CN113853447A - Deposition apparatus system - Google Patents

Deposition apparatus system Download PDF

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Publication number
CN113853447A
CN113853447A CN201980096607.5A CN201980096607A CN113853447A CN 113853447 A CN113853447 A CN 113853447A CN 201980096607 A CN201980096607 A CN 201980096607A CN 113853447 A CN113853447 A CN 113853447A
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CN
China
Prior art keywords
nozzle
viewing port
deposition
laser
deposition apparatus
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Pending
Application number
CN201980096607.5A
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Chinese (zh)
Inventor
崔虔熏
申大成
金昇渊
洪熏护
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LG Electronics Inc
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LG Electronics Inc
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Publication of CN113853447A publication Critical patent/CN113853447A/en
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    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05BSPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B15/00Details of spraying plant or spraying apparatus not otherwise provided for; Accessories
    • B05B15/14Arrangements for preventing or controlling structural damage to spraying apparatus or its outlets, e.g. for breaking at desired places; Arrangements for handling or replacing damaged parts
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05BSPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B15/00Details of spraying plant or spraying apparatus not otherwise provided for; Accessories
    • B05B15/50Arrangements for cleaning; Arrangements for preventing deposits, drying-out or blockage; Arrangements for detecting improper discharge caused by the presence of foreign matter
    • B05B15/52Arrangements for cleaning; Arrangements for preventing deposits, drying-out or blockage; Arrangements for detecting improper discharge caused by the presence of foreign matter for removal of clogging particles
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/12Organic material
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • C23C14/243Crucibles for source material
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/52Means for observation of the coating process
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54Controlling or regulating the coating process
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/564Means for minimising impurities in the coating chamber such as dust, moisture, residual gases

Abstract

The deposition apparatus system of the present invention may comprise: a vacuum chamber, at least one viewing port provided on one surface of the vacuum chamber, a deposition apparatus including a crucible accommodated in the vacuum chamber to accommodate a deposition raw material, a heater unit configured to heat the crucible, and at least one nozzle through which a deposition material evaporated by the deposition raw material passes, a camera located outside the viewing port to photograph the nozzle through the viewing port, a laser located outside the observation port to output a laser beam to the nozzle through the observation port, a laser moving unit configured to move the laser beam output from the laser to a point on the nozzle, and a controller configured to receive a nozzle image captured by the camera and to control operations of the laser and the laser moving unit according to a result of detecting a blockage from the nozzle image.

Description

Deposition apparatus system
[ technical field ]
The present invention relates to a deposition apparatus system that deposits a deposition material on a vapor deposition object, and more particularly, to a deposition apparatus system that can quickly detect and effectively prevent an initial clogging phenomenon of a nozzle for discharging a deposition material.
[ background art ]
Deposition is a method of spraying gaseous particles onto the surface of an object, such as metal or glass, to form a thin solid film.
Recently, as the use of an Organic Light Emitting Diode (OLED) display on an electronic device such as a TV or a mobile phone increases, research into devices for an OLED display panel is also active. In particular, a method of manufacturing an OLED display panel includes a process of depositing an organic material on a glass substrate in a vacuum state.
Specifically, the deposition process includes a process of heating a crucible containing an organic material to evaporate the organic material into a gaseous state, and a process of depositing the gaseous organic material on the substrate through a nozzle.
However, during the deposition process, the organic material in a gaseous state may be deposited around the nozzle to form a film without moving to the substrate, or a blocking phenomenon blocking the hole of the nozzle may occur.
When the blocking phenomenon occurs, the organic material is unevenly deposited on the glass substrate. When the clogging phenomenon occurs seriously, it is necessary to stop the deposition process to clean the nozzle.
Korean patent application laid-open No. 2015-0114098 (filed 3/31/2014) relates to a linear evaporation source (from which heaters are detachable) including a first heater detached from a nozzle of a crucible and second and third heaters corresponding to upper and lower side surfaces of the crucible.
