CN113910822A - Micro-nano optical gold stamping method - Google Patents

Micro-nano optical gold stamping method Download PDF

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Publication number
CN113910822A
CN113910822A CN202111298790.2A CN202111298790A CN113910822A CN 113910822 A CN113910822 A CN 113910822A CN 202111298790 A CN202111298790 A CN 202111298790A CN 113910822 A CN113910822 A CN 113910822A
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CN
China
Prior art keywords
gold stamping
metal plate
plate
micro
nano
Prior art date
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Pending
Application number
CN202111298790.2A
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Chinese (zh)
Inventor
王翔
莫正戎
崔凤
辛佳伟
赵海兵
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Zhejiang Minong Century Group Co ltd
Hangzhou Xinyao Laser Technology Co ltd
Original Assignee
Zhejiang Minong Century Group Co ltd
Hangzhou Xinyao Laser Technology Co ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Zhejiang Minong Century Group Co ltd, Hangzhou Xinyao Laser Technology Co ltd filed Critical Zhejiang Minong Century Group Co ltd
Priority to CN202111298790.2A priority Critical patent/CN113910822A/en
Publication of CN113910822A publication Critical patent/CN113910822A/en
Pending legal-status Critical Current

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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B44DECORATIVE ARTS
    • B44CPRODUCING DECORATIVE EFFECTS; MOSAICS; TARSIA WORK; PAPERHANGING
    • B44C1/00Processes, not specifically provided for elsewhere, for producing decorative surface effects
    • B44C1/16Processes, not specifically provided for elsewhere, for producing decorative surface effects for applying transfer pictures or the like
    • B44C1/165Processes, not specifically provided for elsewhere, for producing decorative surface effects for applying transfer pictures or the like for decalcomanias; sheet material therefor
    • B44C1/17Dry transfer
    • B44C1/1712Decalcomanias applied under heat and pressure, e.g. provided with a heat activable adhesive
    • B44C1/1729Hot stamping techniques
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41CPROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C1/00Forme preparation
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41CPROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C1/00Forme preparation
    • B41C1/02Engraving; Heads therefor

Abstract

The invention belongs to the field of printing processes, and discloses a micro-nano optical gold stamping method. The method comprises the following steps: step 1: carrying out gray level relief processing on the plane vector pattern to enable the pattern to generate a visual concave-convex effect like carving, and then guiding the processed file into an optical carving processing system to carry out micro-nano optical image-text master mask manufacturing; step 2: copying the master mask pattern to a metal plate by using an electrochemical metal deposition method; and step 3: cutting a gold stamping metal plate by laser; and 4, step 4: CNC engraving and removing non-image-text areas of the gold stamping plate; and 5: installing a plate material; step 6: adjusting the temperature; and 7: pressing to make the plate contact with the gold stamping surface paper; and 8: separating the pattern plate from the paper; and step 9: forming micro-nano optical grain patterns; step 10: collecting paper; step 11: and checking the image and text. The invention improves the gold stamping precision to 0.004 mm; the gold stamping foil can replace holographic gold stamping electrochemical aluminum, and is low in cost and high in flexibility.

