011, and the lower heat-insulating layer 3 and each support frame 4 are inserted into the innermost tantalum cylinder 101 through each convex edge 1011 provided with the insertion grooves 1012. As shown in fig. 2 and fig. 3, four ribs 1011 are uniformly formed on the tantalum tube 101 at the innermost layer in the present embodiment, and the supporting structure of each support frame 4 for the crucible 002 and the beam source furnace heater 003 is the prior art.
The lower insulating layer 3 is provided below the whole body of the crucible 002, the beam source furnace heater 003 and the support frame 4, the lower insulating layer 3 is provided above the beam source furnace holder 001, and gaps are provided between the lower insulating layer 3 and the beam source furnace holder 001 and between the lower insulating layer 3 and the crucible 002.
The upper insulating layer 2 is arranged at an opening at the upper end of the outermost tantalum cylinder 101, and the tantalum ring 102 supports the bottom of the upper insulating layer 2.
Specifically, as shown in fig. 4, convex and/or concave spherical bulges 1013 are punched on the surface of each tantalum tube 101 except for the outermost layer and the innermost layer of the tantalum tube 101, the bulges 1013 of each tantalum tube 101 are in contact with the surface of the adjacent tantalum tube 101, and the bulges 1013 are uniformly arranged on the surface of the tantalum tube 101. By the arrangement of the bulges 1013, the contact area between the adjacent tantalum cylinders 101 can be reduced, and the heat conduction can be reduced.
Specifically, as shown in fig. 5, in the present embodiment, the lower insulating layer 3 includes a pyrolytic boron nitride sheet a 301 and 7-10 tantalum sheets a 302 with a thickness of 0.03-0.1mm, the tantalum sheets a 302 are stacked in sequence from top to bottom, the lowermost tantalum sheet a 302 is disposed above the pyrolytic boron nitride sheet a 301, and the pyrolytic boron nitride sheet a 301 functions as the whole of the lower insulating layer 3 and is insulated from the heating wires of the heater 003, etc.; convex and/or concave textures A are punched on the surface of each tantalum sheet A302, the textures A of each tantalum sheet A302 are abutted with the surface of the adjacent tantalum sheet A302, the contact area between the upper tantalum sheet A302 and the lower tantalum sheet A302 is reduced, and heat conduction is reduced; the whole lower heat-insulating layer 3 consisting of the pyrolytic boron nitride sheets A301 and the tantalum sheets A302 which are arranged in a stacked mode is connected with the innermost tantalum cylinder 101 through the insertion grooves 1012 on the ribs 1011, and therefore the installation is convenient. The distance between the lower insulating layer 3 and the bottom of the crucible 002 is 20-30mm, so that the insulating effect of the bottom of the crucible 002 can be enhanced.
Specifically, as shown in fig. 6, the upper insulating layer 2 in this embodiment includes a pyrolytic boron nitride sheet B201, a pyrolytic boron nitride sheet C202, a bracket 203 formed by stamping a tantalum sheet, and a tantalum sheet B204 having a thickness of 7 to 10 layers of 0.03 to 0.1mm, the lower surface of the pyrolytic boron nitride sheet B202 abuts against the tantalum ring 102, the tantalum ring 102 supports the pyrolytic boron nitride sheet B202, and the pyrolytic boron nitride sheet B202 supports the entire upper insulating layer 2 and is insulated from the heater 003 and the like; the bracket 203 is placed on the pyrolytic boron nitride sheet B201, the tantalum sheets B204 are sequentially stacked in the bracket 203 from bottom to top, convex and/or concave textures B are punched on the surfaces of the tantalum sheets B204, the textures B of the tantalum sheets B204 are abutted with the surfaces of the adjacent tantalum sheets B204 or the adjacent bracket 203, the contact area between the upper tantalum sheet B204 and the lower tantalum sheet B204 is reduced, and the heat conduction is reduced; pyrolytic boron nitride sheet C202 is placed on bracket 203, plays a role in supporting and heat preservation, and is insulated from heater 003 and the like; go up the whole holding of heat preservation 2 in outermost tantalum section of thick bamboo 101 upper end opening, and crucible 002 opening passes and goes up heat preservation 2 wholly, goes up heat preservation 2 and keeps warm to crucible 002 top, and the whole periphery of heat preservation 2 is gone up to outermost tantalum section of thick bamboo 101 parcel is to the whole heat preservation of heat preservation 2.
Specifically, in the present embodiment, each support frame 4 is made of a boron nitride sheet, and is insulated from the crucible 002, the beam source furnace heater 003, and the like.