The second and third heaters heat the upper and lower portions of the crucible, respectively, such that the deposition material contained in the lower portion of the crucible is evaporated in the upper portion of the crucible, and the first heater heats the nozzle of the crucible, such that temperature uniformity of the deposition material can be improved when the deposition material evaporated in the crucible is sprayed through the nozzle of the crucible.
Therefore, when a clogging phenomenon occurs during deposition, the clogging phenomenon may be suppressed by increasing the temperature of the first heater to melt the organic material around the nozzle.
However, according to the related art, it is difficult to preliminarily detect a clogging phenomenon occurring around the nozzle and quickly cope with the clogging phenomenon.
In addition, when a clogging phenomenon is detected to operate the first heater, the evaporation amount of the deposition material discharged from the nozzle may be temporarily excessively increased, thereby affecting the quality of the OLED display manufactured through the deposition process.
In addition, when the first heater on the nozzle side is removed to disassemble the crucible, a problem of a large amount of disconnection may occur in the first heater.
In addition, when the first heater is operated to suppress clogging, the amount of heat discharged through all the nozzles increases and the temperature of the display substrate inside the vacuum chamber increases. Therefore, in order to prevent this, a separate cooling device needs to be provided.
[ summary of the invention ]
[ problem ] to
The present invention is designed to solve the problems of the related art, and an object of the present invention is to provide a deposition apparatus system capable of rapidly detecting an initial clogging phenomenon of a nozzle for discharging a deposition material and effectively preventing the clogging phenomenon within a range that does not affect a deposition process.
[ solution ]
The deposition apparatus system may include: a vacuum chamber, at least one viewing port provided on one surface of the vacuum chamber, a deposition apparatus including a crucible accommodated in the vacuum chamber to accommodate a deposition raw material, a heater unit configured to heat the crucible, and at least one nozzle through which a deposition material evaporated by the deposition raw material passes, a camera located outside the viewing port to photograph the nozzle through the viewing port, a laser located outside the viewing port to output a laser beam to the nozzle through the viewing port, a laser moving unit configured to move the laser beam output from the laser to a point on the nozzle, and a controller configured to receive a nozzle image captured by the camera and control operations of the laser and the laser moving unit according to a result of detecting clogging from the nozzle image.
The viewing port may include a first viewing port with the camera mounted on an exterior thereof, and a second viewing port disposed adjacent the first viewing port with the laser mounted on an exterior thereof.
The viewing ports shown may include: a first coating layer applied to the first viewing port to prevent reflection of light incident from the camera, and a second coating layer applied to the second viewing port to transmit a laser beam irradiated from the laser.
The deposition apparatus system may further include an illumination unit located outside the viewing port to illuminate light to the nozzle through the viewing port.
The illumination unit may irradiate light having a wavelength of a specific wavelength band to increase the brightness of the deposition material.
The viewing port may further include a third viewing port disposed adjacent to the first viewing port, and the third viewing port may be a transparent window, the illumination unit being mounted on an outside thereof.
The viewing port may further include a third coating layer for coating the third viewing port to transmit light irradiated from the illumination unit.
The laser moving unit may include a reflector configured to reflect a laser beam of the laser toward the nozzle, and a rotation motor configured to adjust an angle of the reflector.
The controller may control the output intensity and time of the laser beam according to the clogging degree of the nozzle.
The deposition device system can also include a glass that is replaceably disposed between the viewing port and the nozzle to protect the viewing port from the deposition material.
The glass may be disposed closer to the viewing port than to the nozzle.
The deposition device system may further include a shutter unit disposed between the viewing port and the nozzle to be openable and closable, and configured to protect the viewing port from the deposition material.
The shutter unit may include: the image processing apparatus includes a shutter disposed to face at least a portion of the viewing port and to open and close a field of view of the viewing port, and a shutter driving section configured to control a movement of the shutter.
The shutter may be disposed closer to the viewing port than to the nozzle.
The controller may control the operation of the shutter driving part such that the shutter opens the field of view of the observation port at a point in time when at least one of the camera, the illumination unit, or the laser is operated.