Description

Micro-nano optical gold stamping method
Technical Field
The invention belongs to the field of printing processes, and particularly relates to a micro-nano optical gold stamping method.
Background
The existing plate gilding technology has two technologies according to the processing of plate materials: the other is the stamping of an engraving plate of a numerical control machine tool, the other is the stamping of a chemical corrosion plate of a film, patterns on the plate and an electrochemical aluminum foil are simultaneously transferred onto paper by the heating and the pressurizing of the stamping plate to form a corresponding stamping effect, but the stamping of the two micro-nano-scale patterns and characters is realized by adopting the customized holographic pattern positioning stamping foil.
Disclosure of Invention
The invention aims to provide a micro-nano optical gold stamping method, which aims to solve the technical problem that the existing micro-nano image-text gold stamping needs to be realized by adopting customized holographic pattern positioning gold stamping foil for gold stamping.
In order to solve the technical problems, the specific technical scheme of the micro-nano optical gold stamping method is as follows:
a micro-nano optical gold stamping method comprises the following steps:
step 1: carrying out gray level relief processing on the plane vector pattern to enable the pattern to generate a visual concave-convex effect like carving, and then guiding the processed file into an optical carving processing system to carry out micro-nano optical image-text master mask manufacturing;
step 2: copying the master mask pattern to a metal plate by using an electrochemical metal deposition method;
and step 3: cutting a gold stamping metal plate by laser;
and 4, step 4: removing the gold stamping metal plate non-image-text area by CNC engraving;
and 5: installing a metal plate;
step 6: adjusting the gold stamping temperature;
and 7: pressing to make the metal plate contact with the gold stamping surface paper;
and 8: separating the metal plate from the paper;
and step 9: forming micro-nano optical grain patterns;
step 10: collecting paper;
step 11: and checking the image and text.
Further, the specific steps of step 1 are:
step 1.1: designing a gray scale map by using PS software (the effect can be gray scale gradual change, embossment or frosting);
step 1.2: selecting all pixel points under the same gray level;
step 1.3: selecting the pixel points selected in the step 1.2 to be converted into vector paths, and then exporting AI format files; step 1.4: repeating the step 1.2-1.3, wherein the repetition times are the same as the number of gray scales until different gray scales are processed;
step 1.5: parallel line filling units with 180 angles of 0-180 degrees are designed in AI software, and the line width and the space of the parallel lines in the filling units are both 0.004 mm;
step 1.6: sequentially opening the path file exported in the step 1.4, and filling the gray level vector path into the parallel line filling units arranged in the step 1.5;
step 1.7: combining all the gray level vector path filling graphs together and storing the combined graph into an EPS file format;
step 1.8: RIP processing is carried out by using RTI software, and a negative film is output;
step 1.9: and (3) carrying out photoetching offset plate with the output negative film exposure thickness of 2-5 mu m on an LED parallel line exposure machine, developing and then carrying out silver mirror reaction to prepare the micro-nano optical image-text master mask.
Further, in the step 2, the master pattern is copied to a metal plate by an electrochemical metal deposition method to form a micro-nano gold stamping image-text plate material with uniform thickness, and the method specifically comprises the following steps:
after the surface of the mother plate is purified, the four sides of the mother plate are fixed by adhesive tapes and are flatly placed in a reaction tank for 8-13 seconds, silver nitrate solution and glucose solution which are prepared according to the proportion of 100:38 are arranged in the reaction tank, warm water is used for washing the surface of the mother plate after the reaction is completed, a blower is used for drying the surface of the mother plate after the mother plate is washed clean, the four sides of the mother plate are flatly pasted by the adhesive tapes and coated with conductive adhesive, the mother plate is washed by high-purity water after the work is completed, the mother plate is directly placed in nickel sulfamate liquid after the washing, the PH value is ensured to be 5-6 in the process, the specification of the metal plate is checked after the metal deposition is completed, and the thickness of the metal plate is not lower than 1.2 mm.
Further, the specific steps of step 3 are: clamping the metal plate on a frame, accurately aligning the metal plate with a laser point on the plate, aligning the starting point, finding a value (X1 and Y1) of the starting point, then finding a value (X2 and Y1) of a tail end point of the line, after accurate alignment, simulating cutting walking by the laser point, and accurately cutting the metal plate into a single small image-text plate, wherein the track and a cutting wire frame are completely overlapped.
Further, the specific steps of step 4 are: carrying out non-image-text area hollowing treatment on a single metal plate by a CNC engraving machine and a flat-bottom milling cutter; milling the edges of the 'pictures and texts' by an alloy rigid flat-bottom milling cutter, hardening a sharp-end cutter to carry out fine carving and trimming, testing the thickness of the metal plate by a vernier caliper during plate milling, and then determining the thickness of the base, wherein the thickness of the metal plate and the thickness of the base cannot be lower than 7 mm.
Further, the specific steps of step 5 are: polishing and deburring the processed metal plate by using a common sharp-pointed cutter, cleaning oil stains by using alcohol, soaking the metal plate for not less than 15 minutes by using an n-propyl ester solvent, and further cleaning the oil stains.
Further, the specific steps of step 6 are: and mounting the metal plate and the required alumite on a gold stamping machine, stamping a gold stamping surface to be gold stamped when the temperature reaches 95-105 ℃, and correspondingly adjusting the gold stamping pressure according to the thickness of the pattern lines and the layout effect to finish the manufacturing of the technological effect.
The micro-nano optical gold stamping method has the following advantages: the invention uses optical carving image-text mother plate, the mother plate pattern is copied to form the gold stamping plate material by the molecular accumulation method, the gold stamping image-text can have the fineness between micron and nanometer, the ordinary gold stamping film can be hot stamped to have the micro-nano level and high-brightness image-text gold stamping effect, and the original micro-nano level image-text gold stamping needs to be realized by adopting the customized holographic pattern positioning gold stamping foil for gold stamping. 1. The gold stamping precision is improved to 0.004 mm; 2. the gold stamping foil can replace holographic gold stamping alumite, and the cost is low; 3. the flexibility is high.