The working principle is as follows:
the crucible 002 and the beam source furnace heater 003 are arranged on the tantalum cylinder 101 at the innermost layer of the side heat-insulating layer 1 through the support frames 4 and the convex edges 1011 provided with the inserting grooves 1012, and the side heat-insulating layer 1, the upper heat-insulating layer 2 and the lower heat-insulating layer 3 insulate the enclosed inner space to form a suspension type heat-insulating structure for the crucible 002; only the lower end opening of the outermost tantalum cylinder 101 is welded with the beam source furnace bracket 001, and the overall weight of each insulating layer, the crucible 002, the beam source furnace heater 003 and the like is finally supported by the outermost tantalum cylinder 101, so that the heat conduction distance is maximized; through the arrangement of the bulges 1013, the contact area between the adjacent tantalum cylinders 101 can be reduced, the heat conduction is reduced, the heat radiation shielding effect is increased, and the heat preservation function of the beam source furnace with high efficiency and stability is realized.
Claims (10)
1. A thin-wall heat-insulating layer structure of a beam source furnace is characterized in that: the beam source furnace comprises a side heat-insulating layer (1), an upper heat-insulating layer (2), a lower heat-insulating layer (3) and a plurality of supporting frames (4) for supporting a crucible (002) and a beam source furnace heater (003), wherein the crucible (002) and the beam source furnace heater (003) are arranged in an internal space surrounded by the side heat-insulating layer (1), the upper heat-insulating layer (2) and the lower heat-insulating layer (3), and the side heat-insulating layer (1), the upper heat-insulating layer (2) and the lower heat-insulating layer (3) are used for insulating the surrounded internal space;
the side heat-insulating layer (1) comprises a plurality of layers of tantalum cylinders (101) which are sequentially sleeved from outside to inside, wherein the lower end opening of one tantalum cylinder (101) is fixedly connected with a beam source furnace bracket (001); a tantalum ring (102) is welded on the upper part of the inner wall of the outermost tantalum cylinder (101), and the upper ends of the tantalum cylinders (101) except the outermost tantalum cylinder (101) are welded with the tantalum ring (102); the lower heat-insulating layer (3) and each support frame (4) are respectively arranged on the tantalum cylinder (101) at the innermost layer;
the lower heat-insulating layer (3) is arranged below the whole body formed by the crucible (002), the beam source furnace heater (003) and the support frame (4), the lower heat-insulating layer (3) is arranged above the beam source furnace holder (001), and gaps are respectively arranged among the lower heat-insulating layer (3), the beam source furnace holder (001) and the crucible (002);
the upper heat-insulating layer (2) is arranged at an opening at the upper end of the outermost tantalum cylinder (101), and the tantalum ring (102) supports the bottom of the upper heat-insulating layer (2).
2. The thin-wall insulating layer structure of the beam source furnace according to claim 1, characterized in that: the lower end opening of the outermost tantalum cylinder (101) is fixedly connected with the beam source furnace holder (001), and gaps are formed between the lower ends of the tantalum cylinders (101) except the outermost tantalum cylinder (101) and the beam source furnace holder (001).
3. The thin-wall insulating layer structure of the beam source furnace according to claim 1, characterized in that: convex and/or concave bulges (1013) are punched on the surface of each tantalum cylinder (101) except the outermost layer and the innermost layer of the tantalum cylinder (101), and the bulges (1013) of each tantalum cylinder (101) are abutted against the surface of the adjacent tantalum cylinder (101).
4. The thin-wall insulating layer structure of the beam source furnace of claim 3, characterized in that: the bulges (1013) are uniformly arranged on the surface of the tantalum cylinder (101).
5. The thin-wall insulating layer structure of the beam source furnace according to claim 1, characterized in that: a plurality of ribs (1011) are punched on the tantalum cylinder (101) on the innermost layer along the length direction, a plurality of insertion grooves (1012) used for inserting the lower heat-insulating layer (3) and the support frames (4) are respectively formed in each rib (1011), and the lower heat-insulating layer (3) and the support frames (4) are respectively inserted into the tantalum cylinder (101) on the innermost layer through the ribs (1011) provided with the insertion grooves (1012).
6. The thin-wall insulating layer structure of the beam source furnace according to claim 1, characterized in that: the lower heat-insulating layer (3) comprises a pyrolytic boron nitride sheet A (301) and a plurality of layers of tantalum sheets A (302), each tantalum sheet A (302) is sequentially stacked from top to bottom, the tantalum sheet A (302) at the lowest layer is arranged above the pyrolytic boron nitride sheet A (301), convex and/or concave textures A are stamped on the surface of each tantalum sheet A (302), the textures A of each tantalum sheet A (302) are abutted with the adjacent surface of the tantalum sheet A (302), and the pyrolytic boron nitride sheet A (301) and the tantalum sheet A (302) are stacked to form the lower heat-insulating layer (3) which is integrally connected with the innermost tantalum cylinder (101).