The deposition device system may further include a monitor configured to display an image of the nozzle taken by the camera.
The controller may generate an alarm on the monitor when a blockage is detected from the nozzle image.
[ advantageous effects ]
According to the embodiment of the present invention, since the camera monitors the nozzle for discharging the deposition material in real time, it is possible to quickly detect the initial clogging of the nozzle and quickly cope with the initial clogging.
In addition, since the laser provides thermal energy to a desired position of the nozzle, initial clogging can be rapidly solved and clogging phenomenon can be prevented. Accordingly, the deposition process time can be shortened and waste of the deposition material can be prevented.
In addition, since the laser supplies thermal energy only to a point on the nozzle where initial clogging occurs, separately from the heater unit for generating the deposition material, it is possible to uniformly maintain the evaporation amount of the deposition material and prevent the clogging phenomenon. Accordingly, the quality of the OLED display manufactured by the deposition process may be stably maintained.
In addition, since the camera and the laser are disposed outside the vacuum chamber, it can be easily applied to existing products without modifying the deposition apparatus and can reduce costs.
[ description of the drawings ]
Fig. 1 and 2 are diagrams schematically showing the inside of a vacuum chamber of a deposition apparatus system of an embodiment of the present invention when viewed from above and from the front.
Fig. 3 is an exploded perspective view illustrating a deposition apparatus according to an embodiment of the present invention.
Fig. 4 is a diagram schematically showing a clogging prevention module according to an embodiment of the present invention.
Fig. 5 and 6 are a perspective view and a side view illustrating an upper portion of the clogging prevention module applicable to fig. 4.
Fig. 7a and 7b are diagrams illustrating nozzle images displayed on a monitor before/after the blockage is cleared by the blockage prevention module according to the embodiment of the present invention.
[ detailed description of the invention ]
Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings.
Fig. 1 and 2 are diagrams schematically showing the inside of a vacuum chamber of a deposition apparatus system of an embodiment of the present invention when viewed from above and from the front.
The deposition apparatus system of the embodiment of the present invention may include a vacuum chamber 1, a deposition apparatus 100 movably installed in the vacuum chamber 1, and a clogging detecting and removing module 200 detachably provided at an upper side of the vacuum chamber 1, as shown in fig. 1 and 2.
The support part 10 is provided at a lower side inside the vacuum chamber 1, the first driving part 11 and the second driving part 12 are arranged long side by side in a front and rear direction on both sides on the support part 10, the third driving part 13 is arranged long in both directions to pass through the first driving part 11 and the second driving part 12, and the deposition apparatus 100 may be provided on the third driving part 13.
The first and second driving parts 11 and 12 may be configured to move the deposition device 100 and the third driving part 13 in the front-rear direction of the vacuum chamber 1, and the third driving part 13 may be configured to move the deposition device 100 in both directions of the vacuum chamber 1.
At least one or more vapor deposition objects 14 and 15 may be installed inside the vacuum chamber 1 and may be fixed above the deposition apparatus 100 by an aligner 16 provided on a ceiling of the vacuum chamber 1. Of course, the vapor deposition objects 14 and 15 may be variously configured to include glass substrates.
Accordingly, when the deposition apparatus 100 is moved in the front and rear direction of the vacuum chamber 1 by the first and second driving parts 11 and 12 or in both directions of the vacuum chamber 1 by the third driving part 13, the deposition material discharged from the deposition apparatus 100 may be deposited on at least one or more vapor deposition objects 14 and 15.
As described above, the deposition process is performed in an inline manner (in-line manner) in which the deposition apparatus 100 moves and the vapor deposition objects 14 and 15 are fixed, or in a cluster manner (cluster manner) in which the vapor deposition objects 14 and 15 move and the deposition apparatus 100 is fixed, but is not limited thereto.
Fig. 3 is an exploded perspective view illustrating a deposition apparatus according to an embodiment of the present invention.