Drawings
FIG. 1 is a flow chart of the gold stamping plate production of the invention;
fig. 2 is a flow chart of the gold stamping process of the invention.
Detailed Description
In order to better understand the purpose, structure and function of the present invention, a micro-nano optical gold stamping method according to the present invention is described in further detail below with reference to the accompanying drawings.
The invention discloses a technological method of micro-nano optical gold stamping technology, relating to the field of printing technology, and the technology is completed by the following steps:
the first step is as follows: carrying out gray level relief processing on the plane vector pattern to enable the pattern to generate a visual concave-convex effect like carving, and then guiding the processed file into an optical carving processing system to carry out micro-nano optical image-text master mask manufacturing;
the second step is that: copying the master mask pattern to a metal plate by using an electrochemical metal deposition method;
the third step: cutting a gold stamping metal plate by laser;
the fourth step: removing the gold stamping metal plate non-image-text area by CNC engraving;
the fifth step: installing a metal plate;
and a sixth step: adjusting the gold stamping temperature;
the seventh step: pressing to make the metal plate contact with the gold stamping surface paper;
eighth step: separating the metal plate from the paper;
the ninth step: forming micro-nano optical grade grain patterns;
the tenth step: collecting paper;
the eleventh step: and checking the image and text.
The method comprises the following specific steps:
the first step is as follows: carrying out gray level relief processing on the plane vector pattern by using image processing software (AI, PS) to enable the pattern to generate a visual concave-convex effect like carving, and then guiding the processed file into an optical carving processing system to carry out micro-nano optical image-text master mask manufacturing: 1. designing a gray scale map by using PS software (the effect can be gray scale gradual change, embossment or frosting, etc.); 2. selecting all pixel points under the same gray level; 3. selecting the pixel points selected in the step 2 to be converted into vector paths, and then exporting AI format files; 4. repeating the step 2-3 for the same number of times as the number of gray scales until different gray scales are processed; 5. parallel line filling units with 180 angles of 0-180 degrees are designed in AI software, and the line width and the space of the parallel lines in the filling units are both 0.004 mm; 6. opening the path files in sequence, and filling the gray scale vector paths into the parallel line filling units arranged in the step 5; 7. combining all the gray level vector path filling graphs together and storing the combined graph into an EPS file format; 8. RIP processing is carried out by using RTI software, and a negative film is output; 9. and (3) carrying out photoetching offset plate with the output negative film exposure thickness of 2-5 mu m on an LED parallel line exposure machine, developing and then carrying out silver mirror reaction to prepare the micro-nano optical image-text master mask.
The second step is that: copying the master plate pattern onto a metal plate by using an electrochemical metal deposition method to form a micro-nano gold stamping image-text plate material with uniform thickness, which comprises the following specific steps:
after the surface of the mother plate is purified, the four sides of the mother plate are fixed by adhesive tapes and are flatly placed in a reaction tank for 8-13 seconds, silver nitrate solution and glucose solution which are prepared according to the proportion of 100:38 are arranged in the reaction tank, the surface of the mother plate is lightly washed by warm water after the reaction is completed, the surface of the mother plate is blown dry by a blower after the mother plate is washed clean, the four sides of the mother plate are flatly pasted by the adhesive tapes and coated with conductive adhesive, the mother plate is washed by high-purity water after the work is completed, the mother plate is directly placed in nickel sulfamate liquid after the washing, the PH value is ensured to be between 5 and 6 in the process, the specification of the metal plate is checked after the metal deposition is completed, and the thickness of the metal plate is not lower than 1.2 mm.
The third step: clamping the metal plate on a frame, accurately aligning the metal plate with a laser point on the plate, aligning the starting point, finding a value (X1 and Y1) of the starting point, then finding a value (X2 and Y1) of a tail end point of the line, after accurate alignment, simulating cutting walking by the laser point, and accurately cutting the metal plate into a single small image-text plate, wherein the track and a cutting wire frame are completely overlapped.
The fourth step: carrying out non-image-text area hollowing treatment on a single metal plate by a CNC engraving machine and a flat-bottom milling cutter; milling the edges of the pictures and texts by an alloy rigid flat-bottom milling cutter, and finely carving and trimming by a sharp-pointed cutter added at the inlet. When the plate is milled, the thickness of the metal plate is firstly measured by using a vernier caliper, and then the thickness of the base is determined, wherein the thickness of the metal plate and the thickness of the base cannot be lower than 7 mm.
The fifth step: and polishing and deburring the processed metal plate by using a common sharp-pointed cutter, cleaning oil stains by using alcohol, soaking the metal plate for not less than 15 minutes by using an n-propyl ester solvent, and further cleaning the oil stains to avoid influencing the integrity and the flatness of a subsequent gold stamping effect.
And a sixth step: and mounting the micro-nano optical gold stamping metal plate and the required electrochemical aluminum film on a gold stamping machine, stamping a gold stamping surface to be gold stamped when the temperature reaches 95-105 ℃, and correspondingly adjusting the gold stamping pressure according to the thickness of the pattern lines and the layout effect to finish the manufacture of the technological effect.
It is to be understood that the present invention has been described with reference to certain embodiments, and that various changes in the features and embodiments, or equivalent substitutions may be made therein by those skilled in the art without departing from the spirit and scope of the invention. In addition, many modifications may be made to adapt a particular situation or material to the teachings of the invention without departing from the essential scope thereof. Therefore, it is intended that the invention not be limited to the particular embodiment disclosed, but that the invention will include all embodiments falling within the scope of the appended claims.