7. The thin-wall insulating layer structure of the beam source furnace according to claim 1, characterized in that: the distance between the lower heat-insulating layer (3) and the bottom of the crucible (002) is 20-30 mm.
8. The thin-wall insulating layer structure of the beam source furnace according to claim 1, characterized in that: the upper heat-insulating layer (2) comprises pyrolytic boron nitride sheets B (201), pyrolytic boron nitride sheets C (202), brackets (203) and a plurality of layers of tantalum sheets B (204), the lower surfaces of the pyrolytic boron nitride sheets B (202) are abutted to the tantalum ring (102), the brackets (203) are placed on the pyrolytic boron nitride sheets B (201), the tantalum sheets B (204) are sequentially stacked in the brackets (203) from bottom to top, convex and/or concave textures B are punched on the surfaces of the tantalum sheets B (204), the textures B of the tantalum sheets B (204) are abutted to the adjacent tantalum sheets B (204) or the surfaces of the adjacent brackets (203), and the pyrolytic boron nitride sheets C (202) are placed on the brackets (203); the upper heat-insulating layer (2) is integrally contained in an opening at the upper end of the outermost tantalum cylinder (101), and an opening of the crucible (002) penetrates through the whole upper heat-insulating layer (2).
9. The thin-wall insulating layer structure of the beam source furnace of claim 8, wherein: the bracket (203) is formed by punching a tantalum sheet.
10. The thin-wall insulating layer structure of the beam source furnace according to claim 1, characterized in that: each support frame (4) is made of boron nitride sheets.
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| Application Number | Priority Date | Filing Date | Title |
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| CN202111194806.5A CN113970243A (en) | 2021-10-14 | 2021-10-14 | Thin-wall heat-insulating layer structure of beam source furnace |
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| CN202111194806.5A CN113970243A (en) | 2021-10-14 | 2021-10-14 | Thin-wall heat-insulating layer structure of beam source furnace |
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Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4550411A (en) * | 1983-03-30 | 1985-10-29 | Vg Instruments Group Limited | Sources used in molecular beam epitaxy |
| CN202717880U (en) * | 2012-08-03 | 2013-02-06 | 江苏中立新能源股份有限公司 | Novel polysilicon ingot casting furnace thermal field structure |
| CN104499045A (en) * | 2014-12-31 | 2015-04-08 | 华中科技大学 | Kyropoulos-method sapphire crystal growth furnace |
| CN207811927U (en) * | 2018-01-30 | 2018-09-04 | 宁夏旭樱新能源科技有限公司 | The single crystal growing furnace of central reflector layer is set |
| CN209537676U (en) * | 2019-02-26 | 2019-10-25 | 哈尔滨科友半导体产业装备与技术研究院有限公司 | A kind of PVT method single-crystal growing apparatus of accurate control resistance-type heating temperature ladder |
| CN112410871A (en) * | 2020-11-20 | 2021-02-26 | 湖南烁科晶磊半导体科技有限公司 | Beam source furnace for molecular beam epitaxy with movable crucible |
-
2021
- 2021-10-14 CN CN202111194806.5A patent/CN113970243A/en not_active Withdrawn
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4550411A (en) * | 1983-03-30 | 1985-10-29 | Vg Instruments Group Limited | Sources used in molecular beam epitaxy |
| CN202717880U (en) * | 2012-08-03 | 2013-02-06 | 江苏中立新能源股份有限公司 | Novel polysilicon ingot casting furnace thermal field structure |
| CN104499045A (en) * | 2014-12-31 | 2015-04-08 | 华中科技大学 | Kyropoulos-method sapphire crystal growth furnace |
| CN207811927U (en) * | 2018-01-30 | 2018-09-04 | 宁夏旭樱新能源科技有限公司 | The single crystal growing furnace of central reflector layer is set |
| CN209537676U (en) * | 2019-02-26 | 2019-10-25 | 哈尔滨科友半导体产业装备与技术研究院有限公司 | A kind of PVT method single-crystal growing apparatus of accurate control resistance-type heating temperature ladder |
| CN112410871A (en) * | 2020-11-20 | 2021-02-26 | 湖南烁科晶磊半导体科技有限公司 | Beam source furnace for molecular beam epitaxy with movable crucible |
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Application publication date: 20220125 |