As shown in fig. 3, the deposition apparatus 100 applied to the present invention may include a crucible 110 containing a deposition raw material, a heater 120 disposed to surround the crucible 110, a cooler 130 disposed to surround the heater 120, a nozzle cover 140 disposed on an upper surface of the crucible 110, and a guide 150 disposed on an upper surface of the nozzle cover 140.
The crucible 110 has a container shape with an open upper surface, may receive a deposition source material, and may be heated by the heater 120 to evaporate the deposition source material into a deposition material.
The deposition source is a material contained in the crucible 110, the deposition material is a material evaporated in the crucible 110, and the deposition source and the deposition material are the same, but they are names for distinguishing liquid/solid materials and gaseous materials for convenience of description, but are not limited thereto.
At least one nozzle 111 may be positioned at an upper portion of the crucible 110, and the nozzle 111 may be formed in various shapes, such as a hole or a slit, through which the deposition material passes. The crucible 110 may be arranged long in the front-rear direction in the vacuum chamber 1 (shown in fig. 2), and the nozzles 111 may be arranged to be spaced apart from each other by a predetermined distance in the front-rear direction in the vacuum chamber 1 (shown in fig. 2).
The heater 120 may include a heater frame accommodating the crucible 110, a heater generating heat toward the crucible 110, and a reflector reflecting the heat generated by the heater to the crucible 110. A heater frame is provided to surround the crucible 110, a reflector is installed inside the heater frame, and a heater is installed inside the reflector such that the heater can be installed closest to the crucible 110.
The cooler 130 may accommodate the heater 120, and may be configured as a thermal insulator to minimize leakage of heat discharged from the heater 120 to the outside.
The nozzle cover 140 covers the outer circumference of the nozzle 111 formed at the upper portion of the crucible 110, and may be located between the upper portion of the crucible 110 and the lower portion of the guide 150. The nozzle cover 140 can minimize the transfer of heat generated in the crucible 110 to the guide 150, thereby minimizing the influence of the heated guide 150 on the vapor deposition objects 14 and 15 (shown in fig. 2).
The guide 150 guides the deposition material discharged from the nozzle 111, guides the deposition material toward the vapor deposition objects 14 and 15 (as shown in fig. 12), and guides the deposition material to be uniformly deposited on the vapor deposition objects 14 and 15 (as shown in fig. 2).
The guide 150 can minimize the influence of the deposition material on the vacuum chamber 1 and limit the incident angle at which the material ejected from the nozzle 111 is deposited on the vapor deposition objects 14 and 15 (as shown in fig. 2).
Fig. 4 is a view schematically illustrating an occlusion prevention module according to an embodiment of the present invention, and fig. 5 and 6 are a perspective view and a side view illustrating an upper portion of the occlusion prevention module applicable to fig. 4.
The clogging prevention module 200 applied to the present invention may be installed in the form of a module at the upper portion of the vacuum chamber 1, and clogging occurring in the nozzles 141 and 142 in the vacuum chamber 1 may be detected and cleared outside the vacuum chamber 1.
Of course, the installation position of the clogging prevention module 200 is not limited to the upper side inside the vacuum chamber 1, and the clogging prevention module 200 may be provided on one surface of the inside of the vacuum chamber 1 facing the deposition apparatus 100, or may be installed at both sides or the lower side inside the vacuum chamber 1.
As shown in fig. 4 to 6, the jam prevention module 200 may further include viewing ports V1, V2, and V3, a camera 210, lighting parts 221 and 222, a laser 230, a laser moving unit 240, shutter units 251, 252, and 253, a controller 260, and a monitor 270.
The view ports V1, V2, and V3 are provided to transmit light having a wavelength of a specific wavelength band, and at least one view port may be provided on the upper surface of the vacuum chamber 1.
The first view port V1 may be disposed at a position where the camera 210 is installed to transmit light having a wavelength suitable for the camera 210, and the first coating C1 may be formed on an outer side surface of the first view port V1. The first coating C1 may be an anti-reflection coating, and the first coating C1 forms an image on the camera 210 by reducing the amount of reflected light even when the light of the camera 210 is incident.