Claims (8)

1. A micro-nano optical gold stamping method is characterized by comprising the following steps:
step 1: carrying out gray level relief processing on the plane vector pattern to enable the pattern to generate a visual concave-convex effect like carving, and then guiding the processed file into an optical carving processing system to carry out micro-nano optical image-text master mask manufacturing;
step 2: copying the master mask pattern to a metal plate by using an electrochemical metal deposition method;
and step 3: cutting a gold stamping metal plate by laser;
and 4, step 4: removing the gold stamping metal plate non-image-text area by CNC engraving;
and 5: installing a metal plate;
step 6: adjusting the gold stamping temperature;
and 7: pressing to make the metal plate contact with the gold stamping surface paper;
and 8: separating the metal plate from the paper;
and step 9: forming micro-nano optical grade grain patterns;
step 10: collecting paper;
step 11: and checking the image and text.
2. The micro-nano optical gold stamping method according to claim 1, wherein in step 1, the gray level relief processing is performed on the plane vector pattern by using graphic processing software, so that the pattern generates a visual concave-convex effect like carving, wherein the graphic processing software is AI and PS.
3. The micro-nano scale optical gold stamping method according to claim 2, characterized in that the specific steps of step 1 are as follows:
step 1.1: designing a gray scale map by using PS software (the effect can be gray scale gradual change, embossment or frosting);
step 1.2: selecting all pixel points under the same gray level;
step 1.3: selecting the pixel points selected in the step 1.2 to be converted into vector paths, and then exporting AI format files; step 1.4: repeating the step 1.2-1.3, wherein the repetition times are the same as the number of gray scales until different gray scales are processed;
step 1.5: parallel line filling units with 180 angles of 0-180 degrees are designed in AI software, and the line width and the space of the parallel lines in the filling units are both 0.004 mm;
step 1.6: sequentially opening the path file exported in the step 1.4, and filling the gray level vector path into the parallel line filling units arranged in the step 1.5;
step 1.7: combining all the gray level vector path filling graphs together and storing the combined graph into an EPS file format;
step 1.8: RIP processing is carried out by using RTI software, and a negative film is output;
step 1.9: and (3) carrying out photoetching offset plate with the output negative film exposure thickness of 2-5 mu m on an LED parallel line exposure machine, developing and then carrying out silver mirror reaction to prepare the micro-nano optical image-text master mask.
4. The micro-nano optical gold stamping method according to claim 1, wherein the master pattern in step 2 is copied to a metal plate by an electrochemical metal deposition method to form a micro-nano gold stamping image-text plate material with uniform thickness, and the method comprises the following steps:
after the surface of the mother plate is purified, the four sides of the mother plate are fixed by adhesive tapes and are flatly placed in a reaction tank for 8-13 seconds, silver nitrate solution and glucose solution which are prepared according to the proportion of 100:38 are arranged in the reaction tank, warm water is used for washing the surface of the mother plate after the reaction is completed, a blower is used for drying the surface of the mother plate after the mother plate is washed clean, the four sides of the mother plate are flatly pasted by the adhesive tapes and coated with conductive adhesive, the mother plate is washed by high-purity water after the work is completed, the mother plate is directly placed in nickel sulfamate liquid after the washing, the PH value is ensured to be 5-6 in the process, the specification of the metal plate is checked after the metal deposition is completed, and the thickness of the metal plate is not lower than 1.2 mm.
5. The micro-nano scale optical gold stamping method according to claim 1, characterized in that the specific steps of step 3 are as follows: clamping the metal plate on a frame, accurately aligning the metal plate with a laser point on the plate, aligning the starting point, finding a value (X1 and Y1) of the starting point, then finding a value (X2 and Y1) of a tail end point of the line, after accurate alignment, simulating cutting walking by the laser point, and accurately cutting the metal plate into a single small image-text plate, wherein the track and a cutting wire frame are completely overlapped.
6. The micro-nano scale optical gold stamping method according to claim 5, characterized in that the specific steps of step 4 are as follows: carrying out non-image-text area hollowing treatment on a single metal plate by a CNC engraving machine and a flat-bottom milling cutter; milling the edges of the 'pictures and texts' by an alloy rigid flat-bottom milling cutter, hardening a sharp-end cutter to carry out fine carving and trimming, testing the thickness of the metal plate by a vernier caliper during plate milling, and then determining the thickness of the base, wherein the thickness of the metal plate and the thickness of the base cannot be lower than 7 mm.
7. The micro-nano scale optical gold stamping method according to claim 6, characterized in that the specific steps of step 5 are as follows: polishing and deburring the processed metal plate by using a common sharp-pointed cutter, cleaning oil stains by using alcohol, soaking the metal plate for not less than 15 minutes by using an n-propyl ester solvent, and further cleaning the oil stains.
8. The micro-nano scale optical gold stamping method according to claim 1, characterized in that the specific steps of step 6 are as follows: and mounting the metal plate and the required alumite on a gold stamping machine, stamping a gold stamping surface to be gold stamped when the temperature reaches 95-105 ℃, and correspondingly adjusting the gold stamping pressure according to the thickness of the pattern lines and the layout effect to finish the manufacturing of the technological effect.
CN202111298790.2A 2021-11-04 2021-11-04 Micro-nano optical gold stamping method Pending CN113910822A (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114571836A (en) * 2022-01-21 2022-06-03 浙江亚欣包装材料有限公司 Method for manufacturing micro-nano gold stamping plate

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3942440A (en) * 1972-11-14 1976-03-09 Gerhard Ritzerfeld Method of making a printing form
CN1514423A (en) * 2003-08-15 2004-07-21 河南天畅防伪包装有限公司 Holographic colour print antiforge mark and its production technology
CN104309272A (en) * 2014-10-15 2015-01-28 广东壮丽彩印股份有限公司 Making method of three-dimensional relief anti-fake pattern mother set
CN105751676A (en) * 2016-04-29 2016-07-13 珠海市瑞明科技有限公司 Thermal printing thin film with stereo embossment visible with naked eyes and manufacturing method of thermal printing thin film
CN107399192A (en) * 2017-08-30 2017-11-28 郑州华美彩印纸品有限公司 A kind of gilding technology

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3942440A (en) * 1972-11-14 1976-03-09 Gerhard Ritzerfeld Method of making a printing form
CN1514423A (en) * 2003-08-15 2004-07-21 河南天畅防伪包装有限公司 Holographic colour print antiforge mark and its production technology
CN104309272A (en) * 2014-10-15 2015-01-28 广东壮丽彩印股份有限公司 Making method of three-dimensional relief anti-fake pattern mother set
CN105751676A (en) * 2016-04-29 2016-07-13 珠海市瑞明科技有限公司 Thermal printing thin film with stereo embossment visible with naked eyes and manufacturing method of thermal printing thin film
CN107399192A (en) * 2017-08-30 2017-11-28 郑州华美彩印纸品有限公司 A kind of gilding technology

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114571836A (en) * 2022-01-21 2022-06-03 浙江亚欣包装材料有限公司 Method for manufacturing micro-nano gold stamping plate
CN114571836B (en) * 2022-01-21 2023-09-26 浙江亚欣包装材料有限公司 Manufacturing method of micro-nano gold stamping plate

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