The second view port V2 is provided at a position where the lighting units 221 and 222 are installed, and a second coating C2 may be formed on an outer side surface of the second view port V2. The second coating layer C2 may transmit only light having a specific wavelength band and transmit wavelengths of light irradiated by the lighting units 221 and 222.
A third view port V3 is provided at a position where the laser 230 is mounted, and a third coating C3 may be formed on an outer side surface of the third view port V3. The third coating layer C3 may transmit a laser beam and transmit a laser beam irradiated from the laser 230.
The first, second and third view ports V1, V2 and V3 may be coated as necessary, but are not limited thereto.
The first, second and third view ports V1, V2 and V3 are all disposed at adjacent positions, the first view port V1 may be disposed between a pair of the second view ports V2, and the third view port V3 may be disposed at one side of the first view port V1, but not limited thereto.
The first, second, and third view ports V1, V2, and V3 may be easily contaminated by deposition materials during evaporation. To prevent this, first, second, and third glasses G1, G2, and G3, which are individually replaceable, may be provided under the first, second, and third view ports V1, V2, and V3.
The first, second, and third glasses G1, G2, and G3 may be positioned to face the interior of the first, second, and third viewing ports V1, V2, and V3, and may be positioned closer to the first, second, and third viewing ports V1, V2, and V3 than to the nozzle 111.
A support member capable of supporting the first, second and third glasses G1, G2 and G3 inside the vacuum chamber 1 may be provided, and the first, second and third glasses G1, G2 and G3 are replaced with new glasses according to the degree of contamination.
The camera 210 is installed outside the vacuum chamber, i.e., outside the first viewing port V1 to face the nozzle 111, and can photograph at least one nozzle 111 at a preset period.
The camera 210 may be a visual camera capable of accurately photographing the nozzle 111 located inside the vacuum chamber 1 even outside the vacuum chamber 1, but is not limited thereto.
In addition, the camera 210 may communicate with the controller 260 by a wired or wireless manner, and may transmit the nozzle image photographed by the camera 210 to the controller 260.
The illumination units 221 and 222 may be connected with the camera 210 to adjust the ambient brightness of the nozzle 111 so that the camera 210 clearly photographs the nozzle 111. The pair of illumination units 221 and 222 may be disposed at both sides of the camera 210 to irradiate light to the nozzle 111.
The illumination units 221 and 222 may irradiate light having a wavelength of a specific wavelength band, and the light increases the brightness of the deposition material clogged in the nozzle 111, thereby causing fluorescence or phosphorescence. According to embodiments, the illumination units 221 and 222 may be configured in the form of Ultraviolet (UV) light, and the organic material used in the OLED display manufacturing process may be fluorescent or phosphorescent when the UV light is irradiated, but is not limited thereto.
The laser 230 is configured to output a laser beam to the nozzle 111, and the laser beam may provide thermal energy to the clogged portion of the nozzle 111. According to an embodiment, the laser 230 may be configured in the form of a UV laser, but is not limited thereto.
In addition, the laser 230 may communicate with the controller 260 by wire or wirelessly, and control the output intensity and time of the laser beam according to a control signal of the controller 260.
The laser moving unit 240 may be configured to move the laser beam output from the laser 230 to a point on the nozzle 111.
According to an embodiment, the laser moving unit 240 may include a reflector 241 reflecting the laser beam output from the laser 230 toward one point on the nozzle 111 and a rotation motor 242 adjusting an angle of the reflector 241.
One surface of the reflector 241 may be disposed to face between the laser 230 and the nozzle 111, and the other surface of the reflector 241 may be connected to the rotating motor 242.
Of course, the laser moving unit 240 is described simply, a beam expander, a condenser, etc. may be added, and may be configured to move the laser 230 in a horizontal direction or rotate an angle at which the laser 230 is directed, but is not limited thereto.
The at least one shutter unit 251, 252, and 253 may be disposed to protect the first, second, and third viewing ports V1, V2, and V3 from the deposition material, and the first, second, and third shutter units 251, 252, and 253 may be disposed between the first, second, and third viewing ports V1, V2, and V3 and the nozzle 111 to be opened and closed.
The first shutter unit 251 is provided to open and close the field of view of the first viewing port V1, and may be composed of a first shutter 251a provided below the first viewing port V1 to face the first viewing port V1, and a first shutter driving part 251b that controls the movement of the first shutter 251 a.
The first shutter 251a may be disposed closer to the first viewing port V1 than the nozzle 11, and may be located below the first glass G1. The first shutter driving part 251b may be composed of a rotating shaft and a motor connected to one side of the first shutter 251a, but is not limited thereto.
The second shutter unit 252 is provided to open and close the field of view of the second observation port V2 and may be composed of a second shutter 252a and a second shutter driving section 252 b.
The third shutter unit 253 is provided to open and close the field of view of the third observation port V3 and may be composed of a third shutter 253a and a third shutter driving section 253 b.
The first, second, and third shutters 251a, 252a, and 253a are normally maintained in a closed state.
Accordingly, when the deposition material is upwardly discharged through the nozzle 111 during the deposition process, the deposition material being evaporated is doubly blocked by the first, second, third shutters 251a, 252a, and 253a and the first, second, and third glasses G1, G2, and G3 before being deposited on the first, second, and third view ports V1, V2, and V3, thereby maintaining the first, second, and third view ports V1, V2, and V3 in a clean state.
When the camera 210 operates, the first shutter 251a may temporarily open the first viewing port V1, but the deposition material being evaporated is blocked by the first glass G1, thereby keeping the first viewing port V1 clean.
When the lighting units 221 and 222 are operated, the second shutter 252a may temporarily open the second viewing port V2, but the deposition material being evaporated is blocked by the second glass G2, thereby keeping the second viewing port V2 clean.
When the laser 230 operates, the third shutter 253a may temporarily open the third viewing port V3, but the deposition material being evaporated is blocked by the third glass G3, thereby keeping the third viewing port V3 clean.
The controller 260 may control operations of the camera 210, the lighting units 221 and 222, the laser 230, the laser moving unit 240, the first, second, and third shutter units 251, 252, and 253, and the monitor 270, and transmit control signals by wire or wirelessly.
The controller 260 may capture a nozzle image, receive the nozzle image, process the nozzle image, and transmit the nozzle image to the monitor 270 by controlling the operations of the camera 210, the illumination units 221 and 222, and the first and second shutter units 251 and 252.
The controller 260 may analyze the nozzle image to detect an initial clogging phenomenon or judge clogging according to an input signal by the judgment of an operator, and transmit a clogging alarm in the form of text, sound, or warning light to the monitor 270.
The controller 260, which has detected the initial clogging, may irradiate a laser beam to a point on the nozzle 111, i.e., a point where the initial clogging is detected, by controlling the operations of the laser 230, the laser moving unit 240, and the third shutter unit 253.
The controller 260 may uniformly control the output intensity and time of the laser beam or variously control to increase the output intensity and time of the laser beam according to the clogging degree of the nozzle 111, but is not limited thereto.
The monitor 270 may display the nozzle image and the occlusion alarm transmitted from the controller 260.
The operator can quickly determine the initial clogging phenomenon of the nozzle 111 through the nozzle image displayed on the monitor 270 or check that the clogging of the nozzle 111 is removed.
Fig. 7a and 7b are diagrams illustrating nozzle images displayed on a monitor before/after the blockage is cleared by the blockage prevention module according to the embodiment of the present invention.
Before the clogging prevention module of the present invention removes the clogging, it is clear from the nozzle image as shown in fig. 7a that the holes of the nozzle 111 are clogged with the deposition material a.
However, after the clogging prevention module of the present invention removes the clogging by the laser beam, it can be seen from the nozzle image as shown in fig. 7b that the deposition material is completely removed from the holes of the nozzle 111.
The above description is only illustrative of the technical idea of the present invention, and various modifications and changes can be made by those skilled in the art to which the present invention pertains without departing from the essential features of the present invention.
Therefore, the disclosed embodiments of the present invention are not intended to limit the technical spirit of the present invention, but are intended to explain the technical spirit of the present invention, and the scope of the technical spirit of the present invention is not limited by these embodiments.
The scope of the present invention should be construed by the claims set forth below, and all technical ideas within the equivalent scope thereof should be construed to be included in the scope of the present invention.
[ Industrial Applicability ]
The present embodiment can provide a deposition apparatus system that deposits an organic material on a glass substrate in a thin film shape when manufacturing an OLED display panel.

Claims (17)

1. A deposition device system, comprising:
a vacuum chamber;
at least one viewing port disposed on one surface of the vacuum chamber;
a deposition apparatus including a crucible accommodated in the vacuum chamber to accommodate a deposition raw material, a heater unit configured to heat the crucible, and at least one nozzle through which a deposition material evaporated from the deposition raw material passes;
a camera located outside the viewing port to photograph the nozzle through the viewing port; a laser located outside the viewing port to output a laser beam to the nozzle through the viewing port;
a laser moving unit configured to move a laser beam output from the laser to a point on the nozzle; and
a controller configured to receive a nozzle image captured by the camera and control operations of the laser and the laser moving unit according to a result of detecting clogging from the nozzle image.
2. The deposition apparatus system of claim 1, wherein the viewport comprises:
a first viewing port, the camera being mounted on an exterior thereof; and
a second viewing port disposed adjacent the first viewing port, the laser being mounted on the exterior thereof.
3. The deposition apparatus system of claim 2, wherein the viewport comprises:
a first coating applied to a first viewing port to prevent reflection of light incident from the camera; and
a second coating layer applied to a second viewing port to transmit the laser beam irradiated from the laser.
4. The deposition apparatus system of claim 2, further comprising an illumination unit located outside the viewing port to illuminate light through the viewing port to the nozzle.
5. The deposition apparatus system of claim 4, wherein the illumination unit illuminates light having a wavelength of a specific wavelength band to increase brightness of the deposition material.
6. The deposition apparatus system of claim 5 wherein the viewing port further comprises a third viewing port disposed adjacent to the first viewing port, the illumination unit being mounted outside the third viewing port.
7. The deposition apparatus system of claim 6 wherein the viewing port further comprises a third coating for coating the third viewing port to transmit light irradiated from the illumination unit.
8. The deposition apparatus system of claim 1, wherein the laser moving unit comprises:
a reflector configured to reflect a laser beam of the laser toward the nozzle; and
a rotating motor configured to adjust an angle of the reflector.
9. The deposition apparatus system of claim 1, wherein the controller controls an output intensity and time of the laser beam according to a clogging degree of the nozzle.
10. The deposition device system of claim 1, further comprising a glass replaceably disposed between the viewing port and the nozzle to protect the viewing port from the deposition material.
11. The deposition apparatus system of claim 9, wherein the glass is disposed closer to the viewing port than to the nozzle.
12. The deposition apparatus system of claim 1, further comprising a shutter unit disposed between the viewing port and the nozzle and capable of opening and closing, and configured to protect the viewing port from the deposition material.
13. The deposition apparatus system of claim 12, wherein the shutter unit comprises:
a shutter that is provided so as to face at least a part of the observation port and opens and closes a field of view of the observation port; and
a shutter driving section configured to control a movement of the shutter.
14. The deposition apparatus system of claim 13, wherein the shutter is disposed closer to the viewing port than to the nozzle.
15. The deposition apparatus system of claim 13, wherein the controller controls operation of the shutter driving part such that the shutter opens a field of view of the viewing port at a point in time when at least one of the camera, the illumination unit, or the laser is operated.
16. The deposition device system of claim 1, further comprising a monitor configured to display a nozzle image captured by the camera.
17. The deposition apparatus system of claim 1 wherein said controller generates an alarm on said monitor when a blockage is detected from said nozzle image.
CN201980096607.5A 2019-06-20 2019-11-29 Deposition apparatus system Pending CN113853447A (en)

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